JPH07153656A - Creation method of pattern-arrangement-instruction information - Google Patents

Abstract

PURPOSE:To create pattern-arrangement-instruction information more precisely and to easily investigate a cause when an inaccurate photomask has been formed in an original-plate pattern. CONSTITUTION:Original-picture patterns which are drawn on a photmask blank are changed into pieces of data wholly or at every element (T11). On the basis of the individual pieces of pattern data, pieces of data, for arrangement, which prescribe regions of the individual pieces of pattern data in which coordinates are expressed by a coordinate system related to the individual pieces of pattern data are created (T12). The coordinates of peculiar points in the photomask blank are found in a coordinate system which the individual pieces of data for arrangement follow, and pieces of intermediate-pattern-arrangement- instruction information which give instructions to arrange the individual pieces of data for arrangement are created in such a way that the coordinates of the peculiar points are situated in the peculiar points in the photomask blank (T13). The individual pieces of intermdiate-pattern-arrangement-instruction information are transformed into pieces of final pattern-arrangement-instruction information having a form which can be taken into by a drawing apparatus.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pattern layout instruction information creating method for creating pattern layout instruction information to be given to a drawing apparatus or an exposure apparatus.

[0002]

2. Description of the Related Art When a drawing apparatus draws an original image pattern on a photomask blank using an electron beam or a laser beam, it follows drawing instruction information and pattern data whose arrangement position is specified by this drawing instruction information. Draw.
The pattern arrangement instruction information, which is one element of the drawing instruction information for driving the drawing apparatus to execute the drawing, is generally created by obtaining each procedure as shown in FIG.

In this specification, the pattern data is information for specifying the shape of the latent image pattern of the partial section or the entire section of the resist surface, and the drawing instruction information indicates which pattern data is used. , Which defines under what conditions they are drawn on the photomask blank. The drawing instruction information includes
It also contains information that specifies integrated circuits and layers, information that defines positive / negative writing, etc., but in the following, we will create pattern placement instruction information that indicates where on the photomask blank the pattern data will be placed. The processing procedure will be described from the viewpoint of doing so.

[Procedure 1 (T1): Data Conversion of Original Image Pattern] A drawing in which an original image pattern for a photomask blank is described is used as a reference. And, for example, so-called C
Using the AD system, the shape of the latent image pattern of the partial section or the entire section of the resist surface is converted into pattern data (hereinafter referred to as CAD data) based on the drawing. One or more CADs formed in this way
Each data is a pattern data having a rectangular outer shape, and a file name or the like is given so that it can be identified. The points in the rectangular shape and rectangular area defined by each CAD data are
It is expressed by a coordinate system arbitrarily set so that the user of the CAD system can easily convert it into data. Note that the CAD data may be provided by the user to request the creation of a photomask.

[Procedure 2 (T2): Creation of placement data]
Based on the CAD data thus formed,
Create placement data for the photomask blank area. Here, the CAD data also includes information that clarifies, for each point in the rectangular area, whether the electron beam or the laser beam is irradiated or not irradiated, but the arrangement data is shown in Procedure 3. Thus, it is used to clarify where the rectangular area is arranged in the photomask blank area, and at least information for identifying the rectangular shape may be included.

[0006] For example, the layout data may be data that directly represents the vertical and horizontal lengths (window size) of a rectangular shape, or that the lower left coordinate is (0, 0) and the upper right coordinate includes the window size value as it is. This data indirectly represents the window size. Therefore, the coordinate system is different for each placement data, and the placement data is expressed in a coordinate system different from the coordinate system of the CAD data.

[Procedure 3 (T3): Arrangement of Arrangement Data in Photomask Blank Area] Next, each obtained arrangement data is photo-printed based on the specification sheet or the drawing in which the original image pattern is described. Intermediate pattern layout instruction information that defines at which position in the mask blank area the pattern is to be created is created. More specifically, the coordinate system for the photomask blank area is defined, the coordinates where the singular point (center or lower left) of the placement data is located in that coordinate system, and the singular point of the placement data is located at that coordinate position. Creates intermediate pattern placement instruction information that requests placement data to be placed.

For example, the coordinate system of the photomask blank region is defined by a coordinate system in which the lower left of the photomask blank region is (0, 0), a coordinate system in which the center of the photomask blank region is (0, 0), and the like. To do. Then, the coordinates B in the photomask blank area where the center point A of the rectangular area related to the placement data is located are obtained. Then, as the intermediate pattern layout instruction information, for example, “arrange the layout data so that the center point A of the layout data is located at the coordinate B when the lower left of the photomask blank area is (0, 0)”. Create something that means.

In the intermediate pattern placement instruction information, the coordinate system is actually described to describe the photomask blank region, and the singular point coordinates are disclosed to describe the placement data in the photomask blank region. In some cases, the drawing corresponds to the drawing, and in some cases, the drawing is converted into a command sequence that can be applied to a converter program described later (which can be entered from the keyboard).

