JPH0671544A - Grinding abrasive method - Google Patents

Grinding abrasive method

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Publication number
JPH0671544A
JPH0671544A JP25064492A JP25064492A JPH0671544A JP H0671544 A JPH0671544 A JP H0671544A JP 25064492 A JP25064492 A JP 25064492A JP 25064492 A JP25064492 A JP 25064492A JP H0671544 A JPH0671544 A JP H0671544A
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Prior art keywords
grinding
polishing
wheel
abrasive
grindstone
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JP25064492A
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Japanese (ja)
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Manabu Tomitani
学 富谷
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Olympus Optical Co Ltd
オリンパス光学工業株式会社
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Abstract

PURPOSE:To provide a grinding abrasive method in which a working--capacity of the grinding wheel is not lowered at all even if a lot of workpieces are ground in succession. CONSTITUTION:An oxidizing aqueous working fluid 2 is poured on a grinding abrasive wheel 1 made up of using organic high molecular matter as a bonding material, and then grinding and polishing are carried out as grinding this grinding abrasive wheel 1 and a work part 3 jointly. This working fluid 2 consisting of an oxidizing aqueous solution oxidizes a bonding agent of this abrasive wheel 1, having its bonding force lowered. The bonding agent lowered in this bonding force falls off together with abrasive grains in a state of being dulled and clogged, produced on a surface of the abrasive wheel 1. With this constitution, this wheel 1 is subjected to dressing, maintaining its working capacity.

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【産業上の利用分野】本発明は、セラミック,ガラス等を研削研磨加工する研削研磨方法に関する。 The present invention relates to a ceramic, Grinding polishing method for grinding polished glass.

【0002】 [0002]

【従来の技術】セラミック,ガラス等を精密研削研磨加工する砥石としては、有機高分子物質を結合材としたレジノイド砥石やゴム砥石があり、従来、これらの砥石を用いて研削研磨を行なう際には、加工液に水が用いられていた。 BACKGROUND ART Ceramic, as the grindstone for precision grinding polished glass or the like, there is a resinoid grinding stone and rubber grindstone and the organic polymer material binder, conventionally, when performing the grinding and polishing using these grindstone the water has been used in the machining fluid. 特公昭60−13793号公報には、酸化ジルコニウム、酸化セリウム又はべん柄の少なくとも1種からなるガラス鏡面仕上げ用研磨材を含有した多孔質飽和ポリエステル樹脂より成る成形体の単一もしくは複数個を相互に間隔をもたせてそれらの一端部を皿体面に固着してなる研磨皿を使用し、水又は切削油を注ぎながらガラス面を研磨するガラス研磨方法が開示されている。 The Japanese Patent Publication No. Sho 60-13793, zirconium oxide, cross a single or a plurality of molded bodies consisting of porous saturated polyester resin containing glass mirror finish polishing material comprising at least one of cerium oxide or iron oxide red glass polishing method of polishing a glass surface is disclosed using a polisher made by fixing the dish body surface thereof at one end by remembering intervals while pouring water or cutting oil.

【0003】 [0003]

【発明が解決しようとする課題】上記従来の研磨方法で光学ガラスの研磨加工を行なったところ、砥粒の先端が過度に摩減、平坦化する目つぶれや、砥石の表面に被加工物の切り屑が付着し排出できなくなる目詰まりの現象が生じた。 Was subjected to a polishing process of the optical glass in the conventional polishing method [0006], the abrasive grains of the tip is too erodibility, eye collapses or flattening, of the workpiece to the surface of the grindstone phenomenon of clogging the chips can not be discharged adhesion occurs. この目つぶれや目詰まりの現象が生じると加工能力が低下する。 And the phenomenon of the eye collapsed and clogged processing capacity is reduced. そのため、多数個の光学ガラスを連続して研磨加工した際、図3の破線で示すように、累積加工数が増加するのに従って、被加工物の減磨耗(研磨量)が減少する加工能力の低下が生じた。 Therefore, when the polishing continuously a large number of optical glass, as indicated by the broken line in FIG. 3, as the cumulative processing number is increased, the processing ability of reducing abrasion of a workpiece (amount of polishing) is reduced decline has occurred. 本発明は、上記従来技術の問題点に鑑みなされたもので、多数個の被加工物に対して連続して研削研磨加工を行なっても加工能力が低下せず、安定した加工能力を維持することができる研削研磨方法を提供することを目的とする。 The present invention has been made in view of the above-mentioned problems of the prior art, continuously be subjected to grinding and polishing processing does not decrease the processing capacity for a large number of workpieces, to maintain stable processing capacity and to provide a grinding and polishing method capable.

