JPH07122359A - Window part of microwave oven - Google Patents

Window part of microwave oven

Info

Publication number
JPH07122359A
JPH07122359A JP26465993A JP26465993A JPH07122359A JP H07122359 A JPH07122359 A JP H07122359A JP 26465993 A JP26465993 A JP 26465993A JP 26465993 A JP26465993 A JP 26465993A JP H07122359 A JPH07122359 A JP H07122359A
Authority
JP
Japan
Prior art keywords
film
microwave
microwave oven
transparent conductive
window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26465993A
Other languages
Japanese (ja)
Inventor
Akihiko Yoshida
昭彦 吉田
Akiyoshi Hattori
章良 服部
Yoshihiro Hori
堀  喜博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP26465993A priority Critical patent/JPH07122359A/en
Publication of JPH07122359A publication Critical patent/JPH07122359A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electric Ovens (AREA)
  • Constitution Of High-Frequency Heating (AREA)

Abstract

PURPOSE:To improve heat efficiency by using a glass substrate having a transparent conductive film of specific sheet resistance value on the surface, for a window part. CONSTITUTION:An ITO solid film 1 is formed on a glass substrate 3, and a resist resin 2 is formed on the film 1 by screen printing method. A film part 1a which is not covered with the resin 2 is removed by etching and the resin 2 is then peeled off. The substrate 3 having this ITO pattern film 1b is used for the front window of an oven. The pattern of the film 1b is a complex body of island-shape small regions, and microwave is not easily absorbed in relation to wavelength, while the gap interval of the film 1b is made to be shorter than microwave length so as to prevent microwave from leaking to the outside of the microwave oven. Since excellent heat ray reflection characteristic and excellent transparency in visible region can be achieved and absorption of microwave is reduced at the time of cooking by the microwave oven, by using a glass substrate having a transparent conductive film of 100OMEGA/unit sq.-1000OMEGA/ unit sq. in sheet resistance, on the surface, for the front glass window, heat efficiency can be improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、電子レンジオーブン
(電子レンジ及び電気オーブン等の総称)の窓部の被膜
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating for a window of a microwave oven (general term for microwave ovens and electric ovens).

【0002】[0002]

【従来の技術】電子レンジや電気オーブンの加熱調理時
の熱効率を向上させるために、従来から、前面ガラス窓
の内側表面に熱線反射膜が形成されている。このような
熱線反射膜の材料としては、酸化スズ・酸化アンチモン
系(ATO)や酸化インジウム・酸化スズ系(ITO)
などの金属酸化物が知られており、これらの被膜をガラ
ス基板上に形成することにより透明な熱線反射膜を表面
に有する窓ガラスを作成することができる。これらの熱
線反射膜は導電性を有することから、マイクロ波遮蔽の
効果もある。従って、電子レンジの窓材料としては非常
に適したものである。これらの金属酸化物膜の形成方法
としては、真空蒸着法、スパッタリング法、CVD法及
び塗布法が知られている。
2. Description of the Related Art Conventionally, a heat ray reflective film is formed on the inner surface of a front glass window in order to improve the heat efficiency when cooking in a microwave oven or an electric oven. As a material for such a heat ray reflective film, tin oxide / antimony oxide (ATO) or indium oxide / tin oxide (ITO) is used.
Such metal oxides are known, and by forming these coatings on a glass substrate, a window glass having a transparent heat ray reflective film on its surface can be prepared. Since these heat ray reflective films have conductivity, they also have an effect of shielding microwaves. Therefore, it is very suitable as a window material for a microwave oven. As a method for forming these metal oxide films, a vacuum vapor deposition method, a sputtering method, a CVD method and a coating method are known.

