JPH07161643A - Vacuum treater - Google Patents

Vacuum treater

Info

Publication number
JPH07161643A
JPH07161643A JP30535793A JP30535793A JPH07161643A JP H07161643 A JPH07161643 A JP H07161643A JP 30535793 A JP30535793 A JP 30535793A JP 30535793 A JP30535793 A JP 30535793A JP H07161643 A JPH07161643 A JP H07161643A
Authority
JP
Japan
Prior art keywords
dry air
exhaust chamber
exhaust
chamber
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30535793A
Other languages
Japanese (ja)
Inventor
Munenori Iwami
見 宗 憲 石
Takashi Fujii
井 崇 藤
Yoshio Kawamata
又 由 雄 川
Toshiyasu Onoda
利 康 小野田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Engineering Works Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Engineering Works Co Ltd filed Critical Shibaura Engineering Works Co Ltd
Priority to JP30535793A priority Critical patent/JPH07161643A/en
Publication of JPH07161643A publication Critical patent/JPH07161643A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To reduce significantly the amount of infiltration of water vapor into an exhaust chamber at the time when a material to be treated is inserted in the exhaust chamber and to make it possible to shorten an exhaust time. CONSTITUTION:Dry air is introduced in an exhaust chamber 3 through a dry air introducing tube 13 before the opening of an entrance door 6 and this introduction is continued during the time ranging from the opening of the door 6 to the shutting of the door 6. When a pressure in the chamber 3 becomes equal to the atmosphere by this introduction of the dry air, the door 6 is opened, a material to be treated is inserted in the chamber 3. At this time, the dry air, which is exhausted from the chamber 3 to the outside, reduces the amount of infiltration of the atmosphere into the chamber 3. After the door 6 is shut, the introduction of the dry air into the chamber 3 is stopped and at the same time, the dry air is sprayed on vacuum sealing materials 8 via grooves 10 through a dry air tube 11. This spray is continued until the pressure in the chamber 3 is made lower than the atmosphere by evacuation using an exhaust valve 4.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は真空処理装置に係り、特
に排気室と真空処理室とが隔離弁を介して隣接し、被処
理物を排気室側から真空処理室に挿入する真空処理装置
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum processing apparatus, and more particularly, to a vacuum processing apparatus in which an exhaust chamber and a vacuum processing chamber are adjacent to each other through an isolation valve, and an object to be processed is inserted from the exhaust chamber side into the vacuum processing chamber. Regarding

【0002】[0002]

【従来の技術】真空処理装置は、ドライエッチング装置
やスパッタリング装置やCVD装置等の半導体製造装置
を含め種々の分野で広く使用されている。このような真
空処理装置は、真空処理室の入口扉を開放して被処理物
を内部に挿入する際に、大気が真空処理室に混入する。
この大気中の窒素や酸素は、蒸気圧が高いので真空処理
室の排気に大きな影響を与えない。しかしながら、大気
中の水蒸気は蒸気圧が約3000Paと低く、真空処理
室の内部に吸着し真空排気中に徐々に放出されるため、
その除去に長時間を要する。特に、真空処理室内部に
は、処理を行うための電極や吸湿性の高い有機物が多く
存在するために、排気に数時間乃至数十時間を要するこ
ともある。
2. Description of the Related Art Vacuum processing apparatuses are widely used in various fields including semiconductor manufacturing apparatuses such as dry etching apparatuses, sputtering apparatuses and CVD apparatuses. In such a vacuum processing apparatus, when the object to be processed is inserted into the vacuum processing chamber by opening the entrance door of the vacuum processing chamber, the atmosphere is mixed into the vacuum processing chamber.
Since nitrogen and oxygen in the atmosphere have a high vapor pressure, they do not significantly affect the exhaust of the vacuum processing chamber. However, the vapor pressure of water vapor in the atmosphere is as low as about 3000 Pa, and it is adsorbed inside the vacuum processing chamber and gradually released into the vacuum exhaust.
It takes a long time to remove it. In particular, it may take several hours to several tens of hours for evacuation because there are many electrodes for processing and organic substances having high hygroscopicity inside the vacuum processing chamber.

【0003】そこで、この排気時間の短縮を図るため
に、高い生産効率が要求される工業生産用の真空処理装
置としては、真空処理室に隔離弁を介して排気室を接続
した構成のものが一般に使用される。この種の真空処理
装置では、最初に排気室の入口扉を開けてそこに被処理
物を挿入し、この入口扉の閉成後に排気室を所定の圧力
まで排気し、その後に隔離弁を開けて被処理物を真空処
理室に挿入する。この場合に、排気室には被処理物の挿
入時に大気が侵入するので、この排気室内への大気の侵
入量をできるだけ少なくするために、入口扉の開放前
に、水蒸気を含有しない窒素ガスなどを排気室に導入し
て排気室を予め昇圧することが行われる。このような排
気室の付設によって、排気時間は数分乃至数十分に短縮
される。
Therefore, as a vacuum processing apparatus for industrial production, which requires high production efficiency in order to reduce the exhaust time, a vacuum processing apparatus having a structure in which an exhaust chamber is connected to a vacuum processing chamber via an isolation valve is used. Commonly used. In this type of vacuum processing apparatus, first open the inlet door of the exhaust chamber, insert the object to be processed into it, exhaust the exhaust chamber to a specified pressure after closing the inlet door, and then open the isolation valve. Insert the object to be processed into the vacuum processing chamber. In this case, the atmosphere enters the exhaust chamber when the object to be treated is inserted.Therefore, in order to minimize the amount of atmospheric invasion into the exhaust chamber, nitrogen gas that does not contain water vapor, etc. should be opened before opening the inlet door. Is introduced into the exhaust chamber to pre-pressurize the exhaust chamber. By providing such an exhaust chamber, the exhaust time can be shortened from several minutes to several tens of minutes.

【0004】最近は、真空処理装置の生産性を高めるた
めに、排気時間のなお一層の短縮が要求されている。例
えば、光磁気ディスクなどを大量生産するスパッタリン
グ成膜用の真空処理装置では、排気時間を数秒乃至数十
秒に短縮することが要求されている。このため、排気ポ
ンプの大容量化や、水蒸気の吸着表面積を縮小するため
の排気室の小型化や、水蒸気の吸着量を低減するための
排気室の加熱などの種々の手段が講じられている。
Recently, in order to improve the productivity of the vacuum processing apparatus, it is required to further reduce the exhaust time. For example, in a vacuum processing apparatus for sputtering film formation that mass-produces magneto-optical disks and the like, it is required to reduce the exhaust time to several seconds to several tens of seconds. Therefore, various means such as increasing the capacity of the exhaust pump, reducing the size of the exhaust chamber to reduce the adsorption surface area of water vapor, and heating the exhaust chamber to reduce the adsorption amount of water vapor have been taken. .

【0005】[0005]

【発明が解決しようとする課題】ところが、従来の真空
処理装置は、いずれも大気中の水蒸気の侵入を阻止、も
しくは低減するものではないため、排気室での水蒸気の
吸着に起因する問題を本質的に解決することはできなか
った。
However, since none of the conventional vacuum processing apparatuses prevent or reduce the invasion of water vapor in the atmosphere, the problem inherent to the adsorption of water vapor in the exhaust chamber is essential. Couldn't be solved.

【0006】具体的には、排気室内表面に吸着した水蒸
気の再放出は単純に排気時間に依存して低下するため、
上述の大容量の排気ポンプを使用しても排気室内表面か
ら放出される水蒸気の量は変化せず、従ってこの水蒸気
が真空処理に悪影響を及ぼすといった問題がある。例え
ば、スパッタリング成膜法にあっては、放出される水蒸
気と堆積膜との相互作用によって、薄膜の品質が低下す
るといった問題がある。
Specifically, since the re-emission of the water vapor adsorbed on the surface of the exhaust chamber simply decreases depending on the exhaust time,
Even if the large-capacity exhaust pump described above is used, the amount of water vapor released from the surface of the exhaust chamber does not change, and therefore, there is a problem that this water vapor adversely affects the vacuum processing. For example, in the sputtering film forming method, there is a problem that the quality of the thin film deteriorates due to the interaction between the released water vapor and the deposited film.

【0007】また、排気室の小型化及び加熱も、被処理
物の挿入時の水蒸気の侵入自体を低減するものではな
い。更に、排気室の小型化は被処理物の大きさによって
制限を受けるし、また加熱は被処理物の耐熱温度によっ
て制限されるといった問題もある。
Further, the size reduction and heating of the exhaust chamber do not reduce the invasion of water vapor itself when the object to be treated is inserted. Further, there is a problem that miniaturization of the exhaust chamber is limited by the size of the object to be processed, and heating is limited by the heat resistant temperature of the object.

