JPH0680662A - Alkoxymethylthiomethylsilane and production of thiolane compound using the same compound - Google Patents

Alkoxymethylthiomethylsilane and production of thiolane compound using the same compound

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Publication number
JPH0680662A
JPH0680662A JP23696792A JP23696792A JPH0680662A JP H0680662 A JPH0680662 A JP H0680662A JP 23696792 A JP23696792 A JP 23696792A JP 23696792 A JP23696792 A JP 23696792A JP H0680662 A JPH0680662 A JP H0680662A
Authority
JP
Japan
Prior art keywords
group
lower alkyl
formula
phenyl
alkyl group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23696792A
Other languages
Japanese (ja)
Inventor
Akira Hosomi
彰 細見
Makoto Hojo
信 北條
Shinzo Seko
信三 世古
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP23696792A priority Critical patent/JPH0680662A/en
Publication of JPH0680662A publication Critical patent/JPH0680662A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide the subject new compound useful as an intermediate for production of a thiolane. CONSTITUTION:A compound of the formula (R<1> and R<2> are each H, a lower alkyl or phenyl; R<3> is a lower alkoxyalkyl, a lower alkyl or trimethylsilyl), e.g. methoxymethylthiomethyltrimethylsilane. The compound of the formula can be obtained by reacting alpha-trimethylsilylmethanethiol with n-butyllithium and then reacting chloromethyl methyl ether therewith.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はチオラン類およびそのオ
キサアナログである1,3−オキサチオラン類の共通製
造中間体およびそれを用いるチオラン類および1,3−
オキサチオラン類の製造法に関するものである。
FIELD OF THE INVENTION The present invention relates to a common intermediate for the production of thiolanes and their oxa analogs, 1,3-oxathiolanes, and thiolanes and 1,3-oxanes using the same.
The present invention relates to a method for producing oxathiolanes.

【0002】[0002]

【従来の技術】チオラン類の合成方法としては従来、
(2−ハロエチル)オキシラン類と硫化水素とから2位
に置換基を有する3−ヒドロキシチオランを得る方法
(Can.J.Chem. 56, 71(1978)) 、 ハロメチルチオメチルシラン類とカルボニル化合物と
をフッ素イオンの存在下に反応させ5位に置換基を有す
る1,3−オキサチオランを得る方法( J.Chem.Soc.,Ch
em.Commun.,1442(1987)) あるいは メルカプトエタノール誘導体とカルボニル化合物とを
反応させて1,3−オキサチオランを得る方法が知られ
ていた。しかしながらこれらの方法ではチオラン環ある
いは1,3−オキサチオラン環の限定された位置に置換
基を導入することしかできなかった。
2. Description of the Related Art Conventional methods for synthesizing thiolanes are
Method for obtaining 3-hydroxythiolane having a substituent at the 2-position from (2-haloethyl) oxiranes and hydrogen sulfide (Can. J. Chem. 56, 71 (1978)), halomethylthiomethylsilanes and carbonyl compounds A method of reacting with and in the presence of a fluorine ion to obtain 1,3-oxathiolane having a substituent at the 5-position (J. Chem. Soc., Ch
em.Commun., 1442 (1987)) or a method of reacting a mercaptoethanol derivative with a carbonyl compound to obtain 1,3-oxathiolane. However, these methods can only introduce a substituent into a limited position of the thiolane ring or the 1,3-oxathiolane ring.

【0003】[0003]

【発明が解決しようとする課題】本発明の目的は任意の
位置に置換基を有するチオラン類および1,3−オキサ
チオラン類の製造法およびこれらの製造に使用しうる共
通の製造中間体を提供することにある。
DISCLOSURE OF THE INVENTION An object of the present invention is to provide a method for producing thiolanes and 1,3-oxathiolanes having a substituent at an arbitrary position, and a common production intermediate which can be used for their production. Especially.

【0004】[0004]

【課題を解決するための手段】本発明は一般式化1 (式中、R1 、R2 は水素、低級アルキル基もしくはフ
ェニル基を表し、R3 は低級アルコキシアルキル基、低
級アルキル基もしくはトリメチルシリル基を表す。)
The present invention is represented by the general formula 1 (In the formula, R 1 and R 2 represent hydrogen, a lower alkyl group or a phenyl group, and R 3 represents a lower alkoxyalkyl group, a lower alkyl group or a trimethylsilyl group.)

【0005】で表されるアルコキシメチルチオメチルシ
ランおよびそれを使用する一般式 化7 (式中、R1 、R2 、R5 、R6 およびR7 は水素、低
級アルキル基もしくはフェニル基を表す。)
Alkoxymethylthiomethylsilane represented by and a general formula using the same (In the formula, R 1 , R 2 , R 5 , R 6 and R 7 represent hydrogen, a lower alkyl group or a phenyl group.)

【0006】で表されるチオラン類および一般式 化4 (式中、R1 およびR2 は前記とおなじものを表し、R
4 は低級アルキル基、低級アラルキル基、低級シクロア
ルキル基あるいはフェニル基、低級アルキル基、ハロゲ
ン、低級アルコキシ基で置換されていてもよいフェニル
基を表す。)で表される1,3−オキサチオラン類の新
規な製造法を提供するものである。
The thiolanes represented by and the general formula (In the formula, R 1 and R 2 are the same as those described above, and R 1
4 represents a lower alkyl group, a lower aralkyl group, a lower cycloalkyl group or a phenyl group, a lower alkyl group, a phenyl group which may be substituted with a halogen or a lower alkoxy group. The present invention provides a novel method for producing 1,3-oxathiolanes represented by the formula (1).

【0007】以下、本発明について詳細に説明する。本
発明の一般式(化1)で表される新規なアルコキシメチ
ルチオメチルシランを得る方法としては、 α−トリメチルシリルメタンチオールにn−ブチルリ
チウムを反応させ、ついでクロロメチルメチルエーテル
に代表されるクロロメチルエーテル類を反応させる方
法、 置換メタンチオールをと同様にn−ブチルリチウム
と反応させ、ついでクロロメチルエーテル類と反応さ
せ、得られたアセタール化合物をこれと当量のテトラメ
チルエチレンジアミン(以下TMEDA と略称する。)の存
在下に再びn−ブチルリチウムで処理し、つづいてクロ
ロトリメチルシランと反応させシリル化を行いアルコキ
シメチルチオメチルシランを得る方法、あるいは置換
メタンチオールにこれと当量のTMEDA の存在下に2 当量
のn−ブチルリチウムを反応させジアニオンとし、これ
をクロロトリメチルシランを用いてシリル化し、得られ
たトリメチルシリル体を触媒量の18−Crown−6
エーテルと青酸カリウムの存在下アルデヒド類と反応さ
せO−トリメチルシリルアセタール化合物へと導く方法
がある。
The present invention will be described in detail below. As a method for obtaining the novel alkoxymethylthiomethylsilane represented by the general formula (Formula 1) of the present invention, α-trimethylsilylmethanethiol is reacted with n-butyllithium, and then chloromethyl represented by chloromethyl methyl ether. Method of reacting ethers, substituted methanethiol is reacted with n-butyllithium in the same manner as, and then reacted with chloromethyl ethers, and the obtained acetal compound is equivalent to tetramethylethylenediamine (hereinafter abbreviated as TMEDA). ) Is again treated with n-butyllithium, followed by silylation by reaction with chlorotrimethylsilane to obtain alkoxymethylthiomethylsilane, or substituted methanethiol in the presence of an equivalent amount of TMEDA. An equivalent amount of n-butyllithium is reacted to produce dianio And then, it was silylated using chlorotrimethylsilane and the resulting trimethylsilyl body of a catalytic amount 18-Crown-6
There is a method of reacting with an aldehyde in the presence of ether and potassium cyanide to obtain an O-trimethylsilyl acetal compound.

【0008】かかる方法で得られた一般式(化1)で表
されるアルコキシメチルチオメチルシランをフッ素イオ
ンの存在下に一般式 化2 R4 −CHO (式中、R4 は低級アルキル基、低級アラルキル基、低
級シクロアルキル基あるいはフェニル基、低級アルキル
基、ハロゲン、低級アルコキシ基で置換されていてもよ
いフェニル基を表す。)
The alkoxymethylthiomethylsilane represented by the general formula (Formula 1) obtained by the above method is represented by the general formula 2 R 4 --CHO (wherein R 4 is a lower alkyl group or a lower group) in the presence of a fluorine ion. Represents an aralkyl group, a lower cycloalkyl group, a phenyl group, a lower alkyl group, a halogen, or a phenyl group which may be substituted with a lower alkoxy group.)

