JPH0714725Y2 - High frequency cooking device with heater - Google Patents

High frequency cooking device with heater

Info

Publication number
JPH0714725Y2
JPH0714725Y2 JP1989035836U JP3583689U JPH0714725Y2 JP H0714725 Y2 JPH0714725 Y2 JP H0714725Y2 JP 1989035836 U JP1989035836 U JP 1989035836U JP 3583689 U JP3583689 U JP 3583689U JP H0714725 Y2 JPH0714725 Y2 JP H0714725Y2
Authority
JP
Japan
Prior art keywords
heater
upper heater
plate
cooking chamber
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1989035836U
Other languages
Japanese (ja)
Other versions
JPH02128005U (en
Inventor
繁和 住田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP1989035836U priority Critical patent/JPH0714725Y2/en
Priority to KR2019900003781U priority patent/KR930007865Y1/en
Publication of JPH02128005U publication Critical patent/JPH02128005U/ja
Application granted granted Critical
Publication of JPH0714725Y2 publication Critical patent/JPH0714725Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00Heating by electric, magnetic or electromagnetic fields
    • H05B6/64Heating using microwaves
    • H05B6/647Aspects related to microwave heating combined with other heating techniques
    • H05B6/6482Aspects related to microwave heating combined with other heating techniques combined with radiant heating, e.g. infrared heating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00Heating by electric, magnetic or electromagnetic fields
    • H05B6/64Heating using microwaves
    • H05B6/6408Supports or covers specially adapted for use in microwave heating apparatus
    • H05B6/6411Supports or covers specially adapted for use in microwave heating apparatus the supports being rotated

Description

【考案の詳細な説明】 [考案の目的] (産業上の利用分野) 本考案は、加熱調理室の上面部に反射板と上ヒータを備
えたヒータ付高周波加熱調理装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial field of application) The present invention relates to a high-frequency cooking apparatus with a heater, which has a reflector and an upper heater on the upper surface of a cooking chamber.

(従来の技術) 従来のヒータ付高周波加熱調理装置は、第4図に示すよ
うに、加熱調理室1の底部中央に、モータ2によって回
転駆動される回転皿3を設け、この回転皿3上の調理物
(図示せず)をマグネトロン(図示せず)によって高周
波加熱するようになっている。更に、加熱調理室1内の
中段に焼き網5を前面扉6側に変倚させて出入れ可能に
設けると共に、この焼き網5に対応して、加熱調理室1
の上面部に反射板7を前面扉6側に変倚させて設けてい
る。この反射板7は、その内側にヒータ収納空間7aを形
成するために、上方に突出し且つ左右方向に延びる形状
に形成されている。そして、この反射板7の内側に上ヒ
ータ8が左右方向に延びるように設けられている。
(Prior Art) As shown in FIG. 4, a conventional high-frequency heating cooking device with a heater is provided with a rotary plate 3 rotatably driven by a motor 2 in the center of the bottom of a heating cooking chamber 1. The cooked food (not shown) is heated at high frequency by a magnetron (not shown). Furthermore, the grill 5 is provided in the middle of the cooking chamber 1 so that it can be moved in and out by changing it to the front door 6 side.
The reflection plate 7 is provided on the upper surface of the above so as to change to the front door 6 side. The reflector 7 is formed in a shape protruding upward and extending in the left-right direction so as to form a heater housing space 7a inside thereof. An upper heater 8 is provided inside the reflector 7 so as to extend in the left-right direction.