[Procedure 4 (T4): Conversion of pattern layout instruction information into a format that can be captured by a drawing device] The intermediate pattern layout instruction information created as described above is converted into a device compatible converter program (for example, a drawing program). It is converted to the final pattern layout instruction information in a format that can be captured by the drawing device by applying it to an editor provided by the device manufacturer. For example, while looking at the drawing in which the intermediate pattern placement instruction information is described, the user inputs a command corresponding to the intermediate pattern placement instruction information using the keyboard and converts it into the final pattern placement instruction information. Let

The CA created through the above-described procedures
The D data and the pattern arrangement instruction information are given to the drawing device. Information such as the type of integrated circuit, its layer, drawing polarity, and address size is also given to the drawing apparatus.

According to such information, the drawing apparatus recognizes in which area of the photomask blank the irradiation on / off information relating to which CAD data should be used, and according to the on / off information of the recognized CAD data, and Also according to the information of (3), an electron beam or a laser beam is appropriately irradiated to the loaded photomask blank to draw an original image pattern.

FIG. 12 shows an example of a state of data conversion by each of the above-mentioned conventional procedures centering on the coordinate plane. FIG. 12 is an example in which one pattern is arranged on the photomask blank.

Now, as shown in FIG. 12A, the original image pattern has a lower left coordinate of (-10) depending on the CAD system.
0, -50) and the upper right coordinates are converted to CAD data having a rectangular shape of (900, 950). Note that CA
Although the coordinates of other points are also given to the D data, FIG.
In FIG. 2 (a), the above-mentioned two points and the origin coordinates are displayed from the relationship with the following description.

Therefore, in the case of this example, as the placement data, the window size indicating the size of the rectangular area related to the CAD data, that is, the length in the X direction as shown in FIG. 12B. Is 1000 and the length in the Y direction is 1
Data of 000 are obtained. Alternatively, the lower left coordinate (0,
0) and the upper right coordinates (1000, 1000), the values of the upper right coordinates represent the layout data indicating the window size.

Here, as shown in FIG. 12C, as the coordinate system for the photomask blank area, the one having the lower left as the origin (0, 0) is adopted, and the rectangular area related to the placement data in this coordinate system. If the lower left coordinate of the photomask blank is (x1, y1), "When the lower left of the photomask blank is (0, 0), the center point of the placement data is the coordinate (500 + x1, 5).
00 + y1) to arrange the arrangement data in the photomask blank area ". Here, the coordinates (500
The value of 500 in + x1,500 + y1) is (0,0) at the lower left of the rectangular area related to the placement data.
Is a value that defines the coordinates of the center point of the rectangular area in the coordinate system, and is calculated from the placement data. For example, x1 and y1 are 50 and 1 respectively.
If it is 00, the lower left of the photomask blank is (0,
0), the center point of the placement data is the coordinates (55
(0,600) to arrange the arrangement data in the photomask blank area "is created. Such intermediate pattern arrangement instruction information is converted by the apparatus correspondence converter program into pattern arrangement instruction information in a format that the drawing apparatus can capture.

When a plurality of CAD data are formed from the original image pattern, the above processing is executed for each CAD data.

[0018]

Even if a computer is used to create layout data and intermediate pattern layout instruction information, many calculations are often performed manually. For example, the calculation for obtaining the window size of the rectangular area related to the CAD data and the calculation for obtaining the center point coordinates of the rectangular area in the coordinate system in which the lower left of the rectangular area related to the CAD data is (0, 0) are performed manually. It is often done. Further, from a different point of view, the coordinate conversion is also performed when the layout data is formed from the CAD data, and the coordinate conversion is also performed when the intermediate pattern layout instruction information is created from the layout data. . Calculation is required every time such coordinate conversion is performed. In practice, one original image pattern is often divided into a plurality of pieces to form a plurality of CAD data, and therefore, the amount of calculation executed until the final pattern arrangement instruction information is obtained is considerably large. Therefore, the probability of occurrence of calculation error is high, and the possibility that a photomask in which the original pattern is not accurately drawn is formed is also high.

In practice, it is verified whether the formed photomask exactly matches the original pattern. If it is found by such a verification that the original pattern is not accurately formed, various data are analyzed to determine the cause. At the time of investigating the cause, according to the conventional method of creating the pattern arrangement instruction information, since the intermediate pattern arrangement instruction information is in the above-mentioned format, there is no coordinate system information in the CAD data. It is difficult to confirm the consistency between the data and the intermediate pattern placement instruction information, and it is difficult to investigate the cause.

[0020] Such a problem that the calculation amount is large and the probability of calculation error is high and an inaccurate photomask is likely to be created, and that it is difficult to find out the cause of the inaccurate photomask is not solved. This also occurs in the production of large-scale photomasks that require the production of intermediate photomasks.

