JPH07159380A - Connecting part inspecting method in mounting lsi chip, etc. - Google Patents

Connecting part inspecting method in mounting lsi chip, etc.

Info

Publication number
JPH07159380A
JPH07159380A JP5340480A JP34048093A JPH07159380A JP H07159380 A JPH07159380 A JP H07159380A JP 5340480 A JP5340480 A JP 5340480A JP 34048093 A JP34048093 A JP 34048093A JP H07159380 A JPH07159380 A JP H07159380A
Authority
JP
Japan
Prior art keywords
conductive particles
electrode
particle
chip
inspecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5340480A
Other languages
Japanese (ja)
Inventor
Tsutomu Sakatsu
務 坂津
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP5340480A priority Critical patent/JPH07159380A/en
Publication of JPH07159380A publication Critical patent/JPH07159380A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To perform the direct, accurate detection of the connecting state of electrodes and a conductive particle by casting infrared rays on the conducting particle as the modulation light from the outside, oscillating the particle, and detecting the difference in oscillating mode. CONSTITUTION:Infrared rays 7 transmitted through an Si chip 4 are condensed on a chip electrode 5 by a condenser lens, and a conductive particle 3 is irradiated. Then, the particle 3 receives periodic energy, and thermal oscillation occurs. When the frequency of the infrared rays is matched with the natural oscillation of the particle 3, the large steady-state oscillation occurs in the particle 3. At this time, the oscillation mode and the resonant frequency are different depending on the sufficient/insufficient connection between the substrate-side electrode 2 and the electrode 5, and the particle 3. Then, the modulating frequency of the light is adequately changed, and the quality of the connection of the particle 3 with the electrodes 2 and 5 can be detected. In this way, the defective conduction of the connecting part, when the electric connection between the electrodes is carried out through the conductive particle, can be directly detected in high accuracy.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は導電性粒子を介在させて
電極間を接続したLSI、その他電子デバイス等のフェ
イスダウン実装における接続部の検査方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for inspecting a connection portion in face-down mounting of an LSI or other electronic device in which electrodes are connected via conductive particles.

【0002】[0002]

【従来の技術】従来、基板に直接チップを搭載する、い
わゆるベアチップLSI実装技術において、電極間に導
電性粒子を介在させることにより電気的接続を実現する
異方性導電接続方式が用いられる場合、導電性粒子が上
下電極に十分接触していないため、導通不良を招くこと
があった。
2. Description of the Related Art Conventionally, in a so-called bare chip LSI mounting technique in which a chip is directly mounted on a substrate, when an anisotropic conductive connection method is used which realizes electrical connection by interposing conductive particles between electrodes, Since the conductive particles are not in sufficient contact with the upper and lower electrodes, poor conduction may be caused.

【0003】この接続は、図6で示すように、Siチッ
プ4はフェイスダウンで実装され、Siチップ4と基板
1は互いに向き合った状態で導電性粒子3を介して電気
的に接続されているため、接合部は光学的に不透明であ
り、外部からは見えない。なお、2は基板側電極、11
は接着剤である。このような接続構造において、例え
ば、図7に示す場合、導電性粒子3の粒径にばらつきが
あり、小径の導電性粒子は上部のチップ電極5と接続し
ていないが、この様子は外観検査では発見できない。な
お、6はパッシベーション膜である。
In this connection, as shown in FIG. 6, the Si chip 4 is mounted face down, and the Si chip 4 and the substrate 1 are electrically connected to each other through the conductive particles 3 while facing each other. Therefore, the joint is optically opaque and invisible from the outside. In addition, 2 is a substrate side electrode, 11
Is an adhesive. In such a connection structure, for example, in the case shown in FIG. 7, the particle size of the conductive particles 3 varies, and the conductive particles having a small diameter are not connected to the upper chip electrode 5. I can't find it. In addition, 6 is a passivation film.

【0004】[0004]

【発明が解決しようとする課題】そこで、一般に電気的
なチェックが行われている。すなわち、プローブを各端
子間に接触させて検査が行われるが、プローブを当てる
ためのスペースを確保しなければないないこと、また、
端子と導電性粒子の接合不足等の初期不良を発見するこ
とが困難であること等の問題があった。
Therefore, an electrical check is generally performed. That is, the inspection is performed by bringing the probe into contact with each terminal, but it is necessary to secure a space for hitting the probe, and
There is a problem that it is difficult to find an initial defect such as insufficient bonding between the terminal and the conductive particles.