【0003】[0003]

【発明が解決しようとする課題】しかし、上記の真空蒸
着法、スパッタリング法及びCVD法の各方法は、装置
が複雑かつ高価で、コストと量産性とに問題がある。ま
た、塗布法は、上記の真空蒸着法、スパッタリング法及
びCVD法の問題点を解決する可能性を有しているもの
の、実用に耐えうる膜を形成することが困難であった。
例えば、硝酸インジウム、塩化インジウム、塩化第2ス
ズ等の無機化合物の有機溶液を使用した場合は、形成さ
れた膜に白濁を生じたり、得られた膜の機械的強度が不
足で容易に傷がつく等の欠点がある。また、オクチル酸
インジウム等のイオン結合性の強い有機酸インジウムを
用いる方法においては、この有機酸インジウムが加水分
解し易く、比較的容易に化学変化するために、塗布液の
ゲル化が生じる等の欠点がある。さらに、インジウムや
スズの有機錯体を使用する方法も提案されているが、こ
の方法では基板に塗布した後の塗膜の熱分解時におい
て、スズ化合物の蒸散等により、膜の均一化が阻害され
るために、低抵抗の均質膜が得られない等の欠点があ
る。一方、膜の電気抵抗が低くなるにしたがって電子レ
ンジで調理時のマイクロ波が膜に吸収される度合いが大
きくなって前面窓ガラスが発熱し、調理の熱効率が低く
なったり、窓ガラスが熱歪のために破損したりするとい
う不都合があった。特にスパッタリングや蒸着などの真
空プロセスで得られる膜は、その高い結晶性のために膜
の電気抵抗が低く(個有抵抗値で1×10-4〜1×10
-5[Ω・cm]、シート抵抗値で100[Ω/□]以下
(ここで、Ω/□は、四探針法によるシート抵抗の単位
を表わす。))、このような不都合が生じ易い。また、
一般に膜のシート抵抗値の大きさと赤外線反射率とは反
比例の関係にあり、抵抗値を上げると赤外線反射率が下
がる。このように、従来のスパッタリング膜をそのまま
電子レンジオーブンの窓に用いることには問題がある。
However, in each of the above-mentioned vacuum deposition method, sputtering method and CVD method, the apparatus is complicated and expensive, and there are problems in cost and mass productivity. Further, although the coating method has a possibility of solving the above-mentioned problems of the vacuum vapor deposition method, the sputtering method and the CVD method, it has been difficult to form a film that can be practically used.
For example, when an organic solution of an inorganic compound such as indium nitrate, indium chloride, or stannic chloride is used, white turbidity occurs in the formed film, or the mechanical strength of the obtained film is insufficient and scratches are easily caused. There are drawbacks such as sticking. In addition, in the method using an organic acid indium having a strong ionic bond such as indium octylate, the organic acid indium is easily hydrolyzed and chemically changes relatively easily, so that gelling of the coating liquid occurs. There are drawbacks. Furthermore, a method using an organic complex of indium or tin has been proposed, but in this method, during the thermal decomposition of the coating film applied on the substrate, the evaporation of the tin compound may hinder the uniformity of the film. Therefore, there is a drawback that a homogeneous film having a low resistance cannot be obtained. On the other hand, as the electric resistance of the film decreases, the microwaves during cooking are absorbed by the film in a microwave oven to a greater extent and heat is generated on the front window glass, which lowers the thermal efficiency of cooking and causes the window glass to experience thermal strain. There was an inconvenience that it was damaged due to. In particular, a film obtained by a vacuum process such as sputtering or vapor deposition has a low electric resistance due to its high crystallinity (individual resistance value of 1 × 10 −4 to 1 × 10 4).
-5 [Ω · cm], sheet resistance value of 100 [Ω / □] or less (where Ω / □ represents the unit of sheet resistance by the four-point probe method), and such inconvenience is likely to occur. . Also,
Generally, the magnitude of the sheet resistance value of the film and the infrared reflectance are in inverse proportion to each other, and increasing the resistance value lowers the infrared reflectance. Thus, there is a problem in using the conventional sputtering film as it is in the window of the microwave oven.

【0004】本発明は、上記課題を解決するもので、可
視光透過率及び熱線反射率が高く、かつ、マイクロ波吸
収能の小さな透明導電膜を電子レンジオーブン用の窓部
に提供することを目的とする。
The present invention is to solve the above problems and provides a transparent conductive film having a high visible light transmittance and a heat ray reflectance and a small microwave absorptivity in a window portion for a microwave oven. To aim.