(考案が解決しようとする課題) 上記従来構成では、反射板7が前面扉6側に変倚してい
るため、高周波加熱時に反射板7による反射波の分布状
態も前面扉6側に変倚したものとなる。これに対し、調
理物を載せる回転皿3は、加熱調理室1内の中央に位置
しているため、回転皿3上の調理物に照射される上記反
射波の分布状態が均一にならず、前面扉6側に片寄った
ものとなっとなり、これが高周波加熱時に調理物の均一
加熱を阻害する原因となっていた。
(Problems to be Solved by the Invention) In the above conventional configuration, since the reflection plate 7 is changed to the front door 6 side, the distribution state of the reflected wave by the reflection plate 7 during high frequency heating is also changed to the front door 6 side. It will be what you did. On the other hand, since the rotary dish 3 on which the food is placed is located in the center of the cooking chamber 1, the distribution state of the reflected waves applied to the food on the rotary dish 3 is not uniform, The front door 6 is biased toward the side, which is a cause of hindering uniform heating of the cooked food during high frequency heating.

これを改善するために、例えば特開昭64−3418号公報に
示すように、反射板を回転皿の回転中心のほぼ真上に位
置させて、この反射板の中央に上ヒータを配置した構成
としたものがある。
In order to improve this, for example, as shown in Japanese Patent Laid-Open No. Sho 64-3418, a reflector is positioned almost directly above the center of rotation of a rotating dish, and an upper heater is arranged in the center of this reflector. There is something.

しかしながら、加熱調理室の背面は上ヒータの輻射熱を
反射しやすいステンレス板等の金属板で形成されている
のに対し、加熱調理室の前面である前面扉の内面は、輻
射熱の反射率の低いガラス板等により構成されているの
で、上記公報に記載の構成のように、反射板の中央に上
ヒータを配置した構成とすると、上ヒータによる加熱時
に背面側からの反射熱が前面側からの反射熱よりも強く
なって、回転皿上の温度分布がアンバランスな状態とな
り、上ヒータによる加熱時に調理物を均一加熱できない
という欠点がある。
However, the back surface of the cooking chamber is formed of a metal plate such as a stainless steel plate that easily reflects the radiant heat of the upper heater, while the inner surface of the front door, which is the front surface of the cooking chamber, has a low radiant heat reflectance. Since it is composed of a glass plate or the like, if the upper heater is arranged in the center of the reflector as in the structure described in the above publication, the reflected heat from the back side from the front side when heated by the upper heater is It becomes stronger than the reflected heat, the temperature distribution on the rotating dish becomes unbalanced, and there is a drawback that the food cannot be uniformly heated when heated by the upper heater.

本考案はこのような事情を考慮してなされたもので、従
ってその目的は、加熱調理室の上面部に反射板と上ヒー
タを備えたものにあって、高周波加熱時及び上ヒータに
よる加熱時のいずれの場合でも、調理物の均一加熱を可
能ならしめ得るヒータ付高周波加熱調理装置を提供する
にある。
The present invention has been made in consideration of such circumstances, and therefore an object of the present invention is to provide a reflector and an upper heater on the upper surface of a heating and cooking chamber for high frequency heating and heating by the upper heater. In any of the above cases, it is an object of the present invention to provide a high-frequency heating cooking device with a heater, which can uniformly heat the cooked food.

[考案の構成] (課題を解決するための手段) 本考案のヒータ付高周波加熱調理装置は、加熱調理室の
底部に回転可能に設けられた回転皿と、この回転皿上の
調理物を高周波加熱するマグネトロンと、前記加熱調理
室の上面部に上方に突出し且つ左右方向に延びるように
設けられた反射板と、この反射板の内側に左右方向に延
びるように配設された上ヒータとを備えたものにおい
て、前記反射板の前後方向中心を前記回転皿の回転中心
のほぼ真上に位置させる構成とすると共に、前記上ヒー
タの位置を前記反射板の内側において前記加熱調理室の
前面扉側に変倚させた構成としたものである。
[Structure of the Invention] (Means for Solving the Problems) A high-frequency heating and cooking apparatus with a heater according to the present invention includes a rotary plate rotatably provided at the bottom of a heating chamber and a cooking dish on the rotary plate at a high frequency. A magnetron for heating, a reflection plate provided on the upper surface of the heating chamber so as to project upward and extend in the left-right direction, and an upper heater arranged inside the reflection plate so as to extend in the left-right direction. The front door of the cooking chamber is configured such that the center of the reflector in the front-rear direction is located almost directly above the center of rotation of the rotary plate, and the position of the upper heater is inside the reflector. It is configured to change to the side.

(作用) 反射板の前後方向中心を回転皿の回転中心のほぼ真上に
位置させているので、反射板からの反射波の分布状態が
回転皿上においてほぼ均一となり、高周波加熱時に回転
皿上の調理物の加熱具合が均一となる。
(Operation) Since the center of the reflector in the front-rear direction is located almost directly above the center of rotation of the rotary plate, the distribution of the reflected waves from the reflector becomes almost uniform on the rotary plate, and the high frequency heating will cause The heating condition of the cooked food becomes uniform.

皿に、加熱調理室の背面は上ヒータの輻射熱を反射しや
すいステンレス板等の金属板で形成されているのに対
し、加熱調理室の前面である前面扉の内面は、輻射熱の
反射率の低いガラス板等により構成されている点を考慮
して、上ヒータの位置を反射板の内側において加熱調理
室の前面扉側に変倚させているので、上ヒータによる加
熱時に背面側からの反射熱と前面側からの反射熱とを均
等化できて、回転皿上の温度分布を均一化でき、上ヒー
タによる加熱時に調理物の均一加熱を可能ならしめ得
る。
In the dish, the back of the cooking chamber is formed of a metal plate such as a stainless plate that easily reflects the radiant heat of the upper heater, while the inner surface of the front door, which is the front of the cooking chamber, is In consideration of the fact that it is composed of a low glass plate, etc., the position of the upper heater is changed to the front door side of the cooking chamber inside the reflection plate, so that reflection from the back side when heating by the upper heater The heat and the heat reflected from the front side can be equalized, and the temperature distribution on the rotating dish can be made uniform, and the cooking can be uniformly heated when the upper heater heats.

(実施例) 以下、本考案の一実施例を第1図乃至第3図に基づいて
説明する。
Embodiment An embodiment of the present invention will be described below with reference to FIGS. 1 to 3.

まず、全体の縦断正面図を示す第2図(外箱の図示を省
略している)において、11は内部を加熱調理室12とする
内箱で、その底部中央には、モータ13によって回転駆動
される回転皿14が配設されている。この回転皿14と内箱
11の底板との間には下ヒータ15が配設されている。一
方、内箱11の右側面部には、導波管16が取着され、この
導波管16にマグネトロン17か固定されている。18は内箱
11の上面部に溶接等により取付けられた反射板で、この
反射板18は、第1図に示すように上方に多角形状に突出
し且つ左右方向に延びるように形成され、内箱11の上面
部の矩形状開口部11aを通して反射板18の下面側が加熱
調理室12内に開放されている。この場合、反射板18の前
後方向中心Cを回転皿14の回転中心(モータ13の回転軸
13a)のほぼ真上に位置させる構成としている。そし
て、この反射板18の内側の後述する位置には、例えばガ
ラス管ヒータからなる上ヒータ19が左右方向に延びるよ
うに配設されている。
First, in FIG. 2 showing a vertical front view of the whole body (the outer box is not shown), 11 is an inner box having a heating and cooking chamber 12 inside, and a motor 13 is rotationally driven in the center of the bottom of the box. A rotating dish 14 is provided. This rotating plate 14 and inner box
A lower heater 15 is disposed between the bottom plate 11 and the bottom plate. On the other hand, a waveguide 16 is attached to the right side surface of the inner box 11, and a magnetron 17 is fixed to the waveguide 16. 18 is the inner box
A reflection plate attached to the upper surface of 11 by welding or the like. This reflection plate 18 is formed so as to project upward in a polygonal shape and extend in the left-right direction as shown in FIG. The lower surface side of the reflection plate 18 is opened into the cooking chamber 12 through the rectangular opening 11a. In this case, the center C of the reflecting plate 18 in the front-rear direction is set to the rotation center of the rotary plate 14 (the rotation axis of the motor 13).
It is located almost directly above 13a). An upper heater 19 made of, for example, a glass tube heater is disposed inside the reflector 18 at a position described later so as to extend in the left-right direction.

