JPH06813A - Method of cutting single-crystal gallium arsenide - Google Patents

Method of cutting single-crystal gallium arsenide

Info

Publication number
JPH06813A
JPH06813A JP18624092A JP18624092A JPH06813A JP H06813 A JPH06813 A JP H06813A JP 18624092 A JP18624092 A JP 18624092A JP 18624092 A JP18624092 A JP 18624092A JP H06813 A JPH06813 A JP H06813A
Authority
JP
Japan
Prior art keywords
cutting
ingot
wafer
gallium arsenide
gaas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18624092A
Other languages
Japanese (ja)
Inventor
Hiroyuki Matsushita
裕之 松下
Yoshihisa Kusunoki
義久 楠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP18624092A priority Critical patent/JPH06813A/en
Publication of JPH06813A publication Critical patent/JPH06813A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/02Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
    • B28D5/022Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
    • B28D5/028Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a ring blade having an inside cutting edge

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

PURPOSE:To facilitate a flow of coolant liquid and remove defects due to cutting by masking use of warpages of a wafer caused by the crystal anisotropy of signal-crystal gallium arsenide and by cutting the monocrystal while giving relative movement for keeping the cut-in side of an inner peripheral blade cutter to be opened at all time. CONSTITUTION:At the time of cutting start, a single-crystal gallium arsenide (GaAs) ingot 2 is set so that a carbon base 5 comes to the side surface and, at the same time of cutting start, the ingot 2 made to move upward and then to rotate oppositely to the rotating direction of an inner peripheral blade cutter 1 about the central point O. By masking use of the nature in which the surface of GaAs warps to the opposite of the ingot 2, the ingot 2 is so rotationally controlled that GaAs comes to the inlet side of the inner peripherasl cutter 1, and thus cutting is effected in order that coolant liquid reaches the cutting part at all time. Thus, finally, cutting is conducted at the position where the carbon base 5 comes below the ingot 2, thereby cutting off the wafer 3.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ガリウム砒素の単結晶
の棒を切断してウェハを得るための切断方法に関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cutting method for cutting a gallium arsenide single crystal rod to obtain a wafer.

【0002】[0002]

【従来の技術】ガリウム砒素(GaAs)の単結晶は、
<100>方向を結晶成長方向としてLEC法などによ
って製造され、得られた単結晶の棒(以下、インゴッ
ト、という)は外周を円筒状に研削され、さらにオリエ
ンテーションフラット研削された後に内周刃カッタによ
ってウェハ状に切り出される。
2. Description of the Related Art A single crystal of gallium arsenide (GaAs) is
A single crystal rod (hereinafter referred to as an ingot) manufactured by the LEC method or the like with the <100> direction as the crystal growth direction has an outer periphery ground into a cylindrical shape, and further has orientation flat grinding, and thereafter an inner peripheral blade cutter. It is cut into a wafer by.

【0003】図2は、内周刃カッタ1によるGaAsイ
ンゴット2の切断状況を示す図である。内周刃カッタ1
は同心円の穴1aを有する円板で、穴1aの内周部が刃
先となっており、この刃先にダイヤモンド砥粒1bを電
鋳したものである。インゴット2からウェハ3を切り出
す際には、カッタ1の穴1a内にインゴット2を挿入
し、切断部にクーラント液4を注ぎ込みながらカーボン
ベース5を上昇させることにより切断する。
FIG. 2 is a view showing a cutting situation of the GaAs ingot 2 by the inner cutter blade 1. Inner peripheral blade cutter 1
Is a disk having concentric holes 1a, and the inner peripheral portion of the hole 1a serves as a cutting edge, and diamond abrasive grains 1b are electroformed on this cutting edge. When the wafer 3 is cut out from the ingot 2, the ingot 2 is inserted into the hole 1a of the cutter 1, and the coolant 4 is poured into the cutting portion to raise the carbon base 5 for cutting.

【0004】[0004]

【発明が解決しようとする課題】内周刃カッタ1でウェ
ハ3を切り出す場合、GaAs特有の結晶異方性を反映
して、図3に示すように、(100)面はインゴット側
(図中で向こう側)に反り、斜線で示す(0 -1 -1)面
(ここで、−1は「上バーつき1」を表す、以下同様)
はインゴットと反対側(図中で手前側)に反り、全体と
してウェハ3が鞍型に反ってしまうという不都合があ
る。
When the wafer 3 is cut out by the inner peripheral blade cutter 1, the crystal anisotropy peculiar to GaAs is reflected, and as shown in FIG. 3, the (100) plane is on the ingot side (in the figure). (0 -1 -1) plane which is warped to the other side and is indicated by diagonal lines (here, -1 represents "1 with an upper bar", and so on)
Has a disadvantage that the wafer 3 is warped on the side opposite to the ingot (the front side in the figure), and the wafer 3 is warped in a saddle shape as a whole.

