JPH07167998A - Target for laser plasma x-ray source - Google Patents

Target for laser plasma x-ray source

Info

Publication number
JPH07167998A
JPH07167998A JP5315446A JP31544693A JPH07167998A JP H07167998 A JPH07167998 A JP H07167998A JP 5315446 A JP5315446 A JP 5315446A JP 31544693 A JP31544693 A JP 31544693A JP H07167998 A JPH07167998 A JP H07167998A
Authority
JP
Japan
Prior art keywords
target
target material
ray source
laser
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5315446A
Other languages
Japanese (ja)
Inventor
Hiroyuki Kondo
洋行 近藤
Hisao Fujisaki
久雄 藤崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP5315446A priority Critical patent/JPH07167998A/en
Publication of JPH07167998A publication Critical patent/JPH07167998A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To enable continuous use for many hours with generated X-rays being in a wide range from a short wavelength area to a long wavelength area by using material, formed of an element of specific atomic weight, as a target, and forming the target material in the layer state on a windable base by a vacuum thin film forming method. CONSTITUTION:Target material formed of an element of 150 or more in atomic weight is formed in the layer state on a windable base by a vacuum thin film forming method. Tungsten, lead, tantalum, or the like is desirable as the target material. It is also desirable that a fusing point is 2000 deg.C or higher. Tape like polyethylene, polypropylene, aluminium, copper or the like is desirable as the windable base.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、X線顕微鏡、X線露光
装置、X線分析装置等のX線装置に用いられるレーザー
プラズマX線源用標的に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a target for a laser plasma X-ray source used in an X-ray apparatus such as an X-ray microscope, an X-ray exposure apparatus and an X-ray analysis apparatus.

【0002】[0002]

【従来の技術】減圧された装置内にあるレーザープラズ
マX線源用標的にレーザーを照射すると、X線を放出す
るプラズマが発生する。従来、レーザープラズマX線源
用標的の材料には、銅、鉄、等の原子量の小さい材料が
用いられてきた。
2. Description of the Related Art When a laser plasma X-ray source target in a depressurized apparatus is irradiated with a laser, a plasma that emits X-rays is generated. Conventionally, a material having a small atomic weight such as copper or iron has been used as a target material for a laser plasma X-ray source.

【0003】[0003]

【発明が解決しようとする課題】従来の銅や鉄等の標的
材料は、材料元素の原子量が小さいので、発生するX線
のスペクトルはバンド構造を示す。そのため、特定波長
域のみのX線を使用するときには、問題とならないが、
短波長から長波長に渡って(例えば、1nm程度から数
十nmまで)X線波長を走査しながら使用すると、X線
強度が波長に依存して大きく変化するので、X線源とし
て適当でないという問題点がある。
Since conventional target materials such as copper and iron have a small atomic weight of the material element, the spectrum of the generated X-ray shows a band structure. Therefore, when using X-rays only in a specific wavelength range, there is no problem,
When used while scanning X-ray wavelengths from short wavelengths to long wavelengths (for example, from about 1 nm to several tens of nm), the X-ray intensity changes greatly depending on the wavelength, and is not suitable as an X-ray source. There is a problem.

【0004】本発明の目的は、かかる問題点を解決し、
発生するX線が短波長域から長波長域まで広範囲に渡っ
て連続的であり、またX線強度の波長依存性が小さくて
連続スペクトルに近く、さらに長時間連続使用できるレ
ーザープラズマX線源用標的を提供することにある。
The object of the present invention is to solve these problems,
For laser plasma X-ray sources that generate X-rays that are continuous over a wide range from short-wavelength to long-wavelength, have a small wavelength dependence of X-ray intensity, and have a continuous spectrum, and that can be used continuously for a long time. To provide a target.

【0005】[0005]

【課題を解決するための手段】そのため、本発明は第一
に「レーザーを照射すると、プラズマを発生してX線を
放出するレーザープラズマX線源用標的において、前記
標的は、巻き取り可能な基板上に、原子量150以上の
元素からなる材料を真空薄膜形成法により層状に形成し
てなることを特徴とするレーザープラズマX線源用標的
(請求項1)」を提供する。
Therefore, in the first aspect of the present invention, in a laser plasma X-ray source target which generates plasma and emits X-rays when irradiated with a laser, the target can be wound. A target for a laser plasma X-ray source (claim 1), characterized in that a material comprising an element having an atomic weight of 150 or more is formed in layers on a substrate by a vacuum thin film forming method.

