JPH0665703A - Hot-dip metal coating method and device therefor - Google Patents

Hot-dip metal coating method and device therefor

Info

Publication number
JPH0665703A
JPH0665703A JP4245754A JP24575492A JPH0665703A JP H0665703 A JPH0665703 A JP H0665703A JP 4245754 A JP4245754 A JP 4245754A JP 24575492 A JP24575492 A JP 24575492A JP H0665703 A JPH0665703 A JP H0665703A
Authority
JP
Japan
Prior art keywords
plating
bath
hot
pulling
molten metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4245754A
Other languages
Japanese (ja)
Inventor
Katsuto Tani
克人 谷
Yoshinori Fukugi
義規 福木
Kazuhisa Tanaka
一久 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumiden Fine Conductors Co Ltd
Original Assignee
Sumiden Fine Conductors Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumiden Fine Conductors Co Ltd filed Critical Sumiden Fine Conductors Co Ltd
Priority to JP4245754A priority Critical patent/JPH0665703A/en
Publication of JPH0665703A publication Critical patent/JPH0665703A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide a hot-dip metal coating method by which hot dipping metal bath surface at pulling-up part of a wire material is made to be clean condition without any oxide and the other impurities and a metal coated layer having uniform thickness and flatness is obtd. over the whole surface of the wire material at the time of applying the hot-dip metal coating by dipping the wire material of copper wire, etc., into the hot dipping metal bath. CONSTITUTION:In the hot-dip metal coating method for forming the metal coated layer on the surface of the wire material by dipping the wire material (b) into the hot dipping metal bath of molten metal (a) and pulling up to out of the bath, a jetting device 3 for developing the jet by circulating the molten metal (a) in the hot dipping metal bath is provided to form the jet at the pulling-up part A of the wire material (b) from the hot dipping metal bath. Further, the pulling-up part A from the hot dipping metal bath is made to be in the non-oxidized gaseous atmosphere. By jetting, the impurities near the pulling-up part are always made flow out and by making into the non-oxidized gaseous atmosphere, the generation of the oxide film is prevented.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、抵抗器,コンデンサ,
ダイオード,センサ等の各種電子部品のリード或は端子
などとして使用される線条体のめっき方法及びその装置
に関するものである。
The present invention relates to a resistor, a capacitor,
The present invention relates to a method and apparatus for plating filaments used as leads or terminals of various electronic parts such as diodes and sensors.

【0002】[0002]

【従来の技術】線条体に錫又は錫鉛合金(半田)をめっ
きする方法として、大別して電気めっき法と溶融めっき
法がある。溶融めっき法は電気めっき法と比較して、
設備費用が安い,めっき条件の管理が簡単,めっき
廃液がでない等の長所がある一方で、厚さが均一で、表
面が平滑なめっき層を得難いといった欠点がある。
2. Description of the Related Art As methods for plating tin or tin-lead alloy (solder) on a filament, there are roughly classified an electroplating method and a hot dipping method. Compared with electroplating, hot dip plating is
While it has advantages such as low equipment cost, easy management of plating conditions, and no waste plating solution, it has drawbacks that it is difficult to obtain a plating layer having a uniform thickness and a smooth surface.

【0003】これら欠点には、めっき厚さでは、線条体
の横断面で、一方が厚く、他方が薄い偏肉現象や、線条
体の所々で局部的にめっき厚が極小になる「はじき」現
象、或は線条体の長さ方向に竹の節のように周期的にめ
っき厚が変動する現象などがあり、表面平滑性では、表
面の微細な凹凸や、一様でない表面酸化、或は表面への
不純物の付着などがある。
These drawbacks include, in terms of the plating thickness, one side is thick and the other side is thin in the cross-section of the filamentous body, and the plating thickness is locally minimized in the filamentous body. There is a phenomenon such as the phenomenon that the plating thickness changes periodically in the length direction of the filamentous body like a bamboo knot. For surface smoothness, fine irregularities on the surface, uneven surface oxidation, Alternatively, there is adhesion of impurities to the surface.

