JPH0711474A - Method for suppressing oxidation of tin ion by iron ion - Google Patents

Method for suppressing oxidation of tin ion by iron ion

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Publication number
JPH0711474A
JPH0711474A JP15760793A JP15760793A JPH0711474A JP H0711474 A JPH0711474 A JP H0711474A JP 15760793 A JP15760793 A JP 15760793A JP 15760793 A JP15760793 A JP 15760793A JP H0711474 A JPH0711474 A JP H0711474A
Authority
JP
Japan
Prior art keywords
tin
ion
plating
sulfuric acid
iron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15760793A
Other languages
Japanese (ja)
Inventor
Hiromitsu Date
博充 伊達
Chuichi Kato
忠一 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP15760793A priority Critical patent/JPH0711474A/en
Publication of JPH0711474A publication Critical patent/JPH0711474A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To suppress the oxidation of tin ion by iron ion and to realize tinning using an insoluble electrode at a high current density in the production of an electrotinned steel sheet by adding a specified amt. of a specified aromatic compd. to a tinning bath of specified composition. CONSTITUTION:A high-current-density tinning sulfuric acid bath contg. 5-50g/l of sulfuric acid and 40-100g/l of tin(II) is used to produce an electrotinned steel sheet or tinned thin steel sheet. The bath contains >=2 electron-donative substituent, kind among the substituents are hydroxyl, and 0.01-2g/l of an aromatic compd. coordinated to the ortho or para-positions of the benzene ring is added. The compd. has a strong reducing power and tends to bond to the positive iron ion. Consequently, Fe(II) ion generated by the dissolution of steel strip and causing the oxidation of tin ion in the sulfuric acid bath is oxidized to Fe(III) ion, and the oxidation of the tin ion is suppressed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、電気めっきブリキおよ
び薄錫めっき鋼板の製造に関し、不溶性電極を用い、高
電流密度で錫めっきする場合の浴中の鉄イオンによる錫
イオンの酸化防止方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the production of electroplated tin plates and thin tin-plated steel sheets, and relates to a method for preventing tin ion oxidation by iron ions in a bath when tin plating is performed at a high current density using an insoluble electrode. It is a thing.

【0002】[0002]

【従来の技術】ブリキ等の錫めっき鋼板の製造は、現在
は主としてめっき浴としてフェロスタン浴(フェノール
スルホン酸浴)を用い、20A/dm2 程度の低電流密
度で、行われている。また、この場合の電極は、溶解性
の錫電極からコストメリットの大きい白金めっきを施し
たチタン等の不溶性電極へと変わってきている。
2. Description of the Related Art Tin-plated steel sheets such as tin plates are currently manufactured mainly using a ferrostane bath (phenol sulfonic acid bath) as a plating bath at a low current density of about 20 A / dm 2 . Further, the electrode in this case has been changed from a soluble tin electrode to an insoluble electrode such as platinum-plated titanium having a large cost advantage.

【0003】したがって、現在のぶりき製造技術は、生
産性の点と環境性の点の2点において工業的に必ずしも
満足出来ない点がある。すなわち、第1点目の高生産性
化を図るには、高電流密度化し、高速でかつ低コストで
めっきできる技術が必要であるが、フェノールスルホン
酸浴では高電流密度でめっきを行うと、いわゆるめっき
焼けが生じてしまい実用性がない。第2点目の環境性に
おいては、多量のフェノールスルホン酸を含むため排水
処理が困難であり、また近年開発されたアルキルスルホ
ン酸を酸成分とするめっき浴は廃液処理が簡便ではある
が、有機スルホン酸の多量の使用はCOD上昇につなが
り、処理なしで排出することが環境への影響がないとは
考え難い。上述の如く、高速化が可能な高電流密度でめ
っきができ、かつ良環境性で、低コストな錫めっき製造
は、従来技術では困難であるといえる。
Therefore, the current tinplate manufacturing technology is industrially unsatisfactory in terms of both productivity and environment. That is, in order to achieve the high productivity of the first point, it is necessary to have a technology capable of high current density and high-speed and low-cost plating. However, in a phenolsulfonic acid bath, if plating is performed at high current density, So-called plating burn occurs and is not practical. In the second environmental aspect, wastewater treatment is difficult because it contains a large amount of phenolsulfonic acid, and the recently developed plating bath containing an acid component of alkylsulfonic acid is easy to treat waste liquid. The use of a large amount of sulfonic acid leads to an increase in COD, and it is unlikely that discharging without treatment will have no environmental impact. As described above, it can be said that it is difficult to manufacture tin plating which can be plated at a high current density capable of speeding up, is environmentally friendly, and is low in cost with the conventional technology.