【0006】また、本発明は第二に「前記材料の融点が
2000°C以上であることを特徴とする請求項1記載
のレーザープラズマX線源用標的(請求項2)」 を提
供する。
The present invention secondly provides a "target for a laser plasma X-ray source according to claim 1 (claim 2)" in which the melting point of the material is 2000 ° C or more.

【0007】[0007]

【作用】本発明では、原子量150以上の元素からなる
材料を標的に使用しているので、放出されるX線の波長
域は、短波長から長波長にまで渡り(例えば、1nm程
度から数十nmまで)、またX線強度の波長依存性が小
さい。さらに、標的材料を巻き取り可能な基板上に、真
空薄膜形成法により層状に形成したので、標的を巻き取
ることができる。そのため、レーザーが照射される標的
部分を巻き取りにより変更できるので、標的を巻き取り
ながら長時間連続使用することができる。
In the present invention, since a material made of an element having an atomic weight of 150 or more is used as a target, the wavelength range of emitted X-rays ranges from short wavelength to long wavelength (for example, from 1 nm to several tens of nm). (up to nm), and the wavelength dependence of the X-ray intensity is small. Furthermore, since the target material is formed into a layer by a vacuum thin film forming method on a substrate on which the target can be wound, the target can be wound. Therefore, since the target portion irradiated with the laser can be changed by winding, the target can be continuously used for a long time while winding the target.

【0008】標的材料としては、例えば、タングステ
ン、鉛、タンタル、金等が好ましい。また、巻き取り可
能な基板としては、例えば、テープ状の、ポリエチレ
ン、ポリプロピレン、ポリイミド、アルミニウム、銅、
鉄等が好ましい。特に、耐熱性の良いテープが好まし
い。標的材料は、前記巻き取り可能な基板上に、真空薄
膜形成法により層状に形成されるので、標的材料単体で
は、巻き取り可能な形状(例えば、テープ状)にできな
いような標的材料も使用できる。また、標的材料は層状
に形成されるので、厚さが比較的薄い。そのため、X線
を放出するプラズマからの飛散粒子の量を低減できるの
で、X線光学素子等の飛散粒子による損傷を抑制でき
る。
As the target material, for example, tungsten, lead, tantalum, gold and the like are preferable. The substrate that can be wound is, for example, tape-shaped, polyethylene, polypropylene, polyimide, aluminum, copper,
Iron or the like is preferable. Particularly, a tape having good heat resistance is preferable. Since the target material is formed into a layer on the rollable substrate by the vacuum thin film forming method, a target material that cannot be wound into a rollable shape (for example, a tape shape) can be used as the target material alone. . Further, since the target material is formed in layers, it has a relatively small thickness. Therefore, the amount of scattered particles from the plasma that emits X-rays can be reduced, and damage to the X-ray optical element or the like due to scattered particles can be suppressed.

【0009】ところで、標的材料の融点が2000°C
以上であることが好ましい。X線を放出するプラズマか
らの飛散粒子の量を低減でき、X線光学素子等の飛散粒
子による損傷を抑制できるからである。以下、実施例に
より本発明を具体的に説明するが、本発明はこれに限定
されるものではない。
By the way, the melting point of the target material is 2000 ° C.
The above is preferable. This is because the amount of scattered particles from the plasma that emits X-rays can be reduced, and damage to the X-ray optical element and the like due to scattered particles can be suppressed. Hereinafter, the present invention will be specifically described with reference to Examples, but the present invention is not limited thereto.

【0010】[0010]

【実施例】図1は、本実施例のレーザープラズマX線源
用標的を示す斜視図である。ポリイミドテープ上に真空
薄膜形成法により形成した、タングステン、鉛、又はタ
ンタルからなる厚さ数μmから数十μmのテープ状の標
的102 は、当初リール106 に巻き取られている。
EXAMPLE FIG. 1 is a perspective view showing a target for a laser plasma X-ray source of this example. A tape-shaped target 102 made of tungsten, lead, or tantalum and having a thickness of several μm to several tens μm formed on a polyimide tape by a vacuum thin film forming method is initially wound on a reel 106.

