JPH08269772A - Tin plating sulfuric acid bath for high plating current density plating having excellent tin solubility and sludge depressing effect and tin plating method - Google Patents

Tin plating sulfuric acid bath for high plating current density plating having excellent tin solubility and sludge depressing effect and tin plating method

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Publication number
JPH08269772A
JPH08269772A JP7258895A JP7258895A JPH08269772A JP H08269772 A JPH08269772 A JP H08269772A JP 7258895 A JP7258895 A JP 7258895A JP 7258895 A JP7258895 A JP 7258895A JP H08269772 A JPH08269772 A JP H08269772A
Authority
JP
Japan
Prior art keywords
tin
plating
bath
current density
sludge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7258895A
Other languages
Japanese (ja)
Inventor
Tomoya Oga
智也 大賀
Hiromitsu Date
博充 伊達
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP7258895A priority Critical patent/JPH08269772A/en
Publication of JPH08269772A publication Critical patent/JPH08269772A/en
Pending legal-status Critical Current

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  • Electroplating And Plating Baths Therefor (AREA)

Abstract

PURPOSE: To provide a sulfuric acid bath for tin plating and a tin plating method capable of continuously operating stable tin plating with high current density. CONSTITUTION: Tin is electrodeposited on a steel strip at the bath temp. of 30-70 deg.C with the current density of 50A/dm<2> with the tin plating sulfuric acid bath for high current density plating, which is excellent in tin solubility and sludge depressing effect and contains 5-50g/l sulfuric acid, 40-100g/l tin (11), a brightener and 2-10g/l sludge depressant as essentail components.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、容器材料およびその他
の用途に用いられる電気めっきブリキおよび薄錫めっき
鋼板の製造の際に用いる高電流密度による錫めっき硫酸
浴および錫めっき方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a tin plating sulfuric acid bath with a high current density and a tin plating method used in the production of electroplated tinplate and thin tin-plated steel sheets used for container materials and other applications.

【0002】[0002]

【従来の技術】ブリキ等の錫めっき鋼板の製造に用いら
れる錫めっき浴としては、ハロゲン浴、フェロスタン浴
(フェノールスルホン酸浴)、アルカリ浴等が従来から
よく知られている。アルカリ浴は4価の錫である錫酸ナ
トリウムを錫源としているため、2価の錫を使用する他
の浴と同一の錫付着量を得るためには、約2倍の電気量
が必要で、経済的理由から国内外を問わず、現在これを
使用している電気めっきラインはほとんどない。ハロゲ
ン浴は高電流密度でのめっきが可能であるという利点が
あるもののその腐食性のため、装置類のメンテナンスが
他の浴に比べて面倒であり、また不溶性陽極を使用でき
ないという欠点があり、広く使用されるには至っていな
い。このようなことから、現在、世界中のほとんどのブ
リキラインでは、主にフェノールスルホン酸浴が採用さ
れている。フェノールスルホン酸浴から製造したブリキ
は外観、耐食性等、優れた特性を持っているが、高電流
密度でのめっきではいわゆるめっきやけが生じてしまう
欠点がある。また、多量のフェノールスルホン酸を含む
ため、排水処理が困難で、コストアップの一因ともなっ
ている。
2. Description of the Related Art As a tin plating bath used for the production of tin-plated steel sheets such as tinplate, a halogen bath, a ferrostane bath (phenol sulfonic acid bath), an alkaline bath and the like have been well known. Since the alkaline bath uses tetravalent tin, sodium stannate, as the tin source, approximately twice the amount of electricity is required to obtain the same tin deposition amount as other baths using divalent tin. However, for economic reasons, there are few electroplating lines that currently use it both in Japan and overseas. Halogen baths have the advantage that they can be plated at high current densities, but due to their corrosive nature, maintenance of the equipment is more cumbersome than other baths, and insoluble anodes cannot be used. It has not been widely used. For this reason, at present, most of the tin lines in the world mainly use the phenolsulfonic acid bath. Tinplate produced from a phenol sulfonic acid bath has excellent characteristics such as appearance and corrosion resistance, but there is a drawback that so-called plating burn occurs in plating at a high current density. In addition, since it contains a large amount of phenolsulfonic acid, it is difficult to treat wastewater, which is one of the causes of cost increase.

【0003】一方、近年ではアルキルスルホン酸を酸成
分とするめっき浴が使われ始めている。この浴の特徴の
一つに廃液処理が簡便であることが挙げられる。特開平
4−228595号公報によれば、濯ぎ洗い用の水は、
中和によって錫イオンを回収した後は、環境に有害な成
分を含まないために通常の方法で排出可能である。しか
し、有機スルホン酸の多量の使用はCOD上昇につなが
り、処理なしで排出することが環境への影響がないとは
考え難い。
On the other hand, in recent years, a plating bath containing an alkyl sulfonic acid as an acid component has begun to be used. One of the characteristics of this bath is that the waste liquid treatment is simple. According to JP-A-4-228595, the water for rinsing is
After the tin ion is recovered by neutralization, it can be discharged by a usual method because it does not contain a component harmful to the environment. However, the use of a large amount of organic sulfonic acid leads to an increase in COD, and it is unlikely that discharging without treatment has no environmental impact.

【0004】このような状況の中で、本発明者らは、特
願平5−141616号において、高電流密度での電気
錫めっきを行ってもめっきやけが発生せず、陰極電流効
率の低下がなく、めっき外観、耐食性に優れたブリキを
得ることのできる低公害、低コストの硫酸浴、および該
めっき浴を用いためっき方法を提供した。しかし、この
錫めっき用硫酸浴を用いてブリキを製造した場合に新た
に以下の問題が顕在化した。
Under these circumstances, the inventors of the present invention have disclosed in Japanese Patent Application No. Hei 5-141616 that electroplating of tin at high current density does not cause plating burns and lowers the cathode current efficiency. The present invention provides a low-pollution, low-cost sulfuric acid bath capable of obtaining a tin plate excellent in plating appearance and corrosion resistance, and a plating method using the plating bath. However, the following problems newly became apparent when tinplate was produced using this sulfuric acid bath for tin plating.

【0005】この硫酸浴を用いて高電流密度で錫めっき
を行うと、浴中の2価の錫イオン(以下、錫(II) と表
す)が短時間に多量に消費され、浴のバランスを崩し高
電流密度での操業が困難になってくる。錫めっき浴への
錫(II) の供給は、工業的には流動槽を用い金属の錫粒
をめっき浴にて溶解させることによって行うのが適して
いる。この際、より一層の錫の溶解を促すために酸素を
吹き込む事が一般的である。特に、高電流密度で錫めっ
きを行う場合は、酸素吹き込み量を通常より多めに吹き
込み、めっきで消費される錫(II)を充分な速度でめっ
き浴に供給しなくてはならない。
When tin plating is performed at a high current density using this sulfuric acid bath, a large amount of divalent tin ions (hereinafter referred to as tin (II)) in the bath are consumed in a short time, and the bath balance is improved. It becomes difficult to operate at high current density. It is industrially suitable to supply tin (II) to the tin plating bath by using a fluidized tank to dissolve the metal tin particles in the plating bath. At this time, it is common to blow oxygen in order to promote further dissolution of tin. In particular, when performing tin plating at a high current density, it is necessary to blow oxygen in a larger amount than usual and supply tin (II) consumed in plating to the plating bath at a sufficient rate.

【0006】しかし、多量の酸素を吹き込むと錫粒の表
面に錫スラッジが薄く生成し、錫の溶解速度が低下し、
めっき浴への錫(II)の供給速度も低下するという問題
点が発生した。これは、金属錫がめっき液の酸と酸素に
よって錫(II)に溶解した瞬間、更に過剰の酸素のため
酸化が進み、酸化錫すなわちスラッジとなるからであ
る。錫スラッジは不溶解性のため錫粒の表面にスラッジ
が生成すると金属錫からの溶解速度が著しく阻害され
る。この問題点は、硫酸浴を用いて高電流密度でめっき
を行いぶりきを製造するためには、安定操業という観点
からは大きな問題である。
However, when a large amount of oxygen is blown, tin sludge is thinly formed on the surface of the tin particles, and the dissolution rate of tin decreases,
There was a problem that the supply rate of tin (II) to the plating bath also decreased. This is because, at the moment when metallic tin is dissolved in tin (II) by the acid and oxygen of the plating solution, the oxidation proceeds due to the excess oxygen and becomes tin oxide, that is, sludge. Since tin sludge is insoluble, when sludge is generated on the surface of tin particles, the dissolution rate from metallic tin is significantly hindered. This problem is a serious problem from the viewpoint of stable operation in order to manufacture tinplate by plating with a high current density using a sulfuric acid bath.