【0005】その他、音響顕微鏡検査による方法も知ら
れている(TO858A ProcIEEE/CHMT
Int Electron Manuf Techn
ol Symp VOL. 9th PAGE. 92
−97 1990)が、超音波顕微鏡で外部より振動を
伝達している方法をとっているため、伝達経路すべての
情報が混じった信号が得られてしまい、検出精度に問題
がある。
In addition, a method based on acoustic microscopy is also known (TO858A ProcIEEE / CHMT).
Int Electron Manuf Techn
ol Symp VOL. 9th PAGE. 92
-97 1990) adopts a method in which vibration is transmitted from the outside with an ultrasonic microscope, so that a signal in which information of all transmission paths is mixed is obtained, and there is a problem in detection accuracy.

【0006】本発明はこのような点に鑑みてなされたも
ので、LSIチップ等のフェイスダウン実装において、
導電性粒子を介在させて電極間の電気的接続を行った場
合の接続部の導通不良を直接、かつ、精度よく検出しう
る接続評価方法を提供することを目的とする。
The present invention has been made in view of the above points, and in face-down mounting of an LSI chip or the like,
It is an object of the present invention to provide a connection evaluation method capable of directly and accurately detecting a conduction failure in a connection portion when electrically connecting electrodes by interposing conductive particles.

【0006】[0006]

【課題を解決するための手段】本発明によれば、第一
に、LSIチップ等の電極と基板側電極とを導電性粒子
を介在させてフェイスダウンにより電気的に接続した場
合の接続部の検査方法において、該導電性粒子を振動さ
せ、その振動モードの違いにより該電極と該導電性粒子
の接合状態を検出することを特徴とするLSIチップ等
の実装における接続部検査方法が提供される。
According to the present invention, firstly, a connection portion when an electrode such as an LSI chip and a substrate-side electrode are electrically connected face down with conductive particles interposed A method for inspecting a connection portion in mounting an LSI chip or the like, characterized in that the conductive particles are vibrated, and a bonding state between the electrode and the conductive particles is detected by a difference in vibration mode. .

【0007】第二に、上記において、前記導電性粒子の
振動は、赤外線光を変調光として、チップの裏面より透
過させ、接合部の電極部を照射することにより行うこと
を特徴とするLSIチップ等の実装における接続部検査
方法が提供される。
Secondly, in the above, the vibration of the conductive particles is performed by transmitting infrared light as modulated light from the back surface of the chip and irradiating the electrode portion of the joint portion. A method for inspecting a connection part in mounting the same is provided.

【0008】第三に、上記において、前記導電性粒子の
振動は、基板側引き出し電極を反射板として用い、変調
励起光を導電性粒子に照射することにより行うことを特
徴とするLSIチップ等の実装における接続部検査方法
が提供される。
Thirdly, in the above description, the vibration of the conductive particles is performed by irradiating the conductive particles with modulated excitation light by using the substrate side extraction electrode as a reflection plate. A connection inspection method in packaging is provided.

【0009】第四に、上記において、前記導電性粒子の
振動は、LSIチップ裏面に変調光を照射し、照射位置
を時間で変化させることより走査速度と超音波伝播速度
との関係より弾性合成波面を発生させ、LSI電極部の
導電性粒子を振動させることにより行うことを特徴とす
るLSIチップ等の実装における接続部検査方法が提供
される。
Fourthly, in the above description, the vibration of the conductive particles is elastically synthesized by irradiating the back surface of the LSI chip with modulated light and changing the irradiation position with time to obtain the elastic combination based on the relationship between the scanning speed and the ultrasonic wave propagation speed. Provided is a method for inspecting a connection portion in mounting an LSI chip or the like, which is performed by generating a wave front and vibrating conductive particles in an LSI electrode portion.