【0004】[0004]

【発明が解決しようとする課題】本発明者らは、上述の
従来技術を超える高電流密度、良環境性のめっき技術の
完成を目指し、硫酸浴に着目した。しかしながら、硫酸
浴は、従来バッチでのめっきには硫酸濃度を100g/
l以上の高濃度にして用いられているが、ぶりき製造の
ラインでのめっきには装置の腐食を引き起こすためにこ
の濃度では使用できず、さらに、硫酸濃度を低くし、か
つ不溶性電極を使用するとスラッジの発生が極めて多く
なるという大きな問題を有している。
DISCLOSURE OF THE INVENTION The present inventors have focused on a sulfuric acid bath aiming at the completion of a plating technique having a high current density and an environment-friendly property exceeding the above-mentioned conventional techniques. However, the sulfuric acid bath has a sulfuric acid concentration of 100 g /
It is used at a high concentration of 1 or more, but it can not be used at this concentration for plating in the tin plate manufacturing line because it causes corrosion of the equipment. Furthermore, the sulfuric acid concentration is lowered and the insoluble electrode is used. Then, there is a big problem that the generation of sludge becomes extremely large.

【0005】このスラッジは錫酸化物であり、詳細に後
述するが、めっき液中に溶解した鉄(III)イオンによっ
て錫(II)イオンが酸化されて生成する。電極に溶解性
の錫電極を用いる場合は、錫によって鉄(III)イオンが
還元されるのでスラッジ発生が抑制されるが、不溶性電
極を用いる場合は、この作用が働かない。したがって、
不溶性電極を用いる高電流密度での錫めっきの実現のた
めには、めっき性の点での浴組成、めっき条件の検討が
必要であるとともに、錫イオンの鉄イオンによる酸化の
大幅抑制という解決すべき課題がある。そこで、本発明
は、不溶性電極を用い、高電流密度で錫めっきする場合
の硫酸浴中の鉄イオンによる錫イオンの酸化防止方法の
提供を目的とする。
This sludge is tin oxide, and as will be described in detail later, it is produced by oxidizing tin (II) ions by iron (III) ions dissolved in the plating solution. When a soluble tin electrode is used as the electrode, iron (III) ions are reduced by tin, so that the generation of sludge is suppressed, but when an insoluble electrode is used, this action does not work. Therefore,
In order to realize tin plating with high current density using an insoluble electrode, it is necessary to study the bath composition and plating conditions in terms of plating properties, and to solve the problem of significantly suppressing the oxidation of tin ions by iron ions. There are issues to be solved. Therefore, an object of the present invention is to provide a method for preventing oxidation of tin ions by iron ions in a sulfuric acid bath when tin plating is performed at a high current density using an insoluble electrode.

【0006】[0006]

【課題を解決するための手段】本発明者らは、硫酸浴に
おける錫イオンの酸化の原因は鋼ストリップの溶解によ
って生じる鉄(II)イオンが酸化して生じた鉄(III)イ
オンにあることに着目し、この鉄(III)イオンの還元性
と芳香族化合物との関係を詳細に検討し、還元効果のあ
る芳香族化合物の選定に成功し、本発明に至ったもので
ある。
The inventors of the present invention have found that the cause of oxidation of tin ions in a sulfuric acid bath is iron (II) ions produced by oxidation of iron (II) ions produced by dissolution of steel strip. Focusing on the above, the relationship between the reducing property of the iron (III) ion and the aromatic compound was studied in detail, and the aromatic compound having a reducing effect was successfully selected, and the present invention was achieved.