【0004】 [0004]

【課題を解決するための手段】上記目的を達成するために、本発明の研削研磨方法は、図1の概念図で示すように、有機高分子物質を結合材とした研削研磨砥石1に酸化性水溶液からなる加工液2を掛けつつ、研削研磨砥石1と被研削研磨材3とをする合わせて被研削研磨材3を加工することとした。 To achieve the above object, according to the Invention The grinding polishing method of the present invention, as shown in the conceptual diagram of FIG. 1, oxide grinding grindstone 1 in which the organic polymeric material binder while applying a working fluid 2 consisting sexual aqueous solution, it was decided to process the object to be ground and polished material 3 combined to the grinding grindstone 1 and the grinding abrasive 3.

【0005】 [0005]

【作用】上記構成によれば、研削研磨加工の際に、有機高分子物質を結合材とする研削研磨砥石1と被研削研磨材3をすり合わせる研削研磨砥石1のすり合わせ面1a According to the above configuration, when the grinding and polishing process, ground glass surface 1a of the grinding grindstone 1 to align worn grinding grindstone 1 and the grinding and polishing material 3 to the organic polymeric material binder
に酸化性水溶液からなる加工液2を掛けると、研削研磨砥石1の結合剤が酸化されて結合力が低下する。 Multiplying machining liquid 2 made of an oxidizing aqueous solution, bonding force binding agent of the grinding grindstone 1 is oxidized drops. 結合力の低下した結合剤は、その表面が研削研磨加工中に崩れ落ち、ドレッシングされる。 Reduced binding agent binding force, the surface collapsed during grinding polishing are dressed. このドレッシング作用により、研削研磨砥石1の表面の目つぶれや目詰まりを起こした砥粒が、結合剤の結合力の低下と共に脱落し、新しい研削研磨面が表れ自生される。 This dressing action, abrasive grains caused the eyes collapsed and clogging of the surface of the grinding grindstone 1, fall off with reduced binding strength of the binder, a new grinding and polishing surface is autogenous appear. そして、このドレッシング作用は、加工液2が供給されている間、常に行なわれる。 Then, the dressing action, while the working fluid 2 is supplied is always performed.

【0006】上記加工液2である酸化性水溶液は、相手に酸素を与える能力を有する液体で、化学で一般に酸化剤と呼ばれる物質を水で溶解した水溶液である。 [0006] aqueous oxidizing solution is the working fluid 2 is a liquid having the capacity to provide oxygen to the other, it is a substance commonly referred to as the oxidizing agent in the chemical an aqueous solution obtained by dissolving in water. この酸化性水溶液は、酸素原子を放出する能力を有し、放出された酸素原子は、他の物質と非常に反応し易いため、結合剤である有機高分子物質と酸化性水溶液とが接触すると、有機高分子物質に酸化反応が生じる。 The oxidizing aqueous solution, have the ability to release oxygen atom, released oxygen atom, liable to highly reactive with other substances, the organic polymer material is a binder and the oxidizing solution is in contact , the oxidation reaction occurs in the organic polymeric material. この酸化反応は、有機高分子物質の炭素原子や水素原子と酸素原子とが反応して生じる化学反応で、炭素原子との反応ではC The oxidation reaction is a chemical reaction with the carbon atoms and hydrogen atoms and oxygen atoms of the organic polymeric material is produced by the reaction, C is the reaction of the carbon atom
=O結合を生じ、水素原子との反応ではH−O−H結合を生じる。 = Occur O bond, resulting in H-O-H bond in the reaction with hydrogen atoms. 有機高分子内の炭素原子は、長い炭素鎖でつながれており、有機高分子の重合によって硬化している物質は、この炭素鎖が複雑に絡み合って硬質を保っている。 Carbon atoms in the organic polymer are connected by a long carbon chain, the material that is cured by polymerization of the organic polymer, the carbon chain is kept rigid intricately intertwined. しかし、酸化反応により長い炭素鎖中の炭素とが反応して、炭素鎖が短く切断されると、複雑に絡み合った炭素鎖が解かれ、炭素鎖によって硬度を保っていた有機高分子物質も結合力が低下し、硬度が弱まる。 However, by the reaction with carbon in the long carbon chain by oxidation, the carbon chain is cut short, it unwound complex intertwined carbon chain, also organic polymer material was keeping hardness by carbon chain bond force is reduced, the hardness is weakened.

【0007】 [0007]

【実施例1】図2は、本発明の実施例1を示す正面図で、被研磨物である光学ガラス(φ20×t6)4を保持治具5で保持して、図示を省略した研磨機に取り付けた貼付け治具6に固定した研磨用レジンボンド(φ34 First Embodiment FIG 2 is a front view showing a first embodiment of the present invention, and held by the holding jig 5 optical glass (φ20 × t6) 4 to be polished, polishing machine which is not shown abrasive resin bond fixed on the joining jig 6 attached to (Fai34
×t10)7に当接し、レジンボンド砥石7の表面(光学ガラス4とのすり合わせ面)に加工液8を掛けつつ、 × t10) 7 abuts on, while applying a working fluid 8 on the surface of the resin bond grinding stone 7 (ground glass surface of the optical glass 4),
レジンボンド砥石7を回転するとともに光学ガラス4をレジンボンド砥石7の回転軸に対し垂直に揺動してすり合わせながら、以下の加工条件で研磨加工を行なった。 While ground glass swung vertically optical glass 4 with respect to the axis of rotation of resin bonded grinding stone 7 with rotating the resin bond grinding stone 7, the polishing was performed processing under the following processing conditions.
この時、加工液8は、加工中から加工終了後も常に掛け続けた。 At this time, the working fluid 8, continued over always even after the end of processing from during processing.

