JPH0719055B2 - Non-silver image forming material - Google Patents

Description

Description: TECHNICAL FIELD The present invention relates to a non-silver salt image forming material, and more specifically to a relief type non-silver salt photosensitive material relief type contact reversal lith film used in a photomechanical process. Regarding

(Prior art and its problems) Conventionally, a contact reversal lith film made of a silver halide light-sensitive material has been used in the photolithography process.
Various non-silver salt photosensitive material contact reversal lith films have been proposed in response to demands such as simple development processing and cost reduction.

For example, in JP-A-52-89916, a mask layer in which carbon black is dispersed in a film-forming and solvent-soluble polymer substance is provided on a transparent film support, and a photoresist layer is further provided thereon. Is disclosed, wherein the image forming material is a transparent film support obtained by contact-exposure and then developing or developing / etching to leave an exposed portion and to elute an unexposed portion. It is said that a relief type reversal image composed of a photoresist layer and a mask layer can be formed thereon and used as a contact reversal lith film in a photomechanical process.

By the way, in the photo collection process in the photo engraving process, the characters, illustrations, photos, etc. of the manuscript will be "overlaid characters", "white blank characters", "thickened characters",
A single film is finished using techniques such as "cutout composition of photos" and "hair-cutting". For example, in the "hair-cutting" technique, several different types of photos, photographs and characters, etc. It is necessary to synthesize it so that it does not overlap or whiten out, and the permissible width is within 1 hair, that is, 0.1 m
It is within m. That is, when the negative film of the photograph A and the negative film of the photograph B are multi-printed on one film, the overlap or blank of the mask film of the negative film of the photograph A and the mask film of the negative film of the photograph B is 0.1 mm. When the mask film of the negative film of the photograph B is a reversal mask film by the photographic processing method of the mask film of the negative film of the photograph A,
The image forming material for making the reversal mask film must have a misregistration of 0.1 mm or more due to reversal.

However, the relief type reversal image forming material as described above is often 0.1 mm in the reversal mask film production described above.
There is a problem that the above-mentioned misregistration occurs.

In particular, a bright-room vacuum suction contact reversal printer, which is often reversal printed in the shortest possible vacuum suction time in view of workability requirements, and is manufactured from a relief-type reversal image-forming material as described above. When the original film occupies most of the image surface and the reverse film is reverse printed onto the third reversal film, an air pocket is formed between the original film and the third reversal film. In many cases, misregistration occurred due to the occurrence of scratches or poor surface slipperiness between the two.

This is because the relief type reversal image forming material as described above is obtained by applying a polymer solution to the intermediate layer between the mask layer and the base film as described in JP-A-52-89916. It is provided only for the purpose of providing an adhesive effect between the mask layer and the base material film, and has no matteness on the surface. By developing or developing / etching, a completely smooth support surface is provided on the non-image area. It is considered that the reason is that it is only exposed, and that the surface of the base material does not have surface slipperiness and suitability for vacuum suction.

(Means for Solving the Related Art) The inventors of the present invention have made repeated studies for the purpose of solving the above problems in the relief type reversal image forming material, and as a result, provided a mat layer on one side or both sides of the support. , A mask layer and a photoresist layer on the matte layer of the matte film support having a total light transmittance of 60% or more in a wavelength range of at least 330 nm to 600 nm and a center line average roughness of 0.10 μ or more and less than 0.60 μm. The knowledge that the above problems can be solved by the sequential provision has been obtained, and the present invention has been completed.

Hereinafter, the present invention will be specifically described.

The support used in the image-forming material of the present invention is a transparent film support having excellent dimensional stability and a total light transmittance of 60% or more in a wavelength range of at least 330 nm to 600 nm, and examples thereof include polyethylene terephthalate. Examples of the plastic film include a film, a triacetate film, a polycarbonate film, a polyvinyl chloride film, a polystyrene film, a polypropylene film, and a polysulfone film. Among them, a polyethylene terephthalate film having a thickness of 50 μ to 200 μ is particularly preferable. These plastic films may be provided with an undercoat layer or may be subjected to a discharge treatment, if necessary, in order to improve adhesion with a mat layer described later.

Next, each layer laminated on the support will be sequentially described from the support side.

