JPH07218718A - Manufacture of color filter substrate - Google Patents

Abstract

PURPOSE:To provide a method of manufacturing a color filter substrate which has high precision colored patterns with a high throughput at a low cost in the method of manufacturing the color filter substrate for a liquid crystal display device. CONSTITUTION:Colored resins 3 to 5 having plural colors are formed on a transparent substrate 1 by repeatedly executing, at plural times successively from the region of the large exposure to the region of the small exposure at the time of the stepwise exposure, a process in which a positive type photosensitive resin film 2 in the region of the largest stepwise exposure is removed by executing development after the positive type photosensitive resin film 2 is formed on the transparent substrate 1 and the positive type photosensitive resin film 2 is stepwisely exposed by selectively changing the exposure for each color region, and a process in which a negative type photosensitive colored resin film 3 is formed, exposed and developed from the back surface of the transparent substrate 1, and the colored resin film 3 is made to remain on the transparent substrate 1 in the region in which the positive type photosensitive resin film 2 is removed.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter substrate for a liquid crystal display device.

[0002]

2. Description of the Related Art In recent years, liquid crystal display displays have become larger,
With the increase in capacity, colorization is required, and liquid crystal display displays using color filters are provided. Among the components of the color liquid crystal display, the color filter substrate accounts for a large cost,
Lower prices are required.

As a method for manufacturing a color filter substrate at low cost, an electrodeposition method and a printing method are known. The electrodeposition method involves forming an indium tin oxide film (ITO film) on a substrate, patterning this, and forming electrodes on the regions corresponding to the coloring pattern, immersing the electrode in a coloring electrodeposition solution, and attempting to color the film. The step of energizing and coloring the electrodes in the region to be colored is repeated a plurality of times depending on the number of colors to be colored. In addition,
Instead of patterning the ITO film to form an electrode, there is also a method of forming a resist film having an opening in a region to be colored on the ITO film. Further, the printing method is a method of applying a coloring resin to a plate produced corresponding to a coloring pattern and transferring the coloring resin to a substrate, as in the ordinary printing technique.

[0004]

DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention
Since it is difficult to control H, concentration, etc., and the voltage applied to each electrode varies due to variations in sheet resistance of the ITO film and voltage drop in the middle, variations occur in the film formation state of the colored film. There is a problem that it is easy.
Further, the printing method has a problem in that the accuracy of the coloring pattern is poor because the uncured colored resin is transferred from the plate onto the substrate.

An object of the present invention is to eliminate these drawbacks, and it is an object of the present invention to provide a method for inexpensively manufacturing a color filter substrate having a highly accurate colored pattern with high throughput.

[0006]

The above object can be achieved by any of the following means.

The first means is to form a positive photosensitive resin film (2) on a transparent support (1) and selectively expose the positive photosensitive resin film (2) for each color area. After the stepwise exposure is performed by changing the temperature, the development is performed to remove the positive photosensitive resin film (2) in the region having the largest amount of the stepwise exposure, and the negative photosensitive colored resin film (3). ) Is formed on the transparent support (1) by exposing it from the back surface of the transparent support (1) and developing it, and coloring on the transparent support (1) in the area where the positive photosensitive resin film (2) is removed. The step of leaving the resin film (3) is sequentially repeated a plurality of times from the region where the exposure amount in the stepwise exposure is large to the region where the exposure amount is small, and the colored resin of a plurality of colors is formed on the transparent support (1). It is a manufacturing method of a color filter substrate for forming a film (3, 4, 5).

The second means is to form a positive photosensitive resin film (2) on the transparent support (1) and selectively expose the positive photosensitive resin film (2) for each color area. The positive type photosensitive resin film (2) is left in the form of islands in the colored resin film forming region by developing after stepwise exposure, and then the metal film (11) is formed on the entire surface to form the transparent film. After exposure from the back surface of the support (1), development is performed and the island-shaped positive photosensitive resin film (2) having the largest exposure amount in the stepwise exposure and the island-shaped positive photosensitive resin A step of removing the metal film (11) formed on the resin film (2), a negative photosensitive colored resin film (8) is formed, and exposure is performed from the back surface of the transparent support (1). And developed to leave the colored resin film (8) on the transparent support (1) from which the positive photosensitive resin film (2) has been removed. The above steps are sequentially repeated a plurality of times from the island-shaped positive photosensitive resin film having a large exposure amount in the stepwise exposure to the small island-shaped positive photosensitive resin film, and the transparent support (1 ) A colored resin film (8, 9, 10) of a plurality of colors on top of which a metal film (11) is provided between the colored resin films.
It is a manufacturing method of a color filter substrate formed by sandwiching.

