JPH06789Y2 - 電子計数装置 - Google Patents
電子計数装置Info
- Publication number
- JPH06789Y2 JPH06789Y2 JP1987147298U JP14729887U JPH06789Y2 JP H06789 Y2 JPH06789 Y2 JP H06789Y2 JP 1987147298 U JP1987147298 U JP 1987147298U JP 14729887 U JP14729887 U JP 14729887U JP H06789 Y2 JPH06789 Y2 JP H06789Y2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- gas
- flow rate
- electron
- dry gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987147298U JPH06789Y2 (ja) | 1987-09-25 | 1987-09-25 | 電子計数装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987147298U JPH06789Y2 (ja) | 1987-09-25 | 1987-09-25 | 電子計数装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6451886U JPS6451886U (enExample) | 1989-03-30 |
| JPH06789Y2 true JPH06789Y2 (ja) | 1994-01-05 |
Family
ID=31417566
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987147298U Expired - Lifetime JPH06789Y2 (ja) | 1987-09-25 | 1987-09-25 | 電子計数装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06789Y2 (enExample) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0542377Y2 (enExample) * | 1986-11-25 | 1993-10-26 |
-
1987
- 1987-09-25 JP JP1987147298U patent/JPH06789Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6451886U (enExample) | 1989-03-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102117728B (zh) | 一种源内碰撞诱导解离的质谱vuv光电离源装置 | |
| Dunning et al. | Secondary electron ejection from metal surfaces by metastable atoms. I. Measurement of secondary emission coefficients using a crossed beam method | |
| CN105675710B (zh) | 电离室及光离子化传感器 | |
| US2884538A (en) | Radio-active gaseous gauging source | |
| JPH06789Y2 (ja) | 電子計数装置 | |
| CN111024803B (zh) | 一种可调节的光离子化传感器 | |
| CN111505700A (zh) | 一种电子加速器束流强度实时监测装置 | |
| CN116699247A (zh) | 一种介质材料稳态x射线辐射感应电导率测试仪 | |
| CN110596232A (zh) | 一种有智能启停功能的光离子化检测装置及其检测方法 | |
| CN106569161B (zh) | 一种空间电荷密度测量仪器的校准装置 | |
| US5508526A (en) | Dual entrance window ion chamber for measuring X-ray exposure | |
| US20060138353A1 (en) | Ion-implanting apparatus, ion-implanting method, and device manufactured thereby | |
| JPH0524234Y2 (enExample) | ||
| CN115793014A (zh) | 一种带内标定功能的叠层电离室设备 | |
| CN221404507U (zh) | 一种可测量真空紫外灯光强空间分布的装置 | |
| KR101051148B1 (ko) | 한 쌍의 전리함을 이용한 엑스선 측정기 | |
| JPH0754131A (ja) | 薄膜形成装置 | |
| JPH0338669Y2 (enExample) | ||
| DE808892C (de) | Elektrisches Messgeraet zur Messung von Hochvakuum | |
| SU527640A1 (ru) | Анализатор длины волокон в суспензии | |
| CN114779311B (zh) | 一种防溅射法拉第筒及其制备方法 | |
| TWI875112B (zh) | 一種終點檢測裝置及離子束刻蝕系統 | |
| JP4216375B2 (ja) | 二次電子増倍素子を使用した測定方法及び二次電子増倍素子を使用した装置 | |
| JPH0526549Y2 (enExample) | ||
| JPH03141546A (ja) | エレクトロンを測定する装置と方法 |