【0007】[0007]

【発明が解決しようとする課題】そこで、本発明は、上
記の問題を解決して高電流密度で安定な錫めっきの連続
操業を可能とする錫めっき硫酸浴および錫めっき方法を
提供するものである。
Therefore, the present invention provides a tin-plating sulfuric acid bath and a tin-plating method which solve the above problems and enable stable continuous tin plating operation at high current density. is there.

【0008】[0008]

【課題を解決するための手段】本発明者らは、低公害、
低価格という点から酸成分として無機酸である硫酸に着
目し、高電流密度で良好な操業性が得られるめっき浴お
よびめっき方法について種々検討した結果、本発明に至
ったものである。本発明の要旨は、主成分として5〜5
0g/lの硫酸、40〜100g/lの錫(II)、光沢
添加剤および2〜10g/lのスラッジ抑制剤を含むこ
とを特徴とする良好な錫溶解性とスラッジ抑制効果を有
する高電流密度めっき用錫めっき硫酸浴、並びにこの硫
酸めっき浴を用い、浴温30〜70℃、電流密度50A
/dm2 以上で鋼ストリップに錫を電析させる高電流密
度による錫めっき方法にある。
The present inventors have found that low pollution,
As a result of various studies on a plating bath and a plating method capable of obtaining good operability at high current density, paying attention to sulfuric acid which is an inorganic acid as an acid component from the viewpoint of low cost, the present invention has been achieved. The gist of the present invention is 5 to 5 as a main component.
High current with good tin solubility and sludge inhibiting effect, characterized in that it contains 0 g / l sulfuric acid, 40-100 g / l tin (II), gloss additive and 2-10 g / l sludge inhibitor Tin plating sulfuric acid bath for density plating, and using this sulfuric acid plating bath, bath temperature 30 to 70 ° C, current density 50A
/ Dm 2 or more, there is a tin plating method using a high current density for depositing tin on a steel strip.

【0009】[0009]

【作用】以下に本発明について詳細に説明する。本発明
の錫めっき浴では酸成分として硫酸を用いている。硫酸
は、若干のミストが出るものの、本質的に不揮発性で作
業環境や大気の汚染が少ない上、廃液処理上の問題が、
従来の有機スルホン酸を用いる浴と比較して少なく、低
価格である点も工業的に有利である。硫酸濃度は5〜5
0g/lとすべきである。硫酸濃度5g/lで電解液の
pHは約1.2で錫(II)イオンは安定であるが、これ
より低い濃度では、電解時に陰極近傍でpHが高くなる
ために錫(II)イオンが不安定となって沈殿が生じやす
い。また、電析した錫の光沢が優れない。一方、50g
/lより濃いとその効果が飽和するとともに経済的にも
不利が生じるようになる。
The present invention will be described in detail below. In the tin plating bath of the present invention, sulfuric acid is used as an acid component. Sulfuric acid produces a little mist, but is inherently non-volatile, so there is little pollution of the work environment and air, and there are problems with waste liquid treatment.
Compared with conventional baths using organic sulfonic acids, the number of baths is low and the cost is low, which is industrially advantageous. Sulfuric acid concentration is 5-5
Should be 0 g / l. At a sulfuric acid concentration of 5 g / l, the pH of the electrolytic solution is about 1.2, and tin (II) ions are stable. However, at a lower concentration, tin (II) ions are generated because the pH increases near the cathode during electrolysis. It becomes unstable and precipitates easily. Moreover, the gloss of the electrodeposited tin is not excellent. On the other hand, 50g
If it is higher than / l, its effect will be saturated and economically disadvantageous.