【0005】[0005]

【課題を解決するための手段】本発明は、上記目的を達
成するために、シート抵抗値が100[Ω/□ ]〜1
000[Ω/□]の透明導電膜を表面に有するガラス基
板を電子レンジオーブンの窓部に用いたものである。こ
こで、透明導電膜は個々に分離した小領域の集合体から
なるパターンを有しても良い。また、透明導電膜はイン
ジウムの酸化物とスズの酸化物の混合物またはインジウ
ム及びスズの複合酸化物であることが好ましい。透明導
電膜は有機スズ化合物と無機インジウム化合物とこれに
配位可能な有機化合物と溶剤とからなる熱分解性液の塗
布焼成によって得られたものであることが好ましい。
In order to achieve the above object, the present invention has a sheet resistance value of 100 [Ω / □] to 1
A glass substrate having a transparent conductive film of 000 [Ω / □] on its surface was used for the window of a microwave oven. Here, the transparent conductive film may have a pattern composed of an aggregate of individually separated small regions. The transparent conductive film is preferably a mixture of indium oxide and tin oxide or a complex oxide of indium and tin. The transparent conductive film is preferably obtained by coating and firing a thermally decomposable liquid containing an organic tin compound, an inorganic indium compound, an organic compound capable of coordinating with the compound, and a solvent.

【0006】[0006]

【作用】電子レンジ等の窓部のガラス基板の表面に設け
られた、シート抵抗値が100[Ω/□] 〜 1000
[Ω/□]の透明導電膜は、電子レンジ調理時にマイク
ロ波をほとんど吸収せず、さらに熱線反射率も高い。従
って、レンジの熱効率を非常に高める。また、吸収が少
ないことによって発熱も小さいので、ガラス基板を破損
に致らしめることも無い。また、個々に分離した小領域
の集合体からなるパターンを有する透明導電膜はマイク
ロ波の吸収をさらに妨げる作用をする。
A sheet resistance value of 100 [Ω / □] to 1000 provided on the surface of the glass substrate of the window of a microwave oven or the like.
The transparent conductive film of [Ω / □] hardly absorbs microwaves during microwave oven cooking and has a high heat ray reflectance. Therefore, the thermal efficiency of the range is greatly increased. Moreover, since the heat generation is small due to the small absorption, the glass substrate is not damaged. In addition, the transparent conductive film having a pattern made up of a collection of individually separated small regions has a function of further hindering the absorption of microwaves.

【0007】[0007]