【0009】で表されるアルデヒド類と反応させ式 化
(式中、R1 、R2 は水素、低級アルキル基もしくはフ
ェニル基を表し、R3 は低級アルコキシアルキル基、低
級アルキル基もしくはトリメチルシリル基を表わし、R
4 は低級アルキル基、低級アラルキル基、低級シクロア
ルキル基、あるいはフェニル基、低級アルキル基、ハロ
ゲンもしくは低級アルコキシ基で置換されていてもよい
フェニル基を表す。)で表されるアルコール化合物を
得、ついでこれを酸触媒を用いて閉環して前記の一般式
(化4)で示される1,3−オキサチオラン類を製造す
ることができる。
Reaction with an aldehyde represented by the formula: (Wherein R 1 and R 2 represent hydrogen, a lower alkyl group or a phenyl group, R 3 represents a lower alkoxyalkyl group, a lower alkyl group or a trimethylsilyl group, and R
4 represents a lower alkyl group, a lower aralkyl group, a lower cycloalkyl group, or a phenyl group, a lower alkyl group, a phenyl group which may be substituted with a halogen or a lower alkoxy group. The alcohol compound represented by the formula (1) is obtained, and then the ring is closed using an acid catalyst to produce the 1,3-oxathiolane represented by the general formula (Formula 4).

【0010】この工程において使用するアルデヒド類と
しては、アセトアルデヒド、プロピオンアルデヒド、ブ
チルアルデヒド、イソブチルアルデヒド、バレルアルデ
ヒド、2,2-ジメチルプロパナール等の低級アルキルアル
デヒド、シクロヘキサンカーブアルデヒド等の低級シク
ロアルカンカーブアルデヒド類、フェネチルアルデヒ
ド、2,2-ジメチル-3- フェニルプロパナール等の低級ア
ラルキルアルデヒドが挙げられる。さらにベンズアルデ
ヒド、トリルアルデヒド、アニスアルデヒド、フルオロ
ベンズアルデヒド、クロロベンズアルデヒドなどのハロ
アルデヒド類、ビフェニルアルデヒド等のような低級ア
ルキル基、低級アルコキシ基、ハロゲン原子もしくはフ
ェニル基で置換されていてもよい芳香族アルデヒド類が
あげられる。
Aldehydes used in this step include acetaldehyde, propionaldehyde, butyraldehyde, isobutyraldehyde, valeraldehyde, lower alkyl aldehydes such as 2,2-dimethylpropanal, and lower cycloalkanecarbaldehyde such as cyclohexanecarbaldehyde. And lower aralkyl aldehydes such as phenethyl aldehyde and 2,2-dimethyl-3-phenylpropanal. Furthermore, haloaldehydes such as benzaldehyde, tolylaldehyde, anisaldehyde, fluorobenzaldehyde, chlorobenzaldehyde, etc., lower alkyl groups such as biphenylaldehyde, lower alkoxy groups, aromatic aldehydes optionally substituted with halogen atoms or phenyl groups. Can be given.

【0011】アルデヒド類の使用量はアルコキシメチル
チオメチルシラン( 化1)に対して、通常0.5 〜2.1 当
量である。フッ素イオンとしては例えばフッ化テトラノ
ルマルブチルアンモニウムなどのフッ化4 級アンモニウ
ム塩もしくはフッ化セシウム、フッ化リチウム等の周期
率表第1 族元素のフッ化物などが用いられる。その使用
量はアルコキシメチルチオメチルシランに対して、通常
0.1 〜0.6 当量であり、好ましくは0.2 〜0.4 当量であ
る。この反応は通常テトラヒドロフラン、アセトニトリ
ル等の溶媒中で行うことができる。その使用量は、通常
反応基質の1倍量から大過剰量である。反応温度は通常
室温から溶媒の沸点までの温度である。
The amount of aldehyde used is usually 0.5 to 2.1 equivalents relative to the alkoxymethylthiomethylsilane (Chemical formula 1). As the fluorine ion, for example, a quaternary ammonium fluoride such as tetranormalbutylammonium fluoride or a fluoride of a Group 1 element of the periodic table such as cesium fluoride and lithium fluoride is used. The amount used is usually relative to alkoxymethylthiomethylsilane
The amount is 0.1 to 0.6 equivalent, preferably 0.2 to 0.4 equivalent. This reaction can usually be carried out in a solvent such as tetrahydrofuran or acetonitrile. The amount used is usually 1-fold amount to a large excess amount of the reaction substrate. The reaction temperature is usually from room temperature to the boiling point of the solvent.

【0012】かくして得られたアルコール化合物(化
3)は通常の後処理を行うか、あるいはさらに必要によ
りシリカゲルカラムクロマトグラフィー等により精製し
て取り出すことができ、つぎの工程で酸触媒で処理する
ことにより目的物である前記の式(化4)の1,3−オ
キサチオラン化合物を製造することができる。反応に使
用する酸触媒としては硫酸もしくは塩酸があげられる。
その使用量は触媒量である。反応は0 ℃〜室温で行われ
る。この反応は通常塩化メチレン等のハロゲン化炭化水
素溶媒中でおこない、その量は通常反応基質に対して1
倍量から大過剰量である。かくして得られた化合物( 化
4)は通常の後処理を行うか、あるいはさらに必要によ
りシリカゲルカラムクロマトグラフィー等により精製し
て取り出すことができる。
The alcohol compound (Chemical Formula 3) thus obtained can be subjected to usual post-treatment or, if necessary, further purified by silica gel column chromatography and taken out, and treated with an acid catalyst in the next step. According to this, the 1,3-oxathiolane compound of the above-mentioned formula (Formula 4), which is the target, can be produced. Examples of the acid catalyst used in the reaction include sulfuric acid or hydrochloric acid.
The amount used is a catalytic amount. The reaction is performed at 0 ° C to room temperature. This reaction is usually performed in a halogenated hydrocarbon solvent such as methylene chloride, and the amount thereof is usually 1 with respect to the reaction substrate.
Double to large excess. The compound thus obtained (Chemical Formula 4) can be subjected to a usual post-treatment or, if necessary, further purified by silica gel column chromatography and taken out.

【0013】また本発明において一般式(化1)で表さ
れるアルコキシメチルチオメチルシランを一般式 化5 (式中、R5 、R6 およびR7 は水素、低級アルキル
基、フェニル基を表す)
In the present invention, the alkoxymethylthiomethylsilane represented by the general formula (Formula 1) is represented by the general formula (In the formula, R 5 , R 6 and R 7 represent hydrogen, a lower alkyl group or a phenyl group)

【0014】で表されるシリルエノールエーテル類とル
イス酸の存在下に反応させ式 化6 (式中、R1 、R2 、R5 、R6 およびR7 は水素、低
級アルキル基もしくはフェニル基を表す。)で表される
カルボニル化合物を得、ついでこれをフッ素イオンの存
在下に閉環反応させ前記の一般式(化7)で示されるチ
オラン類を製造することができる。
A silyl enol ether represented by the following formula is reacted in the presence of a Lewis acid to give a compound of formula 6 (In the formula, R 1 , R 2 , R 5 , R 6 and R 7 represent hydrogen, a lower alkyl group or a phenyl group.), Which is then subjected to ring closure in the presence of a fluorine ion. A thiolane represented by the above general formula (Formula 7) can be produced by reacting.

【0015】この反応において使用する(化5)のシリ
ルエノールエーテル類としては、2,2-ジメチルビニルト
リメチルシリルエノールエーテル、(Z)-1-フェニル−2-
メチルビニルトリメチルシリルエノールエーテル等をあ
げることができる。その使用量は(化1)で表されるア
ルコキシメチルチオメチルシランに対して通常1 〜2 当
量である。
As the silyl enol ethers of Chemical formula 5 used in this reaction, 2,2-dimethylvinyltrimethylsilyl enol ether and (Z) -1-phenyl-2-
Methyl vinyl trimethyl silyl enol ether etc. can be mentioned. The amount used is usually 1 to 2 equivalents relative to the alkoxymethylthiomethylsilane represented by (Chemical Formula 1).