When making a large-scale photomask,
The original image pattern is divided into two or more sections, and one or more photomasks (intermediate photomasks; for example, reticles) are created using the pattern placement instruction information created for each of the divided sections by the above-described method. A large-scale photomask is created by exposure processing using the intermediate photomask created in this way. Therefore, not only the pattern placement instruction information necessary when creating each intermediate photomask, but also the pattern placement instruction information that defines where to place the rectangular area related to the intermediate photomask in the large-scale photomask blank area is required. Therefore, the above problem is more serious than a small-scale photomask which does not require the production of an intermediate photomask.

The present invention has been made in consideration of the above points, and it is possible to more accurately create the pattern placement instruction information, and moreover, when an inaccurate photomask is created in the original image pattern. An object of the present invention is to provide a method of creating pattern layout instruction information that can create pattern layout instruction information whose cause can be easily investigated.

[0023]

In order to solve such a problem, in the first aspect of the present invention, the pattern arrangement instruction information to be given to the drawing apparatus is created as follows.

That is, (a) the original image pattern drawn on the photomask blank is converted into data for the whole or for each element, and (b) based on each pattern data, coordinates are expressed in a coordinate system related to each pattern data. Create the placement data that defines the area of each pattern data, (c) Find the coordinates of the singular point of the photomask blank in the coordinate system that each placement data follows, and select the singular point at the singular point of the photomask blank. Create intermediate pattern placement instruction information that instructs placement of each placement data so that the coordinates are located, and (d) create a format that is necessary for the drawing device to execute drawing together with the pattern data, and that can be captured by the drawing device. By converting each intermediate pattern placement instruction information into the final pattern placement instruction information that it has, the pattern placement instruction information to be given to the drawing apparatus is created. .

In the second invention, 1 or 2
The pattern arrangement instruction information given to the drawing device for creating each small-scale photomask, which is necessary when creating a large-scale photomask by the exposure processing using the above-mentioned small-scale photomask, and the exposure device The given pattern placement instruction information is created as follows.

That is, (A) the original image pattern drawn on the large-scale photomask blank is converted into data for each element, and the small-scale photomask blank on which each data-converted element pattern data is drawn is determined. B) The final pattern placement instruction information for each small-scale photomask blank is created by the processes (b) to (d) of the first invention,
(C) Obtain the coordinates of the singular point of the large-scale photomask blank in the coordinate system that each element pattern data follows, and arrange each small-scale photomask so that the singular point coordinate is located at the singular point of the large-scale photomask blank. (D) Convert each intermediate pattern placement instruction information to the final pattern placement instruction information that has a format that can be captured by the exposure apparatus, necessary for the exposure apparatus to expose. By doing so, the pattern placement instruction information given to the drawing device for producing each small-scale photomask and the pattern placement instruction information given to the exposure device are created.

[0027]

The first aspect of the present invention relates to a method of creating pattern layout instruction information to be given to a drawing device to create a small-scale photomask. The second aspect of the present invention is a drawing apparatus for producing each small-scale photomask, which is required when a large-scale photomask is produced by an exposure process using an exposure apparatus using one or more small-scale photomasks. To the pattern placement instruction information given to the exposure apparatus and the method for creating the pattern placement instruction information given to the exposure apparatus.

The photomasks intended in this way are different in the first and second inventions, but in both the first and second inventions, the arrangement represented by the coordinate system in the pattern data obtained by converting the original image pattern into data. When the intermediate pattern placement instruction information is created based on the data for design and the element pattern data, the probability of a calculation error at the time of creating the intermediate pattern placement instruction information is reduced and an inaccurate photomask is formed. This makes it possible to easily perform verification of.

[0029]

【Example】

(A) First Embodiment Hereinafter, a first embodiment of a method of creating drawing instruction information according to the present invention will be described in detail with reference to the drawings. This first embodiment is
Small-scale photomask blank (for example, the length of one side is 7
Inches or less) is the drawing target of the drawing device.

Also in this first embodiment, when the procedure up to the creation of the drawing instruction information is roughly divided, it is subjected to the procedure 1 of arranging the original image pattern into data and the arrangement processing as in the conventional creation method. A final pattern placement instruction in a format in which the drawing device can capture Step 2 for creating placement data, Step 3 for placing the placement data in the mask blank area, and the intermediate pattern placement instruction information formed by Step 3. Step 4 of converting to information (Note that
It can be seen that step 2 is omitted depending on the viewpoint).

However, as shown in FIG. 1, the details of the procedure 2 for creating the layout data and the procedure 3 for arranging the layout data in the mask blank area are the same as those of the conventional pattern layout instruction information creation method. Are very different.