【0005】ウェハ3の反りが、図4に示すように、切
断部を上方から見た場合に内周刃の入口側Aでインゴッ
ト2側に反ったときには、クーラント液4がせき止めら
れて切断部にまで届かず、ソウマーク、割れ等の不良を
生じる。逆に、ウェハ3の反りが、図5に示すように、
内周刃の入口側Aでインゴット2と反対側に反ったとき
には、クーラント液4の流れがよくなり、安定した切断
が行える。
As shown in FIG. 4, when the warp of the wafer 3 is warped toward the ingot 2 side at the inlet side A of the inner peripheral blade when the cut portion is viewed from above, the coolant 4 is dammed and the cut portion is cut off. It will not reach the target and will cause defects such as saw marks and cracks. On the contrary, the warp of the wafer 3 is as shown in FIG.
When the inlet side A of the inner peripheral blade is warped to the side opposite to the ingot 2, the flow of the coolant 4 is improved and stable cutting can be performed.

【0006】ところが、従来の切断方法では、切断方向
が一定方向に定められているため、切断全体にわたって
内周刃の入口側Aでウェハ3の反りが内周刃カッタ1か
ら離れるように切断することが出来ず、部分的に切断が
不安定になるという不都合が生じる。
However, in the conventional cutting method, since the cutting direction is fixed, the wafer 3 is cut so that the warp of the wafer 3 is separated from the inner cutter 1 at the inlet side A of the inner cutter over the entire cutting. However, there is an inconvenience that the cutting is partially unstable.

【0007】そこで、本発明はインゴットからウェハを
切り出す際に、ウェハの反りによる切断の不安定性を除
去することを目的とする。
Therefore, an object of the present invention is to eliminate the instability of cutting due to the warp of the wafer when the wafer is cut out from the ingot.

【0008】[0008]

【課題を解決するための手段】本発明は、ガリウム砒素
単結晶の棒を切断してウェハを得る際に、ガリウム砒素
単結晶の結晶異方性によるウェハの反りを利用し、内周
刃カッタの切り込み側が常に開くように単結晶の棒と内
周刃カッタとの間に相対的な動きを与えながら切断する
ことを特徴とする。
The present invention utilizes the warp of the wafer due to the crystal anisotropy of the gallium arsenide single crystal when the bar of the gallium arsenide single crystal is cut to obtain the wafer. It is characterized by cutting while giving relative movement between the single crystal rod and the inner peripheral blade cutter so that the notch side always opens.

【0009】[0009]

【作用】本発明は、ガリウム砒素単結晶の棒(インゴッ
ト)を一方向に移動して切断するのではなく、ウェハが
ブロードから離れる部分に常に内周刃が入るように内周
刃カッタとインゴットホルダに任意の相対運動をさせな
がら切断することを特徴とする。このようにすれば、ク
ーラント液が常に切断部に供給され安定した切断が行え
る。
The present invention does not move a gallium arsenide single crystal rod (ingot) in one direction to cut the bar, but instead inserts the inner edge cutter and the ingot so that the inner edge always enters the portion where the wafer is separated from the broad. It is characterized in that the holder is cut while making an arbitrary relative movement. By doing so, the coolant liquid is always supplied to the cutting portion, and stable cutting can be performed.

【0010】[0010]

【実施例】図1は、本発明による切断方法の一実施例を
示す概略図で、図2〜図5と同一部分には同一符号を付
して説明する。同図において、GaAs単結晶インゴッ
ト2は、内周刃カッタ1に対して上下方向に移動し、か
つ中心点Oを中心にして回転するようにインゴットホル
ダ(不図示)に保持されている。
FIG. 1 is a schematic view showing an embodiment of a cutting method according to the present invention. The same parts as those in FIGS. In the figure, the GaAs single crystal ingot 2 is held by an ingot holder (not shown) so as to move vertically with respect to the inner cutter blade 1 and rotate about a center point O.