【0010】第五に、上記において、前記導電性粒子の
振動は、引き出し電極に伝わる弾性波を検出することよ
り行うことを特徴とするLSIチップ等の実装における
接続部検査方法が提供される。
Fifth, in the above, there is provided a method for inspecting a connection portion in mounting an LSI chip or the like, characterized in that the vibration of the conductive particles is performed by detecting an elastic wave transmitted to an extraction electrode.

【0011】第六に、LSIチップの電極と基板側電極
とを導電性粒子を介在させてフェイダウンにより電気的
に接続した場合の接続部の検査方法において、接続部周
辺より熱を与え、導電性粒子を伝わる熱を検出し、その
熱伝導性の違いにより該電極と該導電性粒子の接合状態
を検出することを特徴とするLSIチップ等の実装にお
ける接続部検査方法が提供される。
Sixth, in the method of inspecting the connection portion when the electrodes of the LSI chip and the electrodes on the substrate side are electrically connected by the faying with the conductive particles interposed, heat is applied from the periphery of the connection portion to conduct electricity. Provided is a method for inspecting a connection portion in mounting an LSI chip or the like, which detects heat transmitted through a conductive particle and detects a bonding state between the electrode and the conductive particle based on a difference in thermal conductivity.

【0012】[0012]

【作用】第一の接続部検査方法は、導電性粒子を振動さ
せ、その振動モードの違いにより電極と導電性粒子の接
合状態を検出する構成としたため、接合状態を直接検出
することができ、しかも電気的なチェックを行う場合に
比べ、初期的な抵抗値チェックでは発見できないような
接合不足や、その他接合部の状態観察を行なうことも可
能である。
In the first connection portion inspection method, the conductive particles are vibrated and the bonding state between the electrode and the conductive particles is detected by the difference in the vibration mode, so that the bonding state can be directly detected. Moreover, as compared with the case of performing an electrical check, it is also possible to perform a joint shortage that cannot be found by an initial resistance value check and to observe the state of other joints.

【0013】第二の接続部検査方法は、前記導電性粒子
の振動を、赤外線光を変調光として、外部から導電性粒
子を照射することにより行う構成としたため、フェイス
ダウンで実装されているLSIでは、LSIのチップ裏
面より電極部を照射することができ、それに接する導電
性粒子の振動を効率的、かつ、精度よく行える。
In the second method for inspecting a connecting portion, since the conductive particles are vibrated by irradiating the conductive particles from outside with infrared light as modulated light, the LSI mounted face down. Then, the electrode portion can be irradiated from the back surface of the LSI chip, and the vibration of the conductive particles in contact therewith can be performed efficiently and accurately.

【0014】第三の接続部検査方法は、前記導電性粒子
の振動を、基板側引き出し電極を反射板として用い、変
調励起光を導電性粒子に照射することにより行う構成と
したため、上記第一、第二の方法と比較して、容易に導
電性粒子に励起光を直接照射でき、効率的に振動を行う
ことができる。
In the third method for inspecting a connecting portion, the conductive particles are vibrated by irradiating the conductive particles with modulated excitation light by using the substrate-side extraction electrode as a reflection plate. In comparison with the second method, the conductive particles can be easily irradiated directly with the excitation light, and the vibration can be efficiently performed.

【0015】第四の接続部検査方法は、前記導電性粒子
の振動を、LSIチップ裏面に変調光を照射し、照射位
置を時間で変化させることにより走査速度と超音波伝播
速度との関係より弾性合成波面を生成し、LSI電極部
の導電性粒子を振動させることにより行う構成としたた
め、光学的に不透明なLSIの向う側にある導電性粒子
にも波面を集束させ、振動を与えることができる。
In a fourth method for inspecting a connecting portion, the vibration of the conductive particles is irradiated to the back surface of the LSI chip with modulated light, and the irradiation position is changed with time to obtain the relationship between the scanning speed and the ultrasonic wave propagation speed. Since the elastic synthetic wavefront is generated and the conductive particles of the LSI electrode portion are vibrated, the wavefront can be focused and vibrated even to the conductive particles on the opposite side of the optically opaque LSI. .

【0016】第五の接続部検査方法は、前記導電性粒子
の振動を、引き出し電極に伝わる弾性波を検出すること
により行う構成としたため、導電性粒子の振動を実装構
造を壊さずに容易に外部から測定できる。
In the fifth method of inspecting a connecting portion, the conductive particles are vibrated by detecting the elastic wave transmitted to the extraction electrode. Therefore, the vibration of the conductive particles can be easily performed without damaging the mounting structure. It can be measured from the outside.