【0004】このような欠点を克服すべく提案された技
術として、特開昭62-7840 号公報に記載された発明があ
る。これは、図3に示すように、金属線条体22をめっき
浴21に浸漬し、垂直に引き上げてめっきを行う装置であ
って、線条体のめっき浴導入部B及び引き上げ部Aに不
活性ガスシール部23を具えるものである。このようなシ
ール部13により、めっき浴表面の酸化を防止し、均一な
めっき層の障害となる酸化膜の影響を排除するのであ
る。
As a technique proposed to overcome such drawbacks, there is an invention described in Japanese Patent Laid-Open No. 62-7840. As shown in FIG. 3, this is a device for immersing a metal filament 22 in a plating bath 21 and vertically pulling it up to perform plating. The active gas seal portion 23 is provided. By such a seal portion 13, the surface of the plating bath is prevented from being oxidized, and the influence of the oxide film which hinders the uniform plating layer is eliminated.

【0005】[0005]

【発明が解決しようとする課題】このように、めっき浴
における金属線条体の導入部B及び引き上げ部Aにガス
シールを行えば、かなりの改善はできるが、引き上げ部
Aから酸化物や不純物をなくすることはできない。ガス
シールをしてもなお引き上げ部Aから酸化物や不純物を
除去できない最大の理由は、金属線条体22に塗布されて
めっき浴中に持ち込まれるフラックスにある。即ち、金
属線条体22は、前処理としてフラックス溶液に浸漬し、
表面にこれを塗布される(図示せず)。塗布されたフラ
ックスは、線条体と共にめっき浴中に持ち込まれ、フラ
ックス効果を発揮すると同時に、一部は線条体表面と、
他の一部は溶融金属と反応して反応生成物を作る。さら
に、他の一部は熱分解し、分解生成物を作る。これらの
生成物は線条体表面に付着し、又はめっき浴中を介して
引き上げ部に達し、ガスシール部内のめっき浴表面に蓄
積されてめっき層の均一性を阻害するからである。さら
に、金属線条体表面の酸化膜も引き上げ部汚染の原因と
なるし、ガスシールを行ってもめっき浴表面の酸化を完
全に防止することは実際上不可能である。
As described above, if a gas seal is applied to the introduction part B and the pulling part A of the metal filament in the plating bath, a considerable improvement can be made, but oxides and impurities from the pulling part A can be improved. You can't get rid of it. The largest reason why oxides and impurities cannot be removed from the pulled-up portion A even with gas sealing is the flux applied to the metal filament 22 and brought into the plating bath. That is, the metal filament 22 is immersed in the flux solution as a pretreatment,
It is applied to the surface (not shown). The applied flux is brought into the plating bath together with the filaments to exert a flux effect, and at the same time, part of the filament surface
Another part reacts with the molten metal to form a reaction product. In addition, some others are pyrolyzed to produce decomposition products. This is because these products adhere to the surface of the filamentous body or reach the pulling up portion through the plating bath and accumulate on the surface of the plating bath in the gas seal portion to impede the uniformity of the plating layer. Further, the oxide film on the surface of the metal filament also causes contamination of the pulled-up portion, and it is practically impossible to completely prevent the oxidation of the surface of the plating bath even if gas sealing is performed.

【0006】[0006]

【課題を解決するための手段】本発明はこのような課題
を解決するためになされたものであって、線条体引き上
げ部のめっき浴表面を酸化物やその他の不純物のない清
浄な状態とし、線条体全面にわたって厚みや平滑性の均
一なめっき層が得られるめっき方法及び装置を提供する
ものである。
The present invention has been made in order to solve the above problems, and the surface of the plating bath of the linear body pulling portion is made clean without any oxides or other impurities. The present invention provides a plating method and apparatus capable of obtaining a plating layer having a uniform thickness and smoothness over the entire surface of a filament.