【0010】建浴時の錫は、可溶性の2価の錫塩として
加える。不要な成分を浴中に入れないため、硫酸錫(I
I)を使用するのが最も好ましい。予め硫酸を加えた溶
液に少しずつ溶解しながら加えていく。一度に多量に加
えると沈殿を生じる。硫酸錫(II)は長期にわたって保
管すると空気酸化を受けて不溶性の錫(IV)が生じるの
で、在庫を不必要に多く持つべきではない。保管は冷暗
所、さらに可能ならば窒素雰囲気中で保管することが望
ましい。酸化錫(II)または金属錫を建浴に用いること
も可能であるが、溶解までに時間がかかる。
[0010] Tin in the bath is added as a soluble divalent tin salt. Since unnecessary components are not put in the bath, tin sulfate (I
Most preferably I) is used. Add it while gradually dissolving it in the solution to which sulfuric acid had been added. Precipitation occurs when a large amount is added at one time. Tin (II) sulphate should not be kept unnecessarily large, as it will undergo air oxidation to form insoluble tin (IV) after long-term storage. It is desirable to store in a cool, dark place, and if possible, in a nitrogen atmosphere. It is possible to use tin (II) oxide or metallic tin in the building bath, but it takes a long time to dissolve.

【0011】錫(II)濃度は40〜100g/lとす
る。40g/l未満では高電流密度でめっきを行うとい
わゆるめっきやけを生じ、高品質のブリキが得難い。1
00g/lを超えるとストリップの持ち出す錫(II)イ
オンが多くなり、経済的に不利である。錫めっきの光沢
添加剤は特に限定する必要はない。一例として、フェロ
スタン浴で使用されるENSA(エトキシ化α−ナフト
ールスルホン酸)が問題なく使用できる。その濃度は2
〜6g/lで良好なめっきを可能にする。
The tin (II) concentration is 40 to 100 g / l. If it is less than 40 g / l, so-called plating burn will occur when plating is performed at a high current density, and it is difficult to obtain a high-quality tin plate. 1
If it exceeds 00 g / l, the amount of tin (II) ions carried out by the strip increases, which is economically disadvantageous. The brightening agent for tin plating does not have to be particularly limited. As an example, ENSA (ethoxylated α-naphthol sulfonic acid) used in ferrostane baths can be used without problems. Its concentration is 2
Good plating is possible at ~ 6 g / l.

【0012】硫酸浴はスラッジの生成量が多いため、ス
ラッジ抑制剤の使用が必要である。適切なスラッジ抑制
剤は、二つ以上の電子供与性置換基を有し、そのうちの
少なくとも一つがヒドロキシ基である電解液溶解性の芳
香族化合物である。このうち、ヒドロキシ基のo−位ま
たはp−位に酸素が芳香環の炭素と結合する置換基を有
する芳香族化合物、あるいは酸素が芳香環の炭素と結合
する置換基がヒドロキシ基のm−位にある芳香族化合物
および芳香環の炭素と結合する原子が窒素である芳香族
化合物であり、それらの添加量は2g/l〜10g/l
で用いることが望ましい。2g/l未満の低濃度の場
合、酸素吹き込みの錫粒溶解法では錫粒の表面に薄いス
ラッジの層が生成し、金属錫の溶解が阻害されるため浴
中の錫(II)濃度のバランスが崩れ、長時間にわたり高
電流密度で良好な錫めっきを継続する事が困難になる。
Since the sulfuric acid bath produces a large amount of sludge, it is necessary to use a sludge inhibitor. Suitable sludge inhibitors are electrolyte soluble aromatics having two or more electron donating substituents, at least one of which is a hydroxy group. Among these, an aromatic compound having a substituent in which oxygen is bonded to carbon of an aromatic ring at the o-position or p-position of a hydroxy group, or a substituent in which oxygen is bonded to carbon of an aromatic ring is the m-position of a hydroxy group. And an aromatic compound in which the atom bonded to the carbon of the aromatic ring is nitrogen, and the addition amount thereof is 2 g / l to 10 g / l.
It is desirable to use. When the concentration is less than 2 g / l, a thin sludge layer is formed on the surface of the tin particles by the oxygen-blended tin particle dissolution method, and the dissolution of metallic tin is hindered, so the tin (II) concentration in the bath is balanced. It becomes difficult to continue good tin plating with high current density for a long time.

