JPH07150362A - Production of ysz buffer layer on sapphire - Google Patents

Production of ysz buffer layer on sapphire

Info

Publication number
JPH07150362A
JPH07150362A JP5318932A JP31893293A JPH07150362A JP H07150362 A JPH07150362 A JP H07150362A JP 5318932 A JP5318932 A JP 5318932A JP 31893293 A JP31893293 A JP 31893293A JP H07150362 A JPH07150362 A JP H07150362A
Authority
JP
Japan
Prior art keywords
aerosol
sapphire
ysz
raw material
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP5318932A
Other languages
Japanese (ja)
Inventor
Yoshio Matsuzaki
良雄 松崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Gas Co Ltd
Original Assignee
Tokyo Gas Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Gas Co Ltd filed Critical Tokyo Gas Co Ltd
Priority to JP5318932A priority Critical patent/JPH07150362A/en
Publication of JPH07150362A publication Critical patent/JPH07150362A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/50Fuel cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemically Coating (AREA)
  • Formation Of Insulating Films (AREA)
  • Fuel Cell (AREA)

Abstract

PURPOSE:To produce a YSZ thin film having good orientability by acting ultrasonic waves on a raw material soln. in a vessel to generate an aerosol and spraying this aerosol onto a sapphire which is previously heated. CONSTITUTION:The raw material soln. 9 consisting of a metal salt is put into the vessel 7. The aerosol 8 of the raw material soln. 9 is generated when the ultrasonic waves is generated by actuating an ultrasonic vibrator transducer 17. The generated aerosol 8 is passed in an aerosol spraying pipe 4 and is put into a reaction tube 10 under the atm. pressure. The aerosol 8 made into a mist form is sprayed as a precursor perpendicularly atop the sapphire 16. The sapphire 16 is previously heated to about 770 deg.C. The aerosol 8 is thermally cracked at the moment the aerosol collides against the sapphire 16, by which the film formation is executed. As a result, the good-quality YSZ thin film is formed on the sapphire 16. Then, a YSZ buffer layer having the excellent controllability of the film thickness is produced.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はサファイア上へのYSZ
バファー層の作製法に関する。
FIELD OF THE INVENTION The present invention relates to YSZ on sapphire.
The present invention relates to a method for manufacturing a buffer layer.

【0002】[0002]

【従来技術】サファイア上に酸化物超伝導体を作製する
場合に格子定数の不整合を緩和するためにバファ層とし
て高配向したYSZ(yttria-stabilized-zilconia)、C
eO2 等の蛍石型の結晶構造を持つ酸化物の薄膜が用い
られる。従来、高配向膜の作製には、電子ビーム蒸着、
イオンビームスパッタリング、パルスレーザーアブレー
ション、CVD、溶液法などが用いられている。なお、
YSZ薄膜は固体電解質燃料電池の電解質層材料として
も使用されている。
2. Description of the Related Art YSZ (yttria-stabilized-zilconia), C, which is highly oriented as a buffer layer in order to alleviate lattice constant mismatch when an oxide superconductor is formed on sapphire, C
A thin film of an oxide such as eO 2 having a fluorite type crystal structure is used. Conventionally, electron beam evaporation,
Ion beam sputtering, pulse laser ablation, CVD, solution method, etc. are used. In addition,
The YSZ thin film is also used as an electrolyte layer material of a solid oxide fuel cell.

【0003】[0003]

【発明が解決しようとする課題】電子ビーム蒸着、イオ
ンビームスパッタリング、パルスレーザーアブレーショ
ン、CVDなどはいずれも真空装置が必要なため高コス
トな作製法となり、また、溶液法は膜厚の制御性に劣る
欠点がある。
Electron beam evaporation, ion beam sputtering, pulsed laser ablation, CVD, etc. all require a vacuum device and are therefore high-cost manufacturing methods. Also, the solution method has high controllability of film thickness. It has inferior drawbacks.

【0004】本発明は上述の点にかんがみてなされたも
ので、サファイア上に配向性の良好なYSZ薄膜を低コ
ストで作製することができ、その膜厚の制御性に優れた
YSZバファー層の作製法を提供することを目的とす
る。
The present invention has been made in view of the above points, and it is possible to form a YSZ thin film having good orientation on sapphire at low cost, and to provide a YSZ buffer layer having excellent controllability of the film thickness. It is intended to provide a manufacturing method.