A third means is to form a positive photosensitive resin film (2) on a transparent support (1) and selectively expose the positive photosensitive resin film (2) for each color area. And a step of exposing the positive photosensitive resin film (2) in the form of islands in the colored resin film forming region, and then forming a negative photosensitive black resin film (12). The transparent support (1) is exposed to light from the back surface and developed, and the negative photosensitive black resin film (12) is formed in a region sandwiched between the island-shaped positive photosensitive resin films (2). After the residual, development is performed to remove the island-shaped positive photosensitive resin film (2) having the largest exposure amount in the stepwise exposure, and the negative photosensitive colored resin film (8). Forming and forming the transparent support (1)
And exposing from the back surface of the positive type photosensitive resin film (2) to leave the colored resin film (8) on the transparent support (1) from which the positive photosensitive resin film (2) has been removed. The above process is repeated a plurality of times from the island-shaped positive type photosensitive resin film having a large exposure amount to the small island-shaped positive type photosensitive resin film, and a plurality of colors are colored on the transparent support (1). A method of manufacturing a color filter substrate, in which a resin film (8, 9, 10) is formed by sandwiching a black resin film (12) between colored resin films.

The negative type photosensitive colored resin film (3/8)
The developing step of 1) and the developing step of the positive photosensitive resin film (2) which is subsequently performed may be simultaneously performed, and the region to be removed at the end of the positive photosensitive resin film (2) is It is not necessary to expose during the stepwise exposure. In addition, the formation of the colored resin films of the plurality of colors is preferably performed sequentially from a colored resin film having a low transmittance in the ultraviolet region or from a colored resin film having a large exposure amount necessary for curing. . Further, the film thickness of the positive photosensitive resin film (2) is preferably larger than the film thickness of the metal film (11).

[0011]

OPERATION FIG. 1 shows a principle explanatory diagram. As shown in FIG. 3A, a positive photosensitive resin film 2 is formed on a transparent support 1, and the exposure amount is changed for each color region of a colored resin film composed of a plurality of colors to perform stepwise exposure. In this example, the exposure amount of the area indicated by the symbol 2a is the largest,
Exposure is performed so that the area indicated by 2 is the smallest and the area indicated by 2b has an intermediate exposure amount.

By the first development, the positive type photosensitive resin film 2 in the area 2a is removed as shown in FIG. Next, as shown in FIG. 3C, a negative photosensitive coloring resin film 3 is formed, and back exposure is performed from the back surface of the transparent support 1. Then, the negative photosensitive resin in the region where the positive photosensitive resin film is removed is formed. The colored resin film 3 is cured, and the positive photosensitive resin film 2 in the regions 2b and 2c is further exposed to light.

When the negative photosensitive colored resin film 3 is developed,
As shown in FIG. 3D, the colored resin film 3 remains in the removed region of the positive photosensitive resin film 2. Then, when the positive photosensitive resin film 2 is developed again, the area 2b is formed by the stepwise exposure shown in FIG. 9A and the backside exposure shown in FIG.
The positive photosensitive resin film 2 is removed because it is sufficiently exposed. In this way, the transparent support 1 is obtained by repeatedly performing the steps from FIG. 2B to FIG.
It is possible to form the colored resin films 3, 4, 5 of a plurality of colors on the top.

The development of the positive photosensitive resin film 2 and the development of the negative photosensitive colored resin film 3 may be carried out at the same time.