【0017】第六の接続部検査方法は、上記第一の検査
方法が導電性粒子を振動させて、振動モードの違いを検
出して接合状態を知ろうとするものであるのに対して、
接続部周辺に熱を与え、導電性粒子を伝わる熱を検出
し、その熱伝導性の違いにより接合状態を知ろうとする
もので、光学的に不透明なLSIの向う側の導電性粒子
でも、外部から直接、より迅速に接合部の情報を得るこ
とができる。
In contrast to the sixth inspection method for connecting parts, in which the above-mentioned first inspection method vibrates the conductive particles, the difference in vibration modes is detected and the joining state is known.
It applies heat to the periphery of the connection part, detects the heat transmitted through the conductive particles, and tries to know the bonding state by the difference in the thermal conductivity. Even conductive particles on the opposite side of the optically opaque LSI can be The information on the joint can be obtained directly and more quickly.

【0018】[0018]

【実施例】以下、本発明を図面にもとづいて詳細に説明
する。
The present invention will be described in detail below with reference to the drawings.

【0019】図1は本発明による振動モードの違いを検
出することにより接続部を検査する方法の第1実施例を
示す図である。本実施例は上記第一または第二に記載し
た方法に対応する。図1において、1はCu等の電極2
が形成されたポリイミドフィルム等の基板、3は樹脂粒
子にNiまたはAu等のメッキを施した導電性粒子、4
は電極5および電極5の周りにパッシベーション膜6が
形成されたSiの半導体チップ、7および8は赤外線光
(変調光)およびレンズをそれぞれ示す。図1に示すよ
うに、Siチップ7を透過する赤外線光8を用い、赤外
線光(変調光)7を集光レンズ8で接合部電極5に集光
し、導電性粒子3を照射すると、照射された導電性粒子
3は周期的なエネルギー(熱)を受け、熱振動を起こ
す。変調光7の周波数を導電性粒子3の固有振動に合わ
せたときに導電性粒子3は大きな定常的な振動を起こ
す。そこで、電極2、5に十分接触している導電性粒子
と接合不十分な導電性粒子とでは、振動モードが異な
り、共振周波数も異なるので光の変調周波数を適宜可変
することにより、電極2、5に対して十分接触している
導電性粒子3と接合不足の導電性粒子3の違いを検出す
ることができる。本例によれば、フェイズダウンで実装
されているLSIのチップ4を裏側より電極部5を照射
することができ、それに接する導電性粒子3への振動を
効率的、かつ、精度よく行える。
FIG. 1 is a diagram showing a first embodiment of a method for inspecting a connecting portion by detecting a difference in vibration mode according to the present invention. This embodiment corresponds to the method described in the above first or second. In FIG. 1, 1 is an electrode 2 made of Cu or the like
Substrate such as a polyimide film on which is formed, 3 is conductive particles obtained by plating resin particles with Ni or Au, and 4
Is a semiconductor chip of Si having an electrode 5 and a passivation film 6 formed around the electrode 5, and 7 and 8 are infrared light (modulated light) and a lens, respectively. As shown in FIG. 1, when infrared light 8 transmitted through the Si chip 7 is used, the infrared light (modulated light) 7 is condensed on the junction electrode 5 by the condenser lens 8, and the conductive particles 3 are irradiated, the irradiation is performed. The generated conductive particles 3 receive periodic energy (heat) and generate thermal vibration. When the frequency of the modulated light 7 is adjusted to the natural vibration of the conductive particle 3, the conductive particle 3 causes a large steady vibration. Therefore, the conductive particles that are in sufficient contact with the electrodes 2 and 5 and the conductive particles that are poorly bonded have different vibration modes and different resonance frequencies. Therefore, by appropriately changing the modulation frequency of light, the electrodes 2, It is possible to detect the difference between the conductive particles 3 that are in sufficient contact with the conductive particles 3 and the conductive particles 3 that are insufficiently bonded. According to this example, the electrode portion 5 can be irradiated from the back side with the LSI chip 4 mounted in a phase-down manner, and the conductive particles 3 in contact therewith can be vibrated efficiently and accurately.

