JPH0664869B2 - Magnetic head slider - Google Patents
Magnetic head sliderInfo
- Publication number
- JPH0664869B2 JPH0664869B2 JP19199386A JP19199386A JPH0664869B2 JP H0664869 B2 JPH0664869 B2 JP H0664869B2 JP 19199386 A JP19199386 A JP 19199386A JP 19199386 A JP19199386 A JP 19199386A JP H0664869 B2 JPH0664869 B2 JP H0664869B2
- Authority
- JP
- Japan
- Prior art keywords
- head slider
- functional group
- magnetic head
- lubricant
- medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は磁気デイスク媒体上に塗布された潤滑剤の磁気
ヘツドスライダへの転移及び付着が起らない、長期信頼
性に優れた高性能な磁気ヘツドスライダに関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention does not cause transfer and adhesion of a lubricant coated on a magnetic disk medium to a magnetic head slider, and is excellent in long-term reliability and high performance. A magnetic head slider.
現在、磁気ヘツドスライダ（以下ヘツドスライダと略記
する）として広く使われている型にウインチエスタ・タ
イプとホイツトニ・タイプがある。該ヘツドスライダは
磁気デイスク媒体の停止中は、磁気デイスク媒体面上に
着陸しており、磁気デイスク媒体（以下、媒体と略記す
る）の回転開始時、又は停止時には、媒体表面に接触走
行する。また、高速度での定常回転時には媒体面上かり
離陸して飛行しているが、その浮上量は、0.1〜0.2μｍ
と非常に狭い。そのため、ヘツドスライダへの潤滑剤の
転移、付着が起ると、ヘツドスライダの媒体表面への吸
着を引起す誘因になると共に、ヘツドスライダの浮上姿
勢の変動、悪化の原因となり、媒体とヘツドスライダの
破壊を引起すヘツドクラツシユに至る。このため、磁気
デイスク装置の媒体面上の潤滑剤の塗布量は、ヘツドス
ライダへの転移、媒体へのヘツドスライダの吸着を防止
するため、最適な量にコントロールされている。At present, winch-ester type and Whittony type are widely used as magnetic head sliders (hereinafter abbreviated as head sliders). The head slider lands on the surface of the magnetic disk medium while the magnetic disk medium is stopped, and contacts the surface of the medium when the magnetic disk medium (hereinafter abbreviated as medium) starts to rotate or stops. Also, at the time of steady rotation at high speed, it flies by taking off on the medium surface, and its flying height is 0.1 to 0.2 μm.
And very narrow. Therefore, if the lubricant is transferred to or adheres to the head slider, it may cause adsorption of the lubricant to the medium surface of the head slider, and may cause fluctuations and deterioration of the flying posture of the head slider. Leading to the destruction of the castle. For this reason, the amount of lubricant applied to the medium surface of the magnetic disk device is controlled to an optimum amount in order to prevent transfer to the head slider and adsorption of the head slider to the medium.
その最適量は、塗布方法や使用する潤滑剤によつて個々
に違つているが、潤滑剤の最適塗布量に制御する方法
は、媒体、ヘツドスライダ間の稼動の信頼性を左右する
媒体作製上の重要な技術となつている。The optimum amount varies depending on the coating method and the lubricant used, but the method of controlling the optimum amount of lubricant is effective in manufacturing the medium that affects the reliability of operation between the medium and the head slider. Has become an important technology.
媒体面上への潤滑剤の固定方法は、固体潤滑剤では媒体
面上に凹部を設けて、潤滑剤を物理的に該凹部に入れる
塗布方法や液体潤滑剤ではSiO２などのトツプコート無
機化合物薄膜表面に潤滑剤未満の反応性官能基を化学的
に結合させる方法が開発されてきた。The method of fixing the lubricant on the medium surface is as follows: a solid lubricant is provided with a concave portion on the medium surface, and a lubricant is physically inserted into the concave portion. A liquid lubricant is a top coat inorganic compound thin film such as SiO 2. Methods have been developed to chemically attach reactive functional groups below the lubricant to the surface.