Further, the stepwise exposure method for the positive photosensitive substrate 1 when manufacturing a color filter substrate consisting of three colors is as follows.
As shown in (a), the positive photosensitive resin film 2 is exposed using a mask 6 having an opening corresponding to the first colored resin film formation region 2a, and then shown in FIG. 2 (b). like,
The mask 6 is moved by one pitch to expose the positive photosensitive resin film 2 in the second colored resin film formation region 2b with an exposure amount smaller than the exposure amount in the first exposure, and the third colored resin film formation region is exposed. The positive type photosensitive resin film 2 of 2c may not be exposed. In this way, the mask alignment is conventionally 4-5.
Throughput is remarkably improved because it is only necessary to do once. Moreover, since the positive photosensitive resin film is used as a pattern guide for forming the colored resin film, it is possible to form a colored pattern with higher accuracy than ever before.

When the colored resin film is formed in order from the resin having a low ultraviolet transmittance, the second negative photosensitive colored resin film formed on the first colored resin film is formed on the back surface. Exposure to light prevents exposure and prevents the second colored resin film from remaining on the first colored resin film. Further, if the negative photosensitive colored resin film having a large curing exposure amount is sequentially formed, the second colored resin film can be prevented from remaining on the first colored resin film for the same reason as above. .

[0017]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A method of manufacturing a color filter substrate according to three embodiments of the present invention will be described below with reference to the drawings.

First Example See FIG. 3 (a) First, a 1000 Å-thick chromium film is formed on a transparent support 1 made of a 1.1 mm-thick non-alkali glass, and this is patterned to form a black matrix 7. .

Referring to FIG. 3B, the positive photosensitive resin film 2 is 2.0 μm thick using a spinner.
The colored resin film forming regions of three colors (R, G, B) are formed to have a thickness of m and exposed stepwise with different exposure amounts for each color region.
In order to perform stepwise exposure, one pattern (width 100 μm, pitch 300
μm) is used, and the photomask 6 is used.
After exposing the color area with an exposure amount of 300 mj / cm ² , the mask 6 is shifted to the G color side and weaker than the R color area.
The exposure may be performed with an exposure amount of 0 mj / cm ² , and the B color area may not be exposed. Needless to say, the gradation photomask may be used to perform the exposure once.

See FIG. 3 (c). When development is performed using an alkaline developer (KOH 0.8%, 25 ° C.), the positive type photosensitive resin film 2 corresponding to the R color region having the largest stepwise exposure amount is removed. To be done. The film thickness of the G color region is slightly reduced but not removed.

Referring to FIG. 4 (a), a negative photosensitive colored resin film 8 of R color is formed to a thickness of 1.5 μm using a spinner or a roll coater, pre-cured (90 ° C., 30 minutes), and then transparently supported. Back exposure is performed from the back surface of the body 1 with an exposure amount of 150 mj / cm ² .

As shown in FIG. 4 (b), when developed using an alkaline developer (KOH 0.8%, 25 ° C.), the R colored resin film 8 is formed only on the removed region of the positive photosensitive resin film 2. Remains, and at the same time, the positive type photosensitive resin film 2 in the G color region having the second largest stepwise exposure amount is removed.

Referring to FIG. 4 (c), a negative-type photosensitive colored resin film of G color is formed to a thickness of 1.5 μm, and back exposure is performed with an exposure amount of 250 mj / cm ² .
When developed, the positive photosensitive resin film 2 in FIG.
When the G colored resin film 9 is formed in the removed area, the positive photosensitive resin film 2 in the B area having the third largest stepwise exposure amount is developed and removed.

Finally, a B-type negative-type photosensitive colored resin film was formed to a thickness of 1.5 μm, and was back-exposed with an exposure amount of 80 mj / cm ² to develop, and as shown in FIG. A colored resin film 8 of three colors R, G, B on the support 1,
9, 10 are formed.

Second Example Refer to FIG. 5 (a). A positive photosensitive resin film 2 having a thickness of 2.0 μm is formed on a transparent support 1 made of 1 mm thick non-alkali glass, and R,
Exposure is performed using a mask 6 having an opening in a region corresponding to one of the three stripe patterns of G and B colors and a black matrix forming region, and then the mask 6 is shifted by one pitch to obtain an exposure amount higher than the previous exposure. Exposure is reduced with less exposure.

As shown in FIG. 5B, since the black matrix forming region is sufficiently exposed by the above-mentioned two exposures after development, the positive photosensitive resin film 2 is removed from this region.

Referring to FIG. 5C, the chromium film 11 is formed to a thickness of 1000 Å by using the sputtering method.