【0008】被研磨物:光学ガラスBK7 研磨砥石:フェノール樹脂を結合剤とし酸化セリウム系研磨材よりまるレジンボンド砥石 樹脂:研磨材=40:60(体積比),研磨材の粒径1 [0008] object to be polished: optical glass BK7 grindstone: phenolic resin and a binder and cerium oxide-based abrasive than full resin bond grinding stone resin: abrasive = 40: 60 (volume ratio), the particle size of the abrasive 1
μm 加工径 :過酸化水素水(H 22 )20%水溶液、供給量1リットル/分、液温25℃ 研磨機 :オスカータイプ、垂直荷重2Kgf,下軸回転数500rpm 研磨時間:3分間 研磨数 :100個 μm processing diameter: hydrogen peroxide (H 2 O 2) 20% aqueous feed rate 1 liter / min, liquid temperature 25 ° C. polisher: Oscar type, vertical load 2 Kgf, lower shaft rotational speed 500rpm Polishing time: Polishing 3 minutes number: 100

【0009】本実施例の研磨方法により光学ガラス10 [0009] Optical glass 10 by the polishing method of this embodiment
0個を加工した結果の累積加工数と1個当たりの被研磨物の減磨量の関係を図3のグラフに示す。 The relationship GenMigakuryou zero or cumulative processing number of the processed result and an object to be polished per shown in the graph of FIG. 比較例として、加工液8以外は同じ加工条件で、加工液に水道水を用いて研磨加工を行なった結果を破線で併記する。 As a comparative example, except the processing fluid 8 in the same working conditions, also shows the result of performing polishing using tap water machining fluid by broken lines. 減磨量の測定にはマイクロメータを用いた。 Using a micrometer to measure the GenMigakuryou. 図3によれば、 According to FIG. 3,
比較例では、累積加工数が5個を超えた時点から被研磨物の減磨量が減少し、累積加工数が20個以上では初期の減磨量の5分の2に減少する加工能力の低下が見られたが、本実施例の研磨方法では累積加工数が増加しても被研磨物の減磨量は全く減少せず、加工能力の低下は生じなかった。 In the comparative example, the cumulative processing number is reduced GenMigakuryou the workpiece from the time when five were exceeded, the cumulative processing number is 20 or more is the processing capacity reduced to two-fifths of the initial GenMigakuryou While reduction is observed, GenMigakuryou of the object to be polished even increased the cumulative processing number in the polishing method of this embodiment is not at all reduced, it did not occur reduction in processing capacity.

【0010】また、本実施例の研磨方法により加工した光学ガラスの表面を20倍の倍率の光学顕微鏡を用いて目視で検査したが、加工した100個の全数にキズは認められなかった。 Further, although the surface of the optical glass which is processed by the polishing method of this example was visually inspected with an optical microscope of 20 times magnification, scratches were observed on the 100 total number of working. さらに、本実施例では、加工液として過酸化水素水を用いたため、分解しても水と酸素になり環境に悪影響を与えることがない。 Further, in this embodiment, since using hydrogen peroxide as the working fluid, it is not adversely affected to be decomposed into water and oxygen environment.

【0011】なお、研磨砥石及び被加工物の大きさや、 [0011] Incidentally, and size of the abrasive grinding wheel and the workpiece,
研磨機の垂直荷重、下軸回転数の条件により研磨砥石表面に生じる目詰まりや目つぶれの生成速度が異なるため、それらに応じて加工液の供給量や濃度を適宜変化させてもよい。 Since the vertical load of the polishing machine, the production rate of the crushed clogging or eyes occurs grindstone surface by the conditions of the lower shaft rotational speed different, the supply amount and concentration of the working fluid may be appropriately changed accordingly. 本実施例では、フェノール樹脂を結合剤としたレジンボンド砥石を用いた場合を説明したが、他にもポリイミド樹脂、ポリエステル樹脂、エポキシ樹脂を結合剤としたレジンボンド砥石、あるいはポリアクリルゴム、ウレタンゴム、多硫化ゴム、スチレンゴムを結合材としたラバーボンド砥石を用いて実施することができ、これらの砥石を用いた場合にあっても本実施例と同様の効果を奏することが確認された。 In this embodiment, a case has been described using a resin bonded grinding wheel in which the phenolic resin and a binder, other polyimide resins, polyester resins, resin-bonded grinding stone was an epoxy resin binder or polyacrylic rubber, urethane rubber, polysulfide rubber, it can be performed using rubber-bonded grindstone and the styrene rubber binder, is possible to achieve the same effect as in this embodiment was confirmed even when using these grinding wheel .