しかし、これらの方法によつて媒体表面に形成された潤
滑層によつても、記録密度の増大に伴うヘツドスライダ
のスペーシングの狭小化によるヘツドスライダへの潤滑
剤の転移を防止することはできなかつた。However, even with the lubricating layer formed on the medium surface by these methods, the transfer of the lubricant to the head slider due to the narrowing of the spacing of the head slider accompanying the increase in recording density cannot be prevented. Nakatsuta.
また、ヘツドスライダの浮上特性は、厳密に設計された
形状以外、ヘツドスライダへの付加物の存在によつて容
易に変化し悪化してしまうため困難が伴い、このためヘ
ツドスライダの処理などによつて潤滑剤の転移を防止す
る技術は全く知られていなかつた。このため、ヘツドス
ライダは、Mn-Znフエライト、Al２Ｏ３・TiCセラミツク
などの材質を所定の形状に加工したままの材質で用いら
れているのが従来の方法であつた。Also, the flying characteristics of the head slider are difficult to change and deteriorate due to the presence of an additive to the head slider, except for the strictly designed shape. However, no technique for preventing the transfer of lubricant has been known. For this reason, the conventional method has been to use the head slider as a material such as Mn-Zn ferrite, Al 2 O 3 .TiC ceramic, etc., which has been processed into a predetermined shape.
本発明の目的は、従来の問題点を解消したヘツドスライ
ダを提供することにある。It is an object of the present invention to provide a head slider that solves the conventional problems.
〔問題点を解決するための手段〕 本発明を概説すれば、本発明はヘツドスライダに関する
発明であつて、無機化合物によつて形成されたヘツドス
ライダにおいて、該ヘツドスライダの表面に化学結合し
た有機シリコン官能基層が設けられていることを特徴と
する。[Means for Solving the Problems] The present invention will be described in brief. The present invention relates to a head slider, and in a head slider formed of an inorganic compound, an organic compound chemically bonded to the surface of the head slider is used. A silicon functional group layer is provided.
本発明は、ヘツドスライダの材質に用いられているMn-Z
n、その他のフエライトやAl２Ｏ３・TiCの混合セラミツ
クなどの表面に有機シリコン官能基を化学結合させるこ
とにより、媒体上の潤滑剤のヘツドスライダへの転移及
び付着を防止することも最も主要な特徴とする。The present invention is based on the Mn-Z used for the material of the head slider.
It is also the most important to prevent the transfer and adhesion of the lubricant on the medium to the head slider by chemically bonding an organosilicon functional group to the surface of other ferrite or a mixed ceramic of Al 2 O 3 · TiC. It is a characteristic.
以下、本発明を図面に基づいて詳細に説明する。従来の
技術によるヘツドスライダの稼動後の横断面図を第２図
に示す。ここで１はヘツドスライダ材である。Hereinafter, the present invention will be described in detail with reference to the drawings. A cross-sectional view of a conventional head slider after operation is shown in FIG. Here, 1 is a head slider material.
従来のヘツドスライダでは、磁気デイスク装置の稼動
時、媒体の回転開始、停止、高速回転の繰返しの結果、
コンタミネーシヨンの炭化水素、吸着水と共に潤滑剤が
媒体より転移し表面に付着する。ここで２はコンタミネ
ーシヨンの炭化水素、３は吸着水、４は潤滑剤である。
この結果、ヘツドスライダの浮上特性が悪化し、ヘツド
クラツシユの原因となり、磁気デイスク装置の信頼性を
低下させる。これに対し、本発明ではヘツドスライダの
表面に均一にかつ単分子層的な極薄膜の有機シリコン官
能基を化学結合させている。第１図は有機シリコン官能
基をヘツドスライダ表面に均一につけた本発明による稼
動後のヘツドスライダの横断面図である。ここで５はヘ
ツドスライダ材に均一な厚さで化学結合している有機シ
リコン官能基層である。有機シリコン官能基をヘツドス
ライダに化学結合させるためにはシリル化反応を用いる
ことができる。該シリル化反応としては、下の（１）式
に示すようにMn-Znフエライト、Al２Ｏ３・TiCなどのヘ
ツドスライダ表面の水酸基を、ヘキサメチルジシラザン
（以下、HMDSと略記する）などのシリル化剤によつて有
機シリコン官能基に変性させる。In the conventional head slider, when the magnetic disk device is operating, the result of repeating the start / stop of the medium rotation and the high-speed rotation,
Along with the hydrocarbon and adsorbed water of contamination, the lubricant transfers from the medium and adheres to the surface. Here, 2 is a hydrocarbon of contamination, 3 is adsorbed water, and 4 is a lubricant.
