JPH07176085A - Production of optical disk molded substrate excellent in transfer property - Google Patents

Production of optical disk molded substrate excellent in transfer property

Info

Publication number
JPH07176085A
JPH07176085A JP32051293A JP32051293A JPH07176085A JP H07176085 A JPH07176085 A JP H07176085A JP 32051293 A JP32051293 A JP 32051293A JP 32051293 A JP32051293 A JP 32051293A JP H07176085 A JPH07176085 A JP H07176085A
Authority
JP
Japan
Prior art keywords
molding
optical disk
substrate
polycarbonate resin
transfer property
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32051293A
Other languages
Japanese (ja)
Inventor
Seiji Masuda
誠司 増田
Hideki Hasegawa
秀樹 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Rayon Co Ltd
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Priority to JP32051293A priority Critical patent/JPH07176085A/en
Publication of JPH07176085A publication Critical patent/JPH07176085A/en
Pending legal-status Critical Current

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Landscapes

  • Injection Moulding Of Plastics Or The Like (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

PURPOSE:To obtain an optical disk substrate having excellent transfer property with small warpage by injection compression molding a polycarbonate resin under specified molding conditions. CONSTITUTION:A polycarbonate resin is subjected to injection compression molding with an injection molding machine under the conditions of 370-390 deg.C molding temp., 120-140 deg.C die temp., and 20-50 ton pressure to form a substrate. By this method, an optical disk substrate excellent in transfer property with little warpage cap be obtd. by using a transparent polycarbonate resin, and thereby, increase in the massproductivity and decrease in the cost are realized. Further, high-density input of picture images is possible and the recording amt. is increased.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は射出圧縮成形法によるポ
リカーボネート樹脂系光ディスク成形基板の製造方法に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a polycarbonate resin optical disk molded substrate by injection compression molding.

【0002】[0002]

【従来の技術】1980年代初頭にコンパクトディスク
(CD)とレーザーディスク(LD)が市販されて以
来、光ディスクは急速に普及してきているが、現在で
は、更に、CDサイズの光ディスクにLD並の動画をデ
ジタルで記録することが望まれており、薄型で高密度化
されたものの開発が種々検討されている。(1992年
秋の「応用物理学会」における講演17p−T−11、
17p−T−13、1993年春の「応用物理学会」に
おける講演29a−B−8、29a−B−5等) 従来、薄型高密度ディスクの製造方法としては、転写法
の1つである2P法によって、ガラス基板や樹脂板上に
硬化性樹脂を塗布又は注入し、ピット又は溝を形成させ
た原盤を重ね合わせた後に硬化性樹脂を硬化させる方
法、又は、エッチング法によって基板上にピット又は溝
を形成していた。しかしながら、これらの方法は量産性
とコスト面では優れているとは言えない。
2. Description of the Related Art Optical discs have been rapidly spreading since the market of compact discs (CDs) and laser discs (LDs) in the early 1980's. Nowadays, however, optical discs of CD size are comparable to those of LDs. Is desired to be recorded digitally, and various studies have been made on development of a thin and high-density one. (Lecture 17p-T-11 at "The Society of Applied Physics", Autumn 1992,
17p-T-13, lecture at "Applied Physics Society" in the spring of 1993, 29a-B-8, 29a-B-5, etc.) Conventionally, the 2P method, which is one of the transfer methods, has been used as a method for manufacturing a thin high-density disk. By applying or injecting a curable resin on a glass substrate or a resin plate, and stacking the masters on which the pits or grooves have been formed, and then curing the curable resin, or by the etching method, the pits or grooves on the substrate. Had formed. However, these methods cannot be said to be excellent in terms of mass productivity and cost.

【0003】このような状況において、量産性とコスト
面で優れている製造方法として、透明な熱可塑性樹脂を
射出成形法又は射出圧縮成形法によって薄型高密度ディ
スク成形基板を得る方法の開発が強く望まれている。
Under such circumstances, as a manufacturing method excellent in mass productivity and cost, a method of obtaining a thin high-density disk molded substrate by injection molding or injection compression molding of a transparent thermoplastic resin has been strongly developed. Is desired.

【0004】[0004]

【発明が解決しようとする課題】本発明の目的とすると
ころは、従来得られなかった、透明なポリカーボネート
樹脂を用い、射出圧縮成形法により、転写性に優れ、反
りの小さな光ディスク成形基板を得るための成形方法を
提供することにある。
The object of the present invention is to obtain an optical disk molding substrate having excellent transferability and small warpage by injection compression molding using a transparent polycarbonate resin, which has hitherto not been obtained. To provide a molding method therefor.