【0011】切断開始時には、カーボンベース5が側面
に来るようにインゴット2をセットしておき、切断開始
と同時にインゴット2を上昇させ、かつ中心点Oを中心
にして内周刃カッタ1の回転方向と逆に反時計方向に回
転させる(図a)。
At the start of cutting, the ingot 2 is set so that the carbon base 5 is on the side surface, the ingot 2 is raised at the same time as the start of cutting, and the inner peripheral blade cutter 1 is rotated about the center point O. Conversely, rotate counterclockwise (Fig. A).

【0012】そして、GaAsの(0 -1 -1)面がイン
ゴット2と反対側に反ることを利用し、(0 -1 -1)面
が内周刃の入口側Aに来るようにインゴット2を回転制
御し、クーラント液4が常に切断部に届くようにして切
断する(図b)。そして、最終的にはカーボンベース5
がインゴット2の下部に来る位置で切断し、ウェハ3を
切り離す(図c)。
Utilizing the fact that the (0 -1 -1) plane of GaAs is warped to the side opposite to the ingot 2, the (0 -1 -1) plane comes to the inlet side A of the inner peripheral blade. 2 is rotationally controlled so that the coolant 4 always reaches the cutting portion (Fig. B). And finally, carbon base 5
The wafer 3 is cut at a position where it comes to the bottom of the ingot 2, and the wafer 3 is cut off (FIG. C).

【0013】[0013]

【発明の効果】本発明によれば、切断中にインゴットを
回転させ、切断全体にわたり内周刃がインゴットに入る
側で常にウェハが内周刃から離れる方向に反るようにし
て切断するので、クーランド液の流れがよくなり、切断
による不良を除去することが可能となる。
According to the present invention, since the ingot is rotated during cutting, and the wafer is cut so that the inner peripheral blade enters the ingot over the entire cutting so that the wafer always warps in the direction away from the inner peripheral blade. The flow of the coolant is improved, and defects due to cutting can be removed.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による切断方法の一実施例を示す概略図
である。
FIG. 1 is a schematic view showing an embodiment of a cutting method according to the present invention.

【図2】内周刃カッタによるインゴットの切断状況を示
す図である。
FIG. 2 is a diagram showing a cutting situation of an ingot by an inner blade cutter.

【図3】ウェハの反りを説明するための図である。FIG. 3 is a diagram for explaining a warp of a wafer.

【図4】切断部を上方から見た場合のウェハの反りを示
す図である。
FIG. 4 is a diagram showing the warp of the wafer when the cut portion is viewed from above.

【図5】切断部を上方から見た場合のウェハの反りを示
す図である。
FIG. 5 is a diagram showing a warp of a wafer when a cut portion is viewed from above.

【符号の説明】[Explanation of symbols]

1 内周刃カッタ 2 インゴット 3 ウェハ 4 クーラント液 5 カーボンベース 1 Inner peripheral blade cutter 2 Ingot 3 Wafer 4 Coolant liquid 5 Carbon base

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 ガリウム砒素単結晶の棒を切断してウェ
ハを得る際に、前記ガリウム砒素単結晶の結晶異方性に
よる前記ウェハの反りを利用し、内周刃カッタの切り込
み側が常に開くように前記単結晶の棒と前記内周刃カッ
タとの間に相対的な動きを与えながら切断することを特
徴とするガリウム砒素単結晶の切断方法。
1. When a bar of gallium arsenide single crystal is cut to obtain a wafer, the warp of the wafer due to the crystal anisotropy of the gallium arsenide single crystal is utilized so that the cut side of the inner cutter is always open. A method for cutting a gallium arsenide single crystal, characterized in that the gallium arsenide single crystal is cut while providing relative movement between the single crystal rod and the inner cutter.
JP18624092A 1992-06-19 1992-06-19 Method of cutting single-crystal gallium arsenide Pending JPH06813A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18624092A JPH06813A (en) 1992-06-19 1992-06-19 Method of cutting single-crystal gallium arsenide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18624092A JPH06813A (en) 1992-06-19 1992-06-19 Method of cutting single-crystal gallium arsenide

Publications (1)

Publication Number Publication Date
JPH06813A true JPH06813A (en) 1994-01-11

Family

ID=16184809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18624092A Pending JPH06813A (en) 1992-06-19 1992-06-19 Method of cutting single-crystal gallium arsenide

Country Status (1)

Country Link
JP (1) JPH06813A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6574752B1 (en) 1999-07-15 2003-06-03 International Business Machines Corporation Method and system for error isolation during PCI bus configuration cycles

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6574752B1 (en) 1999-07-15 2003-06-03 International Business Machines Corporation Method and system for error isolation during PCI bus configuration cycles

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