【0005】[0005]

【課題を解決するための手段】上記課題を解決するため
本発明は、サファイア上に高配向なYSZ薄膜を作製す
る方法であって、大気圧下のエアロゾル発生器の容器に
原料溶液を入れる段階と、前記容器内の原料溶液に超音
波を作用させてエアロゾルを発生させる段階と、エアロ
ゾルを噴霧させる段階と、噴霧したエアロゾルを予め赤
外線ランプ等で加熱したサファイア上にプリカーサーと
して噴霧してYSZ膜を成膜させる段階と、を包含する
ことを特徴とする。
In order to solve the above problems, the present invention is a method for producing a highly oriented YSZ thin film on sapphire, which comprises the step of putting a raw material solution into a container of an aerosol generator under atmospheric pressure. And a step of generating an aerosol by applying ultrasonic waves to the raw material solution in the container, a step of spraying the aerosol, and a YSZ film obtained by spraying the sprayed aerosol as a precursor on sapphire preheated with an infrared lamp or the like. And a step of forming a film.

【0006】[0006]

【作用】成膜作業はすべて大気圧の下で行なわれ、ま
た、基板のみ高温度に温度上昇するが、その他の部分は
室温で作動するので、作業が簡単でし易くなる。
The film forming operation is all performed under atmospheric pressure, and the temperature of only the substrate rises to a high temperature, but the other parts operate at room temperature, so the operation is simple and easy.

【0007】[0007]

【実施例】以下、本発明を実施例について説明する。EXAMPLES The present invention will be described below with reference to examples.

【0008】図1は本発明のサファイア上へのYSZバ
ファー層の作製法を実施する装置の概略構成を示す斜視
図である。
FIG. 1 is a perspective view showing a schematic structure of an apparatus for carrying out the method for producing a YSZ buffer layer on sapphire according to the present invention.

【0009】エアロゾル発生器1は水を入れた密封容器
であり、該エアロゾル発生器1の内部の底に超音波振動
子17が取り付けられ、また、この水の上にY、Zrを
含む原料溶液9を入れた椀状容器7が浮かんでいる。前
記エアロゾル発生器1の一端にキャリアガス送入管2が
連結され、他端にエアロゾル給送管3が取り付けられて
いる。
The aerosol generator 1 is a sealed container containing water, an ultrasonic vibrator 17 is attached to the bottom inside the aerosol generator 1, and a raw material solution containing Y and Zr is placed on the water. A bowl-shaped container 7 containing 9 is floating. A carrier gas feed pipe 2 is connected to one end of the aerosol generator 1, and an aerosol feed pipe 3 is attached to the other end.

【0010】T字形反応管10は1本の直立支管11と
2本の水平支管12からなり、透明な石英ガラスで作ら
れ、その3個の開口はシリコンゴムで作った栓13によ
り塞がれている。直立支管11の開口に嵌めた栓13を
エアロゾル給送管3の一端が貫通し、このエアロゾル給
送管3の端部にエアロゾル噴霧管4が摺動自在に嵌合し
ている。エアロゾル給送管3はゴムホース、ガラス管や
ポリマチューブ等で作られ、エアロゾル噴霧管4は石英
ガラスで作られている。
The T-shaped reaction tube 10 is composed of one upright branch tube 11 and two horizontal branch tubes 12, made of transparent quartz glass, and its three openings are closed by plugs 13 made of silicone rubber. ing. One end of the aerosol delivery pipe 3 penetrates a plug 13 fitted in the opening of the upright branch pipe 11, and an aerosol spray pipe 4 is slidably fitted to the end of the aerosol delivery pipe 3. The aerosol feed pipe 3 is made of a rubber hose, a glass pipe, a polymer tube, or the like, and the aerosol spray pipe 4 is made of quartz glass.

【0011】反応管10の内部でエアロゾル噴霧管4の
垂直方向下方にサセプター15が水平に配置され、この
サセプター15の上面に基板としてのサファイア16が
載置されている。サセプター15はNi等の金属で作ら
れている。
Inside the reaction tube 10, a susceptor 15 is horizontally arranged below the aerosol spray tube 4 in the vertical direction, and a sapphire 16 as a substrate is placed on the upper surface of the susceptor 15. The susceptor 15 is made of a metal such as Ni.

【0012】サファイア16はエアロゾル噴霧管4の噴
霧口5の直下に位置決めされている。サファイア16と
エアロゾル噴霧管4の噴霧口5との間隔Hはエアロゾル
噴霧管4を上下に摺動させることにより調節することが
でき、間隔Hを1〜2cmまで短縮することができる。
The sapphire 16 is positioned immediately below the spray port 5 of the aerosol spray tube 4. The interval H between the sapphire 16 and the spray port 5 of the aerosol spray tube 4 can be adjusted by sliding the aerosol spray tube 4 up and down, and the interval H can be shortened to 1 to 2 cm.