As a result, the flying characteristics of the head slider are deteriorated, causing head crushing, and reducing the reliability of the magnetic disk device. On the other hand, in the present invention, an extremely thin monolayer organic silicon functional group is chemically bonded uniformly to the surface of the head slider. FIG. 1 is a cross-sectional view of an operating head slider according to the present invention in which an organosilicon functional group is uniformly attached to the surface of the head slider. Reference numeral 5 is an organic silicon functional group layer chemically bonded to the head slider material with a uniform thickness. A silylation reaction can be used to chemically bond the organosilicon functional group to the head slider. As the silylation reaction, as shown in the following formula (1), the hydroxyl groups on the head slider surface of Mn-Zn ferrite, Al 2 O 3 .TiC, etc. are converted to hexamethyldisilazane (hereinafter abbreviated as HMDS), etc. The organosilicon functional group is modified with the silylating agent.
ここで、有機シリコン官能基としては、 で表されるものを用いることができる。ＭはSi、Alなど
の金属あるいは半金属元素である。該有機シリコン官能
基中のSi原子に結合しているアルキル基Ｒ１、Ｒ２、Ｒ
３の種類の違いにより、好ましくは次の４種に分類する
ことができる。本発明の有機シリコン官能基を表面に化
学結合したヘツドスライダを作製するためには、好まし
くは分類中の１種を用いればよい。 Here, as the organosilicon functional group, What is represented by can be used. M is a metal such as Si or Al or a metalloid element. Alkyl groups R 1 , R 2 and R bonded to Si atoms in the organosilicon functional group
It can be preferably classified into the following four types according to the difference in the three types. In order to prepare a head slider in which the organosilicon functional group of the present invention is chemically bonded to the surface, one of the above classifications is preferably used.
Ｒ１、Ｒ２、Ｒ３が共にメチル基 有機シリコン官能基：（CH３）３Si− Ｒ１、Ｒ２はメチル基、Ｒ３はフエニル基 有機シリコン官能基:Ph（CH３）２Si− （ここでPhはフエニル基を示す） Ｒ１、Ｒ２はメチル基、Ｒ３は第３級ブチル基 有機シリコン官能基:t-Bu（CH３）２Si− （ここでt-Buは第３級ブチル基を示す） Ｒ１、Ｒ２はメチル基、Ｒ３はペンタフルオロフエニ
ル基 有機シリコン官能基:C６Ｆ５（CH３）２Si− 該シリル化剤をヘツドスライダ表面に化学結合させる方
法として、シリル化剤中でヘツドスライダを加温反応さ
せる方法、シリル加剤蒸気中に保持する方法、スピンコ
ート法、ワイプ法などを用いることができる。R 1 , R 2 and R 3 are all methyl groups Organic silicon functional group: (CH 3 ) 3 Si— R 1 and R 2 are methyl groups, R 3 is phenyl group Organic silicon functional group: Ph (CH 3 ) 2 Si -(Wherein Ph represents a phenyl group) R 1 and R 2 are methyl groups, R 3 is a tertiary butyl group Organosilicon functional group: t-Bu (CH 3 ) 2 Si- (where t-Bu is It represents a tertiary butyl group) R 1 and R 2 are methyl groups, R 3 is a pentafluorophenyl group Organosilicon functional group: C 6 F 5 (CH 3 ) 2 Si-The silylating agent is applied to the head slider surface. As a method of chemically bonding, a method of heating the head slider in a silylating agent to heat it, a method of holding it in the vapor of the silyl additive, a spin coating method, a wiping method and the like can be used.