【0016】また触媒のルイス酸としては3 価の塩化イ
ンジウムとクロロトリメチルシランの混合物からなるも
のを使用し、その組成は3 価の塩化インジウム1当量に
対してクロロトリメチルシラン2.5〜5当量までの範
囲のものが使用できる。これら混合物からなるルイス酸
の使用量は触媒量でよい。反応は塩化メチレン等のハロ
ゲン化炭化水素溶媒中で通常おこなう。反応温度は0 ℃
〜室温程度までである。反応終了後、反応マスを水で希
釈し中和洗浄、分液し濃縮する等の通常の後処理をする
か、さらに必要によりシリカゲルカラムクロマトグラフ
ィー等により精製することによりカルボニル化合物(化
6)を得ることができる。
As the Lewis acid for the catalyst, a mixture of trivalent indium chloride and chlorotrimethylsilane is used, and its composition is 2.5 to 5 equivalents of chlorotrimethylsilane to 1 equivalent of trivalent indium chloride. The range up to can be used. The Lewis acid comprising these mixtures may be used in a catalytic amount. The reaction is usually performed in a halogenated hydrocarbon solvent such as methylene chloride. Reaction temperature is 0 ° C
~ Up to room temperature. After completion of the reaction, the carbonyl compound (Chemical Formula 6) can be obtained by subjecting the reaction mass to usual post-treatments such as diluting with water, neutralization and washing, separating and concentrating, or further purifying by silica gel column chromatography or the like if necessary. Obtainable.

【0017】このようにして得られたカルボニル化合物
(化6)は、さらにフッ素イオンで処理してチオラン化
合物( 化7)へと導くことができる。その際用いるフッ
素イオン源としては例えばフッ化テトラノルマルブチル
アンモニウムなどのフッ化4級アンモニウム塩もしくは
フッ化セシウム、フッ化リチウム等の周期率表第1族元
素のフッ化物などが挙げられる。その使用量は中間体カ
ルボニル化合物(化6)に対して、通常0.1 〜1.0 当量
である。
The carbonyl compound (Chemical Formula 6) thus obtained can be further treated with a fluorine ion to be converted into a thiolane compound (Chemical Formula 7). Examples of the fluorine ion source used at that time include a quaternary ammonium fluoride salt such as tetranormalbutylammonium fluoride or a fluoride of a Group 1 element of the periodic table such as cesium fluoride and lithium fluoride. The amount thereof used is usually 0.1 to 1.0 equivalent based on the intermediate carbonyl compound (Chemical Formula 6).

【0018】この反応は通常テトラヒドロフラン、アセ
トニトリル等の溶媒中で行うことができる。その使用量
は、通常反応基質の1倍量から大過剰量である。反応温
度は通常室温から溶媒の沸点までの温度である。かくし
て得られたチオラン類は前記カルボニル化合物と同様の
後処理法により取り出すことができる。
This reaction can usually be carried out in a solvent such as tetrahydrofuran or acetonitrile. The amount used is usually 1-fold amount to a large excess amount of the reaction substrate. The reaction temperature is usually from room temperature to the boiling point of the solvent. The thiolanes thus obtained can be taken out by the same post-treatment method as that for the carbonyl compound.

【0019】[0019]

【発明の効果】本発明によれば、任意の置換様式のチオ
ラン類およびそのオキサアナログである1,3−オキサ
チオラン類が共通の中間体から効率的に得られる。
INDUSTRIAL APPLICABILITY According to the present invention, thiolanes having an arbitrary substitution pattern and its oxa analog 1,3-oxathiolanes can be efficiently obtained from a common intermediate.

【0020】[0020]

【実施例】以下、実施例により本発明をさらに詳細に説
明するが、本発明は以下の実施例に限定されるものでは
ない。
The present invention will be described in more detail with reference to the following examples, but the present invention is not limited to the following examples.

【0021】実施例1 モレラキュラーシーブ4Aと磁気回転子をいれアルゴン
置換した2口フラスコを減圧下で加熱乾燥した。この中
にテトラヒドロフラン5ml,テトラノルマルブチルアンモ
ニウムフルオリドのテトラヒドロフラン溶液(0.8
M)0.125ml(0.1mmol)を加えた。2.
5時間攪拌した後ベンズアルデヒド53mg(0.5m
mol)とメトキシメチルトリメチルシリルメチルスル
フィド150mg(0.91mmol)を加え室温で2
2時間攪拌した。エーテルで反応マスを希釈し水で洗っ
た。分液後、有機層をぼう硝で乾燥し乾燥剤を濾別後、
濾液から溶媒を留去した。得られたオイルをシリカゲル
薄層クロマトグラフィーで分離精製しメトキシメチルβ
−ヒドロキシフェネチルスルフィドを収率84%で得
た。
Example 1 A two-necked flask containing a molecular sieve 4A and a magnetic rotor and replaced with argon was heated and dried under reduced pressure. In this, 5 ml of tetrahydrofuran and a tetrahydrofuran solution of tetra-n-butylammonium fluoride (0.8
M) 0.125 ml (0.1 mmol) was added. 2.
After stirring for 5 hours, 53 mg of benzaldehyde (0.5 m
mol) and methoxymethyltrimethylsilylmethyl sulfide (150 mg, 0.91 mmol) were added at room temperature for 2
Stir for 2 hours. The reaction mass was diluted with ether and washed with water. After liquid separation, the organic layer is dried with Glauber's salt and the desiccant is filtered off.
The solvent was distilled off from the filtrate. The resulting oil was separated and purified by silica gel thin layer chromatography to obtain methoxymethyl β
-Hydroxyphenethyl sulfide was obtained with a yield of 84%.

【0022】メトキシメチルβ−ヒドロキシフェネチル
スルフィドの分析値.1 HNMR(60MHz,TMS/CCl4 ) δ:2.62(dd,J=7.8,13.8Hz,1
H),2.82(dd,J=4.2,13.8Hz,1
H),3.02(s,br.1H,),3.28(s,
3H),4.44(d,J=12.0Hz,1H),
4.55(d,J=12.0Hz,1H),4.61
(dd,J=4.2,7.8Hz,1H),7.15
(s,5H). IR.(neat film): 3440,2940,1450,
1350,1180,1080,940,900,73
0,700cm-1
Analytical value of methoxymethyl β-hydroxyphenethyl sulfide. 1 HNMR (60 MHz, TMS / CCl 4 ) δ: 2.62 (dd, J = 7.8, 13.8 Hz, 1
H), 2.82 (dd, J = 4.2, 13.8 Hz, 1
H), 3.02 (s, br. 1H,), 3.28 (s,
3H), 4.44 (d, J = 12.0Hz, 1H),
4.55 (d, J = 12.0 Hz, 1H), 4.61
(Dd, J = 4.2, 7.8 Hz, 1H), 7.15
(S, 5H). IR. (Neat film): 3440, 2940, 1450,
1350, 1180, 1080, 940, 900, 73
0,700 cm -1 .

【0023】実施例2〜6 実施例1においてベンズアルデヒドの代わりにp−アニ
スアルデヒド、p−ビフェニルアルデヒド、p−クロロ
ベンズアルデヒド、2,2−ジメチルプロパナールある
いはシクロヘキサンカーブアルデヒドをそれぞれ用いる
以外はおなじように反応を行い実施例2〜6のアルコー
ル化合物が得られた。
Examples 2 to 6 As in Example 1, except that p-anisaldehyde, p-biphenylaldehyde, p-chlorobenzaldehyde, 2,2-dimethylpropanal or cyclohexanecarbaldehyde was used instead of benzaldehyde, respectively. The reaction was performed to obtain the alcohol compounds of Examples 2 to 6.

【0024】実施例7 フラスコ内にモレキュラーシーブ4Aを適当量入れ窒素
置換した2 口フラスコ内を減圧下加熱乾燥した。この中
にTHF5mlとTBAF・THF溶液(0.71M)
0.57ml(0.40mmol)を仕込み2時間攪拌
を行った。2,2−ジメチル−3−フェニルプロパナー
ル324mg(2.00mmol)とメトキシメチルチ
オメチルトリメチルシラン164mg(1.00mmo
l)をこの中に加え室温で24時間攪拌を行った。さら
にTBAF・THF溶液(0.90M)0.23ml
(0.21mmol)を加え通算67時間攪拌を行っ
た。反応終了後、反応マスをセライト濾過し水で加水分
解した。エーテルで抽出した有機層を乾燥し乾燥剤を濾
別後、濾液を濃縮した。シリカゲルカラムクロマトグラ
フィーで濃縮物を精製して、酢酸エチル/ヘキサン=1
/5の展開溶媒でRf値0.41の3,3-ジメチル−4-フ
ェニル−1-メトキシメチルチオブタン-2- オールを収率
59% で得た。
Example 7 An appropriate amount of molecular sieve 4A was put in a flask, and the inside of a two-necked flask purged with nitrogen was heated and dried under reduced pressure. 5mL of THF and TBAF / THF solution (0.71M)
0.57 ml (0.40 mmol) was charged and the mixture was stirred for 2 hours. 324 mg (2.00 mmol) of 2,2-dimethyl-3-phenylpropanal and 164 mg (1.00 mmo) of methoxymethylthiomethyltrimethylsilane.
1) was added to this and the mixture was stirred at room temperature for 24 hours. Furthermore, TBAF / THF solution (0.90M) 0.23 ml
(0.21 mmol) was added and the mixture was stirred for a total of 67 hours. After completion of the reaction, the reaction mass was filtered through Celite and hydrolyzed with water. The organic layer extracted with ether was dried, the desiccant was filtered off, and the filtrate was concentrated. The concentrate was purified by silica gel column chromatography and ethyl acetate / hexane = 1
Yield of 3,3-dimethyl-4-phenyl-1-methoxymethylthiobutan-2-ol with Rf value 0.41 in a developing solvent of / 5
Obtained at 59%.

