JPH0663088B2 - Continuous composite coating equipment for strips - Google Patents
Continuous composite coating equipment for stripsInfo
- Publication number
- JPH0663088B2 JPH0663088B2 JP4638386A JP4638386A JPH0663088B2 JP H0663088 B2 JPH0663088 B2 JP H0663088B2 JP 4638386 A JP4638386 A JP 4638386A JP 4638386 A JP4638386 A JP 4638386A JP H0663088 B2 JPH0663088 B2 JP H0663088B2
- Authority
- JP
- Japan
- Prior art keywords
- coating
- layer
- strip
- cvd
- composite coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は金属やプラスチックなどの各種帯板の表面に１
層、２層あるいは多層のコーティングを連続的に施すた
めの装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION INDUSTRIAL APPLICABILITY The present invention is applied to the surface of various strips of metal or plastic.
It relates to a device for the continuous application of layer, double-layer or multi-layer coatings.
従来の技術 材料に耐食性や装飾性などを付与するために、表面にコ
ーティングを施す手段として、塗装、メッキ、蒸着など
が古くから行われている。近年、イオンプレーティン
グ、スパッタリング、プラズマCVD（chemical vapor de
position）などのいわゆるドライコーティング法によ
り、優れた耐食性、装飾性、耐摩耗性を有する被覆層が
得られることがわかり、このような方法によってコーテ
ィングされた高付加価値材料の要求が高まっている。Conventional techniques In order to impart corrosion resistance and decorative properties to materials, coating, plating, vapor deposition, etc. have long been performed as means for coating the surface. In recent years, ion plating, sputtering, plasma CVD (chemical vapor de
It has been found that a coating layer having excellent corrosion resistance, decorativeness and abrasion resistance can be obtained by a so-called dry coating method such as position), and there is an increasing demand for high value-added materials coated by such a method.
発明が解決しようとする問題点 従来のドライコーティング法は、切板などを真空容器に
入れてコーティングするバッチ処理によって行われてお
り、また、帯板に連続的にコーティングする方法も知ら
れているが、いずれも単一の処理である。各種ドライコ
ーティング法により施された皮膜は、それぞれ特有の特
性を有しているで、単一の処理手段では、限られた特性
のものしか得られない。Problems to be Solved by the Invention A conventional dry coating method is performed by a batch process in which a cut plate or the like is placed in a vacuum container for coating, and a method for continuously coating a strip plate is also known. However, each is a single process. The films formed by various dry coating methods have their own unique characteristics, so that only a single processing means can obtain only those with limited characteristics.
本発明は、帯板に連続的に複数のドライコーティングを
施し、単層あるいは多層の被覆層を生成させ、耐食性、
装飾性、耐摩耗性などの各種多様の特性を有するコイル
製品を比較的短時間で製造する設備を目的とする。The present invention continuously applies a plurality of dry coatings to a strip to form a single-layer or a multi-layer coating layer, corrosion resistance,
The purpose of the present invention is to provide equipment for manufacturing coil products having various characteristics such as decorativeness and wear resistance in a relatively short time.
問題点を解決するための手段 本発明は、２基の巻出巻取装置の間に差圧シール装置を
介して真空容器を設け、該真空容器内にイオンプレーテ
ィング装置（以下IP装置という）とスパッタリング装置
（以下SP装置という）とプラズマCVD装置（以下Ｐ−CVD
装置という）を直列に設けたことを特徴とする。Means for Solving the Problems The present invention provides a vacuum container between two unwinding and winding devices via a differential pressure sealing device, and an ion plating device (hereinafter referred to as an IP device) in the vacuum container. And sputtering equipment (hereinafter SP equipment) and plasma CVD equipment (hereinafter P-CVD)
Device) is provided in series.
以下に本発明設備を第１図に示す一例によって説明す
る。２基の巻出巻取装置１、１の間に差圧シール装置
５、５を介して真空容器６が設けられ、真空容器６内に
IP装置２とSP装置３とＰ−CVD装置４が直列に設けられ
ている。The equipment of the present invention will be described below with reference to an example shown in FIG. A vacuum container 6 is provided between the two unwinding and winding devices 1 and 1 with a differential pressure sealing device 5 and 5 interposed therebetween.
The IP device 2, the SP device 3, and the P-CVD device 4 are provided in series.