【0005】[0005]

【課題を解決するための手段】本発明の要旨とするとこ
ろは、ポリカーボネート樹脂を、成形温度370〜39
0℃、型温120〜140℃、型締圧20〜50トンの
成形条件で射出圧縮成形することを特徴とする、転写性
に優れた光ディスク成形基板の製造方法にある。
The gist of the present invention is to use a polycarbonate resin at a molding temperature of 370-39.
A method for producing an optical disk molded substrate having excellent transferability is characterized by performing injection compression molding under molding conditions of 0 ° C., mold temperature of 120 to 140 ° C., and mold clamping pressure of 20 to 50 tons.

【0006】本発明に用いられるポリカーボネート樹脂
としては、ビスフェノールAとホスゲン、又はビスフェ
ノールAとジフェニルカーボネートから得られるもの等
が挙げられる。
Examples of the polycarbonate resin used in the present invention include those obtained from bisphenol A and phosgene, or bisphenol A and diphenyl carbonate.

【0007】本発明においては、得られる光ディスク成
形基板の厚みは1.0mm以下であることが好ましい。
即ち、「光学技術コンタクト」23,No.7,198
5の451頁の(4)式に記載されているように、傾い
た光ディスク成形基板上には板厚と開口数の3乗に比例
した大きさのコマ収差が発生する。従って、厚みが1.
0mmを越えると、光ディスクを高密度化するために開
口数の高い対物レンズを使った場合、コマ収差が大きく
なり、その結果、ディスク基板が傾いたときにクロスト
ークが大きくなると同時に、ディスクからの戻り光量が
減少するため、S/N比が劣化すると共に、ジッターが
増大し過ぎ、好ましくない。
In the present invention, the thickness of the optical disk molding substrate obtained is preferably 1.0 mm or less.
That is, “Optical Technology Contact” 23 , No. 7,198
As described in the equation (4) on page 451 of No. 5, coma aberration having a magnitude proportional to the plate thickness and the cube of the numerical aperture is generated on the inclined optical disk molding substrate. Therefore, the thickness is 1.
If it exceeds 0 mm, when an objective lens with a high numerical aperture is used to densify the optical disc, coma aberration becomes large, and as a result, crosstalk becomes large when the disc substrate is tilted, and at the same time, the disc from the disc becomes larger. Since the amount of returning light decreases, the S / N ratio deteriorates and the jitter increases too much, which is not preferable.

【0008】本発明においては、光ディスク基板は射出
圧縮成形法によって成形されるが、成形条件としては、
成形温度370〜390℃、型温120〜140℃、型
締圧20〜50トンであることが必要である。
In the present invention, the optical disk substrate is molded by the injection compression molding method.
It is necessary that the molding temperature is 370 to 390 ° C, the mold temperature is 120 to 140 ° C, and the mold clamping pressure is 20 to 50 tons.

【0009】成形温度が370℃未満、型温が120℃
未満又は型締圧が20トン未満では転写性が悪くなり、
特に1mm厚以下の薄型ディスク基板を得る場合には好
ましくない。成形温度が390℃を越えると成形材料が
分解し易くなり、好ましくない。また、型温が140℃
を越えると成形基板の反りが大きくなり、好ましくな
い。また、型締圧が50トンを越えるとディスク基板の
反りが大きくなり、好ましくない。
Molding temperature less than 370 ° C, mold temperature 120 ° C
When the mold clamping pressure is less than 20 tons or the mold clamping pressure is less than 20 tons, the transferability is deteriorated.
In particular, it is not preferable when obtaining a thin disk substrate having a thickness of 1 mm or less. If the molding temperature exceeds 390 ° C., the molding material is likely to decompose, which is not preferable. Also, the mold temperature is 140 ℃
If it exceeds, the warp of the molded substrate increases, which is not preferable. Further, when the mold clamping pressure exceeds 50 tons, the warp of the disk substrate becomes large, which is not preferable.

【0010】上記条件で射出圧縮成形することにより、
得られる光ディスク成形基板の反りは200μm以下と
少なく、且つ、得られる光ディスク成形基板表面のピッ
ト又は溝は1.0μm以下という優れた転写性が得られ
る。
By performing injection compression molding under the above conditions,
The warp of the obtained optical disk molded substrate is as small as 200 μm or less, and the excellent transferability that the pits or grooves on the surface of the obtained optical disk molded substrate is 1.0 μm or less is obtained.

【0011】[0011]

【実施例】以下に、実施例により本発明を更に詳しく説
明する。
The present invention will be described in more detail with reference to the following examples.

