JPH07170062A - Nitrogen reflow device - Google Patents
Nitrogen reflow deviceInfo
- Publication number
- JPH07170062A JPH07170062A JP31195393A JP31195393A JPH07170062A JP H07170062 A JPH07170062 A JP H07170062A JP 31195393 A JP31195393 A JP 31195393A JP 31195393 A JP31195393 A JP 31195393A JP H07170062 A JPH07170062 A JP H07170062A
- Authority
- JP
- Japan
- Prior art keywords
- concentration
- deviation
- supply
- reflow
- value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、プリント基板と電子部
品とを半田結合するＮ2リフロー装置に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an N 2 reflow device for soldering a printed circuit board and an electronic component.
【０００２】[0002]
【従来の技術】従来のこの種のＮ2リフロー装置におい
て、Ｏ2濃度を制御するにあたって、あらかじめ所定の
Ｏ2濃度に安定させる際のＮ2供給量を計測し、これを参
考として使用者が経験則でＮ2供給バルブを調節すると
いう手段が多くとられていた。また、Ｏ2濃度制御装置
を備えたＮ2リフロー装置においても、今日のような微
細なパターンの半田濡れ性を確保する微妙なＯ2濃度制
御には難を持っている。BACKGROUND OF THE INVENTION N 2 reflow machine this type of conventional, O 2 in controlling the density, measured N 2 supply amount when stabilized in advance predetermined O 2 concentration, the user of this reference As a rule of thumb, many measures have been taken to adjust the N 2 supply valve. Further, even in the N 2 reflow apparatus equipped with the O 2 concentration control device, there is a difficulty in delicate O 2 concentration control for ensuring solder wettability of a fine pattern as in the present day.
【０００３】以下、図４に基づき従来のＯ2濃度制御装
置について説明する。図４は従来のＯ2濃度制御のタイ
ミングチャートを示している。図４において、１はＯ2
濃度現在値、２はＯ2濃度設定値、３はＮ2供給バルブの
開閉状態を示すバルブ開閉信号である。Ｏ2濃度設定値
２に対して濃度Ａを超えた時点でＮ2供給を減少させる
必要がある。しかしながら、Ｏ2濃度測定系では数十秒
の遅れ時間Δｔが存在するため、バルブ開閉信号３にて
Ｎ2供給バルブを閉じるのはΔｔ秒後になる。この間に
余分なＮ2が供給されて、図４のような濃度Ａを超した
供給量波形となる。また、下方の濃度Ｂに対しても同様
であり、Ｎ2供給量は常に遅れた出力となり、所定のＯ2
濃度を得ることはできない。A conventional O 2 concentration controller will be described below with reference to FIG. FIG. 4 shows a timing chart of the conventional O 2 concentration control. In FIG. 4, 1 is O 2
The present concentration value, 2 is the O 2 concentration set value, and 3 is a valve opening / closing signal indicating the opening / closing state of the N 2 supply valve. It is necessary to reduce the N 2 supply when the concentration A exceeds the O 2 concentration set value of 2. However, in the O 2 concentration measuring system, there is a delay time Δt of several tens of seconds, and therefore the N 2 supply valve is closed by the valve opening / closing signal 3 after Δt seconds. During this period, excess N 2 is supplied, and the supply amount waveform exceeds the concentration A as shown in FIG. The same applies to the lower concentration B as well, and the N 2 supply amount is always delayed and the predetermined O 2
No concentration can be obtained.
【０００４】[0004]
【発明が解決しようとする課題】上記従来の構成では、
Ｏ2濃度測定系に遅れ時間を考慮した補償手段がとられ
ていない。Ｎ2供給バルブの開閉タイミングを、Ｏ2濃度
測定値に依存している。Ｏ2濃度の変動により半田濡れ
性の品質に差異が生じる。また、常にＯ2濃度の安定性
の確認と調整が必要であるため、工場管理のコストが発
生しているという問題があった。SUMMARY OF THE INVENTION In the above conventional configuration,
The O 2 concentration measuring system does not have any compensating means considering the delay time. The opening / closing timing of the N 2 supply valve depends on the measured O 2 concentration. A change in O 2 concentration causes a difference in solder wettability quality. Further, since it is always necessary to confirm and adjust the stability of the O 2 concentration, there is a problem that factory management costs are incurred.
【０００５】本発明は、上記従来技術の問題を解決する
ものであり、Ｏ2濃度を常に安定させることにより半田
濡れ性の品質の差異等の問題を解決できるＮ2リフロー
装置を提供することを目的とする。The present invention solves the above-mentioned problems of the prior art, and provides an N 2 reflow apparatus capable of solving problems such as difference in quality of solder wettability by always stabilizing the O 2 concentration. To aim.
