JPH05285812A - Grinding method - Google Patents

Grinding method

Info

Publication number
JPH05285812A
JPH05285812A JP9066992A JP9066992A JPH05285812A JP H05285812 A JPH05285812 A JP H05285812A JP 9066992 A JP9066992 A JP 9066992A JP 9066992 A JP9066992 A JP 9066992A JP H05285812 A JPH05285812 A JP H05285812A
Authority
JP
Japan
Prior art keywords
grinding
abrasive grains
workpiece
work
polishing abrasive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9066992A
Other languages
Japanese (ja)
Inventor
Nobuo Yasunaga
暢男 安永
Kozo Abe
耕三 阿部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP9066992A priority Critical patent/JPH05285812A/en
Publication of JPH05285812A publication Critical patent/JPH05285812A/en
Pending legal-status Critical Current

Links

Landscapes

  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Abstract

PURPOSE:To provide a grinding method capable of acquiring finished surfaces high in precision and quality and of improving grinding work efficiency. CONSTITUTION:Under a method to flatly grind a workpiece by using a straight type grinding wheel or a cup type grinding wheel, the workpiece is ground by supplying a grinding liquid suspending polishing abrasive grains smaller than grinding abrasive grains in grain diameter or polishing abrasive grains which are crushed smaller than the grinding abrasive grains during the time of grinding. The fine polishing abrasive grains work on a microscopic area of a ground surface and remove a material a microscopic amount each. Consequently, a streak and a processed distorted layer made by grinding process are removed without damaging surface quality. Additionally, the grinding liquid dissolves and removes grinding dusts attached to the grinding surface of the grinding wheel during the time of grinding work.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、研削方法、特に平面
研削方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a grinding method, and more particularly to a surface grinding method.

【0002】[0002]

【従来の技術】一般に、研削加工では、高能率かつ高精
度で工作物を研削するために、研削砥石と工作物との接
触部分に研削液を供給しながら研削加工を行っている。
研削液には、耐蝕性、冷却性、潤滑性などが要求され
る。このような研削液は、鉱油、動植物油、エステル
油、または界面活性剤などを主成分としており、極圧添
加剤などを添加したものもある。
2. Description of the Related Art Generally, in grinding, in order to grind a workpiece with high efficiency and high precision, the grinding is performed while supplying a grinding liquid to a contact portion between a grinding wheel and the workpiece.
The grinding liquid is required to have corrosion resistance, cooling property, lubricity and the like. Such a grinding fluid contains mineral oil, animal or vegetable oil, ester oil, or a surfactant as a main component, and may include an extreme pressure additive or the like.

【0003】[0003]

【発明が解決しようとする課題】一般に研削加工では、
砥粒切刃の機械的切削作用によって工作物表面を加工す
る。このために、上記のような従来の研削液を使用した
研削加工では、条痕および加工ひずみの残留が避けられ
なかった。したがって、研削面の表面粗さが大きく、ま
た残留ひずみの緩和により形状寸法の経年変化を生じ、
仕上げ面の品質低下を招いていた。
Generally, in the grinding process,
The workpiece surface is machined by the mechanical cutting action of the abrasive cutting edge. For this reason, in the grinding process using the conventional grinding fluid as described above, residual scratches and machining strains cannot be avoided. Therefore, the surface roughness of the ground surface is large, and the relaxation of residual strain causes secular change in shape and dimension.
The quality of the finished surface deteriorated.

【0004】また、従来の研削液を用いた研削作業で
は、目づまりも生じやすかった。したがって、研削砥石
を頻繁にドレッシングしなければならず、研削作業能率
低下の一因となっていた。
Further, in the conventional grinding work using a grinding liquid, clogging is likely to occur. Therefore, the grinding wheel has to be dressed frequently, which has been a cause of a reduction in the efficiency of the grinding work.

【0005】この発明は、高精度、高品質の仕上げ面を
得ることができ、研削作業能率の向上を図ることができ
る研削方法を提供しようとするものである。
The present invention is intended to provide a grinding method capable of obtaining a high-precision and high-quality finished surface and improving the grinding work efficiency.

【0006】[0006]

【課題を解決するための手段】この発明の研削方法は、
ストレート形砥石またはカップ形砥石を用いて工作物を
平面研削する方法において、粒径が研削砥粒より小さい
研磨砥粒または研削中に研削砥粒より小さく破砕される
研磨砥粒を懸濁した研削液を供給して工作物を研削す
る。
The grinding method of the present invention comprises:
In a method of surface grinding a workpiece using a straight grindstone or a cup grindstone, a grinding grain having a grain size smaller than that of the grinding grain or grinding that is crushed smaller than the grinding grain during grinding is suspended. Liquid is supplied to grind the workpiece.