【0007】すなわち、本発明は、不溶性電極を用いる
錫めっき製造において、5〜50g/lの硫酸、40〜
100g/lの錫(II) を含む高電流密度錫めっき硫酸
浴中に、二つ以上の電子供与性置換基を有し、その内の
少なくとも一つがヒドロキシ基であり、かつそのベンゼ
ン環への配置がオルト位またはパラ位である芳香族化合
物を0.01〜2g/l添加することを特徴とする錫イ
オンの酸化抑制法である。
That is, according to the present invention, in the tin plating production using the insoluble electrode, 5 to 50 g / l of sulfuric acid, 40 to
A high current density tin-plating sulfuric acid bath containing 100 g / l of tin (II) has two or more electron-donating substituents, at least one of which is a hydroxy group, A method for suppressing oxidation of tin ions, which comprises adding 0.01 to 2 g / l of an aromatic compound having an ortho position or a para position.

【0008】[0008]

【作用】以下に、本発明について詳細に説明する。硫酸
浴における錫イオン、鉄イオンおよび電極金属としての
金属錫、めっき鋼板としての金属鉄との化学反応上の関
係は、下記の式に従うと考えられる。 錫電極の溶解: Sn →Sn2++2e (1) 鋼ストリップの溶解: Fe →Fe2++2e (2) 鉄(II) イオンの空気酸化: Fe2++O2→Fe3+ (3) 鉄(III)イオンによる錫イオンの酸化: 2Fe3+ +Sn2+→2Fe2+ + Sn(IV) (4) スラッジの生成: Sn(IV)+O2→ SnO2 (5) 鉄(III) イオンの錫電極での還元: 2Fe3++Sn→2Fe2+ +Sn2+ (6) 錫(IV) イオンの錫電極での還元: Sn(IV)+Sn→2Sn2+ (7)
The present invention will be described in detail below. The chemical reaction relationship with tin ions, iron ions, metallic tin as an electrode metal, and metallic iron as a plated steel sheet in a sulfuric acid bath is considered to follow the following formula. Dissolution of tin electrode: Sn → Sn 2+ + 2e (1) Dissolution of steel strip: Fe → Fe 2+ + 2e (2) Air oxidation of iron (II) ions: Fe 2+ + O 2 → Fe 3+ (3) Iron Oxidation of tin ion by (III) ion: 2Fe 3+ + Sn 2+ → 2Fe 2+ + Sn (IV) (4) Sludge formation: Sn (IV) + O 2 → SnO 2 (5) Iron (III) ion Reduction with tin electrode: 2Fe 3+ + Sn → 2Fe 2+ + Sn 2+ (6) Reduction of tin (IV) ion with tin electrode: Sn (IV) + Sn → 2Sn 2+ (7)

【0009】(4)式に示されている錫(II) イオン
は、主にめっき浴として添加されたものであるが、この
イオンが(4)に従って、鉄(III)イオンによって酸化
され錫(IV)イオンさらに錫酸化物となってスラッジを
形成する。この場合、溶解性錫電極を使用している場合
にスラッジ発生が少ないのは、(6),(7)に従っ
て、それぞれ鉄(III)イオン、錫(IV) イオンが還元さ
れるためであり、不溶性電極の場合は、この反応が生じ
ないので、発生が多くなる。不溶性電極使用下でスラッ
ジ生成を抑制するには、(3)の鉄(II)イオンの空気
酸化を抑制するか、錫電極を使用している時の(6)式
の反応に準じた鉄(III)イオンの還元を起こして、鉄
(III)イオン量を少なくしてやればよい。
The tin (II) ion represented by the formula (4) is mainly added as a plating bath, and this ion is oxidized by the iron (III) ion according to (4) to produce tin (II) ion. IV) Ions and tin oxide form sludge. In this case, the reason why sludge is less generated when the soluble tin electrode is used is that iron (III) ions and tin (IV) ions are reduced according to (6) and (7), respectively. In the case of an insoluble electrode, since this reaction does not occur, the number of generations increases. In order to suppress sludge formation when using an insoluble electrode, the air oxidation of iron (II) ions in (3) should be suppressed, or the iron ( III) Ions may be reduced to reduce the amount of iron (III) ions.

