JPH0671427A - Brazing method for tial - Google Patents
Brazing method for tialInfo
- Publication number
- JPH0671427A JPH0671427A JP24869592A JP24869592A JPH0671427A JP H0671427 A JPH0671427 A JP H0671427A JP 24869592 A JP24869592 A JP 24869592A JP 24869592 A JP24869592 A JP 24869592A JP H0671427 A JPH0671427 A JP H0671427A
- Authority
- JP
- Japan
- Prior art keywords
- tial
- brazing
- pure
- base
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Chemically Coating (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明はろう付の改良を図ること
ができるＴｉＡｌのろう付方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a TiAl brazing method capable of improving brazing.
【０００２】[0002]
【従来の技術】ＴｉＡｌはＡｌの含有量が約３５％と極
めて高く、ろう付しようとする接合界面にＡｌの酸化皮
膜が発生してろう付性を悪化する。2. Description of the Related Art TiAl has an extremely high Al content of about 35%, and an Al oxide film is formed at the joint interface to be brazed, which deteriorates the brazing property.
【０００３】従って、従来、ろう付け前の前処理でＴｉ
Ａｌの接合界面を酸洗浄又はエメリー研磨を施し次いで
ろう付を行う方法が用いられている。Therefore, in the prior art, Ti was used as a pretreatment before brazing.
A method is used in which the Al bonding interface is subjected to acid cleaning or emery polishing and then brazing.
【０００４】[0004]
【発明が解決しようとする課題】前処理からろう付の実
施までの保管時間は経験的に約６時間以内にキープする
必要があるとされている。しかしながら、上記の方法に
よる実際の製品の製作工程では保管時間を６時間以内に
キープすることは困難で、実用的でないという問題があ
る。The storage time from pretreatment to brazing is empirically required to be kept within about 6 hours. However, it is difficult to keep the storage time within 6 hours in the actual manufacturing process of the product by the above method, which is not practical.
【０００５】[0005]
【発明の目的】本発明はＴｉＡｌの接合界面に酸化皮膜
が発生するのを防止しろう付性を改良することを目的と
する。An object of the present invention is to prevent the formation of an oxide film at the joint interface of TiAl and improve the brazing property.
【０００６】[0006]
【研究結果による知見】上記した問題点を解決すべく本
発明者らは、ＴｉＡｌに付着可能な金属で且つ表面に酸
化皮膜が形成されにくく熱処理を行った際に酸化皮膜が
分解され易い金属について鋭意研究の結果、ＮｉはＴｉ
Ａｌに付着可能で且つ酸化皮膜が形成されにくい性質を
備えているという知見を得るに至った。[Findings from Research Results] In order to solve the above-mentioned problems, the inventors of the present invention have identified a metal that can adhere to TiAl and that is hard to form an oxide film on the surface and is easily decomposed when heat-treated. As a result of earnest research, Ni is Ti
We have come to the knowledge that it has the property of being capable of adhering to Al and being hard to form an oxide film.
【０００７】[0007]
【課題を解決するための手段】本発明のうち第１の手段
はＴｉＡｌの表面を酸洗浄後純Ｎｉメッキを施して母材
を形成し、２枚の母材の純Ｎｉメッキを施した面間にろ
う材を挾み、真空下において両母材を所定の温度に加熱
し、接合するものであり、第２の手段はＴｉＡｌの表面
にプラズマ溶接によりＮｉコーティングを施して母材を
形成し、２枚の母材の純Ｎｉメッキを施した面間にろう
材を挾み、真空下において両母材を所定の温度に加熱
し、接合するものである。According to a first means of the present invention, the surface of TiAl is cleaned with an acid and then plated with pure Ni to form a base material, and two surfaces of the base material are plated with pure Ni. A brazing filler metal is sandwiched between them, and both base metals are heated to a predetermined temperature under vacuum to bond them. The second means is to form a base metal by applying Ni coating to the surface of TiAl by plasma welding. A brazing material is sandwiched between two surfaces of a base material plated with pure Ni, and both base materials are heated to a predetermined temperature under vacuum to bond them.