【0025】3,3-ジメチル−4-フェニル−1-メトキシメ
チルチオブタン-2- オールの分析値1 HNMR(60MHz,TMS/CDCl3 ) δ:0.83(s,3H),0.93(s,3H),
2.50(dd,J=9.0,14.0Hz,1H),
2.53(d,J=13.0Hz,1H),2.77
(d,J=13.0Hz,1H),2.93(dd,J
=2.0,14.0Hz,1H),3.27−3.53
(m,1H),3.30(dd,J=2.0,9.0H
z,1H),3.35(s,3H),4.47(d,J
=12.0Hz,1H),4.63(d,J=12.0
Hz,1H),7.15(s,5H). EIマススペクトル m/e(% relative intensity) :2
22(M+ −MeOH;3.8),195(1.7),
162(11.2),145(6.9),133(9.
0),121(8.0),91(100),89(2
4.3),69(50.7),65(15.4),60
(30.2),45(97.8) IR(neat film ):3450,2940,2340,
1490,1470,1450,1180,1080,
700,665cm-1
Analysis value of 3,3-dimethyl-4-phenyl-1-methoxymethylthiobutan-2-ol 1 HNMR (60 MHz, TMS / CDCl 3 ) δ: 0.83 (s, 3H), 0.93 ( s, 3H),
2.50 (dd, J = 9.0, 14.0 Hz, 1H),
2.53 (d, J = 13.0 Hz, 1H), 2.77
(D, J = 13.0 Hz, 1H), 2.93 (dd, J
= 2.0, 14.0 Hz, 1H), 3.27-3.53
(M, 1H), 3.30 (dd, J = 2.0, 9.0H
z, 1H), 3.35 (s, 3H), 4.47 (d, J
= 12.0 Hz, 1H), 4.63 (d, J = 12.0)
Hz, 1H), 7.15 (s, 5H). EI mass spectrum m / e (% relative intensity): 2
22 (M + -MeOH; 3.8), 195 (1.7),
162 (11.2), 145 (6.9), 133 (9.
0), 121 (8.0), 91 (100), 89 (2)
4.3), 69 (50.7), 65 (15.4), 60
(30.2), 45 (97.8) IR (neat film): 3450, 2940, 2340,
1490, 1470, 1450, 1180, 1080,
700,665 cm -1 .

【0026】かかる方法により得られた3,3−ジメチ
ル−4−フェニル−1−メトキシメチルチオブタン−2
−オール134mg(0.52mmol)を含む塩化メ
チレン溶液5mlを調製した。この中に濃硫酸5滴を加
え室温で40分間攪拌した。反応終了後、反応液を飽和
重曹水に加えてアルカリ性とした。分液後水層を塩化メ
チレンで2回、エーテルで2回抽出し、抽出液を有機層
に加えた。無水硫酸マグネシウムで乾燥した有機層を濾
過し、濾液から溶媒を留去した。得られた濃縮物をトリ
メチルアミンを少量加えた溶出溶媒を用いたシリカゲル
カラムクロマトグラフィーに供し81% の収率で5-( β−
ジメチルフェネチル)-1,3- オキサチオランを得た。
3,3-Dimethyl-4-phenyl-1-methoxymethylthiobutane-2 obtained by such a method
5 ml of a methylene chloride solution containing all-134 mg (0.52 mmol) was prepared. 5 drops of concentrated sulfuric acid was added thereto, and the mixture was stirred at room temperature for 40 minutes. After completion of the reaction, the reaction solution was added to saturated aqueous sodium hydrogen carbonate to make it alkaline. After separation, the aqueous layer was extracted twice with methylene chloride and twice with ether, and the extract was added to the organic layer. The organic layer dried over anhydrous magnesium sulfate was filtered, and the solvent was distilled off from the filtrate. The resulting concentrate was subjected to silica gel column chromatography using an elution solvent containing a small amount of trimethylamine to give 5- (β-
Dimethylphenethyl) -1,3-oxathiolane was obtained.

【0027】5-( β−ジメチルフェネチル)-1,3- オキ
サチオランの分析値1 HNMR(60MHz,TMS/CDCl3 ) δ:0.87(s,3H), 0.97(s,3H),
2.33−2.97(m,4H),3.45(dd,J
=6.0,9.0Hz,1H),4.67(d,J=
5.4Hz,1H),4.93(d,J=5.4Hz,
1H),7.12(s,5H). EIマススペクトル m/e(% relative intensity) :2
22(M+ ;21.2),145(5.3),130
(31.8),101(25.2),91(100),
55(27.6),43(33.4). IR(neat film ):2975,2860,2375,
1600,1495,1460,1390,1365,
1295,1220,1115,1070,1030,
700,665cm-1
Analysis value of 5- (β-dimethylphenethyl) -1,3-oxathiolane 1 HNMR (60 MHz, TMS / CDCl 3 ) δ: 0.87 (s, 3H), 0.97 (s, 3H),
2.33-2.97 (m, 4H), 3.45 (dd, J
= 6.0, 9.0 Hz, 1H), 4.67 (d, J =
5.4 Hz, 1 H), 4.93 (d, J = 5.4 Hz,
1H), 7.12 (s, 5H). EI mass spectrum m / e (% relative intensity): 2
22 (M + ; 21.2), 145 (5.3), 130
(31.8), 101 (25.2), 91 (100),
55 (27.6), 43 (33.4). IR (neat film): 2975, 2860, 2375,
1600, 1495, 1460, 1390, 1365,
1295, 1220, 1115, 1070, 1030,
700,665 cm -1 .

【0028】実施例8、9 実施例7において使用した2,2−ジメチル−3−フェ
ニルプロパナールの代わりにp−アニスアルデヒドを用
いて、メトキシメチルチオメチルトリメチルシランの代
わりにメトキシエトキシメチルチオメチルトリメチルシ
ランおよびフェニル(メトキシメチルチオ)メチルトリ
メチルシランとの反応をそれぞれ行い(表1)に示す実
施例8および9のアルコール化合物を得た。
Examples 8 and 9 P-anisaldehyde was used in place of 2,2-dimethyl-3-phenylpropanal used in Example 7, and methoxyethoxymethylthiomethyltrimethylsilane was used in place of methoxymethylthiomethyltrimethylsilane. And phenyl (methoxymethylthio) methyltrimethylsilane, respectively, to obtain alcohol compounds of Examples 8 and 9 shown in (Table 1).

