JPH07199164A - Surface treatment of plastic film substrate for liquid crystal display element - Google Patents

Surface treatment of plastic film substrate for liquid crystal display element

Info

Publication number
JPH07199164A
JPH07199164A JP33466593A JP33466593A JPH07199164A JP H07199164 A JPH07199164 A JP H07199164A JP 33466593 A JP33466593 A JP 33466593A JP 33466593 A JP33466593 A JP 33466593A JP H07199164 A JPH07199164 A JP H07199164A
Authority
JP
Japan
Prior art keywords
substrate
plastic film
liquid crystal
film substrate
crystal display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33466593A
Other languages
Japanese (ja)
Inventor
Toshio Oide
俊夫 大出
Sumio Kamoi
澄男 鴨井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP33466593A priority Critical patent/JPH07199164A/en
Publication of JPH07199164A publication Critical patent/JPH07199164A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To make the gap of a spacing for sealing liquid crystals uniform and to obviate generation of visible defects by confining the height of projections on the surface of a plastic film substrate to a prescribed height or below in the method for surface treatment of the plastic film substrate for a liquid crystal display element comprising treating the surfaces of plastic film substrates on which transparent conductive films are formed and which are sealed with liquid crystals in the spacing formed by the transparent conductive films facing each other. CONSTITUTION:The plastic substrates 11 on which the transparent conductive films are formed and which are sealed with the liquid crystal injected into the spacing formed by facing the surfaces each other are held by glass plates 12 having smooth surfaces. A stainless steel plate 14 on which a weight 13 is placed is placed on these glass plates 12 and the assembly is held in this state for 10 minutes in an oven kept at 120 deg.C, by which the projections on the surfaces of the substrates 1 are press welded under heating and are made into the prescribed height or below. The temp. of the oven 23 is below the thermal deformation temp. of the substrates 11 and the Snoop hardness of the glass plates 12 is about 500.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、液晶表示素子用のプラ
スチックフィルム基板の表面処理方法に関し、詳しく
は、表面に透明導電膜を形成しその透明導電膜が対向す
る隙間に液晶を封止する液晶表示素子用プラスチックフ
ィルム基板の表面処理方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment method for a plastic film substrate for a liquid crystal display device, and more specifically, a transparent conductive film is formed on the surface and liquid crystal is sealed in a gap facing the transparent conductive film. The present invention relates to a surface treatment method for a plastic film substrate for a liquid crystal display device.

【0002】[0002]

【従来の技術】従来、液晶表示素子は表面に透明導電膜
をパターンニングした基板を用い、その基板が対向する
隙間に液晶を注入・封止して透明導電膜に液晶の駆動電
圧を印加することによって所定の表示を行なうようにな
っており、基板としてはガラス基板が用いられていた
が、近年、打ち抜き等によって容易に加工することが可
能なプラスチックフィルム基板がガラス基板に代り多用
されている。
2. Description of the Related Art Conventionally, a liquid crystal display element uses a substrate having a transparent conductive film patterned on its surface, and liquid crystal is injected and sealed in a gap facing the substrate to apply a driving voltage of the liquid crystal to the transparent conductive film. By doing so, a predetermined display is performed, and a glass substrate was used as the substrate, but in recent years, a plastic film substrate that can be easily processed by punching or the like is widely used instead of the glass substrate. .

【0003】[0003]

【発明が解決しようとする課題】しかしながら、このよ
うな従来のプラスチックフィルム基板にあっては、その
表面には微細な突起がある。この基板を用いて液晶表示
素子を作製した場合、所定高さ以上の突起に対向する基
板がその突起によって押されて基板間の液晶を封止する
隙間の間隔dが広くなる。そのため、その箇所のΔn・
d(Δn:液晶の光学異方性、d:液晶の層厚)が他の
箇所に較べて大きくなってしまい、その箇所の色が他の
箇所と異なる目視欠点が発生するという問題があった。
However, such a conventional plastic film substrate has fine protrusions on its surface. When a liquid crystal display device is manufactured using this substrate, the substrate facing the protrusion having a predetermined height or more is pushed by the protrusion and the gap d between the substrates for sealing the liquid crystal becomes wide. Therefore, Δn
There is a problem that d (Δn: optical anisotropy of liquid crystal, d: layer thickness of liquid crystal) becomes large as compared with other portions, and a visual defect in which the color of the portion is different from that of other portions occurs. .

【0004】そこで、本発明は、プラスチックフィルム
基板の表面の突起の高さを所定高さ以下にすることによ
り、液晶を封止する隙間の間隔を均一にして、目視欠点
の発生をなくすことを目的とする。
Therefore, according to the present invention, the height of the protrusions on the surface of the plastic film substrate is set to be equal to or less than a predetermined height so that the gaps for sealing the liquid crystal are made uniform and the occurrence of visual defects is eliminated. To aim.

【0005】[0005]

【課題を解決するための手段】上記目的達成のため、請
求項1記載の発明は、表面に透明導電膜を形成し、該透
明導電膜を所定隙間を介して対向させて該隙間に液晶を
封止する液晶表示素子のプラスチックフィルム基板の表
面を処理する液晶表示素子用プラスチックフィルム基板
の表面処理方法であって、前記プラスチックフィルム基
板を、所定温度で加熱するとともに所定圧力で圧接し、
該基板の表面の突起を加熱圧接して該突起を所定高さ以
下にすることを特徴とするものである。
In order to achieve the above object, the invention according to claim 1 forms a transparent conductive film on the surface, and the transparent conductive films are opposed to each other with a predetermined gap, and a liquid crystal is filled in the gap. A surface treatment method for a plastic film substrate for a liquid crystal display device for treating a surface of a plastic film substrate of a liquid crystal display device to be sealed, wherein the plastic film substrate is heated at a predetermined temperature and pressed under a predetermined pressure,
It is characterized in that the projections on the surface of the substrate are heated and pressed to make the projections have a predetermined height or less.

【0006】請求項2記載の発明は、前記プラスチック
フィルム基板を、所定硬度の平滑な表面を備えた一対の
平滑板で挟み、該基板を所定圧力で挟圧することを特徴
とするものである。請求項3記載の発明は、前記プラス
チックフィルム基板を、平滑な表面を備えた一対の加圧
ローラの間を通過させ、該基板を所定圧力で挟圧するこ
とを特徴とするものである。
According to a second aspect of the present invention, the plastic film substrate is sandwiched between a pair of smooth plates having a smooth surface having a predetermined hardness, and the substrate is pressed at a predetermined pressure. The invention according to claim 3 is characterized in that the plastic film substrate is passed between a pair of pressure rollers having a smooth surface, and the substrate is clamped at a predetermined pressure.