真空容器６は、差圧シール装置５、５の間で一体的に構
成され、排気装置Ｐにより各部位が所定の真空度に保た
れるよう排気される。The vacuum container 6 is integrally configured between the differential pressure sealing devices 5 and 5, and is evacuated by the evacuation device P so that each part is maintained at a predetermined degree of vacuum.
巻出巻取装置１、１は、帯板Ｓのコイルを巻き出し、あ
るいは巻き出された帯板Ｓを巻取るものであって、真空
容器６の外側の大気中に設けられている。The unwinding / winding devices 1 and 1 unwind the coil of the strip S or wind up the unrolled strip S, and are provided in the atmosphere outside the vacuum container 6.
差圧シール装置５は、大気と真空の間を段階的にシール
するものであり、第１図に示すようなロールを用いるほ
か各種の手段をとることができる。The differential pressure seal device 5 seals between the atmosphere and the vacuum stepwise, and can use various means other than using a roll as shown in FIG.
IP装置２は、蒸発源となるターゲット８を加熱あるいは
電子ビーム照射等により蒸発させイオン化し、帯板Ｓの
表面に被覆層を形成させるものである。The IP device 2 evaporates and ionizes the target 8 as an evaporation source by heating or electron beam irradiation to form a coating layer on the surface of the strip S.
SP装置３は、不活性ガスを電界中でイオン化しターゲッ
ト９に衝突させて、ターゲット９の原子あるいは分子を
はじき出して帯板Ｓの表面に被覆層を形成させるもので
ある。The SP device 3 ionizes an inert gas in an electric field and collides it with the target 9 to eject atoms or molecules of the target 9 to form a coating layer on the surface of the strip S.
Ｐ−CVD装置４は、反応性ガスを電界中でプラズマ化し
化学反応を起させて、帯板Ｓの表面に化学反応による生
成物からなる被覆層を形成させるものである。The P-CVD apparatus 4 is for making a reactive gas into plasma in an electric field to cause a chemical reaction to form a coating layer made of a product of the chemical reaction on the surface of the strip S.
IP装置２、SP装置３、Ｐ−CVD装置４は第１図の順に配
置するほか、任意の順序で直列に配置することができる
が、IP装置２とSP装置３は隣接することが望ましい。The IP device 2, the SP device 3, and the P-CVD device 4 can be arranged in series in any order in addition to the arrangement shown in FIG. 1, but it is desirable that the IP device 2 and the SP device 3 are adjacent to each other.
なお、第１図中の５′は差圧シール装置、７は予熱ヒー
タ、10はガス導入口、11はIP装置ヒータ、12はSP装置ヒ
ータ、13はＰ−CVD装置ヒータ、14はスリットである。
差圧シール装置５′およびスリット14は、IP装置、SP装
置、Ｐ−CVD装置内を所定の真空度に保つためのもので
あり、公知の各種手段を用いてもよい。In FIG. 1, 5'is a differential pressure seal device, 7 is a preheat heater, 10 is a gas inlet, 11 is an IP device heater, 12 is an SP device heater, 13 is a P-CVD device heater, and 14 is a slit. is there.
The differential pressure seal device 5'and the slit 14 are for keeping the inside of the IP device, the SP device and the P-CVD device at a predetermined vacuum degree, and various known means may be used.
作用 巻出巻取装置１、１のいずれか一方に帯板Ｓのコイルを
装着し、帯板Ｓの一端を他方に装着して、真空容器６内
を排気する。つぎにIP装置２、SP装置３、Ｐ−CVD装置
４のうち所望の装置に所望の反応ガスを導入し、各ポン
プＰにより、各装置内を所定の真空度に維持する。つい
で、予熱ヒータ７および所望の装置内のヒータ11、12、
13により帯板Ｓを所定温度に加熱しつつ通板させ、コー
ティングを行う。Action The coil of the strip S is attached to one of the unwinding and winding devices 1 and 1, one end of the strip S is attached to the other, and the inside of the vacuum container 6 is evacuated. Next, a desired reaction gas is introduced into a desired device among the IP device 2, the SP device 3, and the P-CVD device 4, and each pump P maintains the inside of each device at a predetermined vacuum degree. Then, the preheating heater 7 and the heaters 11 and 12 in the desired apparatus are
The strip S is heated to a predetermined temperature by 13 and is passed through the plate for coating.