【０００６】[0006]
【課題を解決するための手段】この目的を達成するため
に、本発明はＮ2リフロー装置に、Ｏ2濃度測定装置と、
Ｏ2濃度測定装置からのＯ2濃度現在値と外部から入力さ
れるＯ2濃度設定値との偏差と偏差の時間的変化率を算
出し、Ｎ2供給量を調整するバルブ開閉信号によりＮ2供
給バルブを制御し、偏差の時間的変化率と次回単位時間
のＮ2供給量との関連を数式もしくはテーブルマップで
記憶する制御装置と、Ｎ2供給装置と、Ｎ2供給バルブ駆
動装置とから構成したものである。To achieve this object, the present invention provides an N 2 reflow apparatus, an O 2 concentration measuring apparatus, and
O 2 calculates the deviation and temporal change rate of the deviation between the O 2 concentration setting of the O 2 concentration is input from the current value and the outside from the concentration measuring apparatus, N 2 by a valve closing signal for adjusting the N 2 supply amount From the control device that controls the supply valve and stores the relation between the temporal change rate of the deviation and the N 2 supply amount of the next unit time by a mathematical expression or a table map, the N 2 supply device, and the N 2 supply valve drive device. It is composed.
【０００７】[0007]
【作用】上記構成によれば、前回単位時間でのＯ2濃度
の傾向とＮ2供給量を基に現在のＯ2濃度を推定すること
が可能になり、Ｏ2濃度を常に安定させることができ
る。According to the above construction, the present O 2 concentration can be estimated based on the tendency of the O 2 concentration in the last unit time and the N 2 supply amount, and the O 2 concentration can always be stabilized. it can.
【０００８】[0008]
【実施例】以下、図面を参照して実施例を詳細に説明す
る。図１は本発明の一実施例のＮ2リフロー装置の基本
構成を示している。図１において、11はＮ2リフロー装
置本体、12はＮ2リフロー装置本体内部に設置されたＯ2
濃度センサ部、13はＯ2濃度測定装置、14はＯ2濃度測定
装置13からの出力であるＯ2濃度現在値、15はＮ2リフロ
ー制御装置、16は外部から入力されるＯ2濃度設定値、1
7はＯ2濃度現在値14とＯ2濃度設定値16とからＯ2濃度偏
差ΔＤを算出する偏差演算手段、18はＯ2濃度偏差ΔＤ
より前回値と今回値のＯ2濃度平均変化率を算出する偏
差平均変化率演算手段、19は今回Ｎ2供給量を算出する
Ｎ2供給量演算手段、20はバルブ開閉信号出力手段、21
はバルブ開閉信号出力手段20の出力であるバルブ開閉信
号、22はＮ2供給バルブ駆動装置、23はＮ2供給開閉バル
ブ、24はＮ2供給装置である。Embodiments will be described in detail below with reference to the drawings. FIG. 1 shows the basic configuration of an N 2 reflow apparatus according to an embodiment of the present invention. In FIG. 1, 11 is an N 2 reflow apparatus main body and 12 is an O 2 installed inside the N 2 reflow apparatus main body.
Concentration sensor unit, 13 O 2 concentration measuring device, 14 O 2 concentration present value output from O 2 concentration measuring device 13, 15 N 2 reflow controller, 16 O 2 concentration setting input from outside Value, 1
Reference numeral 7 is a deviation calculating means for calculating the O 2 concentration deviation ΔD from the O 2 concentration present value 14 and the O 2 concentration setting value 16, and 18 is the O 2 concentration deviation ΔD.
From the deviation average change rate calculation means for calculating the O 2 concentration average change rate of the previous value and the current value, 19 is the N 2 supply amount calculation means for calculating the current N 2 supply amount, 20 is the valve opening / closing signal output means, 21
Is a valve opening / closing signal output from the valve opening / closing signal output means 20, 22 is an N 2 supply valve driving device, 23 is an N 2 supply opening / closing valve, and 24 is an N 2 supply device.
【０００９】Ｎ2リフロー装置本体11内部に設置された
Ｏ2濃度センサ部12の信号から、Ｏ2濃度測定装置13は遅
れ時間を伴ったＯ2濃度現在値14をＮ2リフロー制御装置
15へ出力する。Ｎ2リフロー制御装置15では、偏差演算
手段17により先に入力されているＯ2濃度設定値16とＯ2
濃度現在値14とを比較し、Ｏ2濃度偏差ΔＤを算出す
る。これにより、前回値と今回値から偏差平均変化率演
算手段18によりＯ2濃度平均変化率を算出する。Ｎ2供給
量演算手段19では上記の値を基に今回Ｎ2供給量を算出
する。From the signal of the O 2 concentration sensor section 12 installed inside the N 2 reflow apparatus main body 11, the O 2 concentration measuring apparatus 13 outputs the current O 2 concentration value 14 with a delay time to the N 2 reflow control apparatus.