【0007】その特徴は、線条体を溶融金属のめっき浴
中に浸漬し、浴外へ引き上げることにより該線条体表面
にめっき層を形成する溶融めっき方法において、前記線
条体のめっき浴引き上げ部に溶融金属の噴流を形成し、
かつこのめっき浴引き上げ部を非酸化性ガス雰囲気とす
ることにある。そして、この方法を実施する装置は、溶
融金属を貯溜するめっき浴槽内に、該溶融金属中に浸漬
され引き上げられる線条体を案内するシンカーローラー
と、前記溶融金属を循環させて噴流を発生する噴流装置
を具え、該噴流装置のノズルを線条体のめっき浴引き上
げ部に配置し、この引き上げ部を非酸化性ガス雰囲気と
するガスシール室を具えることを特徴とする。
[0007] Its characteristic is that in the hot dip plating method of forming a plating layer on the surface of the filament by immersing the filament in a molten metal plating bath and pulling it out of the bath. Form a jet of molten metal in the pulling up part,
Moreover, this plating bath pulling up part is made into a non-oxidizing gas atmosphere. An apparatus for carrying out this method is a plating bath for storing molten metal, and a sinker roller for guiding a linear body immersed in the molten metal and pulled up, and a jet flow by circulating the molten metal. It is characterized in that it is equipped with a jet device, the nozzle of the jet device is arranged at the plating bath pull-up part of the linear body, and the pull-up part is provided with a gas seal chamber which makes a non-oxidizing gas atmosphere.

【0008】図に基づいて本発明の一具体例を説明す
る。 (めっき装置)図1は本発明装置の概略を示す構成図
で、めっき浴槽1は外周にヒーター(図示せず)を具
え、内部にめっき層を形成する溶融金属aを貯溜し、そ
の温度を制御するものである。めっきは、溶融金属中に
線条体bを浸漬し、これを垂直に引き上げることにより
行うのであるが、このようなめっき浴槽1内には、前記
線条体11を案内するシンカーロール2と噴流装置3が具
えられている。
A specific example of the present invention will be described with reference to the drawings. (Plating apparatus) FIG. 1 is a schematic diagram showing the apparatus of the present invention. The plating bath 1 is provided with a heater (not shown) on the outer periphery thereof, and a molten metal a for forming a plating layer is stored inside and the temperature thereof is adjusted. To control. The plating is carried out by immersing the filament b in the molten metal and pulling it up vertically. In such a plating bath 1, the sinker roll 2 for guiding the filament 11 and the jet flow. Device 3 is provided.

【0009】噴流装置3は、溶融金属aを循環させて線
条体bの引き上げ部Aに噴流を発生させるもので、例え
ば、密閉容器に溶融金属の取り込み口6及び噴き出しノ
ズル5並びに圧入型ポンプ4を具え、取り込み口6から
噴流装置内へ溶融金属aを取り込み、これをノズル5か
らオーバーフローさせて噴流とするものである。ノズル
から噴流として噴き出された溶融金属は、一部が線条体
にめっき層として付着し、他はめっき浴に環流される。
通常、めっき浴内の不純物は、その表面に浮遊するか底
部に沈殿するものが多く、前記取り込み口6はこれら不
純物のないめっき浴中間層に設けることが好ましい。
又、前記ノズル5は、めっき浴の引き上げ部Aに、線条
体bを囲む形で設けられ、その開口縁はめっき浴表面よ
り若干高く設定されている。尚、線条体bを該ノズル5
に導入するにあたっては、ガイドダイス7を用いてい
る。
The jet device 3 circulates the molten metal a to generate a jet at the pulling portion A of the filament b. For example, the molten metal intake 6 and the jet nozzle 5 and the press-fitting pump are provided in a closed container. 4, the molten metal a is taken into the jet device from the take-in port 6 and overflows from the nozzle 5 to form a jet flow. A part of the molten metal ejected as a jet from the nozzle adheres to the linear body as a plating layer, and the other part is circulated to the plating bath.
Usually, most of the impurities in the plating bath float on the surface or precipitate at the bottom, and the intake port 6 is preferably provided in the plating bath intermediate layer free of these impurities.
Further, the nozzle 5 is provided at the pulling-up portion A of the plating bath so as to surround the filament b, and its opening edge is set to be slightly higher than the surface of the plating bath. The filament b is attached to the nozzle 5
A guide die 7 is used for the introduction.