【0008】そこで、本発明の目的は、被処理物を排気
室に挿入する時の排気室への水蒸気の侵入量を大幅に低
減し、排気時間を短縮することができる真空処理装置を
提供することにある。
Therefore, an object of the present invention is to provide a vacuum processing apparatus capable of significantly reducing the amount of water vapor entering the exhaust chamber when inserting the object to be processed into the exhaust chamber and shortening the exhaust time. Especially.

【0009】[0009]

【課題を解決するための手段】この目的を達成するため
に本発明は、入口扉とこの入口扉をシールする真空シー
ル材とを備える排気室と、この排気室を真空排気する排
気手段と、隔離弁を介して上記排気室に接続され、上記
排気室から挿入された被処理物を真空処理する真空処理
室とを具備する真空処理装置において、上記入口扉の開
放から閉成までの間、上記排気室に乾燥空気を導入する
乾燥空気導入機構と、上記真空シール材を挟んで大気側
から乾燥空気を上記真空シール材の周囲に吹付け、この
乾燥空気の吹付けを上記排気室の圧力が大気圧よりも小
さくなるまで続行する乾燥空気吹付け機構とを具備する
ことを特徴とするものである。
To achieve this object, the present invention provides an exhaust chamber having an inlet door and a vacuum sealing material for sealing the inlet door, and an exhaust means for exhausting the exhaust chamber to vacuum. In a vacuum processing apparatus comprising a vacuum processing chamber that is connected to the exhaust chamber via an isolation valve and vacuum-processes an object to be processed inserted from the exhaust chamber, during opening to closing of the inlet door, A dry air introduction mechanism for introducing dry air into the exhaust chamber, and a dry air is blown around the vacuum seal material from the atmosphere side with the vacuum seal material sandwiched between the dry air introduction mechanism and the exhaust chamber. With a dry air blowing mechanism that continues until the pressure becomes lower than the atmospheric pressure.

【0010】このような構成にあっては、上記乾燥空気
導入機構は、上記入口扉の開放に先立って上記排気室内
の圧力がほぼ大気圧に等しくなるまで、上記乾燥空気を
上記排気室に導入し、上記入口扉の閉成後に上記乾燥空
気の導入を停止することが望ましい。従来用いられてい
る窒素ガス等を用いた、排気室の昇圧は、入口扉の開弁
と共に、窒素ガスとの供給を停止するものであって、本
質的に、外気の混入を防ぐことは出来ない。
In such a structure, the dry air introducing mechanism introduces the dry air into the exhaust chamber until the pressure in the exhaust chamber becomes substantially equal to the atmospheric pressure before opening the inlet door. However, it is desirable to stop the introduction of the dry air after closing the inlet door. Pressurization of the exhaust chamber using conventionally used nitrogen gas, etc., stops the supply of nitrogen gas together with the opening of the inlet door, and it is essentially impossible to prevent the mixing of outside air. Absent.

【0011】[0011]

【作用】被処理物は開放された入口扉から排気室内に挿
入される。この入口扉が閉成されると、排気室は真空シ
ール材によって密閉され、排気が行われる。
The object to be processed is inserted into the exhaust chamber through the open entrance door. When this inlet door is closed, the exhaust chamber is sealed with a vacuum sealing material and exhaust is performed.

【0012】乾燥空気導入機構は入口扉の開放から閉成
までの間、排気室に乾燥空気を導入する。この乾燥空気
は入口扉の開放時に排気室から外部に流出し、大気中の
水蒸気が排気室内に侵入することを阻止、または低減す
る。
The dry air introducing mechanism introduces dry air into the exhaust chamber during the period from the opening of the inlet door to the closing thereof. This dry air flows out from the exhaust chamber to the outside when the inlet door is opened, and prevents or reduces water vapor in the atmosphere from entering the exhaust chamber.