【0020】次に、図2は本発明の第2実施例を示す図
である。本例は第一または第三に記載した方法に対応す
る。図2に示すように、基板1側の引き出し電極2をミ
ラーとして利用し、所定の角度より接着剤11を透過す
る光線を照射して接合層11端部より入射させ、導電性
粒子3に光を当て熱振動を起こさせる。本例によれば導
電性粒子に容易に励起光を直接照射でき、効率的に振動
を行うことができる。
Next, FIG. 2 is a diagram showing a second embodiment of the present invention. This example corresponds to the method described in the first or third. As shown in FIG. 2, the extraction electrode 2 on the side of the substrate 1 is used as a mirror, and a light beam that passes through the adhesive 11 is irradiated from a predetermined angle to be incident from the end of the bonding layer 11 and the conductive particle 3 is irradiated with light. Apply heat to cause vibration. According to this example, the conductive particles can easily be directly irradiated with the excitation light, and the vibration can be efficiently performed.

【0021】図3は本発明の第3実施例を示す図であ
る。本例は第一または第四に記載した方法に対応する。
図3に示すようにフェイスダウンされたLSIチップ4
の外側から光ビーム20を照射し、照射位置を移動させ
ることで弾性波の合成波22を生成し、電極部5に弾性
波を集束させる。本例によると、光学的に不透明なLS
Iチップ4の向う側(内側)にある導電性粒子3にも波
面を集束させ、振動を与えられる。
FIG. 3 is a diagram showing a third embodiment of the present invention. This example corresponds to the method described in the first or fourth.
LSI chip 4 face down as shown in FIG.
By irradiating the light beam 20 from the outside and moving the irradiation position, a synthetic wave 22 of elastic waves is generated and the elastic waves are focused on the electrode portion 5. According to this example, the optically opaque LS
The wavefront is also focused on the conductive particles 3 on the opposite side (inner side) of the I-chip 4 to give vibration.

【0022】図4は本発明の第4実施例を示す図であ
る。本例は第一または第五に記載した方法に対応する。
図4に示すように接合部の導電性粒子3を振動させたと
き、導電性粒子3と電極2、5の接触具合で、その振動
が基板電極2に伝わるときの伝播効率が異なるため、基
板電極2の弾性波信号を検出することで導電性粒子3と
電極2、5の接触具合を知ることができる。検出するに
は、例えば圧電素子30のようなものを基板電極2に密
着させたり、あるいは光マイクロ31を基板電極2に照
射し光学的に振動を検出してもよい。本例によると導電
性粒子3の実装構造を壊さずに容易に外部から測定でき
る。
FIG. 4 is a diagram showing a fourth embodiment of the present invention. This example corresponds to the method described in the first or fifth.
As shown in FIG. 4, when the conductive particles 3 at the joint are vibrated, the contact efficiency between the conductive particles 3 and the electrodes 2 and 5 causes different propagation efficiency when the vibration is transmitted to the substrate electrode 2. By detecting the elastic wave signal of the electrode 2, the contact condition between the conductive particle 3 and the electrodes 2 and 5 can be known. For the detection, for example, a piezoelectric element 30 or the like may be brought into close contact with the substrate electrode 2 or the substrate 31 may be irradiated with the optical micro 31 to optically detect the vibration. According to this example, it is possible to easily measure from the outside without breaking the mounting structure of the conductive particles 3.

【0023】以上は導電性粒子を振動させてその振動モ
ードの違いを検出して接合状態(導電性粒子の保持状
態)を知ろうとする方法である。その目的のため、光を
強度変調するときの変調周波数を可変とし、振動の固有
振動周波数に合わせるようにすれば有効である。
The above is the method of vibrating the conductive particles and detecting the difference between the vibration modes to know the bonding state (holding state of the conductive particles). For that purpose, it is effective to make the modulation frequency when intensity-modulating light variable so as to match the natural vibration frequency of vibration.

【0024】図5は本発明のもう一つの接続部検査方法
の実施例を示す図である。本例は第六に記載した方法に
対応する。図5に示すように、チップ4上面から、ある
いは、基板側電極2から熱を加え(例えば光を照射して
熱エネルギーを変換させてもよい)、その熱42が伝導
し接合部の導電性粒子3を経由して他方に伝わった熱4
3を検出すると、導電性粒子3の接合部に接着剤11が
介在している場合等は当然熱の伝導効率が異なり、検出
する熱量は違ってくる。熱量の測定サーモビュア等の非
接触の温度計測方法等が有効である。本例によると、光
学的に不透明なLSIチップの向う側の導電性粒子3で
も、より迅速に接合部の情報を得ることができる。
FIG. 5 is a diagram showing another embodiment of the connection portion inspection method of the present invention. This example corresponds to the method described in the sixth. As shown in FIG. 5, heat is applied from the top surface of the chip 4 or from the electrode 2 on the substrate side (for example, light energy may be converted by irradiating light), and the heat 42 is conducted and the conductivity of the bonding portion is increased. Heat 4 transferred to the other via particle 3
When 3 is detected, the heat conduction efficiency is naturally different when the adhesive 11 is present in the joint portion of the conductive particles 3 and the detected amount of heat is different. Measurement of heat quantity Non-contact temperature measurement methods such as thermo-viewers are effective. According to this example, even in the case of the electrically conductive particles 3 on the opposite side of the optically opaque LSI chip, the information on the bonded portion can be obtained more quickly.

【0025】[0025]

【発明の効果】以上のように、本発明によれば、LSI
チップ等のフェイダウン実装における電極と導電性粒子
の接合状態を直接検出することができ、しかも、電気的
チェック等に比較して初期的な抵抗値チェックでは発見
できないような接合不足なども精度よく検出することが
できる。
As described above, according to the present invention, the LSI
It is possible to directly detect the bonding state of electrodes and conductive particles in the face-down mounting of chips, etc., and moreover, it is possible to accurately detect bonding shortages that cannot be detected by the initial resistance value check as compared with electrical checks. Can be detected.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による接続部検査方法の一例を説明する
図である。
FIG. 1 is a diagram illustrating an example of a connection portion inspection method according to the present invention.

【図2】本発明による接続部検査方法の別例を説明する
図である。
FIG. 2 is a diagram illustrating another example of the connection portion inspection method according to the present invention.

【図3】本発明による接続部検査方法のさらに別例を説
明する図である。
FIG. 3 is a diagram illustrating still another example of the connection portion inspection method according to the present invention.

【図4】本発明による接続部検査方法のさらに別例を説
明する図である。
FIG. 4 is a diagram illustrating still another example of the connection portion inspection method according to the present invention.

【図5】本発明によるもう一つの接続部検査方法の例を
説明する図である。
FIG. 5 is a diagram illustrating an example of another connection portion inspection method according to the present invention.

【図6】ベアチップフェイスダウン実装構造を示す図で
ある。
FIG. 6 is a diagram showing a bare chip face-down mounting structure.

【図7】ベアチップフェイスダウン実装構造における接
合不良を説明する図である。
FIG. 7 is a diagram illustrating a defective joint in a bare chip face-down mounting structure.

【符号の説明】[Explanation of symbols]

1 基板 2 基板側電極 3 導電性粒子 4 Siチップ 5 チップ電極 6 パッシベーション膜 7 赤外線光(変調光) 8 集光レンズ 10 励起光 11 接着剤 20 光ビーム 21 超音波 22 合成波 30 圧電素子 31 光マイクロ 41 光照射 42、43 熱伝導 1 Substrate 2 Substrate Side Electrode 3 Conductive Particle 4 Si Chip 5 Chip Electrode 6 Passivation Film 7 Infrared Light (Modulated Light) 8 Condensing Lens 10 Excitation Light 11 Adhesive 20 Light Beam 21 Ultrasonic Wave 22 Synthetic Wave 30 Piezoelectric Element 31 Light Micro 41 Light irradiation 42,43 Heat conduction

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 LSIチップ等の電極と基板側電極とを
導電性粒子を介在させてフェイスダウンにより電気的に
接続した場合の接続部の検査方法において、該導電性粒
子を振動させ、その振動モードの違いにより該電極と該
導電性粒子の接合状態を検出することを特徴とするLS
Iチップ等の実装における接続部検査方法。
1. A method of inspecting a connecting portion when electrodes such as an LSI chip and electrodes on a substrate side are electrically connected by face down with conductive particles interposed therebetween. An LS characterized by detecting a bonding state between the electrode and the conductive particle based on a mode difference
A method for inspecting a connection portion in mounting an I chip or the like.
【請求項2】 前記導電性粒子の振動は、赤外線光を変
調光として、チップの裏面より透過させ、接合部の電極
部を照射することにより行うことを特徴とする請求項1
に記載のLSIチップ等の実装における接続部検査方
法。
2. The vibration of the conductive particles is performed by transmitting infrared light as modulated light from the back surface of the chip and irradiating the electrode portion of the bonding portion.
5. A method for inspecting a connection part in mounting an LSI chip or the like as described in.
【請求項3】 前記導電性粒子の振動は、基板側引き出
し電極を反射板として用い、変調励起光を導電性粒子に
照射することにより行うことを特徴とする請求項1に記
載のLSIチップ等の実装における接続部検査方法。
3. The LSI chip according to claim 1, wherein the conductive particles are vibrated by using the substrate-side extraction electrode as a reflector and irradiating the conductive particles with modulated excitation light. Inspection method for connection in mounting.
【請求項4】 前記導電性粒子の振動は、LSIチップ
裏面に変調光を照射し、照射位置を時間で変化させるこ
とより走査速度と超音波伝播速度との関係より弾性合成
波面を発生させ、LSI電極部の導電性粒子を振動させ
ることにより行うことを特徴とする請求項1に記載のL
SIチップ等の実装における接続部検査方法。
4. The vibration of the conductive particles irradiates the back surface of the LSI chip with modulated light and changes the irradiation position with time to generate an elastic composite wavefront based on the relationship between the scanning speed and the ultrasonic wave propagation speed. The L according to claim 1, which is performed by vibrating the conductive particles of the LSI electrode portion.
A method for inspecting a connection portion in mounting an SI chip or the like.
【請求項5】 前記導電性粒子の振動は、引き出し電極
に伝わる弾性波を検出することより行うことを特徴とす
る請求項1に記載のLSIチップ等の実装における接続
部検査方法。
5. The method for inspecting a connection portion in mounting an LSI chip or the like according to claim 1, wherein the vibration of the conductive particles is performed by detecting an elastic wave transmitted to an extraction electrode.
【請求項6】 LSIチップ等の電極と基板側電極とを
導電性粒子を介在させてフェイダウンにより電気的に接
続した場合の接続部の検査方法において、接続部周辺よ
り熱を与え、導電性粒子を伝わる熱を検出し、その熱伝
導性の違いにより該電極と該導電性粒子の接合状態を検
出することを特徴とするLSIチップ等の実装における
接続部検査方法。
6. A method for inspecting a connection portion when an electrode of an LSI chip or the like and a substrate-side electrode are electrically connected by faying with conductive particles interposed therebetween, wherein heat is applied from the periphery of the connection portion so that the conductivity is reduced. A method for inspecting a connection portion in mounting an LSI chip or the like, which comprises detecting heat transmitted through particles and detecting a bonding state between the electrode and the conductive particles based on a difference in thermal conductivity.
JP5340480A 1993-12-08 1993-12-08 Connecting part inspecting method in mounting lsi chip, etc. Pending JPH07159380A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5340480A JPH07159380A (en) 1993-12-08 1993-12-08 Connecting part inspecting method in mounting lsi chip, etc.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5340480A JPH07159380A (en) 1993-12-08 1993-12-08 Connecting part inspecting method in mounting lsi chip, etc.

Publications (1)

Publication Number Publication Date
JPH07159380A true JPH07159380A (en) 1995-06-23

Family

ID=18337371

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5340480A Pending JPH07159380A (en) 1993-12-08 1993-12-08 Connecting part inspecting method in mounting lsi chip, etc.

Country Status (1)

Country Link
JP (1) JPH07159380A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002296245A (en) * 2001-03-30 2002-10-09 Hitachi Zosen Corp Method and device for discriminating material of body, and sorting facility

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002296245A (en) * 2001-03-30 2002-10-09 Hitachi Zosen Corp Method and device for discriminating material of body, and sorting facility

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