JPH0668727A - Manufacture of superconducting wire - Google Patents
Manufacture of superconducting wireInfo
- Publication number
- JPH0668727A JPH0668727A JP4219966A JP21996692A JPH0668727A JP H0668727 A JPH0668727 A JP H0668727A JP 4219966 A JP4219966 A JP 4219966A JP 21996692 A JP21996692 A JP 21996692A JP H0668727 A JPH0668727 A JP H0668727A
- Authority
- JP
- Japan
- Prior art keywords
- base material
- polishing
- superconducting
- film
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E40/00—Technologies for an efficient electrical power generation, transmission or distribution
- Y02E40/60—Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ケーブル、マグネット
等に使用する酸化物高温超電導線の製造方法に関し、特
に、長尺基材上に酸化物高温超電導膜を形成してなる超
電導線の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an oxide high temperature superconducting wire used for cables, magnets and the like, and more particularly to producing a superconducting wire formed by forming an oxide high temperature superconducting film on a long base material. Regarding the method.
【０００２】[0002]
【従来の技術および発明が解決しようとする課題】液体
窒素温度（７７．３Ｋ）よりも高い臨界温度（Ｔｃ）を
示すＹ系（Ｔｃ：９０Ｋ）、Ｂｉ系（Ｔｃ：１０８
Ｋ）、Ｔｌ系（Ｔｃ：１２５Ｋ）酸化物超電導材料の発
見により、そのエネルギー分野およびエレクトロニクス
分野への応用が期待されるようになってきた。2. Description of the Related Art Y-based (Tc: 90K) and Bi-based (Tc: 108) which show a critical temperature (Tc) higher than liquid nitrogen temperature (77.3K).
With the discovery of K) and Tl-based (Tc: 125K) oxide superconducting materials, their application to the fields of energy and electronics has come to be expected.
【０００３】この中でエネルギー分野への応用をめざし
た酸化物高温超電導体の線材化は、この材料の発見当初
から精力的に進められてきている。[0003] Among them, the formation of high-temperature oxide superconductors into wires for the purpose of application in the energy field has been vigorously pursued since the discovery of this material.
【０００４】この線材化について、種々の方法が検討さ
れているが、その１つには、酸化物高温超電導体を金属
で被覆し、線材化する方法がある。この方法では、たと
えば、酸化物高温超電導体を銀シース内に充填したもの
について、伸線および圧延等の塑性加工を施した後、焼
結処理して線材が得られる。このプロセスでは、塑性加
工と焼結処理の組合せにより、銀被覆内の超電導体に高
い配向性をもたせ、高い臨界電流値を実現させるように
なってきた。Various methods have been studied for forming the wire rod, and one of them is a method of coating the high temperature oxide superconductor with a metal to form the wire rod. In this method, for example, a high-temperature oxide superconductor filled in a silver sheath is subjected to plastic working such as wire drawing and rolling, and then sintered to obtain a wire. In this process, a combination of plastic working and sintering has made the superconductor in the silver coating highly oriented and has realized a high critical current value.
【０００５】一方、スパッタリングや蒸着法等の気相プ
ロセスにより、可撓性を有する長尺基材上に超電導膜を
形成し、超電導線材を得る方法も検討されてきている。
この方法は、特に、基材上に形成される超電導体組織を
制御することによって臨界電流密度（Ｊｃ）が飛躍的に
高められる可能性を有しており、線材のＪｃ、特に磁場
中でのＪｃを高める方法として期待されている。On the other hand, a method of obtaining a superconducting wire by forming a superconducting film on a flexible long substrate by a vapor phase process such as sputtering or vapor deposition has been investigated.
This method has the possibility that the critical current density (Jc) can be dramatically increased by controlling the superconducting texture formed on the substrate. It is expected as a method to increase Jc.
【０００６】この長尺基材に超電導膜を形成する技術に
関しては、まず基礎として、たとえばレーザアブーショ
ン法により、単結晶基材上に１×１０6 Ａ／ｃｍ2 を超
える高Ｊｃの酸化物高温超電導膜を形成する技術が確立
されてきた。Regarding the technique for forming a superconducting film on this long base material, first, as a basis, for example, by a laser ablation method, a high Jc oxide exceeding 1 × 10 6 A / cm 2 is formed on a single crystal base material. Techniques for forming high temperature superconducting films have been established.