【0007】研削砥石の砥粒は通常のもの、たとえばダ
イヤモンド、CBN、WA、GCなどの砥粒が用いられ
る。また、ボンド材も通常のもの、たとえばビトリファ
イド、レジノイド、メタルなどのボンド材が用いられ
る。
As the abrasive grains of the grinding wheel, conventional abrasive grains such as diamond, CBN, WA, and GC are used. Further, as the bonding material, a usual bonding material such as vitrified, resinoid, metal or the like is used.

【0008】上記研磨砥粒として、工作物のポリシング
に用いる研磨剤、ポリシングに近い微細砥粒または工作
物と同程度の硬度のもしくは軟質の砥粒がある。工作物
と同程度の硬度のもしくは軟質の砥粒の場合、これらの
研磨砥粒中、粒径が研削砥粒よりも大きなものがあって
も、研削中に破砕して微細な砥粒となる。研磨砥粒また
は破砕された研磨砥粒の粒径は、0.01〜10μm程
度が適当である。これらの砥粒として、たとえばSiO
2 粉末、BaCO3 粉末、Cr2 3 粉末やFe2 3
粉末などがある。研磨砥粒を懸濁する工作液としては、
水、KOH水溶液などのアルカリ液などを用いる。ま
た、工作液は、エッチングなどの化学的作用を示すもの
であってもよい。
As the above-mentioned polishing abrasive grains, there are an abrasive used for polishing a workpiece, fine abrasive grains close to polishing, or abrasive grains having a hardness similar to that of the workpiece or a soft abrasive grain. In the case of abrasive grains that have the same hardness or softness as the work piece, even if some of these abrasive grains have a larger grain size than the abrasive grains, they will be crushed into fine grains during grinding. .. The particle diameter of the abrasive grains or the crushed abrasive grains is preferably about 0.01 to 10 μm. As these abrasive grains, for example, SiO
2 powder, BaCO 3 powder, Cr 2 O 3 powder and Fe 2 O 3
There are powders. As a working fluid that suspends abrasive grains,
Water or an alkaline solution such as KOH aqueous solution is used. Further, the working fluid may be one that exhibits a chemical action such as etching.

【0009】研磨剤の温度は、20〜50℃が適当であ
る。
The temperature of the polishing agent is preferably 20 to 50 ° C.

【0010】研削方式は、カップ形砥石によるロータリ
ー研削方式、あるいはストレート形砥石によるレシプロ
研削方式であってもよい。
The grinding method may be a rotary grinding method using a cup type grindstone or a reciprocating grinding method using a straight type grindstone.

【0011】[0011]

【作用】遊離した微細な研磨砥粒は、研削面を転動、あ
るいは滑り運動する。研削によって生じた研削面の突起
部は、研磨砥粒の衝突によって破壊される。微細な研磨
砥粒は研削面の微小面積に作用し、微少量ずつ材料を除
去する。これにより、研削加工により生じた条痕および
加工ひずみ層は、表面品質を損なうことなく除去され
る。
The released fine abrasive grains roll or slide on the ground surface. The protrusion on the ground surface caused by the grinding is destroyed by the collision of the polishing abrasive grains. The fine abrasive grains act on a very small area of the ground surface and remove the material in minute amounts. As a result, the scratches and processing strain layer generated by the grinding process are removed without impairing the surface quality.

【0012】また、化学的作用を有する研削液は、研削
作業中に砥石研削面に付着した研削屑を溶去する。
Further, the grinding liquid having a chemical action dissolves away the grinding dust attached to the grinding surface of the grindstone during the grinding operation.

【0013】[0013]

【実施例】ダイヤモンド研削ホイールによりシリコンウ
エハを研削した。ダイヤモンド砥粒の平均粒径は5μm
であり、容積比は30%である。研削液はシリカ微粉末
をKOH水溶液に懸濁したものである。シリコン微粉末
の平均粒径は、0.05μmである。ホイール周速度は
1700 m/minであり、切込み量は0.002mm/pass
であった。上記条件で研削の結果、表面粗さRaは0.
003μmであり、残留ひずみは0であった。また、2
0時間、ドレッシングなしで連続研削することができ
た。
Example A silicon wafer was ground with a diamond grinding wheel. The average diameter of diamond abrasive grains is 5 μm
And the volume ratio is 30%. The grinding liquid is a suspension of fine silica powder in a KOH aqueous solution. The average particle size of the silicon fine powder is 0.05 μm. Wheel peripheral speed is 1700 m / min, depth of cut is 0.002 mm / pass
Met. As a result of grinding under the above conditions, the surface roughness Ra was 0.
The residual strain was 003 μm and the residual strain was 0. Also, 2
It was possible to continuously grind for 0 hours without dressing.

