JPH07173622A - Cylindrical target for pvd method - Google Patents

Abstract

PURPOSE:To prevent peeling between a target base body and evaporating material by providing a position deviation preventing part on the boundary between a target base body and evaporating body. CONSTITUTION:A target consists of a cylindrical base body 1 and a evaporating material 2 covering the outer circumference of the base body 1. The base body 1 is made of a hollow body of round cross section, forming a position deviation preventing part 3 at the center part in longitudinal direction. The position deviation preventing part 3 is made of projecting part formed along the outer circumferential face of the base body 1. An evaporating body 2 is integrally joined on the outer circumferential face of the base body 1 made of Cr, etc., as a specific thickness layer. This target is mounted on PVD device. As a temp. rises in operation, the deviation between both tends to occur due to difference in thermal expansion between the evaporating body 2 and base body 1, the deviation is impeded by the position deviation preventing part 3, preventing the deviation between both. The position deviation preventing part 3 constituted with the recessed part formed at the center part of the base body 1 provides the same working effect.

Description

Detailed Description of the Invention

[0001]

The present invention relates to the PVD method (Physical V).
apor Deposition: Physical vapor deposition method)

[0002]

2. Description of the Related Art As a PVD method, there are an arc ion plating method, a sputtering method and the like. For example, those described in JP-A-5-106025 and JP-A-5-230634 are known. Then, as a target used in this type of PVD method, for example, Japanese Patent Laid-Open No. 5-3
The one described in Japanese Patent No. 9566 is known.

In Japanese Unexamined Patent Publication (Kokai) No. 5-39566, HIP (Hot) is used as a target on the outer peripheral surface of a cylindrical substrate.
Isostatic Pressing: Evaporating material by hot isostatic pressing method)
A technique for joining (target materials) is disclosed.
Further, in the publication, in the production of a Cr target, a stainless steel pipe is used as a base body, and Cr powder as an evaporation material is concentrically formed around the pipe by HIP treatment.

[0004]

In the conventional target in which the above-mentioned stainless steel tube is used as a substrate and the evaporation material is bonded to the periphery of the substrate by the HIP process, the substrate and the evaporation material are separated from each other in the cooling process from the high temperature of the HIP process. Due to the difference in the coefficient of thermal expansion, the base body shrinks more greatly, and in many cases peeling or cracking occurs between the evaporation material and the base body. This phenomenon is difficult to be manifested when the target has a small total length and a small diameter, but becomes more likely to appear as the target becomes larger.

When the above-mentioned target in which peeling has occurred is incorporated into a PVD apparatus and used, a shift in the target axial direction occurs between the substrate and the evaporation material on the outer periphery of the target due to the temperature rise during use. It occurred and became unusable. Therefore, an object of the present invention is to provide a cylindrical target for the PVD method, which solves the problem of misalignment between the substrate and the evaporation material due to separation and the like.

[0006]

In order to achieve the above object, the present invention takes the following means. That is, the feature of the invention of claim 1 is that in a cylindrical target for the PVD method in which the outer peripheral surface of a cylindrical substrate is covered with an evaporating material, both are formed at the boundary between the substrate and the evaporating material. The point is that a position deviation prevention portion is provided to prevent deviation in the axial direction.

Further, the feature of the present invention as set forth in claim 2 resides in that the position shift prevention portion is composed of a concave portion or a convex portion formed on the outer peripheral surface of the base body. According to a third aspect of the present invention, in a cylindrical target for a PVD method in which an evaporation material is bonded to an outer peripheral surface of a cylindrical base material, the difference in thermal expansion between the base material and the evaporation material is It is formed of a small material.

According to a fourth aspect of the present invention, in a cylindrical target for a PVD method, wherein an evaporation material is bonded to the outer peripheral surface of a cylindrical substrate by HIP treatment, the substrate is cooled by HIP treatment. This is because it is made of alloy steel that undergoes transformation in the process and the evaporation material is made of chromium.

[0009]

According to the present invention as set forth in claim 1, since a positional deviation preventing portion for preventing axial deviation of the base material and the evaporation material is provided at the boundary portion between the base material and the evaporation material, the target is
Even if an axial deviation occurs between the evaporation material and the base due to a difference in thermal expansion between the evaporation material and the base body while being attached to the VD device during use, the deviation is prevented by the position deviation prevention portion. Misalignment is prevented.