【実施例】以下に、本発明の実施例を詳細に説明する。
本発明の透明導電膜形成用組成物は以下のようにして合
成される。まず、無機インジウム化合物をインジウムと
スズのいずれとも配位可能な有機化合物と混合する。こ
こで、前記無機インジウム化合物は、インジウムやスズ
と配位可能な有機化合物と、置換できるような配位子を
持つものであればよい。例えば、硝酸インジウム、塩化
インジウムが挙げられ、さらに結晶水を有しているもの
が好ましい。また、インジウムとスズのいずれとも配位
可能な有機化合物は、インジウムとスズに一部配位し
て、それらの中間化合物の形成を助け、有機溶剤に対す
る溶解性をもたせるために必要であり、例えば、β−ジ
ケトン類、α−またはβ−ケトン酸類、前記ケトン酸類
のエステル類、α−またはβ−アミノアルコール類が挙
げられる。次に、前記溶液に有機溶剤と有機スズ化合物
を加え、それらの有機溶液を加熱処理する。ここで、有
機スズ化合物としては、空気中では比較的安定であるが
加熱処理により容易に加水分解し易いものであればよ
い。例えば、カルボン酸スズやジカルボン酸スズが挙げ
られ、また、炭素数が小さいギ酸スズ、酢酸スズ又はシ
ュウ酸スズが好ましい。また、有機溶剤としては、本発
明において用いる有機化合物や無機化合物を溶解するも
のであれば良い。例えば、トルエン、キシレン等の芳香
族炭化水素、エタノール、イソプロパノール等のアルコ
ール類、酢酸エチル、酢酸ブチル等の酢酸エステル類、
アセトン、ジエチルケトン等のケトン類、メトキシエタ
ノール、エトキシエタノール等のエーテル類、及び、テ
トラヒドロフラン等が挙げられる。さらに、加熱処理の
温度としては、無機インジウム化合物と、有機スズ化合
物と、それらと配位可能な有機化合物とからなる有機溶
液の還流温度もしくは還流温度付近が好ましい。
EXAMPLES Examples of the present invention will be described in detail below.
The composition for forming a transparent conductive film of the present invention is synthesized as follows. First, an inorganic indium compound is mixed with an organic compound capable of coordinating both indium and tin. Here, the inorganic indium compound may have an organic compound capable of coordinating with indium or tin and a ligand capable of substituting. Examples thereof include indium nitrate and indium chloride, and those having crystallization water are preferable. Further, an organic compound capable of coordinating both indium and tin is necessary for coordinating indium and tin in part, assisting formation of an intermediate compound thereof, and having solubility in an organic solvent. , Β-diketones, α- or β-ketone acids, esters of the above ketone acids, α- or β-amino alcohols. Next, an organic solvent and an organic tin compound are added to the solution, and the organic solution is heat-treated. Here, the organotin compound may be any one that is relatively stable in the air but is easily hydrolyzed by heat treatment. Examples thereof include tin carboxylate and tin dicarboxylate, and tin formate, tin acetate or tin oxalate having a small number of carbon atoms are preferable. Further, as the organic solvent, any solvent capable of dissolving the organic compound or the inorganic compound used in the present invention may be used. For example, aromatic hydrocarbons such as toluene and xylene, alcohols such as ethanol and isopropanol, acetic acid esters such as ethyl acetate and butyl acetate,
Examples thereof include ketones such as acetone and diethyl ketone, ethers such as methoxyethanol and ethoxyethanol, and tetrahydrofuran. Furthermore, the temperature of the heat treatment is preferably at or near the reflux temperature of the organic solution containing the inorganic indium compound, the organic tin compound, and the organic compound capable of coordinating with them.

【0008】そして、加熱処理後の有機溶液を室温付近
まで冷却し、多価アルコール類を加えて、混合した有機
溶液を熱分解性組成物とする。ここで、多価アルコール
類は、有機溶液の増粘効果と、熱分解性組成物をガラス
基板に塗布・乾燥して得られる被膜の安定性を与えるも
のであり、例えばグリコール類や3価のアルコール類が
挙げられるが、炭素数が小さく熱分解時の炭素残留の恐
れの少ないエチレングリコールやグリセリンが好まし
い。このようにして、得られた熱分解性組成物を基板に
塗布・乾燥した後、焼成して熱線反射膜を形成する。こ
こで、熱分解性組成物の塗布には、スクリーン印刷法、
ロールコート法、ディップコート法、スピンコート法等
を用いることができるが、ディップコート法及びスピン
コート法が好ましい。また、焼成温度としては、熱分解
性組成物が分解する温度以上で、かつ、ガラス基板の変
形温度以下であれば良く、400〜700℃が好まし
い。以下、さらに詳細な実施例によって本発明を説明す
るが、本発明はこれらの実施例によって限定されるもの
ではないことは言うまでもない。
Then, the organic solution after the heat treatment is cooled to around room temperature, polyhydric alcohols are added, and the mixed organic solution is made into a thermally decomposable composition. Here, the polyhydric alcohol provides the thickening effect of the organic solution and the stability of the coating film obtained by coating and drying the thermally decomposable composition on the glass substrate. Examples thereof include alcohols, and ethylene glycol and glycerin, which have a small number of carbon atoms and are less likely to remain carbon during thermal decomposition, are preferable. The heat-decomposable composition thus obtained is applied to a substrate, dried, and then fired to form a heat ray reflective film. Here, for the application of the thermally decomposable composition, a screen printing method,
A roll coating method, a dip coating method, a spin coating method or the like can be used, but the dip coating method and the spin coating method are preferable. The firing temperature may be higher than or equal to the temperature at which the thermally decomposable composition decomposes and lower than or equal to the deformation temperature of the glass substrate, preferably 400 to 700 ° C. Hereinafter, the present invention will be described with reference to more detailed examples, but it goes without saying that the present invention is not limited to these examples.