(1) Matt Layer The mat layer preferably has a coating film thickness of 0.1 μ to 20 μ, more preferably 0.5 μ to 5 μ, and is provided on one side or both sides of the plastic film. The films provided with a matte layer on one or both sides have a total light transmittance of 60% or more in a wavelength range of at least 330 nm to 600 nm, and a center line average roughness of 0.10 μm.
If the total light transmittance is less than 60% in the above wavelength range, two or more mask films are prepared from the image forming material of the present invention, and the mask films are overlapped to form a third reversal film. When printing on, the non-image area has poor printing light transmission, and the printing time will be longer than necessary.
In the plate-collecting operation of the above-mentioned photomechanical process, the sharpness of the reversal image is deteriorated, particularly, the suitability of "white letters" is deteriorated.

Further, when the center line average roughness is less than 0.10 μ, the object of the present invention is not achieved, as it is substantially the same as the transparent film in terms of surface slipperiness and vacuum suction suitability. Further, when the center line average roughness is 0.60 μ or more, the surface slipperiness and the vacuum suction suitability are improved, but the background fog is generated in the non-image portion of the reverse image and the sharpness of the reverse image is lowered.

The matte layer is a dispersion of a matting agent in an organic solvent solution of a binder, for example, using a ball mill, a sand grinder, an attritor, a roll mill, a high-speed impeller disperser, etc. to form a dispersion liquid, which is applied and dried on the plastic film. It may be formed.

Examples of matting agents that can be used in the matting layer of the image-forming material of the present invention include calcium carbonate, barium sulfate, silicon dioxide, and other extender pigment fine particles having a particle size of 5 μm or less, and benzoguanamine resin having a particle size of 3 μm or less. Examples thereof include true spherical particles and colorless polymer particles such as rice starch having a particle diameter of 5 μm or less. The binder that can be used in the matte layer of the image forming material of the present invention is preferably one that is insoluble or hardly swellable in the photoresist layer developing solution and the mask layer etching solution. That is, the binder having such a property is selected from the group consisting of basic substances, acidic substances, neutral salts, and water-compatible lower alcohols, alone or in a mixture of 2 or more.
Insoluble or hardly swellable in an aqueous solution of a mixture of one or more substances, and hydrocarbon type, halogenated hydrocarbon type, alcohol type, ether type, acetal type, ketone type, ester type, polyhydric alcohol and its derivative type , Fatty acids,
Phenol-based or nitrogen-based organic solvent such as hexane, toluene, xylene, carbon tetrachloride, trichloroethane, butanol, isopropanol, tetrahydrofuran, methyl ethyl ketone, ethyl acetate, methyl cellosolve, ether or a mixture of two or more thereof. Dissolvable polymer compounds, examples of which include nitrocellulose, cellulose acetate butyrate, cellulose acetate propionate, cellulose acetate, polyvinyl acetate, polyvinyl formal, polyvinyl butyral, vinyl chloride-vinyl acetate copolymer, vinyl chloride. -Vinyl acetate-vinyl alcohol copolymer, vinyl chloride-vinyl acetate-maleic acid copolymer, vinylidene chloride-vinyl chloride copolymer, vinylidene chloride-acrylonitrile copolymer, ethylene-vinyl acetate Copolymer, linear saturated polyesters, and modified ether type polyester.

These may be used alone or in combination of two or more.

A mat layer composed of the above extender pigment or colorless polymer fine particles and a polymer binder which is insoluble or hardly swellable in the photoresist layer developing solution and the mask layer etching solution is called a chemical mat layer.

(2) Mask layer The mask layer has a coating film thickness of usually 0.5 to 20 μm, preferably 1
It is ~ 10μ, more preferably, it is necessary to be as thin as possible in order to prevent side etching of the mask layer that causes thinning of the image line in the reversing operation, and the printing image density required for the reversing operation, for example, near. If the UV concentration and the ortho concentration are at least 2.5 or more, it is 2 to 5 μ. The mask layer is a dispersion of a black pigment in a solution of a film-forming binder soluble in water or an organic solvent, using a suitable dispersing means, for example, a ball mill, a sand grinder, an attritor, a roll mill, or a high-speed impeller disperser. It is preferable to apply and dry it on the matte film.

The water or organic solvent used in this dispersion is required not to dissolve or significantly swell the mat layer. Depending on the binder composition of the mat layer, a hydrocarbon type, a halogenated hydrocarbon type, or an alcohol is used. These can be used alone or in admixture of two or more from organic solvents such as a series, an ether series, an acetal series, a ketone series, an ester series, a polyhydric alcohol and its derivative series, a fatty acid series, a phenol series, and a nitrogen compound series. .