According to the second aspect of the present invention, since the position shift preventing portion is composed of the concave portion or the convex portion formed on the outer peripheral surface of the base body, the axial direction of both of them is axially used during mounting on the PVD apparatus. Be sure to prevent misalignment. In the invention according to claim 3, since the base body is formed of a material having a small difference in thermal expansion from the evaporation material, positional displacement between the base material and the evaporation material due to temperature change is prevented.

According to a fourth aspect of the invention, the substrate is HI.
Since it is made of alloy steel that undergoes transformation in the cooling process of P treatment and the evaporation material is made of chromium, in the cooling process of HIP treatment, the substrate is heat-shrinked in the entire temperature range and is usually 300 to 500 °. Expansion due to transformation also occurs in a specific temperature range between C, and as a result, the apparent coefficient of thermal expansion in the cooling process becomes smaller than that of ordinary iron and approaches Cr, so that between the substrate and the evaporation material. Peeling is prevented.

[0012]

Embodiments of the present invention will be described below with reference to the drawings. In FIG. 1, the target of the present invention comprises a cylindrical substrate 1 and an evaporation material 2 which covers the outer peripheral portion of the substrate 1.
The base body 1 is made of a hollow body having a circular cross section, and a displacement prevention portion 3 is formed at the center in the longitudinal direction thereof. The position shift prevention portion 3 is composed of a convex portion formed on the outer peripheral surface of the base body 1 along the circumferential direction.

The evaporation material 2 is made of chromium (Cr),
It is integrally joined to the outer peripheral surface of the substrate 1 as a layer having a predetermined thickness by the HIP process. The method of manufacturing the target is as follows. That is, a displacement preventing portion formed of a convex portion is processed on the outer periphery of a base material made of a solid rod body,
Around the base material, the capsule described in the above-mentioned JP-A-5-39566 is used to perform Cr treatment by HIP treatment.
Join the evaporation material. HIP treatment is 10 at 1280 ° C
It was carried out for 5 hours under the condition of 00 kgf / cm ² .

After the HIP treatment, a through hole 4 for a cooling water passage was formed in the center of the base material, and both ends and the outer periphery were finished into a predetermined shape. What is shown in FIG.
3 is composed of a concave portion formed in the central portion of the substrate 1, and the other structure and manufacturing method are the same as those in FIG.

Although not shown in the drawings, a target having no position deviation prevention portion 3 was manufactured by a manufacturing method similar to the above as a conventional example. Then, the target of this conventional example and the target of the example of the present invention shown in FIGS. 1 and 2 were set in an arc ion plating apparatus and a comparative test was conducted. The material configurations and outer shapes of these three types of targets are the same.

In the target of the above-mentioned conventional example, an axial deviation between the evaporating material and the substrate occurs with the passage of operating time,
When the total operation time was 10 hours or less, the deviation reached 3 mm, and further operation became impossible. This is because the heat load during operation raises the temperature of the evaporative material part more than the directly water-cooled substrate, and thermal expansion results in insufficient contact between the evaporative material and the substrate during operation. It is considered that this caused the axial displacement.

On the other hand, none of the targets of the examples of the present invention shown in FIGS. 1 and 2 showed the above-mentioned deviation even after 100 hours had elapsed. FIG. 3 shows another embodiment of the present invention, in which the positional deviation prevention portion 3 is an annular uneven portion formed on the outer peripheral portion of the hollow or solid cylindrical substrate 1 at predetermined intervals in the axial direction. It is composed by.

FIG. 4 shows another embodiment of the present invention, in which the displacement prevention portion 3 is formed in a screw shape by the uneven portion formed on the outer peripheral portion of the base 1. FIG. 3,
Also in the target of No. 4, the same effect as that of the above-mentioned ones of FIGS. In each of the examples shown in FIGS. 1 and 2, when the material after HIP treatment was sampled and the bonding state between the substrate 1 and the evaporation material 2 was observed, no apparent delamination was observed, Microscopically, separation occurred on the Cr vaporizer side near the joint interface. This separation is considered to have occurred during the cooling process in the HIP process.

Therefore, in order to prevent peeling occurring in the cooling process in the HIP process, the following constitution is adopted. That is, in the cylindrical target for PVD method in which the evaporation material 2 is joined to the outer peripheral surface of the cylindrical base material 1 by the HIP process, the base material 1 is formed of a material having a small thermal expansion difference from the evaporation material 2. .

Particularly when Cr is used as the evaporating material 2,
The target of the following configuration is provided. That is, the base 1 is made of titanium or a titanium alloy, and the evaporation material is formed around it.
The Cr of 2 is joined by HIP processing to manufacture a target. When pure titanium was selected as the substrate 1 and the target molding was performed, no separation or separation between the two was observed even by microscopic observation of the interface between the substrate 1 and the evaporation material 2.
A Cr target was obtained in which the displacement of the substrate 1 did not occur.