【0011】リール106 ,107には、モーターがそれぞれ
連結されており(図示せず) 、これらのモーターの回転
により、テープ状の標的102 は、リール106 からリール
107に巻き取られる。巻き取りの途中で、パルスレーザ
ー光110 が 標的102 上に照射されると、プラズマが発
生してX線が放出される。レーザー光が照射される標的
部分では、押さえ板103 と、部材105 に取り付けられた
バネによって押さえ板103 に向かって押しつけられてい
る板104 とによって、標的位置がレーザー光110 の光軸
方向に変動しないように挟み込まれている。
Motors are respectively connected to the reels 106 and 107 (not shown), and the tape-shaped target 102 is rotated from the reel 106 to the reel by the rotation of these motors.
It is wound up by 107. When the target 102 is irradiated with the pulsed laser light 110 during winding, plasma is generated and X-rays are emitted. In the target portion irradiated with the laser light, the target position is changed in the optical axis direction of the laser light 110 by the pressing plate 103 and the plate 104 pressed against the pressing plate 103 by the spring attached to the member 105. It is sandwiched so as not to.

【0012】レーザー光110 は、押さえ板103 に設けら
れた穴111 を通って標的102 に照射される。リール106,
107 は、台101 上に回転可能に設けられている。部材10
5 及び押さえ板103 は、台101 上に固定されている。台
101 は、ステージ108 上に取り付けられており、ステー
ジ108 はモーター109 によりA方向に移動できる。テー
プ状標的102 がリール107 に全て巻き取られると、前回
テープ走行時のレーザー照射により、標的102 上に生じ
た孔を少なくとも避けるように、ステージ108 をA方向
に移動する。その後、今度は逆に、リール107 からリー
ル106 に標的102 を巻き取りながらレーザー光を照射す
る。
The laser light 110 is applied to the target 102 through a hole 111 formed in the pressing plate 103. Reel 106,
107 is rotatably provided on the base 101. Member 10
5 and the pressing plate 103 are fixed on the base 101. Stand
101 is mounted on a stage 108, and the stage 108 can be moved in the A direction by a motor 109. When the tape-shaped target 102 is completely wound up on the reel 107, the stage 108 is moved in the direction A so as to avoid at least the holes formed on the target 102 by the laser irradiation during the previous tape running. Then, this time, on the contrary, the laser light is emitted while the target 102 is wound from the reel 107 to the reel 106.

【0013】このようにして、標的102 は複数回、往復
走行させて使用することができる。図2は、巻き取り可
能な基板201 と、その上に形成した薄膜状の標的材料20
2の概略断面図である。図2では、基板201 上の全面に
薄膜状の標的材料202 が形成されているが、図3、図4
に示すように、基板上のレーザー光照射部分だけに標的
材料を形成してもよい。図3では、基板301 上にドット
状の標的材料302 が形成され、また図4では、基板401
上にストライプ状の標的材料402 が形成されている。
In this way, the target 102 can be used by traveling back and forth a plurality of times. FIG. 2 shows a rollable substrate 201 and a thin film target material 20 formed thereon.
2 is a schematic sectional view of FIG. In FIG. 2, the thin film target material 202 is formed on the entire surface of the substrate 201.
As shown in, the target material may be formed only on the portion irradiated with the laser light on the substrate. In FIG. 3, the dot-shaped target material 302 is formed on the substrate 301, and in FIG.
Striped target material 402 is formed on the top.

【0014】なお、標的材料とバインダーを混合したも
のを基板上に塗布して標的を形成することもできる。
It is also possible to form a target by coating a mixture of the target material and the binder on the substrate.

【0015】[0015]

【発明の効果】以上の通り、本発明のレーザープラズマ
X線源用標的によれば、発生するX線が短波長域から長
波長域まで広範囲に渡って連続的であり、またX線強度
の波長依存性が小さくて連続スペクトルに近く、さらに
長時間連続使用できる。
As described above, according to the target for laser plasma X-ray source of the present invention, the generated X-rays are continuous over a wide range from the short wavelength region to the long wavelength region, and the X-ray intensity It has a small wavelength dependence, is close to a continuous spectrum, and can be used continuously for a long time.

【図面の簡単な説明】[Brief description of drawings]

【図1】は、実施例のレーザープラズマX線源用標的を
示す斜視図である。
FIG. 1 is a perspective view showing a target for a laser plasma X-ray source according to an embodiment.