【0029】[0029]

【表1】アルコキシメチルチオメチルシラン(化1)と
アルデヒドとの反応 ────────────────────────────────── 化1 アルデヒド TBAF 反応 化3 実施例 R1234 CHO 当量 時間 収率 1 H H Me Ph 0.2+0.2 48hr 84% 2 H H Me p-MeOC6H4 0.2 48hr 72% 3 H H Me p-PhC6H4 0.2+0.2 48hr 63% 4 H H Me p-ClC6H4 0.2+0.2 72hr 44% 5 H H Me Me3C 0.2 47hr 87% 6 H H Me C6H11 0.4 67hr 64% 7 H H Me PhCH2(Me)2C 0.4+0.2 67hr 59% 8 H H MeOCH2 CH2 p-MeOC6H4 0.2+0.2 46hr 60% 9 Ph H Me p-MeOC6H4 0.2 22hr 82% ────────────────────────────────── 1)仕込モル比は( 化 1)/アルデヒド/TBAF=1/2/0.2 を基
準としている。 2)反応溶媒はテトラヒドロフランを用いた。 3)反応温度は室温で行った。 4)TBAF( テトラノルマルブチルアンモニウムフルオリ
ド)は必要により追加した。 追加当量は+ 記号付きの
数字で付記した。 5)収率はすべてカラムクロマトグフィー後の精製収率で
ある。
[Table 1] Reaction of alkoxymethylthiomethylsilane (Chemical Formula 1) with aldehyde ────────────────────────────────── --Chemical 1 Aldehyde TBAF reaction 3 Example R 1 R 2 R 3 R 4 CHO Equivalent time Yield 1 H H Me Ph 0.2 + 0.2 48hr 84% 2 H H Me p-MeOC6H4 0.2 48hr 72% 3 H H Me p -PhC6H4 0.2 + 0.2 48hr 63% 4 H H Me p-ClC6H4 0.2 + 0.2 72hr 44% 5 H H Me Me3C 0.2 47hr 87% 6 H H Me C6H11 0.4 67hr 64% 7 H H Me PhCH2 (Me) 2C 0.4+ 0.2 67hr 59% 8 H H MeOCH 2 CH 2 p-MeOC6H4 0.2 + 0.2 46hr 60% 9 Ph H Me p-MeOC6H4 0.2 22hr 82% ─────────────────── ─────────────── 1) The molar ratio is based on (Chemical formula 1) /aldehyde/TBAF=1/2/0.2. 2) Tetrahydrofuran was used as the reaction solvent. 3) The reaction temperature was room temperature. 4) TBAF (tetranormal butyl ammonium fluoride) was added as needed. Additional equivalents are indicated by numbers with a + sign. 5) All yields are purification yields after column chromatography.

【0030】実施例7と同様に表1の式(化3)のアル
コール化合物を酸触媒を用いて環化させ(表2)に示す
式(化4)の1,3−オキサチオランを得る。
In the same manner as in Example 7, the alcohol compound of formula (Formula 3) in Table 1 is cyclized using an acid catalyst to obtain 1,3-oxathiolane of formula (Formula 4) shown in (Table 2).

【0031】[0031]

【表2】 [Table 2]

【0032】実施例10 InCl3 221mg(1.00mmol)をはかりと
ったフラスコを窒素置換したのち減圧下に加熱してIn
Cl3 を乾燥した。この中に塩化メチレン30ml、クロロ
トリメチルシラン(d=0.858)0.63ml(5
40mg,4.98mmol)を加え室温で4分間攪拌
した。フェニル(メトキシメチルチオ)メチルトリメチ
ルシラン2.40g(10.00mmol)と1−トリ
メチルシロキシ−2−メチルプロペン2.88g(2
0.00mmol)の塩化メチレン溶液(20ml)を
0℃で加え、同温度で3.5時間攪拌しさらに室温で1
時間攪拌した。反応マスを濾過して、水で加水分解し、
分液した有機層とエーテル抽出層とを合わせ乾燥、濾過
し、濾液を濃縮した。濃縮物をシリカゲルカラムクロマ
トグラフィーで精製し収量2.58g(9.20mmo
l)収率92%で3−〔フェニル(トリメチルシリル)
メチルチオ〕−2,2−ジメチルプロパナールを得た。
Example 10 A flask in which 221 mg (1.00 mmol) of InCl 3 was weighed was replaced with nitrogen and then heated under reduced pressure to obtain In.
The Cl 3 was dried. 30 ml of methylene chloride and 0.63 ml of chlorotrimethylsilane (d = 0.858) (5
40 mg, 4.98 mmol) was added and the mixture was stirred at room temperature for 4 minutes. 2.40 g (10.00 mmol) of phenyl (methoxymethylthio) methyltrimethylsilane and 2.88 g (2 of 1-trimethylsiloxy-2-methylpropene
(0.00 mmol) methylene chloride solution (20 ml) was added at 0 ° C., the mixture was stirred at the same temperature for 3.5 hours, and further stirred at room temperature for 1 hour.
Stir for hours. The reaction mass is filtered and hydrolyzed with water,
The separated organic layer and ether extraction layer were combined, dried, filtered, and the filtrate was concentrated. The concentrate was purified by silica gel column chromatography to give a yield of 2.58 g (9.20 mmo).
l) 3- [phenyl (trimethylsilyl) with a yield of 92%
Methylthio] -2,2-dimethylpropanal was obtained.

【0033】3−〔フェニル(トリメチルシリル)メチ
ルチオ〕−2,2−ジメチルプロパナールの分析値1 HNMR(60MHz,TMS/CCl4 ) δ:0.12(s,9H),1.12(s,3H),
1.15(s,3H)2.42(d,J=13.0H
z,1H), 2.58(d,J=13.0Hz,1
H),3.22(s,1H),7.23(s,5H),
9.38(s,1H). EIマススペクトル m/e(%relative intensity): 26
5(0.6), 224(3.0), 195(41.
0), 135(21.8), 91(13.1), 73
(100), 45(36.2). IR(neat film ): 2950,1725,1690,
1490,1465,1445,1250,1070,
850,700cm-1
Analysis value of 3- [phenyl (trimethylsilyl) methylthio] -2,2-dimethylpropanal 1 HNMR (60 MHz, TMS / CCl 4 ) δ: 0.12 (s, 9H), 1.12 (s, 3H),
1.15 (s, 3H) 2.42 (d, J = 13.0H
z, 1H), 2.58 (d, J = 13.0Hz, 1
H), 3.22 (s, 1H), 7.23 (s, 5H),
9.38 (s, 1H). EI mass spectrum m / e (% relative intensity): 26
5 (0.6), 224 (3.0), 195 (41.
0), 135 (21.8), 91 (13.1), 73
(100), 45 (36.2). IR (neat film): 2950, 1725, 1690,
1490, 1465, 1445, 1250, 1070,
850,700 cm -1 .

【0034】モレキュラーシーブ4Aを適当量入れ窒素
置換し減圧下に加熱乾燥した2 口フラスコの中にTHF
5ml、TBAF・THF溶液(0.68M)0.29
ml(0.20mmol)と先に精製した3−〔フェニ
ル(トリメチルシリル)メチルチオ〕−2,2−ジメチ
ルプロパナール140mg(0.50mmol)を加え
室温で23時間攪拌を行った。反応終了後、反応マスを
セライト濾過し水で加水分解した。エーテルで水層を抽
出後、分液した有機層と一緒にして乾燥し、乾燥剤を濾
別後、濾液を濃縮した。得られた濃縮物をシリカゲルカ
ラムクロマトグラフィーで精製して目的物のジアステレ
オマー混合物を全収率92%で得た。
An appropriate amount of molecular sieve 4A was charged, and the atmosphere was replaced with nitrogen, and THF was placed in a two-necked flask which was heated and dried under reduced pressure.
5 ml, TBAF / THF solution (0.68M) 0.29
mL (0.20 mmol) and previously purified 3- [phenyl (trimethylsilyl) methylthio] -2,2-dimethylpropanal 140 mg (0.50 mmol) were added, and the mixture was stirred at room temperature for 23 hours. After completion of the reaction, the reaction mass was filtered through Celite and hydrolyzed with water. The aqueous layer was extracted with ether, the organic layer separated was dried together, the desiccant was filtered off, and the filtrate was concentrated. The obtained concentrate was purified by silica gel column chromatography to obtain the target diastereomer mixture in a total yield of 92%.

【0035】酢酸エチル/ヘキサン=1/5の展開溶媒
でRf値0.40のジアステレオマーの分析値1 HNMR(270MHz,TMS/CDCl3 ) δ:1.14(s,6H),1.80(s,1H),
2.62(d,J=10.6Hz,1H),2.98
(d,J=10.6Hz,1H),3.63(d,J=
9.2Hz,1H),4.10(d,J=9.2Hz,
1H),7.22−7.35(m,3H),7.43−
7.55(m,2H).13 CNMR(270MHz,TMS/CDCl3 ) δ:20.0,26.2,40.3,43.6,54.
2,87.3,127.7,128.4(2C),12
8.6(2C),140.2.
Analysis value of diastereomer having Rf value of 0.40 in developing solvent of ethyl acetate / hexane = 1/5. 1 HNMR (270 MHz, TMS / CDCl 3 ) δ: 1.14 (s, 6H), 1. 80 (s, 1H),
2.62 (d, J = 10.6 Hz, 1H), 2.98
(D, J = 10.6 Hz, 1H), 3.63 (d, J =
9.2 Hz, 1 H), 4.10 (d, J = 9.2 Hz,
1H), 7.22-7.35 (m, 3H), 7.43-
7.55 (m, 2H). 13 CNMR (270 MHz, TMS / CDCl 3 ) δ: 20.0, 26.2, 40.3, 43.6, 54.
2, 87.3, 127.7, 128.4 (2C), 12
8.6 (2C), 140.2.