【0012】さらに、加工液である酸化性水溶液としては、過酸化水素水の他に、過マンガン酸ナトリウム、クロム酸カリウム、ニクロム酸カリウム、ペルオクソ酸化ナトリウム、ペルオクソ硫酸、ペルオクソ硝酸、塩素酸、臭素酸、ヨウ素酸を用いて実施でき、これらの酸化性水溶液を用いた場合にあっても本実施例と同様な作用、効果が得られた。 Furthermore, as the oxidizing aqueous solution as a processing solution, in addition to hydrogen peroxide, sodium permanganate, potassium chromate, potassium dichromate, peroxo sodium oxide, peroxo sulfuric acid, peroxo acid, chlorine acid, bromine acid, can be carried out using a periodate, similar effects as the present embodiment even when using these aqueous oxidizing solution, the effect was obtained. 但し、過マンガン酸ナトリウム、 However, sodium permanganate,
ニクロム酸カリウム、ヨウ素酸は重金属を含むため、廃液の際に重金属用の処理をして廃液する必要がある。 Since potassium dichromate, the iodate containing heavy metals, it is necessary to waste by the process for heavy metals in the waste.

【0013】また、被研磨物にセラミックを用いた場合にあっても、本実施例と同様な作用、効果が得られた。 Further, even in case of using the ceramic object to be polished, the same effect as the present embodiment, the effect was obtained.
本実施例と同じ加工条件でセラミックを研磨したところ、光学ガラスを研磨した時に比べて単位時間当たりの被加工物の減磨重が5分の1に減少したものの、100 It was polished ceramic under the same processing conditions as the embodiment, although the reduction MigakuShigeru workpieces per unit time than when polishing the optical glass is reduced to one-fifth, 100
個加工しても累積被加工物の減磨量は減少することがなかった。 GenMigakuryou cumulative workpiece be pieces processed did not decrease.

【0014】さらに、本実施例の研磨方法で研削砥石を用いて研削加工したところ、被加工物の減磨量が全く減少せず、本実施例と同様な作用、効果が得られた。 [0014] Further the grinding using a grinding wheel in the polishing method of this embodiment, GenMigakuryou not at all decrease of the workpiece, the same effect as the present embodiment, the effect was obtained. そのときの加工条件を以下に示す。 It shows the processing conditions of the time below. 但し、本実施例と同一の部分は省略する。 However, the same parts as the embodiment will be omitted. 研削砥石:ポリイミド樹脂とダイヤモンド砥粒によりなるレジンボンド砥粒、 集中度100、粒度♯800 研磨機 :オスカータイプ、垂直荷重4Kgf、下軸回転数650rpm 研削数 :200個 Grinding wheel: polyimide resin and diamond abrasive grains by comprising resin bonded abrasives, the degree of concentration 100, particle size ♯800 polishing machine: Oscar type, vertical load 4 kgf, the lower shaft speed 650rpm grinding stars 200

【0015】 [0015]

【実施例2】本実施例の研磨方法は、酸化性の水溶液を砥石に掛ける時間を減らし、ドレッシングによる砥石の減耗を抑えることで、上記実施例1の効果に経済的な効果を付加したもので、加工液に酸化性水溶液と水の2種類を用い、各々を交互に掛けることで酸化性水溶液の砥石に供給する時間と量を必要最小限にして研磨加工を行なった。 The polishing method of Example 2] This example reduces the time taken to oxidizing aqueous solution grindstone, by suppressing the depletion of the grinding wheel by the dressing, obtained by adding an economic effect on the effects of the Example 1 in, using two types of aqueous oxidizing solution and water working fluid was subjected to grinding in the minimum necessary time and amount of supplying the grindstone oxidizing solution by multiplying each alternately. 図4は、本発明の実施例2を示す正面図で、被研磨物である研磨面が凹形状の光学ガラス(φ7×t Figure 4 is a front view showing a second embodiment of the present invention, the object to be polished at a polishing surface concave optical glass (.phi.7 × t
1.1×R25)10を保持治具11で保持して、図示を省略した研磨機に取り付けた貼付け治具12に固定した研磨用ラバーボンド砥石(φ11×R25)13とすり合わせ、ラバーボンド砥石13の表面に加工液14を掛けつつ、ラバーボンド砥石13を回転するとともに光学ガラス10をラバーボンド砥石12の回転軸に対し垂直に揺動させ、35秒の加工時間で研磨加工を行なった。 The 1.1 × R25) 10 and held by the holding jig 11, the polishing rubber bonded wheel which is fixed to the joining jig 12 attached to a polishing machine which is not shown (φ11 × R25) 13 and ground glass, rubber bonded wheel while on 13 the surface of multiplying the working fluid 14, is swung vertically optical glass 10 with respect to the axis of rotation of the rubber bonded wheel 12 while rotating the rubber bonded wheel 13, it was subjected to polishing with a 35 seconds processing time. 加工液14には、酸化性水溶液14aと水14bとの2種類を用い、35秒の研磨時間のうち、最初の10 The working fluid 14, using two kinds of the oxidizing solution 14a and water 14b, of the 35 seconds of polishing time, the first 10
秒間だけ酸化性水溶液14aを掛け、その以外の時間は水14bを掛けた。 Only over the aqueous oxidizing solution 14a seconds, the time other than the hung water 14b. そして、この35秒間の研磨加工を繰り返し行い、2種類の加工液14をラバーボンド砥石13の表面に交互に掛けながら研磨加工を行なった。 Then repeats the polishing of the 35 seconds, was performed polished while applying alternately two kinds of working fluid 14 to the surface of the rubber bonded wheel 13.

【0016】本実施例の研磨加工の加工条件を以下に示す。 [0016] The processing conditions for polishing of this example are shown below. 被研磨物:光学ガラスSK11 研磨砥石:多硫化ゴムを結合材とし酸化ジルコニウム系研磨材よりなるラバーボンド砥石 樹脂:研磨材=40:60(体積比)研磨材粒径1μm 加工液 :ペルオクソ炭酸ナトリウム(N a23 Workpiece: optical glass SK11 grindstone: polysulfide rubber and a binder consisting of zirconium oxide-based abrasive rubber bonded wheel resin: abrasive = 40: 60 (volume ratio) abrasive particle size 1μm working solution: peroxo sodium carbonate (N a C 2 O 3)
10%水溶液及び水、供給量0.5リットル/分、液温25℃ 研磨材 :オスカータイプ、垂直荷重2Kgf、下軸回転数500rpm 研磨時間:35秒 研磨数 :100個 本実施例の研磨方法により、光学ガラス10を100個加工した後、砥石13の減耗量をマイクロメータで測定したところ、砥石13の減耗量は29μmであった。 10% solution and water, supply of 0.5 liters / minute, liquid temperature 25 ° C. Abrasive: Oscar type, vertical load 2 Kgf, lower shaft rotational speed 500rpm Polishing time: 35 seconds polishing stars 100 polishing method of the present embodiment Accordingly, after the optical glass 10 and 100 processing, the measured depletion of the grindstone 13 in micrometers, depletion of the grinding wheel 13 was 29 .mu.m. 同じ加工条件で加工液14に酸化性水溶液14aのみを用いて研磨加工したところ、砥石13の減耗量は60μm Was polished using only aqueous oxidizing solution 14a in the machining fluid 14 in the same processing conditions, depletion of the grinding wheel 13 is 60μm
であったため、本実施例では砥石13の減耗量を約5割以上も削減でき、経済的な効果をも得ることができた。 Since was, also reduced by about 50% or more depletion of the grindstone 13 in the present embodiment, it could be obtained also an economic effect.
さらに、実施例1と同様に、砥粒の目詰まりや目つぶれによる加工能力の低下は見られなかった。 In the same manner as in Example 1, decrease in the processing capacity due to the abrasive clogging and eyes collapsed was observed. また、本実施例と同様に研削加工を行なったところ、研磨加工と同様な作用、効果を得ることができた。 Furthermore, was conducted in the same manner as in grinding with the present embodiment, it was possible to obtain grinding and similar operations and effects.

【0017】 [0017]

【発明の効果】以上のように、本発明の研削研磨方法にあっては、加工液に酸化性水溶液を用い、有機高分子物質を結合剤とした研削研磨砥石をドレッシングしているため、砥石の目つぶれや目詰まりによる加工能力の低下を解消することができ、多数個を連続して研削、研磨加工しても累積加工数が増加するに従って生じる加工能力の低下が見られなくなり、安定した加工能力を得ることができる。 As is evident from the foregoing description, since In the grinding and polishing method of the present invention, the aqueous oxidizing solution used in the working fluid, and dress the grinding grindstone in which the organic polymeric material and a binder, grinding wheel eyes collapsed and clogging due can eliminate a reduction in processing capacity, grinding plurality of continuous, polished cumulative processing number decrease in processing capacity is not observed to occur with increasing even, stable it is possible to obtain processing capability.

【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS

【図1】本発明の研削研磨方法を概念的に示す斜視図である。 1 is a perspective view conceptually showing a grinding polishing method of the present invention.

【図2】本発明の実施例1を示す正面図である。 It is a front view showing a first embodiment of the present invention; FIG.

【図3】本発明の実施例1と従来技術における加工能力の比較を示すグラフ図である。 3 is a graph showing a comparison of processing capacity in the first embodiment and the prior art of the present invention.