このようなシリル化反応によつてヘツドスライダ表面に
形成される有機シリコン官能基は、ヘツドスライダ材に
化学結合している水酸化物などの水素原子が反応（１）
のように、有機シリコン官能基になつた形態としてのみ
存在し、有機シリコン官能基が単分子層的に数オングス
トロームという極薄の均一な厚さの変性層を形成する。
このような有機シリコン官能基の変性層をヘツドスライ
ダ表面に形成する過程において、変性層形成前にヘツド
スライダ表面に必ず付着しているコンタミネーシヨンの
炭化水素や吸着水を排除する。この結果、ヘツドスライ
ダ表面上に有機シリコン官能基が化学結合すると共に、
ヘツドスライダ表面は非常に清浄な表面になる。The organosilicon functional group formed on the surface of the head slider by such a silylation reaction is reacted with a hydrogen atom such as hydroxide chemically bonded to the head slider material (1).
As described above, the organosilicon functional group exists only as a form, and the organosilicon functional group forms a very thin modified layer having a uniform thickness of several angstroms in a monomolecular layer.
In the process of forming such a modified layer of an organosilicon functional group on the head slider surface, hydrocarbons and adsorbed water of contamination that are always attached to the surface of the head slider before forming the modified layer are removed. As a result, an organic silicon functional group is chemically bonded on the head slider surface,
The head slider surface becomes a very clean surface.
第３図はヘツドスライダ材１の表面上に有機シリコン官
能基７が共有結合により単分子層の厚さで結合し、有機
シリコン官能基層５を形成している状態での分子の配向
形態を示す模式図である。ここで６は表面に結合してい
る有機シリコン官能基層と空気相との界面を示す。有機
シリコン官能基層はシリコン原子と官能基（ここで
Ｒ１、Ｒ２、Ｒ３）との相乗効果により、ヘツドスライ
ダ表面にはつ水性を与える。その結果、水蒸気の表面へ
の吸着を防止する。更に、有機シリコン官能基層が低い
表面張力を持つことにより、媒体との接触あるいは潤滑
剤飛まつとヘツドスライダとの衝突によつても、ヘツド
スライダ上への潤滑剤の付着を有効に防止することがで
きる。本発明により従来、磁気デイスク装置の信頼性を
損つていたヘツドスライダの媒体への吸着によるヘツド
クラツシユ及びヘツドスライダの飛行特性の変動による
媒体との接触による摩擦、摩耗の増加、読出し／書込み
特性の低下を防止することができる。更に有機シリコン
官能基層をヘツドスライダ表面に形成すると該官能基層
は長期間空気中で変化しないため、初期に持つていた性
能を維持すると共に、ヘツドスライダへの水分の再吸
着、コンタミネーシヨンの炭化水素の付着を防止するこ
とができるため、磁気デイスク装置の高信頼度化を達成
することができる。FIG. 3 shows the orientation of molecules in a state in which the organic silicon functional group 7 is covalently bonded on the surface of the head slider material 1 by the thickness of a monomolecular layer to form the organic silicon functional group layer 5. It is a schematic diagram. Here, 6 indicates the interface between the organic silicon functional group layer bonded to the surface and the air phase. The organosilicon functional group layer imparts water repellency to the surface of the head slider by the synergistic effect of silicon atoms and functional groups (here, R 1 , R 2 and R 3 ). As a result, the adsorption of water vapor on the surface is prevented. Further, since the organic silicon functional group layer has a low surface tension, it is possible to effectively prevent the lubricant from adhering to the head slider even when it contacts the medium or when the lubricant splashes and collides with the head slider. You can According to the present invention, friction and wear due to contact between the head slider and the medium due to variations in the flight characteristics of the head clutch due to adsorption of the head slider to the medium, which has been impairing the reliability of the magnetic disk device, increase in read / write characteristics. The decrease can be prevented. Further, when an organosilicon functional group layer is formed on the surface of the head slider, the functional group layer does not change in the air for a long period of time, so that the performance initially held is maintained, moisture is re-adsorbed to the head slider, and carbonization of contamination is performed. Since it is possible to prevent hydrogen from adhering, it is possible to achieve high reliability of the magnetic disk device.
〔実施例〕 以下本発明を実施例により更に具体的に説明するが本発
明はこれら実施例に限定されない。[Examples] Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to these Examples.