【0007】請求項4記載の発明は、ヌープ硬度が20
0以上の前記平滑板を用いることを特徴とするものであ
る。請求項5記載の発明は、ヌープ硬度が200以上の
前記加圧ローラを用いることを特徴とするものである。
請求項6記載の発明は、前記プラスチックフィルム基板
を、該基板の熱変形温度以下で加熱することを特徴とす
るものである。
The invention according to claim 4 has a Knoop hardness of 20.
It is characterized in that 0 or more of the smooth plates are used. The invention according to claim 5 is characterized in that the pressure roller having a Knoop hardness of 200 or more is used.
The invention according to claim 6 is characterized in that the plastic film substrate is heated at a heat deformation temperature of the substrate or lower.

【0008】請求項7記載の発明は、表面に前記透明導
電膜を形成する前に、前記プラスチックフィルム基板を
加熱圧接することを特徴とするものである。請求項8記
載の発明は、前記プラスチックフィルム基板を、吸水処
理を施した後、加熱圧接することを特徴とするものであ
る。請求項9記載の発明は、表面に透明導電膜を形成
し、該透明導電膜を所定隙間を介して対向させて該隙間
に液晶を封止する液晶表示素子のプラスチックフィルム
基板の表面を処理する液晶表示素子用プラスチックフィ
ルム基板の表面処理方法であって、前記プラスチックフ
ィルム基板に、透明導電膜を形成する前に、該基板の表
面を研磨して該表面の突起を所定高さ以下にすることを
特徴とするものである。
The invention according to claim 7 is characterized in that the plastic film substrate is heated and pressed before the transparent conductive film is formed on the surface. The invention according to claim 8 is characterized in that the plastic film substrate is subjected to water absorption treatment and then heated and pressure-welded. According to a ninth aspect of the present invention, the surface of a plastic film substrate of a liquid crystal display device is formed in which a transparent conductive film is formed on the surface, the transparent conductive films are opposed to each other through a predetermined gap, and liquid crystal is sealed in the gap. A method for treating a surface of a plastic film substrate for a liquid crystal display device, which comprises polishing the surface of the substrate so that the protrusions on the surface are not more than a predetermined height before forming a transparent conductive film on the plastic film substrate. It is characterized by.

【0009】[0009]

【作用】請求項1記載の発明では、プラスチックフィル
ム基板が所定温度で加熱されるとともに所定圧力で圧接
され、基板表面の突起が加熱圧接されてその突起が所定
高さ以下にされる。したがって、基板を所定隙間を介し
て対向させたとき、対向する基板を押す突起がなくな
り、液晶を封止する隙間の間隔が均一にされる。
According to the first aspect of the present invention, the plastic film substrate is heated at a predetermined temperature and pressed at a predetermined pressure, and the projection on the surface of the substrate is heated and pressed so that the projection has a predetermined height or less. Therefore, when the substrates are opposed to each other through the predetermined gap, there is no protrusion that pushes the opposed substrate, and the gaps for sealing the liquid crystal are made uniform.

【0010】請求項2記載の発明では、プラスチックフ
ィルム基板は所定硬度の平滑な表面を備えた一対の平滑
板に挟まれて所定の圧力で挟圧される。したがって、突
起以外の箇所の基板表面に影響を与えることなく、平滑
板が挟圧する圧力は表面の突起に加えられ、その突起が
加熱圧接されて所定高さ以下にされる。請求項3記載の
発明では、プラスチックフィルム基板は平滑な表面を備
えた一対の加圧ローラの間を通過して、その加圧ローラ
により所定圧力で挟圧されて加熱圧接される。したがっ
て、加圧ローラに挟圧される箇所の基板表面の突起が加
熱圧接され所定高さ以下にされる。
According to the second aspect of the present invention, the plastic film substrate is sandwiched by a pair of smooth plates having a smooth surface having a predetermined hardness and is sandwiched by a predetermined pressure. Therefore, the pressure sandwiched by the smooth plate is applied to the projections on the surface without affecting the surface of the substrate other than the projections, and the projections are heated and pressed to a predetermined height or less. According to the third aspect of the invention, the plastic film substrate passes between the pair of pressure rollers having a smooth surface, and is nipped by the pressure rollers at a predetermined pressure to be heated and pressed against each other. Therefore, the protrusions on the surface of the substrate where the pressure is applied by the pressure roller are heated and pressed to a predetermined height or less.

【0011】請求項4記載の発明では、プラスチックフ
ィルム基板はヌープ硬度が200以上の平滑板に挟圧さ
れて加熱圧接される。ここで、基板表面の突起の高さを
所定以下にするにはヌープ硬度が200以上の表面が必
要である。したがって、その平滑板に挟圧されて加熱圧
接された基板表面の突起は確実に所定高さ以下にされ
る。
According to the fourth aspect of the present invention, the plastic film substrate is sandwiched between the smooth plates having a Knoop hardness of 200 or more and heated and pressure-welded. Here, a surface having a Knoop hardness of 200 or more is required in order to make the height of the protrusions on the surface of the substrate below a predetermined value. Therefore, the protrusions on the surface of the substrate, which are sandwiched by the smooth plate and heated and brought into pressure contact with each other, are surely made to have a predetermined height or less.

【0012】請求項5記載の発明では、プラスチックフ
ィルム基板はヌープ硬度が200以上の加圧ローラに挟
圧されて加熱圧接される。ここで、基板表面の突起の高
さを所定以下にするにはヌープ硬度が200以上の表面
が必要である。したがって、その加圧ローラに挟圧され
て加熱圧接された基板表面の突起は確実に所定高さ以下
にされる。
According to the fifth aspect of the invention, the plastic film substrate is nipped by a pressure roller having a Knoop hardness of 200 or more and heated and pressure-contacted. Here, a surface having a Knoop hardness of 200 or more is required in order to make the height of the protrusions on the surface of the substrate below a predetermined value. Therefore, the protrusions on the surface of the substrate, which are sandwiched by the pressure roller and heated and brought into pressure contact with each other, are surely made to have a predetermined height or less.

【0013】請求項6記載の発明では、プラスチックフ
ィルム基板はその熱変形温度以下の温度で加熱圧接され
る。したがって、基板を薄くしたり基板表面にうねり等
を生じさせることなく、表面の突起が加熱圧接され所定
高さ以下にされる。請求項7記載の発明では、表面に透
明導電膜を形成する前に、プラスチックフィルム基板は
加熱圧接される。したがって、透明導電膜に与える影響
を考慮することなく基板を加熱圧接することができ、突
起の高さがより低くされる。また、透明導電膜は加熱さ
れないので、その物性が変化してしまうことがない。
According to the sixth aspect of the present invention, the plastic film substrate is heated and pressure-welded at a temperature not higher than its thermal deformation temperature. Therefore, the projections on the surface are heated and pressed into contact with each other to a predetermined height or less without thinning the substrate or causing undulations on the surface of the substrate. In the invention according to claim 7, before forming the transparent conductive film on the surface, the plastic film substrate is heated and pressure-welded. Therefore, the substrate can be heated and pressure-contacted without considering the influence on the transparent conductive film, and the height of the protrusion can be further reduced. Further, since the transparent conductive film is not heated, its physical properties do not change.