【0013】T字型反応管10の左右2本の水平支管1
2の開口にはめた栓13をそれぞれ排気管14が貫通し
ている。
Two horizontal branch tubes 1 on the left and right of the T-shaped reaction tube 10.
The exhaust pipes 14 penetrate through the plugs 13 fitted in the openings of the two.

【0014】T字型反応管10の外部においてサセプタ
ー15の直下に、サセプター15の加熱器として赤外線
ランプ6が配置されている。
An infrared lamp 6 is arranged as a heater of the susceptor 15 just below the susceptor 15 outside the T-shaped reaction tube 10.

【0015】本発明のYSZ(イットリア安定化ジルコ
ニア)を成膜する工程を順番に説明する。 (1)大気圧下のエアロゾル発生器1の中の容器7にオ
クチル酸塩、ナフテン酸塩などの金属塩を原料溶液9と
して入れる。 (2)超音波振動子17を作動させて超音波を発生する
と、原料溶液9のエアロゾル8を発生する。 (3)キャリアガスとしての空気がキャリアガス送入管
2を通じてエアロゾル発生器1の中に供給される。 (4)エアロゾル発生器1の中で発生したエアロゾル8
はキャリアガスに乗ってエアロゾル給送管3及びエアロ
ゾル噴霧管4の中を通過して大気圧下の反応管10に入
る。 (5)超音波でミスト化した金属塩のエアロゾル8をプ
リカーサーとしてエアロゾル噴霧管4からサファイア1
6の上面に垂直に噴霧する。あらかじめ赤外線ランプ6
を作動させることによりサセプター15が既に加熱さ
れ、その上のサファイア16は約770°Cに温度上昇
している。したがって、エアロゾル8はサファイア16
に衝突した瞬間に熱分解して成膜作用を行なう。 (6)反応管10の中に発生する排出ガスは排気管14
を通じて外部に排出される。 (7)このようにして、サファイア16上に良質のYS
Z薄膜が成膜される。
The steps of forming the YSZ (yttria-stabilized zirconia) film of the present invention will be described in order. (1) A metal salt such as octylate or naphthenate is placed as a raw material solution 9 in a container 7 inside the aerosol generator 1 under atmospheric pressure. (2) When the ultrasonic oscillator 17 is operated to generate ultrasonic waves, the aerosol 8 of the raw material solution 9 is generated. (3) Air as a carrier gas is supplied into the aerosol generator 1 through the carrier gas inlet pipe 2. (4) Aerosol 8 generated in the aerosol generator 1
Ride on the carrier gas, pass through the aerosol feed pipe 3 and the aerosol spray pipe 4, and enter the reaction pipe 10 under atmospheric pressure. (5) From the aerosol spray tube 4 to the sapphire 1 using the aerosol 8 of metal salt atomized by ultrasonic waves as a precursor.
Spray vertically on top of 6. Infrared lamp 6 beforehand
The susceptor 15 is already heated by activating the sapphire, and the temperature of the sapphire 16 thereon is raised to about 770 ° C. Therefore, the aerosol 8 is sapphire 16
The film is formed by thermal decomposition at the moment it collides with. (6) Exhaust gas generated in the reaction tube 10 is exhaust pipe 14
Is discharged to the outside through. (7) In this way, good quality YS on sapphire 16
A Z thin film is formed.

【0016】上記作業において、赤外線ランプ6により
サセプター15のみが加熱され、反応管10は加熱され
ない。サファイア16の表面とエアロゾル噴霧管4の噴
霧口5との間隔Hを張設することにより、エアロゾル8
のサファイア16上のみに衝突して熱分解するように調
節することができる。上記作業はすべて大気圧のもとで
行なわれ、真空中で作業する必要がなく、また前述のよ
うにサファイア16は約770°Cに温度上昇するが、
その他の部分は室温で作業ができる。
In the above work, only the susceptor 15 is heated by the infrared lamp 6 and the reaction tube 10 is not heated. By providing a distance H between the surface of the sapphire 16 and the spray port 5 of the aerosol spray tube 4, the aerosol 8
It can be adjusted to impinge on only the sapphire 16 and thermally decompose. All of the above operations are performed under atmospheric pressure, there is no need to work in a vacuum, and as described above, the temperature of sapphire 16 rises to about 770 ° C,
Other parts can be worked at room temperature.