実施例１ 第４図は本発明の１実施例を説明する模式図であつて、
分子の配向状態を示す。１はヘツドスライダ材、５は有
機シリコン官能基層、６は有機シリコン官能基層と空気
相との界面、７は有機シリコン官能基であるトリメチル
シリル基を示す。トリメチルシリル基をヘツドスライダ
材の表面に共有結合させるには、ヘツドスライダをHMDS
の液中あるいは蒸気中に100℃前後で保持すればよい。H
MDSとの反応を、ピリジンのようなHMDSと反応した溶媒
中でも行うことができる。ヘツドスライダの表面にトリ
メチルシリル基７がシリル化反応によつて化学結合を形
成する。該シリル化反応の過程において、ヘツドスライ
ダ材の表面に必ず付着しているコンタミネーシヨンの炭
化水素及び吸着水を除去してしまうため、トリメチルシ
リル基で覆われたヘツドスライダ材、表面は非常に清浄
な表面になる。このため、トリメチルシリル基の化学特
性やはつ水性などの特性がほぼ完全に発揮される。ここ
では、パーフルオロポリエーテルのような液体潤滑剤や
固体潤滑剤を塗布してある媒体を用いて本発明の効果を
調べた。その結果、Mn-Znフエライト材質のウインチエ
スタ・タイプ（荷重7gf・トラツク幅15μｍ）やホイツ
トニ・タイプ（荷重7gf・トラツク幅10μｍ）のヘツド
スライダを用いた２万回のCSS試験後、本発明によるヘ
ツドスライダでは、潤滑剤のヘツドスライダへの付着は
全く認められないのに対し、従来のままのヘツドスライ
ダ表面には、多量の潤滑剤の付着が認められた。また本
発明によるヘツドスライダでは相対湿度65％以上の高湿
度領域でも、ヘツドスライダの媒体への吸着が長時間で
も全く起らないのに対し、従来のヘツドスライダでは媒
体への強い吸着が４〜５時間で起り、ヘツドクラツシユ
に至つた。従来型のヘツドスライダでは潤滑剤の付着に
よる浮上特性の悪化に伴い、書込み／読出し特性の性能
劣化が認められたのに対し、本発明のヘツドスライダで
は書込み／読出し特性の劣化がCSS2万回後も全く認めら
れなかつた。Embodiment 1 FIG. 4 is a schematic diagram for explaining one embodiment of the present invention,
The molecular orientation is shown. Reference numeral 1 is a head slider material, 5 is an organosilicon functional group layer, 6 is an interface between the organosilicon functional group layer and the air phase, and 7 is a trimethylsilyl group which is an organosilicon functional group. To covalently bond the trimethylsilyl group to the surface of the head slider material, use the head slider with HMDS.
It may be kept in the liquid or steam at about 100 ° C. H
The reaction with MDS can also be performed in a solvent that has reacted with HMDS such as pyridine. Trimethylsilyl group 7 forms a chemical bond on the surface of the head slider by a silylation reaction. In the process of the silylation reaction, hydrocarbons and adsorbed water of the contamination that are surely attached to the surface of the head slider material are removed, so the head slider material covered with trimethylsilyl group and the surface are very clean. It becomes a smooth surface. Therefore, the chemical properties of the trimethylsilyl group and the properties such as water repellency are almost completely exhibited. Here, the effect of the present invention was investigated using a medium coated with a liquid lubricant such as perfluoropolyether or a solid lubricant. As a result, according to the present invention, after 20,000 CSS tests using a winch-ester type (load 7 gf, track width 15 μm) or Whittoni type (load 7 gf, track width 10 μm) head slider made of Mn-Zn ferrite material, In the head slider, no adhesion of the lubricant to the head slider was observed at all, whereas a large amount of the lubricant was recognized on the surface of the head slider as it was. Further, in the head slider according to the present invention, even in a high humidity region of 65% or more in relative humidity, adsorption of the head slider to the medium does not occur at all for a long time, whereas in the conventional head slider, strong adsorption to the medium is 4 to 4. It took 5 hours to reach the head crass. In the conventional head slider, the deterioration of the write / read characteristics was observed along with the deterioration of the flying characteristics due to the adhesion of the lubricant, whereas in the head slider of the present invention, the write / read characteristics deteriorate after 20,000 CSS. Was never recognized.