【0014】請求項8記載の発明では、プラスチックフ
ィルム基板は吸水処理が施された後、加熱圧接される。
したがって、基板表面の突起は変形し易くされた後、加
熱圧接されてその高さがより低くされる。請求項9記載
の発明では、プラスチックフィルム基板に透明導電膜を
形成する前にその表面が研磨されて表面の突起が所定高
さ以下にされる。したがって、研磨された基板表面に透
明導電膜を形成した後、基板を所定隙間を介して対向さ
せたとき、対向する基板を押す突起がなくなり、液晶を
封止する隙間の間隔が均一にされる。また、透明導電膜
は加熱されないので、物性が変化してしまうことがな
い。
According to the present invention, the plastic film substrate is subjected to water absorption treatment and then heated and pressure-welded.
Therefore, the protrusions on the surface of the substrate are easily deformed and then heated and pressure-welded to lower the height. In the invention according to claim 9, the surface of the transparent conductive film is polished before the transparent conductive film is formed on the plastic film substrate so that the projections on the surface have a predetermined height or less. Therefore, after the transparent conductive film is formed on the polished substrate surface, when the substrates are opposed to each other through a predetermined gap, there is no protrusion that pushes the opposing substrate, and the gaps for sealing the liquid crystal are made uniform. . Moreover, since the transparent conductive film is not heated, the physical properties do not change.

【0015】[0015]

【実施例】以下、本発明を図面に基づいて説明する。図
1は本発明に係る液晶表示素子用プラスチックフィルム
基板の表面処理方法の第1実施例を実施する際に使用す
る部材の一例を示す側面図である。なお、本実施例は請
求項1、2、4、または6のいづれかに記載の発明に対
応する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the drawings. FIG. 1 is a side view showing an example of a member used when carrying out a first embodiment of a surface treatment method for a plastic film substrate for a liquid crystal display element according to the present invention. The present embodiment corresponds to the invention described in any one of claims 1, 2, 4, and 6.

【0016】同図において、11はプラスチックフィルム
基板であり、プラスチックフィルム基板11(以下、単に
基板11ともいう)は厚さが160μmのプラスチックフ
ィルムを大きさを300mm□に切り出したものであ
り、その表面には透明導電膜が所定のパターンで形成さ
れている。この基板11は、厚さが5mm、表面粗度が約
30nm、大きさが350mm□の平滑な表面を備えた
一対のガラス板12(平滑板)に挟まれ、そのガラス板12
上に30kgのおもり13を載せた厚さ5mm、大きさ3
50mm□のステンレス板14を載置されて加圧された状
態でプラスチックフィルムの熱変形温度以下の温度であ
る120℃に保持している図示していないオーブン内で
10分間加熱される。なお、このオーブンの加熱温度と
しては熱変形温度以上にしてしまうと基板11が薄くなっ
たり、表面にうねり等の変形が生じるため熱変形温度以
下にする必要があり、またおもり13が加える圧力として
は基板11表面に形成されている透明導電膜にクラックが
生じない程度の圧力にしておく必要がある。
In the figure, reference numeral 11 denotes a plastic film substrate, and the plastic film substrate 11 (hereinafter, also simply referred to as substrate 11) is a plastic film having a thickness of 160 μm cut out into a size of 300 mm □. A transparent conductive film is formed on the surface in a predetermined pattern. This substrate 11 is sandwiched between a pair of glass plates 12 (smooth plates) having a smooth surface with a thickness of 5 mm, a surface roughness of about 30 nm, and a size of 350 mm □.
5mm thick and size 3 with a 30kg weight 13 on top
A 50 mm square stainless steel plate 14 is placed and heated in an oven (not shown) maintained at 120 ° C., which is a temperature not higher than the heat distortion temperature of the plastic film, for 10 minutes while being pressed. As the heating temperature of the oven, if the temperature is higher than the heat deformation temperature, the substrate 11 becomes thin, or deformation such as waviness occurs on the surface, so it is necessary to set the temperature below the heat deformation temperature, and as a pressure applied by the weight 13. Needs to be kept at a pressure that does not cause cracks in the transparent conductive film formed on the surface of the substrate 11.

【0017】基板11は、公知の方法により作製されるT
Nタイプの反射型液晶表示素子の基板として用いられ、
詳しい説明は省略するが、同様に形成された基板に所定
の隙間を介して前記透明導電膜が対向するようシール剤
により貼合わされ、透明導電膜に駆動電圧を印加するこ
とによって駆動する液晶がその隙間に注入・封止され前
記液晶表示素子を構成する。
The substrate 11 is made of T by a known method.
Used as a substrate for N-type reflective liquid crystal display elements,
Although detailed description is omitted, a liquid crystal driven by applying a drive voltage to the transparent conductive film is attached to the substrate formed in the same manner with a sealant so that the transparent conductive film faces each other through a predetermined gap. It is injected and sealed in the gap to form the liquid crystal display element.

【0018】ここで、液晶表示素子は、目視で評価する
と正常な箇所とは色の異なる目視欠点(色ムラ)が発生
することがあるため、前記透明導電膜を形成した表面に
複数の微細な突起のある未処理の基板11を用いて作製す
ると、同様に複数箇所で目視欠点が認められその液晶表
示素子を分解して目視欠点発生箇所と他の箇所に対応す
る表面の突起の高さを触針式段差計で測定したところ、
突起の高さは約0.5〜15μmであり目視欠点の発生
した箇所の突起の高さは2.5μm以上であることか
ら、突起の高さを2.5μm未満とすれば目視欠点の発
生をなくすことができることが判った。
Here, in the liquid crystal display element, when visually evaluated, visual defects (color unevenness) having a color different from that of a normal portion may occur. Therefore, a plurality of minute fine lines are formed on the surface on which the transparent conductive film is formed. When the unprocessed substrate 11 having protrusions is used for the production, similarly, visual defects are recognized at a plurality of locations, and the liquid crystal display element is disassembled to determine the height of the protrusions on the surface corresponding to the visual defect occurrence location and other locations. When measured with a stylus type step meter,
Since the height of the protrusion is about 0.5 to 15 μm and the height of the protrusion at the place where the visual defect occurs is 2.5 μm or more, the visual defect occurs if the height of the protrusion is less than 2.5 μm. It turns out that you can get rid of.

【0019】次に、作業手順とともに作用を説明する。
まず、表面に透明導電膜が形成された基板11を準備し
て、その基板11をガラス板12に挟み込み、そのガラス板
12の上にステンレス板14およびおもり13を載置して加圧
した状態のまま温度が120℃の前記オーブン内に入れ
て10分間放置した後、取り出す。
Next, the operation will be described together with the work procedure.
First, a substrate 11 having a transparent conductive film formed on its surface is prepared, the substrate 11 is sandwiched between glass plates 12, and the glass plate
A stainless steel plate 14 and a weight 13 are placed on 12 and placed in the oven at a temperature of 120 ° C. in a pressurized state, left for 10 minutes, and then taken out.