【0013】乾燥空気吹付け機構は、入口扉の閉成時に
乾燥空気を真空シール材の周囲に吹付け、この乾燥空気
の吹付けを上記排気室の圧力が大気圧よりも小さくなる
まで続行する。これによって、排気室の排気開始の際に
真空シール材ととびらのすきまから吸引される気体は、
水蒸気を含まない、乾燥空気となり、排気開始に伴なう
水蒸気の吸引を防ぐことができる。
The dry air blowing mechanism blows dry air around the vacuum seal material when the inlet door is closed, and continues blowing the dry air until the pressure in the exhaust chamber becomes lower than atmospheric pressure. . As a result, the gas sucked from the gap between the vacuum seal material and the door at the time of starting the exhaust of the exhaust chamber,
It becomes dry air that does not contain water vapor, and it is possible to prevent suction of water vapor accompanying the start of exhaust.

【0014】排気室が充分に排気された後に隔離弁が開
放され、被処理物は排気室から真空処理室に挿入され、
真空処理を受ける。
After the exhaust chamber is sufficiently exhausted, the isolation valve is opened, the object to be processed is inserted from the exhaust chamber into the vacuum processing chamber,
Receive vacuum treatment.

【0015】図2は、排気室の入口扉を所定時間だけ開
放した後に、一定時間の排気を行った時の到達圧力を測
定した実験結果を示したグラフであり、横軸が排気室の
入口扉の開放時間で、縦軸が到達圧力である。
FIG. 2 is a graph showing the experimental results of measuring the ultimate pressure when the exhaust chamber inlet door was opened for a predetermined time and then exhausted for a certain period of time. The horizontal axis represents the inlet of the exhaust chamber. Door opening time, the vertical axis is the ultimate pressure.

【0016】同図において、線aは入口扉の開放中、特
別な措置を施さない場合であり、線bは入口扉の開放
中、窒素を排気室に導入し入口扉から外部に放出した場
合であり、線cは入口扉の開放中、乾燥空気を排気室に
導入し入口扉から外部に放出した場合である。線aでは
到達圧力は入口扉の開放時間に大きく依存し、入口扉の
開放時間が長くなるにつれて到達圧力も大きくなってし
まうことが分かる。他方、入口扉の開放中に窒素または
乾燥空気を放出した場合には、線b及び線cに示したよ
うに到達圧力は入口扉の開放時間にあまり依存しなくな
り、ほぼ一定となる。これは、窒素または乾燥空気の放
出によって排気室への大気の侵入量が減少し、水蒸気の
吸着量が低減されたことを表している。
In the figure, line a is the case where no special measures are taken during the opening of the entrance door, and line b is the case where nitrogen is introduced into the exhaust chamber and released outside through the entrance door during the opening of the entrance door. The line c is the case where the dry air is introduced into the exhaust chamber and is discharged to the outside through the inlet door while the inlet door is open. It can be seen from the line a that the ultimate pressure greatly depends on the opening time of the entrance door, and the ultimate pressure increases as the opening time of the entrance door increases. On the other hand, when nitrogen or dry air is released during the opening of the entrance door, the ultimate pressure becomes almost constant and does not depend on the opening time of the entrance door as shown by the lines b and c. This indicates that the release of nitrogen or dry air reduced the amount of atmospheric air entering the exhaust chamber and the amount of water vapor adsorbed.

【0017】入口扉の開放中の窒素の放出は、被処理物
を排気室に挿入する作業者の窒息などを招く恐れがある
ので、本発明では乾燥空気を使用する。
The release of nitrogen during opening of the inlet door may cause choking of an operator who inserts the object to be processed into the exhaust chamber. Therefore, dry air is used in the present invention.

【0018】図3は、乾燥空気を放出しながら入口扉を
開放し、その後に入口扉を閉成して所定時間だけ排気を
行った時の到達圧力を測定した実験結果を示したグラフ
である。このグラフにおいて、線aは、入口扉を単に閉
じた後に排気を行った場合であり、線bは入口扉をネジ
止めによって固定した後に排気を行った場合であり、線
cは入口扉を閉じた後に、乾燥空気を外部側から入口扉
のゴム製ガスケットの周囲に吹付けながら排気を行った
場合である。
FIG. 3 is a graph showing an experimental result obtained by measuring the ultimate pressure when the inlet door is opened while releasing the dry air, and then the inlet door is closed and exhaust is performed for a predetermined time. . In this graph, the line a is the case where the exhaust is performed after the inlet door is simply closed, the line b is the case where the exhaust is performed after the inlet door is fixed by screwing, and the line c is the case where the inlet door is closed. After that, the dry air is blown from outside to blow around the rubber gasket of the entrance door.