Referring to FIG. 6A, back exposure is performed from the back surface of the transparent support 1.

As shown in FIG. 6 (b), when developed, the positive photosensitive resin film 2 in the region exposed with the largest exposure amount in the stepwise exposure in FIG. 5 (a) is dissolved and the chromium formed thereon is dissolved. The membrane 11 is lifted off.

Referring to FIG. 6C, a negative photosensitive color resin film 8 of R color is formed.

Referring to FIG. 7A, back exposure is performed from the back surface of the transparent support 1.

As shown in FIG. 7 (b), after development, the colored resin film 8 of R color remains in the region where the positive photosensitive resin film 2 is removed, and at the same time, the colored resin film 8 of the R color is exposed in the stepwise exposure process.
The positive photosensitive resin film 2 in the region exposed with the second largest exposure amount is dissolved, and the chromium film 11 formed thereon
Is lifted off.

Referring to FIG. 7 (c), by repeating the steps shown in FIGS. 6 (c), 7 (a) and 7 (b) two more times, R,
A color filter substrate on which the colored resin films 8, 9 and 10 of three colors G and B are formed is formed.

Third Example FIG. 5 (b) Re-reference Similar to the second example, as shown in FIG. 5 (b), the positive photosensitive resin film 2 is formed in an island shape on the transparent support 1.

See FIG. 8A. A negative photosensitive black resin film is applied to form a negative photosensitive black resin film 12.

See FIG. 8B. Back exposure is performed from the back surface of the transparent support 1.

As shown in FIG. 8C, the development removes the positive photosensitive resin film 2 in the area exposed with the largest exposure amount and the negative photosensitive black resin film 12 in the area excluding the black matrix forming area. It

Referring to FIG. 8D, a negative photosensitive color resin film 8 of R color is formed.

See FIG. 9A. Back exposure is performed from the back surface of the transparent support 1.

As shown in FIG. 9 (b), upon development, a colored resin film 8 of R color is formed in the area where the positive photosensitive resin film 2 has been removed, and at the same time, it is 2
The positive photosensitive resin film 2 in the area exposed with the second largest exposure amount is removed.

Referring to FIG. 9 (c), by repeating the steps shown in FIGS. 8 (c), 9 (a) and 9 (b) two more times, R,
A color filter substrate on which the colored resin films 8, 9 and 10 of three colors G and B are formed is formed.

[0042]

As described above, in the method of manufacturing a color filter substrate according to the present invention, the colored resin films of a plurality of colors can be sequentially formed by skillfully combining stepwise exposure and backside exposure for development. Therefore, the number of times of mask alignment in the photolithography process can be reduced, and the throughput can be significantly improved. Further, since the colored resin film is formed by using the positive photosensitive resin as a pattern guide, compared to the case where the negative photosensitive colored resin film is patterned by using the photolithography method to form the colored resin film. Highly accurate pattern formation becomes possible. In particular, the photosensitive black resin forming the black matrix has poor photolithographic properties (development, pattern accuracy, etc.) because it is a non-transmissive material, and it is difficult to align it with the colored resin pattern. Since it is formed by patterning by alignment, it is possible to form a highly precise pattern of the photosensitive black resin.

[Brief description of drawings]

FIG. 1 is a diagram illustrating the principle of the present invention.

FIG. 2 is an explanatory diagram of stepwise exposure.

FIG. 3 is a manufacturing process diagram of a color filter substrate (first
Corresponding to the example).

FIG. 4 is a manufacturing process diagram of a color filter substrate (first
Corresponding to the example).

FIG. 5 is a manufacturing process diagram of a color filter substrate (second)
Corresponding to the example).

FIG. 6 is a manufacturing process diagram of a color filter substrate (second)
Corresponding to the example).

FIG. 7 is a manufacturing process diagram of a color filter substrate (second)
Corresponding to the example).

FIG. 8 is a manufacturing process diagram of the color filter substrate (third embodiment)
Corresponding to the example).

FIG. 9 is a manufacturing process diagram of the color filter substrate (third embodiment)
Corresponding to the example).