【0010】そして、このようなめっき浴の線条体引き
上げ部Aは、ガスシール室8により取り囲まれている。
ガスシール室8は、引き上げられた線条体bが通り抜け
る通過孔9と、非酸化性ガスが供給される導入孔10を具
え、その内部を非酸化性ガス雰囲気とできるよう構成さ
れている。ここで、非酸化性ガスとしては、例えばヘリ
ウム,アルゴン,窒素,二酸化炭素の単体或はこれら2
種以上の混合体が用いられる。
The filament pulling portion A of such a plating bath is surrounded by the gas seal chamber 8.
The gas seal chamber 8 is provided with a passage hole 9 through which the pulled-up filamentous body b passes and an introduction hole 10 to which a non-oxidizing gas is supplied, and the inside thereof can be made into a non-oxidizing gas atmosphere. Here, as the non-oxidizing gas, for example, helium, argon, nitrogen, carbon dioxide alone or 2
Mixtures of more than one species are used.

【0011】(めっき方法)このような装置において、
めっき原料として、例えば、錫,鉛又は錫鉛合金等を主
成分とする金属をめっき浴槽1内に入れ、ヒーターで加
熱して溶融し、所定の温度に保持する。これと同時に噴
流装置3を作動させて噴流を発生させ、さらにガスシー
ル室内を非酸化性ガス雰囲気とする。ここで、噴流の流
量は、ノズル5先端の液面が波立たず、かつ不純物が液
面に浮上してきてもこれを常時除去しうるに十分な量と
する。そして、溶融金属中に線条体を導入する。線条体
は、例えば銅線などで、その断面形状は円形,楕円形,
各種多角形等種々のものが適用できる。
(Plating Method) In such an apparatus,
As a plating raw material, for example, a metal containing tin, lead, or a tin-lead alloy as a main component is placed in the plating bath 1, heated by a heater to melt, and maintained at a predetermined temperature. At the same time, the jet device 3 is operated to generate a jet flow, and the inside of the gas seal chamber is made a non-oxidizing gas atmosphere. Here, the flow rate of the jet flow is set to an amount sufficient to always remove impurities even if the liquid surface at the tip of the nozzle 5 does not swell and the impurities float on the liquid surface. Then, the filament is introduced into the molten metal. The filamentous body is, for example, a copper wire, the cross-sectional shape of which is circular, oval,
Various types such as various polygons can be applied.

【0012】溶融金属中に導入された線条体は、先ずシ
ンカーローラー2を介して垂直に引き上げられ、ガイド
ダイス7、ノズル5、ガスシール室8内を経てめっき処
理が施される。ここで、めっき浴の線条体引き上げ部A
は、ノズル5より溶融金属aが噴流となってオーバーフ
ローされているため、液面は順次新たな溶融金属により
更新され、ガスシール室8の酸化抑制効果と相まって酸
化膜が形成されることはない。又、ガスシール室内のめ
っき浴面に不純物が浮遊しても、噴流により線条体付近
に止まることなく流し去られ、めっき層に付着すること
もない。
The filamentous body introduced into the molten metal is first pulled up vertically through the sinker roller 2 and then plated through the guide die 7, the nozzle 5 and the gas seal chamber 8. Here, the filament pull-up part A of the plating bath
Since the molten metal a is jetted and overflows from the nozzle 5, the liquid surface is sequentially updated with new molten metal, and an oxide film is not formed in combination with the effect of suppressing the oxidation of the gas seal chamber 8. . Further, even if impurities float on the surface of the plating bath in the gas seal chamber, they are not washed away by the jet stream in the vicinity of the filaments and are not attached to the plating layer.

【0013】このように、線条体を酸化膜或は不純物が
全くない清浄なめっき浴から引き上げることにより、線
条体表面に均一な厚みで平滑な液状のめっき層を形成す
ることができる。この液状めっき層は、重力によって一
部が流下し、溶融金属の粘度,温度,冷却速度など幾つ
かの条件によって定まる平衡厚さに落ち着く。この間、
めっき層表面に酸化物や不純物がないため、液状めっき
層は何等障害を受けることなく均一かつ一様に流下して
平衡厚さに達し、その結果全長にわたって厚さが均一
で、表面平滑性に優れためっき層が形成される。
As described above, by pulling the filament from a clean plating bath free from any oxide film or impurities, a smooth liquid plating layer having a uniform thickness can be formed on the filament surface. Part of this liquid plating layer flows down due to gravity, and settles to an equilibrium thickness determined by several conditions such as the viscosity of the molten metal, temperature and cooling rate. During this time,
Since there are no oxides or impurities on the plating layer surface, the liquid plating layer flows evenly and evenly without reaching any obstacle to reach the equilibrium thickness, resulting in uniform thickness over the entire length and smooth surface. An excellent plating layer is formed.

【0014】尚、本例では引き上げ部Aのみにガスシー
ル室を設けたが、線条体のめっき浴導入部Bに同様のガ
スシール室を設けてもよい。これにより、線条体導入部
付近のめっき浴面酸化を防止することができる。
In this embodiment, the gas seal chamber is provided only in the pulling up portion A, but a similar gas seal chamber may be provided in the plating bath introducing portion B of the filament. As a result, it is possible to prevent oxidation of the plating bath surface in the vicinity of the filament introducing portion.

【0015】[0015]

【実施例】【Example】

(実施例1)図1に示した装置を用いて実際にめっきを
行った。めっき条件は次の通りである。 線条体:0.6mmφの銅線で前処理にて水溶性フラッ
クスを塗布したもの。 溶融金属:錫90%,鉛10%の半田。 めっき浴温度:280℃ 線速:30m/分 非酸化性ガス:窒素
(Example 1) The plating was actually performed using the apparatus shown in FIG. The plating conditions are as follows. Striatal: A 0.6 mmφ copper wire coated with water-soluble flux by pretreatment. Molten metal: 90% tin, 10% lead solder. Plating bath temperature: 280 ° C Linear velocity: 30 m / min Non-oxidizing gas: Nitrogen

【0016】又、比較例として、図1に示した装置から
噴流装置を取り外し、その他の条件は上記と同様にして
めっきを行った。そして、これらめっき線について、め
っき厚さの均一性と表面の平滑性について評価を行っ
た。厚さの均一性は、製造しためっき線から10m間隔
に50本のサンプルを切り取り、各サンプルについて図
2に示すように4箇所(〜)のめっき厚さを蛍光X
線による厚さ計で測定し、全測定値の平均値及び標準偏
差を求め、標準偏差が小さいほどめっき厚さが均一であ
ると評価した。一方、平滑性は、めっき線1kg程度を
束状にして3名による肉眼検査を行い、10点法(良好
10点)により評価した。その結果を表1に示す。
As a comparative example, the jet apparatus was removed from the apparatus shown in FIG. 1 and plating was performed under the other conditions similar to the above. Then, with respect to these plated wires, the uniformity of the plating thickness and the smoothness of the surface were evaluated. As for the uniformity of the thickness, 50 samples were cut from the manufactured plating wire at intervals of 10 m, and the plating thickness at four places (to) was measured by fluorescent X for each sample as shown in FIG.
The thickness was measured with a line, and the average value and standard deviation of all the measured values were obtained. The smaller the standard deviation, the more uniform the plating thickness was evaluated. On the other hand, the smoothness was evaluated by a 10-point method (good 10 points) by conducting a macroscopic inspection by 3 persons with a plated wire of about 1 kg in a bundle. The results are shown in Table 1.