【0010】本発明者らは、還元の視点で分子構造を考
え、還元力の強いヒドロキシ基を有する化合物がよいと
考え、かつ鉄イオンのプラスイオンと結びつき易くする
ために、電子過剰になり易い分子構造の化合物が適して
いると考えた。すなわち、二つ以上の電子供与性置換基
を有し、その内の少なくとも一つがヒドロキシ基であ
り、かつそのベンゼン環への配置がオルト位またはパラ
位である芳香族化合物である。
The present inventors consider the molecular structure from the viewpoint of reduction, consider that a compound having a hydroxy group having a strong reducing power is preferable, and make it easy for the compound to have a positive ion of iron ion, so that electron excess easily occurs. We thought that compounds with a molecular structure were suitable. That is, it is an aromatic compound having two or more electron-donating substituents, at least one of which is a hydroxy group, and the arrangement on the benzene ring is at the ortho position or the para position.

【0011】二つ以上の電子供与性置換基を有した芳香
族化合物のベンゼン環は、その置換基からの電子供与を
受けて電子過剰になっているので、鉄(III)イオンと結
びつき易い。また、置換基の配位位置をオルト位、パラ
位に限定するのは、この位置であればベンゼン環への電
子供与が起きやすいためである。電子供与性置換基の内
の少なくとも一つをヒドロキシ基とするのは、還元性を
持たせるためであり、好ましくは二つ以上がよい。
Since the benzene ring of the aromatic compound having two or more electron-donating substituents is electron-excessive due to the electron donation from the substituents, it is easy to bond with the iron (III) ion. Further, the reason why the coordinate position of the substituent is limited to the ortho position and the para position is that electron donation to the benzene ring is likely to occur at this position. The reason why at least one of the electron-donating substituents is a hydroxy group is for imparting a reducing property, and preferably two or more.

【0012】このような基本的考えに基づき種々化合物
を検討した結果、具体的にはo−ヒドロキシアニソー
ル、o−アミノフェノール、2,3−ジヒドロキシ安息
香酸、ピロガロール等が適当であることが判った。上述
の芳香族化合物の添加量は、0.01〜2g/lとす
る。すなわち、0.01g/l未満では酸化防止効果が
十分でなく、2g/lを超えると効果が飽和することに
加え、浴中有機物の減少により良環境性化を狙った本発
明の主旨に反するからである。
As a result of examining various compounds based on such a basic idea, it was found that specifically o-hydroxyanisole, o-aminophenol, 2,3-dihydroxybenzoic acid, pyrogallol and the like are suitable. . The amount of the above-mentioned aromatic compound added is 0.01 to 2 g / l. That is, if it is less than 0.01 g / l, the antioxidant effect is not sufficient, and if it exceeds 2 g / l, the effect is saturated, and it is contrary to the gist of the present invention aiming to improve the environment by reducing organic substances in the bath. Because.

【0013】本発明の錫めっき浴は硫酸浴であるが、そ
の硫酸量、錫(II) 量はめっき性と錫イオンの酸化抑制
の観点とから決めた。まず、硫酸は、若干のミストが出
るものの、本質的に不揮発性で作業環境や大気の汚染が
少ない上、廃液処理上の問題が、従来の有機スルホン酸
を用いる浴と比較して少なく、低価格である点も工業的
に有利であるが、硫酸濃度は5〜50g/lとする。硫
酸濃度5g/lで電解液のpHは約1.2で錫(II) イ
オンは安定であるが、これより低い濃度では、電解時に
陰極近傍でpHが高くなるために錫(II)イオンが不安定
となって沈殿が生じやすい。また、電析した錫の光沢が
優れない。一方、50g/lより濃いと鋼ストリップの
溶解による浴中の鉄濃度の上昇による浴の劣化促進、装
置類の腐食促進等、さまざまな弊害が生じる。
The tin plating bath of the present invention is a sulfuric acid bath, and the amount of sulfuric acid and the amount of tin (II) were determined from the viewpoints of plating property and suppression of tin ion oxidation. First, although sulfuric acid produces a slight amount of mist, it is essentially non-volatile and has little pollution in the working environment and air, and it has less problems in waste liquid treatment compared to conventional baths using organic sulfonic acid, and it has a low level. The price is industrially advantageous, but the sulfuric acid concentration is 5 to 50 g / l. At a sulfuric acid concentration of 5 g / l, the pH of the electrolyte is about 1.2, and tin (II) ions are stable. However, at lower concentrations, tin (II) ions are generated because the pH increases near the cathode during electrolysis. It becomes unstable and precipitates easily. Moreover, the gloss of the electrodeposited tin is not excellent. On the other hand, if the concentration is higher than 50 g / l, various problems such as accelerated deterioration of the bath due to an increase in iron concentration in the bath due to dissolution of the steel strip and accelerated corrosion of the equipment will occur.

【0014】錫(II) 濃度は40〜100g/lとす
る。40g/l未満では高電流密度でめっきを行うとい
わゆるめっき焼けを生じ、高品質のブリキが得難い。1
00g/lを超えるとストリップの持ち出す錫(II) イ
オンが多くなることに加え、前述の芳香族化合物添加で
は錫イオンの酸化抑制の限界を超え、スラッジが多量に
生成するようになるため経済的に不利である。
The tin (II) concentration is 40 to 100 g / l. If it is less than 40 g / l, so-called plating burn occurs when plating is performed at a high current density, and it is difficult to obtain a high-quality tin plate. 1
If the amount exceeds 00 g / l, the amount of tin (II) ions carried out by the strip will increase, and in addition to the above-mentioned aromatic compound addition, the oxidation limit of tin ions will be exceeded, and a large amount of sludge will be generated, which is economical. Is disadvantageous to

【0015】次に、本発明のめっき浴を用いた場合のめ
っき条件は、高電流密度でのめっきに必要なめっき条件
とすればよく、基本的にはそれ以外は特段考慮すべき点
はない。すなわち、めっき液の流速は100m/min
以上の高速とすることが望ましく、前処理は、通常の電
解アルカリ脱脂、硫酸酸洗あるいはさらにニッケルフラ
ッシュめっき等の下地めっきを施すこともできる。ま
た、浴温は30〜70℃でよい。陰極電流密度は、陰極
電流効率が高く、良好なめっきが得られる範囲であれば
高いほど好ましい。その理由は、生産性の向上による経
済性の利点ばかりでなく、電析において細かいめっき析
出核が多く発生し、緻密なめっきとなり耐食性が向上す
ることにある。本発明では、従来最も多く使用されてき
たフェロスタン浴で実現困難であった50A/dm2
上の高電流密度でめっきを行う。
Next, the plating conditions in the case of using the plating bath of the present invention may be those required for plating at high current density, and basically there is no special consideration other than that. . That is, the flow rate of the plating solution is 100 m / min
The above-mentioned high speed is desirable, and the pretreatment may be usual electrolytic alkaline degreasing, sulfuric acid pickling, or further underlying plating such as nickel flash plating. The bath temperature may be 30 to 70 ° C. The cathode current density is preferably as high as possible as long as the cathode current efficiency is high and good plating can be obtained. The reason is not only the economic advantage due to improved productivity, but also a large number of fine plating nuclei generated during electrodeposition, resulting in dense plating and improved corrosion resistance. In the present invention, plating is performed at a high current density of 50 A / dm 2 or more, which has been difficult to achieve with the ferrostane bath which has been used most often.