[Procedure 1 (T11): Data Conversion of Original Image Pattern] The process of converting the original image pattern shown in the drawing into CAD data is the same as the conventional process.

[Procedure 2 (T12): Creation of Placement Data] Based on each CAD data formed in procedure 1, coordinate values in the CAD system coordinate system that defines the rectangular area related to each CAD data (for example, the lower left corner). And the coordinate value of the upper right coordinate)
Recognize. That is, in the first embodiment, C
The coordinate values (lower left and upper right coordinate values) that define the rectangular area related to the AD data are used in the placement process.
It can be said that the CAD data itself is fictitious placement data. In other words, coordinate conversion is not required when creating layout data based on CAD data.

[Procedure 3 (T13): Arrangement of Placement Data in Photomask Blank Area] The singular point coordinates (for example, center point coordinates) C of the mask blank area are recognized in the CAD system coordinate system. Then, "the layout data area (the layout data area composed of the lower left and upper right coordinates) represented in the CAD system coordinate system is defined as a photomask blank in which the singular point (center point) coordinate C of the mask blank in the CAD system coordinate system is Intermediate pattern arrangement instruction information, which means "arrange in the photomask blank area so as to match the position of the singular point (center point) of the area", is created.

If there are a plurality of pattern data (CAD data) arranged on the same mask blank, and the coordinate systems for the respective CAD data are the same, "the data areas for arrangement represented by the CAD system coordinate system are Each is C
Pattern arrangement instruction information in the middle meaning that "the singular point (center point) coordinate C of the mask blank in the AD system coordinate system is arranged so as to match the singular point (center point) of the mask blank in the drawing apparatus coordinate system". To create.

Incidentally, the intermediate pattern layout instruction information created in the procedure 3 of the conventional method indicates the singular point of the layout data as follows.
The arrangement data is arranged so as to coincide with the coordinates of the singular point in the photomask blank area having a coordinate system different from that of the arrangement data. On the other hand, the intermediate pattern placement instruction information created in the procedure 3 of the first embodiment uses the singular point of the photomask blank region having a coordinate system different from the placement data as a reference, Obtaining the coordinate value of the placement data corresponding to the singular point, and placing the placement data so that the coordinate value of the placement data corresponding to the singular point of the photomask blank area matches the singular point of the photomask blank area, That is.

Since the layout data itself follows the coordinate system of the CAD data, and the intermediate pattern layout instruction information itself created in step 3 of the first embodiment is such, the intermediate pattern layout instruction is performed. The information includes the coordinate value according to the coordinate system in the CAD data as it is. Therefore, it is not necessary to convert the coordinate system when creating the intermediate pattern layout instruction information from the layout data.

[Procedure 4 (T14): Conversion of pattern layout instruction information into a format that can be captured by the drawing apparatus] The intermediate pattern layout instruction information created as described above is applied to the apparatus correspondence converter program, and the drawing apparatus sets it. Convert to the final pattern placement instruction information in a format that can be imported.

As described above, the intermediate pattern layout instruction information is "the layout data areas represented in the CAD system coordinate system are respectively set to the singular point (center) of the mask blank in the CAD system coordinate system. Point) coordinate C is arranged so as to coincide with a singular point (center point) of the mask blank in the drawing apparatus coordinate system, but the underlined portion is not included in the command. Which is an instruction for parallel movement of coordinates. Therefore, most of the conventional device-adaptive converter programs can deal with the intermediate pattern placement instruction information created in the procedure 3 of the first embodiment. If the existing device compatible converter program cannot support the intermediate pattern layout instruction information created in the procedure 3 of the first embodiment, it is necessary to change the device compatible converter program itself.

Even if the expression of the intermediate pattern layout instruction information created in the procedure 3 is different between the conventional and the first embodiment, the pattern layout instruction information finally obtained by the device corresponding converter program is The conventional method and the method of the first embodiment are the same.

FIG. 2 shows the above-mentioned steps T1 of the first embodiment.
1 illustrates an example of data conversion by 1 to T14 with the coordinate plane as the center. FIG. 2 is an example in which one pattern is arranged on the mask blank. The coordinate values in FIG. 2 are all values in the CAD system coordinate system.

Now, as shown in FIG. 2A, the original image pattern is in the coordinate system by the CAD system, the lower left coordinate is (-100, -50), and the upper right coordinate is (900, 95).
It is assumed that the data is converted into CAD data having a rectangular shape of (0). It should be noted that although the coordinates of other points are also given to the CAD data, in FIG. 2A, from the relationship with the following description,
The above two points and the origin coordinates are displayed.

Therefore, in the case of this example, as the placement data, as shown in FIG. 2B, the lower left coordinates (−100, -100, which defines the size of the rectangular area relating to the CAD data).
-50), and the upper right coordinate (900,950) is recognized.