Output to 15. In the N 2 reflow controller 15, the deviation calculating means 17 inputs the O 2 concentration set value 16 and the O 2 concentration which are previously input.
The current concentration value 14 is compared to calculate the O 2 concentration deviation ΔD. Thus, the average deviation rate of change of O 2 concentration is calculated by the deviation average change rate calculating means 18 from the previous value and the current value. The N 2 supply amount calculation means 19 calculates the N 2 supply amount this time based on the above values.
【００１０】図２は制御装置のＮ2供給量算出用のテー
ブルマップを示している。例えば、Ｏ2濃度平均変化率
が100％，今回の偏差が−100％，前回出力値が100％の
とき、今回出力値は75％といったテーブルマップを用意
し演算を施している。このテーブルマップは設備特性に
応じて登録追加が可能であり、また数式で一意に定義し
てもよい。FIG. 2 shows a table map for calculating the N 2 supply amount of the control device. For example, when the average change rate of O 2 concentration is 100%, the current deviation is −100%, and the previous output value is 100%, a table map such that the current output value is 75% is prepared and the calculation is performed. This table map can be registered and added according to the equipment characteristics, and may be uniquely defined by a mathematical expression.
【００１１】このようにして求められた今回Ｎ2供給量
は、バルブ開閉信号出力手段20により単位時間あたりの
バルブ開閉信号21に変換されてＮ2供給バルブ駆動装置2
2へ送られる。Ｎ2供給バルブ駆動装置22にてＮ2供給開
閉バルブ23が駆動され、Ｎ2供給装置からＮ2が供給され
る。The present N 2 supply amount obtained in this way is converted into the valve opening / closing signal 21 per unit time by the valve opening / closing signal output means 20 and the N 2 supply valve driving device 2
Sent to 2. The N 2 supply valve driving device 22 drives the N 2 supply opening / closing valve 23 to supply N 2 from the N 2 supply device.
【００１２】図３にはＯ2濃度制御のタイミングチャー
トを示している。ここで、図１と同一作用効果のものに
は同一符号を付し、その詳細な説明は省略する。図３に
おいて、25は偏差平均変化率演算手段18で算出されるＯ
2濃度平均変化率である。図３はＯ2濃度平均変化率25と
Ｎ2供給のバルブ開閉信号21による開閉率(t-1〜t0斜線
部)ならびにＯ2濃度偏差ΔＤを基に次回のＮ2供給のバ
ルブ開閉信号21での制御を示している(t0〜t1)。FIG. 3 shows a timing chart of the O 2 concentration control. Here, components having the same effects as those in FIG. 1 are designated by the same reference numerals, and detailed description thereof will be omitted. In FIG. 3, 25 is O calculated by the deviation average change rate calculation means 18.
2 The average change rate of concentration. FIG. 3 shows the valve opening / closing signal for the next N 2 supply based on the average change rate 25 of O 2 concentration, the opening / closing rate by the valve opening / closing signal 21 of N 2 supply (shaded area from t −1 to t 0 ) and the O 2 concentration deviation ΔD. The control at 21 is shown (t 0 to t 1 ).
【００１３】このように本実施例によれば、Ｏ2濃度偏
差ΔＤと単位時間ごとのＯ2濃度平均変化率ならびに前
回Ｎ2供給量を算出することにより、今回Ｎ2供給量を調
整しＯ2濃度変動の少ないＮ2リフロー装置を実現するこ
とができる。As described above, according to the present embodiment, the present N 2 supply amount is adjusted by calculating the O 2 concentration deviation ΔD, the O 2 concentration average change rate per unit time, and the previous N 2 supply amount. 2 It is possible to realize an N 2 reflow device with little fluctuation in concentration.
【００１４】なお、バルブ開閉信号21は時間的なデュー
ティを有したパルス波形として表しているが、バルブ開
度を制御する出力信号であってもよい。Although the valve opening / closing signal 21 is shown as a pulse waveform having a temporal duty, it may be an output signal for controlling the valve opening.
【００１５】[0015]
【発明の効果】以上説明したように本発明によれば、Ｏ
2濃度偏差，Ｏ2濃度平均変化率，前回Ｎ2供給量から今
回Ｎ2供給量を制御することにより、Ｏ2濃度変動の少な
いＮ2リフロー装置を実現でき、半田濡れ性の品質の差
異等の問題を解決できるという効果を奏する。As described above, according to the present invention, O
2 density deviation, O 2 concentration average rate, by controlling the current N 2 supply amount from the previous N 2 supply amount, O 2 can be realized with less N 2 reflow machine of density variation, the quality of solder wettability difference, etc. The effect of being able to solve the problem of.