【0009】[実施例1]1リットルの三角フラスコ
に、45gの硝酸インジウム(In(NO3)3・3H2O)を秤量
し、50gのアセチルアセトンを加えて、室温で混合・溶
解させた。その溶液に、Sn/(In+Sn)の比率が35wt%に
なるようにシュウ酸第1スズ(SnC2O4)とアセトンを加
えて還流した。その還流後の溶液を、室温付近まで冷却
し、5gのグリセリンを加えて、攪拌・混合し、熱分解
性組成物を合成した。その熱分解性組成物に、厚さ5m
mのソーダガラス基板を60cm/minの引き上げ速度でディ
ップコートした。その基板を5分間室温で放置し、100
℃で5分間乾燥した後、500℃で1時間焼成した。こう
して形成された膜の厚みは0.10μmであった。こうして
ITOの被膜(以下、ITOベタ膜という)をガラス基
板全面に施したITOガラスができ上がる。でき上がっ
たITOガラスを電子レンジオーブンの前面窓に供す
る。
Example 1 45 g of indium nitrate (In (NO 3 ) 3 .3H 2 O) was weighed in a 1-liter Erlenmeyer flask, 50 g of acetylacetone was added, and the mixture was mixed and dissolved at room temperature. Stannous oxalate (SnC 2 O 4 ) and acetone were added to the solution so that the Sn / (In + Sn) ratio was 35 wt%, and the mixture was refluxed. The solution after the reflux was cooled to around room temperature, 5 g of glycerin was added, and the mixture was stirred and mixed to synthesize a thermally decomposable composition. The thermally decomposable composition has a thickness of 5 m
m soda glass substrate was dip coated at a pulling rate of 60 cm / min. Leave the substrate at room temperature for 5 minutes and
After drying at 5 ° C for 5 minutes, it was baked at 500 ° C for 1 hour. The thickness of the film thus formed was 0.10 μm. In this way, an ITO glass in which an ITO film (hereinafter referred to as an ITO solid film) is applied to the entire surface of the glass substrate is completed. The resulting ITO glass is used for the front window of the microwave oven.

【0010】[実施例2]図1は本実施例によるITO
ガラスの構成を示す断面図である。図に於いて、まず実
施例1に示す方法でガラス基板3上にITOベタ膜1を
形成したものを用意する。次にITOベタ膜1の表面に
例えば図1に示すようなパターンのレジスト樹脂2をス
クリーン印刷法によって形成する。次にレジスト樹脂2
で被覆されていないITO膜部1aをエッチングにより
除去し、その後レジスト樹脂2を剥離する。こうして得
られたITOパターン膜1bを持つガラス基板3を電子
レンジオーブンの前面窓に供する。ここで、ITOパタ
ーン膜1bのパターンは例えばアイランド状(個々に分
離した島状)小領域の集合体である。このようなパター
ンの形成によってマイクロ波がその波長との関係から吸
収されにくくなる。また、ITOパターン膜1bの隙間
の間隔は、マイクロ波が電子レンジオーブンの外部へ漏
洩するのを防ぐためマイクロ波の波長より短くする。
[Embodiment 2] FIG. 1 shows an ITO according to this embodiment.
It is sectional drawing which shows the structure of glass. In the figure, first, a glass substrate 3 having an ITO solid film 1 formed thereon by the method shown in Example 1 is prepared. Next, a resist resin 2 having a pattern as shown in FIG. 1, for example, is formed on the surface of the ITO solid film 1 by a screen printing method. Next, resist resin 2
The ITO film portion 1a not covered with is removed by etching, and then the resist resin 2 is peeled off. The glass substrate 3 having the ITO pattern film 1b thus obtained is used as a front window of a microwave oven. Here, the pattern of the ITO pattern film 1b is, for example, an aggregate of island-shaped (individually separated island-shaped) small regions. The formation of such a pattern makes it difficult for the microwave to be absorbed due to its relationship with the wavelength. The gap between the ITO pattern films 1b is shorter than the wavelength of the microwave in order to prevent the microwave from leaking to the outside of the microwave oven.