【0016】錫めっき後の鋼板は用途によってはリフロ
ー処理を施す。従来のフェロスタン浴などではめっき液
の希釈液がそのままフラックスになり得たので、通常ド
ラッグアウト槽をストリップが通過するだけでフラック
ス塗布の目的は達せられた。しかし、本発明のめっき浴
は希釈してもフラックスとして作用しないので、極めて
平滑で光沢の優れたブリキを必要とする場合は、めっ
き、水洗後にフラックスを塗布する工程を入れることが
望ましい。しかし、フラックスを塗布しないでリフロー
しても、実用上十分な光沢を有するブリキを得ることが
できる。化成処理は、用途により通常の方法で行えばよ
い。
The steel plate after tin plating is subjected to a reflow treatment depending on the application. In conventional ferrostan baths, etc., the diluted solution of the plating solution could be directly used as flux, so the purpose of flux application could be achieved simply by passing the strip through the dragout bath. However, since the plating bath of the present invention does not act as a flux even when diluted, when an extremely smooth and glossy tin plate is required, it is desirable to include a step of applying flux after plating and washing with water. However, even if the reflow is performed without applying the flux, a tin plate having practically sufficient gloss can be obtained. The chemical conversion treatment may be performed by an ordinary method depending on the application.

【0017】[0017]

【実施例】以下、本発明を実施例に基づいて具体的に説
明する。下記に示す組成のめっき液に、鉄(III)イオン
を硫酸鉄として添加し、表1に示す芳香族化合物の効果
を試験した。 めっき液:硫酸錫(II) 108.6g/l(錫として
60g/l) 硫酸 16.7g/l ENSA 4.0g/l 鉄(III)イオン 10.0g/l
EXAMPLES The present invention will be specifically described below based on examples. Iron (III) ions were added as iron sulfate to a plating solution having the composition shown below, and the effects of the aromatic compounds shown in Table 1 were tested. Plating solution: tin (II) sulfate 108.6 g / l (60 g / l as tin) sulfuric acid 16.7 g / l ENSA 4.0 g / l iron (III) ion 10.0 g / l

【0018】試験は、内径105mm、高さ800mm
の錫溶解槽に粒径2.8mm錫粒を5kg充填し、80
リットルのめっき液を60リットル/分で循環させ、
1.5リットル/分の酸素を吹き込んだ。溶解槽内圧力
は2kgf/cm2 とした。酸素吹き込み2時間後のめ
っき液2リットルを濾過しスラッジの重量を測定した。
試験結果を表1に示すように、芳香族化合物を含む場
合、鉄イオンによる錫イオンの酸化は大幅に抑制され、
スラッジ生成は極めて少ない。
The test is carried out with an inner diameter of 105 mm and a height of 800 mm.
The tin dissolving tank of 5 is filled with 5 kg of tin particles of 2.8 mm in diameter,
Circulating liter of plating solution at 60 liters / minute,
Bubbling oxygen at 1.5 liter / min. The pressure in the dissolution tank was 2 kgf / cm 2 . 2 liters of the plating solution after 2 hours of blowing oxygen was filtered and the weight of the sludge was measured.
As shown in the test results in Table 1, in the case of containing an aromatic compound, the oxidation of tin ions by iron ions was significantly suppressed,
Sludge generation is extremely low.

【0019】[0019]

【表1】 [Table 1]

【0020】次に、電解中のスラッジ生成抑制とめっき
性の確認のため、液流速200m/minの横型循環セ
ルを用いて下記2試験液を循環させて電流密度150A
/dm2 、50クーロン/dm2 の錫めっきを行った。
電極はチタンに白金めっきした不溶性電極を使用した。
めっき性は、陰極電流効率、めっき光沢、耐食性(AT
C試験)で評価しスラッジ生成抑制効果はめっき後の液
中の量から判断した。
Next, in order to suppress sludge formation during electrolysis and to confirm the plating property, the following two test solutions were circulated using a horizontal circulation cell with a solution flow rate of 200 m / min to obtain a current density of 150 A.
/ Dm 2, 50 were tin plating of Coulomb / dm 2.
The electrode used was an insoluble electrode formed by plating platinum on titanium.
Plating properties include cathode current efficiency, plating gloss, corrosion resistance (AT
C test) and the sludge formation suppressing effect was judged from the amount in the liquid after plating.

