JPH0712322A - Discharged gas disposal equipment - Google Patents

Discharged gas disposal equipment

Info

Publication number
JPH0712322A
JPH0712322A JP15551993A JP15551993A JPH0712322A JP H0712322 A JPH0712322 A JP H0712322A JP 15551993 A JP15551993 A JP 15551993A JP 15551993 A JP15551993 A JP 15551993A JP H0712322 A JPH0712322 A JP H0712322A
Authority
JP
Japan
Prior art keywords
gas
heating chamber
discharged gas
discharged
exhaust gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15551993A
Other languages
Japanese (ja)
Inventor
Akiyoshi Onishi
明義 大西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP15551993A priority Critical patent/JPH0712322A/en
Publication of JPH0712322A publication Critical patent/JPH0712322A/en
Pending legal-status Critical Current

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  • Incineration Of Waste (AREA)

Abstract

PURPOSE:To extend a staying time of discharged gas within a heating chamber, perform a sufficient heating of the discharged gas and get a complete combustion by a method wherein a gas supplying pipe for taking discharged gas of a combustion furnace into the heating chamber is formed with a plurality of gas supplying holes, and a staying plate having a plurality of aeration holes therein is arranged within the heating chamber. CONSTITUTION:Discharged gas discharged from ignited substances within an ascending or descending type batch ceramic baking furnace is fed to a gas supplying pipe 11 within a discharged gas disposal equipment 3 through a ceiling pipe 7 as well as a suction fan 6. The discharged gas fed from the gas supplying pipe 11 is injected from the gas supplying holes 14 and further uniformly fed into a chamber 15 of a heating chamber 9. The discharged gas fed into the chamber 15 flows in sequence into each of the chambers 16, 18 through the aeration holes 19 in the staying plate 12. Since positions of the aeration holes 19 in the opposing staying plates 12 are different from each other, the discharged gas is clogged by the staying plates 12, stayed in each of the chambers 15 and 18, and the discharged gas is efficiently and sufficiently heated by heat generated at the gas heater 13 so as to perform a positive and complete combustion there.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、焼成炉から排出される
有機物バインダを含むガスを燃焼分解する排ガス処理装
置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exhaust gas treating apparatus for burning and decomposing a gas containing an organic binder discharged from a firing furnace.

【0002】[0002]

【従来の技術】図3を用いて、直接燃焼式排ガス処理装
置の構成と処理手順を説明する。
2. Description of the Related Art The structure and processing procedure of a direct combustion type exhaust gas processing apparatus will be described with reference to FIG.

【0003】図3において、31はトンネル型焼成炉で
あり、32は直接燃焼式排ガス処理装置である。トンネ
ル型焼成炉31から排気ダクト33を通じて排出される
ガスは、パイプ34を経由し、ブロワ35によって吸引
され、空気と混合された後、加熱室36に送り込まれ、
バーナ37から発せられる火炎によって完全燃焼させら
れる。バーナ37へは、燃料供給装置38から燃料ガス
が供給される。加熱室36で完全燃焼したガスは,連通
孔39を通じて冷却室40へ送り込まれる。ここで冷却
されたガスは、排気ブロワ41によって大気中に排気さ
れる。
In FIG. 3, reference numeral 31 is a tunnel type firing furnace, and 32 is a direct combustion type exhaust gas treatment apparatus. The gas discharged from the tunnel-type firing furnace 31 through the exhaust duct 33 is sucked by the blower 35 through the pipe 34, mixed with air, and then sent into the heating chamber 36.
It is completely burned by the flame emitted from the burner 37. Fuel gas is supplied to the burner 37 from a fuel supply device 38. The gas completely combusted in the heating chamber 36 is sent to the cooling chamber 40 through the communication hole 39. The gas cooled here is exhausted into the atmosphere by the exhaust blower 41.