【０００７】しかしながら、線材として実用的な基材は
多結晶材料であり、この材料上で高Ｊｃの超電導膜を形
成させるには、さらに検討を進めていく必要があった。However, a practical base material for a wire is a polycrystalline material, and further study has been required to form a superconducting film of high Jc on this material.
【０００８】本発明者らは、長尺基材上に酸化物高温超
電導膜を形成してより実用的な線材を得る方法として、
まず長尺の基材を準備し、この基材の表面を研磨した
後、研磨した清浄でかつ平滑な基材上に酸化物高温超電
導膜を形成するプロセスを検討してきた。このプロセス
では、表面粗さＲmax が０．０１μ程度に研磨された基
材上に、レーザアブーション等の蒸着法によって良好な
成膜が行なわれる。The present inventors have proposed a method for forming a high temperature oxide superconducting film on a long base material to obtain a more practical wire rod.
First, a process of preparing a long base material, polishing the surface of the base material, and then forming an oxide high temperature superconducting film on the polished and smooth base material has been studied. In this process, a good film is formed on a base material having a surface roughness R max of about 0.01 μm by a vapor deposition method such as laser ablation.
【０００９】しかし、このプロセスの生産性はさほど良
くなかった。これは、長尺の基材を研磨するのに時間が
かかるうえに、成膜工程においても基材を長尺にすると
時間が相当かかるためである。However, the productivity of this process was not very good. This is because it takes a long time to polish a long base material, and it takes a long time to make the base material long in the film forming step.
【００１０】本発明の目的は、基材上に超電導膜を形成
して超電導線を得る技術において、より生産性に優れた
方法を提供することにある。An object of the present invention is to provide a method having a higher productivity in the technique of forming a superconducting film on a base material to obtain a superconducting wire.
【００１１】[0011]
【課題を解決するための手段】本発明に従って基材上に
酸化物高温超電導膜を形成してなる超電導線の製造方法
が提供される。第１の発明に従う超電導線の製造方法
は、基材の表面を研磨する工程と、研磨された基材を切
断して複数に分割する工程と、複数に分割された基材の
研磨された表面に酸化物高温超電導膜をそれぞれ形成す
る工程とを備える。According to the present invention, there is provided a method for producing a superconducting wire, which comprises forming a high temperature oxide superconducting film on a substrate. A method of manufacturing a superconducting wire according to a first aspect of the present invention includes a step of polishing a surface of a base material, a step of cutting the polished base material into a plurality of pieces, and a polished surface of the plurality of base materials. And a step of forming an oxide high temperature superconducting film, respectively.
【００１２】第１の発明において、研磨された基材は、
固定刃のスリッタ等で切断できる。また、基材の切断
は、回転刃のスリッタを使用し、洗浄が容易な切削剤を
用いて湿式で行なうこともできる。In the first invention, the polished substrate is
Can be cut with a fixed blade slitter. The base material may be cut by a wet method using a rotary blade slitter and a cutting agent that is easy to wash.
【００１３】この切断工程において、たとえば、厚さ
０．０５〜０．２ｍｍのテープ状基材を切断する場合、
研磨された基材は固定刃のスリッタ等で容易に切断する
ことができる。この切断により、切断前と同じ長さを有
し、切断前より幅の小さいテープ状基材を所望の数だけ
得ることができる。In this cutting step, for example, when cutting a tape-shaped substrate having a thickness of 0.05 to 0.2 mm,
The ground base material can be easily cut with a fixed blade slitter or the like. By this cutting, it is possible to obtain a desired number of tape-shaped substrates having the same length as before cutting and having a width smaller than that before cutting.