Next, the center point coordinates (X0, Y0) of the photomask blank area in the CAD system coordinate system are recognized. The center point of the photomask blank area is set as a singular point that provides a reference for the placement process. And FIG.
As shown in (c), "lower left coordinates (-100, -5
0), the placement data area defined by the upper right coordinates (900, 950) is placed such that the coordinates (X0, Y0) in the same coordinate system as the placement data coincide with the center of the photomask blank area. The intermediate pattern placement instruction information meaning "" is created. For example, if X0 and Y0 are 720 and 730, respectively, "lower left coordinate (-100,
-50), the placement data area defined by the upper right coordinates (900, 950) is set to the coordinates (720, 73) in the same coordinate system.
Intermediate pattern arrangement instruction information, which means that “0) is arranged so as to match the center of the photomask blank region”, is created.

FIG. 3 also shows the above-mentioned steps T1 of the first embodiment.
An example of data conversion by 1 to T14 is shown focusing on the conversion of the coordinate system. FIG. 3 is an example in which two patterns are arranged on a photomask blank.
Also in FIG. 3, the coordinates represented by (x, y) are the coordinates represented by the CAD system coordinate system.

Now, as shown in FIG. 3A, it is assumed that the CAD user forms the CAD data by dividing the original image pattern into two partial sections by the CAD system. Moreover, both CAD data are represented by a coordinate system having the center of the photomask blank area as the origin, and the rectangular area related to one CAD data is the lower left coordinates (-4000, -4200),
The upper right coordinates (-2000, 4000) and the other CA
The rectangular area related to the rectangular shape of the D data is the lower left coordinates (250
0, -2000) and upper right coordinates (4200, 4000).

Therefore, in this example, as the placement data, as shown in FIG. 3B, the lower left coordinate (-400) which defines the size of the rectangular area relating to one of the CAD data.
0, -4200), upper right coordinates (-2000,4000)
And the set of the lower left coordinates (2500, -2000) and the upper right coordinates (4200, 4000) that define the size of the rectangular area related to the other CAD data are recognized.

Next, the center point coordinates (0, 0) of the photomask blank area in the CAD system coordinate system are recognized.
As a result, as shown in FIG. 3C, "lower left coordinates (-4
000, -4200), upper right coordinates (-2000,400
0) and the lower left coordinates (25
00, -2000), upper right coordinates (4200,4000)
And an arrangement data area defined by 1. are arranged such that coordinates (0, 0) in the coordinate system related to the arrangement data coincide with the center of the photomask blank area. Information is created.

As described above, when the CAD data is expressed with the center of the photomask blank area as the origin, the intermediate pattern layout instruction information can be easily created.

Although FIG. 3 shows that the origins of the two CAD data coincide with each other, the two CAD data may be represented by coordinate systems having different origins. Pattern placement instruction information for data,
The coordinates to be matched with the singular point (for example, the center) of the photomask blank area are different (see FIGS. 6 to 8 described later).
reference).

Regardless of the example shown in FIG. 2 or the example shown in FIG. 3, the intermediate pattern placement instruction information created as described above is applied to the device correspondence converter program to obtain the final pattern. Converted to placement instruction information.

Therefore, according to the first embodiment, as the placement data, the set of the lower left coordinates and the upper right coordinates of the rectangular area related to the CAD data is used as it is, and the peculiarity in the coordinate system related to the placement data area is used. Since the intermediate pattern placement instruction information that means matching the point coordinates to the singular point of the photomask blank area is formed, the calculation amount required to obtain the intermediate pattern placement instruction information is smaller than that of the conventional method. It is possible to increase the probability of forming an accurate photomask on the original pattern, and moreover,
Even if an inaccurate photomask occurs, the cause can be easily investigated.

(B) Second Embodiment Hereinafter, a second embodiment of the method for creating the pattern arrangement instruction information according to the present invention will be described in detail with reference to the drawings. This second embodiment is intended for a large-scale photomask blank (for example, one side has a length of 7 inches or more).

Here, FIG. 4 shows an example of a procedure for creating the pattern arrangement instruction information according to the second embodiment. Hereinafter, the procedure for creating the pattern placement instruction information for a large-scale photomask blank will be described with reference to FIG.

As for the large-scale photomask, one or a plurality of small-scale photomasks (reticles) are prepared, and transfer to a large-scale photomask blank using this small-scale photomask is repeated twice or more. The method of creating is used. Therefore, as the pattern placement instruction information when creating the large-scale photomask, the pattern placement instruction information necessary when creating the intermediate small-scale photomask (in the description of the second embodiment, the pattern placement instruction at the time of drawing) Information) and pattern placement instruction information required when creating a large-scale photomask from an intermediate small-scale photomask (referred to as exposure-time pattern placement instruction information in the description of the second embodiment). . The drawing pattern arrangement instruction information can be created by the same method as the above-described case of creating a single small-scale photomask. So, in the following,
A method of creating exposure pattern placement instruction information required when creating a large-scale photomask from an intermediate small-scale photomask will be mainly described.