【0020】このとき、前記オーブン内でプラスチック
フィルムの熱変形温度以下の温度である120℃に加熱
されるとともに、基板11にはガラス板12、おもり13、お
よびステンレス板14の重さが加えられてガラス板12によ
り挟圧され、ガラス板12の表面が圧接される。このガラ
ス板12の表面は平滑であるため、基板11の突起以外の表
面に圧力を加えることなく突起が圧接される。
At this time, the glass substrate 12, the weight 13, and the stainless steel plate 14 are added to the substrate 11 while being heated to 120 ° C. which is lower than the heat distortion temperature of the plastic film in the oven. And is pressed by the glass plate 12, and the surface of the glass plate 12 is pressed. Since the surface of the glass plate 12 is smooth, the projections are pressed against the surfaces of the substrate 11 other than the projections without applying pressure.

【0021】そして、この表面処理を施す前に基板11表
面の突起の高さを前記触針式段差計で測定しておき、基
板11の突起を加熱圧接した後、取り出して再度突起の高
さを測定したところ、処理前には高さが12μmであっ
た突起が2μmに減少していた。また、基板11は突起以
外の箇所は圧接されていないとともに加熱温度もプラス
チックフィルムの熱変形温度以下の温度のため、厚さが
薄くなったり、その表面にうねり等発生の発生も認めら
れず、突起以外の箇所の表面性に差は認められなかっ
た。さらに、この表面処理後の基板11を用いて前記液晶
表示素子を作製したところ、液晶を封止した隙間を介し
て対向する基板11を押す突起もなく、その隙間の間隔は
均一にされて、目視欠点は認められなかった。
Before performing this surface treatment, the height of the protrusions on the surface of the substrate 11 is measured with the stylus type step gauge, the protrusions of the substrate 11 are heated and pressed, and then taken out and the height of the protrusions is again measured. Was measured, the number of protrusions, which had a height of 12 μm before the treatment, was reduced to 2 μm. In addition, the substrate 11 is not pressure-welded at portions other than the protrusions and the heating temperature is the temperature not higher than the thermal deformation temperature of the plastic film, so that the thickness becomes thin, and the occurrence of undulations on its surface is not recognized, No difference was observed in the surface properties other than the protrusions. Furthermore, when the liquid crystal display element is manufactured using the substrate 11 after the surface treatment, there is no protrusion that pushes the opposing substrate 11 through the gap in which the liquid crystal is sealed, and the gap is made uniform. No visual defects were observed.

【0022】また、基板11を挟むガラス板12に代えて、
厚さが2mm、大きさが350mm□の平滑な表面を備
えた一対のアルミニウム板(図示していない)に挟み込
み、そのアルミニウム板上にステンレス板14およびおも
り13を載置して、同様に加圧した状態のまま温度が12
0℃の前記オーブン内に入れて10分間放置した後、取
り出して前記液晶表示素子を作製したところ、突起が原
因による目視欠点が認められた。そのため、前記アルミ
ニウム板のヌープ硬度は約50であるため、ヌープ硬度
が約200の厚さが2mmの軟鋼材を用いて同様な試験
を行なったところ、目視欠点が認められなかった。この
ことから、基板11表面の突起を変形させ所定高さ以下に
する効果を得るためには、挟圧する材料としてヌープ硬
度が200程度以上の表面が必要であることが判り、ガ
ラス板12のヌープ硬度は約500であるため十分であ
る。
Further, instead of the glass plates 12 sandwiching the substrate 11,
It is sandwiched between a pair of aluminum plates (not shown) having a smooth surface with a thickness of 2 mm and a size of 350 mm □, and the stainless plate 14 and the weight 13 are placed on the aluminum plate and similarly applied. The temperature remains 12 when pressed.
When the liquid crystal display element was manufactured by putting it in the oven at 0 ° C. for 10 minutes and then taking it out, a visual defect due to the protrusion was observed. Therefore, since the Knoop hardness of the aluminum plate is about 50, when a similar test was performed using a mild steel material having a Knoop hardness of about 200 and a thickness of 2 mm, no visual defect was observed. From this, it can be seen that in order to obtain the effect of deforming the protrusions on the surface of the substrate 11 to be less than the predetermined height, a surface having a Knoop hardness of about 200 or more is required as a material for pressing, and the Knoop of the glass plate 12 is required. A hardness of about 500 is sufficient.

【0023】このように本実施例によれば、基板11を挟
んで加熱圧接するガラス板12のヌープ硬度は200以上
であるため、基板11表面の突起を確実に所定高さ以下に
することができる。また、そのガラス板12は平滑な平面
を備えているため、突起以外の余分な箇所の基板11表面
に圧力を加えることがなく、基板11の突起以外の表面を
変形させることがない。さらに、加熱温度はプラスチッ
クフィルムの熱変形温度以下としているため、基板11が
薄くなったり、うねりが生じることがない。
As described above, according to this embodiment, since the Knoop hardness of the glass plate 12 that is heated and pressed against the substrate 11 is 200 or more, the protrusions on the surface of the substrate 11 can be surely set to a predetermined height or less. it can. Further, since the glass plate 12 has a smooth flat surface, no pressure is applied to the surface of the substrate 11 in the extra portions other than the protrusions, and the surface of the substrate 11 other than the protrusions is not deformed. Furthermore, since the heating temperature is set to be equal to or lower than the heat deformation temperature of the plastic film, the substrate 11 does not become thin and undulate.

【0024】そして、この基板11を用いて前記液晶表示
素子を作製する際、基板11表面の突起は所定高さ以下に
されているので、液晶を注入し封止する隙間の間隔を均
一にすることができ、目視欠点が発生することがない。
なお、本実施例では、おもり13を載せることによって基
板11を圧接しているが、おもり13に限らず空気等の気体
の圧力を利用して圧力を加えるエアバック等を用いても
よい。また、ガラス板12を用いて基板11を挟圧している
が、ヌープ硬度が200程度以上で異物が付着しないも
のを用いればよいことはいうまでもない。
When the liquid crystal display element is manufactured using this substrate 11, since the protrusions on the surface of the substrate 11 are set to a predetermined height or less, the gaps for injecting and sealing the liquid crystal are made uniform. Therefore, visual defects do not occur.
In this embodiment, the substrate 11 is pressure-contacted by placing the weight 13, but not limited to the weight 13, an air bag or the like that applies pressure using the pressure of gas such as air may be used. Further, although the glass plate 12 is used to clamp the substrate 11, it is needless to say that it is possible to use a glass plate having a Knoop hardness of about 200 or more and no foreign matter adheres thereto.