【0004】[0004]

【発明が解決しようとする課題】従来の排ガス処理装置
においては、設備が大掛かりであるために、イニシャル
コストが高くなる。また、コストが高いことに加えて占
有面積が大きいために、バッチ式焼成炉等の比較的小型
の焼成炉に搭載して使用するには適していない。例え
ば、数台のバッチ式焼成炉の排ガスをまとめて処理する
場合にも、配管経路が長くなり、排ガスが配管途中でタ
ール化して付着する原因となることがある。さらに、ガ
ス式の排ガス処理装置の場合、NOX やSOX が発生す
るといった問題も生ずる。
In the conventional exhaust gas treating apparatus, since the equipment is large, the initial cost becomes high. In addition, since the cost is high and the occupied area is large, it is not suitable for being mounted and used in a relatively small-sized firing furnace such as a batch type firing furnace. For example, when the exhaust gas from several batch-type firing furnaces is collectively processed, the piping path may become long, and the exhaust gas may become tar and adhere in the middle of the piping. Further, in the case of the gas type exhaust gas treatment device, there is a problem that NO X and SO X are generated.

【0005】そこで本発明においては、より小型で、燃
焼効率が良く、しかも安価な排ガス処理装置を提供する
ことを目的とする。
Therefore, it is an object of the present invention to provide an exhaust gas treatment apparatus which is smaller in size, has good combustion efficiency, and is inexpensive.

【0006】[0006]

【課題を解決するための手段】本発明は上記目的を達成
するため、内部にガス供給管とヒータを配した加熱室を
有し、焼成炉から排出されるガスを、前記ガス供給管に
よって前記加熱室の内部に取り込み、前記ヒータによっ
て加熱し、燃焼分解する排ガス処理装置において、前記
ガス供給管に複数のガス供給孔を形成するとともに、前
記加熱室の内部に、両主面を貫通する複数の通気孔を形
成した滞留板を配置したことを特徴とする。また、滞留
板を複数枚とし、滞留板に形成する通気孔を、対向する
滞留板どうしで千鳥状にずらして形成したことを特徴と
する。
In order to achieve the above object, the present invention has a heating chamber in which a gas supply pipe and a heater are arranged, and a gas discharged from a firing furnace is supplied to the gas supply pipe by the gas supply pipe. In an exhaust gas treatment device that is taken into the inside of a heating chamber, heated by the heater, and decomposed by combustion, a plurality of gas supply holes are formed in the gas supply pipe, and a plurality of gas supply holes that penetrate both main surfaces are formed inside the heating chamber. It is characterized in that a retention plate having ventilation holes is arranged. Further, the present invention is characterized in that a plurality of retaining plates are provided, and the ventilation holes formed in the retaining plates are staggered between the opposing retaining plates.

【0007】[0007]

【作用】本発明の排ガス処理装置によれば、焼成炉から
吸引したガスを、ガス供給管を通じて加熱室に送り込む
際、前記ガス供給管に形成した複数のガス供給孔からガ
スが噴出するので、ガスは加熱室内に満遍なく送り込ま
れる。また、加熱室内に送り込まれたガスは、加熱室内
に配置された滞留板によって流動を抑制され、前記滞留
板に設けられた複数の通気孔を通過して、ゆっくりと少
量ずつ冷却室側へ流動する。すなわち、ガスの加熱室内
での滞留時間が長くなり、その間、ガスはヒータによっ
て充分に加熱され、完全燃焼する。
According to the exhaust gas treating apparatus of the present invention, when the gas sucked from the firing furnace is fed into the heating chamber through the gas supply pipe, the gas is ejected from the plurality of gas supply holes formed in the gas supply pipe. The gas is evenly fed into the heating chamber. Further, the gas sent into the heating chamber is restrained from flowing by a retaining plate arranged in the heating chamber, passes through a plurality of vent holes provided in the retaining plate, and slowly flows to the cooling chamber side little by little. To do. That is, the residence time of the gas in the heating chamber becomes long, and during that time, the gas is sufficiently heated by the heater and completely burned.

【0008】[0008]

【実施例】図1と図2を用いて本発明の一実施例にかか
る排ガス処理装置の構成を説明する。図1は本発明の排
ガス処理装置を昇降型バッチ式セラミック焼成炉に搭載
した場合の全体図で、図2は本装置の部分断面図であ
る。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The structure of an exhaust gas treating apparatus according to an embodiment of the present invention will be described with reference to FIGS. FIG. 1 is an overall view of a case where an exhaust gas treating apparatus of the present invention is installed in a lifting type batch-type ceramic firing furnace, and FIG. 2 is a partial sectional view of the apparatus.