【００１４】第２の発明に従う超電導線の製造方法は、
基材の表面を研磨する工程と、研磨された基材表面に酸
化物高温超電導膜を形成する工程と、次いで、基材を切
断して複数の超電導線を得る工程とを備える。A method of manufacturing a superconducting wire according to the second invention is
The method includes a step of polishing the surface of the substrate, a step of forming an oxide high temperature superconducting film on the polished surface of the substrate, and a step of cutting the substrate to obtain a plurality of superconducting wires.
【００１５】第２の発明では、基材上に形成された超電
導膜の劣化を防止する意味で、乾式において切断を行な
う方が望ましいが、超電導膜の保護および安定化の目的
で超電導膜を銀等の層で覆い、湿式で切断を行なっても
よい。In the second aspect of the invention, it is preferable to perform cutting in a dry method in order to prevent deterioration of the superconducting film formed on the base material, but the superconducting film is made of silver for the purpose of protecting and stabilizing the superconducting film. You may cover with a layer etc., and perform wet cutting.
【００１６】第２の発明によれば、切断により、たとえ
ば、所定の長さを有し、切断前より小さい幅の超電導線
を所望の数だけ得ることができる。According to the second invention, by cutting, for example, a desired number of superconducting wires having a predetermined length and a width smaller than that before cutting can be obtained.
【００１７】第１および第２の発明において、基材に
は、超合金、特にハステロイおよびインコネル等のＮｉ
基合金、ならびに銀等の貴金属を好ましく用いることが
できる。より具体的には、ハステロイＣ（１６．５％Ｃ
ｒ、〜２．５％Ｃｏ、１７％Ｍｏ、５％Ｆｅ、残部Ｎ
ｉ）およびインコネル７１３Ｃ（１３％Ｃｒ、〜１％Ｃ
ｏ、４．５％Ｍｏ、６％Ａｌ、〜２％Ｆｅ、残部Ｎｉ）
等を基材として用いることができる。In the first and second inventions, the base material is made of a superalloy, particularly Ni such as Hastelloy and Inconel.
Base alloys and noble metals such as silver can be preferably used. More specifically, Hastelloy C (16.5% C
r, 2.5% Co, 17% Mo, 5% Fe, balance N
i) and Inconel 713C (13% Cr, ~ 1% C
o, 4.5% Mo, 6% Al, ~ 2% Fe, balance Ni)
Etc. can be used as a base material.
【００１８】第１および第２の発明における研磨工程で
は、通常のエメリー紙またはダイヤモンドペーパによる
面出しの後、研磨微粒粉を懸濁させた研磨剤を用いて研
磨仕上げを行なうことができる。研磨微粒粉としては、
Ａｌ2 Ｏ3 、ＳｉＣ、Ｃｒ2Ｏ3 およびコロイダルシリ
カ等の少なくともいずれかを用いることができる。ま
た、研磨剤中に過酸化水素または硝酸等を加えたものを
用いて、メカノケミカルポリッシングを行なうこともで
きる。研磨剤を用いる研磨では、たとえば、最大表面粗
さＲmax ０．０１〜０．０５μまで好ましく研磨するこ
とができる。研磨された基材は、速やかに洗浄され、超
電導膜が形成されるべき面が調製された基材として次工
程に送られる。In the polishing step in the first and second inventions, after the normal surface is embossed with emery paper or diamond paper, polishing finishing can be carried out using an abrasive having suspended fine abrasive powder. As polishing fine powder,
At least one of Al 2 O 3 , SiC, Cr 2 O 3 and colloidal silica can be used. In addition, mechanochemical polishing can be performed using a polishing agent to which hydrogen peroxide, nitric acid, or the like is added. In polishing using an abrasive, for example, maximum surface roughness R max of 0.01 to 0.05 μ can be preferably performed. The polished base material is immediately washed and sent to the next step as a base material in which the surface on which the superconducting film is to be formed is prepared.