【図4】本発明実施例2を示す正面図である。 4 is a front view showing the present invention in Example 2.

【符号の説明】 DESCRIPTION OF SYMBOLS

1 研削研磨砥石 2 加工液 3 被研削研磨材 4,10 光学ガラス 7 レジンボンド砥石 8 加工液(酸化性水溶液) 13 ラバーボンド砥石 14 加工液 14a 酸化性水溶液 14b 水 1 grinding grindstone 2 machining fluid 3 to be ground abrasive 4,10 optical glass 7 resin bonded grinding wheel 8 working fluid (aqueous oxidizing solution) 13 Rubber bonded wheel 14 working fluid 14a oxidizing solution 14b Water

───────────────────────────────────────────────────── ────────────────────────────────────────────────── ───

【手続補正書】 [Procedure amendment]

【提出日】平成5年9月17日 [Filing date] 1993 September 17,

【手続補正1】 [Amendment 1]

【補正対象書類名】明細書 [Correction target document name] specification

【補正対象項目名】0002 [Correction target item name] 0002

【補正方法】変更 [Correction method] change

【補正内容】 [Correction contents]

【0002】 [0002]

【従来の技術】セラミック,ガラス等を精密研削研磨加工する砥石としては、有機高分子物質を結合材としたレジノイド砥石やゴム砥石があり、従来、これらの砥石を用いて研削研磨を行なう際には、加工液に水が用いられていた。 BACKGROUND ART Ceramic, as the grindstone for precision grinding polished glass or the like, there is a resinoid grinding stone and rubber grindstone and the organic polymer material binder, conventionally, when performing the grinding and polishing using these grindstone the water has been used in the machining fluid. 特公昭60−13793号公報には、酸化ジルコニウム、酸化セリウム又はべん柄の少なくとも1種からなるガラス鏡面仕上げ用研磨材を含有した多孔質飽<br>和ポリエステル樹脂より成る成形体の単一もしくは複数個を相互に間隔をもたせてそれらの一端部を皿体面に固着してなる研磨皿を使用し、水又は切削油を注ぎながらガラス面を研磨するガラス研磨方法が開示されている。 The Japanese Patent Publication No. Sho 60-13793, zirconium oxide, single molded body composed of porous non-saturated <br> sum polyester resin containing glass mirror finish polishing material comprising at least one of cerium oxide or iron oxide red or using a polisher made by fixing the dish body surface thereof at one end by remembering intervals plurality another, glass polishing method of polishing a glass surface have been disclosed while pouring water or cutting oil.

【手続補正2】 [Amendment 2]

【補正対象書類名】明細書 [Correction target document name] specification

【補正対象項目名】0004 [Correction target item name] 0004

【補正方法】変更 [Correction method] change

【補正内容】 [Correction contents]

【0004】 [0004]

【課題を解決するための手段】上記目的を達成するために、本発明の研削研磨方法は、図1の概念図で示すように、有機高分子物質を結合とした研削研磨砥石1に酸化性水溶液からなる加工液2を掛けつつ、研削研磨砥石1と被研削研磨材3とをする合わせて被研削研磨材3を加工することとした。 To achieve the above object, according to the Invention The grinding polishing method of the present invention, as shown in the conceptual diagram of FIG. 1, oxide grinding grindstone 1 in which the organic polymeric material and a binder while applying a working fluid 2 consisting sexual aqueous solution, it was decided to process the object to be ground and polished material 3 combined to the grinding grindstone 1 and the grinding abrasive 3.

【手続補正3】 [Amendment 3]

【補正対象書類名】明細書 [Correction target document name] specification

【補正対象項目名】0005 [Correction target item name] 0005

【補正方法】変更 [Correction method] change

【補正内容】 [Correction contents]

【0005】 [0005]

【作用】上記構成によれば、研削研磨加工の際に、有機高分子物質を結合とする研削研磨砥石1と被研削研磨材3をすり合わせる研削研磨砥石1のすり合わせ面1a According to the above configuration, when the grinding and polishing process, ground glass surface 1a of the grinding grindstone 1 to align worn grinding grindstone 1 and the grinding and polishing material 3 to the organic polymeric material binder
に酸化性水溶液からなる加工液2を掛けると、研削研磨砥石1の結合剤が酸化されて結合力が低下する。 Multiplying machining liquid 2 made of an oxidizing aqueous solution, bonding force binding agent of the grinding grindstone 1 is oxidized drops. 結合力の低下した結合剤は、その表面が研削研磨加工中に崩れ落ち、ドレッシングされる。 Reduced binding agent binding force, the surface collapsed during grinding polishing are dressed. このドレッシング作用により、研削研磨砥石1の表面の目つぶれや目詰まりを起こした砥粒が、結合剤の結合力の低下と共に脱落し、新しい研削研磨面が表れ自生される。 This dressing action, abrasive grains caused the eyes collapsed and clogging of the surface of the grinding grindstone 1, fall off with reduced binding strength of the binder, a new grinding and polishing surface is autogenous appear. そして、このドレッシング作用は、加工液2が供給されている間、常に行なわれる。 Then, the dressing action, while the working fluid 2 is supplied is always performed.