【0019】この図において、入口扉を単に閉じた後に
排気を行った場合には、排気によってガスケットと入口
扉との間の極く僅かな隙間から大気が吸引され、この大
気中の水蒸気が排気室内に吸着するため、到達圧力が下
がらない、即ち排気時間が長くなってしまう。これに対
して、ネジ止めした場合は大気の吸引がなくなり、到達
圧力を下げることができる。同様に、乾燥空気をガスケ
ットの周囲に吹付けた場合には、ガスケットの周囲の水
蒸気は、乾燥空気によってガスケット近傍から除去され
るため、排気室内の排気作用によって吸引されるのは乾
燥空気のみとなり、水蒸気の吸引はなくなるため到達圧
力を下げることができる。
In this figure, when the air is exhausted after the inlet door is simply closed, the air is sucked from the very small gap between the gasket and the inlet door by the exhaust, and the water vapor in the air is exhausted. Since it is adsorbed in the room, the ultimate pressure does not decrease, that is, the exhaust time becomes long. On the other hand, when the screws are used, atmospheric suction is eliminated, and the ultimate pressure can be lowered. Similarly, when dry air is blown around the gasket, the water vapor around the gasket is removed from the vicinity of the gasket by the dry air, so only the dry air is sucked by the exhaust action in the exhaust chamber. Since the suction of water vapor is eliminated, the ultimate pressure can be lowered.

【0020】本発明は、上述の実験結果の知見に基づ
き、入口扉の開放時に乾燥空気をそこから外部に放出し
て大気中の水蒸気の侵入を低減し、かつ真空シール材の
周囲への乾燥空気の吹付けによって真空シール材周囲か
らの水蒸気の吸着を低減するものである。
The present invention is based on the knowledge of the above experimental results that when the entrance door is opened, it releases dry air to the outside to reduce the invasion of water vapor in the atmosphere and to dry the vacuum sealing material around the circumference. By spraying air, adsorption of water vapor around the vacuum seal material is reduced.

【0021】[0021]

【実施例】以下に本発明による真空処理装置の実施例を
図1を参照して説明する。図1において、真空処理室1
には隔離弁2を介して排気室3が接続されている。この
排気室3には、排気弁4を介して排気管5が連通され、
この排気管5には図示を省略した排気ポンプが接続され
ている。また、排気室3の入口扉6に対向する排気室3
のフランジ面7には、真空シール用のゴムパッキン8を
収容するリング状溝9が刻設されると共に、このリング
状溝9の外側にリング状の乾燥空気吹出し溝10が刻設
されている。この乾燥空気吹出し溝10には乾燥空気管
11が連通し、この乾燥空気管11には遮断弁12が設
置されている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the vacuum processing apparatus according to the present invention will be described below with reference to FIG. In FIG. 1, a vacuum processing chamber 1
An exhaust chamber 3 is connected to the via an isolation valve 2. An exhaust pipe 5 is connected to the exhaust chamber 3 via an exhaust valve 4,
An exhaust pump (not shown) is connected to the exhaust pipe 5. Further, the exhaust chamber 3 facing the inlet door 6 of the exhaust chamber 3
A ring-shaped groove 9 for accommodating a rubber packing 8 for vacuum seal is engraved on the flange surface 7, and a ring-shaped dry air blowing groove 10 is engraved on the outer side of the ring-shaped groove 9. . A dry air pipe 11 communicates with the dry air blowing groove 10, and a cutoff valve 12 is installed in the dry air pipe 11.

【0022】排気室3の側壁には乾燥空気導入管13が
設置され、この乾燥空気導入管13には遮断弁14が取
付けられている。また、排気室3には、排気室内の圧力
を測定する圧力計15が取付けられている。
A dry air introducing pipe 13 is installed on the side wall of the exhaust chamber 3, and a shutoff valve 14 is attached to the dry air introducing pipe 13. A pressure gauge 15 for measuring the pressure inside the exhaust chamber is attached to the exhaust chamber 3.