【0012】本発明では、射出成形機(名機製作所
(株)製ダイナメルタM−70A−DM)を用い、0.
6μmのピッチを有するピット及び溝が形成されたスタ
ンパーを装着した金型を用い、外径120mm、厚さ
0.6又は1.2mmの光ディスク成形基板を射出圧縮
成形し、その基板について転写性及び反りの状態につい
て評価を行った。
In the present invention, an injection molding machine (Dynamelter M-70A-DM manufactured by Meiki Seisakusho Co., Ltd.) is used.
Using a mold equipped with a stamper having pits and grooves having a pitch of 6 μm, an optical disk molding substrate having an outer diameter of 120 mm and a thickness of 0.6 or 1.2 mm was injection compression molded, and transferability and The warpage was evaluated.

【0013】評価法としては、光ディスク基板のピット
又は溝が転写されている表面に、導電膜として約20n
mの厚さに金をスパッタし、走査型トンネル顕微鏡(以
下STMと略す)を用いて射出圧縮成形基板のピット又
は溝形状を測定した。これらの断面形状から深さを求
め、スタンパのピット又は溝の深さで除した値を転写率
と定義し、転写性の評価基準とした。
As an evaluation method, a conductive film of about 20 n is formed on the surface of the optical disk substrate on which the pits or grooves are transferred.
Gold was sputtered to a thickness of m, and the pit or groove shape of the injection compression molded substrate was measured using a scanning tunneling microscope (hereinafter abbreviated as STM). The depth was obtained from these cross-sectional shapes, and the value obtained by dividing the depth by the pits or grooves of the stamper was defined as the transfer rate, which was used as the transferability evaluation standard.

【0014】また、光ディスクの反りについては、成形
後1日以上室温放置した基板について、ディスク基板の
中心部分に対する、最外周における垂直方向の変位量を
反り量として測定した。
With respect to the warp of the optical disk, the amount of vertical displacement of the outermost circumference with respect to the central portion of the disk substrate was measured as the warp amount of the substrate which was left at room temperature for one day or more after molding.

【0015】[実施例1〜10、比較例1〜5]透明熱
可塑性樹脂として、帝人化成(株)製ポリカーボネート
樹脂AD9000TGを用い、表1に示すシリンダー温
度、型温、型締圧の成形条件にて各種光ディスク成形基
板を成形し、表1に示す厚みの基板を得た。この基板の
転写性及び反りについての評価結果を表1に示した。
[Examples 1 to 10 and Comparative Examples 1 to 5] Polycarbonate resin AD9000TG manufactured by Teijin Chemicals Ltd. was used as the transparent thermoplastic resin, and the molding conditions of cylinder temperature, mold temperature and mold clamping pressure shown in Table 1 were used. Various optical disk molded substrates were molded by using to obtain substrates having the thicknesses shown in Table 1. Table 1 shows the evaluation results of transferability and warpage of this substrate.

【0016】[0016]

【表1】 [Table 1]

【0017】[0017]

【発明の効果】本発明の成形方法により、従来得られな
かった、透明なポリカーボネート樹脂を用い、転写性が
優れ、且つ反りの小さな光ディスク成形基板を得ること
が可能となることから、量産性及びコスト面で非常に優
れており、更に得られたディスク成形基板の転写性が良
好であり、且つ反りが小さいことから、画像の高密度入
力が可能となり、次世代の光ディスク基板として、その
効果は極めて大きいものである。
According to the molding method of the present invention, it is possible to obtain an optical disk molding substrate having excellent transferability and small warpage, which has not been obtained in the past, by using a transparent polycarbonate resin. The cost is very good, the transferability of the obtained disk-molded substrate is good, and the warp is small, which enables high-density image input, and its effect as a next-generation optical disk substrate. It is extremely large.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 B29L 11:00 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Office reference number FI technical display location B29L 11:00

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 ポリカーボネート樹脂を、成形温度37
0〜390℃、型温120〜140℃、型締圧20〜5
0トンの成形条件で射出圧縮成形することを特徴とす
る、転写性に優れた光ディスク成形基板の製造方法。
1. A polycarbonate resin is molded at a molding temperature of 37.
0-390 ° C, mold temperature 120-140 ° C, mold clamping pressure 20-5
A method of manufacturing an optical disk molded substrate having excellent transferability, characterized by performing injection compression molding under a molding condition of 0 ton.
JP32051293A 1993-12-20 1993-12-20 Production of optical disk molded substrate excellent in transfer property Pending JPH07176085A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32051293A JPH07176085A (en) 1993-12-20 1993-12-20 Production of optical disk molded substrate excellent in transfer property

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32051293A JPH07176085A (en) 1993-12-20 1993-12-20 Production of optical disk molded substrate excellent in transfer property

Publications (1)

Publication Number Publication Date
JPH07176085A true JPH07176085A (en) 1995-07-14

Family

ID=18122279

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32051293A Pending JPH07176085A (en) 1993-12-20 1993-12-20 Production of optical disk molded substrate excellent in transfer property

Country Status (1)

Country Link
JP (1) JPH07176085A (en)

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