Examples of black pigments that can be used for this mask layer include carbon black, carbon graphite, phthalocyanine pigments, graphite powder, blackened silver powder, nickel powder, iron oxide powder, titanium black, etc. Carbon black having a high covering power is particularly preferable.

The content of the black pigment in the mask layer is 10 to 500% by weight, preferably 60 to 300% by weight based on the film-forming polymer described below.
% By weight, and as described above, a sufficient amount of black pigment is contained in the film-forming polymer as much as possible in order to obtain a sufficient print image density and form a mask layer in a thin film as much as possible, so that the film-forming performance is not deteriorated. desirable.

Examples of the film-forming polymer that can be used for this mask layer include the following which can be dissolved or swelled by the photoresist layer developing solution or the mask layer etching solution depending on the composition of the photoresist layer developing solution and the mask layer etching solution. Polymer compounds selected from the polymer compounds of each group may be mentioned, and these may be used alone or in admixture of two or more.

(A) ... Water-soluble resin Gelatin, sodium alginate, methyl cellulose, carboxymethyl cellulose, hydroxyethyl cellulose, hydroxypropyl cellulose, polyvinylpyrrolidone, polyvinyl alcohol, polyvinyl methyl ether, vinyl methyl ether-maleic anhydride copolymer,
Polyethylene oxide, sodium polyacrylate, partially saponified polyacrylic acid ester, polyacrylamide,
Acrylamide-diacetone acrylamide copolymer and the like.

(B) ... Alkali-soluble resin Acrylic acid-methacrylic acid ester copolymer, 2-hydroxyethyl methacrylate-acrylonitrile-methyl methacrylate-methacrylic acid copolymer, styrene-maleic anhydride copolymer partial esterified product, polyvinyl -P
-Hydroxybenzal, novolac type phenolic resin, etc.

(C) ... Acid-soluble resin such as dimethylaminoethyl methacrylate-methyl methacrylate copolymer.

(3) Photoresist Layer The photoresist layer is made of a photosensitive film-forming substance,
Dissolves in a developer consisting of an aqueous solution of a basic substance, an acidic substance, a neutral salt, or a lower alcohol compatible with water, or a mixture of two or more types, by exposure to ultraviolet light, visible light, etc. Property, swelling property, etc. are changed, only the exposed part can remain on the mask layer, and the remaining part
Various conventionally known photoresists, which will be described later, can be used as long as they are insoluble in an etching solution composed of an aqueous solution of one or a mixture of two or more selected from the same substance group as described above. The preferred thickness of the photoresist layer is 0.5 ~ 10μ, more preferably,
Efficient reversal printing with reversal printers that are widely used in photoengraving process (500mJ / cm ² or less, preferably 100mJ
/ cm ² or less) and 1 to 5 μm so as to obtain the resist performance in the developing / etching process.

The photoresist layer is formed by applying various conventionally known photoresists described below as a coating solution using water or an organic solvent which does not swell or remarkably swell the mask layer, and is applied and dried on the mask layer.

Further, the matting agent used for the matting layer can be added to the photoresist layer coating liquid, and if necessary, an overcoat layer containing the matting agent can be further laminated on the photoresist layer.

The photoresists preferably used in the present invention are listed below.

(A) Photoresist Combining Diazo Resin with Water-Soluble Resin or Alkali-Soluble Resin A photoresist combining diazo resin with water-soluble resin or alkali-soluble resin is diazo represented by P-diazodiphenylamine paraformaldehyde condensate. A photoresist in which a resin is combined with a water-soluble resin such as gelatin, polyvinyl alcohol, polyvinylpyrrolidone, hydroxyethyl cellulose, vinyl methyl ether-maleic anhydride copolymer, acrylamide-diacetone acrylamide copolymer or the above diazo resin can be used as an organic solvent. A photoresist in which a solution type is combined with an alkali-soluble resin such as 2-hydroxyethyl methacrylate-acrylonitrile-methyl methacrylate-methacrylic acid copolymer can be mentioned.

(B) Photoresist having an azide group as a photosensitive group Photoresists having an azido group as a photosensitive group include polyazido vinyl benzoate, polyazido vinyl phthalate, polyazidostyrene, polyvinyl azidobenzal acetal, polyvinyl azidonaphthyl acetal, and azide. Examples thereof include benzaldehyde-phenol resin and azidodiphenylamine formalin condensation polymer.