【００１９】第１および第２の発明において、ＹＢａ2
Ｃｕ3 Ｏx 等のＹ系、Ｂｉ2 Ｓｒ2Ｃａ2 Ｃｕ3 Ｏx 等
のＢｉ系、ＴｌＢｉＳｒ2 Ｃａ2 Ｃｕ3 Ｏx 等のＴｌ系
などの酸化物高温超電導膜を基材表面に形成することが
できる。この超電導膜を形成するにあたり、まず、基材
上にイットリア安定化ジルコニア（ＹＳＺ）またはＭｇ
Ｏ等からなる中間層を形成することが好ましい。この中
間層を介して酸化物高温超電導膜を基材表面に形成する
ことにより、超電導膜の結晶性を高め、高Ｊｃの膜を形
成させることができる。In the first and second inventions, YBa 2
A high temperature oxide superconducting film such as Y-based such as Cu 3 O x , Bi-based such as Bi 2 Sr 2 Ca 2 Cu 3 O x or Tl-based such as TlBiSr 2 Ca 2 Cu 3 O x is formed on the surface of the substrate. be able to. In forming this superconducting film, first, yttria-stabilized zirconia (YSZ) or Mg is formed on the base material.
It is preferable to form an intermediate layer made of O or the like. By forming the oxide high temperature superconducting film on the surface of the base material via this intermediate layer, the crystallinity of the superconducting film can be enhanced and a film with high Jc can be formed.
【００２０】これら中間層および超電導膜は、成膜速度
の大きなレーザアブーションにより形成することが好ま
しいが、その他、スパッタ法およびＣＶＤ法等でも形成
させることができる。The intermediate layer and the superconducting film are preferably formed by laser ablation at a high film forming rate, but they can also be formed by a sputtering method, a CVD method or the like.
【００２１】[0021]
【発明の作用効果】従来、たとえば、テープ状の基材に
超電導膜を形成して超電導線を製造する場合、超電導線
として最終的なサイズの基材が研磨され、その上に超電
導膜が形成されてきた。したがって、従来法で複数の超
電導線を製造する場合、複数の基材がそれぞれ研磨さ
れ、その上にそれぞれ超電導膜が形成されていた。Conventionally, for example, when a superconducting film is formed on a tape-shaped base material to manufacture a superconducting wire, a base material of a final size as a superconducting wire is polished and a superconducting film is formed thereon. It has been. Therefore, when manufacturing a plurality of superconducting wires by the conventional method, a plurality of base materials were each ground and a superconducting film was formed on each.
【００２２】これに対し、第１の発明では、研磨した基
材を切断することにより、超電導膜を形成すべき複数の
基材を従来よりも短時間に得ている。これは、切断にか
かる時間が研磨にかかる時間に比べて圧倒的に短く、複
数の基材を調製するために研磨を１回しか行なわないこ
とで、大幅にプロセスに要する時間を短縮できるからで
ある。On the other hand, in the first invention, a plurality of base materials on which superconducting films are to be formed are obtained in a shorter time by cutting the polished base material. This is because the time required for cutting is overwhelmingly shorter than the time required for polishing, and since polishing is performed only once to prepare a plurality of substrates, the time required for the process can be significantly shortened. is there.
【００２３】一方、常識的に考えれば、このように一度
研磨した基材を切断することによって、基材に傷が生
じ、良好な成膜を行なえないのではないかという懸念が
あった。しかしながら、以下の実施例で示すように、切
断を行なって得られた基材上でも高いＪｃを示す超電導
膜が形成されるので、このような切断が成膜に大きな影
響を与えないことを本発明者らは見出した。On the other hand, from a common sense, there is a concern that cutting the base material that has been once polished may cause damage to the base material and prevent good film formation. However, as shown in the following examples, since a superconducting film having a high Jc is formed even on a substrate obtained by cutting, it is essential that such cutting does not significantly affect the film formation. The inventors have found out.
【００２４】以上説明したように、第１の発明は、複数
の基材についてそれぞれ長い時間をかけて研磨する工程
を圧縮し、幅広の基材を一度に研磨した後、切断するこ
とによって研磨にかかる時間を短縮し、基材上に超電導
膜を形成した超電導線プロセスの生産性を向上させてい
る。As described above, according to the first aspect of the invention, the step of polishing a plurality of base materials for a long time is compressed, the wide base material is polished at one time, and then the base material is cut to be polished. This time is shortened and the productivity of the superconducting wire process in which the superconducting film is formed on the substrate is improved.