【0021】試験液1 硫酸錫(II) 108.6g
/l(錫として60g/l) 硫酸 16.7g/l ENSA 4.0g/l 鉄(III)イオン 10.0g/l 2,3−ジヒドロキシアニソール 1.2g/l 試験液2 硫酸錫(II) 108.6g/l(錫とし
て60g/l) 硫酸 16.7g/l ENSA 4.0g/l 鉄(III)イオン 20.0g/l ピロガロール 0.5g/l 結果を表2に示すが、本発明に関わる実施例は、全て良
好なめっき性とスラッジ生成抑制効果を示した。
Test liquid 1 108.6 g of tin (II) sulfate
/ L (60 g / l as tin) Sulfuric acid 16.7 g / l ENSA 4.0 g / l Iron (III) ion 10.0 g / l 2,3-Dihydroxyanisole 1.2 g / l Test liquid 2 Tin (II) sulfate 108.6 g / l (60 g / l as tin) Sulfuric acid 16.7 g / l ENSA 4.0 g / l Iron (III) ion 20.0 g / l Pyrogallol 0.5 g / l The results are shown in Table 2, but the present invention All of the examples relating to (1) showed good plating properties and sludge formation suppressing effect.

【0022】[0022]

【表2】 [Table 2]

【0023】[0023]

【発明の効果】以上の実施例から明かなように、本発明
によれば、不溶性電極を用いる場合にも、鉄イオンによ
る錫イオンの酸化を抑制できるので、高電流密度での錫
めっきが可能になり、しかも、良環境性を保てるため、
ぶりき等の製造面での工業的価値が極めて大きい。
As is apparent from the above examples, according to the present invention, even when an insoluble electrode is used, the oxidation of tin ions due to iron ions can be suppressed, so that tin plating at high current density is possible. In addition, in order to maintain a good environment,
The industrial value in terms of manufacturing such as tinplate is extremely high.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 不溶性電極を用いる錫めっき製造におい
て、5〜50g/lの硫酸、40〜100g/lの錫
(II) を含む高電流密度錫めっき硫酸浴中に、二つ以上
の電子供与性置換基を有し、その内の少なくとも一つが
ヒドロキシ基であり、かつそのベンゼン環への配位がオ
ルト位またはパラ位である芳香族化合物を0.01〜2
g/l添加することを特徴とする錫イオンの鉄イオンに
よる酸化の抑制法。
1. In the tin plating production using an insoluble electrode, two or more electron donors are added to a high current density tin plating sulfuric acid bath containing 5 to 50 g / l sulfuric acid and 40 to 100 g / l tin (II). Aromatic compound having a polar substituent, at least one of which is a hydroxy group, and the coordination to the benzene ring is ortho or para is 0.01 to 2
A method for suppressing the oxidation of tin ions by iron ions, which comprises adding g / l.
JP15760793A 1993-06-28 1993-06-28 Method for suppressing oxidation of tin ion by iron ion Pending JPH0711474A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15760793A JPH0711474A (en) 1993-06-28 1993-06-28 Method for suppressing oxidation of tin ion by iron ion

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15760793A JPH0711474A (en) 1993-06-28 1993-06-28 Method for suppressing oxidation of tin ion by iron ion

Publications (1)

Publication Number Publication Date
JPH0711474A true JPH0711474A (en) 1995-01-13

Family

ID=15653428

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15760793A Pending JPH0711474A (en) 1993-06-28 1993-06-28 Method for suppressing oxidation of tin ion by iron ion

Country Status (1)

Country Link
JP (1) JPH0711474A (en)

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