Furthermore, an photoresist obtained by mixing an azide photosensitizer and a polymer, for example, 4,4′-diadstilbene-2,2′-disulfonic acid anilide, 4-azido-1-
Photoresist prepared by mixing phenylaminobenzene-2-sulfonic acid anilide or 4-4'-diazide chalcone with a novolac type phenol resin.
59-37540 DISCLOSURE OF THE INVENTION 4, 4'described in Example 1 and Example 3
A photoresist is prepared by mixing a diazide chalcone or 2,6-di (4'-azidobenzal) -cyclohexanone with a polyvinyl butyral resin.

(C) Photoresist having an acryloyl group as a photosensitive group 10 to 40% by weight of acryloyl group-containing monomer, 1 to 20% by weight of a photopolymerization initiator, and 10 to 10% of a film-forming polymer soluble or swellable in a developing solution. Examples of the photoresist include 80% by weight and 10% by weight or less of other additives such as a sensitizer and a thermal polymerization inhibitor, which are compatible with each other.

The acryloyl group-containing monomer is an addition-polymerizable unsaturated monomer, and specifically, it is a polyfunctional acrylate such as 1,6-hexanediol diacrylate, polyethylene glycol 200 diacrylate, diethylene glycol diacrylate, neopentyl. Glycol diacrylate, triethylene glycol diacrylate, hydroxypivalic acid ester neopentyl glycol diacrylate, bis (acryloxyethoxy) bisphenol A, bis (acryloxypolyethoxy) bisphenol A, trimethylolpropane triacrylate, pentaerythritol triacrylate,
Dipentaerythritol hexaacrylate and the like are desirable, and in addition, phenoxyethyl acrylate, stearyl acrylate, lauryl acrylate, methoxyethyl acrylate, N, N-dimethylaminoethyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 2-methoxy. Monofunctional acrylates such as ethoxyethyl acrylate, 2-ethoxyethoxyethyl acrylate, 2-hydroxyethyl acryloyl phosphate, and tetrahydrofurfuryl acrylate can also be used in combination with the above polyfunctional acrylates.

The public polymerization initiator includes acetophenone, P-dimethylacetophenone, benzophenone, P, P-dichlorobenzophenone, Michler's ketone (4-4'-bisdimethylaminobenzophenone), benzyl, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl. Ether, benzoin n-propyl ether, benzoin isobutyl ether, benzoin n-butyl ether, 2-chlorothioxanthone, 2-
Methylthioxanthone, azobisisobutylnitrile,
Benzoin peroxide, 2,4,5-triphenylimidazole dimer and the like can be used.

As the film-forming polymer which can be dissolved or swelled in the developing solution, when the developing solution is water alone, polyvinyl alcohol, polyacrylic acid, acrylamide-diacetone acrylamide copolymer, etc. can be used, and the developing solution is an alkaline aqueous solution. In this case, an acrylic acid-methacrylic acid ester copolymer, a styrene-maleic anhydride copolymer partially esterified product, a novolac type phenol resin, or the like can be used. When the developer is an acidic aqueous solution, dimethylaminoethyl methacrylate-methyl methacrylate copolymer or the like can be used. Michler's ketone, thiazine dye and the like can be used as a sensitizer, and hydroquinone and the like can be used as a thermal polymerization inhibitor. More desirably, if necessary, the composition may have a main chain, chain ends,
A polymer or oligomer having a photopolymerizable unsaturated group in its side chain can be used in a compatible manner.

(Examples) Hereinafter, the present invention will be specifically described with reference to Examples, but the present invention is not limited to these Examples.

Example 1 Matte layer composition Linear saturated polyester resin 10 parts by weight (TOYOBO Byron 200) Silicon dioxide fine powder 1 part by weight (Fuji Dehyson Chemical Cyloid 978) Toluene 33 parts by weight Methyl ethyl ketone 33 parts by weight Ethyl acetate 33 parts by weight Above The composition was dispersed by a ball mill for 6 hours to obtain a mat layer coating liquid. This coating solution is applied to one side of a polyethylene terephthalate film having a thickness of 100μ using a wire bar and dried at a temperature of 90 ° C for 1 minute to give a coating film thickness of about 1.5μ.
A single-sided matte film was obtained. The total light transmittance of this single-sided matte film is 62% at 330 nm and 400 nm
81%, 85% at 500 nm, and 86% at 600 nm. The center line average roughness of the matte layer of this one-sided matte film was 0.41 μm.