【0017】上記実施例において、反応管10はT字状
のものを使用したが、その他の形状のものでもよく、例
えば、2本の水平支管12のかわりに4本や8本等の水
平支管を使用してもよい。要は直立支管11の中にエア
ロゾル噴霧管4を垂直に配置し、その直下にサファイア
16を水平に配置することが大切である。
In the above embodiment, the reaction tube 10 is T-shaped, but other shapes may be used. For example, instead of the two horizontal branch tubes 12, four horizontal branch tubes or eight horizontal branch tubes are used. May be used. In short, it is important to vertically arrange the aerosol spray pipe 4 in the upright branch pipe 11 and horizontally arrange the sapphire 16 directly below it.

【0018】次に本発明の方法をサファイア上で実施し
た場合の実験例を示す。
Next, an example of an experiment when the method of the present invention is carried out on sapphire will be shown.

【0019】実験仕様を次表に示す。The experimental specifications are shown in the following table.

【0020】[0020]

【表1】 図2は上記実験で作製した薄膜のX線回析の結果を示す
グラフである。
[Table 1] FIG. 2 is a graph showing the results of X-ray diffraction of the thin film produced in the above experiment.

【0021】図2に基板温度が750°Cにおける薄膜
の配向性を示している。このグラフから(111)面に
優先配向していることが分かる。
FIG. 2 shows the orientation of the thin film at a substrate temperature of 750 ° C. From this graph, it can be seen that the (111) plane is preferentially oriented.

【0022】[0022]

【発明の効果】以上説明したように本発明のサファイア
上へのYSZバファー層の作製法では、赤外線を用いて
透明石英管の内部のサセプターを加熱することでサファ
イアのみを高温度に昇温できるようにし、かつエアロゾ
ルの噴霧口をサファイアから1〜2cmの近さまで近付け
るようにし、さらに超音波を用いて溶液を微粒化する構
成にしたので次のような優れた効果が得られる。 (1)成膜作業はすべて大気圧のもとで行われ、また、
サファイアのみは770°Cに温度上昇するが、その他
の部分は室温で作動する構成となっているので、装置が
簡単、廉価で作業がし易い。 (2)この装置により緻密で均質な高配向なYSZ薄膜
を成膜することができる。 (3)特に、原料の金属塩として金属石けんを用いると
配向性の良好な薄膜が得られる。
As described above, in the method of manufacturing the YSZ buffer layer on the sapphire of the present invention, only the sapphire can be heated to a high temperature by heating the susceptor inside the transparent quartz tube using infrared rays. Since the atomizing port of the aerosol is brought close to the sapphire to a distance of 1 to 2 cm, and the solution is atomized by using ultrasonic waves, the following excellent effects can be obtained. (1) All film forming operations are performed under atmospheric pressure,
Only sapphire rises in temperature to 770 ° C, but the other parts are configured to operate at room temperature, so the device is simple, inexpensive, and easy to work with. (2) With this device, a dense and uniform YSZ thin film with high orientation can be formed. (3) In particular, when metal soap is used as the metal salt as a raw material, a thin film having good orientation can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のサファイア上へのYSZバファー層の
作製法を実施する装置の概略構成を示す一部断面斜視図
である。
FIG. 1 is a partial cross-sectional perspective view showing a schematic configuration of an apparatus for carrying out a method for producing a YSZ buffer layer on sapphire according to the present invention.

【図2】本発明の方法を使用して作製した薄膜の配向性
を示すグラフである。
FIG. 2 is a graph showing the orientation of a thin film produced using the method of the present invention.

【符号の説明】[Explanation of symbols]

1 T字型反応管 2 キャリアガス送入管 3 エアロゾル給送管 4 エアロゾル噴霧管 5 噴霧口 6 赤外線ランプ 7 椀状容器 8 エアロゾル 9 原料溶液 10 T字型反応管 11 直立支管 12 水平支管 13 栓 14 排気管 15 サセプター 16 サファイア 17 超音波振動子 1 T-shaped reaction tube 2 Carrier gas inlet tube 3 Aerosol supply tube 4 Aerosol spray tube 5 Spray port 6 Infrared lamp 7 Bowl-shaped container 8 Aerosol 9 Raw material solution 10 T-shaped reaction tube 11 Upright branch tube 12 Horizontal branch tube 13 Plug 14 Exhaust pipe 15 Susceptor 16 Sapphire 17 Ultrasonic transducer