【0023】次に、この実施例の作用を説明する。遮断
弁14が開弁され、乾燥空気が乾燥空気導入管13から
排気室3内に導入される。この乾燥空気の導入によって
排気室3内の圧力が大気圧に等しくなったことを圧力計
15が検出すると、この検出に応じて、入口扉6が開放
され、図示を省略した被処理物搬送装置によって被処理
物が排気室3内に挿入される。この間、遮断弁14は開
弁状態のままであるので、乾燥空気は乾燥空気導入管1
3から排気室3内に放出されており、入口扉6の開放時
に外部に流出する。
Next, the operation of this embodiment will be described. The shutoff valve 14 is opened, and dry air is introduced into the exhaust chamber 3 through the dry air introducing pipe 13. When the pressure gauge 15 detects that the pressure in the exhaust chamber 3 has become equal to the atmospheric pressure due to the introduction of the dry air, the inlet door 6 is opened in response to this detection, and the object transporting device not shown is shown. Thus, the object to be processed is inserted into the exhaust chamber 3. During this time, the shut-off valve 14 remains open, so that the dry air is fed to the dry air introduction pipe 1
3 is discharged into the exhaust chamber 3 and flows out to the outside when the entrance door 6 is opened.

【0024】このように、入口扉6の開放時には乾燥空
気が排気室3から外部に流出し続け、これによって排気
室3内への大気の侵入を阻止、または低減する。
Thus, when the inlet door 6 is opened, the dry air continues to flow out from the exhaust chamber 3 to prevent or reduce the invasion of the atmosphere into the exhaust chamber 3.

【0025】被処理物の挿入後、直ちに入口扉6が閉成
され、この入口扉6の閉成後に、遮断弁14が閉弁され
て排気室3内への乾燥空気の導入を停止する。これと同
時またはその後に、遮断弁12が開弁され、これによっ
て乾燥空気が乾燥空気吹出し溝10から噴出し、この乾
燥空気はゴムパッキン8の周囲に吹付けられる。次い
で、排気弁4が開弁され排気室3が排気されて、ゴムパ
ッキン8の周囲に吹付けられた乾燥空気も、ゴムパッキ
ン8の周囲の水蒸気と共に排気される。
Immediately after the object to be processed is inserted, the inlet door 6 is closed, and after the inlet door 6 is closed, the shutoff valve 14 is closed to stop the introduction of dry air into the exhaust chamber 3. Simultaneously with or after this, the shutoff valve 12 is opened, whereby the dry air is ejected from the dry air blowing groove 10, and the dry air is blown around the rubber packing 8. Next, the exhaust valve 4 is opened, the exhaust chamber 3 is exhausted, and the dry air blown around the rubber packing 8 is also exhausted together with the water vapor around the rubber packing 8.

【0026】この排気室3内の圧力が大気圧よりも小さ
くなると、これを検出した圧力計15の検出出力に応じ
て遮断弁12が閉弁され、この閉弁によって、乾燥空気
吹出し溝10からの乾燥空気の噴出が停止される。
When the pressure in the exhaust chamber 3 becomes lower than the atmospheric pressure, the shut-off valve 12 is closed according to the detection output of the pressure gauge 15 which detects the pressure. Of the dry air is stopped.

【0027】その後に、排気室3が所定圧まで充分に排
気されると、排気弁4が閉弁されると共に、隔離弁2が
開弁され、排気室3内の被処理物が隔離弁2を介して真
空処理室1に挿入される。この後に、隔離弁2が閉弁さ
れ、被処理物が真空処理室1で真空処理される。その
後、上述の操作が繰り返される。
After that, when the exhaust chamber 3 is sufficiently exhausted to a predetermined pressure, the exhaust valve 4 is closed, the isolation valve 2 is opened, and the object to be treated in the exhaust chamber 3 is isolated from the isolation valve 2. It is inserted into the vacuum processing chamber 1 via. After this, the isolation valve 2 is closed, and the object to be processed is vacuum-processed in the vacuum processing chamber 1. Then, the above operation is repeated.

【0028】このように、入口扉6の開放中、乾燥空気
の放出によって排気室への大気の侵入を低減し、かつ入
口扉6の閉成時に、ゴムパッキン8の周囲への乾燥空気
の吹付けによってゴムパッキン8付近の水蒸気を排気す
るので、排気室内での水蒸気の吸着を充分に減少させる
ことができ、排気時間が大幅に短縮される。
As described above, during the opening of the inlet door 6, the invasion of the atmosphere into the exhaust chamber is reduced by releasing the dry air, and when the inlet door 6 is closed, the dry air is blown around the rubber packing 8. Since the water vapor in the vicinity of the rubber packing 8 is exhausted by the attachment, the adsorption of the water vapor in the exhaust chamber can be sufficiently reduced, and the exhaust time can be greatly shortened.

【0029】なお、上記の実施例では、乾燥空気吹出し
溝10を排気室3のフランジ面7に刻設し、乾燥空気管
11を排気室3に形成した。しかしながら、この乾燥空
気吹出し溝10及び乾燥空気管11は入口扉6側に設け
ることもできる。
In the above embodiment, the dry air blowing groove 10 is formed on the flange surface 7 of the exhaust chamber 3 and the dry air pipe 11 is formed in the exhaust chamber 3. However, the dry air blowing groove 10 and the dry air pipe 11 may be provided on the inlet door 6 side.

【0030】[0030]

【発明の効果】以上の説明から明らかなように本発明に
よれば、入口扉の開放から閉成までの間、排気室に乾燥
空気を導入する乾燥空気導入機構と、真空シール材を挟
んで大気側から乾燥空気を真空シール材の周囲に吹付
け、この乾燥空気の吹付けを排気室の圧力が大気圧より
も小さくなるまで続行する乾燥空気吹付け機構とを具備
し、入口扉の開放時に乾燥空気をそこから外部に放出し
て大気中の水蒸気の侵入を低減し、かつ真空シール材の
周囲への乾燥空気の吹付けによって真空シール材周囲か
らの水蒸気の吸着を低減するので、排気室内での水蒸気
の吸着を充分に減少させることができ、排気時間を大幅
に短縮することができる。
As is apparent from the above description, according to the present invention, the dry air introduction mechanism for introducing dry air into the exhaust chamber and the vacuum sealing material are sandwiched between the opening and closing of the inlet door. Equipped with a dry air blowing mechanism that blows dry air around the vacuum seal material from the atmosphere side and continues blowing this dry air until the pressure in the exhaust chamber becomes lower than atmospheric pressure, and opens the entrance door. Occasionally, dry air is released to the outside to reduce the intrusion of water vapor in the atmosphere, and by spraying dry air around the vacuum seal material, the adsorption of water vapor around the vacuum seal material is reduced. Adsorption of water vapor in the room can be sufficiently reduced, and exhaust time can be greatly shortened.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による真空処理装置の実施例を概略的に
示した断面図。
FIG. 1 is a sectional view schematically showing an embodiment of a vacuum processing apparatus according to the present invention.

【図2】入口扉の開放時間と到達圧力との関係を示した
グラフ。
FIG. 2 is a graph showing the relationship between the opening time of the entrance door and the ultimate pressure.

【図3】排気時間と到達圧力との関係を示したグラフ。FIG. 3 is a graph showing the relationship between exhaust time and ultimate pressure.

【符号の説明】[Explanation of symbols]

1 真空処理室 2 隔離弁 3 排気室 4 排気弁 5 排気管 4、5 排気手段 6 入口扉 8 真空シール材 10 乾燥空気吹出し溝 11 乾燥空気管 12 遮断弁 10、11、12 乾燥空気吹付け機構 13 乾燥空気導入管 14 遮断弁 13、14 乾燥空気導入機構 DESCRIPTION OF SYMBOLS 1 Vacuum processing chamber 2 Isolation valve 3 Exhaust chamber 4 Exhaust valve 5 Exhaust pipe 4, 5 Exhaust means 6 Entrance door 8 Vacuum sealing material 10 Dry air blowing groove 11 Dry air pipe 12 Shutoff valve 10, 11, 12 Dry air blowing mechanism 13 dry air introduction pipe 14 shutoff valve 13, 14 dry air introduction mechanism

───────────────────────────────────────────────────── フロントページの続き (72)発明者 小野田 利 康 神奈川県座間市相模が丘6丁目25番22号 株式会社芝浦製作所相模工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Toshiyasu Onoda 6-25-22 Sagamigaoka, Zama city, Kanagawa Shibaura Plant Sagami Plant

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】入口扉とこの入口扉をシールする真空シー
ル材とを備える排気室と、この排気室を真空排気する排
気手段と、隔離弁を介して上記排気室に接続され、上記
排気室から挿入された被処理物を真空処理する真空処理
室とを具備する真空処理装置において、上記入口扉の開
放から閉成までの間、上記排気室に乾燥空気を導入する
乾燥空気導入機構と、上記真空シール材を挟んで大気側
から乾燥空気を上記真空シール材の周囲に吹付け、この
乾燥空気の吹付けを上記排気室の圧力が大気圧よりも小
さくなるまで続行する乾燥空気吹付け機構とを具備する
ことを特徴とする真空処理装置。
1. An exhaust chamber provided with an inlet door and a vacuum sealing material for sealing the inlet door, an exhaust means for vacuum exhausting the exhaust chamber, and an exhaust chamber connected to the exhaust chamber via an isolation valve. In a vacuum processing apparatus comprising a vacuum processing chamber for vacuum processing the object to be processed inserted from, during the opening to closing of the inlet door, a dry air introduction mechanism for introducing dry air into the exhaust chamber, A dry air blowing mechanism that blows dry air around the vacuum seal material from the atmosphere side across the vacuum seal material and continues blowing the dry air until the pressure in the exhaust chamber becomes lower than atmospheric pressure. A vacuum processing apparatus comprising:
【請求項2】上記乾燥空気導入機構は上記入口扉の開放
に先立って上記排気室内の圧力がほぼ大気圧に等しくな
るまで、上記乾燥空気を上記排気室に導入し、上記入口
扉の閉成後に上記乾燥空気の導入を停止することを特徴
とする請求項1に記載の真空処理装置。
2. The dry air introducing mechanism introduces the dry air into the exhaust chamber and closes the inlet door until the pressure in the exhaust chamber becomes substantially equal to the atmospheric pressure prior to opening the inlet door. The vacuum processing apparatus according to claim 1, wherein the introduction of the dry air is stopped later.
JP30535793A 1993-12-06 1993-12-06 Vacuum treater Pending JPH07161643A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30535793A JPH07161643A (en) 1993-12-06 1993-12-06 Vacuum treater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30535793A JPH07161643A (en) 1993-12-06 1993-12-06 Vacuum treater

Publications (1)

Publication Number Publication Date
JPH07161643A true JPH07161643A (en) 1995-06-23

Family

ID=17944147

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30535793A Pending JPH07161643A (en) 1993-12-06 1993-12-06 Vacuum treater

Country Status (1)

Country Link
JP (1) JPH07161643A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8945340B2 (en) 2009-02-12 2015-02-03 Tokyo Electron Limited Plasma processing apparatus, and maintenance method and assembling method of the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8945340B2 (en) 2009-02-12 2015-02-03 Tokyo Electron Limited Plasma processing apparatus, and maintenance method and assembling method of the same

Similar Documents

Publication Publication Date Title
KR100316300B1 (en) Plasma processing apparatus and method of plasma cleaning a plasma processing apparatus
JP3501524B2 (en) Vacuum exhaust system for processing equipment
JPH0137476B2 (en)
JPS6312336A (en) Method of supplying very high purity gas and its supplying system
JPH07161643A (en) Vacuum treater
JPH04100222A (en) Vacuum treatment method
JP2772835B2 (en) Substrate processing apparatus and vacuum processing method
JP3856397B2 (en) Wafer processing method for semiconductor manufacturing apparatus and semiconductor manufacturing apparatus
JPH0783011B2 (en) Decompression treatment method and device
JP2001070781A (en) Vacuum treatment device
JPH0982594A (en) Depressurizing method for chamber in semiconductor manufacturing equipment
JP2001060555A (en) Substrate treating method
JP3595508B2 (en) Semiconductor manufacturing equipment
JP2520592Y2 (en) Decompression exhaust device
JPH0245920A (en) Semiconductor manufacturing device
JPH0693427A (en) Formation of film in vacuum
KR960006957B1 (en) Vacuum system of etching apparatus and operating method thereof
JP2002198411A (en) Pressure control method, transfer apparatus, and cluster tool
JPH11335843A (en) Airtightness testing device and film forming device
KR0122609Y1 (en) Device for manufacturing a semiconductor device
JPS6119294B2 (en)
JPH0631154A (en) Vacuum device
JPH10326730A (en) Semiconductor manufacturing device and its maintenance method
JP2002118067A (en) Vacuum treatment method and apparatus thereof
JP2000271469A (en) Vacuum treating device