【0036】Rf値0.49のジアステレオマーの分析
1 HNMR(270MHz,TMS/CDCl3 ) δ:1.22(s,6H),1.52(s,1H),
2.60(d,J=9.9Hz,1H),3.20
(d,J=9.9Hz,1H),3.68(d,J=
3.3Hz,1H),4.84(d,J=3.3Hz,
1H),7.28−7.39(m,3H),7.51−
7.54(m,2H).13 CNMR(270MHz,TMS/CDCl3 ) δ:22.6,25.3,42.9,48.1,56.
6,83.8,127.8,128.6(2C),12
9.3(2C),136.9.
Analysis value of diastereomer having Rf value 0.49 1 HNMR (270 MHz, TMS / CDCl 3 ) δ: 1.22 (s, 6H), 1.52 (s, 1H),
2.60 (d, J = 9.9Hz, 1H), 3.20
(D, J = 9.9 Hz, 1H), 3.68 (d, J =
3.3 Hz, 1 H), 4.84 (d, J = 3.3 Hz,
1H), 7.28-7.39 (m, 3H), 7.51-
7.54 (m, 2H). 13 CNMR (270 MHz, TMS / CDCl 3 ) δ: 22.6, 25.3, 42.9, 48.1, 56.
6, 83.8, 127.8, 128.6 (2C), 12
9.3 (2C), 136.9.

【0037】実施例11 実施例10においてフェニル(メトキシメチルチオ)メ
チルトリメチルシランの代わりに参考例4のα- トリメ
チルシリルベンジルα'-トリメチルシリルオキシベンジ
ルスルフィドを用いる以外は同様の条件で反応を行い3
−〔フェニル(トリメチルシリル)メチルチオ〕−3−
フェニル−2,2−ジメチルプロパナールを得、これを
原料として次の反応を行った。
Example 11 The reaction was carried out under the same conditions as in Example 10 except that α-trimethylsilylbenzyl α′-trimethylsilyloxybenzyl sulfide of Reference Example 4 was used instead of phenyl (methoxymethylthio) methyltrimethylsilane.
-[Phenyl (trimethylsilyl) methylthio] -3-
Phenyl-2,2-dimethylpropanal was obtained, and the following reaction was carried out using this as a raw material.

【0038】2 口フラスコ内にモレキュラーシーブ4A
を適当量入れ窒素置換した。減圧下に加熱してフラスコ
内を乾燥させた中にTHF5ml、TBAF・THF溶
液(1.0 M)0.18ml(0.18mmol)と上記
方法で得られた3−〔フェニル(トリメチルシリル)メ
チルチオ〕−3−フェニル−2,2−ジメチルプロパナ
ール125mg(0.35mmol)を入れ室温で23
時間攪拌を行った。反応終了後セライト濾過し、水で加
水分解した。エーテルで抽出した有機層を乾燥し、乾燥
剤を濾別した濾液を濃縮した。得られた濃縮物をシリカ
ゲルカラムクロマトグラフィーで精製してヘキサン/酢
酸エチル=8/1の展開溶媒でRf値0.20とRf値
0.67の目的物のジアステレオマーを合わせて83%
の収率で得た。
Molecular sieve 4A in a 2-neck flask
Was put in an appropriate amount and replaced with nitrogen. While heating under reduced pressure to dry the inside of the flask, 5 ml of THF, 0.18 ml (0.18 mmol) of TBAF / THF solution (1.0 M) and 3- [phenyl (trimethylsilyl) methylthio] -3 obtained by the above method. -Phenyl-2,2-dimethylpropanal (125 mg, 0.35 mmol) was added to the mixture at room temperature for 23 hours.
Stir for hours. After the reaction was completed, it was filtered through Celite and hydrolyzed with water. The organic layer extracted with ether was dried, the desiccant was filtered off, and the filtrate was concentrated. The obtained concentrate was purified by silica gel column chromatography and combined with a developing solvent of hexane / ethyl acetate = 8/1 to obtain 83% of the target diastereomer having an Rf value of 0.20 and an Rf value of 0.67.
It was obtained in a yield of.

【0039】Rf値0.20のジアステレオマー化合物
の分析値1 HNMR(270MHz,TMS/CDCl3 ) δ:0.84(s,3H),1.05(s,3H),
1.86(s,1H),3.82(d,J=9.56H
z,1H),4.29(d,J=9.56Hz,1
H),4.52(s,1H),7.20−7.55
(m,10H).13 CNMR(270MHz,TMS/CDCl3 ) δ:14.2,24.7,47.4,53.8,57.
3,88.3,127.6,127.7,127.8
(2C),128.5(2C),128.6(2C),
129.5(2C),136.8,140.3.
Analysis value of diastereomeric compound having Rf value of 0.20 1 HNMR (270 MHz, TMS / CDCl 3 ) δ: 0.84 (s, 3H), 1.05 (s, 3H),
1.86 (s, 1H), 3.82 (d, J = 9.56H
z, 1H), 4.29 (d, J = 9.56Hz, 1
H), 4.52 (s, 1H), 7.20-7.55.
(M, 10H). 13 CNMR (270 MHz, TMS / CDCl 3 ) δ: 14.2, 24.7, 47.4, 53.8, 57.
3,88.3,127.6,127.7,127.8
(2C), 128.5 (2C), 128.6 (2C),
129.5 (2C), 136.8, 140.3.

【0040】実施例12,13 実施例10においてフェニル(メトキシメチルチオ)メ
チルトリメチルシランの代わりにメトキシメチルチオメ
チルトリメチルシランまたは参考例3で製造したα- ト
リメチルシリルメチルα'-トリメチルシリルオキシプロ
ピルスルフィドを用いる以外は同様に反応を行いそれぞ
れ実施例12あるいは実施例13のチオラン化合物を得
た。
Examples 12 and 13 Except that phenyl (methoxymethylthio) methyltrimethylsilane was replaced by methoxymethylthiomethyltrimethylsilane or α-trimethylsilylmethyl α'-trimethylsilyloxypropyl sulfide produced in Reference Example 3 in Example 10. The same reaction was performed to obtain the thiolane compound of Example 12 or Example 13, respectively.

【0041】実施例14 参考例2で得られたフェニル(メトキシメチルチオ)メ
チルトリメチルシランと1−フェニル−2−トリメチル
シリルオキシプロペンとを用いて実施例10と同様の条
件で反応を行い実施例14のチオラン化合物を得た。
Example 14 Using the phenyl (methoxymethylthio) methyltrimethylsilane obtained in Reference Example 2 and 1-phenyl-2-trimethylsilyloxypropene, a reaction was conducted under the same conditions as in Example 10 A thiolane compound was obtained.

【0042】[0042]

【表3】 TBAF:テトラノルマルブチルアンモニウムフルオリドを
表す。反応時間は( 化6)から(化7)への反応時間を
表す。
[Table 3] TBAF: represents tetra-n-butylammonium fluoride. The reaction time represents the reaction time from (Chemical formula 6) to (Chemical formula 7).

【0043】次に本発明化合物であるアルコキシメチル
チオメチルシラン類(化1)の製造法を参考例1〜4に
示す。
Next, Reference Examples 1 to 4 show methods for producing alkoxymethylthiomethylsilanes (Chemical Formula 1) which are the compounds of the present invention.