【０００８】[0008]
【作用】前処理としてＴｉＡｌの表面の接合界面にＮｉ
メッキを施すか或いはＰＶＤ法によりＮｉコーティング
を施したので、Ａｌの酸化皮膜の発生を抑制して、ろう
付性が改良される。[Function] As a pretreatment, Ni is applied to the bonding interface on the surface of TiAl.
Since the plating is applied or the Ni coating is applied by the PVD method, the generation of an Al oxide film is suppressed and the brazing property is improved.
【０００９】[0009]
【実施例】以下、本発明によるＴｉＡｌのろう付方法に
ついて説明する。The method for brazing TiAl according to the present invention will be described below.
【００１０】図１は本発明の一実施例を示す。FIG. 1 shows an embodiment of the present invention.
【００１１】本実施例においては、ＴｉＡｌ１の表面に
厚さ５〜１０μｍの純Ｎｉメッキ２を施して母材を形成
し、両母材間に厚さ５０〜１００μｍのろう材３（チタ
ンベース４０％、ジルコニウム２０％、ニッケル２０
％、銅２０％で構成されるＴ−２０２０）を挾み、真空
度１．３３×１０ー2Ｐａ以下の炉内で１０分間、９３０
℃の温度に加熱して両母材を接合し、５００〜６００℃
まで炉冷し、約１５０℃で炉外へ取り出す。接合後のＴ
ｉＡｌの引張強度は１４７Ｎであった。In this embodiment, a base material is formed by applying pure Ni plating 2 having a thickness of 5 to 10 μm on the surface of TiAl 1, and a brazing material 3 (titanium base 40 having a thickness of 50 to 100 μm) between the base materials. %, Zirconium 20%, nickel 20
%, With 20% of copper sandwiched the configured T-2020), the degree of vacuum 1.33 × 10 over 2 Pa or less in the furnace for 10 minutes, 930
Heated to a temperature of ℃ to join both base materials, 500 to 600 ℃
The furnace is cooled to about 150 ° C. and taken out of the furnace. T after joining
The tensile strength of iAl was 147N.
【００１２】図２は、本実施例であるＮｉメッキを施し
たものとＮｉメッキのない従来のものとのろう付性に及
ぼす保持時間の影響を比較したものである。FIG. 2 compares the effect of holding time on the brazability between the Ni-plated product of this embodiment and the conventional Ni-plated product.
【００１３】図で明らかなように前処理からろう付まで
の保持時間が６時間までは従来のものも、本発明のもの
も共にろう付性に影響はなかったが、保持時間が２〜３
日経過の段階では従来のものはろう付性が低下したのに
対し本発明のものはろう付性は低下しなかった。As is apparent from the figure, neither the conventional one nor the present invention has an effect on the brazing property when the holding time from pretreatment to brazing is up to 6 hours, but the holding time is 2 to 3
In the course of the day, the brazing property of the conventional one decreased, whereas the brazing property of the present invention did not decrease.
【００１４】図３は本発明の他の実施例を示す。FIG. 3 shows another embodiment of the present invention.
【００１５】本実施例においてはＴｉＡｌ１の表面にＰ
ＶＤ法により厚さ約５μｍのＮｉコーティング４を施し
て母材を形成し、両母材間に図１の実施例と同様のろう
材３を挾み、図１の実施例と同様の条件で両母材を加熱
し、接合する。In this embodiment, P is formed on the surface of TiAl1.
A base material is formed by applying a Ni coating 4 having a thickness of about 5 μm by the VD method, and a brazing material 3 similar to that of the embodiment of FIG. 1 is sandwiched between the base materials, and the same conditions as those of the embodiment of FIG. 1 are used. Both base materials are heated and joined.
【００１６】[0016]
【発明の効果】上記した本発明のＴｉＡｌのろう付方法
においては、ＴｉＡｌの接合界面にＮｉメッキを施すか
或いはＰＶＤ法によりＮｉコーティングを施したので、
Ａｌの酸化皮膜の発生を抑制してろう付性が改良される
とともに保管期間も従来のものに比べて長くすることが
できる。In the above-described TiAl brazing method of the present invention, since the NiAl joint interface is plated with Ni or the PVD method is used for Ni coating,
The generation of an Al oxide film is suppressed to improve the brazing property, and the storage period can be extended as compared with the conventional one.