【0025】また、本実施例の第1の他の態様として
は、表面に透明導電膜を形成する前の基板11を準備し
て、その基板11をガラス板12に挟み込み、そのガラス板
12上にステンレス板14およびおもり13を載置して、同様
に加圧した状態のまま温度が120℃の前記オーブン内
に入れて10分間放置した後、取り出して基板11の片側
表面に透明導電膜を公知のスパッタリング法により形成
する。この態様では、透明導電膜を形成する前の基板11
表面の突起が所定高さ以下にされ、その後、基板11表面
に透明導電膜が形成される。したがって、透明導電膜を
加熱および圧接することなく基板11の突起が所定高さ以
下にされる。そのため、透明導電膜を考慮することなく
基板11を加熱圧接することができ、基板11表面の突起を
より低くすることもできる。また、透明導電膜の物性
(例えば、光透過率、導電率、およびエッチング性等)
を変化させることがない。そして、この基板11を用いて
前記液晶表示素子を作製したところ、目視欠点は認めら
れなかった。なお、この他の態様は請求項1、2、4、
6、または7のいづれかに記載の発明に対応する。
As a first other mode of the present embodiment, a substrate 11 before forming a transparent conductive film on the surface is prepared, the substrate 11 is sandwiched between glass plates 12, and the glass plate
Place the stainless steel plate 14 and the weight 13 on 12 and put them in the oven at a temperature of 120 ° C. in the same pressurized state for 10 minutes and then take them out and transparent conductive material on one surface of the substrate 11. The film is formed by a known sputtering method. In this embodiment, the substrate 11 before the transparent conductive film is formed
The protrusions on the surface are made to have a predetermined height or less, and then a transparent conductive film is formed on the surface of the substrate 11. Therefore, the protrusions of the substrate 11 are set to a predetermined height or less without heating and pressing the transparent conductive film. Therefore, the substrate 11 can be heated and pressure-contacted without considering the transparent conductive film, and the protrusion on the surface of the substrate 11 can be further lowered. In addition, the physical properties of the transparent conductive film (for example, light transmittance, conductivity, and etching property)
Does not change. Then, when the liquid crystal display element was manufactured using this substrate 11, no visual defect was observed. It should be noted that the other aspects are defined in claims 1, 2, 4,
It corresponds to the invention described in either 6 or 7.

【0026】また、本実施例の第2の他の態様として
は、基板11を加熱圧接する前に、基板11を温度25℃、
湿度90%に保持した恒温高湿槽内に30分間放置する
吸水処理を施した後、その基板11をガラス板12に挟み、
そのガラス板12上にステンレス板14およびおもり13を載
置して、同様に加圧した状態のまま温度が120℃の前
記オーブン内に入れて10分間放置する。この態様で
は、基板11を吸水処理することにより変形し易くするこ
とができ、基板11表面の突起は吸水処理により変形し易
くされ、加熱圧接によって高さがより低くされる。そし
て、この表面処理を施す前に基板11表面の突起の高さを
前記触針式段差計で測定しておき、基板11を吸水処理を
施して加熱圧接した後、取り出して再度突起の高さを測
定したところ、処理前には高さが12μmであった突起
が1.5μmに減少していた。なお、この他の態様は請
求項1、2、4、6、または8のいづれかに記載の発明
に対応する。
As a second other mode of this embodiment, the temperature of the substrate 11 is set to 25 ° C. before the substrate 11 is heated and pressed.
After performing a water absorption treatment of leaving it for 30 minutes in a constant temperature and high humidity tank maintained at a humidity of 90%, the substrate 11 is sandwiched between glass plates 12,
A stainless steel plate 14 and a weight 13 are placed on the glass plate 12, and the glass plate 12 is placed in the oven at a temperature of 120 ° C. and left for 10 minutes in the same pressurized state. In this mode, the substrate 11 can be easily deformed by absorbing water, and the projections on the surface of the substrate 11 can be easily deformed by absorbing water, and the height thereof can be lowered by heating and pressure contact. Then, before performing this surface treatment, the height of the protrusions on the surface of the substrate 11 is measured with the stylus type step gauge, and after the substrate 11 is subjected to water absorption treatment and heated and pressure-contacted, it is taken out and the height of the protrusions is again measured. Was measured, the number of protrusions having a height of 12 μm before the treatment was reduced to 1.5 μm. It should be noted that this other aspect corresponds to the invention described in any one of claims 1, 2, 4, 6, or 8.

【0027】さらに、本実施例の第3の他の態様として
は、表面に透明導電膜を形成する前の基板11を準備し
て、液晶表示素子用ガラス基板の表面研磨に用いられる
研磨機(図示していないが、例えば、スピードファム製
ポリッシングマシン SP−800)で研磨した後、
基板11を洗浄して乾燥した後、研磨面に透明導電膜を公
知のスパッタリング法により形成する。この態様では、
透明導電膜を形成する前の基板11表面の突起が研磨によ
り所定高さ以下にされ、その後、基板11表面に透明導電
膜が形成される。したがって、透明導電膜を加熱および
圧接することなく基板11の突起が所定高さ以下にされ
る。そのため、透明導電膜の物性を変化させることがな
い。そして、研磨前後の基板11表面の突起を前記触針式
段差計で測定したところ、研磨前には高さが約10μm
であった突起が約1μmに減少していた。また、研磨後
の基板11を洗浄・乾燥した後、研磨面に透明導電膜を公
知のスパッタリング法により形成して前記液晶表示素子
を作製したところ、対向する基板11を押す突起はなく、
液晶を注入・封止する隙間の間隔を均一にすることがで
き、目視欠点は認められなかった。なお、この他の態様
は請求項9記載の発明に対応する。
Further, as a third other mode of this embodiment, a polishing machine used for polishing the surface of a glass substrate for a liquid crystal display device by preparing a substrate 11 before forming a transparent conductive film on the surface thereof ( Although not shown, for example, after polishing with a Speed Fam polishing machine SP-800),
After the substrate 11 is washed and dried, a transparent conductive film is formed on the polished surface by a known sputtering method. In this aspect,
The protrusions on the surface of the substrate 11 before forming the transparent conductive film are polished to a predetermined height or less, and then the transparent conductive film is formed on the surface of the substrate 11. Therefore, the protrusions of the substrate 11 are set to a predetermined height or less without heating and pressing the transparent conductive film. Therefore, the physical properties of the transparent conductive film are not changed. Then, the protrusion on the surface of the substrate 11 before and after polishing was measured by the stylus type step gauge, and the height was about 10 μm before polishing.
The number of protrusions was about 1 μm. Further, after cleaning and drying the substrate 11 after polishing, a transparent conductive film was formed on the polishing surface by a known sputtering method to produce the liquid crystal display element, and there was no protrusion that pushes the opposing substrate 11,
It was possible to make the gaps for injecting and sealing the liquid crystal uniform, and no visual defects were observed. The other aspect corresponds to the invention of claim 9.

【0028】次に、図2は本発明に係る液晶表示素子用
プラスチックフィルム基板の表面処理方法の第2実施例
を実施する際に使用する装置の一例の概略全体構成を示
す側面図である。なお、本実施例は請求項1、3、5、
または6のいづれかに記載の発明に対応する。同図にお
いて、21はプラスチックフィルム基板であり、プラスチ
ックフィルム基板21(以下、単に基板21ともいう)は表
面に前記透明導電膜を形成され基板ロール22にロール状
に巻かれた厚さが160μm、幅330mmのプラスチ
ックフィルムであり、この基板21は基板ロール22から引
き出されオーブン23内を通過した後、基板巻取ローラ24
に巻き取られる。この基板21は、基板ロール22に巻かれ
たままの状態ではその表面に前記液晶表示素子を作製す
ると目視欠陥となる複数の突起がある。
Next, FIG. 2 is a side view showing a schematic overall construction of an example of an apparatus used for carrying out the second embodiment of the surface treatment method for a plastic film substrate for a liquid crystal display element according to the present invention. In this embodiment, the claims 1, 3, 5,
Alternatively, it corresponds to the invention described in any one of 6. In the figure, reference numeral 21 denotes a plastic film substrate, and the plastic film substrate 21 (hereinafter, also simply referred to as the substrate 21) has the transparent conductive film formed on the surface thereof, and has a thickness of 160 μm wound in a roll shape on a substrate roll 22, The substrate 21 is a plastic film having a width of 330 mm. The substrate 21 is pulled out from the substrate roll 22 and passes through the oven 23, and then the substrate take-up roller 24
To be wound up. The substrate 21 has a plurality of protrusions on the surface of the substrate 21 in a state that the substrate 21 is still wound on the substrate roll 22, which become visual defects when the liquid crystal display element is manufactured.

【0029】この基板21は、プラスチックフィルムの熱
変形温度以下の温度の120℃に保持されているオーブ
ン23内に開口部23aから入って複数の搬送ローラ25上を
搬送速度を1mm/分で案内されるとともに、その搬送
ローラ25の間に配設された平滑な表面を有する一対のセ
ラミックス製の加圧ローラ26(ヌープ硬度=約200
0)に表面の前記透明導電膜にクラックが生じない程度
の圧力で挟圧されて開口部23bから搬出される。
The substrate 21 enters the oven 23, which is maintained at 120 ° C., which is lower than the heat distortion temperature of the plastic film, through the opening 23a and guides it on the plurality of transport rollers 25 at a transport speed of 1 mm / min. And a pair of ceramic pressure rollers 26 (Knoop hardness = about 200) which are arranged between the transport rollers 25 and have a smooth surface.
In (0), the transparent conductive film on the surface is pinched with a pressure that does not cause cracks and is carried out from the opening 23b.

【0030】次に、作業手順とともに作用を説明する。
まず、表面に透明導電膜が形成されたプラスチックフィ
ルムをロール状に巻かれた基板ロール22を準備して、そ
の基板ロール22から基板21を引き出してオーブン23内の
搬送ローラ25に案内させるとともに加圧ローラ26の間を
通して基板巻取ローラ24に係合させる。次いで、その基
板21をオーブン23により120℃に加熱するとともに加
圧ローラ26により挟圧しつつ1mm/分の速度で搬送
し、基板ロール22から順次引き出してオーブン23内を通
過させて基板巻取ローラ24に巻き取る。
Next, the operation will be described together with the work procedure.
First, a substrate roll 22 in which a plastic film having a transparent conductive film formed on the surface thereof is wound in a roll shape is prepared, and the substrate 21 is pulled out from the substrate roll 22 and guided to a conveyance roller 25 in an oven 23 and applied. The substrate take-up roller 24 is engaged with the pressure roller 26 between the pressure roller 26 and the pressure roller 26. Next, the substrate 21 is heated to 120 ° C. in the oven 23, conveyed while being pinched by the pressure roller 26 at a speed of 1 mm / min, sequentially drawn out from the substrate roll 22 and passed through the oven 23 to take up the substrate winding roller. Take up to 24.

【0031】このとき、基板21は加圧ローラ26が挟圧し
て圧接するとともにオーブン23内で120℃に加熱され
て、加圧ローラ26が挟圧する基板21表面の突起が加熱圧
接される。したがって、基板21表面の突起が所定高さに
される。そして、基板21を大きさ300mm□に切り出
して前記液晶表示素子を作製したところ、目視欠点は認
められなかった。
At this time, the substrate 21 is pressed and pressed by the pressure roller 26, and is heated to 120 ° C. in the oven 23, and the projection on the surface of the substrate 21 pressed by the pressure roller 26 is heated and pressed. Therefore, the protrusions on the surface of the substrate 21 are made to have a predetermined height. Then, the substrate 21 was cut into a size of 300 mm □ to manufacture the liquid crystal display element, and no visual defect was recognized.

【0032】このように本実施例によれば、基板21をオ
ーブン23内で熱変形温度以下で加熱するとともに平滑な
平面を備えヌープ硬度が200以上の加圧ローラ26で所
定圧力で挟圧して加熱圧接するので、上述実施例と同様
な作用効果が得られ、基板21表面の突起を確実に所定高
さ以下にすることができる。また、基板21に変形が生じ
ることがなく、前記透明導電膜にクラックが生じること
もない。
As described above, according to this embodiment, the substrate 21 is heated in the oven 23 at a temperature not higher than the heat deformation temperature, and is pressed at a predetermined pressure by a pressure roller 26 having a smooth flat surface and a Knoop hardness of 200 or more. Since the heating and pressing are performed, the same effects as those of the above-described embodiment can be obtained, and the protrusions on the surface of the substrate 21 can be surely made to have a predetermined height or less. Further, the substrate 21 is not deformed, and the transparent conductive film is not cracked.

【0033】さらに、この基板21は基板ロール22から引
き出して表面処理するので、切り出す前に連続的に加熱
圧接することができる。なお、本実施例では、セラミッ
クス製の加圧ローラ26を用いて基板21を挟圧している
が、セラミックス製に限らずヌープ硬度が200程度以
上で異物が付着しないものを用いればよい。但し、ステ
ンレス等の金属を用いると導電性の異物が基板21表面に
付着するおそれがあり好ましくない。また、基板21は基
板ロール22から引き出して表面処理しているが、基板21
を所定の大きさに切り出した後、オーブン23に入れて加
圧ローラ26により挟圧させてもよい。さらに、透明導電
膜を表面に形成された基板21を用いているが、透明導電
膜を形成する前の基板を準備してオーブン23内に入れて
加圧ローラ26により順次挟圧させてもよいことはいうま
でもない。
Further, since the substrate 21 is pulled out from the substrate roll 22 and subjected to the surface treatment, it can be continuously heated and pressed before being cut out. In this embodiment, the pressure roller 26 made of ceramics is used to clamp the substrate 21. However, the pressure roller 26 is not limited to ceramics, and a Knoop hardness of about 200 or more that does not allow foreign matter to adhere may be used. However, the use of metal such as stainless steel is not preferable because conductive foreign matter may adhere to the surface of the substrate 21. Although the substrate 21 is pulled out from the substrate roll 22 for surface treatment,
After being cut into a predetermined size, it may be placed in the oven 23 and pinched by the pressure roller 26. Further, although the substrate 21 on which the transparent conductive film is formed is used, a substrate before forming the transparent conductive film may be prepared, placed in the oven 23, and sequentially pressed by the pressure roller 26. Needless to say.

【0034】[0034]

【発明の効果】請求項1記載の発明によれば、プラスチ
ックフィルム基板を所定温度で加熱するとともに所定圧
力で圧接して基板表面の突起を所定高さ以下にするの
で、基板を所定隙間を介して対向させたとき、対向する
基板を押す突起をなくして液晶を封止する隙間の間隔を
均一にすることができ、液晶表示素子の目視欠点をなく
すことができる。
According to the first aspect of the present invention, since the plastic film substrate is heated at a predetermined temperature and pressed at a predetermined pressure so that the protrusions on the surface of the substrate have a height not more than a predetermined height, the substrate is placed through a predetermined gap. When facing each other, it is possible to eliminate the protrusion that pushes the facing substrate and make the gap of the liquid crystal sealing uniform, thereby eliminating the visual defect of the liquid crystal display element.

【0035】請求項2記載の発明によれば、プラスチッ
クフィルム基板を所定硬度の平滑な表面を備えた一対の
平滑板に挟み所定圧力で挟圧するので、突起以外の箇所
の基板表面に影響を与えることなく、平滑板が挟圧する
圧力を突起に加えて加熱圧接することができ、その突起
のみを変形させ所定高さ以下にすることができる。請求
項3記載の発明によれば、プラスチックフィルム基板を
平滑な表面を備えた一対の加圧ローラの間を通過させそ
の加圧ローラが所定圧力で挟圧するので、加圧ローラが
挟圧する箇所の基板表面の突起を加熱圧接して所定高さ
以下にすることができる。また、加圧ローラは通過する
箇所の基板を挟圧するので、ロール状に巻かれたプラス
チックフィルムを順次巻き出して加圧ロール間を通過さ
せることができ、ロール状に巻かれたプラスチックフィ
ルムを切り出すことなく表面処理することができる。
According to the second aspect of the present invention, since the plastic film substrate is sandwiched between a pair of smooth plates having a smooth surface having a predetermined hardness and is clamped with a predetermined pressure, the surface of the substrate other than the protrusion is affected. It is possible to apply the pressure that the smooth plate presses to the protrusions without heating, and to heat and pressure the protrusions, and only the protrusions can be deformed to a predetermined height or less. According to the third aspect of the present invention, the plastic film substrate is passed between the pair of pressure rollers having a smooth surface, and the pressure rollers squeeze at a predetermined pressure. The protrusions on the surface of the substrate can be heated and pressed to have a height not higher than a predetermined height. Further, since the pressure roller pinches the substrate at the passing position, the rolled plastic film can be sequentially unwound to pass between the pressure rolls, and the rolled plastic film can be cut out. Can be surface treated without.

【0036】請求項4記載の発明によれば、プラスチッ
クフィルム基板をヌープ硬度が200以上の平滑板が挟
圧して加熱圧接するので、基板表面の突起を確実に所定
高さ以下にすることができる。請求項5記載の発明によ
れば、プラスチックフィルム基板をヌープ硬度が200
以上の加圧ローラが挟圧して加熱圧接するので、基板表
面の突起を確実に所定高さ以下にすることができる。
According to the invention as set forth in claim 4, since the smoothing plate having a Knoop hardness of 200 or more is pressed against the plastic film substrate for heating and pressure contact, the protrusions on the surface of the substrate can be reliably made to have a predetermined height or less. . According to the invention of claim 5, the plastic film substrate has a Knoop hardness of 200.
Since the above-mentioned pressure rollers squeeze and heat-contact each other, the protrusions on the surface of the substrate can be reliably made to have a predetermined height or less.

【0037】請求項6記載の発明によれば、プラスチッ
クフィルム基板をその熱変形温度以下の温度で加熱圧接
するので、基板を薄くしたり基板表面にうねり等を生じ
させることなく、表面の突起を加熱圧接して所定高さ以
下にすることができる。請求項7記載の発明によれば、
表面に透明導電膜を形成する前に、プラスチックフィル
ム基板を加熱圧接するので、透明導電膜に与える影響を
考慮することなく基板を加熱圧接することができ、突起
の高さをより低くすることができる。また、透明導電膜
は加熱されないので、その物性が変化してしまうことが
ない。
According to the sixth aspect of the present invention, the plastic film substrate is heated and pressure-bonded at a temperature not higher than its heat deformation temperature, so that the protrusions on the surface can be formed without thinning the substrate or generating undulations on the substrate surface. It can be heated and pressed to a predetermined height or less. According to the invention of claim 7,
Since the plastic film substrate is heat-pressed before forming the transparent conductive film on the surface, the substrate can be heat-pressed without considering the influence on the transparent conductive film, and the height of the protrusion can be made lower. it can. Further, since the transparent conductive film is not heated, its physical properties do not change.

【0038】請求項8記載の発明によれば、プラスチッ
クフィルム基板を吸水処理した後、加熱圧接するので、
基板表面の突起を変形し易くすることができ、その高さ
をより低くすることができる。請求項9記載の発明によ
れば、プラスチックフィルム基板に透明導電膜を形成す
る前にその表面を研磨して表面の突起を所定高さ以下に
するので、研磨した基板表面に透明導電膜を形成した
後、基板を所定隙間を介して対向させたとき、対向する
基板を押す突起がなくなり、液晶を封止する隙間の間隔
を均一にすることができ、液晶表示素子の目視欠点をな
くすことができる。また、透明導電膜は加熱されないの
で、その物性が変化してしまうことがない。
According to the invention described in claim 8, since the plastic film substrate is subjected to water absorption treatment and then heated and pressure-contacted,
The protrusions on the surface of the substrate can be easily deformed, and the height can be further reduced. According to the invention of claim 9, before the transparent conductive film is formed on the plastic film substrate, the surface thereof is polished so that the projections on the surface have a predetermined height or less, so that the transparent conductive film is formed on the polished substrate surface. After that, when the substrates are made to face each other with a predetermined gap, there is no protrusion that pushes the opposite substrate, the gaps for sealing the liquid crystal can be made uniform, and visual defects of the liquid crystal display element can be eliminated. it can. Further, since the transparent conductive film is not heated, its physical properties do not change.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る液晶表示素子用プラスチックフィ
ルム基板の表面処理方法の第1実施例を実施する際に使
用する部材の一例を示す側面図である。
FIG. 1 is a side view showing an example of a member used for carrying out a first embodiment of a surface treatment method for a plastic film substrate for a liquid crystal display element according to the present invention.