[Procedure 1 (T21): Data conversion of original image pattern] The original image pattern described in the drawing is, for example, CA.
Data is converted into CAD data based on the drawing using the D system. Information may be provided by the user in the form of CAD data.

[Procedure 2 (T22): Dividing into Pattern Areas Formed on Intermediate Photomask Blank] The size of the large-scale photomask blank is confirmed. Also, by confirming the exposure range of the large-scale photomask exposure apparatus to be used, the allowable range in which the center of the intermediate small-scale photomask can be deviated from the center of the large-scale photomask blank is confirmed. Furthermore, while watching the CAD data, C
Check the area on the AD data. Furthermore, the coordinates in the CAD data corresponding to the center of the large-scale photomask blank are confirmed.

In consideration of (1) minimizing the number of small-scale photomasks, and (2) simplifying the exposure method for large-scale photomask blanks as much as possible, C
The area where the pattern exists in the AD data is a small-scale photomask area (hereinafter referred to as element CAD data)
Split into. Further, it is determined which small-scale photomask blank the pattern associated with which element CAD data is to be drawn on.

For example, it may be decided to draw a pattern relating to two or more element CAD data for one small-scale photomask blank, and two patterns formed on the same small-scale photomask blank. The patterns related to the element CAD data to be drawn on the small scale photomask blank may be determined so that the patterns related to the element CAD data described above are separated on the large scale photomask.

[Procedure 3 (T23): Creation of pattern placement instruction information for intermediate photomask blank] Similar to the method of creating drawing instruction information for a single small-scale photomask, each intermediate small-scale photomask is created. Create intermediate drawing pattern arrangement instruction information for, and apply this intermediate drawing pattern arrangement instruction information to the converter program,
It is converted into the final drawing pattern arrangement instruction information for driving the drawing apparatus (see steps 2 to 4 in the first embodiment).

In this case, the intermediate drawing pattern arrangement instruction information is CA related to the large-scale photomask blank.
The coordinates according to the coordinate system of D data are included as they are.

[Procedure 4 (T24): Creation of Placement Data on Large-Scale Photomask Blank] The exposure position D of the intermediate small-scale photomask with respect to the large-scale photomask blank is recognized in the CAD system coordinate system. Further, the size of the aperture of the exposure apparatus (the size of the pattern related to the element CAD data) at the time of the exposure processing is recognized in the CAD system coordinate system.

For example, the coordinates in the CAD system coordinate system at the lower left and upper right of the rectangular area related to the element CAD data are recognized as the size information of the aperture of the exposure apparatus during the exposure processing. Further, for example, the coordinate D in the CAD system coordinate system that matches the singular point of the small-scale photomask blank in the rectangular area related to the element CAD data is used as position information at the time of exposure of the small-scale photomask to the large-scale photomask blank. recognize.

[Procedure 5 (T25): Arrangement of Placement Data in Large-Scale Mask Blank Area] The singular point coordinates (for example, center point coordinates) E of the large-scale photomask blank are recognized in the CAD system coordinate system. Then, "when the singular point (center point) coordinate of the large-scale photomask blank is E, the small-scale photomask is arranged so that the singular point of the small-scale mask blank in the CAD system coordinate system matches the coordinate D in the same coordinate system. Is positioned and the pattern area related to the element CAD data composed of the lower left and upper right coordinates represented by the CAD system coordinate system is set as the exposure range. " To create. Similarly, when there are a plurality of intermediate small-scale photomask blanks, intermediate exposure pattern arrangement instruction information is created.

[Procedure 6 (T26): Conversion to Final Exposure Pattern Arrangement Instruction Information for Exposure Device Drive] Intermediate exposure pattern arrangement instruction information for exposure device drive created as described above Is converted into final drawing instruction information for driving the exposure apparatus by a converter program (for example, provided by the exposure apparatus manufacturer).
For example, while looking at the drawing in which the intermediate exposure pattern arrangement instruction information is described, the user uses the keyboard,
A command corresponding to the intermediate exposure pattern arrangement instruction information is input and converted into final exposure pattern arrangement instruction information.

The drawing apparatus performs drawing processing on the small-scale photomask blank by using the pattern arrangement instruction information at the time of drawing for the small-scale photomask created by the above procedure 3 to create an intermediate small-scale photomask. To do. In addition, according to the final exposure pattern arrangement instruction information for the exposure apparatus created in step 6 above, the exposure apparatus performs the exposure process through the small-scale photomask on the large-scale photomask blank to perform the large-scale photomask blank. Have a photomask created.

FIG. 5 to FIG. 10 are explanatory views of a specific method of creating pattern arrangement instruction information for creating a large-scale photomask.

The CAD data formed based on the original image pattern provided by the user or the CAD data provided by the user is displayed at the lower left coordinate (-
10000,0), upper right coordinates (260000,2000)
00) of the large-scale photomask is defined, and the pattern exists only in the peripheral portion of the rectangular area of the large-scale photomask. At this time, confirm the exposure range of the large-scale photomask exposure device to be used, minimize the number of small-scale photomasks, and simplify the exposure method for large-scale photomasks as much as possible. With the above in mind, as shown in FIG. 5, the area where the pattern exists in the CAD data is divided into a plurality of partial pattern areas (element CAD data) RA to RG.

At the time of such division processing, which partial pattern area is to be created in which small-scale photomask is also determined. For example, the partial pattern areas RA and R
E is drawn on one small-scale photomask blank SPM1, partial pattern regions RC and RD are drawn on one small-scale photomask blank SPM2, and partial pattern regions RF and RG are written on one small-scale photomask blank. SP
It is decided to draw in M3 and draw the partial pattern region RB in one small-scale photomask blank SPM4.

Since the small-scale photomask produced here is an intermediate member for producing the large-scale photomask, the position of the partial pattern area (placement data) in the small-scale photomask is determined by the information creator. Can be arbitrarily selected.

FIG. 6 shows a small-scale photomask blank SP.
It shows the determined arrangement positions of the partial pattern areas RA and RE with respect to M1. Note that, in FIG. 6, coordinates (x, y) indicate coordinates relating to the partial pattern area RA, and coordinates [x, y] indicate coordinates relating to the partial pattern area RE.

In the case of the arrangement example of FIG. 6, "lower left coordinate (-10
000,108600), upper right coordinates (60000,20)
Partial pattern area RA for arrangement defined by
In the coordinate system (55000, 146000)
Is arranged so as to coincide with the center of the small-scale photomask blank SPM1 ", and the intermediate pattern arrangement instruction information at the time of drawing and" lower left coordinate [224800, 380
00] and the upper right coordinates [260000, 108600] are arranged such that the arrangement partial pattern region RE is arranged so that the coordinates [195000, 55000] in the coordinate system coincide with the center of the small-scale photomask blank SPM1. In the meantime, the pattern layout instruction information at the time of drawing is created.

FIG. 7 shows a small-scale photomask blank SP.
FIG. 8 shows the determined arrangement positions of the partial pattern regions RC and RD with respect to M2, and FIG. 8 shows the determined arrangement positions of the partial pattern regions RF and RG with respect to the small-scale photomask blank SPM3. 9
Shows the determined arrangement position of the partial pattern region RB with respect to the small-scale photomask blank SPM4. Since the meaning of these drawings is the same as that of FIG. 6, the description thereof is omitted.

Intermediate drawing pattern arrangement instruction information for each small-scale photomask blank created as described above is applied to the converter program to make a final drawing pattern arrangement for driving the drawing apparatus. Converted to instruction information. The drawing device draws on the small-scale photomask blank based on the pattern arrangement instruction information and the CAD data, and then resist removal processing or the like is performed to form four intermediate small-scale photomasks.

Here, in FIG. 6, the coordinates (55000, 146000) located at the center of the small-scale photomask blank SPM1 for the partial pattern area RA are also located at the center of the small-scale photomask blank SPM1 for the partial pattern area RE. Coordinates [195000,55
000] is also C for large-scale photomask blanks.
It is a coordinate value according to the coordinate system related to AD data. Conversely, in other words, as shown in FIG. 10, when the center of the large-scale photomask blank is represented by the coordinates (125,000, 100000) of the coordinate system related to CAD data,
Partial pattern area RA or RE on a small-scale photomask
When the exposure apparatus exposes the pattern (1), the position of the center of the small-scale photomask is shown.

Therefore, for example, the intermediate exposure pattern arrangement instruction information for the exposure apparatus for the partial pattern area RA is "mounted when the center coordinates of the large-scale photomask blank are (125,000, 100000). The first small-scale photomask SPM1 is positioned so that its center is at the coordinates (55000, 146000), and the area defined by the lower left coordinates (-10000, 108600) and the upper right coordinates (60000, 200,000) is used as the exposure area. It means "exposure".
Intermediate exposure pattern arrangement instruction information for other partial pattern areas is also formed in the same manner.

FIG. 10 conceptually shows such intermediate exposure pattern arrangement instruction information.

The intermediate exposure pattern arrangement instruction information created as described above is applied to the converter program and converted into the final exposure pattern arrangement instruction information for driving the exposure apparatus. The exposure apparatus performs exposure on the large-scale photomask blank based on the specific exposure pattern arrangement instruction information.

