JPH07211276A - Exposing shutter mechanism for electron microscope etc - Google Patents

Abstract

PURPOSE:To eliminate the vacuum leak, generation of vibration and decay of response considered as a failure of a conventional shutter mechanism by using a magnetic field of an electromagnet outside of the vacuum to improve the mechanism of an exposing shutter mechanism to be used for electron microscope, especially, a shutter mechanism provided in the vacuum. CONSTITUTION:An exposing shutter 3a, of which weigh is reduced, is supported by using a pivot bearing to support a shutter supporting point 4, and an iron piece 8 is provided at the terminal of the shutter 3a. A magnetic pole 12 is fixed to each electrode coil 5, 6 for open/close and a coil part to open/close 14 a shutter plate. The shutter plate can be moved at a high speed with a low vibration in the vacuum by controlling an electromagnetic coil control power source 9 for controlling the electromagnetic coils on the basis of the shutter open/close signal 10.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure shutter mechanism used in an electron microscope or the like which requires high speed and high resolution image capturing.

[0002]

2. Description of the Related Art In a conventional exposure shutter for an electron microscope, a shutter plate is provided at the tip of an air cylinder, and the air cylinder is controlled by compressed air to provide a shutter function. Since the air cylinder has a vacuum seal structure via an O-ring, the response speed of the air cylinder is limited, and a slight vacuum leak occurs when the air cylinder shaft is slid. Further, vibration occurs in the air cylinder portion with the pressure change of the compressed air, and there is a problem such as a vibration obstacle in high-magnification photography. If the response speed of the shutter is slow, a high-sensitivity film is used, or if the exposure time is shortened, the exposure time to the film changes, which causes unevenness in blackening.

[0003]

SUMMARY OF THE INVENTION An object of the present invention is to improve the mechanism of an exposure shutter used in an electron microscope, and in particular to increase the shutter speed and to generate vibration during operation.
This is to solve problems such as vacuum leaks.

[0004]

In order to achieve the above object, the shutter plate of the electron microscope is separated from the driving mechanism, and the driving mechanism is provided outside the vacuum to control the shutter plate.
This is to reduce the occurrence of vibration in addition to the vacuum leak at the time of shutter operation and the increase in operating time.

[0005]

The exposure shutter mechanism used in an electron microscope or the like is provided with a shutter opening / closing mechanism in the vicinity of the electron beam passage as a means for controlling the exposure time to the film, for determining the exposure time to the film and capturing an image from the CCD TV. I am using
In recent years, in order to cope with exposure to high-sensitivity films and high-sensitivity TVs, higher shutter speeds have been required. As a means to meet these needs, we will reduce the weight of the shutter plate provided in the vacuum, support the pivot bearings, provide a drive system using the magnetic field of the electromagnet outside the vacuum, and control the current flowing through it. This makes it possible to increase the shutter speed, reduce vibration from the drive system, and prevent vacuum leaks.

[0006]

EXAMPLE An example of the present invention will be described below with reference to FIG. FIG. 1 shows a configuration of an exposure shutter mechanism used in an electron microscope or the like for high speed, vibration reduction, and prevention of a vacuum leak during operation as viewed from above.

The mirror body 1 of the electron microscope is designed to have a high vacuum 13, and an electron beam passage 2 is provided at the center of the mirror body. In the exposure shutter for an electron microscope, the exposure time is determined by opening / closing 14 this electron beam passage with the shutter plate 3. The shutter plate is supported by pivot bearings so that opening and closing can be performed instantly with the shutter fulcrum 4 as a fulcrum.

To open and close the shutter plate, the electromagnetic coil control power supply 9 is operated by the shutter open / close signal 10 to the B side at the time of open and the A side at the time of close.
Each of the open electromagnetic coils 5 is excited to generate a magnetic field in the magnetic pole 12, which is attached to the end of the shutter plate. Iron piece 8
Suction is either open or close, and the shutter plate is opened and closed on the electron beam passage side.

The magnetic pole is fixed to the vacuum seal by an O-ring 7 for vacuum seal. A shock absorber 11 is provided as a means for absorbing the vibration generated when the iron plate collides with the magnetic pole on the open side of the shutter plate.

As described above, according to this embodiment, since the drive mechanism and the shutter plate are separated from each other, no vacuum leak occurs during operation, and the weight and weight of the shutter plate can be easily reduced. The generation of vibration due to the impact of is also reduced. The shutter speed can be increased only by the response speed of the electromagnet control power supply, and the shutter fulcrum position can be changed as needed to further increase the speed.

[0011]

According to the present invention, in an exposure shutter mechanism used in an electron microscope or the like, it is possible to reduce the occurrence of vacuum leak and vibration that occur during shutter operation, and it is possible to easily increase the shutter speed. Is remarkable.

[Brief description of drawings]

FIG. 1 is a configuration diagram of an embodiment of the present invention.

[Explanation of symbols]

1 ... Mirror body, 2 ... Electron beam passage, 3 ... Shutter plate, 4 ... Shutter fulcrum, 5 ... Shutter open electromagnetic coil, 6 ...
Power supply coil for shutter close, 7 ... O-ring for vacuum seal, 8 ... Iron piece, 9 ... Electromagnetic coil control power supply, 10 ... Shutter open / close signal, 11 ... Shock absorption, 12 ... Magnetic pole, 13 ... High vacuum, 14 ... Open / close .

Claims (1)

[Claims] 1. A shutter mechanism used in an electron microscope or the like, for capturing a high-resolution image, exposing a high-sensitivity film,
A shutter provided in a vacuum for the purpose of preventing vibration problems from the shutter mechanism when capturing TV images, exposure unevenness due to delay in shutter response speed, and vacuum drop during operation. An exposure shutter mechanism for electron microscopes, etc., which uses a magnetic field of an electromagnet outside the vacuum to control the current flowing through the plate to function as a shutter.