【図１】本発明のＴｉＡｌのろう付方法の一実施例を示
す縦断面図である。FIG. 1 is a vertical sectional view showing an embodiment of a TiAl brazing method of the present invention.
【図２】本発明のＮｉメッキを施したものと従来のＮｉ
メッキを施さないものとのろう付性に及ぼす保持時間の
影響についての比較を示す図である。FIG. 2 shows the Ni-plated product of the present invention and a conventional Ni product.
It is a figure which shows the comparison about the influence of the holding time on the brazability with what is not plated.
【図３】本発明のＴｉＡｌのろう付方法の他の実施例を
示す縦断面図である。FIG. 3 is a vertical sectional view showing another embodiment of the TiAl brazing method of the present invention.
１ ＴｉＡｌ ２ 純Ｎｉメッキ ３ ろう材 ４ Ｎｉコーティング 1 TiAl 2 Pure Ni plating 3 Brazing material 4 Ni coating
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｃ２３Ｃ 18/32 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Office reference number FI technical display location C23C 18/32
Claims (2)
を施して母材を形成し、２枚の母材の純Ｎｉメッキを施
した面間にろう材を挾み、真空下において両母材を所定
の温度に加熱し、接合することを特徴とするＴｉＡｌの
ろう付方法。1. A surface of TiAl is cleaned with an acid and then plated with pure Ni to form a base material, and a brazing material is sandwiched between the surfaces of the two base materials plated with pure Ni. A brazing method of TiAl, characterized in that the materials are heated to a predetermined temperature and joined.
ａｌ ＶａｐｏｒＤｅｐｏｓｉｔｉｏｎ）法（物理蒸着
法）によりＮｉコーティングを施して母材を形成し、２
枚の母材の純Ｎｉメッキを施した面間にろう材を挾み、
真空下において両母材を所定の温度に加熱し、接合する
ことを特徴とするＴｉＡｌのろう付方法。2. PVD (Physic) on the surface of TiAl
The Ni coating is applied by the al Vapor Deposition method (physical vapor deposition method) to form the base material, and 2
A brazing filler metal is sandwiched between the surfaces of the base materials that have been plated with pure Ni,
A brazing method of TiAl, characterized in that both base materials are heated to a predetermined temperature under vacuum and joined.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24869592A JPH0671427A (en) | 1992-08-25 | 1992-08-25 | Brazing method for tial |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24869592A JPH0671427A (en) | 1992-08-25 | 1992-08-25 | Brazing method for tial |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0671427A true JPH0671427A (en) | 1994-03-15 |
Family
ID=17181964
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24869592A Pending JPH0671427A (en) | 1992-08-25 | 1992-08-25 | Brazing method for tial |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0671427A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007296546A (en) * | 2006-04-28 | 2007-11-15 | Toyota Central Res & Dev Lab Inc | Soldering method |
| US7749614B2 (en) * | 2003-07-25 | 2010-07-06 | Onera (Office National D'etudes Et De Recherches Aerospatiales) | Method of brazing a Ti-Al alloy |
| CN105537750A (en) * | 2016-01-20 | 2016-05-04 | 天津大学 | High-strength connection process for copper-niobium rodlike metals under non-vacuum low-pressure condition |
| KR20180010301A (en) * | 2015-12-23 | 2018-01-30 | 희성정밀 주식회사 | Cooling plate producing method for battery stack of electric vehicle and cooling plate by the same |
-
1992
- 1992-08-25 JP JP24869592A patent/JPH0671427A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7749614B2 (en) * | 2003-07-25 | 2010-07-06 | Onera (Office National D'etudes Et De Recherches Aerospatiales) | Method of brazing a Ti-Al alloy |
| JP2007296546A (en) * | 2006-04-28 | 2007-11-15 | Toyota Central Res & Dev Lab Inc | Soldering method |
| JP4675821B2 (en) * | 2006-04-28 | 2011-04-27 | 株式会社豊田中央研究所 | Brazing method |
| KR20180010301A (en) * | 2015-12-23 | 2018-01-30 | 희성정밀 주식회사 | Cooling plate producing method for battery stack of electric vehicle and cooling plate by the same |
| CN105537750A (en) * | 2016-01-20 | 2016-05-04 | 天津大学 | High-strength connection process for copper-niobium rodlike metals under non-vacuum low-pressure condition |
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