【0017】[0017]

【表1】 [Table 1]

【0018】同表に示すように、比較例に比べ実施例
は、めっき厚の均一性及び表面平滑性共に大幅に改善さ
れていることが確認された。
As shown in the table, it was confirmed that the examples were significantly improved in both plating thickness uniformity and surface smoothness as compared with the comparative examples.

【0019】(実施例2)次に、前記実施例1のめっき
条件を、線条体:幅2mm,厚さ0.1mmの銅平角
線、溶融金属:錫60%,鉛40%の半田とし、他の条
件は同一としてめっきを行った。比較例として、図1に
示した装置から噴流装置を取り外した装置によりめっき
を行った点も同様である。
(Embodiment 2) Next, the plating conditions of the above Embodiment 1 are as follows: filament: width 2 mm, thickness 0.1 mm, copper flat wire, molten metal: tin 60%, lead 40% solder. The plating was performed under the same other conditions. As a comparative example, plating is carried out by an apparatus in which the jet apparatus is removed from the apparatus shown in FIG.

【0020】そして、得られためっき線について、めっ
き厚さの均一性と表面の平滑性について評価を行った。
評価方法は実施例1と同様であるが、めっき厚さの測定
箇所は、各サンプルについて、平角線の表面2箇所とし
た。その結果を表2に示す。
The obtained plated wire was evaluated for uniformity of plating thickness and surface smoothness.
The evaluation method was the same as in Example 1, but the measurement points of the plating thickness were two points on the surface of the rectangular wire for each sample. The results are shown in Table 2.

【0021】[0021]

【表2】 [Table 2]

【0022】同表に示すように、平角線の場合も、実施
例はめっき厚さ均一性及び表面平滑性共に優れているこ
とが確認された。
As shown in the table, it was confirmed that even in the case of the rectangular wire, the examples are excellent in both plating thickness uniformity and surface smoothness.

【0023】[0023]

【発明の効果】以上説明したように、本発明方法によれ
ば、線条体のめっき浴引き上げ部に噴流を形成すると共
に、その周辺を非酸化性ガス雰囲気とすることで、酸化
物や不純物に影響されることなく、均一なめっき層を形
成することができる。又、本発明装置は、本発明方法を
実施するのに最適なもので、前記効果を確実に達成しう
るものである。
As described above, according to the method of the present invention, a jet flow is formed in the drawing bath of the filamentous body and the periphery thereof is made into a non-oxidizing gas atmosphere, so that oxides and impurities It is possible to form a uniform plating layer without being affected by. Further, the device of the present invention is optimal for carrying out the method of the present invention, and can certainly achieve the above-mentioned effects.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明装置の概略を示す構成図である。FIG. 1 is a configuration diagram showing an outline of a device of the present invention.

【図2】めっき層の厚さ測定に際し、測定箇所を示す説
明図である。
FIG. 2 is an explanatory diagram showing measurement points when measuring the thickness of a plating layer.

【図3】従来のめっき装置を示す構成図である。FIG. 3 is a configuration diagram showing a conventional plating apparatus.