Next, the following composition was dispersed by a ball mill for 72 hours to obtain a mask layer coating liquid. This coating solution was applied onto the mat layer using a wire bar and dried at a temperature of 90 ° C. for 1 minute and 30 seconds to form a mask layer having a coating film thickness of about 1.5 μ on the mat layer.

Mask layer composition 5 parts by weight of methacrylic acid-methacrylic acid copolymer (a copolymer consisting of 30 mol% of methyl methacrylate, 40 mol% of 2-hydroxyethyl methacrylate, 27 mol% of methacrylonitrile, and 3 mol% of methacrylic acid). Carbon black 5 parts by weight (Mitsubishi Chemical Co., Ltd. MA-100) Methyl Cellosolve 90 parts by weight Silicone-based surfactant 0.2 parts by weight (Dow Corning FS-XB-2725) Photoresist consisting of the following composition Apply the layer coating solution on the mask layer using a wire bar,
Was dried for 1 minute with warm air to form a photoresist layer having a coating film thickness of about 1 μm on the mask layer.

Photoresist layer composition Butyral resin 5 parts by weight (Sekisui Chemical Co., Ltd., S-REC BL-3) 4,4'-diazidochalcone 0.5 parts by weight Toluene 38 parts by weight Methyl ethyl ketone 45 parts by weight Butyl acetate 22 parts by weight Image of the present invention as described above A forming material was obtained.

Example 2 Matte layer composition 10 parts by weight of linear saturated polyester resin (Vylon 200 manufactured by Toyobo Co., Ltd.) 1 part by weight of benzoguanamine resin fine particles (FP100B manufactured by Nippon Shokubai Kagaku Kogyo Co., Ltd.) 33 parts by weight of methyl ethyl ketone 33 parts by weight of ethyl acetate 33 parts by weight of the above composition The product was dispersed with a ball mill for 48 hours to obtain a mat layer coating liquid. Using this coating solution, a single-sided matte film having a coating thickness of about 1.5 μm was obtained in the same manner as in Example 1. The total light transmittance of this single-sided matte film is 6 at 330 nm.
1%, 80% at 400 nm, 85% at 500 nm, and 86% at 600 nm. The center line average roughness of the matte layer of this one-sided matte film was 0.25 μ.

Then, the same mask layer as in Example 1 was formed on the mat layer in the same manner as in Example 1. Further, a photoresist layer coating liquid comprising the following composition was formed in the same manner as in Example 1 to form a photoresist layer having a coating film thickness of about 1.5 μ on the mask layer.

Photoresist layer composition Acrylic acid / methacrylic acid ester copolymer solution 20 parts by weight (Kyowa Chemical Industry Co., Ltd., NK-3) Trimethylolpropane triacrylate 6 parts by weight Benzophenone 0.8 parts by weight Michler's ketone 0.4 parts by weight Hydroquinone 0.02 parts by weight Toluene 75 parts by weight Parts butyl acetate 50 parts by weight Then, an overcoat layer composed of the following composition was formed on the photoresist layer to a coating film thickness of about 0.5 μm.

Polyvinyl alcohol 3 parts by weight (Nippon Gosei Kagaku Kogyo, Gohsenol NH-20) Distilled water 90 parts by weight Isopropyl alcohol 6 parts by weight Silicone surfactant 0.05 parts by weight (Dow Corning PS-XB-2725) An image forming material of the invention was obtained.

Example 3 Matte layer composition Vinylidene chloride / vinyl chloride copolymer solution 25 parts by weight (Kureha Chemical Industries Kureharon SOA) Silicon dioxide fine powder 1 part by weight (Fuji Dehyson Chemical Cyloid 978) Ethyl acetate 51 parts by weight Toluene 33 parts by weight The above composition was dispersed by a ball mill for 6 hours to obtain a mat layer coating liquid. Using this coating solution, a single-sided matte film having a coating thickness of about 1.5 μm was obtained in the same manner as in Example 1. The total light transmittance of this single-sided matte film is 6 at 330 nm.
2%, 80% at 400 nm, 85% at 500 nm, and 86% at 600 nm. The center line average roughness of the matte layer of this single-sided matte film was 0.43 μm.

Next, the following composition was dispersed by a ball mill for 72 hours to obtain a mask layer coating liquid. This coating solution was applied and dried on the matte layer in the same manner as in Example 1 to form a mask layer.

Mask layer composition Acrylic acid-methacrylic acid ester copolymer solution 20 parts by weight (Kyoso Chemical Industry, SR-102) Carbon black 5 parts by weight (Mitsubishi Chemical Industries, MA-100) Distilled water 75 parts by weight Silicone surfactant 0.2 parts by weight of the agent (FS-XB-2725 manufactured by Dow Corning) Further, the same photoresist layer and overcoat layer as in Example 2 were formed on the mask layer in the same manner as in Example. As described above, the image forming material of the present invention was obtained.

Comparative Example An image forming material of Comparative Example was prepared in the same manner as in Example 3 except that a matte layer was provided in Example 3 using the same 100 μm thick polyethylene terephthalate film as that used in Examples 1 to 3. Got The total light transmittance of this 100μ polyethylene terephthalate film is 33
65% at 0 nm, 84% at 400 nm, 8 at 500 nm
7% and 88% at 600 nm. The centerline average roughness of this film was 0.04μ.

The reversal printing registration accuracy in the photolithography process of the image forming materials obtained in Examples 1 to 3 and Comparative Example was compared by the following method.

A grid of 5 cm was drawn with 0.1 mm fine lines. Height 61 cm, width 82 cm
As a manuscript, the scribe base film of
The image forming materials obtained in No. 3 and Comparative Example were exposed with a bright room vacuum suction contact reversal printer (KVP-GIII manufactured by Kimoto) at an exposure amount of 100 mJ / cm.
^{In step 2,} reverse printing was performed using a register pin, and a reverse positive film was obtained by the following development processing method.

Development processing method Example 1 An 8% sodium alkylnaphthalenesulfonate aqueous solution (Perox NBL 4 times water diluted solution manufactured by Kao Soap) was heated to 30 ° C. to prepare a developing solution. It was dipped in this developer for 2 minutes, washed with running tap water, rubbed with absorbent cotton to develop, wiped off water droplets, and dried with warm air at 40 ° C. for 30 minutes.

Examples 2, 3 and Comparative Example A 0.01% anhydrous sodium carbonate aqueous solution was heated to 30 ° C. to prepare a developer. It is immersed in this developing solution for 30 seconds, and after that, in Example 1
Washing with water, rubbing, and development were carried out in the same manner as in.

Next, each of the obtained reversal positive films was used as an original, and the same image forming material as each original was subjected to reversal printing and developing treatment in the same manner as above to obtain a negative film by re-reversal printing.

The square dimensions of the positive film and the negative film of the same image forming material for Examples 1 to 3 and Comparative Example obtained as described above were measured using a glass scale,
For each 5 cm grid
When there was expansion and contraction of 0.05 mm or more, it was regarded as a defective grid. Of the 192 grids, less than 30 bad grids indicated good registration accuracy, and 90 or more bad registration accuracy.

As a result, the image forming materials obtained in Examples 1 and 3 had good registration accuracy, and the image forming materials obtained in Comparative Examples had poor registration accuracy. Further, the image forming material obtained in Example 2 showed a good / bad boundary region in terms of register accuracy.

(Effects of the Invention) As described in detail above, according to the present invention, it can be used in techniques such as "overprinting characters", "thickening characters", "photographing cut-out composition", and "hair-cutting" in the photolithography process. A relief type contact reversal lith film of a non-silver salt photosensitive material having high reversal registration accuracy was provided.

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Toshimichi Katsuoka 1115-2 Suzuya, Yono City, Saitama Prefecture Kimoto Saitama Factory (72) Inventor Yasunori Sugiyama 1115-2, Suzuya Yono City, Saitama Prefecture Kimoto Saitama Factory Co., Ltd. (56) References JP-A-52-89916 (JP, A) JP-A-55-166245 (JP, A) JP-A-58-1141 (JP, A) JP-A-57-22235 (JP, A) 52-154625 (JP, U)

Claims (3)

[Claims] 1. A mat layer comprising an extender pigment or colorless polymer fine particles and a polymer binder which is insoluble or hardly swellable in a photoresist layer developing solution and a mask layer etching solution, on one or both sides of a support. Provided, in the wavelength range of at least 330 nm to 600 nm, the total light transmittance is 60% or more, and the center line average roughness is 0.10 μ or more 0.
A mask layer and a photoresist layer, in which exposed or unexposed portions are removed by developing or developing / etching after exposure, are sequentially laminated on the mat layer of the mat film support having a thickness of less than 60 μm. A non-silver image forming material characterized by: 2. The non-silver salt image forming material according to claim 1, wherein the mask layer comprises a black pigment layer dispersed in the polymer binder. 3. The non-silver salt image-forming material according to claim 2, wherein the black pigment contains carbon black as a main component.