ここで留意すべき点は、上ヒータ19の位置を反射板18の
内側において加熱調理室12の前面扉23側に変倚させたこ
とである。この場合の上ヒータ19の変倚量lは、例えば
10mmに設定されている。
The point to be noted here is that the position of the upper heater 19 is changed to the front door 23 side of the cooking chamber 12 inside the reflection plate 18. In this case, the displacement amount 1 of the upper heater 19 is, for example,
It is set to 10 mm.

尚、上ヒータ19の取付構造は、第3図に示すように、反
射板18の端板部18aにヒータ貫通筒部20を外向きに突出
形成し、このヒータ貫通筒部20に固定した環状の碍子21
に上ヒータ19を支持すると共に、内箱11の上面に固定し
た取付板22によって上ヒータ19の左右方向の移動を規制
するものである。また、第1図において、23は加熱調理
室12の前面を開閉する前面扉である。
As shown in FIG. 3, the mounting structure of the upper heater 19 has an annular shape in which the heater penetrating cylinder portion 20 is formed so as to project outward on the end plate portion 18a of the reflecting plate 18 and is fixed to the heater penetrating cylinder portion 20. Insulator 21
The upper heater 19 is supported by the mounting plate 22 fixed to the upper surface of the inner box 11, and the lateral movement of the upper heater 19 is restricted. Further, in FIG. 1, 23 is a front door that opens and closes the front surface of the heating and cooking chamber 12.

次に、上記構成の作用について説明する。高周波加熱に
より調理を行う場合には、回転皿14上に加熱物を載せ、
モータ13に通電して回転皿14を回転させると共に、マグ
ネトロン17を動作させて高周波(マイクロ波)を発生
し、この高周波を導波管16の出口16aから加熱調理室12
内に放射させる。これにより、回転皿14上の調理物は、
導波管16の出口16aからの直接波と、内箱11の内面及び
反射板18で反射した反射波の照射を受けて周囲から加熱
される。
Next, the operation of the above configuration will be described. When cooking by high-frequency heating, place the heating object on the rotating dish 14,
The motor 13 is energized to rotate the rotary plate 14 and the magnetron 17 is operated to generate a high frequency (microwave). The high frequency is supplied from the outlet 16a of the waveguide 16 to the cooking chamber 12
Let it radiate in. As a result, the food on the rotating dish 14
The direct wave from the exit 16a of the waveguide 16 and the reflected wave reflected by the inner surface of the inner box 11 and the reflection plate 18 are irradiated and heated from the surroundings.

この場合、反射板18の前後方向中心Cを回転皿14の回転
中心のほぼ真上に位置させる構成としているので、マグ
ネトロン17による高周波加熱時に、反射板18からの反射
波の分布が従来の如く前面扉23側に片寄らず、回転皿14
上の調理物全体にほぼ均等に反射波が照射されるように
なる。このため、高周波加熱時に調理物全体を均一加熱
できて、加熱むらの発生を防止できる。
In this case, since the center C of the reflecting plate 18 in the front-rear direction is located almost directly above the center of rotation of the rotating dish 14, the distribution of the reflected wave from the reflecting plate 18 during the high frequency heating by the magnetron 17 is the same as in the conventional case. Rotating plate 14 without biasing to the front door 23 side
The reflected waves are almost evenly radiated to the entire cooking above. For this reason, the entire cooking product can be uniformly heated during high-frequency heating, and uneven heating can be prevented.

ところで、加熱調理室12の背面(内箱11の内面)は上ヒ
ータ19の輻射熱を反射しやすいステンレス板等の金属板
で形成されているのに対し、加熱調理室12の前面である
前面扉23の内面は、輻射熱の反射率の低いガラス板等に
より構成されている。従って、仮に、上ヒータ19の位置
を加熱調理室12の中央(回転皿14の回転中心上)に設定
すると、上ヒータ19による加熱調理時において、背面側
からの反射熱が前面側の反射熱よりも強くなり、それに
よって回転皿14上の調理物は背面側の方が強く加熱され
て、焼きむら、こげ色のむらを生ずるという不都合を生
じる。
By the way, the rear surface of the cooking chamber 12 (the inner surface of the inner box 11) is formed of a metal plate such as a stainless plate that easily reflects the radiant heat of the upper heater 19, while the front door that is the front surface of the cooking chamber 12 is The inner surface of 23 is made of a glass plate or the like having a low reflectance of radiant heat. Therefore, if the position of the upper heater 19 is set to the center of the cooking chamber 12 (on the center of rotation of the rotary plate 14), the heat reflected from the back side will be the heat reflected from the rear side when the upper heater 19 is cooking. As a result, the food on the rotary dish 14 is heated more strongly on the back side, which causes uneven baking and uneven darkness.

しかしながら、本実施例では、上ヒータ19の位置を反射
板18の内側において加熱調理室12の前面扉23側に変倚さ
せているので、上ヒータ19による加熱時に背面側からの
反射熱と前面側からの反射熱とを均等化できて、回転皿
14上における上ヒータ19からの輻射熱と反射熱とによる
温度分布を均一化でき、上ヒータ19による調理物の均一
加熱を可能ならしめ得て、焼きむら、こげ色のむらの発
生を防止できる。
However, in this embodiment, since the position of the upper heater 19 is changed to the front door 23 side of the cooking chamber 12 inside the reflection plate 18, the reflected heat from the rear side and the front surface when heating by the upper heater 19 are performed. Rotating plate that can equalize the heat reflected from the side
The temperature distribution due to the radiant heat and the reflected heat from the upper heater 19 on the upper part 14 can be made uniform, and the cooked food can be uniformly heated by the upper heater 19, and uneven burning and dark brown color can be prevented.

尚、本考案は上記実施例に限定されるものではなく、例
えば、上ヒータ19の支持構造を変更したり、反射板18の
断面形状を変更しても良い等、種々の変形が可能であ
る。
The present invention is not limited to the above embodiment, and various modifications are possible such as changing the support structure of the upper heater 19 or changing the cross-sectional shape of the reflection plate 18. .

[考案の効果] 本考案は以上の説明から明らかなように、反射板の前後
方向中心を回転皿の回転中心のほぼ真上に位置させた構
成としているので、マグネトロンによる高周波加熱時
に、反射板からの反射波の分布が従来の如く前面扉側に
片寄らず、回転皿上の調理物全体にほぼ均等に反射波を
照射することができて、高周波加熱時に調理物全体を均
一加熱でき、加熱むらの発生を防止できる。
[Effects of the Invention] As is apparent from the above description, the present invention has a configuration in which the center of the reflector in the front-rear direction is positioned almost directly above the center of rotation of the rotating dish, so that the reflector is heated during high frequency heating by the magnetron. The distribution of the reflected waves from the system is not biased toward the front door side as in the conventional case, and the reflected waves can be evenly radiated to the entire cooked food on the rotating dish, and the entire cooked food can be heated uniformly during high frequency heating. It is possible to prevent unevenness.

しかも、上ヒータの位置を反射板の内側において加熱調
理室の前面扉側に変倚させる構成としているので、上ヒ
ータによる加熱時に背面側からの反射熱と前面側からの
反射熱とを均等化できて、回転皿上の温度分布を均一化
でき、上ヒータによる調理物の均一加熱を可能ならしめ
得て、焼きむら、こげ色のむらの発生を防止できる。
Moreover, since the position of the upper heater is changed to the front door side of the cooking chamber inside the reflector, the heat reflected from the back side and the heat reflected from the front side are equalized during heating by the upper heater. As a result, the temperature distribution on the rotary dish can be made uniform, and the cooked food can be uniformly heated by the upper heater, so that uneven baking and uneven coloring can be prevented.