【0044】参考例1 メトキシメチルチオメチルトリメチルシランの合成 2口フラスコに磁気回転子を入れ減圧下、加熱乾燥を行
いアルゴン置換した。エーテル40mlとトリメチルシ
リルメタンチオール3.58g(30mmol)をこの
中に仕込み、−78℃に冷却後、ブチルリチウムのヘキ
サン溶液19.5ml(1.62M,32mmol)を
ゆっくり加えた。加え終わった後、室温まで昇温し1.
5時間攪拌を行った。0℃に冷却しクロロメチルメチル
エーテル(d=1.07)2.18ml(29mmo
l)を加えた。室温で2時間攪拌した後、飽和重曹水溶
液で加水分解した。分液後、水層を3回エーテル抽出
し、得られた有機層をぼう硝で乾燥した。乾燥剤を濾過
した後、濾液を濃縮した。得られたオイルにCaH2
乾燥剤として添加して蒸留を行った。沸点88−90℃
(48mmHg)のメトキシメチルチオメチルトリメチ
ルシラン4.02gを収率82%で得た。
Reference Example 1 Synthesis of methoxymethylthiomethyltrimethylsilane A magnetic rotor was placed in a two-necked flask, heated under reduced pressure, and replaced with argon. 40 ml of ether and 3.58 g (30 mmol) of trimethylsilylmethanethiol were charged therein, and after cooling to −78 ° C., 19.5 ml (1.62 M, 32 mmol) of a hexane solution of butyl lithium was slowly added. After the addition was completed, the temperature was raised to room temperature.
The mixture was stirred for 5 hours. After cooling to 0 ° C., 2.18 ml (29 mmo) of chloromethyl methyl ether (d = 1.07)
l) was added. After stirring at room temperature for 2 hours, it was hydrolyzed with a saturated aqueous sodium hydrogen carbonate solution. After liquid separation, the aqueous layer was extracted with ether three times, and the obtained organic layer was dried with sodium sulfate. After filtering the desiccant, the filtrate was concentrated. CaH 2 was added to the obtained oil as a desiccant and distilled. Boiling point 88-90 ° C
4.02 g of (48 mmHg) methoxymethylthiomethyltrimethylsilane was obtained with a yield of 82%.

【0045】メトキシメチルチオメチルトリメチルシラ
ンの分析値1 HNMR(60MHz,TMS/CDCl3 ) δ:0.10(s.9H),1.83(s,2H),
3.30(s,3H),4.52(s,2H).
Analysis value of methoxymethylthiomethyltrimethylsilane 1 HNMR (60 MHz, TMS / CDCl 3 ) δ: 0.10 (s.9H), 1.83 (s, 2H),
3.30 (s, 3H), 4.52 (s, 2H).

【0046】参考例2 フェニル(メトキシメチルチオ)メチルトリメチルシラ
ンの合成 磁気回転子を入れ窒素置換を行ったセプタムキャップ付
きの100mlの2口フラスコにエーテル30mlとベ
ンジルメルカプタン(d=1.058)3.52ml
(3.72g,30mmol)を加えた。この反応液を
−78℃に冷却後ブチルリチウムヘキサン溶液19.4
ml(1.6 M,31mmol)をゆっくり加えた。
加え終わった後、1時間同温度で攪拌した後、室温まで
昇温して2時間攪拌した。反応液を0℃に冷却しクロロ
メチルメチルエーテル(d=1.07)2.33ml
(2.50g,31mmol)を加え、0℃で1時間反
応させた後室温まで昇温し、一晩反応を行った。飽和重
曹水溶液に反応マスをあけ分液し、水層を3回エーテル
で抽出し、有機層をぼう硝で乾燥した。乾燥剤を濾過し
たのち濾液を濃縮した。濃縮物にCaH2 を添加して蒸
留を行い定量的に沸点88℃/2.5mmHgのメトキ
シメチルベンジルスルフィドを得た。
Reference Example 2 Synthesis of Phenyl (methoxymethylthio) methyltrimethylsilane 30 ml of ether and benzyl mercaptan (d = 1.058) were placed in a 100 ml two-necked flask equipped with a septum cap and charged with a magnetic rotor and purged with nitrogen. 52 ml
(3.72 g, 30 mmol) was added. After the reaction solution was cooled to -78 ° C, butyllithium hexane solution 19.4
ml (1.6 M, 31 mmol) was added slowly.
After the addition was completed, the mixture was stirred for 1 hour at the same temperature, then warmed to room temperature and stirred for 2 hours. The reaction solution was cooled to 0 ° C. and chloromethyl methyl ether (d = 1.07) 2.33 ml
(2.50 g, 31 mmol) was added, the mixture was reacted at 0 ° C. for 1 hour, then warmed to room temperature, and reacted overnight. The reaction mass was poured into a saturated aqueous solution of sodium hydrogen carbonate and the layers were separated. The aqueous layer was extracted 3 times with ether, and the organic layer was dried with sodium sulfate. After filtering the drying agent, the filtrate was concentrated. CaH 2 was added to the concentrate and distilled to quantitatively obtain methoxymethylbenzyl sulfide having a boiling point of 88 ° C./2.5 mmHg.

【0047】メトキシメチルベンジルスルフィドの分析
1 HNMR(60MHz,TMS/CDCl3 ) δ:3.33(s.3H),3.73(s,2H),
4.48(s,2H)7.28(s,5H).
Analysis value of methoxymethylbenzyl sulfide 1 HNMR (60 MHz, TMS / CDCl 3 ) δ: 3.33 (s.3H), 3.73 (s, 2H),
4.48 (s, 2H) 7.28 (s, 5H).

【0048】このようにして得られたメトキシメチルベ
ンジルスルフィド4.76g(30mmol)、ヘキサ
ン125mlおよびTMEDA(テトラメチルエチレン
ジアミン)(d=0.77)4.82ml(32mmo
l)を磁気回転子をいれ窒素置換を行ったセプタムキャ
ップ付きの2口フラスコに仕込んだ。これを−10℃に
冷却後ブチルリチウムヘキサン溶液20.6ml(1.
6M,33mmol)をゆっくり加えた。加え終わった
後、3時間同温度で攪拌した。磁気回転子をいれ窒素置
換を行ったセプタムキャップ付きの別の2口フラスコに
ヘキサン20mlとクロロトリメチルシラン(d=0.
858)4.4ml(35mmol)を入れた。−10
℃に冷却し先に調製した溶液をこの中に滴下した。 −
10℃で一晩反応を行った後、水にあけエーテル抽出し
ぼう硝で乾燥した。乾燥剤を濾別し、濾液を濃縮して得
られたオイルに水素化カルシウムを加えて蒸留し沸点1
20℃/0.08mmHgのフェニル(メトキシメチル
チオ)メチルトリメチルシランを収量5.81g、(2
5mmol)収率83%で得た。
4.76 g (30 mmol) of methoxymethylbenzyl sulfide thus obtained, 125 ml of hexane and 4.82 ml (32 mmo) of TMEDA (tetramethylethylenediamine) (d = 0.77).
l) was placed in a two-necked flask equipped with a septum cap, which was charged with a magnetic rotor and purged with nitrogen. After cooling this to -10 ° C, 20.6 ml of butyllithium hexane solution (1.
6M, 33 mmol) was added slowly. After the addition was completed, the mixture was stirred for 3 hours at the same temperature. 20 ml of hexane and chlorotrimethylsilane (d = 0.
858) 4.4 ml (35 mmol) was added. -10
The solution was cooled to 0 ° C. and the solution prepared above was added dropwise thereto. −
After reacting overnight at 10 ° C., the mixture was poured into water, extracted with ether, and dried with sodium sulfate. The desiccant is filtered off, the filtrate is concentrated and calcium hydride is added to the oil obtained and distilled to give a boiling point of 1
The yield of phenyl (methoxymethylthio) methyltrimethylsilane at 20 ° C./0.08 mmHg was 5.81 g, (2
5 mmol) was obtained with a yield of 83%.

【0049】フェニル(メトキシメチルチオ)メチルト
リメチルシランの分析値1 HNMR(60MHz,CH2 Cl2 /CCl4 ) δ:0.15(s.9H),3.32(s,3H),
3.45(s,1H),4.28(d,J=11Hz,
1H),4.58(d,J=11Hz,1H),7.3
0(s,5H).
Analysis value of phenyl (methoxymethylthio) methyltrimethylsilane 1 HNMR (60 MHz, CH 2 Cl 2 / CCl 4 ) δ: 0.15 (s.9H), 3.32 (s, 3H),
3.45 (s, 1H), 4.28 (d, J = 11 Hz,
1H), 4.58 (d, J = 11 Hz, 1H), 7.3
0 (s, 5H).

【0050】参考例3 トリメチルシリルメチルα -トリメチルシリルオキシプ
ロピルスルフィドの合成 トリメチルシリルメチルチオトリメチルシラン5.76
g(30mmol)とプロピオンアルデヒド(d=0.
804)2.0ml(1.6g,28mmol)とを窒
素置換したフラスコに仕込んだ。窒素気流下、KCNと
18−Crown−6の混合物12mg(0.036m
mol)をこれに加えて攪拌した。この間氷水で反応マ
スを冷却しつつ5.5時間攪拌した。これを減圧蒸留し
て沸点65−67℃/1mmHgの留分を集めた。収量
5.19g,収率74%でトリメチルシリルメチルα -
トリメチルシリルオキシプロピルスルフィドを得た。
Reference Example 3 Synthesis of trimethylsilylmethyl α-trimethylsilyloxypropyl sulfide 5.76 Trimethylsilylmethylthiotrimethylsilane
g (30 mmol) and propionaldehyde (d = 0.
804) 2.0 ml (1.6 g, 28 mmol) was charged into a flask whose atmosphere was replaced with nitrogen. 12 mg (0.036 m) of a mixture of KCN and 18-crown-6 under a nitrogen stream.
(mol) was added to this and stirred. During this, the reaction mass was cooled with ice water and stirred for 5.5 hours. This was distilled under reduced pressure to collect a fraction having a boiling point of 65 to 67 ° C./1 mmHg. Trimethylsilylmethyl α − with a yield of 5.19 g and a yield of 74%
Trimethylsilyloxypropyl sulfide was obtained.