【0011】[比較例1]比較例として、ITOターゲ
ットのRFスパッタリングにより、厚さ3mmのソーダ
ガラス基板上にITO膜を形成し、これを電子レンジオ
ーブンの前面窓に供する。表1に実施例1、2及び比較
例1の、赤外線反射率、可視光(波長550nm)透過
率、シート抵抗、マイクロ波吸収の程度及び熱効率の比
較結果を示す。
[Comparative Example 1] As a comparative example, an ITO film was formed on a soda glass substrate having a thickness of 3 mm by RF sputtering of an ITO target, and the ITO film was used as a front window of a microwave oven. Table 1 shows the comparison results of the infrared reflectance, visible light (wavelength 550 nm) transmittance, sheet resistance, degree of microwave absorption and thermal efficiency of Examples 1 and 2 and Comparative Example 1.

【0012】[0012]

【表1】 [Table 1]

【0013】表1から明らかなように、実施例1は比較
例1に比べて熱効率が優れており、実施例2はさらに優
れている。
As is clear from Table 1, Example 1 is superior to Comparative Example 1 in thermal efficiency, and Example 2 is even more superior.

【0014】図2は、ディップ熱分解法により得られた
本発明のITO膜のマイクロ波吸収能及び赤外線反射率
を膜のシート抵抗に対してプロットしたものである。シ
ート抵抗は膜厚や(スズ/インジウム)比を変化させる
ことにより調整することができる。図から明らかなよう
に、シート抵抗が100[Ω/□]及び1000[Ω/
□]において特性に臨界的変化が見られる。すなわち、
赤外線反射率(実線)はシート抵抗の増加に伴って緩や
かに減少するが、シート抵抗が1000[Ω/□]を超
えると急激に減少し始める。一方、マイクロ波反射能
(破線)は、シート抵抗が100[Ω/□]未満の領域
においては抵抗値の増加と共に急激に減少するが、シー
ト抵抗が100[Ω/□]に達すると減少は非常に緩や
かになる。従って、シート抵抗が100〜1000[Ω
/□]の範囲に於いては、マイクロ波吸収が少ないレベ
ルでほぼ安定し、かつ、赤外線反射率も比較的高いレベ
ルを維持していることがわかる。
FIG. 2 is a plot of the microwave absorptivity and infrared reflectance of the ITO film of the present invention obtained by the dip pyrolysis method against the sheet resistance of the film. The sheet resistance can be adjusted by changing the film thickness or the (tin / indium) ratio. As is clear from the figure, the sheet resistance is 100 [Ω / □] and 1000 [Ω /
In □], a critical change is seen in the characteristics. That is,
The infrared reflectance (solid line) gradually decreases as the sheet resistance increases, but begins to decrease rapidly when the sheet resistance exceeds 1000 [Ω / □]. On the other hand, the microwave reflectivity (broken line) sharply decreases as the resistance value increases in the region where the sheet resistance is less than 100 [Ω / □], but decreases when the sheet resistance reaches 100 [Ω / □]. Very loose. Therefore, the sheet resistance is 100 to 1000 [Ω
In the range of [/ □], it can be seen that the microwave absorption is almost stable at a low level and the infrared reflectance is maintained at a relatively high level.

【0015】[実施例3]図3は、実施例3を示す断面
図である。これは実施例2によるITOガラスを用いた
電子レンジの略構造を示す図である。図に於いて、まず
略半球状のガラス13に実施例2で述べた方法と同じ手
法でITO膜12を形成する。でき上がった略半球状I
TOガラス14を電子レンジの蓋として用いる。すなわ
ち、略半球状ITOガラス14全体がレンジの蓋になり
本体の皿部15上に載置され、マグネトロン等を含むレ
ンジ本体部16から発せられるマイクロ波は皿部15を
通過して食品17に照射される。ITO膜を施した略半
球状ITOガラス14はマイクロ波をほとんど吸収せ
ず、かつ、赤外線を良く反射するので熱効率の良い斬新
な外観の電子レンジを提供することができる。
[Third Embodiment] FIG. 3 is a sectional view showing a third embodiment. This is a diagram showing a schematic structure of a microwave oven using the ITO glass according to the second embodiment. In the figure, first, the ITO film 12 is formed on the substantially hemispherical glass 13 by the same method as that described in the second embodiment. Finished almost hemispherical I
The TO glass 14 is used as the lid of the microwave oven. That is, the substantially hemispherical ITO glass 14 becomes the lid of the range and is placed on the plate part 15 of the main body, and the microwave emitted from the range main part 16 including the magnetron etc. passes through the plate part 15 and reaches the food 17. Is irradiated. Since the substantially hemispherical ITO glass 14 provided with the ITO film hardly absorbs microwaves and reflects infrared rays well, it is possible to provide a microwave oven having a novel appearance with good thermal efficiency.

【0016】なお、上記実施例1においては、ガラス基
板の両面に熱線反射膜をディップ熱分解法により形成し
た例について述べたが、一方の面にレジスト形成するな
どして他方の面のみに熱線反射膜を形成することももち
ろん可能である。
In the first embodiment described above, the example in which the heat ray reflective films are formed on both surfaces of the glass substrate by the dip pyrolysis method has been described. It is of course possible to form a reflective film.

【0017】[0017]

【発明の効果】本発明は上記の様に構成されているの
で、以下の効果を奏する。シート抵抗が100[Ω/
□] 〜 1000[Ω/□]の透明導電膜を表面に有す
るガラス基板を前面ガラス窓に用いることにより、熱線
反射特性と可視領域における透過性とに優れ、かつ電子
レンジ調理時のマイクロ波吸収が小さくなるので、熱効
率が改善されるという効果がある。また上記透明導電膜
を用いて構成された電子レンジオーブンの窓部は、マイ
クロ波を反射する効果もあり、従来マイクロ波遮蔽に用
いられていた前面有孔金属板の使用が不要になるという
効果がある。また、透明導電膜が分離した小領域の集合
体からなるパターンによって構成されている電子レンジ
の窓部は、マイクロ波の波長との関係から一層マイクロ
波を吸収しにくいので、さらに熱効率が向上するという
効果がある。
Since the present invention is configured as described above, it has the following effects. Sheet resistance is 100 [Ω /
□] to 1000 [Ω / □] A glass substrate having a transparent conductive film on its surface is used for the front glass window, and thus has excellent heat ray reflection characteristics and transmittance in the visible region, and also absorbs microwaves during microwave cooking. Is smaller, so that the thermal efficiency is improved. Further, the window portion of the microwave oven configured by using the transparent conductive film also has the effect of reflecting microwaves, and the effect that the use of the front perforated metal plate that has been conventionally used for microwave shielding becomes unnecessary. There is. Further, the window portion of the microwave oven configured by the pattern of the aggregate of the small regions in which the transparent conductive film is separated is further difficult to absorb the microwave because of the relationship with the wavelength of the microwave, and thus the thermal efficiency is further improved. There is an effect.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のパターン化ITO膜の1実施例を示す
図である。
FIG. 1 is a diagram showing an embodiment of a patterned ITO film of the present invention.

【図2】膜の電気抵抗と赤外線反射及びマイクロ波吸収
の両特性の関係を示す図である。
FIG. 2 is a diagram showing the relationship between the electric resistance of a film and both characteristics of infrared reflection and microwave absorption.

【図3】本発明による透明導電膜を用いた電子レンジの
一例を示す断面図である。
FIG. 3 is a cross-sectional view showing an example of a microwave oven using a transparent conductive film according to the present invention.

【符号の説明】[Explanation of symbols]