【手続補正4】 [Amendment 4]

【補正対象書類名】明細書 [Correction target document name] specification

【補正対象項目名】0006 [Correction target item name] 0006

【補正方法】変更 [Correction method] change

【補正内容】 [Correction contents]

【0006】上記加工液2である酸化性水溶液は、相手に酸素を与える能力を有する液体で、化学で一般に酸化剤と呼ばれる物質を水で溶解した水溶液である。 [0006] aqueous oxidizing solution is the working fluid 2 is a liquid having the capacity to provide oxygen to the other, it is a substance commonly referred to as the oxidizing agent in the chemical an aqueous solution obtained by dissolving in water. この酸化性水溶液は、酸素原子を放出する能力を有し、放出された酸素原子は、他の物質と非常に反応し易いため、結合剤である有機高分子物質と酸化性水溶液とが接触すると、有機高分子物質に酸化反応が生じる。 The oxidizing aqueous solution, have the ability to release oxygen atom, released oxygen atom, liable to highly reactive with other substances, the organic polymer material is a binder and the oxidizing solution is in contact , the oxidation reaction occurs in the organic polymeric material. この酸化反応は、有機高分子物質の炭素原子や水素原子と酸素原子とが反応して生じる化学反応で、炭素原子との反応ではC The oxidation reaction is a chemical reaction with the carbon atoms and hydrogen atoms and oxygen atoms of the organic polymeric material is produced by the reaction, C is the reaction of the carbon atom
=O結合を生じ、水素原子との反応ではH−O−H結合を生じる。 = Occur O bond, resulting in H-O-H bond in the reaction with hydrogen atoms. 有機高分子内の炭素原子は、長い炭素鎖でつながれており、有機高分子の重合によって硬化している物質は、この炭素鎖が複雑に絡み合って硬質を保っている。 Carbon atoms in the organic polymer are connected by a long carbon chain, the material that is cured by polymerization of the organic polymer, the carbon chain is kept rigid intricately intertwined. しかし、酸化反応により長い炭素鎖中の炭素と酸素 However, carbon and oxygen in the long carbon chain by oxidation
とが反応して、炭素鎖が短く切断されると、複雑に絡み合った炭素鎖が解かれ、炭素鎖によって硬度を保っていた有機高分子物質も結合力が低下し、硬度が弱まる。 Preparative by the reaction, the carbon chain is cut short, unwound complex intertwined carbon chains, organic polymer material was keeping hardness by carbon chains bonding force is reduced, the hardness is weakened.

【手続補正5】 [Amendment 5]

【補正対象書類名】明細書 [Correction target document name] specification

【補正対象項目名】0009 [Correction target item name] 0009

【補正方法】変更 [Correction method] change

【補正内容】 [Correction contents]

【0009】本実施例の研磨方法により光学ガラス10 [0009] Optical glass 10 by the polishing method of this embodiment
0個を加工した結果の累積加工数と1個当たりの被研磨物の減耗量の関係を図3のグラフに示す。 The depletion of relationships zero cumulative processing number of the processed result and an object to be polished per shown in the graph of FIG. 比較例として、加工液8以外は同じ加工条件で、加工液に水道水を用いて研磨加工を行なった結果を破線で併記する。 As a comparative example, except the processing fluid 8 in the same working conditions, also shows the result of performing polishing using tap water machining fluid by broken lines. 減耗 Depletion
の測定にはマイクロメータを用いた。 Using a micrometer to measure the amount. 図3によれば、 According to FIG. 3,
比較例では、累積加工数が5個を超えた時点から被研磨物の減磨量が減少し、累積加工数が20個以上では初期の減磨量の5分の2に減少する加工能力の低下が見られたが、本実施例の研磨方法では累積加工数が増加しても被研磨物の減耗量は全く減少せず、加工能力の低下は生じなかった。 In the comparative example, the cumulative processing number is reduced GenMigakuryou the workpiece from the time when five were exceeded, the cumulative processing number is 20 or more is the processing capacity reduced to two-fifths of the initial GenMigakuryou While reduction is observed, depletion of the object to be polished even increased the cumulative processing number in the polishing method of this embodiment is not at all reduced, it did not occur reduction in processing capacity.