【００２５】第２の発明では、複数の基材についてそれ
ぞれ研磨し、それぞれ超電導膜を形成する工程を圧縮
し、幅広の基材を一度に研磨し、その上に超電導膜を形
成した後、切断を行なうことによって研磨および超電導
膜形成にかかる時間を大幅に短縮している。超電導膜形
成に要する時間は、研磨に要する時間よりもさらに長い
ので、成膜時間を短縮することは超電導線の生産性をさ
らに向上させることにつながる。In the second invention, a step of polishing each of a plurality of base materials and forming a superconducting film is compressed, a wide base material is polished at a time, a superconducting film is formed thereon, and then cut. By doing so, the time required for polishing and forming the superconducting film is significantly shortened. Since the time required for forming the superconducting film is longer than the time required for polishing, shortening the film forming time leads to further improvement in the productivity of the superconducting wire.
【００２６】一方、常識的に考えれば、このように成膜
を行なった基材を切断することによって、膜の損傷が起
こり、Ｊｃの高い超電導膜が得られないのではないかと
いう懸念があった。しかしながら、以下の実施例で示す
ように、切断を行なって得られた超電導線が高いＪｃを
有するので、このような切断が成膜に大きな影響を与え
ないことを本発明者らは見出した。On the other hand, from a common sense, there is a concern that cutting the substrate on which the film has been formed in this way may damage the film, resulting in a superconducting film having a high Jc. It was However, since the superconducting wire obtained by cutting has a high Jc as shown in the following examples, the present inventors have found that such cutting does not significantly affect the film formation.
【００２７】このように、本発明者らは、常識的な考え
を覆し、研磨工程または成膜工程の後に切断工程を設け
ることで、生産性に優れたプロセスを見出したのであ
る。As described above, the inventors of the present invention overturned the common sense and found a process having excellent productivity by providing the cutting process after the polishing process or the film forming process.
【００２８】一方、たとえば、テープ状基材を用いる場
合、最終的に線材として必要な幅は、多くの場合５ｍｍ
程度以下でよい。しかしながら、５ｍｍ以下という幅
は、通常の研磨に用いられる研磨ディスクにとって、研
磨を良好に行なうためには狭すぎるうえ、レーザアブー
ション法により超電導膜を蒸着させるにも狭すぎた。ま
た、生産性を向上させるため、幅の狭い複数の基材につ
いて同時に研磨したり、成膜を行なったりすることも考
えられたが、研磨ディスクや成膜装置の機構は複雑であ
り、これを実用化することは困難であった。On the other hand, for example, when a tape-shaped substrate is used, the width finally required as a wire is often 5 mm.
It may be less than or equal to the degree. However, the width of 5 mm or less is too narrow for a polishing disk used for ordinary polishing to perform good polishing, and too narrow for vapor deposition of a superconducting film by a laser ablation method. In addition, in order to improve productivity, it was possible to simultaneously polish or form a film on a plurality of narrow base materials, but the mechanism of the polishing disk and the film forming apparatus is complicated, It was difficult to put it into practical use.
【００２９】これに対して、第１および第２の発明に従
えば、より幅広のテープ状基材について従来よりも適切
な条件下で研磨および成膜を行なうことができた。On the other hand, according to the first and second aspects of the invention, it was possible to perform polishing and film formation on a wider tape-shaped substrate under more appropriate conditions than in the past.
【００３０】さらに、マグネットやケーブル等に利用さ
れる超電導線を、その要求される臨界電流や形状に応じ
て提供しようとする場合、研磨工程または成膜工程の後
に切断工程を有する第１および第２の発明は、より生産
性の高い方法として有用である。Further, when it is intended to provide a superconducting wire used for a magnet, a cable or the like according to the required critical current or shape thereof, the first and the first steps having a cutting step after the polishing step or the film forming step. Invention 2 is useful as a method with higher productivity.