【0051】トリメチルシリルメチルα -トリメチルシ
リルオキシプロピルスルフィドの分析値1 HNMR(60MHz,CHCl3 /CCl4 ) δ:0.13(s.9H),0.16(s,9H),
0.94(t,J=7.0Hz,3H),1.73
(s,2H),1.50−2.06(m,2H),4.
58(t,J=6.0Hz,1H). EIマススペクトル m/e(%relative intensity)250(0.
4),192(3.2),177(4.6),131(58.4),115(3.6),73(100),59
(7.8).
Analysis value of trimethylsilylmethyl α-trimethylsilyloxypropyl sulfide 1 HNMR (60 MHz, CHCl 3 / CCl 4 ) δ: 0.13 (s.9H), 0.16 (s, 9H),
0.94 (t, J = 7.0 Hz, 3H), 1.73
(S, 2H), 1.50-2.06 (m, 2H), 4.
58 (t, J = 6.0 Hz, 1H). EI mass spectrum m / e (% relative intensity) 250 (0.
4), 192 (3.2), 177 (4.6), 131 (58.4), 115 (3.6), 73 (100), 59
(7.8).

【0052】参考例4 α- トリメチルシリルベンジルα'-トリメチルシリルオ
キシベンジルスルフィドの合成 フェニル(トリメチルシリルチオ) メチルトリメチルシ
ラン2.58g(9.6mmol)とベンズアルデヒド
(d=1.05)0.88ml(924mg ,8.7mmo
l)とを窒素置換したフラスコに仕込んだ。窒素気流下
KCNと18−Crown−6の混合物を触媒量加えて
室温で8時間攪拌した。これを減圧蒸留して136−1
41℃/0.8mmHgの留分を集め、収量2.35g
(6.3mmol)、収率72%でα- トリメチルシリ
ルベンジルα'-トリメチルシリルオキシベンジルスルフ
ィドを得た。
Reference Example 4 Synthesis of α-trimethylsilylbenzyl α′-trimethylsilyloxybenzyl sulfide Phenyl (trimethylsilylthio) methyl trimethylsilane 2.58 g (9.6 mmol) and benzaldehyde (d = 1.05) 0.88 ml (924 mg, 8.7 mmo
1) and were charged in a flask in which nitrogen was replaced. A catalytic amount of a mixture of KCN and 18-Crown-6 was added under a nitrogen stream, and the mixture was stirred at room temperature for 8 hours. This is distilled under reduced pressure to 136-1
The fraction of 41 ° C / 0.8mmHg was collected, and the yield was 2.35g.
(6.3 mmol) with a yield of 72%, α-trimethylsilylbenzyl α′-trimethylsilyloxybenzyl sulfide was obtained.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 一般式 化1 (式中、R1 、R2 は水素、低級アルキル基もしくはフ
ェニル基を表し、R3 は低級アルコキシアルキル基、低
級アルキル基もしくはトリメチルシリル基を表す。)で
表されるアルコキシメチルチオメチルシラン。
1. A general formula 1 (Wherein R 1 and R 2 represent hydrogen, a lower alkyl group or a phenyl group, and R 3 represents a lower alkoxyalkyl group, a lower alkyl group or a trimethylsilyl group).
【請求項2】一般式 化1 (式中、R1 、R2 、R3 は前記とおなじ。)で表され
るアルコキシメチルチオメチルシランを一般式 化2 R4 −CHO (式中、R4 は低級アルキル基、低級アラルキル基、低
級シクロアルキル基あるいはフェニル基、低級アルキル
基、ハロゲン、低級アルコキシ基で置換されていてもよ
いフェニル基を表す。)で表されるアルデヒド類とフッ
素イオンの存在下に反応させ一般式 化3 (式中、R1 、R2 は水素、低級アルキル基もしくはフ
ェニル基を表し、R3 は低級アルコキシアルキル基、低
級アルキル基もしくはトリメチルシリル基を表し、R4
は低級アルキル基、低級アラルキル基、低級シクロアル
キル基あるいはフェニル基、低級アルキル基、ハロゲ
ン、低級アルコキシ基で置換されていてもよいフェニル
基を表す。)で表されるアルコール化合物を得、ついで
これを酸で処理して閉環することを特徴とする一般式
化4 (式中、R1 、R2 およびR4 は前記とおなじ。)で示
される1,3−オキサチオラン類の製造方法。
2. A general formula 1 (In the formula, R 1 , R 2 , and R 3 are the same as above.) The alkoxymethylthiomethylsilane represented by the general formula 2 R 4 —CHO (wherein R 4 is a lower alkyl group, a lower aralkyl group, A lower cycloalkyl group or a phenyl group, a lower alkyl group, a halogen, or a phenyl group which may be substituted with a lower alkoxy group.) In the presence of a fluorine ion. (In the formula, R 1 and R 2 represent hydrogen, a lower alkyl group or a phenyl group, R 3 represents a lower alkoxyalkyl group, a lower alkyl group or a trimethylsilyl group, and R 4
Represents a lower alkyl group, a lower aralkyl group, a lower cycloalkyl group, a phenyl group, a lower alkyl group, a halogen, or a phenyl group which may be substituted with a lower alkoxy group. ) To obtain an alcohol compound, which is then treated with an acid for ring closure.
Conversion 4 (In the formula, R 1 , R 2 and R 4 are the same as above.) A method for producing 1,3-oxathiolanes.
【請求項3】一般式 化1 (式中、R1 、R2 は水素、低級アルキル基もしくはフ
ェニル基を表し、R3 は低級アルコキシアルキル基、低
級アルキル基もしくはトリメチルシリル基を表す。)で
表されるアルコキシメチルチオメチルシランを一般式
化5 (式中、R5 、R6 およびR7 は水素、低級アルキル
基、フェニル基を表す。)で表されるシリルエノールエ
ーテル類とルイス酸の存在下に反応させ一般式化6 (式中、R1 、R2 、R5 、R6 およびR7 は水素、低
級アルキル基もしくはフェニル基を表す。)で表される
カルボニル化合物を得、ついでこれをフッ素イオンの存
在下に閉環反応させることを特徴とする一般式 化7 (式中、R1 、R2 、R5 、R6 およびR7 は前記と同
じ。)で示されるチオラン類の製造方法。
3. A general formula 1 (Wherein R 1 and R 2 represent hydrogen, a lower alkyl group or a phenyl group, and R 3 represents a lower alkoxyalkyl group, a lower alkyl group or a trimethylsilyl group).
Conversion 5 (In the formula, R 5 , R 6 and R 7 represent hydrogen, a lower alkyl group or a phenyl group.) The silyl enol ether represented by the general formula 6 (In the formula, R 1 , R 2 , R 5 , R 6 and R 7 represent hydrogen, a lower alkyl group or a phenyl group.), Which is then subjected to ring closure in the presence of a fluorine ion. General formula 7 characterized by reacting (In the formula, R 1 , R 2 , R 5 , R 6 and R 7 are the same as the above.) A method for producing a thiolane compound.
JP23696792A 1992-09-04 1992-09-04 Alkoxymethylthiomethylsilane and production of thiolane compound using the same compound Pending JPH0680662A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
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Publication Number Publication Date
JPH0680662A true JPH0680662A (en) 1994-03-22

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Country Link
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016159374A1 (en) * 2015-04-02 2016-10-06 株式会社ボナック Method for producing glycoside compounds

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016159374A1 (en) * 2015-04-02 2016-10-06 株式会社ボナック Method for producing glycoside compounds
JPWO2016159374A1 (en) * 2015-04-02 2017-11-16 株式会社ボナック Method for producing glycoside compound
EP3301103A4 (en) * 2015-04-02 2019-01-23 Bonac Corporation Method for producing glycoside compounds
US10377788B2 (en) 2015-04-02 2019-08-13 Bonac Corporation Method for producing glycoside compounds

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