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Transparent support 2 Positive type photosensitive resin film 3/4 5 Negative type photosensitive coloring resin film 6 Mask 7 Black matrix 8 R color negative type photosensitive coloring resin film 9 G color negative type photosensitive coloring resin film 10 B-color negative photosensitive colored resin film 11 Chromium film 12 Negative photosensitive black resin film

Claims (8)

[Claims] 1. A step of forming a positive type photosensitive resin film (2) on a transparent support (1) and selectively changing the exposure amount of each of the positive type photosensitive resin film (2) for each color region. After the exposure, a step of developing to remove the positive photosensitive resin film (2) in the region having the largest stepwise exposure amount; and forming a negative photosensitive colored resin film (3) The transparent support (1) is exposed in the back surface of the transparent support (1) and developed to remove the positive photosensitive resin film (2) in the removed region.
The step of leaving the colored resin film (3) on top is repeatedly performed a plurality of times from the region where the exposure amount in the stepwise exposure is large to the region where the exposure amount is small, and the transparent support (1) is colored in a plurality of colors Resin film (3.4
A method for manufacturing a color filter substrate, which comprises forming 5). 2. A step of forming a positive photosensitive resin film (2) on a transparent support (1), and selectively changing the exposure amount of the positive photosensitive resin film (2) for each color region. After exposure and development, the positive photosensitive resin film (2) is left as islands in the colored resin film formation region, and then a metal film (11) is formed on the entire surface to form the transparent support (1). After exposure from the back side, development is performed to form on the island-shaped positive type photosensitive resin film (2) having the largest exposure amount in the stepwise exposure and the island-shaped positive type photosensitive resin film (2). A step of removing the metal film (11) formed, and a negative photosensitive colored resin film (8) is formed, exposed from the back surface of the transparent support (1) and developed to obtain the positive photosensitive resin. The step of leaving the colored resin film (8) on the transparent support (1) from which the resin film (2) has been removed, Sequentially and repeatedly executed multiple times until the small islands of the positive photosensitive resin film from Kii island-like positive photosensitive resin film, the coloring of a plurality of colors on the transparent substrate (1) a resin film (8, 9
A method for manufacturing a color filter substrate, characterized in that the metal film (11) is sandwiched between the colored resin films (10). 3. A step of forming a positive type photosensitive resin film (2) on a transparent support (1) and selectively changing the exposure amount of the positive type photosensitive resin film (2) for each color region. After exposure and development, the positive photosensitive resin film (2) is left in the colored resin film forming region in an island shape, and then a negative photosensitive black resin film (12) is formed to form the transparent support ( The negative photosensitive black resin film (1) is exposed and developed from the back surface of 1).
2) is left in the region sandwiched between the island-shaped positive type photosensitive resin film (2), and is developed, and the island-shaped positive type photosensitive resin film having the largest exposure amount in the stepwise exposure is developed. A step of removing (2), forming a negative type photosensitive colored resin film (8), exposing from the back surface of the transparent support (1) and developing, to form a positive type photosensitive resin film (2). A step of leaving the colored resin film (8) on the removed transparent support (1), from the island-shaped positive photosensitive resin film having a large exposure amount in the stepwise exposure to the small island-shaped positive photosensitive resin. Of the colored resin film (8, 9) of a plurality of colors on the transparent support (1).
・ Black resin film (12) between colored resin films
A method of manufacturing a color filter substrate, characterized in that the color filter substrate is formed by sandwiching. 4. The negative photosensitive colored resin film (3.8)
4. The method for producing a color filter substrate according to claim 1, wherein the developing step of 1) and the developing step of the positive type photosensitive resin film (2) which is subsequently performed are simultaneously performed. 5. The color filter according to claim 1, 2, 3 or 4, wherein a region of the positive photosensitive resin film (2) that is finally removed is not exposed during the stepwise exposure. Substrate manufacturing method. 6. The colored resin film of a plurality of colors is formed sequentially from a colored resin film having a low transmittance in the ultraviolet region, according to claim 1, 2, 3, 4, or 5. Method for manufacturing color filter substrate. 7. The colored resin film of a plurality of colors is formed sequentially from a colored resin film having a large exposure amount required for curing, according to claim 1, 2, 3, 4, or 5. Of manufacturing color filter substrate of. 8. The method of manufacturing a color filter substrate according to claim 2, wherein the positive photosensitive resin film (2) is thicker than the metal film (11).