【図2】は、本発明にかかるレーザープラズマX線源用
標的の一例である巻き取り可能な基板201 と、その上に
全面形成した薄膜状の標的材料202 の概略断面図であ
る。
FIG. 2 is a schematic cross-sectional view of a rollable substrate 201 which is an example of a target for a laser plasma X-ray source according to the present invention, and a thin film target material 202 formed on the entire surface thereof.

【図3】は、本発明にかかるレーザープラズマX線源用
標的の別の例である巻き取り可能な基板301 と、その上
にドット状に形成した薄膜状の標的材料302の概略断面
図である。
FIG. 3 is a schematic cross-sectional view of a rollable substrate 301, which is another example of a target for a laser plasma X-ray source according to the present invention, and a thin film target material 302 formed in a dot shape thereon. is there.

【図4】は、本発明にかかるレーザープラズマX線源用
標的のさらに別の例である巻き取り可能な基板401 と、
その上にストライプ状に形成した薄膜状の標的材料402
の概略断面図である。
FIG. 4 is a rollable substrate 401 which is yet another example of a target for a laser plasma X-ray source according to the present invention;
A thin film target material 402 formed in a stripe pattern on the target material 402.
FIG.

【符号の説明】[Explanation of symbols]

101 ・・・台 102 ・・・テープ状の標的( 巻き取り可能な基板の一
例) 103 ・・・第1の押さえ板 104 ・・・第2の押さえ板 105 ・・・部材 106 ・・・第1のリール 107 ・・・第2のリール 108 ・・・ステージ 109 ・・・モーター 110 ・・・レーザー光 111 ・・・第1の押さえ板に設けられた穴 201 ・・・巻き取り可能な基板 202 ・・・基板全面に層状に形成された標的材料 301 ・・・巻き取り可能な基板 302 ・・・基板上にドット状に形成された層状の標的材
料 401 ・・・巻き取り可能な基板 402 ・・・基板上にストライプ状に形成された層状の標
的材料 以 上
101 ・ ・ ・ Stand 102 ・ ・ ・ Tape-shaped target (an example of a substrate that can be wound up) 103 ・ ・ ・ First pressing plate 104 ・ ・ ・ Second pressing plate 105 ・ ・ ・ Member 106 ・ ・ ・1st reel 107 ・ ・ ・ Second reel 108 ・ ・ ・ Stage 109 ・ ・ ・ Motor 110 ・ ・ ・ Laser beam 111 ・ ・ ・ Hole 201 provided in the first pressing plate 201 ・ ・ ・ Rewable substrate 202 ・ ・ ・ Target material formed in layers on the entire surface of substrate 301 ・ ・ ・ Rollable substrate 302 ・ ・ ・ Layered target material formed in dots on the substrate 401 ・ ・ ・ Rollable substrate 402 ... Layered target material formed in stripes on substrate

フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H05G 2/00 Continuation of front page (51) Int.Cl. 6 Identification number Office reference number FI technical display area H05G 2/00

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 レーザーを照射すると、プラズマを発生
してX線を放出するレーザープラズマX線源用標的にお
いて、 前記標的は、巻き取り可能な基板上に、原子量150以
上の元素からなる材料を真空薄膜形成法により層状に形
成してなることを特徴とするレーザープラズマX線源用
標的。
1. A target for a laser plasma X-ray source, which emits X-rays by generating plasma when irradiated with a laser, wherein the target is made of a material composed of an element having an atomic weight of 150 or more on a rollable substrate. A target for a laser plasma X-ray source, which is formed in layers by a vacuum thin film forming method.
【請求項2】 前記材料の融点が2000°C以上であ
ることを特徴とする請求項1記載のレーザープラズマX
線源用標的。
2. The laser plasma X according to claim 1, wherein the melting point of the material is 2000 ° C. or higher.
Source target.
JP5315446A 1993-12-15 1993-12-15 Target for laser plasma x-ray source Pending JPH07167998A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5315446A JPH07167998A (en) 1993-12-15 1993-12-15 Target for laser plasma x-ray source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5315446A JPH07167998A (en) 1993-12-15 1993-12-15 Target for laser plasma x-ray source

Publications (1)

Publication Number Publication Date
JPH07167998A true JPH07167998A (en) 1995-07-04

Family

ID=18065471

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5315446A Pending JPH07167998A (en) 1993-12-15 1993-12-15 Target for laser plasma x-ray source

Country Status (1)

Country Link
JP (1) JPH07167998A (en)

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