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 サファイア上に高配向なYSZ薄膜を作
製する方法であって、大気圧下のエアロゾル発生器の中
の容器に原料溶液を入れる段階と、前記容器原料溶液に
超音波を作用させてエアロゾルを発生させる段階と、エ
アロゾルをあらかじめ加熱したサファイア上に噴霧して
YSZ膜を成膜させる段階と、を包含することを特徴と
するサファイア上へのYSZバファー層の作製法。
1. A method for producing a highly oriented YSZ thin film on sapphire, comprising the steps of placing a raw material solution in a container in an aerosol generator under atmospheric pressure, and applying ultrasonic waves to the container raw material solution. A method for producing a YSZ buffer layer on sapphire, which comprises the steps of: generating an aerosol by applying the aerosol and spraying the aerosol onto a pre-heated sapphire to form a YSZ film.
JP5318932A 1993-11-25 1993-11-25 Production of ysz buffer layer on sapphire Withdrawn JPH07150362A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5318932A JPH07150362A (en) 1993-11-25 1993-11-25 Production of ysz buffer layer on sapphire

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5318932A JPH07150362A (en) 1993-11-25 1993-11-25 Production of ysz buffer layer on sapphire

Publications (1)

Publication Number Publication Date
JPH07150362A true JPH07150362A (en) 1995-06-13

Family

ID=18104601

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5318932A Withdrawn JPH07150362A (en) 1993-11-25 1993-11-25 Production of ysz buffer layer on sapphire

Country Status (1)

Country Link
JP (1) JPH07150362A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006310190A (en) * 2005-04-28 2006-11-09 Dainippon Printing Co Ltd Proton conducting type fuel cell and its manufacturing method
JP2007077433A (en) * 2005-09-13 2007-03-29 Fujikura Ltd Film deposition system
JP2007299767A (en) * 2007-07-18 2007-11-15 National Institute Of Advanced Industrial & Technology Electrolyte material for solid electrolyte fuel cells, solid electrolyte fuel cell and method for fabrication thereof
JP2009120872A (en) * 2007-11-12 2009-06-04 Dainippon Printing Co Ltd Method for producing metal oxide film

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006310190A (en) * 2005-04-28 2006-11-09 Dainippon Printing Co Ltd Proton conducting type fuel cell and its manufacturing method
JP2007077433A (en) * 2005-09-13 2007-03-29 Fujikura Ltd Film deposition system
JP2007299767A (en) * 2007-07-18 2007-11-15 National Institute Of Advanced Industrial & Technology Electrolyte material for solid electrolyte fuel cells, solid electrolyte fuel cell and method for fabrication thereof
JP2009120872A (en) * 2007-11-12 2009-06-04 Dainippon Printing Co Ltd Method for producing metal oxide film

Similar Documents

Publication Publication Date Title
US5356672A (en) Method for microwave plasma assisted supersonic gas jet deposition of thin films
WO2013038484A1 (en) Oxide film deposition method and oxide film deposition device
KR100212906B1 (en) Process for producing oxide films and chemical deposition apparatus therefor
JP2016216332A (en) Method for producing yttrium oxide film
EP0492880A2 (en) Method of preparing metal oxide films
JPH07150362A (en) Production of ysz buffer layer on sapphire
JPH07150361A (en) Production of soi device using ysz thin film
JP2000212749A (en) Thin film forming device and production of tungsten nitride thin film
JPS61244025A (en) Manufacture of thin film
CN105121699B (en) Film build method
JP5378631B2 (en) Vapor growth crystal thin film manufacturing method
JPS5852473A (en) Surface treatment of metallic material
JPH0324259A (en) Direct plotting device by laser
RU2188878C2 (en) Method of application of amorphous silicon films and device for realization of this method
JPH01298168A (en) Device for forming metallic compound
JPS6197912A (en) Cvd equipment
JPH0249386B2 (en) PURAZUMACVD SOCHI
JPH0312788B2 (en)
JPS63179074A (en) Production of electrically conductive film
JPS59140369A (en) Method and device for producing thin film
JPH0869809A (en) Synthesizing method of ysz thin film by using vacuum ultraviolet ray and its device
JPH05311462A (en) Method for film formation by heat plasma
JPH0475775B2 (en)
TW583324B (en) Method and equipment for growing a thin film in a low temperature
JPH03174305A (en) Production of oxide superconductor

Legal Events

Date Code Title Description
A300 Withdrawal of application because of no request for examination

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20010130