【手続補正6】 [Amendment 6]

【補正対象書類名】明細書 [Correction target document name] specification

【補正対象項目名】0013 [Correction target item name] 0013

【補正方法】変更 [Correction method] change

【補正内容】 [Correction contents]

【0013】また、被研磨物にセラミックを用いた場合にあっても、本実施例と同様な作用、効果が得られた。 Further, even in case of using the ceramic object to be polished, the same effect as the present embodiment, the effect was obtained.
本実施例と同じ加工条件でセラミックを研磨したところ、光学ガラスを研磨した時に比べて単位時間当たりの被加工物の減耗量が5分の1に減少したものの、100 It was polished ceramic under the same processing conditions as the embodiment, although the depletion of the workpiece per unit time than when polishing the optical glass is reduced to one-fifth, 100
個加工しても累積被加工物の減耗量は減少することがなかった。 Depletion of the accumulated workpiece be pieces processed did not decrease.

【手続補正7】 [Amendment 7]

【補正対象書類名】明細書 [Correction target document name] specification

【補正対象項目名】0014 [Correction target item name] 0014

【補正方法】変更 [Correction method] change

【補正内容】 [Correction contents]

【0014】さらに、本実施例の研磨方法で研削砥石を用いて研削加工したところ、被加工物の減耗量が全く減少せず、本実施例と同様な作用、効果が得られた。 [0014] Further the grinding using a grinding wheel in the polishing method of this embodiment, without reducing depleting amount of the workpiece at all, the same effect as the present embodiment, the effect was obtained. そのときの加工条件を以下に示す。 It shows the processing conditions of the time below. 但し、本実施例と同一の部分は省略する。 However, the same parts as the embodiment will be omitted. 研削砥石:ポリイミド樹脂とダイヤモンド砥粒によりなるレジンボンド砥粒、 集中度100、粒度#800 研磨機 :オスカータイプ、垂直荷重4Kgf、下軸回転数650rpm 研削数 :200個 Grinding wheel: polyimide resin and diamond abrasive grains by comprising resin bonded abrasives, the degree of concentration 100, size of # 800 polishing machine: Oscar type, vertical load 4 kgf, the lower shaft speed 650rpm grinding stars 200

Claims (1)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】 有機高分子物質を結合剤とした研削研磨砥石に加工液を掛けつつ研削研磨砥石と被研削研磨材とをすり合わせて被研削研磨材を加工する研削研磨方法において、前記加工液が酸化性水溶液であることを特徴とする研削研磨方法。 And 1. A so Awa sliding and grinding grindstone and the grinding abrasive while applying a working fluid to the grinding polishing grindstone and the organic polymeric material binder in the grinding polishing method of processing an object to be ground and polished material, the working fluid grinding polishing method but is characterized in that an oxidizing aqueous solution.
JP25064492A 1992-08-26 1992-08-26 Grinding abrasive method Pending JPH0671544A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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JPH0671544A true true JPH0671544A (en) 1994-03-15

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Country Link
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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998029217A1 (en) * 1997-01-03 1998-07-09 Minnesota Mining And Manufacturing Company Method and article for the production of optical quality surfaces on glass
US5888119A (en) * 1997-03-07 1999-03-30 Minnesota Mining And Manufacturing Company Method for providing a clear surface finish on glass
US5910471A (en) * 1997-03-07 1999-06-08 Minnesota Mining And Manufacturing Company Abrasive article for providing a clear surface finish on glass
US6231629B1 (en) 1997-03-07 2001-05-15 3M Innovative Properties Company Abrasive article for providing a clear surface finish on glass
US6261435B1 (en) 1997-10-21 2001-07-17 Nihon Techno Kabushiki Kaisha Plating method
CN105817976A (en) * 2016-03-23 2016-08-03 大连理工大学 Efficient ultraprecise grinding method for nanometer depth damaged layer

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998029217A1 (en) * 1997-01-03 1998-07-09 Minnesota Mining And Manufacturing Company Method and article for the production of optical quality surfaces on glass
US5876268A (en) * 1997-01-03 1999-03-02 Minnesota Mining And Manufacturing Company Method and article for the production of optical quality surfaces on glass
US5989111A (en) * 1997-01-03 1999-11-23 3M Innovative Properties Company Method and article for the production of optical quality surfaces on glass
US6155910A (en) * 1997-01-03 2000-12-05 3M Innovative Properties Company Method and article for the production of optical quality surfaces on glass
US5888119A (en) * 1997-03-07 1999-03-30 Minnesota Mining And Manufacturing Company Method for providing a clear surface finish on glass
US5910471A (en) * 1997-03-07 1999-06-08 Minnesota Mining And Manufacturing Company Abrasive article for providing a clear surface finish on glass
US6110015A (en) * 1997-03-07 2000-08-29 3M Innovative Properties Company Method for providing a clear surface finish on glass
US6231629B1 (en) 1997-03-07 2001-05-15 3M Innovative Properties Company Abrasive article for providing a clear surface finish on glass
US6261435B1 (en) 1997-10-21 2001-07-17 Nihon Techno Kabushiki Kaisha Plating method
CN105817976A (en) * 2016-03-23 2016-08-03 大连理工大学 Efficient ultraprecise grinding method for nanometer depth damaged layer

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