【符号の説明】[Explanation of symbols]

1 めっき浴槽 2 シンカーロール 3 噴流装置 4 圧入型ポンプ 5 ノズル 6 取り込み口 7 ガイドダイス 8 ガスシール室 9 通過孔 10 導入孔 11 銅線 12 めっき層 21 めっき浴 22 金属線条体 23 不活性ガスシール部 a 溶融金属 b 線条体 A 引き上げ部 B 導入部 1 plating bath 2 sinker roll 3 jet device 4 press-fitting pump 5 nozzle 6 intake port 7 guide die 8 gas sealing chamber 9 passage hole 10 introduction hole 11 copper wire 12 plating layer 21 plating bath 22 metal wire strip 23 inert gas seal Part a Molten metal b Striatum A Lifting part B Introducing part

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 線条体を溶融金属のめっき浴中に浸漬
し、浴外へ引き上げることにより該線条体表面にめっき
層を形成する溶融めっき方法において、前記線条体のめ
っき浴引き上げ部に溶融金属の噴流を形成し、かつこの
めっき浴引き上げ部を非酸化性ガス雰囲気とすることを
特徴とする溶融めっき方法。
1. A hot-dip plating method for forming a plating layer on the surface of a filament by immersing the filament in a molten metal plating bath and pulling it out of the bath. 1. A hot dip plating method, characterized in that a jet of molten metal is formed on the surface of the bath, and the pulled-up portion of the plating bath is in a non-oxidizing gas atmosphere.
【請求項2】 溶融金属を貯溜するめっき浴槽内に、該
溶融金属中に浸漬され引き上げられる線条体を案内する
シンカーローラーと、前記溶融金属を循環させて噴流を
発生する噴流装置を具え、該噴流装置のノズルを線条体
のめっき浴引き上げ部に配置し、この引き上げ部を非酸
化性ガス雰囲気とするガスシール室を具えることを特徴
とする溶融めっき装置。
2. A plating bath for storing molten metal, comprising a sinker roller for guiding a linear body immersed in the molten metal and pulled up, and a jet device for circulating the molten metal to generate a jet flow, A hot dip plating apparatus comprising a gas seal chamber in which a nozzle of the jet device is arranged in a drawing bath of a filamentous body, and the drawing portion is in a non-oxidizing gas atmosphere.
JP4245754A 1992-08-21 1992-08-21 Hot-dip metal coating method and device therefor Pending JPH0665703A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4245754A JPH0665703A (en) 1992-08-21 1992-08-21 Hot-dip metal coating method and device therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4245754A JPH0665703A (en) 1992-08-21 1992-08-21 Hot-dip metal coating method and device therefor

Publications (1)

Publication Number Publication Date
JPH0665703A true JPH0665703A (en) 1994-03-08

Family

ID=17138304

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4245754A Pending JPH0665703A (en) 1992-08-21 1992-08-21 Hot-dip metal coating method and device therefor

Country Status (1)

Country Link
JP (1) JPH0665703A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5850869A (en) * 1994-07-20 1998-12-22 Mannesmann Aktiengesellschaft Inversion casting device with crystallizer
JP2007239056A (en) * 2006-03-10 2007-09-20 Sakuratech Co Ltd Hot-dip coating device, and hot-dip coating method
JP2008169461A (en) * 2006-12-14 2008-07-24 Hitachi Cable Ltd Solder plated wire for solar battery and method for producing the same
CN111893414A (en) * 2020-04-30 2020-11-06 武汉钢铁有限公司 Furnace nose annular overflow device of hot coating production line

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5850869A (en) * 1994-07-20 1998-12-22 Mannesmann Aktiengesellschaft Inversion casting device with crystallizer
JP2007239056A (en) * 2006-03-10 2007-09-20 Sakuratech Co Ltd Hot-dip coating device, and hot-dip coating method
JP4585474B2 (en) * 2006-03-10 2010-11-24 サクラテック株式会社 Hot dipping treatment apparatus and hot dipping treatment method
JP2008169461A (en) * 2006-12-14 2008-07-24 Hitachi Cable Ltd Solder plated wire for solar battery and method for producing the same
CN111893414A (en) * 2020-04-30 2020-11-06 武汉钢铁有限公司 Furnace nose annular overflow device of hot coating production line

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