【0009】図1において、1は昇降型バッチ式セラミ
ック焼成炉で、被焼成物2を焼成する。3は本発明の排
ガス処理装置で、断熱材によって構成されており、昇降
型バッチ式セラミック焼成炉1の上部に、架台4に載置
した状態で固定されている。5は吸引パイプであり、そ
の一端を昇降型バッチ式セラミック焼成炉1に接続し、
他端を吸引ファン6に接続している。さらに吸引ファン
6は、天井パイプ7の一端と接続しており、天井パイプ
7の他端は排ガス処理装置3の上部に取り付けられてい
る。
In FIG. 1, reference numeral 1 is an elevating type batch type ceramic firing furnace for firing an object to be fired 2. Reference numeral 3 denotes an exhaust gas treating apparatus of the present invention, which is made of a heat insulating material, and is fixed on the pedestal 4 in the upper portion of the lifting type batch type ceramic firing furnace 1. Reference numeral 5 is a suction pipe, one end of which is connected to the lifting type batch type ceramic firing furnace 1,
The other end is connected to the suction fan 6. Furthermore, the suction fan 6 is connected to one end of the ceiling pipe 7, and the other end of the ceiling pipe 7 is attached to the upper part of the exhaust gas treatment device 3.

【0010】排ガス処理装置3の内部は、図2に示すよ
うに、長手方向に対して垂直に配置された隔壁8によっ
て、加熱室9と冷却室10とに仕切られている。加熱室
9には、例えば5本のガス供給管11と、3枚の滞留板
12と、16本のヒータ13が配されている。ガス供給
管11はアルミナまたはムライト質で構成され、5本そ
れぞれが加熱室9の長手方向に対して垂直に配されてい
る。したがって、図2に示しているのは、5本のガス供
給管のうちの1本だけである。また、ガス供給管11の
それぞれの一端は加熱室9の天井部を貫通して、排ガス
処理装置3の上部に取り付けられた天井パイプ7に接続
されている。一方、他端は閉塞されており、加熱室9の
床部に接して固定されている。さらに、ガス供給管11
の外周には、複数のガス供給孔14が互いに等間隔に設
けられている。滞留板12は、多孔質アルミナまたはム
ライト質から構成され、3枚がそれぞれ加熱室9の長手
方向に対して垂直に配置されている。したがって、加熱
室9は、滞留板12によって4つの部屋15乃至18に
仕切られている。また、滞留板12には、両主面を貫通
する複数の通気孔19が設けられている。通気孔19
は、対向する2枚の滞留板どうしで同じ位置に重ならな
いように、千鳥状に設けられている。ヒータ13は、耐
酸性材料で構成されるシリンダ状の片端子ヒータで、滞
留板12によって仕切られた15乃至18の各部屋に4
本ずつ、滞留板12の主面に対して水平に配置されてい
る。また、ヒータ13のそれぞれの一端は、排ガス処理
装置3の外壁に装着されたヒータ端子室(図示せず)
に、加熱室9の側壁を貫通して接続されており、他端は
加熱室9の内壁に挿入され、固定されている。
As shown in FIG. 2, the interior of the exhaust gas treatment device 3 is partitioned into a heating chamber 9 and a cooling chamber 10 by a partition wall 8 which is arranged perpendicularly to the longitudinal direction. The heating chamber 9 is provided with, for example, five gas supply pipes 11, three retention plates 12, and 16 heaters 13. The gas supply pipes 11 are made of alumina or mullite, and each of the five gas supply pipes 11 is arranged perpendicularly to the longitudinal direction of the heating chamber 9. Therefore, only one of the five gas supply pipes is shown in FIG. Further, one end of each of the gas supply pipes 11 penetrates the ceiling portion of the heating chamber 9 and is connected to the ceiling pipe 7 attached to the upper portion of the exhaust gas treatment device 3. On the other hand, the other end is closed and fixed in contact with the floor of the heating chamber 9. Further, the gas supply pipe 11
A plurality of gas supply holes 14 are provided at equal intervals on the outer periphery of the. The retention plates 12 are made of porous alumina or mullite, and the three retention plates 12 are arranged perpendicular to the longitudinal direction of the heating chamber 9. Therefore, the heating chamber 9 is divided into four chambers 15 to 18 by the retaining plate 12. Further, the retention plate 12 is provided with a plurality of ventilation holes 19 penetrating both main surfaces. Vent hole 19
Are provided in a zigzag manner so that the two facing retention plates do not overlap at the same position. The heater 13 is a cylinder-shaped one-terminal heater made of an acid-resistant material, and is provided in each of 15 to 18 chambers partitioned by the retention plate 12.
The books are arranged horizontally with respect to the main surface of the retention plate 12. Further, one end of each of the heaters 13 has a heater terminal chamber (not shown) mounted on the outer wall of the exhaust gas treatment device 3.
To the inner wall of the heating chamber 9, and the other end is fixed to the inner wall of the heating chamber 9.