【0013】更に、スラッジの発生も酸素吹き込みの時
点で多く、スラッジ抑制効果も十分ではない。スラッジ
は空気酸化あるいは不溶性電極を使用した場合に電極表
面での酸化反応によっても生成するが、錫溶解時のスラ
ッジ発生に比べれば小さい。又、10g/lを超えると
効果が飽和すること、経済的なデメリットが発生する事
に加え、浴中有機物の減少により低公害化を狙った本発
明の主旨に反する。
Further, sludge is often generated at the time of blowing oxygen, and the sludge suppressing effect is not sufficient. Sludge is also produced by air oxidation or an oxidation reaction on the electrode surface when an insoluble electrode is used, but it is smaller than sludge generation when tin is dissolved. Further, when it exceeds 10 g / l, the effect is saturated, an economical demerit is generated, and it is contrary to the purpose of the present invention aiming at low pollution by reducing organic substances in the bath.

【0014】次に本発明のめっき方法について説明す
る。本発明における高電流密度用の錫めっきは、電解液
と鋼ストリップとの相対スピードを100m/min.
以上の高速で流動させることが望ましい。本発明のめっ
き浴で錫めっきを施す鋼板は特に限定せず、用途により
適切な鋼板を用いればよい。前処理として電解アルカリ
脱脂、電解酸洗により表面の洗浄、活性化を施す。さら
にニッケル系のフラッシュめっき等の下地めっきを施す
ことも何等規定するものではない。
Next, the plating method of the present invention will be described. In the tin plating for high current density in the present invention, the relative speed between the electrolytic solution and the steel strip is 100 m / min.
It is desirable to flow at the above high speed. The steel plate to be tin-plated with the plating bath of the present invention is not particularly limited, and a suitable steel plate may be used depending on the application. As a pretreatment, the surface is cleaned and activated by electrolytic alkaline degreasing and electrolytic pickling. Furthermore, the provision of nickel-based flash plating or other undercoating is not specified.

【0015】錫めっきは浴温30〜70℃で行う。電解
や攪拌等による発熱のため、30℃未満の浴温を得るに
は冷却のためのコストがかかり、経済的でないばかりで
なく、外観、耐食性の優れためっきが得られない。70
℃を超える浴温での操業は、装置類の腐食や鋼板の鉄溶
出促進による浴の劣化が促進されることおよび蒸気の発
生が多くなり、作業環境が悪くなることから避けるべき
である。錫めっき量は、特に規定するものではなく使用
される用途によって適切な錫めっき量を施せば良い。
The tin plating is performed at a bath temperature of 30 to 70 ° C. Due to heat generation due to electrolysis, stirring, etc., it takes a cost for cooling to obtain a bath temperature of less than 30 ° C., which is not economical and plating excellent in appearance and corrosion resistance cannot be obtained. 70
Operation at a bath temperature in excess of ℃ should be avoided because the corrosion of the equipment and the deterioration of the bath due to the accelerated elution of iron from the steel sheet are accelerated, and the generation of steam increases, which deteriorates the working environment. The amount of tin plating is not particularly specified, and an appropriate amount of tin plating may be applied depending on the intended use.

【0016】陰極電流効率が高く、良好なめっきが得ら
れる範囲であれば、陰極電流密度は高いほど好ましい。
生産性の向上による経済性の利点ばかりでなく、電析に
おいて細かいめっき析出核が多く発生し、緻密なめっき
となるため耐食性が向上する。リフロー処理する場合
も、リフロー前の電析錫が緻密なほど生成した錫−鉄合
金が緻密で鉄面露出がなく、耐食性は良好である。本発
明では、従来最も多く使用されてきたフェロスタン浴で
実現困難であった50A/dm2 以上の高電流密度でめ
っきを行う。これによって上に述べたように耐食性の向
上も図ることもできる。
The higher the cathode current density is, the more preferable as long as the cathode current efficiency is high and good plating can be obtained.
In addition to the economic advantage due to improved productivity, a large number of fine plating precipitation nuclei are generated during electrodeposition, resulting in a dense plating, which improves corrosion resistance. Also in the case of the reflow treatment, the denser the electrodeposited tin before the reflow is, the denser the tin-iron alloy is formed, the iron surface is not exposed, and the corrosion resistance is good. In the present invention, plating is performed at a high current density of 50 A / dm 2 or more, which has been difficult to achieve with the ferrostane bath which has been used most often. This can also improve the corrosion resistance as described above.