【0014】比較例として、上記と同一の研削条件によ
り従来の研削液である鉱油を用いてシリコンウエハを研
削した。その結果、表面粗さRaは0.009μmであ
り、残留ひずみは0.3μmの深さまであった。また、
1.5時間おきにドレッシングする必要があった。
As a comparative example, a silicon wafer was ground using a conventional grinding fluid, mineral oil, under the same grinding conditions as described above. As a result, the surface roughness Ra was 0.009 μm and the residual strain was up to a depth of 0.3 μm. Also,
I had to dress every 1.5 hours.

【0015】[0015]

【発明の効果】この発明では、微細な研磨砥粒が研削面
の微小面積に作用し、微少量ずつ材料を除去するので、
研削加工により生じた条痕および加工ひずみ層は、表面
品質を損なうことなく除去される。この結果、高精度、
高品質の仕上げ面が得られる。また、研削液は、研削作
業中に砥石研削面に付着した研削屑を溶去するので、頻
繁にドレッシングを行わなくても、安定して長時間続け
て研削作業を行うことができ、研削作業能率の向上を図
ることができる。
EFFECTS OF THE INVENTION In the present invention, since fine abrasive grains act on a very small area of the ground surface to remove the material in minute amounts,
The streaks and work strain layers generated by the grinding process are removed without impairing the surface quality. As a result, high precision,
High quality finished surface is obtained. In addition, since the grinding fluid dissolves away the grinding debris adhering to the grinding wheel grinding surface during grinding work, it is possible to perform stable and long-term grinding work without frequent dressing. It is possible to improve efficiency.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 ストレート形砥石またはカップ形砥石を
用いて工作物を平面研削する方法において、粒径が研削
砥粒より小さい研磨砥粒または研削中に研削砥粒より小
さく破砕される研磨砥粒を懸濁した研削液を供給して工
作物を研削することを特徴とする研削方法。
1. A method of surface grinding a workpiece using a straight grindstone or a cup grindstone, wherein the abrasive grains have a grain size smaller than that of the abrasive grains or are crushed smaller than the abrasive grains during grinding. A grinding method, characterized in that a grinding liquid is suspended to grind a workpiece.
JP9066992A 1992-04-10 1992-04-10 Grinding method Pending JPH05285812A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9066992A JPH05285812A (en) 1992-04-10 1992-04-10 Grinding method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9066992A JPH05285812A (en) 1992-04-10 1992-04-10 Grinding method

Publications (1)

Publication Number Publication Date
JPH05285812A true JPH05285812A (en) 1993-11-02

Family

ID=14004947

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9066992A Pending JPH05285812A (en) 1992-04-10 1992-04-10 Grinding method

Country Status (1)

Country Link
JP (1) JPH05285812A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000190191A (en) * 1998-12-25 2000-07-11 Disco Abrasive Syst Ltd Processing method for semiconductor wafer
CN105773321A (en) * 2016-03-16 2016-07-20 四川神工钨钢刀具有限公司 Hard alloy tool grinding process
CN106098865A (en) * 2016-06-27 2016-11-09 山东浪潮华光光电子股份有限公司 A kind of method that the LED of improvement Sapphire Substrate grinds away limit
CN106239269A (en) * 2016-08-23 2016-12-21 蚌埠精科机床制造有限公司 The finishing method that a kind of platform of machine tool mirror-polishing processes
TWI642517B (en) * 2014-02-25 2018-12-01 光洋機械工業股份有限公司 Surface grinding method for workpiece

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000190191A (en) * 1998-12-25 2000-07-11 Disco Abrasive Syst Ltd Processing method for semiconductor wafer
TWI642517B (en) * 2014-02-25 2018-12-01 光洋機械工業股份有限公司 Surface grinding method for workpiece
CN105773321A (en) * 2016-03-16 2016-07-20 四川神工钨钢刀具有限公司 Hard alloy tool grinding process
CN106098865A (en) * 2016-06-27 2016-11-09 山东浪潮华光光电子股份有限公司 A kind of method that the LED of improvement Sapphire Substrate grinds away limit
CN106239269A (en) * 2016-08-23 2016-12-21 蚌埠精科机床制造有限公司 The finishing method that a kind of platform of machine tool mirror-polishing processes

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