【0011】排ガス処理装置3の内部を加熱室9と冷却
室10とに仕切っている隔壁8には、滞留板12と同
様、その両主面を貫通する複数の通気孔20が設けられ
ている。
A partition wall 8 which divides the interior of the exhaust gas treatment device 3 into a heating chamber 9 and a cooling chamber 10 is provided with a plurality of ventilation holes 20 penetrating both main surfaces thereof, like the retention plate 12. .

【0012】次に、排ガス処理装置3を用いた排ガス処
理作業を説明する。
Next, an exhaust gas processing operation using the exhaust gas processing device 3 will be described.

【0013】昇降型バッチ式セラミック焼成炉1の内部
の被焼成物2から排出されたガスは、吸引ファン6によ
って、吸引パイプ5を介して吸い上げられる。さらに、
ガスは天井パイプ7を通って、排ガス処理装置3の内部
のガス供給管11に送り込まれる。ガス供給管11に送
られたガスは、ガス供給孔14から噴出し、加熱室9の
部屋15に満遍なく送り込まれる。部屋15に送り込ま
れたガスは、滞留板12の通気孔19を通じて順次、各
部屋16乃至18へ流れ込む。この際、対向する滞留板
12どうしで通気孔19の位置が異なるので、ガスは滞
留板12に遮られて、ゆっくりと流動する。すなわち、
15乃至18の各部屋の内部にガスが滞留している時間
が長く、その間、ガスはヒータ13の発熱によって効率
よく、充分に加熱され、確実に完全燃焼する。
The gas discharged from the material 2 to be fired inside the lifting type batch ceramic firing furnace 1 is sucked up by the suction fan 6 through the suction pipe 5. further,
The gas is sent to the gas supply pipe 11 inside the exhaust gas treatment device 3 through the ceiling pipe 7. The gas sent to the gas supply pipe 11 is ejected from the gas supply hole 14 and is evenly sent to the chamber 15 of the heating chamber 9. The gas sent to the room 15 sequentially flows into the rooms 16 to 18 through the ventilation holes 19 of the retaining plate 12. At this time, since the positions of the vent holes 19 are different between the retaining plates 12 facing each other, the gas is blocked by the retaining plates 12 and flows slowly. That is,
The gas stays in each of the chambers 15 to 18 for a long time, and during that time, the gas is efficiently and sufficiently heated by the heat generated by the heater 13 and surely burns completely.

【0014】完全燃焼したガスは、隔壁8に設けられた
貫通孔20を通って冷却室11に流れ込む。ガスはここ
で冷却された後、排気ダクト21を通って、排気ファン
22によって大気中に排出される。
The completely combusted gas flows into the cooling chamber 11 through the through hole 20 provided in the partition wall 8. After being cooled here, the gas passes through the exhaust duct 21 and is exhausted to the atmosphere by the exhaust fan 22.

【0015】[0015]

【発明の効果】本発明の排ガス処理装置によれば、燃焼
効率が良く、ガスは確実に完全燃焼する。したがって、
設備の小型化が可能で、占有面積を小さくすることによ
って、バッチ式焼成炉に搭載して用いることができる。
この際、1基の焼成炉につき1基の排ガス処理装置を用
いることができるので、大型設備1基で複数の焼成炉の
排ガス処理を行う場合よりも、ガスの配管経路が短くな
り、配管内にタールが付着することは少なく、排気ダク
トの内部を清掃する手間が軽減される。また、小型設備
ゆえにイニシャル・コストが低減され、ガスの不完全燃
焼がないので、NOX やSOX が発生することはなくな
る。加えて、片端子ヒータを用いた場合には、ヒータお
よびヒータ端子室のメンテナンスは片面だけについて行
えば良くなり、メンテナンスの手間が軽減される。
According to the exhaust gas treating apparatus of the present invention, the combustion efficiency is good, and the gas is surely completely burned. Therefore,
The equipment can be downsized, and by occupying a small area, it can be installed in a batch type firing furnace and used.
At this time, since one exhaust gas treatment device can be used for one firing furnace, the gas piping path becomes shorter than that in the case where exhaust gas treatment of a plurality of firing furnaces is performed by one large-scale facility. The tar is rarely attached to the inner wall of the exhaust duct, and the labor for cleaning the inside of the exhaust duct is reduced. Moreover, since the initial cost is reduced and the gas is not incompletely burned due to the small equipment, NO X and SO X are not generated. In addition, when the one-terminal heater is used, the maintenance of the heater and the heater terminal chamber only needs to be performed on one side, and the labor of maintenance is reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の排ガス処理装置を焼成炉に搭載した場
合の全体図。
FIG. 1 is an overall view of a case where an exhaust gas treating apparatus of the present invention is installed in a firing furnace.

【図2】本発明の排ガス処理装置の部分断面図。FIG. 2 is a partial cross-sectional view of an exhaust gas treating apparatus of the present invention.

【図3】従来の排ガス処理装置を焼成炉に搭載した場合
の部分断面図。
FIG. 3 is a partial cross-sectional view when a conventional exhaust gas treatment device is installed in a firing furnace.

【符号の説明】[Explanation of symbols]

3 排ガス処理装置 9 加熱室 11 ガス供給管 12 滞留板 13 ヒータ 14 ガス供給孔 19 通気孔 3 Exhaust gas treatment device 9 Heating chamber 11 Gas supply pipe 12 Retention plate 13 Heater 14 Gas supply hole 19 Vent hole

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 内部にガス供給管とヒータを配した加熱
室を有し、焼成炉から排出されるガスを、前記ガス供給
管によって前記加熱室の内部に取り込み、前記ヒータに
よって加熱し、燃焼分解する排ガス処理装置において、
前記ガス供給管に複数のガス供給孔を形成するととも
に、前記加熱室内に、両主面を貫通する複数の通気孔を
形成した滞留板を配置したことを特徴とする排ガス処理
装置。
1. A heating chamber in which a gas supply pipe and a heater are arranged, the gas discharged from the firing furnace is taken into the heating chamber by the gas supply pipe, heated by the heater, and burned. In the exhaust gas treatment device that decomposes,
An exhaust gas treatment apparatus, wherein a plurality of gas supply holes are formed in the gas supply pipe, and a retention plate having a plurality of ventilation holes penetrating both main surfaces is arranged in the heating chamber.
【請求項2】 前記加熱室の内部に配置する滞留板を複
数枚とし、その滞留板に形成する通気孔を、対向する滞
留板どうしで千鳥状にずらして形成したことを特徴とす
る、請求項1に記載の排ガス処理装置。
2. A plurality of retention plates are disposed inside the heating chamber, and ventilation holes formed in the retention plates are formed by staggering the opposing retention plates. The exhaust gas treatment device according to item 1.
JP15551993A 1993-06-25 1993-06-25 Discharged gas disposal equipment Pending JPH0712322A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15551993A JPH0712322A (en) 1993-06-25 1993-06-25 Discharged gas disposal equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15551993A JPH0712322A (en) 1993-06-25 1993-06-25 Discharged gas disposal equipment

Publications (1)

Publication Number Publication Date
JPH0712322A true JPH0712322A (en) 1995-01-17

Family

ID=15607841

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15551993A Pending JPH0712322A (en) 1993-06-25 1993-06-25 Discharged gas disposal equipment

Country Status (1)

Country Link
JP (1) JPH0712322A (en)

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