【００３１】[0031]
実施例１ 厚さ０．１ｍｍ、幅２５ｍｍ、長さ１ｍのハステロイＣ
テープを基材として用いた。この基材の表面を、平均粒
径０．１μｍのアルミナ粒子を用いて研磨した。この研
磨は、２０ｋｇｆで荷重されたロールにより基材を直径
４００ｍｍのディスク上に押しつけながら行なった。Example 1 Hastelloy C having a thickness of 0.1 mm, a width of 25 mm and a length of 1 m
The tape was used as a substrate. The surface of this base material was polished using alumina particles having an average particle diameter of 0.1 μm. This polishing was performed while pressing the base material onto a disk having a diameter of 400 mm by a roll loaded with 20 kgf.
【００３２】次に、研磨された基材上に、まず厚さ０．
５μｍのイットリア安定化ジルコニア（ＹＳＺ）中間層
を形成し、次いでその上に、厚さ１μｍのＹＢａ2 Ｃｕ
3 Ｏ 7-y 酸化物高温超電導層を形成した。いずれの層
も、レーザアブーションにより次の条件で形成された。Next, on the polished substrate, first, a thickness of 0.
5 μm yttria-stabilized zirconia (YSZ) interlayer
And then on top of it 1 μm thick YBa2Cu
3O 7-yAn oxide high temperature superconducting layer was formed. Which layer
Was also formed by laser ablation under the following conditions.
【００３３】（ＹＳＺ中間層成膜条件） ターゲット：８％Ｙ2 Ｏ3 −ＺｒＯ（５０φ） 雰囲気ガス：Ａｒ−１０％Ｏ2 ガス圧：１０ｍｔｏｒｒ 基板温度：７００℃ エネルギー密度：３．５Ｊ／ｃｍ2 レーザ繰返し周波数：４０Ｈｚ ターゲット−基板間距離：５０ｍｍ （ＹＢａ2 Ｃｕ3 Ｏ7-y 成膜条件） ターゲット：ＹＢａ2 Ｃｕ3 Ｏ7-y （５０φ） 雰囲気ガス：１０％Ｏ2 ガス圧：２００ｍｔｏｒｒ 基板温度：６５０℃ エネルギー密度：３．５Ｊ／ｃｍ2 レーザ繰返し周波数：８０Ｈｚ ターゲット−基板間距離：５０ｍｍ このようにして超電導層を形成した線材について、Ｊｃ
を測定したところ、１ｍ全長にわたり、７７Ｋにおいて
２６，０００Ａ／ｃｍ2 のＪｃを達成した。このプロセ
スにおいて、真空引きやヒータ加熱を含む準備時間を除
き、研磨時間は３０分／ｍ、中間層成膜時間は８時間／
ｍ、超電導層成膜時間は１２時間／ｍであった。(YSZ intermediate layer film forming conditions) Target: 8% Y 2 O 3 -ZrO (50φ) Atmosphere gas: Ar-10% O 2 Gas pressure: 10 mtorr Substrate temperature: 700 ° C. Energy density: 3.5 J / cm 2 laser repetition frequency: 40 Hz Target-substrate distance: 50 mm (YBa 2 Cu 3 O 7-y film forming condition) Target: YBa 2 Cu 3 O 7-y (50φ) Atmosphere gas: 10% O 2 Gas pressure: 200 mtorr Substrate temperature: 650 ° C. Energy density: 3.5 J / cm 2 Laser repetition frequency: 80 Hz Target-substrate distance: 50 mm Regarding the wire material on which the superconducting layer was formed in this way, Jc
Was measured, and a Jc of 26,000 A / cm 2 was achieved at 77K over the entire length of 1 m. In this process, the polishing time is 30 minutes / m and the intermediate layer film formation time is 8 hours / excluding the preparation time including evacuation and heater heating.
m, and the superconducting layer film formation time was 12 hours / m.
【００３４】次に、得られたテープ状線材の前後に予備
のテープをスポット溶接して、通常の乾式スリッタで５
ｍｍ幅に切断した。その結果、長さ約１ｍ、幅５ｍｍの
テープ状超電導線が５本作製された。この工程におい
て、切断時間は１分／ｍであった。したがって、５本の
線材を得るために約４分の切断時間しか要さなかった。
得られた各線材のＪｃを測定したところ、切断する前と
同等の値が得られた。Next, spare tapes are spot-welded on the front and back of the obtained tape-shaped wire rod, and the tape is welded with an ordinary dry slitter.