IP装置２、SP装置３、Ｐ−CVD装置４を第１図のように
配設し、帯板Ｓを第１図の右から左に通板すると、たと
えばIP装置２とＰ−CVD装置４を作動した場合には、イ
オンプレーティング被覆層とプラズマCVD被覆層の２層
コーティングが施される。また第１図の配置で、スパッ
タリング被覆層、プラズマCVD被覆層、イオンプレーテ
ィング被覆層を順に形成した３層コーティングを施す場
合は、まず、SP装置３およびＰ−CVD装置を作動して図
の右から左に通板し、ついでIP装置を作動して図の左か
ら右に通板すればよい。When the IP device 2, the SP device 3, and the P-CVD device 4 are arranged as shown in FIG. 1 and the strip S is passed from right to left in FIG. 1, for example, the IP device 2 and the P-CVD device 4 When the above is activated, a two-layer coating including an ion plating coating layer and a plasma CVD coating layer is applied. Further, in the case of applying the three-layer coating in which the sputtering coating layer, the plasma CVD coating layer, and the ion plating coating layer are sequentially formed in the arrangement of FIG. 1, first, the SP device 3 and the P-CVD device are operated to operate as shown in FIG. Pass the plate from right to left, then activate the IP device and pass from left to right in the figure.
このようにして、イオンプレーティング被覆層、スパッ
タリング被覆層、プラズマCVD被覆層のうちから選択し
た任意の被覆層を有する単層あるいは多層コーティング
を施すことができる。In this way, a single layer or multi-layer coating having any coating layer selected from an ion plating coating layer, a sputtering coating layer and a plasma CVD coating layer can be applied.
また、巻出巻取装置が大気中に設置されているのでハン
ドリングが容易で、かつ複数のコイルを接続して連続的
に処理できる。Further, since the unwinding and winding device is installed in the atmosphere, it is easy to handle, and a plurality of coils can be connected to continuously process.
実施例 （１）ステンレス鋼帯表面にTiNとアモルファスSiO
２（以下α−SiO２という）の２層コーティングを施
し、装飾性と耐食性の優れた自動車モール用ステンレス
コイルを製造した例を示す。Example (1) TiN and amorphous SiO on the surface of stainless steel strip
An example is shown in which a two-layer coating of 2 (hereinafter referred to as α-SiO 2 ) is applied to manufacture a stainless steel coil for automobile moldings having excellent decorativeness and corrosion resistance.
厚さ0.5mm、幅300mmの304系ステンレス鋼帯をラインス
ピード0.1m／分で通板しながら、まずIP装置により蒸発
源としてTiを、ガスとしてＮ２を使用し、真空度10− ３
Torrに維持してTiNをコーティングした後、SiH４とＮ２
とＯ２混合ガスを約1Torrの真空度でプラズマ化したＰ
−CVD装置で、TiN薄膜上にα−SiO２をコーティングし
た。その結果、金色で装飾性と耐食性ともに優れたモー
ル材用ステンレスコイルが得られた。Thickness 0.5 mm, while passing plate 304 stainless steel strip of width 300mm in line speed 0.1m / min, the Ti by first IP device as the evaporation source, using N 2 as a gas, a vacuum degree of 10 - 3
After coating TiN with maintaining Torr, SiH 4 and N 2
And O 2 mixed gas were made into plasma at a vacuum of about 1 Torr.
Using a CVD device, the TiN thin film was coated with α-SiO 2 . As a result, a stainless steel coil for molding material, which was golden and had excellent decorativeness and corrosion resistance, was obtained.
（２）ステンレス鋼帯表面にWCとα−SiO２の２層コー
ティングを施し、装飾性と耐食性の兼備した建築内装ミ
ラー材用ステンレスコイルを製造した例を示す。(2) An example of producing a stainless steel coil for a building interior mirror material, which has a double-layer coating of WC and α-SiO 2 on the surface of a stainless steel strip, and has both decorativeness and corrosion resistance.