【0017】アノードは溶性、不溶性のどちらでも使用
できるが、高電流密度でめっきを行う場合、錫アノード
の減量が多く、交換頻度が高くなるため、不溶性アノー
ドを用いる方が望ましい。不溶性アノードとしては白金
族金属またはその酸化物がよいが高価なため、チタンを
母材とし、白金等のめっきを施したものでよい。不溶性
アノードを用いる場合のめっき液への錫イオンの補給
は、前述したように金属錫粒を浸漬した電解液に酸素ま
たは空気を吹き込むことによって錫を溶解すればよい。
本発明のように高電流密度で錫めっきを行う場合、浴中
の錫(II)濃度を一定に保つためには錫溶解速度の高い
酸素吹き込み法を用いる方が好ましい。
The anode may be either soluble or insoluble, but when plating is performed at a high current density, it is preferable to use an insoluble anode because the amount of tin anode is reduced and the replacement frequency increases. The insoluble anode is preferably a platinum group metal or its oxide, but it is expensive, and therefore titanium may be used as a base material and plated with platinum or the like. When an insoluble anode is used, tin ions can be replenished to the plating solution by blowing oxygen or air into the electrolytic solution in which the metal tin particles are immersed as described above to dissolve the tin.
When tin plating is performed at a high current density as in the present invention, it is preferable to use an oxygen blowing method with a high tin dissolution rate in order to keep the tin (II) concentration in the bath constant.

【0018】錫めっき後の鋼板は用途によってはリフロ
ー処理を施す。従来のフェロスタン浴などではめっき液
の希釈液がそのままフラックスになり得たので、通常ド
ラッグアウト槽をストリップが通過するだけでフラック
ス塗布の目的は達せられた。しかし、本発明のめっき浴
は希釈してもフラックスとして作用しないので、極めて
平滑で光沢の優れたブリキを必要とする場合は、めっ
き、水洗後にフラックスを塗布する工程を入れることが
望ましいが、本発明ではフラックスを塗布しないでリフ
ローしても、実用上十分な光沢を有するブリキを得るこ
とができる。化成処理は、用途により適切な化成処理を
行えばよい。例えば、重クロム酸ソーダ水溶液中または
クロム酸−アニオン系水溶液中での浸漬処理あるいは電
解処理等、各種要求される特性、用途に応じて化成処理
条件を使い分ければ良い。
The steel plate after tin plating is subjected to a reflow treatment depending on the application. In conventional ferrostan baths, etc., the diluted solution of the plating solution could be directly used as flux, so the purpose of flux application could be achieved simply by passing the strip through the dragout bath. However, since the plating bath of the present invention does not act as a flux even when diluted, when an extremely smooth and glossy tin plate is required, it is desirable to include a step of applying flux after plating and washing with water. In the invention, even if the reflow is performed without applying the flux, a tin plate having practically sufficient gloss can be obtained. As the chemical conversion treatment, an appropriate chemical conversion treatment may be performed depending on the application. For example, the chemical conversion treatment conditions may be appropriately selected according to various required characteristics and applications, such as immersion treatment in a sodium dichromate aqueous solution or a chromate-anion aqueous solution or electrolytic treatment.

【0019】[0019]

【実施例】以下に本発明の実施例を説明する。板厚0.
2mmのめっき原板を脱脂、電解酸洗した後に、表1に
示すような種々のめっき浴組成、条件およびめっき条件
によって錫めっき鋼板を製造した。これらの錫めっき鋼
板に対して、以下に記した方法により、(1)めっき性
およびめっき鋼板特性、(2)錫溶解性、(3)錫溶解
性、(4)スラッジ生成、について試験した。
Embodiments of the present invention will be described below. Sheet thickness 0.
After degreasing a 2 mm original plating plate and electrolytic pickling, tin-plated steel sheets were manufactured under various plating bath compositions, conditions and plating conditions as shown in Table 1. These tin-plated steel sheets were tested for (1) platability and plated steel sheet characteristics, (2) tin solubility, (3) tin solubility, and (4) sludge formation by the methods described below.