It was cut to a width of mm. As a result, five tape-shaped superconducting wires having a length of about 1 m and a width of 5 mm were produced. In this step, the cutting time was 1 minute / m. Therefore, only about 4 minutes of cutting time was required to obtain 5 wires.
When the Jc of each obtained wire was measured, the same value as before cutting was obtained.
【００３５】実施例２ 実施例１で用いたのと同じ基材を実施例１と同様にして
研磨した。次に、通常の乾式スリッタを用いて、基材を
５ｍｍ幅に切断し、長さ１ｍ、幅５ｍｍの基材を５本得
た。Example 2 The same substrate used in Example 1 was polished as in Example 1. Next, using a normal dry slitter, the base material was cut into a width of 5 mm to obtain five base materials each having a length of 1 m and a width of 5 mm.
【００３６】その後、それぞれの基材上に、まず厚さ
０．５μｍのＹＳＺ中間層を形成し、次いで厚さ１μｍ
のＹＢａ2 Ｃｕ3 Ｏ7-y 酸化物高温超電導層を形成し
た。これらの層はレーザアブーションにより形成され、
形成条件は実施例１と同様であった。Thereafter, a YSZ intermediate layer having a thickness of 0.5 μm is first formed on each substrate, and then a thickness of 1 μm is formed.
YBa 2 Cu 3 O 7-y oxide high temperature superconducting layer was formed. These layers are formed by laser ablation,
The forming conditions were the same as in Example 1.
【００３７】得られた５本の超電導線についてＪｃを測
定したところ、１ｍ全長にわたり、７７Ｋにおいて２
６，０００Ａ／ｃｍ2 のＪｃを得ることができた。この
プロセスにおいて、真空引きやヒータ加熱を含む準備時
間を除き、研磨時間は３０分／ｍ、中間層成膜時間は８
時間／ｍ、超電導層成膜時間は１２時間／ｍであった。
一方、切断時間は１分／ｍであった。Jc was measured for the obtained five superconducting wires, and the Jc was 2 at 77K over the entire length of 1 m.
It was possible to obtain Jc of 6,000 A / cm 2 . In this process, the polishing time is 30 minutes / m and the intermediate layer film formation time is 8 except for the preparation time including evacuation and heater heating.
Time / m, the superconducting layer film formation time was 12 hours / m.
On the other hand, the cutting time was 1 minute / m.
【００３８】一方、比較のため、厚さ０．１ｍｍ、幅５
ｍｍ、長さ１ｍのハステロイＣテープを基材とし、実施
例１と同様にして研磨および成膜を行なって超電導線を
得た。得られた超電導線のＪｃは、７７Ｋにおいて２
６，０００Ａ／ｃｍ2 であった。このプロセスにおい
て、真空引きやヒータ加熱を含む準備時間を除き、研磨
時間は３０分／ｍ、中間層成膜時間は８時間／ｍ、超電
導層成膜時間は１２時間／ｍであった。On the other hand, for comparison, the thickness is 0.1 mm and the width is 5 mm.
Using a Hastelloy C tape of mm in length and 1 m in length as a base material, polishing and film formation were carried out in the same manner as in Example 1 to obtain a superconducting wire. The Jc of the obtained superconducting wire was 2 at 77K.
It was 6,000 A / cm 2 . In this process, the polishing time was 30 minutes / m, the intermediate layer film formation time was 8 hours / m, and the superconducting layer film formation time was 12 hours / m, excluding the preparation time including evacuation and heater heating.