更に0.25mmの測定長の最大高さRmax80ÅのSiO２層付ア
ルマイト変性アルミニウム・デイスクを用いて本発明の
ヘツドデイスク及び同一形状の従来品のヘツドデイスク
の接着力を測定した。このとき媒体の最上層にはパーフ
ルオロポリエーテルが塗布されている。Mn-Znフエライ
ト製のウインチエスタ・タイプのヘツドスライダについ
ては本発明の有機シリコン官能基を結合させたヘツドス
ライダでは吸着力は第１表に示すように、2gfであるの
に対し、有機シリコン官能基層の無い従来のヘツドスラ
イダでは20gfと非常に大きかつた。このような大きな吸
着力の結果、ヘツドスライダを支えているジンバルバネ
の座屈が起つた。Further, the adhesion strength of the head disk of the present invention and the conventional head disk of the same shape was measured using an alumite-modified aluminum disk with a SiO 2 layer having a maximum height Rmax of 80Å with a measurement length of 0.25 mm. At this time, the uppermost layer of the medium is coated with perfluoropolyether. As for the winch-ester type head slider made of Mn-Zn ferrite, the head slider having the organosilicon functional group of the present invention has an adsorption force of 2 gf as shown in Table 1, while the adsorption force is 2 gf. The conventional head slider without a base layer was very large, 20gf. As a result of such a large attracting force, the gimbal spring supporting the head slider buckles.
本実施例で用いたHMDSによつてヘツドスライダ表面に形
成されるトリメチルシリル基の代りに、有機シリコン官
能基としてPh（CH３）２Si-、t-Bu（CH３）２Si-又はＣ
６Ｆ５（CH３）２Si-を形成しても同様に優れた効果が
認められた。 Instead of the trimethylsilyl group formed on the head slider surface by HMDS used in this example, Ph (CH 3 ) 2 Si-, t-Bu (CH 3 ) 2 Si- or C as an organosilicon functional group is used.
Even if 6 F 5 (CH 3 ) 2 Si- was formed, the same excellent effect was recognized.
実施例２ ヘツドスライダとしてAl２Ｏ３・TiC製のホイツトニ・
タイプのものを用い、Rmax100Å（測定長ｌ＝0.25mm）
のアルマイト層付アルミニウム基板の磁気デイスク上で
の特性を調べた。トツプコート層はSiO２であり、更に
その上にパーフルオロポリエーテル・ジカルボキシレー
トをスピンコート法により塗布し、その後、加熱して潤
滑層を形成した。ヘツドスライダの形状は第１表中に示
されている。本発明のヘツドスライダの表面には有機シ
リコン官能基層として（CH３）３Si-、Ph（CH３）２Si
-、t-Bu（CH３）２Si-、Ｃ６Ｆ５（CH３）２Si-のうち
の１つが形成されている。４万回のCSS試験後、本発明
によるヘツドスライダでは、潤滑剤のヘツドスライダへ
の転移及び付着が全く認められなかつた。これ対し従来
品にはスライダ部及びその周囲に、多量の潤滑剤の付着
が認められた。また、本発明と従来品のヘツドスライダ
の媒体との吸着力は、第１表に示すように、本発明のヘ
ツドスライダでは3gfであるのに対し、従来品では25gf
と非常に大きく、そのため、ヘツドスライダは正常な浮
上ができず、ヘツドクラツシユに至つた。その他実施例
１と同様の優れた特性を示し、高性能、高信頼度化され
たヘツドスライダを作製することを可能とした。更に、
ヘツトスライダとシリル化剤の反応速度が早く、かつ、
有機シリコン官能基層は単分子層的であるため、試薬量
は少なくて済み、本発明は経済的にも大きなメリツトを
もたらすことができる。Example 2 A head slider made of Al 2 O 3 .TiC
Rmax100Å (measurement length l = 0.25mm)
The characteristics of the aluminum substrate with the alumite layer on the magnetic disk were investigated. The top coat layer was SiO 2 , and perfluoropolyether dicarboxylate was further applied thereon by a spin coat method, and then heated to form a lubricating layer. The shape of the head slider is shown in Table 1. On the surface of the head slider of the present invention, (CH 3 ) 3 Si-, Ph (CH 3 ) 2 Si is formed as an organic silicon functional group layer.
-, t-Bu (CH 3 ) 2 Si-, C 6 F 5 (CH 3) 2 one of Si- are formed. After the CSS test of 40,000 times, in the head slider according to the present invention, no transfer or adhesion of the lubricant to the head slider was observed. On the other hand, in the conventional product, a large amount of lubricant was adhering to the slider and its surroundings. Further, as shown in Table 1, the attraction force between the head slider of the present invention and the medium of the conventional head slider is 3 gf, whereas the head slider of the present invention is 25 gf.
The head slider was unable to fly normally, leading to head crash. In addition, the same excellent characteristics as in Example 1 were exhibited, and it was possible to manufacture a head slider with high performance and high reliability. Furthermore,
The reaction speed of the het slider and the silylating agent is fast, and
Since the organic silicon functional group layer is a monomolecular layer, the amount of reagent is small, and the present invention can bring about a great advantage economically.
以上説明したように、本発明のヘツドスライダによつ
て、長期間、ヘツドスライダへの潤滑剤の転移を防ぐこ
とができると共に、媒体への吸着力を低下させることが
できる。更に高湿度下でもヘツドスライダの媒体への吸
着を防ぐことができる。As described above, according to the head slider of the present invention, the transfer of the lubricant to the head slider can be prevented for a long period of time and the adsorption force to the medium can be reduced. Further, it is possible to prevent adsorption of the head slider to the medium even under high humidity.
このため、長期にわたつて、過酷な雰囲下でも、ヘツド
スライダの正常な浮上、飛行、停止を各特性を得ること
ができるので、磁気デイスク装置の高信頼度化、高性能
化を図ることができる利点がある。また本発明のヘツド
スライダは高速度で経済的に製造することができる利点
をも有している。Therefore, over a long period of time, the head slider can normally fly, fly, and stop even in a harsh atmosphere, so that the magnetic disk device can have high reliability and high performance. There is an advantage that can be. The head slider of the present invention also has the advantage that it can be manufactured economically at high speeds.
第１図は、本発明による有機シリコン官能基層を表面に
設けた、稼動後のヘツドスライダの横断面図、第２図は
従来のヘツドスライダの稼動後の横断面図、第３図はヘ
ツドスライダ材上に共有結合した有機シリコン官能基層
の分子の配向形態を示す模式図、第４図は本発明の１実
施例の分子の配向状態を示す模式図である。 1:ヘツドスライダ材、2:コンタミネーシヨンの炭化水
素、3:吸着水、4:潤滑剤、5:有機シリコン官能基層、6:
有機シリコン官能基層と空気層との界面、7:有機シリコ
ン官能基FIG. 1 is a cross-sectional view of a head slider having an organic silicon functional group layer according to the present invention on its surface after operation, FIG. 2 is a cross-sectional view of a conventional head slider after operation, and FIG. 3 is a head slider. FIG. 4 is a schematic diagram showing an orientation form of molecules of an organic silicon functional group layer covalently bonded on a material, and FIG. 4 is a schematic diagram showing an orientation state of molecules of one embodiment of the present invention. 1: Head slider material, 2: Hydrocarbon of contamination, 3: Adsorbed water, 4: Lubricant, 5: Organosilicon functional group layer, 6:
Interface between organic silicon functional group layer and air layer, 7: organic silicon functional group
───────────────────────────────────────────────────── フロントページの続き (72)発明者 木町 良弘 茨城県那珂郡東海村大字白方字白根162番 地 日本電信電話株式会社茨城電気通信研 究所内 (72)発明者 寺田 章 茨城県那珂郡東海村大字白方字白根162番 地 日本電信電話株式会社茨城電気通信研 究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yoshihiro Kimachi 162 Shirahane, Shirahoji, Tokai-mura, Naka-gun, Ibaraki prefecture, Nippon Telegraph and Telephone Corporation, Ibaraki Telecommunications Research Institute (72) Inventor Akira Terada, Naka-gun, Ibaraki prefecture Tokai-mura, Oita, Shirokata, Shirane 162, Nippon Telegraph and Telephone Corporation, Ibaraki Telecommunications Research Institute
Claims (4)
スライダにおいて、該磁気ヘツドスライダの表面に化学
結合した有機シリコン官能基層が設けられていることを
特徴とする磁気ヘツドスライダ。1. A magnetic head slider formed of an inorganic compound, wherein an organic silicon functional group layer chemically bonded to the surface of the magnetic head slider is provided.