【図１】本発明の実施例であるＮ2リフロー装置の基本
構成図である。FIG. 1 is a basic configuration diagram of an N 2 reflow apparatus that is an embodiment of the present invention.
【図２】本実施例のＮ2供給量の算出用のテーブルマッ
プを示す図である。FIG. 2 is a diagram showing a table map for calculating an N 2 supply amount according to the present embodiment.
【図３】本実施例のＯ2濃度制御のタイミングチャート
である。FIG. 3 is a timing chart of O 2 concentration control according to the present embodiment.
【図４】従来のＯ2濃度制御のタイミングチャートであ
る。FIG. 4 is a timing chart of conventional O 2 concentration control.
１，14…Ｏ2濃度現在値、 ２，16…Ｏ2濃度設定値、
３，21…バルブ開閉信号、 11…Ｎ2リフロー装置本
体、 12…Ｏ2濃度センサ部、 13…Ｏ2濃度測定装置、
15…Ｎ2リフロー制御装置、 17…偏差演算手段、 1
8…偏差平均変化率演算手段、 19…Ｎ2供給量演算手
段、 20…バルブ開閉信号出力手段、 22…Ｎ2供給バ
ルブ駆動装置、 23…Ｎ2供給開閉バルブ、 24…Ｎ2供
給装置、 25…Ｏ2濃度平均変化率。1,14 ... O 2 concentration current value, 2,16 ... O 2 concentration setting value,
3, 21 ... Valve opening / closing signal, 11 ... N 2 reflow device main body, 12 ... O 2 concentration sensor part, 13 ... O 2 concentration measuring device,
15 ... N 2 reflow control device, 17 ... deviation calculation means, 1
8 ... Deviation average change rate calculation means, 19 ... N 2 supply amount calculation means, 20 ... Valve opening / closing signal output means, 22 ... N 2 supply valve driving device, 23 ... N 2 supply opening / closing valve, 24 ... N 2 supply device, 25 ... O 2 concentration average change rate.
Claims (3)
差の時間的変化率を算出しＮ2供給量を制御する制御装
置と、Ｎ2供給装置と、Ｎ2供給バルブ駆動装置とを有す
ることを特徴とするＮ2(窒素)リフロー装置。1. An O 2 (oxygen) concentration measuring device, a control device for controlling a N 2 supply amount by calculating a temporal change rate of deviation of the O 2 concentration, an N 2 supply device, and an N 2 supply valve drive. An N 2 (nitrogen) reflow device having a device.
濃度現在値と外部から入力されるＯ2濃度設定値との偏
差と該偏差の時間的変化率を算出し、Ｎ2供給量を調整
するバルブ開閉信号によりＮ2供給バルブを制御するこ
とを特徴とする請求項１記載のＮ2リフロー装置。2. A control device, O 2 from O 2 concentration measuring device
The present invention is characterized in that a deviation between a current concentration value and an O 2 concentration set value input from the outside and a temporal change rate of the deviation are calculated, and the N 2 supply valve is controlled by a valve opening / closing signal for adjusting the N 2 supply amount. The N 2 reflow apparatus according to claim 1.
単位時間のＮ2供給量との関連を数式もしくはテーブル
マップで記憶する手段を有することを特徴とする請求項
１記載のＮ2リフロー装置。3. A control device, N 2 according to claim 1, further comprising a means for storing a relationship between the temporal change rate and N 2 feed rate of the next unit time deviation equation or table map Reflow equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31195393A JPH07170062A (en) | 1993-12-13 | 1993-12-13 | Nitrogen reflow device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31195393A JPH07170062A (en) | 1993-12-13 | 1993-12-13 | Nitrogen reflow device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07170062A true JPH07170062A (en) | 1995-07-04 |
Family
ID=18023427
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31195393A Pending JPH07170062A (en) | 1993-12-13 | 1993-12-13 | Nitrogen reflow device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07170062A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20150314401A1 (en) * | 2012-12-14 | 2015-11-05 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Portable equipment for monitoring and controlling the level of oxygen in reflow oven atmosphere |
-
1993
- 1993-12-13 JP JP31195393A patent/JPH07170062A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20150314401A1 (en) * | 2012-12-14 | 2015-11-05 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Portable equipment for monitoring and controlling the level of oxygen in reflow oven atmosphere |
| US9539672B2 (en) * | 2012-12-14 | 2017-01-10 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Portable equipment for monitoring and controlling the level of oxygen in reflow oven atmosphere |
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