【００３９】以上の実験結果から明らかなように、予め
研磨された幅広の基材を切断してその上に超電導膜を形
成するか、幅広の超電導線を形成した後切断を行なって
複数の超電導線を得た場合でも、幅の狭い基材について
研磨および成膜を行なった場合と同等のＪｃを有する超
電導線が得られることがわかる。したがって、研磨した
基材を切断して超電導層を形成することにより、研磨時
間を短縮することができ、超電導膜まで形成した基材を
切断することにより、研磨時間および成膜時間を短縮す
ることができた。このように本発明に従えば、基材上に
超電導膜を形成して複数の超電導線を得るに際し、研磨
時間および／または成膜時間を大幅に短縮して、そのプ
ロセスの生産性を向上させることができる。As is clear from the above experimental results, a wide base material that has been polished in advance is cut to form a superconducting film on it, or a wide superconducting wire is formed and then cut to form a plurality of superconducting films. It can be seen that even when a wire is obtained, a superconducting wire having Jc equivalent to that when polishing and forming a film on a narrow base material is obtained. Therefore, the polishing time can be shortened by cutting the polished base material to form the superconducting layer, and the polishing time and the film forming time can be shortened by cutting the base material formed up to the superconducting film. I was able to. Thus, according to the present invention, when forming a superconducting film on a substrate to obtain a plurality of superconducting wires, the polishing time and / or the film forming time is significantly shortened to improve the productivity of the process. be able to.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 藤野 剛三 大阪市此花区島屋一丁目１番３号 住友電 気工業株式会社大阪製作所内 (72)発明者 原 築志 東京都調布市西つつじケ丘二丁目４番１号 東京電力株式会社技術研究所内 (72)発明者 石井 英雄 東京都調布市西つつじケ丘二丁目４番１号 東京電力株式会社技術研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Gozo Fujino 1-3-3 Shimaya, Konohana-ku, Osaka City Sumitomo Electric Industries, Ltd. Osaka Works (72) Inventor Tsukushi Hara, Nishitsujikigaoka, Chofu-shi, Tokyo 4-4 No. 1 TEPCO Technical Research Institute (72) Inventor Hideo Ishii 2-4-1, Nishi Tsutsujigaoka, Chofu-shi, Tokyo TEPCO Technical Research Institute
Claims (2)
なる超電導線の製造方法であって、 前記基材の表面を研磨する工程と、 研磨された基材を切断して複数に分割する工程と、 複数に分割された基材の研磨された表面に酸化物高温超
電導膜をそれぞれ形成する工程とを備える、超電導線の
製造方法。1. A method of manufacturing a superconducting wire, which comprises forming a high-temperature oxide superconducting film on a base material, which comprises a step of polishing the surface of the base material, and cutting the polished base material into a plurality of pieces. A method of manufacturing a superconducting wire, comprising: a step of dividing; and a step of forming an oxide high temperature superconducting film on a polished surface of a plurality of divided substrates.
なる超電導線の製造方法であって、 基材の表面を研磨する工程と、 研磨された基材表面に酸化物高温超電導膜を形成する工
程と、 次いで、前記基材を切断して複数の超電導線を得る工程
とを備える、超電導線の製造方法。2. A method for producing a superconducting wire, which comprises forming an oxide high-temperature superconducting film on a substrate, the step of polishing the surface of the substrate, and the oxide high-temperature superconducting film on the polished substrate surface. And a step of cutting the substrate to obtain a plurality of superconducting wires.
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|---|---|---|---|
| JP21996692A JP3320782B2 (en) | 1992-08-19 | 1992-08-19 | Superconducting wire manufacturing method |
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|---|---|---|---|
| JP21996692A JP3320782B2 (en) | 1992-08-19 | 1992-08-19 | Superconducting wire manufacturing method |
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|---|---|
| JPH0668727A true JPH0668727A (en) | 1994-03-11 |
| JP3320782B2 JP3320782B2 (en) | 2002-09-03 |
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| JP21996692A Expired - Fee Related JP3320782B2 (en) | 1992-08-19 | 1992-08-19 | Superconducting wire manufacturing method |
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| US6498302B2 (en) | 2000-04-25 | 2002-12-24 | Sumitomo Electric Industries, Ltd. | Multifilamentary oxide superconducting wire and method of producing the same, and stranded oxide superconducting wire and method of producing the same |
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| JP2009500843A (en) * | 2005-07-06 | 2009-01-08 | コリアポリテクニック大学 | Superconducting magnet for permanent current and manufacturing method thereof |
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