Therefore, according to the second embodiment described above, a small-scale photomask, which is necessary when the intermediate small-scale photomask is prepared and the large-scale photomask is prepared using the intermediate small-scale photomask, Since the intermediate drawing pattern arrangement instruction information and the intermediate exposure pattern arrangement instruction information for creating the large-scale photomask include the coordinate values according to the coordinate system of the CAD data, the conventional instruction information Compared to the creation method, the amount of calculation is small, the probability of creating an inaccurate large-scale photomask due to a calculation error can be reduced, and what information is incorrect if an inaccurate photomask is created Can be done easily.

(C) Other Embodiments The types of the drawing apparatus and the exposure apparatus on which the present invention is based are not limited. That is, it may be an electron beam drawing device, a laser drawing device, a pattern generator, a contact proximity device, a photo repeater, or the like.

In the above embodiment, the singular point of the mask blank that defines the arranging position by the intermediate pattern arranging instruction information is shown at the lower left or the center. Information may be formed.

[0082]

As described above, according to the present invention, the intermediate pattern placement instruction information is formed using the data relating to the placement represented by the coordinate system in the pattern data. Compared to, the calculation amount is small, the probability of creating an incorrect mask due to a calculation error can be reduced, and when an incorrect mask is created,
It is possible to easily verify which information is wrong.

[Brief description of drawings]

FIG. 1 is an explanatory diagram showing a procedure for creating pattern layout instruction information in a first embodiment.

FIG. 2 is an explanatory diagram showing a specific first creation example in the first embodiment.

FIG. 3 is an explanatory diagram showing a specific second creation example in the first embodiment.

FIG. 4 is an explanatory diagram showing a procedure for creating pattern layout instruction information in the second embodiment.

FIG. 5 is an explanatory diagram (part 1) showing a specific creation example in the second embodiment.

FIG. 6 is an explanatory diagram (part 2) showing a specific creation example in the second embodiment.

FIG. 7 is an explanatory diagram (part 3) showing a specific creation example in the second embodiment.

FIG. 8 is an explanatory view (No. 4) showing a specific creation example in the second embodiment.

FIG. 9 is an explanatory view (Part 5) showing a specific creation example in the second embodiment.

FIG. 10 is an explanatory view (No. 6) showing a specific creation example in the second embodiment.

FIG. 11 is an explanatory diagram showing a conventional procedure for creating pattern placement instruction information.

FIG. 12 is an explanatory diagram showing a specific example of conventional creation.

[Explanation of symbols]

T11 ... Data conversion of original image pattern, T12 ... Creation of arrangement data, T13 ... Arrangement of arrangement data in mask blank area, T14 ... Conversion of pattern arrangement instruction information to final format, T21 ... Data conversion of original image pattern, T22 ... Division into pattern areas formed on the intermediate photomask blank, T23 ... Creation of drawing pattern arrangement instruction information, T
24 ... Creation of placement data for large-scale photomask blank, T25 ... Placement of placement data in large-scale mask blank area, T26 ... Conversion of exposure pattern placement instruction information to final format.

Claims (2)

[Claims] 1. (a) The original image pattern drawn on the photomask blank is converted into data for the whole or for each element, and (b) coordinates are expressed in a coordinate system related to each pattern data based on each pattern data. Create the placement data that defines the area of each pattern data, and (c) find the coordinates of the singular point of the photomask blank in the coordinate system that each placement data follows, and select the singular point at the singular point of the photomask blank. (D) A format that is necessary for the drawing device to execute drawing together with the above pattern data and that can be loaded by the drawing device by creating intermediate pattern placement instruction information that instructs that the placement data be placed so that the coordinates are located. Of pattern arrangement instruction information, characterized by comprising a process of converting each of the above intermediate pattern arrangement instruction information into final pattern arrangement instruction information having Law. 2. A pattern to be provided to a drawing device for making each of the small-scale photomasks, which is required when a large-scale photomask is made by an exposure process using an exposure device that uses one or more small-scale photomasks. Placement instruction information,
And a method of creating pattern placement instruction information for creating the pattern placement instruction information to be given to the exposure apparatus, comprising: (A) converting an original image pattern drawn on a large-scale photomask blank into data for each element. The small-scale photomask blank on which each of the element pattern data that has been written is determined, and (B) the final pattern placement instruction information for each of the small-scale photomask blanks is processed according to claim 1 (b).
Created in ~ (d), (C) Obtain the coordinates of the singular point of the large-scale photomask blank in the coordinate system that each element pattern data follows, and locate the singular point coordinates at the singular point of the large-scale photomask blank. Create intermediate pattern placement instruction information to instruct placement of each small-scale photomask as described above, and (D) create final pattern placement instruction information that has a format that can be captured by the exposure device and that is required for exposure by the exposure device. A method of creating pattern arrangement instruction information, characterized by comprising a process of converting each of the intermediate pattern arrangement instruction information.