1 ITOベタ膜 1b ITOパターン膜 3 ガラス基板 1 ITO solid film 1b ITO pattern film 3 Glass substrate

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】シート抵抗が100Ω/□ 〜 1000Ω
/□の透明導電膜を表面に有するガラス基板より構成さ
れる電子レンジオーブンの窓部。
1. The sheet resistance is 100 Ω / □ to 1000 Ω.
A window part of a microwave oven composed of a glass substrate having a transparent conductive film of / □ on its surface.
【請求項2】透明導電膜が、個々に分離した小領域の集
合体からなるパターンを有していることを特徴とする請
求項1に記載の電子レンジオーブンの窓部。
2. The window portion of a microwave oven according to claim 1, wherein the transparent conductive film has a pattern composed of an assembly of individually separated small regions.
【請求項3】透明導電膜がインジウムの酸化物とスズの
酸化物との混合物またはインジウム及びスズの複合酸化
物であることを特徴とする請求項1に記載の電子レンジ
オーブンの窓部。
3. The window part of a microwave oven according to claim 1, wherein the transparent conductive film is a mixture of an indium oxide and a tin oxide or a complex oxide of indium and tin.
【請求項4】透明導電膜が有機スズ化合物と無機インジ
ウム化合物とこれに配位可能な有機化合物と溶剤とから
なる熱分解性液の塗布焼成によって得られたものである
ことを特徴とする請求項1に記載の電子レンジオーブン
の窓部。
4. The transparent conductive film is obtained by coating and firing a thermally decomposable liquid containing an organic tin compound, an inorganic indium compound, an organic compound capable of coordinating with the compound, and a solvent. The window of the microwave oven according to Item 1.
JP26465993A 1993-10-22 1993-10-22 Window part of microwave oven Pending JPH07122359A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26465993A JPH07122359A (en) 1993-10-22 1993-10-22 Window part of microwave oven

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26465993A JPH07122359A (en) 1993-10-22 1993-10-22 Window part of microwave oven

Publications (1)

Publication Number Publication Date
JPH07122359A true JPH07122359A (en) 1995-05-12

Family

ID=17406429

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26465993A Pending JPH07122359A (en) 1993-10-22 1993-10-22 Window part of microwave oven

Country Status (1)

Country Link
JP (1) JPH07122359A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100777284B1 (en) * 2005-12-28 2007-11-20 엘지전자 주식회사 Microwave oven
JP2012021739A (en) * 2010-07-16 2012-02-02 Panasonic Corp Cooking device
US11825587B2 (en) 2018-02-13 2023-11-21 Sabic Global Technologies B.V. Transparent electromagnetic shielding panels and assemblies containing the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100777284B1 (en) * 2005-12-28 2007-11-20 엘지전자 주식회사 Microwave oven
JP2012021739A (en) * 2010-07-16 2012-02-02 Panasonic Corp Cooking device
US11825587B2 (en) 2018-02-13 2023-11-21 Sabic Global Technologies B.V. Transparent electromagnetic shielding panels and assemblies containing the same

Similar Documents

Publication Publication Date Title
US5225273A (en) Transparent electroconductive laminate
EP0035906B2 (en) Selectively light-transmitting laminated structure
US7147805B2 (en) Composition for forming a transparent conducting film, solution for forming a transparent conducting film and method of forming a transparent conducting film
EP0524630B1 (en) Composition for use in a transparent and electrically conductive film and a method for making the film
GB2065093A (en) Process for producing transparent electroconductive film
JP2002533902A (en) Light transmitting substrate having light transmitting low resistance coating
GB2428689A (en) Process for preparing transparent conducting metal oxides
JPH07122359A (en) Window part of microwave oven
JP2011028861A (en) Manufacturing method of transparent conductive film, transparent conductive film, transparent conductive substrate, and device using the same
US5252356A (en) Method of producing transparent zinc oxide films
JP3208794B2 (en) Composition for forming transparent conductive film and method for forming transparent conductive film
KR100357946B1 (en) Manufacturing process of transparent conductive layer
JP3049890B2 (en) Method for forming transparent conductive film
JP3144951B2 (en) Method of manufacturing heat reflection window
JPH06325637A (en) Transparent conductive coating film forming application liquid and low reflecting transparent conductive film
JP3545452B2 (en) Method for manufacturing transparent conductive film
JPH07320541A (en) Transparent conductive film forming composition and manufacture of transparent conductive film
JP3091606B2 (en) Method for producing composition for forming transparent conductive film and method for forming transparent conductive film
JPH05166423A (en) Manufacture of conductive film and low reflective conductive film
JP2959014B2 (en) Method for manufacturing transparent electrode substrate
JP3153961B2 (en) Method for producing transparent conductive zinc oxide film
JPH07161235A (en) Transparent conductive film and its manufacture
JP3112496B2 (en) Method for producing transparent photoconductive metal oxide laminated film
JPH0467285B2 (en)
JPH0572685B2 (en)