This is because when a Cr target is formed by using titanium or its alloy as the substrate 1, the substrate 1 and the evaporation material 2
This is because the difference in thermal expansion between the base material 1 and the evaporation material 2 does not occur because the difference in thermal expansion between the base material 1 and the evaporation material 2 does not occur. The microscopic peeling can also be prevented by forming the target by forming the base 1 from an alloy steel that undergoes transformation during the cooling process, and bonding the Cr vaporizing material 2 by HIP to the periphery thereof.

That is, in the cooling process of the HIP process, the substrate 1 is heat-shrunk in the entire temperature range, and the temperature is usually 300 to 300.
Expansion due to transformation also occurs in a specific temperature range between 500 ° C, and as a result, the apparent coefficient of thermal expansion in the cooling process becomes smaller than that of ordinary iron and approaches Cr of the evaporation material 2, so that Separation between 1 and evaporation material 2 is prevented.

The present invention is not limited to the above-mentioned respective embodiments. For example, in the invention described in claims 1 to 3, the substrate and the evaporation material are joined by HIP treatment,
It may be joined by a hot press or the like.

[0024]

According to the present invention as set forth in claim 1, since a displacement preventing portion is provided at the boundary between the substrate and the evaporation material to prevent separation of the both, the target is PV.
Even if the temperature rises during mounting on the D device and the thermal expansion difference between the evaporating material and the base body causes a displacement between the two, the displacement is prevented by the position displacement prevention portion, and the displacement between the two is prevented. And a stable PVD method can be used for film formation.

According to the second aspect of the present invention, in order to prevent the axial displacement of the base material and the evaporation material, the position displacement prevention portion is composed of the concave portion or the convex portion formed on the outer peripheral surface of the base material. It is possible to prevent the positional displacement between the two during use while being mounted on the device. According to the third aspect of the invention, since the difference in thermal expansion between the two is small, positional deviation is unlikely to occur due to temperature changes.

According to a fourth aspect of the invention, the substrate is HI.
Since it is made of alloy steel that undergoes transformation in the cooling process of P treatment and the evaporation material is made of chromium, in the cooling process of HIP treatment, the substrate is heat-shrinked in the entire temperature range and is usually 300 to 500 °. Expansion due to transformation also occurs in a specific temperature range between C, and as a result, the apparent coefficient of thermal expansion in the cooling process becomes smaller than that of ordinary iron and approaches Cr, so that between the substrate and the evaporation material. Peeling is prevented.

[Brief description of drawings]

FIG. 1 is a sectional view of a target showing an embodiment of the present invention.

FIG. 2 is a sectional view of a target showing another embodiment of the present invention.

FIG. 3 is a cross-sectional view of a target showing another embodiment of the present invention.

FIG. 4 is a sectional view of a target showing another embodiment of the present invention.

[Explanation of symbols]

 1 base 2 evaporation material 3 misalignment prevention section

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiroshi Tamaki 2-3-1, Niihama, Arai-cho, Takasago, Hyogo Prefecture Takasago Works, Kobe Steel Co., Ltd. (72) Koji Hanaguri, Niihama, Arai-cho, Takasago, Hyogo No. 1 Inside the Takasago Works, Kobe Steel, Ltd. (72) In Honor Nomura Honor No. 2-3-1, Niihama, Niihama, Arai Town, Takasago City, Hyogo Prefecture Inside the Takasago Works, Kobe Steel Co., Ltd.

Claims (4)

[Claims] 1. A cylindrical target for a PVD method, comprising an outer peripheral surface of a cylindrical substrate covered with an evaporation material, for preventing axial displacement between the substrate and the evaporation material at a boundary portion between them. A cylindrical target for the PVD method, which is provided with a position shift prevention portion. 2. The cylindrical target for the PVD method according to claim 1, wherein the misregistration prevention portion is composed of a concave portion or a convex portion formed on the outer peripheral surface of the base body. 3. A cylindrical target for a PVD method, comprising an outer peripheral surface of a cylindrical substrate and an evaporation material bonded to the outer surface, wherein the substrate is made of a material having a small thermal expansion difference from the evaporation material. A cylindrical target for the PVD method. 4. An evaporation material is HIPed on the outer peripheral surface of a cylindrical substrate.
In a cylindrical target for the PVD method, which is joined by a treatment, the substrate is made of an alloy steel that transforms in the cooling process of the HIP treatment, and the evaporation material is made of chromium. target.