【0020】(1)めっき性およびめっき鋼板特性 液流速230m/min.の横型循環セルを用いて試験
液を循環させて種々の電流密度で錫めっきを行った。そ
の際の供給クーロン数は目的とする錫めっき量を得られ
るように適宜調整した。アノードはチタンに白金めっき
した不溶性アノードを使用した。めっき性、めっき鋼板
特性を下記の方法で評価した。
(1) Platability and characteristics of plated steel sheet Liquid flow rate 230 m / min. The test solution was circulated using the horizontal circulation cell of No. 1 to perform tin plating at various current densities. The number of Coulombs supplied at that time was appropriately adjusted so as to obtain a desired tin plating amount. The anode used was an insoluble anode made by plating platinum on titanium. The platability and the characteristics of the plated steel sheet were evaluated by the following methods.

【0021】(a)陰極電流効率 めつき鋼板の錫付着量を希塩酸中での電解剥離によって
測定し、理論付着量に対する百分率を陰極電流効率とし
た。電流効率は、高ければ高いほど好ましいが、実用上
90%以上あれば問題ない。 (b)めっき光沢 JIS Z 8741の方法により、めっきままおよび
リフロー後のめっき鋼板の光沢度Gs60°を測定し
た。光の入射、反射の方向は、めっき原板の圧延方向と
した。ぶりきとしてのめっき光沢度Gs60°は250
以上が望まれる。 (c)耐食性(ATC試験) 鋼板に錫めっきを施した後、260℃でリフロー処理、
脱脂し、金属錫を電解剥離して試験片を作成した。2.
25cm2 の通電部を残してシールし、26.7℃のト
マトジュースに浸漬して、20時間後の試験片と錫極間
に流れるカップル電流を測定した。ATC値としては、
0.3μA/cm2 以下が望まれる。
(A) Cathode current efficiency The amount of tin deposited on the galvanized steel sheet was measured by electrolytic stripping in dilute hydrochloric acid, and the percentage of the theoretical amount deposited was defined as the cathode current efficiency. The higher the current efficiency, the more preferable it is, but practically 90% or more causes no problem. (B) Plating Gloss The gloss Gs 60 ° of the as-plated and reflowed plated steel sheet was measured by the method of JIS Z 8741. The direction of incidence and reflection of light was the rolling direction of the original plating plate. Plating gloss Gs 60 ° as tin plate is 250
The above is desired. (C) Corrosion resistance (ATC test) After the steel plate is tin-plated, reflow treatment is performed at 260 ° C.
A test piece was prepared by degreasing and electrolytically stripping metallic tin. 2.
A 25 cm 2 current-carrying portion was left sealed and immersed in tomato juice at 26.7 ° C., and after 20 hours, a couple current flowing between the test piece and the tin electrode was measured. As the ATC value,
0.3 μA / cm 2 or less is desired.

【0022】(2)錫溶解試験 内系105mm,高さ800mmの錫溶解槽に粒径2.
8mmの錫粒を5kg充填し、80リットルのめっき液
を60リットル/minの速度で循環させ、2.0リッ
トル/minの酸素を吹き込んだ。溶解槽内の圧力は
2.3kgf/cm2 とした。実験前にあらかじめ浴中
の錫(II)濃度をよう素滴定により測定しておき、3時
間試験後の浴中の錫(II)濃度を測定し試験前後の錫
(II)濃度の差を錫溶解量とし、錫溶解速度で求めた。
錫溶解速度としては1.5g/min以上が好ましい。
(2) Tin dissolution test In a tin dissolution tank having an internal diameter of 105 mm and a height of 800 mm, a particle size of 2.
5 kg of 8 mm tin particles were filled, 80 liter of plating solution was circulated at a rate of 60 liter / min, and 2.0 liter / min of oxygen was blown therein. The pressure in the dissolution tank was 2.3 kgf / cm 2 . Before the experiment, the tin (II) concentration in the bath was measured in advance by iodine titration, and the tin (II) concentration in the bath after 3 hours of the test was measured to determine the difference in the tin (II) concentration before and after the test. The amount of dissolution was defined as tin dissolution rate.
The tin dissolution rate is preferably 1.5 g / min or more.

【0023】(3)スラッジ生成試験 上記錫溶解試験後にめっき液を2リットル採取し、濾過
後生成したスラッジの重量を測定した。スラッジ生成量
としては少ない方が好ましいが、50g以下を抑制効果
があると判断した。 以上の試験評価結果を表1に示す。本発明の実施例1〜
7は、総合評価として良好な結果を示している。特に、
◎で示された実施例2〜5は、特に性能に優れている。
(3) Sludge Generation Test After the above tin dissolution test, 2 liters of the plating solution was sampled and the weight of the sludge generated after filtration was measured. Although it is preferable that the amount of sludge generated is small, 50 g or less was judged to have a suppressing effect. Table 1 shows the above test evaluation results. Examples 1 to 1 of the present invention
No. 7 shows a good result as a comprehensive evaluation. In particular,
Examples 2 to 5 shown by ⊚ are particularly excellent in performance.

【0024】[0024]

【表1】 [Table 1]

【0025】[0025]

【発明の効果】本発明により、低公害、低コストの硫酸
浴を用いて高電流密度で良好な連続めっき操業が可能と
なり、(1)トータルコストの低減、(2)環境汚染の
軽減、(3)錫めっき鋼板の耐食性向上の如きメリット
が得られる。
EFFECTS OF THE INVENTION According to the present invention, it is possible to perform a good continuous plating operation with a high current density using a low-pollution, low-cost sulfuric acid bath, (1) reduction of total cost, (2) reduction of environmental pollution, ( 3) Advantages such as improved corrosion resistance of tin-plated steel sheets can be obtained.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 主成分として5〜50g/lの硫酸、4
0〜100g/lの錫(II)、光沢添加剤および2〜1
0g/lのスラッジ抑制剤を含むことを特徴とする良好
な錫溶解性とスラッジ抑制効果を有する高電流密度めっ
き用錫めっき硫酸浴。
1. Sulfuric acid of 5 to 50 g / l as a main component, 4
0-100 g / l tin (II), gloss additive and 2-1
A tin-plating sulfuric acid bath for high current density plating, which has a good tin solubility and a sludge-suppressing effect, containing 0 g / l of a sludge-suppressing agent.
【請求項2】 請求項1記載のめっき浴を用い、浴温3
0〜70℃、電流密度50A/dm2 以上で鋼ストリッ
プに錫を電析させる高電流密度による錫めっき方法。
2. The plating bath according to claim 1, wherein the bath temperature is 3
A high current density tin plating method in which tin is electrodeposited on a steel strip at 0 to 70 ° C. and a current density of 50 A / dm 2 or more.
【請求項3】 めっき浴への錫(II)供給時に高濃度の
酸素吹き込みを行う請求項2記載の錫めっき方法。
3. The tin plating method according to claim 2, wherein a high concentration of oxygen is blown in at the time of supplying tin (II) to the plating bath.
JP7258895A 1995-03-30 1995-03-30 Tin plating sulfuric acid bath for high plating current density plating having excellent tin solubility and sludge depressing effect and tin plating method Pending JPH08269772A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7258895A JPH08269772A (en) 1995-03-30 1995-03-30 Tin plating sulfuric acid bath for high plating current density plating having excellent tin solubility and sludge depressing effect and tin plating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7258895A JPH08269772A (en) 1995-03-30 1995-03-30 Tin plating sulfuric acid bath for high plating current density plating having excellent tin solubility and sludge depressing effect and tin plating method

Publications (1)

Publication Number Publication Date
JPH08269772A true JPH08269772A (en) 1996-10-15

Family

ID=13493706

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7258895A Pending JPH08269772A (en) 1995-03-30 1995-03-30 Tin plating sulfuric acid bath for high plating current density plating having excellent tin solubility and sludge depressing effect and tin plating method

Country Status (1)

Country Link
JP (1) JPH08269772A (en)

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