【図2】本発明に係る液晶表示素子用プラスチックフィ
ルム基板の表面処理方法の第2実施例を実施する際に使
用する装置の一例の概略全体構成を示す側面図である。
FIG. 2 is a side view showing a schematic overall configuration of an example of an apparatus used for carrying out a second embodiment of the surface treatment method for a plastic film substrate for a liquid crystal display element according to the present invention.

【符号の説明】[Explanation of symbols]

11、21 プラスチックフィルム基板 12 ガラス板(平滑板) 23 オーブン 26 加圧ローラ 11, 21 Plastic film substrate 12 Glass plate (smooth plate) 23 Oven 26 Pressure roller

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】表面に透明導電膜を形成し、該透明導電膜
を所定隙間を介して対向させて該隙間に液晶を封止する
液晶表示素子のプラスチックフィルム基板の表面を処理
する液晶表示素子用プラスチックフィルム基板の表面処
理方法であって、 前記プラスチックフィルム基板を、所定温度で加熱する
とともに所定圧力で圧接し、該基板の表面の突起を加熱
圧接して該突起を所定高さ以下にすることを特徴とする
液晶表示素子用プラスチックフィルム基板の表面処理方
法。
1. A liquid crystal display device for treating the surface of a plastic film substrate of a liquid crystal display device, wherein a transparent conductive film is formed on a surface of the liquid crystal display device, and the transparent conductive film is opposed to the surface of the plastic film substrate through a predetermined gap. A method for surface treatment of a plastic film substrate for use in heating, wherein the plastic film substrate is heated at a predetermined temperature and pressed at a predetermined pressure, and a protrusion on the surface of the substrate is heated and pressure-contacted so that the protrusion has a predetermined height or less. A method for surface treatment of a plastic film substrate for a liquid crystal display device, which is characterized by the above.
【請求項2】前記プラスチックフィルム基板を、所定硬
度の平滑な表面を備えた一対の平滑板で挟み、該基板を
所定圧力で挟圧することを特徴とする請求項1記載の液
晶表示素子用プラスチックフィルム基板の表面処理方
法。
2. The plastic for a liquid crystal display device according to claim 1, wherein the plastic film substrate is sandwiched between a pair of smooth plates having a smooth surface having a predetermined hardness, and the substrate is clamped at a predetermined pressure. Surface treatment method for film substrate.
【請求項3】前記プラスチックフィルム基板を、平滑な
表面を備えた一対の加圧ローラの間を通過させ、該基板
を所定圧力で挟圧することを特徴とする請求項1記載の
液晶表示素子用プラスチックフィルム基板の表面処理方
法。
3. The liquid crystal display device according to claim 1, wherein the plastic film substrate is passed between a pair of pressure rollers having a smooth surface, and the substrate is clamped at a predetermined pressure. Surface treatment method for plastic film substrates.
【請求項4】ヌープ硬度が200以上の前記平滑板を用
いることを特徴とする請求項2記載の液晶表示素子用プ
ラスチックフィルム基板の表面処理方法。
4. The surface treatment method for a plastic film substrate for a liquid crystal display element according to claim 2, wherein the smooth plate having a Knoop hardness of 200 or more is used.
【請求項5】ヌープ硬度が200以上の前記加圧ローラ
を用いることを特徴とする請求項3記載の液晶表示素子
用プラスチックフィルム基板の表面処理方法。
5. The method for surface treatment of a plastic film substrate for a liquid crystal display device according to claim 3, wherein the pressure roller having a Knoop hardness of 200 or more is used.
【請求項6】前記プラスチックフィルム基板を、該基板
の熱変形温度以下で加熱することを特徴とする請求項1
記載の液晶表示素子用プラスチックフィルム基板の表面
処理方法。
6. The plastic film substrate is heated at a temperature equal to or lower than the thermal deformation temperature of the substrate.
A method for treating the surface of a plastic film substrate for a liquid crystal display element as described above.
【請求項7】表面に前記透明導電膜を形成する前に、前
記プラスチックフィルム基板を加熱圧接することを特徴
とする請求項1記載の液晶表示素子用プラスチックフィ
ルム基板の表面処理方法。
7. The surface treatment method for a plastic film substrate for a liquid crystal display device according to claim 1, wherein the plastic film substrate is heated and pressed before the transparent conductive film is formed on the surface.
【請求項8】前記プラスチックフィルム基板を、吸水処
理を施した後、加熱圧接することを特徴とする請求項1
記載の液晶表示素子用プラスチックフィルム基板の表面
処理方法。
8. The plastic film substrate is subjected to water absorption treatment and then heated and pressure-bonded.
A method for treating the surface of a plastic film substrate for a liquid crystal display element as described above.
【請求項9】表面に透明導電膜を形成し、該透明導電膜
を所定隙間を介して対向させて該隙間に液晶を封止する
液晶表示素子のプラスチックフィルム基板の表面を処理
する液晶表示素子用プラスチックフィルム基板の表面処
理方法であって、 前記プラスチックフィルム基板に、透明導電膜を形成す
る前に、該基板の表面を研磨して該表面の突起を所定高
さ以下にすることを特徴とする液晶表示素子用のプラス
チックフィルム基板の表面処理方法。
9. A liquid crystal display element for treating the surface of a plastic film substrate of a liquid crystal display element, wherein a transparent conductive film is formed on the surface, the transparent conductive film is opposed via a predetermined gap, and liquid crystal is sealed in the gap. A method of treating a surface of a plastic film substrate for use, comprising: polishing the surface of the substrate to form a protrusion on the surface to a predetermined height or less before forming a transparent conductive film on the plastic film substrate. Method for surface treatment of plastic film substrate for liquid crystal display device.
JP33466593A 1993-12-28 1993-12-28 Surface treatment of plastic film substrate for liquid crystal display element Pending JPH07199164A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33466593A JPH07199164A (en) 1993-12-28 1993-12-28 Surface treatment of plastic film substrate for liquid crystal display element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33466593A JPH07199164A (en) 1993-12-28 1993-12-28 Surface treatment of plastic film substrate for liquid crystal display element

Publications (1)

Publication Number Publication Date
JPH07199164A true JPH07199164A (en) 1995-08-04

Family

ID=18279895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33466593A Pending JPH07199164A (en) 1993-12-28 1993-12-28 Surface treatment of plastic film substrate for liquid crystal display element

Country Status (1)

Country Link
JP (1) JPH07199164A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8941011B2 (en) 2011-08-16 2015-01-27 Samsung Display Co., Ltd. Flexible substrates and method of manufacturing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8941011B2 (en) 2011-08-16 2015-01-27 Samsung Display Co., Ltd. Flexible substrates and method of manufacturing the same
US9480165B2 (en) 2011-08-16 2016-10-25 Samsung Display Co., Ltd. Flexible substrates and method of manufacturing the same

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