（１）と同様のステンレス鋼帯を（１）と同様のライン
スピードで通板しながら、まず、SP装置により蒸発源と
してWCを、不活性ガスとしてArを使用し、真空度10− ３
Torrに維持してWCをコーティングした後、（１）と同様
にしてＰ−CVD装置でα−SiO２をコーティングした。そ
の結果、装飾性、耐食性、加工性の優れた建築内装ミラ
ー材用ステンレスコイルが得られた。(1) while passing plate in the same line speed and the same stainless steel strip (1) and, firstly, the WC as the evaporation source by SP device, using Ar as the inert gas, vacuum degree of 10 - 3
After coating WC while maintaining Torr, α-SiO 2 was coated by a P-CVD apparatus in the same manner as (1). As a result, a stainless steel coil for a building interior mirror material having excellent decorativeness, corrosion resistance and workability was obtained.
発明の効果 本発明により、金属やプラスチックなど各種帯板の表面
に各種被覆層からなる単層あるいは多層のコーティング
が連続処理で短時間に形成され、装飾性、耐食性、耐摩
耗性等の各種特性を有する帯板コイル製品が製造でき
る。EFFECTS OF THE INVENTION According to the present invention, a single-layer or multi-layer coating consisting of various coating layers is formed on a surface of various strips such as metal and plastic by a continuous treatment in a short time, and various characteristics such as decorativeness, corrosion resistance, and abrasion resistance are obtained. It is possible to manufacture a strip coil product having
第１図は本発明設備の一例を示す概略説明図である。 １……巻出巻取装置、２……IP装置、３……SP装置、４
……Ｐ−CVD装置、５、５′……差圧シール装置、６…
…真空容器、７……予熱ヒータ、８、９……ターゲッ
ト、10……ガス導入口、11、12、13……ヒータ、14……
スリット、Ｓ……帯板、Ｐ……ポンプ。FIG. 1 is a schematic explanatory view showing an example of the equipment of the present invention. 1 ... Unwinding / winding device, 2 ... IP device, 3 ... SP device, 4
... P-CVD equipment, 5, 5 '... Differential pressure sealing equipment, 6 ...
… Vacuum container, 7 …… Preheat heater, 8,9 …… Target, 10 …… Gas inlet, 11,12,13 …… Heater, 14 ……
Slit, S ... Strip plate, P ... Pump.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 村田 朋美 神奈川県川崎市中原区井田1618番地 新日 本製鐵株式會社内第１技術研究所内 (72)発明者 伊藤 叡 神奈川県川崎市中原区井田1618番地 新日 本製鐵株式會社内第１技術研究所内 (72)発明者 大久保 尚武 東京都千代田区大手町２−６−３ 新日本 製鐵株式會社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Tomomi Murata 1618 Ida, Nakahara-ku, Kawasaki-shi, Kanagawa Kanagawa Pref. In-house Research Laboratories No. 1 (72) Inventor, Ito, Ida Nakahara-ku, Kawasaki-shi, Kanagawa No. 1618 Nippon Steel & Steel Co., Ltd. In-house Technical Research Laboratory (72) Inventor Naotake Okubo 2-6-3 Otemachi, Chiyoda-ku, Tokyo Shin-Nippon Steel & Co., Ltd.
Claims (1)
を介して真空容器を設け、該真空容器内にイオンプレー
ティング装置とスパッタリング装置とプラズマCVD装置
を直列に設けたことを特徴とする金属帯板の連続複合コ
ーティング設備。1. A vacuum container is provided between two unwinding and winding devices via a differential pressure sealing device, and an ion plating device, a sputtering device and a plasma CVD device are provided in series in the vacuum container. A continuous composite coating equipment for metal strips.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4638386A JPH0663088B2 (en) | 1986-03-05 | 1986-03-05 | Continuous composite coating equipment for strips |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4638386A JPH0663088B2 (en) | 1986-03-05 | 1986-03-05 | Continuous composite coating equipment for strips |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62205272A JPS62205272A (en) | 1987-09-09 |
| JPH0663088B2 true JPH0663088B2 (en) | 1994-08-17 |
Family
ID=12745616
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4638386A Expired - Lifetime JPH0663088B2 (en) | 1986-03-05 | 1986-03-05 | Continuous composite coating equipment for strips |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0663088B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013087315A (en) * | 2011-10-17 | 2013-05-13 | Takada Tekku Kk | Apparatus for continuous treatment of substrate |
| CN108251820A (en) * | 2018-03-09 | 2018-07-06 | 无锡博硕珈睿科技有限公司 | The manufacturing method and manufacturing equipment of self-heating product/material |
-
1986
- 1986-03-05 JP JP4638386A patent/JPH0663088B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62205272A (en) | 1987-09-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |