JPH066247B2 - Fine movement stage device - Google Patents
Fine movement stage deviceInfo
- Publication number
- JPH066247B2 JPH066247B2 JP60143062A JP14306285A JPH066247B2 JP H066247 B2 JPH066247 B2 JP H066247B2 JP 60143062 A JP60143062 A JP 60143062A JP 14306285 A JP14306285 A JP 14306285A JP H066247 B2 JPH066247 B2 JP H066247B2
- Authority
- JP
- Japan
- Prior art keywords
- fine movement
- mounting
- rotation
- leaf spring
- armature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000033001 locomotion Effects 0.000 title claims description 65
- 230000007246 mechanism Effects 0.000 claims description 65
- 230000005540 biological transmission Effects 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 14
- 230000002093 peripheral effect Effects 0.000 claims description 9
- 230000000694 effects Effects 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005549 size reduction Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/25—Movable or adjustable work or tool supports
- B23Q1/26—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
- B23Q1/34—Relative movement obtained by use of deformable elements, e.g. piezoelectric, magnetostrictive, elastic or thermally-dilatable elements
- B23Q1/36—Springs
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Machine Tool Units (AREA)
Description
【発明の詳細な説明】 <産業上の利用分野> 本発明は例えば半導体製造装置、顕微鏡等の精密測定機
器、高精度加工機等に適用する微動ステージ装置に関す
る。DETAILED DESCRIPTION OF THE INVENTION <Industrial field of application> The present invention relates to a fine movement stage apparatus applied to, for example, a semiconductor manufacturing apparatus, a precision measuring instrument such as a microscope, a high precision processing machine or the like.
<発明の概要> 本発明は、取付基板上に縦設したセンタ支柱に回転ベー
スを軸承し、該ベース上に取付ベース、2枚の平行板ば
ね、試料ステージを配備し、支柱を囲み等角位置に対応
して板ばねと取付ベースとの間に試料ステージの垂直微
動機構、取付基板と回転ベースとの間に試料ステージを
微動回転させる微動回転機構を配備してなり、組立調整
に精密作業を要せずして試料ステージの高精度な垂直微
動および高分解能な回転微動を実現するにある。<Outline of the Invention> The present invention supports a rotating base on a center column vertically installed on a mounting substrate, and disposes the mounting base, two parallel leaf springs, and a sample stage on the base, and surrounds the column to form an isometric structure. Depending on the position, a vertical fine movement mechanism for the sample stage is provided between the leaf spring and the mounting base, and a fine movement rotation mechanism for finely rotating the sample stage is provided between the mounting substrate and the rotation base, for precision work during assembly and adjustment. It is to realize high-precision vertical fine movement and high-resolution rotary fine movement of the sample stage without the need for.
<従来の技術> この種微動ステージ装置としては、例えば第6図乃至第
8図に示す如く、ハウジング8の立上りフランジ81の
上周面に円形板ばね82の外周部を取付け固定し、円形
板ばね82の中心部に位置して上面にステージ83、下
面にアーマチァ84の円直支柱85の上端がそれぞれ一
体的に取付け固定され、ハウジング8中には、前記アー
マチァ84における水平基板86の上下にアーマチァギ
ャップh,hを設けて対向する一対のリング状磁気吸着
機構9,9aを配設している。また、試料ステージ83
には、その一側に回転伝達レバー87を突設し、該レバ
ー87を直交方向に往復動する往復動機構88に連繋し
ている。かかるステージ装置において、ステージ83を
垂直微動する場合、予め、磁気吸着機構9,9aに電流
を流さない状態でアーマチァキャップh,hを設定し、
以後、磁気吸着機構9,9aの電流値を微調整してアー
マチァギャップh,hを微小変化させることにより、ス
テージ83は垂直方向に微動調整される。また、ステー
ジ83を微動回転する場合、往復機構88を作動するこ
とによりレバー87が変位し、ステージ83は支軸89
を回転中心として回転方向に微動する。ところが、上記
従来のステージ装置では、アーマチァ84および対をな
す磁気吸着機構9,9a等を完全水平、垂直に組立てる
ことは困難であり、従って、第8図に示す如く、アーマ
チァ84に対して磁気吸着機構9,9aがθだけ傾き固
定された場合、磁気吸着機構9,9aの吸引力によって
アーマチァ84は力Fが発生し、この力Fは円形板ばね
82の中心廻りの曲げモーメンMとして作用し、その結
果、ステージ83は傾斜する。ステージ83を完全水平
に保ち、垂直微動する場合、前記曲げモーメントMが垂
直見送り精度に悪影響を及ぼし、送り精度の劣化を招く
一因をなしている。また、微動回転機構88において、
ステージ83に突設した回転伝達レバー87とこれに直
交した往復駆動機構の作動レバー90は常に弾圧状態で
接合しているため、ステージ83が垂直微動を行うと、
前記レバー87,90間に摩擦力Fが発生し、従って、
ステージ83は第7図に仮想線にて示す如く、摩擦発生
部を支点として傾斜微動を生じる。この傾斜微動はステ
ージの水平度が失われ垂直送り精度の劣化を招く。<Prior Art> As a fine movement stage device of this type, as shown in FIGS. 6 to 8, for example, an outer peripheral portion of a circular leaf spring 82 is attached and fixed to an upper peripheral surface of a rising flange 81 of a housing 8 to form a circular plate. The stage 83 is located at the center of the spring 82, and the upper surface of the stage 83 is integrally fixed to the lower surface of the stage 83. The upper ends of the circular columns 85 of the armature 84 are integrally fixed to the lower surface of the horizontal substrate 86 of the armature 84. A pair of opposed ring-shaped magnetic attraction mechanisms 9 and 9a are provided with armature gaps h and h. In addition, the sample stage 83
A rotation transmission lever 87 is projectingly provided on one side thereof and is connected to a reciprocating mechanism 88 that reciprocates in the orthogonal direction. In such a stage device, when the stage 83 is finely moved vertically, the armature caps h and h are set in advance in a state where no current is applied to the magnetic attraction mechanisms 9 and 9a.
After that, the current value of the magnetic attraction mechanisms 9 and 9a is finely adjusted to finely change the armature gaps h and h, so that the stage 83 is finely adjusted in the vertical direction. When the stage 83 is finely rotated, the lever 87 is displaced by operating the reciprocating mechanism 88, and the stage 83 is supported by the support shaft 89.
Finely moves in the direction of rotation around. However, in the conventional stage apparatus described above, it is difficult to assemble the armature 84 and the pair of magnetic attraction mechanisms 9 and 9a in a completely horizontal and vertical direction. Therefore, as shown in FIG. When the attraction mechanisms 9 and 9a are tilted and fixed by θ, a force F is generated in the armature 84 by the attraction force of the magnetic attraction mechanisms 9 and 9a, and this force F is a circular leaf spring.
It acts as a bending moment M around the center of 82, and as a result, the stage 83 tilts. When the stage 83 is kept perfectly horizontal and moves slightly vertically, the bending moment M adversely affects the vertical feed-off accuracy, which contributes to deterioration of the feed accuracy. In the fine movement rotation mechanism 88,
Since the rotation transmission lever 87 protrudingly provided on the stage 83 and the actuating lever 90 of the reciprocating drive mechanism orthogonal to the rotation transmission lever 87 are always joined in an elastic state, when the stage 83 makes a vertical fine movement,
A frictional force F is generated between the levers 87 and 90, and
The stage 83, as shown by the phantom line in FIG. 7, produces fine tilt movement with the friction generating portion as a fulcrum. The fine movement of the tilt causes the horizontality of the stage to be lost, resulting in deterioration of vertical feed accuracy.
<発明の目的> この発明は、板ばねの剛性をアップし且つアーマチァギ
ャップ調整を簡易化し、高精度な垂直微動送り、およ
び、回転微動送りを実現すると共に、精密な組立調整を
要しない新規な微動ステージ装置を提供することを目的
とする。<Object of the Invention> The present invention improves the rigidity of the leaf spring and simplifies the armature gap adjustment, realizes highly precise vertical fine movement feed and rotary fine movement feed, and does not require precise assembly adjustment. A fine movement stage device is provided.
<発明の構成および効果> 上記の目的を達成するため、この発明では、取付基板上
に縦設したセンタ支柱に回転ベースを軸承し、この回転
ベース上ヘ、取付ベース、2枚の平行板ばね、試料ステ
ージを配備し、支柱を囲む等角位置に対応して板ばねと
回転ベースとの間に試料ステージの垂直微動機構を、ま
た取付基板と回転ベースとの間に試料ステージを微動回
転させる微動回転機構を配備して成る。<Structure and Effect of the Invention> In order to achieve the above object, in the present invention, a rotation base is axially supported by a center column vertically installed on a mounting substrate, and the rotation base is mounted on the rotation base and the two parallel leaf springs. , The sample stage is provided, and the vertical fine movement mechanism of the sample stage is moved between the leaf spring and the rotary base, and the sample stage is finely rotated between the mounting substrate and the rotary base, corresponding to the equiangular position surrounding the column. It is equipped with a fine motion rotation mechanism.
上記の構成によると、この発明では、試料ステージは平
行板ばねによって傾きに対する剛性が高く、従って、垂
直微動機構の垂直方向の作用力にアンバランスが生じて
も、試料ステージは水平性を維持する。According to the above configuration, in the present invention, the sample stage has a high rigidity against inclination due to the parallel leaf springs, and therefore, the sample stage maintains the horizontality even if the vertical acting force of the vertical fine movement mechanism is unbalanced. .
また、垂直微動機構は、3組のPush-Pull構造の吸着機
構を独立して配設しているため、吸着機構対向面間ギャ
ップ或いはアーマチァギャップを微調整することにより
試料ステージを傾けることなく垂直微動できる。また、
微動回転機構は、従来のレバー連繋構造をもたないた
め、摩擦力等によるステージの微動傾斜がなく、試料ス
テージは常に完全水平状態を保持する。In addition, since the vertical fine movement mechanism has three sets of push-pull structure suction mechanisms that are independently arranged, the sample stage is not tilted by finely adjusting the gap between the suction mechanism facing surfaces or the armature gap. Can move vertically. Also,
Since the fine movement rotation mechanism does not have a conventional lever connecting structure, there is no fine movement inclination of the stage due to a frictional force or the like, and the sample stage always maintains a completely horizontal state.
また、試料ステージの垂直微動機構と微動回転機構は、
相互に独立構造となしたから、互いに悪影響を及ぼすこ
とがなく、それぞれ安定した微動動作を実現し、動作の
信頼性、安定性を向上する等の実用上の効果を奏する。In addition, the vertical fine movement mechanism and the fine movement rotation mechanism of the sample stage are
Since they have mutually independent structures, they do not adversely affect each other, and realize stable micro-movements respectively, and have practical effects such as improvement of operation reliability and stability.
<実施例の説明> 第1図および第2図は本発明にかかる微動ステージ装置
を示す。<Description of Embodiments> FIGS. 1 and 2 show a fine movement stage device according to the present invention.
該微動ステージ装置は、取付基板1上に縦設されたセン
タ支柱11と、該センタ支柱11に回転可能に軸承され
た回転ベース12と、該回転ベース12の筒部上に軸固
定された平行板ばね構造をなす2枚の円盤状板ばね2,
3と、該板ばね3上に配備され外周縁を固定支持した試
料ステージ4と、センタ支柱11の周辺等角位置に対応
して第1の板ばね2と取付ベース13との間に配設された
垂直微動機構5と、取付基板1と回転ベース12との間
に設けられ、垂直微動機構5を含む試料ステージ4を微
動回転させる微動回転機構とから構成する。The fine movement stage device includes a center column 11 vertically installed on a mounting substrate 1, a rotation base 12 rotatably supported by the center column 11, and a parallel shaft fixed on a cylindrical portion of the rotation base 12. Two disc-shaped leaf springs 2 having a leaf spring structure 2,
3, a sample stage 4 provided on the leaf spring 3 and fixedly supporting the outer peripheral edge thereof, and arranged between the first leaf spring 2 and the mounting base 13 in correspondence with the peripheral equiangular position of the center support 11. The vertical fine movement mechanism 5 and the fine movement rotation mechanism which is provided between the mounting substrate 1 and the rotation base 12 and finely rotates the sample stage 4 including the vertical fine movement mechanism 5.
前記第1および第2の板ばね2,3は、中央にリング状
取付部21,31、取付部の外周に円盤状のバネ部2
2,32、バネ部の外周に前記取付部21,31と同心
円の取付リング部 23,33が一体に形成されており、該板ばね2,3
は、これを上下に重ね取付部21,31を取付ベース1
3の上面にビス固定すると共に、外周取付リング部2
3,33を重合し、該部に試料ステージ4の外周部を一
体結合し、取付ベース13と試料ステージ4との間に平
行ばねを構成している。The first and second leaf springs 2 and 3 have ring-shaped mounting portions 21 and 31 in the center and a disk-shaped spring portion 2 on the outer periphery of the mounting portion.
2, 32, and mounting ring portions 23, 33 concentric with the mounting portions 21, 31 are integrally formed on the outer circumference of the spring portion.
Stack them on top of each other and mount the mounting parts 21 and 31 on the mounting base 1.
3 is fixed to the upper surface of 3 with screws, and the outer peripheral mounting ring portion 2
3, 33 are superposed, and the outer peripheral portion of the sample stage 4 is integrally connected to this portion to form a parallel spring between the mounting base 13 and the sample stage 4.
垂直微動機構5は、センタ支柱11を囲む円周の等角位
置に構成したもので、第1の板ばねの120度位置に取
付け固定された3個のアーマチァ51と、取付ベース1
3に突設したアーム14に取付けられ、各アーマチァ5
1の上下面に対向配備した3組の磁気吸着機構53,53a
とからなる。The vertical fine movement mechanism 5 is configured at an equiangular position of the circumference surrounding the center support 11, and includes three armatures 51 fixedly mounted at 120 degrees of the first leaf spring, and the mounting base 1.
Each armature 5 is attached to the arm 14 protruding from the armature 3.
3 sets of magnetic attraction mechanisms 53, 53a arranged facing each other on the upper and lower surfaces of No. 1
Consists of.
各アーマチァ51は、端部の取付部52を取付リング部
33に接着或いはビス固定して試料ステージ4と完全平
行に設定されている。Each armature 51 is set to be completely parallel to the sample stage 4 by adhering or fixing the end mounting portion 52 to the mounting ring portion 33.
対をなす磁気吸着機構53,53aは、アーマチァ51
の上、下面に所定のアーマチァギャップh,hを設けて
配備され、アーマチァ51を磁気的に変位させるもの
で、ヨーク54におけるセンサ部55にコイル56を巻
いてなる電磁石、および内部に永久磁石57を配備した
Push-Pull構造の吸着機構であって、永久磁石57によ
りアーマチァ51に対し常時吸引力が作用するようにな
す。The magnetic attraction mechanism 53, 53a forming a pair is connected to the armature 51.
The armature 51 is magnetically displaced by disposing predetermined armature gaps h and h on the upper and lower surfaces thereof, and an electromagnet having a coil 56 wound around a sensor portion 55 of a yoke 54 and a permanent magnet inside. Deployed 57
The attraction mechanism has a push-pull structure, and the permanent magnet 57 constantly applies an attraction force to the armature 51.
微動回転機構6は、取付基板1上に直線運動機構61お
よび該機構の直線運動を回転運動に変える伝達機構67
を配設し、該伝達機構67の伝達ピン4を回転ベース1
2に連繋して構成される。The fine movement rotation mechanism 6 includes a linear movement mechanism 61 on the mounting substrate 1 and a transmission mechanism 67 for converting the linear movement of the mechanism into a rotation movement.
And the transmission pin 4 of the transmission mechanism 67 is attached to the rotary base 1
It is configured by connecting to 2.
前記直線運動機構61は、取付基板1に配設され、駆動
軸63上に送りネジを形成した正逆回転する減速モータ
と、駆動軸63に沿って形成された摺動ガイド64と、
駆動軸63に螺合され、該軸63の回転駆動により往復
動するリードナット65とからなり、該リードナット6
5にはガイドピン66を突設して下端を摺動ガイド64
に係合すると共に、該ピン66の軸身部に伝達機構67
を連繋している。The linear motion mechanism 61 is disposed on the mounting substrate 1, and has a forward-reverse rotation speed reduction motor in which a feed screw is formed on the drive shaft 63, and a slide guide 64 formed along the drive shaft 63.
The lead nut 6 is screwed to the drive shaft 63 and reciprocates by the rotational drive of the shaft 63.
5 is provided with a guide pin 66, and the lower end is a sliding guide 64.
And the transmission mechanism 67 is attached to the shaft of the pin 66.
Are connected.
伝達機構67は、固定部69の一側に薄肉ひんじ部70
を介して可動部71を一体形成した伝達部材68を設け
て、前記固定部69を取付基板1上に縦設固定すると共
に、可動部71にはこれと一体のレバー72および該レ
バー72と対向する板ばね製弾性片73を有し、レバー
72と弾性片73との間に前記ガイドピン66を係合把
持している。可動部71の上面には伝達ピン74が縦設
され、一方、回転ベース12にはこれと一体の突片1
5、該突片15に対向して板ばね製弾性片16を有し、
弾性片16と突片15との間に前記伝達ピン74を係合
把持して伝達機構を構成してなり、リードナット65が軸
方向に移行するとき、可動部71はひんじ部70を支点
として回動し、伝達ピン74と回転ベース12の連繋に
より試料ステージ4が微動回転する。The transmission mechanism 67 includes a thin hinge portion 70 on one side of the fixed portion 69.
A transmission member 68 integrally formed with a movable portion 71 is provided to fix the fixed portion 69 vertically on the mounting substrate 1, and the movable portion 71 has a lever 72 integral with the movable portion 71 and a lever 72 facing the lever 72. It has a leaf spring elastic piece 73, and the guide pin 66 is engaged and held between the lever 72 and the elastic piece 73. A transmission pin 74 is vertically provided on the upper surface of the movable portion 71, and on the other hand, the rotation base 12 has a projection piece 1 integrated with the transmission pin 74.
5, having an elastic piece 16 made of a leaf spring facing the projecting piece 15,
The transmission pin 74 is engaged and gripped between the elastic piece 16 and the projecting piece 15 to form a transmission mechanism. When the lead nut 65 moves in the axial direction, the movable portion 71 supports the elbow portion 70 as a fulcrum. The sample stage 4 is finely rotated by the connection of the transmission pin 74 and the rotation base 12.
第4図は本発明微動ステージ装置における磁気吸着機構
53,53aの励磁回路の一例を示す。対をなす3組の
電磁コイル56,56aは電源回路58に直列に接続さ
れ、また、対をなす電磁コイル56,56aにはそれぞ
れ可変抵抗R1,R2,R3が並列に接続されており、磁気
吸着機構53,53aに流れる電流値を変えてアーマチ
ァギャップh,hの調整を行うものである。FIG. 4 shows an example of an exciting circuit for the magnetic attraction mechanisms 53, 53a in the fine movement stage device of the present invention. Three pairs of electromagnetic coils 56, 56a are connected in series to the power supply circuit 58, and variable resistors R 1 , R 2 , R 3 are connected in parallel to the paired electromagnetic coils 56, 56a, respectively. The armature gaps h and h are adjusted by changing the value of the current flowing through the magnetic attraction mechanisms 53 and 53a.
第5図は本発明微動ステージ装置における平行板ばね
2,3の他の実施例を示す。該実施例では、第1の板ば
ね2を中央リング状取付部21、取付部の外周に放射状
に突出する帯板状バネ部22、該バネ部22を囲む取付
リング部23が一体構成された構造となし、該第1の板
ばね2上に前述例と同様な円盤状の第2の板ばね3を重
合している。尚、第2の板ばね3も第1野板ばねと同一
構造となすも勿論可能である。FIG. 5 shows another embodiment of the parallel leaf springs 2 and 3 in the fine movement stage device of the present invention. In this embodiment, the first plate spring 2 is integrally formed with a central ring-shaped mounting portion 21, a strip-plate-shaped spring portion 22 radially protruding to the outer periphery of the mounting portion, and a mounting ring portion 23 surrounding the spring portion 22. In the structure, a second disk-shaped plate spring 3 similar to the above-mentioned example is superposed on the first plate spring 2. The second leaf spring 3 may of course have the same structure as the first leaf spring.
然して、本発明微動ステージ装置の組立に際しては、予
め3組の磁気吸着機構53,53aに対しPush-Pull特
性、即ち負荷電流−吸引力特性が一致するように磁極面
g,gを完全平行に揃え、その間にアーマチァ51を位
置させた後、対をなす磁気吸着機構53,53aを作動
して上下アーマチァギャップh,hを同等に設定する。However, when assembling the fine movement stage device of the present invention, the magnetic pole surfaces g, g are preliminarily parallel to each other so that the push-pull characteristics, that is, the load current-attraction force characteristics, match the three magnetic attraction mechanisms 53, 53a. After aligning and positioning the armature 51 between them, the pair of magnetic attraction mechanisms 53, 53a are operated to set the upper and lower armature gaps h, h equally.
試料ステージ4の微動調整に際し、対をなす磁気吸着機
構53,53aに通電すると、対応したアーマチァ51
は上または下に微小変位し、同時に平行板ばね2,3の
外周部が微小変位して試料ステージ4は垂直方向に微動
調整される。このとき、かりに、平行板ばね2,3に、
半径方向のたわみ等の不均一性が存在した場合、可変抵
抗器R1,R2,R3を調整して3組の磁気吸着機構53,
53aに対する電流値を変えることにより、試料ステー
ジ4は、平行板ばね2,3の不均一に拘らず水平が保た
れる。During fine adjustment of the sample stage 4, when the pair of magnetic attraction mechanisms 53, 53a are energized, the corresponding armature 51
Is slightly displaced upward or downward, and at the same time, the outer peripheral portions of the parallel leaf springs 2 and 3 are slightly displaced so that the sample stage 4 is finely adjusted in the vertical direction. At this time, to the parallel leaf springs 2 and 3,
When non-uniformity such as bending in the radial direction exists, the variable resistors R 1 , R 2 , and R 3 are adjusted so that three sets of magnetic attraction mechanisms 53,
By changing the current value for 53a, the sample stage 4 is kept horizontal regardless of the nonuniformity of the parallel leaf springs 2 and 3.
次に、試料ステージ4の微動回転調整に際し、モータ6
2の作動によりリードナット65が軸方向に移行すると
き、リードナット65は、これに連繋した可動体71を
ひんじ部70を支点として回動させ、可動体71は伝達
ピン74を介して連繋した回転ベース12を微動回転さ
せ、従って試料ステージ4の高精度な微動回転調整をな
し得る。Next, when adjusting the fine rotation of the sample stage 4, the motor 6
When the lead nut 65 moves in the axial direction by the operation of 2, the lead nut 65 rotates the movable body 71 linked thereto with the hinge portion 70 as a fulcrum, and the movable body 71 is linked via the transmission pin 74. The rotating base 12 is finely rotated, and therefore, the fine rotation adjustment of the sample stage 4 can be performed with high accuracy.
本発明は上記の如く、センタ支柱11に回転ベース12
を軸承し、該ベース12上に取付ベース13、取付ベー
ス13上に2枚の平行板ばね2,3、平行板ばね2,3
上に試料ステージ4を取付け、支柱11を囲む等角位置
に対応して第1の板ばね2と取付ベース13との間に試
料ステージ4の垂直微動機構5、取付基板1と回転ベー
ス12との間に試料ステージ4の微動回転機構6を設け
たから、本発明は特に、試料ステージ4の垂直微動機構
5および微動回転機構6はそれぞれ独立して構成され、
従来装置の如く相互の悪影響がなく、各微動動作の信頼
性、安定性が向上する。According to the present invention, as described above, the center support 11 is attached to the rotary base 12.
And the mounting base 13 on the base 12, two parallel leaf springs 2 and 3 on the mounting base 13, and the parallel leaf springs 2 and 3.
The sample stage 4 is mounted on the upper part, and the vertical fine movement mechanism 5, the mounting substrate 1 and the rotating base 12 of the sample stage 4 are provided between the first leaf spring 2 and the mounting base 13 in correspondence with the equiangular position surrounding the column 11. Since the fine movement rotation mechanism 6 of the sample stage 4 is provided between the two, the present invention particularly has the vertical fine movement mechanism 5 and the fine movement rotation mechanism 6 of the sample stage 4 independently configured,
There is no mutual adverse effect unlike the conventional device, and the reliability and stability of each fine movement operation are improved.
また本発明は、板ばね2,3の周辺等角位置にアーマチ
ァ51を配設し、各アーマチァ51にそれぞれ対をなす
Push-Pull構造の磁気吸着機構53,53aを対向配備
して垂直微動機構5を構成したから、試料ステージ4の
水平設定に際し、アーマチァギャップ調整に自由度が得
られ、調整が著しく容易となる。Further, according to the present invention, the armatures 51 are arranged at equiangular positions around the leaf springs 2 and 3, and each armature 51 is paired.
Since the vertical fine movement mechanism 5 is configured by disposing the push-pull structure magnetic attraction mechanisms 53 and 53a facing each other, the armature gap can be adjusted freely when the sample stage 4 is horizontally set, and the adjustment is significantly facilitated. .
更に本発明では、2枚の平行板ばね構造を用いたため、
試料ステージ4の傾斜に対する剛性が高く、安定した垂
直微動を実現する。また、微動回転機構6には、直線運
動を回転運動に変える伝達機構67の一部に薄肉ひんじ
部70を設けて、試料ステージ4に対し動力を伝達する
ようにしたから、試料ステージ4は、微動回転時、全く
ガタツキがなく、安定し且つ高精度な微動回転調整をな
し得ると共に、本発明装置は従来装置に比較して小型
化、軽量化を達成する等の幾多の効果を有す。Further, in the present invention, since two parallel leaf spring structures are used,
The rigidity with respect to the inclination of the sample stage 4 is high, and stable vertical fine movement is realized. Further, the fine movement rotation mechanism 6 is provided with a thin-walled elbow portion 70 in a part of the transmission mechanism 67 for converting a linear movement into a rotation movement so as to transmit power to the sample stage 4. In addition, there is no rattling at the time of fine movement rotation, stable and highly precise fine movement rotation adjustment can be performed, and the device of the present invention has many effects such as size reduction and weight reduction as compared with the conventional device. .
第1図は一部を断面に表した本発明微動ステージ装置の
平面図、第2図は第1図II−II線断面図、第3図は微動
回転動作の原理説明図、第4図は磁気吸着機構の回路構
成例を示す図、第5図は平行板ばねの他の実施例を示す
斜面図、第6図は従来の微動ステージ装置の平面図、第
7図は第6図中VII−VII線断面図、第8図は従来装置の
動作の説明図である。 1‥‥取付基板 11‥‥センタ支柱 12‥‥回転ベース 13‥‥取付ベース 2‥‥第1の板ばね 21‥‥取付部 22‥‥バネ部 23‥‥リング部 3‥‥第2の板バネ 31‥‥取付部 32‥‥バネ部 33‥‥リング部 4‥‥試料ステージ 5‥‥垂直微動機構 51‥‥アーマチァ 53‥‥磁気吸着機構 6‥‥微動回転機構 61‥‥直線運動機構 67‥‥伝達機構 74‥‥伝達ピンFIG. 1 is a plan view of a fine movement stage device of the present invention, a part of which is shown in cross section, FIG. 2 is a cross sectional view taken along the line II-II of FIG. 1, FIG. FIG. 5 is a diagram showing a circuit configuration example of a magnetic attraction mechanism, FIG. 5 is a perspective view showing another embodiment of a parallel leaf spring, FIG. 6 is a plan view of a conventional fine movement stage device, and FIG. 7 is VII in FIG. FIG. 8 is a cross-sectional view taken along line VII, and FIG. 8 is an explanatory diagram of the operation of the conventional device. 1 ... Mounting board 11 ... Center support 12 ... Rotating base 13 ... Mounting base 2 ... 1st leaf spring 21 ... Mounting section 22 ... Spring section 23 ... Ring section 3 ... Second plate Spring 31 ・ ・ ・ Mounting part 32 ・ ・ ・ Spring part 33 ・ ・ ・ Ring part 4 ‥‥ Sample stage 5 ‥‥ Vertical fine movement mechanism 51 ‥‥ Armature 53 ‥‥ Magnetic adsorption mechanism 6 ‥ Fine movement rotation mechanism 61 ・ ・ ・ Linear movement mechanism 67 Transmission mechanism 74 Transmission pin
Claims (4)
センタ支柱に軸承された回転ベースと、該回転ベース上
に取付け固定された取付ベースと、取付ベース上に取付
けられた平行板ばねを構成する2枚の板ばねと、該板ば
ねと、該板ばね上に配備され外周部を支持した試料ステ
ージと、センタ支柱の周辺等角位置に対応して板ばねと
取付ベースとの間に配設された垂直微動機構と、取付基
板と回転ベースとの間に設けられ垂直微動機構を含む試
料ステージを微動回転する微動回転機構とを具備して成
る微動ステージ装置。1. A center support column vertically provided on a mounting substrate, a rotation base supported by the center support column, a mounting base fixedly mounted on the rotation base, and a parallel plate mounted on the mounting base. The two leaf springs constituting the spring, the leaf spring, the sample stage provided on the leaf spring and supporting the outer peripheral portion, the leaf spring and the mounting base corresponding to the peripheral equiangular position of the center column. A fine movement stage device comprising a vertical fine movement mechanism arranged between the mounting substrate and a rotation base, and a fine movement rotation mechanism for finely rotating a sample stage including the vertical fine movement mechanism.
角位置にアーマチァを配設し、取付フレームに、各アー
マチァの上下に所定アーマチァギヤップを存して対向し
たPush-Pull構造の対をなす磁気吸着機構を配設してな
る特許請求の範囲第1項記載の微動ステージ装置。2. The vertical fine movement mechanism has a push-pull structure in which armatures are provided at 120 ° equiangular positions on the outer circumference of a leaf spring, and a mounting frame faces each armature with a predetermined armature gap above and below each armature. The fine movement stage device according to claim 1, wherein a pair of magnetic attraction mechanisms are provided.
構および該直線運動を回転運動に変える伝達機構を配設
し、伝達ピンを回転ベースに連繋してなる特許請求の範
囲第1項記載の微動ステージ装置。3. A fine movement rotation mechanism, wherein a linear movement mechanism and a transmission mechanism for converting the linear movement into a rotation movement are provided on a mounting substrate, and a transmission pin is connected to a rotation base. The fine movement stage device described.
該取付部の外周に円盤状或いは放射状に突出した帯板状
バネ部、バネ部の外周に取付リング部が一体形成されて
いる特許請求の範囲第1項記載の微動ステージ装置。4. The parallel leaf spring has a ring-shaped mounting portion in the center,
The fine movement stage device according to claim 1, wherein a disk-shaped or radially protruding strip-shaped spring portion is formed on the outer periphery of the mounting portion, and a mounting ring portion is integrally formed on the outer periphery of the spring portion.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60143062A JPH066247B2 (en) | 1985-06-28 | 1985-06-28 | Fine movement stage device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60143062A JPH066247B2 (en) | 1985-06-28 | 1985-06-28 | Fine movement stage device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS624539A JPS624539A (en) | 1987-01-10 |
JPH066247B2 true JPH066247B2 (en) | 1994-01-26 |
Family
ID=15330023
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60143062A Expired - Lifetime JPH066247B2 (en) | 1985-06-28 | 1985-06-28 | Fine movement stage device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH066247B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100443083B1 (en) * | 2002-01-30 | 2004-08-04 | 삼성전자주식회사 | Apparatus for rotating a sample |
-
1985
- 1985-06-28 JP JP60143062A patent/JPH066247B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS624539A (en) | 1987-01-10 |
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