【図面の簡単な説明】[Brief description of drawings]

第1図乃至第3図は本考案の一実施例を示したもので、
第1図は加熱調理室部分の縦断側面図、第2図は同縦断
正面図、第3図は上ヒータの支持構造部分の拡大縦断正
面図である。そして、第4図は従来例を示す第1図相当
図である。 図面中、11は内箱、12は加熱調理室、13はモータ、14は
回転皿、15は下ヒータ、17はマグネトロン、18は反射
板、19は上ヒータ、23は前面扉である。
1 to 3 show an embodiment of the present invention.
FIG. 1 is a vertical sectional side view of a heating and cooking chamber portion, FIG. 2 is a vertical sectional front view thereof, and FIG. 3 is an enlarged vertical sectional front view of a support structure portion of an upper heater. FIG. 4 is a view corresponding to FIG. 1 showing a conventional example. In the drawings, 11 is an inner box, 12 is a cooking chamber, 13 is a motor, 14 is a rotary plate, 15 is a lower heater, 17 is a magnetron, 18 is a reflector, 19 is an upper heater, and 23 is a front door.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】加熱調理室の底部に回転可能に設けられた
回転皿と、この回転皿上の調理物を高周波加熱するマグ
ネトロンと、前記加熱調理室の上面部に上方に突出し且
つ左右方向に延びるように設けられた反射板と、この反
射板の内側に左右方向に延びるように配設された上ヒー
タとを備えたものにおいて、前記反射板の前後方向中心
を前記回転皿の回転中心のほぼ真上に位置させる構成と
すると共に、前記上ヒータの位置を前記反射板の内側に
おいて前記加熱調理室の前面扉側に変倚させたことを特
徴とするヒータ付高周波加熱調理装置。
1. A rotating dish rotatably provided at the bottom of a cooking chamber, a magnetron for high-frequency heating of food on the rotating dish, and a magnetron projecting upward from the upper surface of the cooking chamber and extending in the left-right direction. In a structure provided with a reflection plate provided so as to extend and an upper heater arranged inside the reflection plate so as to extend in the left-right direction, the center of the reflection plate in the front-rear direction is defined as the center of rotation of the rotary plate. A high-frequency heating cooking device with a heater, characterized in that it is positioned almost directly above and the position of the upper heater is changed to the front door side of the heating chamber inside the reflection plate.
JP1989035836U 1989-03-29 1989-03-29 High frequency cooking device with heater Expired - Lifetime JPH0714725Y2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1989035836U JPH0714725Y2 (en) 1989-03-29 1989-03-29 High frequency cooking device with heater
KR2019900003781U KR930007865Y1 (en) 1989-03-29 1990-03-28 Microwave range with a heater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989035836U JPH0714725Y2 (en) 1989-03-29 1989-03-29 High frequency cooking device with heater

Publications (2)

Publication Number Publication Date
JPH02128005U JPH02128005U (en) 1990-10-22
JPH0714725Y2 true JPH0714725Y2 (en) 1995-04-10

Family

ID=12453061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989035836U Expired - Lifetime JPH0714725Y2 (en) 1989-03-29 1989-03-29 High frequency cooking device with heater

Country Status (2)

Country Link
JP (1) JPH0714725Y2 (en)
KR (1) KR930007865Y1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101650576B1 (en) * 2010-02-01 2016-08-23 엘지전자 주식회사 Electric oven

Also Published As

Publication number Publication date
JPH02128005U (en) 1990-10-22
KR930007865Y1 (en) 1993-11-24
KR900017362U (en) 1990-10-05

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