アルキルシリル基である特許請求の範囲第１項記載の磁
気ヘツドスライダ。2. The magnetic head slider according to claim 1, wherein the functional group of the organic silicon functional group layer is a trialkylsilyl group.
リル基である特許請求の範囲第２項記載の磁気ヘツドス
ライダ。3. The magnetic head slider according to claim 2, wherein the trialkylsilyl group is a trimethylsilyl group.
停止時あるいは低速回転時には磁気ヘツドスライダが磁
気デイスクと接触しており、高速の定常回転時には磁気
ヘツドスライダが磁気デイスク上に浮上するタイプの磁
気ヘツドスライダである特許請求の範囲第１項記載の磁
気ヘツドスライダ。4. A magnetic head slider of the type in which the magnetic head slider is in contact with the magnetic disk when the magnetic disk is stopped or is rotating at a low speed, and the magnetic head slider floats above the magnetic disk during a steady rotation at a high speed. The magnetic head slider according to claim 1, which is a head slider.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19199386A JPH0664869B2 (en) | 1986-08-19 | 1986-08-19 | Magnetic head slider |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19199386A JPH0664869B2 (en) | 1986-08-19 | 1986-08-19 | Magnetic head slider |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6348674A JPS6348674A (en) | 1988-03-01 |
| JPH0664869B2 true JPH0664869B2 (en) | 1994-08-22 |
Family
ID=16283829
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19199386A Expired - Fee Related JPH0664869B2 (en) | 1986-08-19 | 1986-08-19 | Magnetic head slider |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0664869B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4082880B2 (en) | 2001-06-15 | 2008-04-30 | 富士通株式会社 | Information storage device |
| RU2728836C2 (en) | 2016-10-28 | 2020-07-31 | Ппг Индастриз Огайо, Инк. | Coatings to increase detection distance to object detected by means of electromagnetic radiation of near infrared range |
| WO2020102181A1 (en) | 2018-11-13 | 2020-05-22 | Ppg Industries Ohio, Inc. | Method of detecting a concealed pattern |
| WO2022233411A1 (en) | 2021-05-05 | 2022-11-10 | Wacker Chemie Ag | Mixtures containing a silirane-functionalized compound and a polymer |
-
1986
- 1986-08-19 JP JP19199386A patent/JPH0664869B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6348674A (en) | 1988-03-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4152487A (en) | Magnetic record member | |
| JPH0359488B2 (en) | ||
| US4069360A (en) | Magnetic record member and process for manufacturing the same | |
| US4649448A (en) | Thin film magnetic head having a sliding surface | |
| US5425988A (en) | Recording and reproducing device which includes a protective film and a monomolecular fluoro organo silicon film | |
| US9214173B2 (en) | Slider with high and low surface energy coatings proximate transducer | |
| JPH0664869B2 (en) | Magnetic head slider | |
| US9153256B2 (en) | Slider with self-assembled monolayer pattern | |
| KR0138251B1 (en) | Magnetic recording medium and its manufacturing method | |
| JPS6352319A (en) | Magnetic memory body and manufacture thereof | |
| JP2846746B2 (en) | Magnetic recording medium and method of manufacturing the same | |
| JPS60223027A (en) | Magnetic disk medium | |
| JP2004295992A (en) | Record medium and its manufacturing method | |
| JPH01240598A (en) | Magnetic storage and production thereof | |
| JPS5829148A (en) | Magnetic recording medium | |
| Jiang et al. | Tribological properties of OTS self-assembled monolayers | |
| JPH0465454B2 (en) | ||
| JP2924052B2 (en) | Magnetic storage body and method of manufacturing the same | |
| JPS5939809B2 (en) | magnetic memory | |
| JPH09265616A (en) | Magnetic head and its production | |
| JPH04298817A (en) | Magnetic recording medium | |
| JPH0388189A (en) | Magnetic disk device | |
| JPS62270018A (en) | Magnetic disk medium | |
| JPH0668832B2 (en) | Magnetic storage body and manufacturing method thereof | |
| JPS63298816A (en) | Magnetic disk medium |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |