JPH0715772U - Substrate holder with heater - Google Patents
Substrate holder with heaterInfo
- Publication number
- JPH0715772U JPH0715772U JP4604293U JP4604293U JPH0715772U JP H0715772 U JPH0715772 U JP H0715772U JP 4604293 U JP4604293 U JP 4604293U JP 4604293 U JP4604293 U JP 4604293U JP H0715772 U JPH0715772 U JP H0715772U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- substrate holder
- temperature
- heater
- disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
(57)【要約】
【目的】 磁気特性が高く、ばらつきの少ない磁気ディ
スクを安定に製造する薄膜磁気ディスク基板ホルダーを
提供する。
【構成】 薄膜磁気ディスク製造に用いられるインライ
ン式スパッタ装置用ホルダーにおいて、ディスク基板を
装着する基板ホルダーに加熱装置を直接装着した薄膜磁
気ディスク基板ホルダー。
(57) [Summary] [Object] To provide a thin film magnetic disk substrate holder for stably manufacturing a magnetic disk having high magnetic characteristics and little variation. [Structure] In a holder for an in-line type sputtering apparatus used for manufacturing a thin film magnetic disk, a thin film magnetic disk substrate holder in which a heating device is directly mounted on a substrate holder on which a disk substrate is mounted.
Description
【0001】[0001]
本考案は、薄膜磁気ディスクを製造する為のインライン式スパッタ装置に使用 されるディスク基板を装着する基板ホルダ−の改良に関するものである。 The present invention relates to an improvement of a substrate holder for mounting a disc substrate used in an in-line type sputtering apparatus for manufacturing a thin film magnetic disc.
【0002】[0002]
コンピューター用薄膜磁気ディスク装置は、近年その大容量化が強く求められ ているが、大容量化を図るためには磁気記録媒体における記録密度を高めること が必要である。記録密度を高めるためには、磁気ヘッドの低浮上量化を可能とす る平滑な表面を有する基板、及び磁気記録媒体の高保磁力化が求められている。 従来磁気記録媒体用の基板としては表面に膜厚10〜20μmのNi−Pメッキ 層を有するアルミニウム基板が用いられている。Ni−Pメッキ層の表面には記 録再生用磁気ヘッドとの吸着防止を目的として中心線平均粗さRa=65オング ストローム程度の肌荒らし処理(テクスチャー処理)が施されている。近年はR a=40オングストローム程度まで平滑性を上げたものも用いられるようになり 、さらに平滑性に優れた基板としてガラスやセラミックス、カーボン等の非磁性 基板を用いることも検討されている。基板板厚は0.64mm〜1.27mm程 度の物が用いられている。一般に薄膜磁気ディスクを量産するスパッタ装置には 、図2に示すようなインライン式のものが多く使用されている。この装置では、 図3に示すように大気中で基板ホルダーにディスク基板を装着し、予備加熱ヒー ター、加熱ヒーターで加熱した後、スパッタによってディスク基板上にCr薄膜 ついで磁気記録媒体であるCo合金系の薄膜を成膜し、さらに潤滑を目的とした カーボン膜を成膜する。 In recent years, thin-film magnetic disk devices for computers have been strongly required to have a large capacity, but in order to achieve a large capacity, it is necessary to increase the recording density of a magnetic recording medium. In order to increase the recording density, it is required to increase the coercive force of the magnetic recording medium and the substrate having a smooth surface that enables the flying height of the magnetic head to be reduced. Conventionally, as a substrate for a magnetic recording medium, an aluminum substrate having a Ni—P plating layer with a film thickness of 10 to 20 μm on its surface has been used. The surface of the Ni-P plated layer is subjected to a surface roughening treatment (texture treatment) with a center line average roughness Ra of about 65 Å for the purpose of preventing adsorption to the recording / reproducing magnetic head. In recent years, a material having a smoothness up to about Ra = 40 angstrom has been used, and it is also considered to use a non-magnetic substrate such as glass, ceramics or carbon as a substrate having a further excellent smoothness. A substrate having a thickness of about 0.64 mm to 1.27 mm is used. In general, an in-line type as shown in FIG. 2 is often used as a sputtering apparatus for mass-producing thin film magnetic disks. In this device, as shown in FIG. 3, a disk substrate is mounted on a substrate holder in the atmosphere, heated by a preheating heater and a heating heater, and then a Cr thin film is deposited on the disk substrate by sputtering and then a Co alloy which is a magnetic recording medium. A system thin film is formed, and then a carbon film for the purpose of lubrication is formed.
【0003】 スパッタ成膜前にディスク基板を加熱する目的は、基板加熱により薄膜磁気デ ィスクの保磁力を制御すること、及び保磁力変動の原因となる基板及び基板ホル ダー表面の吸着ガス、水分等を除去することにある。基板ホルダーは、通常板厚 6〜8mm程度の物が使用されており、スパッタで付着した膜が剥離しないよう に表面にRa=1〜4μm程度の肌荒らし処理がなされる。基板ホルダーの材質 としてはAl合金やTi合金が一般的に用いられている。The purpose of heating the disk substrate before the sputtering film formation is to control the coercive force of the thin film magnetic disk by heating the substrate, and to absorb the adsorbed gas and moisture on the surface of the substrate and the substrate holder that cause coercive force fluctuation. And so on. As the substrate holder, one having a plate thickness of about 6 to 8 mm is usually used, and a surface roughening treatment of Ra = 1 to 4 μm is performed on the surface so that a film attached by sputtering is not peeled off. As a material for the substrate holder, Al alloy or Ti alloy is generally used.
【0004】[0004]
近年の薄膜磁気ディスクの高記録密度化の要求から媒体保磁力は1500[O e]以上の高い保磁力が求められるようになってきた。基板加熱温度が高いほど 媒体の保磁力は向上することから、基板加熱温度も高温になりつつある。しかし それにともなって基板ホルダーとディスク基板との温度差が大きくなる傾向があ る。 ディスク基板と基板ホルダーを加熱した後、Co合金系の薄膜、カーボン膜を 成膜するターゲット前まで搬送する間に基板ホルダーの温度が低下してしまい、 デイスク基板から基板ホルダーに熱が奪われ、それに伴うディスク基板温度の低 下により十分な膜の磁気特性及び均一性が得られない。また、ディスク基板の熱 による変形を起こさない為にむやみに高温に加熱できないのである。 Due to the recent demand for higher recording density of thin film magnetic disks, a medium coercive force of 1500 [O e] or more has been required. Since the coercive force of the medium improves as the substrate heating temperature increases, the substrate heating temperature is also increasing. However, the temperature difference between the substrate holder and the disc substrate tends to increase accordingly. After heating the disk substrate and the substrate holder, the temperature of the substrate holder drops while being transported to the front of the target for forming the Co alloy thin film and the carbon film, and the heat is taken from the disk substrate to the substrate holder. As a result, the temperature of the disk substrate is lowered, so that sufficient magnetic properties and uniformity of the film cannot be obtained. Further, since the disk substrate is not deformed by heat, it cannot be heated to a high temperature unnecessarily.
【0005】[0005]
上記課題を解決するために本考案に於いて講じた手段は、例えば、ディスク基 板を装着する基板ホルダーに加熱用のヒーター線を埋め込む等、加熱手段を装着 した基板ホルダーを薄膜磁気ディスクの製造に用いることである。 The means taken in the present invention to solve the above-mentioned problem is, for example, to embed a heater wire for heating in a substrate holder on which a disk substrate is mounted, to manufacture a thin film magnetic disk by mounting a substrate holder on which heating means is mounted. Is to use.
【0006】[0006]
本考案実施例のように、基板ホルダ−にヒーター線を装着し、基板ホルダーの 温度を基板温度付近に加熱保持することにより、ディスク基板温度の低下を防ぐ ことができる。このため、ディスク基板の温度が均一に、高温に保たれることに より、磁気特性が均一で高磁気特性の磁気ディスクが安定して製造できる。また 、ヒーターを装着することにより、ディスク基板と基板ホルダーを加熱する時間 が短縮されるのみならず過度に高温に加熱する必要がなく、ディスク基板の熱変 形が防止できるのである。 As in the embodiment of the present invention, a heater wire is attached to the substrate holder and the temperature of the substrate holder is heated and maintained near the substrate temperature to prevent the disk substrate temperature from decreasing. Therefore, since the temperature of the disk substrate is kept uniform and high, a magnetic disk having uniform magnetic characteristics and high magnetic characteristics can be stably manufactured. Further, by mounting the heater, not only the time for heating the disc substrate and the substrate holder is shortened but also it is not necessary to heat the disc substrate to an excessively high temperature, and the thermal deformation of the disc substrate can be prevented.
【0007】[0007]
以下、本考案を実施例をもって具体的に説明する。但し本考案の範囲が、これ らの実施例により限定されるものではない。 (実施例) 本考案に係わる基板ホルダーの形状を図1に、また比較例として用いた従来型 基板ホルダーを図3に示す。本考案の基板ホルダーは板厚1.27mm、外径95 mmの3.5インチアルミニウム合金ディスク基板用として作製したものであり、 ヒーターを内蔵したものである(図1)。この基板ホルダーに36枚のディスク 基板を大気中でセットした。その後、基板ホルダーを予備加熱室に送り込み真空 引きした後、第一ヒ−タにより加熱温度290℃で3分間真空加熱を行い、更に 真空に排気してあるスパッタ室に基板ホルダーを送り込んで第二ヒーターで基板 温度290℃で二分間加熱を行った(図2)。 Hereinafter, the present invention will be described in detail with reference to examples. However, the scope of the present invention is not limited by these embodiments. (Embodiment) The shape of the substrate holder according to the present invention is shown in FIG. 1, and the conventional substrate holder used as a comparative example is shown in FIG. The substrate holder of the present invention is made for a 3.5-inch aluminum alloy disc substrate having a plate thickness of 1.27 mm and an outer diameter of 95 mm, and has a built-in heater (Fig. 1). 36 disc substrates were set in the substrate holder in the atmosphere. After that, the substrate holder is sent to the preheating chamber and evacuated, and then vacuum heating is performed at a heating temperature of 290 ° C. for 3 minutes by the first heater, and further the substrate holder is sent to the sputtering chamber which is evacuated to a second vacuum. The heater was used to heat the substrate at a temperature of 290 ° C. for 2 minutes (FIG. 2).
【0008】 図4に第二ヒ−タ−加熱後の本考案ヒーター装着式基板ホルダ−とそれにセッ トしたディスク基板の放置時間と表面測定温度との関係を示す。図4に示すよう に、基板ホルダーとディスク基板の温度はほぼ同じ温度で高温に保たれ、10数 分の放置時間では、ほとんど温度降下も少ないことがわかる。実際は第2ヒータ ー加熱後2分弱でスパッタ成膜するのであるが、図4に示すように、スパッタ領 域での、この位の温度変化は問題にならないのである。ディスク基板加熱完了後 、Arガスを導入してスパッタ室内を2.66Paに保持し、Cr,CoCrT aを順に成膜して、作製した基板ホルダー内の全ての薄膜磁気デイスクをB−H メータを用いて保磁力を測定し、保磁力の平均値及び保磁力ばらつきの標準偏差 を求めた。その結果を表1の実施例の行に示した。FIG. 4 shows the relationship between the surface-measured temperature and the standing time of the heater-equipped substrate holder of the present invention after heating the second heater and the disk substrate set therein. As shown in FIG. 4, it can be seen that the temperature of the substrate holder and the temperature of the disc substrate are kept at substantially the same temperature, and the temperature drop hardly occurs after leaving for 10 minutes or more. Actually, sputter film formation takes less than 2 minutes after the second heater is heated, but as shown in FIG. 4, such a temperature change in the sputter region does not pose a problem. After the heating of the disk substrate was completed, Ar gas was introduced to maintain the inside of the sputtering chamber at 2.66 Pa, Cr and CoCrTa were sequentially deposited, and all the thin film magnetic disks in the fabricated substrate holder were measured with a BH meter. Then, the coercive force was measured and the average value of the coercive force and the standard deviation of the coercive force variation were obtained. The results are shown in the row of Examples in Table 1.
【0009】[0009]
【表1】 [Table 1]
【0010】 (比較例) 実施例と同様のディスク基板を図3に示す従来型の市販のアルミニウム合金製 ホルダー(830mmX780mmX6.5mmt)に36枚大気中でセットし、実施 例と同じ加熱条件で加熱を行った。 図5に第二ヒ−タ−加熱後の従来型基板ホルダ−の基板ホンダーとそれセット したディスク基板の放置時間と表面測定温度との関係を示す。図5に示すように 、基板ホルダーとディスク基板の温度差が大きく、10数分の放置時間でも、温 度降下が大きくディスク基板の熱が基板ホルダーに流出していることが推測され る。またスパッタ領域時間帯でのディスク基板の温度低下は著しく、磁気特性的 に問題が予測されるのである。次にディスク基板加熱完了後、実施例と同様の方 法で成膜し、保磁力を測定した結果を表1の比較例の行に示した。表1より実施 例に比較して、比較例である従来型基板ホルダーの場合は、磁気特性的に低保磁 力であり、また、保磁力の標準偏差(σ)が大きく、ばらつきが大きいことがわ かる。Comparative Example 36 disc substrates similar to those of the example were set in a conventional commercial aluminum alloy holder (830 mm × 780 mm × 6.5 mmt) shown in FIG. 3 in the atmosphere, and heated under the same heating conditions as the example. I went. FIG. 5 shows the relationship between the substrate holder of the conventional substrate holder after heating the second heater and the disc substrate set therein and the surface measurement temperature. As shown in FIG. 5, the temperature difference between the substrate holder and the disk substrate is large, and it is presumed that the temperature of the disk substrate is large and the heat of the disk substrate is flowing out to the substrate holder even after left for 10 minutes. In addition, the temperature drop of the disk substrate during the sputter region time zone is remarkable, and problems are expected in terms of magnetic properties. Next, after heating of the disk substrate was completed, a film was formed in the same manner as in the example, and the coercive force was measured. The results are shown in the row of the comparative example in Table 1. Table 1 shows that the conventional substrate holder, which is a comparative example, has a low magnetic coercive force in comparison with the examples, and the standard deviation (σ) of the coercive force is large and the variation is large. I understand.
【0011】[0011]
本考案によれば、ディスク基板をセットする基板ホルダーに例えばヒーターを 装着することにより、基板ホルダーを加熱、保温することが可能となる為、本基 板ホルダーを薄膜磁気ディスクの製造に用いることでスパッタ成膜時に、ディス ク基板から基板ホルダーへの熱の流出が防止でき、ディスク基板の温度低下を防 ぐことができる為、高い保磁力の薄膜磁気ディスクを製造することが可能となる 。また基板ホルダーの温度が均一になる為、基板ホルダー内のディスク基板の磁 気特性のばらつきが小さくなり、歩留りが向上するのである。 According to the present invention, it is possible to heat and heat the substrate holder by attaching a heater to the substrate holder for setting the disc substrate. Therefore, the substrate holder can be used for manufacturing a thin film magnetic disk. During sputter deposition, heat can be prevented from flowing from the disk substrate to the substrate holder, and the temperature of the disk substrate can be prevented from decreasing, making it possible to manufacture thin-film magnetic disks with high coercive force. Further, since the temperature of the substrate holder becomes uniform, the variation in magnetic characteristics of the disk substrate in the substrate holder is reduced, and the yield is improved.
【図面の簡単な説明】[Brief description of drawings]
【図1】本考案の実施例を示すヒ−タ−装着式基板ホル
ダ−の概略図FIG. 1 is a schematic view of a heater mounting type substrate holder showing an embodiment of the present invention.
【図2】インライン式スパッタ装置概略図[Fig. 2] Schematic diagram of in-line type sputtering device
【図3】従来型の基板ホルダ−の概略図FIG. 3 is a schematic view of a conventional substrate holder.
【図4】本考案のヒ−タ−装着式基板ホルダ−を使用し
たときのディスク基板及び基板ホルダ−の温度と時間の
関係を示す図FIG. 4 is a diagram showing a relationship between temperature and time of the disk substrate and the substrate holder when the heater mounting type substrate holder of the present invention is used.
【図5】従来型の基板ホルダ−を使用したときのディス
ク基板及び基板ホルダ−の温度と時間の関係を示す図FIG. 5 is a diagram showing a relationship between temperature and time of a disk substrate and a substrate holder when a conventional substrate holder is used.
───────────────────────────────────────────────────── フロントページの続き (72)考案者 伊藤 康平 埼玉県熊谷市三ケ尻5200番地日立金属株式 会社磁性材料研究所内 (72)考案者 飛世 正博 埼玉県熊谷市三ケ尻5200番地日立金属株式 会社磁性材料研究所内 (72)考案者 萩原 英俊 埼玉県熊谷市三ケ尻5200番地日立金属株式 会社磁性材料研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Kohei Ito 5200 Mikajiri, Kumagaya-shi, Saitama Hitachi Metals Co., Ltd. Magnetic Materials Research Institute (72) Masahiro Tobiyo 5200 Mikageri, Kumagaya, Saitama Hitachi Metals Co., Ltd. In-house (72) Hidetoshi Hagiwara, Hidetoshi Hagiwara, 5200 Sankejiri, Kumagaya, Saitama Hitachi Metals Co., Ltd.
Claims (2)
ライン式スパッタ装置用ディスクホルダーにおいて、デ
ィスク基板を装着する基板ホルダーに加熱装置を直接装
着したことを特徴とする薄膜磁気ディスク基板ホルダ
ー。1. A disk holder for an in-line type sputtering apparatus used for manufacturing a thin film magnetic disk, wherein a heating device is directly mounted on the substrate holder on which the disk substrate is mounted.
ある薄膜磁気ディスク基板ホルダー。2. The thin film magnetic disk substrate holder according to claim 1, wherein the heating device is a heater.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4604293U JPH0715772U (en) | 1993-08-24 | 1993-08-24 | Substrate holder with heater |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4604293U JPH0715772U (en) | 1993-08-24 | 1993-08-24 | Substrate holder with heater |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0715772U true JPH0715772U (en) | 1995-03-17 |
Family
ID=12735978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4604293U Pending JPH0715772U (en) | 1993-08-24 | 1993-08-24 | Substrate holder with heater |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0715772U (en) |
-
1993
- 1993-08-24 JP JP4604293U patent/JPH0715772U/en active Pending
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