JPH0658900A - Moisture sensor - Google Patents

Moisture sensor

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Publication number
JPH0658900A
JPH0658900A JP20920692A JP20920692A JPH0658900A JP H0658900 A JPH0658900 A JP H0658900A JP 20920692 A JP20920692 A JP 20920692A JP 20920692 A JP20920692 A JP 20920692A JP H0658900 A JPH0658900 A JP H0658900A
Authority
JP
Japan
Prior art keywords
moisture
film
humidity sensor
sensitive film
insulating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20920692A
Other languages
Japanese (ja)
Inventor
Masahisa Ikejiri
昌久 池尻
Satoshi Chiba
悟志 千葉
Tatsuo Hama
辰男 濱
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP20920692A priority Critical patent/JPH0658900A/en
Publication of JPH0658900A publication Critical patent/JPH0658900A/en
Pending legal-status Critical Current

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  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)

Abstract

PURPOSE:To enhance response and mass productivity by forming a dielectric film on a conductive substrate and forming a moisture-sensitive film thereon. CONSTITUTION:50ml of ethylsilicate (Si(OC2H5)4) is added with 34ml of ethanol and 16ml of 0.02N hydrochloric acid, for example, and stirred for one hour to produce a solution which is then applied on a stainless steel substrate 1 through spin coating and heat treated at 300 deg.C for one hour thus forming an SiO2 dielectric film 2 on the stainless steel substrate 1. On the other hand, 100ml of water is added with 100ml of ethanol, 80g of manganese acetate, 20g of lead acetate, 10g of potassium acetate, and stirred for one hour to prepare a moisture-sensitive coating liquid. The stainless steel substrate 1 formed with the dielectric film 2 is then dip coated with the moisture-sensitive coating liquid and heat treated at 500 deg.C for one hour thus forming a moisture-sensitive film 3 on the dielectric film 2. Ag paste is then screen printed on the moisture- sensitive film 3 to form a comb type electrodes 4. Since a moisture-sensitive film 3 is formed on the dielectric film 2 formed on a substrate 1, thermal response is enhanced, an inexpensive large substrate can be used and mass productivity is enhanced, resulting in unit cost reduction.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、湿度に対応して素子の
電気的特性が変化することにより湿度を検出する湿度セ
ンサに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a humidity sensor for detecting humidity by changing electric characteristics of an element in response to humidity.

【0002】[0002]

【従来の技術】近年、湿度計測、湿度制御を必要とする
分野が増加し、湿度センサの重要性が認められるように
なった。
2. Description of the Related Art In recent years, the number of fields requiring humidity measurement and humidity control has increased, and the importance of humidity sensors has come to be recognized.

【0003】湿度に対応して素子の電気的特性が変化す
ることにより湿度を検出する湿度センサには、電解質
系、金属系、高分子系、セラミックス系等があり、それ
ぞれいろいろな系が研究されているが、現在実用化され
ているものは、高分子系およびセラミックス系の湿度セ
ンサである。いずれも、素子に対する水の吸脱着によ
り、素子の抵抗値または静電容量が変化する性質を利用
したものである。
Humidity sensors that detect humidity by changing the electrical characteristics of the element in response to humidity include electrolyte-based, metal-based, polymer-based, and ceramic-based humidity sensors, and various systems have been studied. However, polymer and ceramic humidity sensors are currently in practical use. All of them utilize the property that the resistance value or capacitance of the element changes due to the adsorption and desorption of water with respect to the element.

【0004】基板にはアルミナ、ガラス等の絶縁体が用
いられ、この基板上に櫛形電極、感湿膜を形成するか、
基板上に下部電極、感湿膜、上部電極を形成したサンド
ウィッチ形構造にするのが一般的である。
An insulator such as alumina or glass is used for the substrate, and a comb-shaped electrode or a moisture sensitive film is formed on this substrate.
A sandwich type structure in which a lower electrode, a moisture sensitive film and an upper electrode are formed on a substrate is generally used.

【0005】[0005]

【発明が解決しようとする課題】しかし、従来の湿度セ
ンサは、アルミナ基板はシリコン等の導電性基板に比べ
高価であり、ガラス基板は熱に弱く割れやすいという問
題点があった。また、センサを安く大量に製造するため
には、大型の基板に多数の素子を作り、これを切断して
用いることが望ましいが、アルミナ、ガラス等の基板は
反り等の問題があり、大型で安い基板はなかった。さら
に、絶縁体は導電体に比べ、熱伝導率が小さいため、湿
度センサの熱応答が遅くなる、という問題点もあった。
However, the conventional humidity sensor has a problem that the alumina substrate is more expensive than a conductive substrate such as silicon, and the glass substrate is weak against heat and is easily broken. Further, in order to manufacture a sensor inexpensively and in a large amount, it is desirable to make a large number of elements on a large-sized substrate and then cut and use them, but a substrate such as alumina or glass has a problem such as warpage and is large. There was no cheap board. Furthermore, since the insulator has a smaller thermal conductivity than the conductor, there is a problem that the thermal response of the humidity sensor becomes slow.

【0006】[0006]

【課題を解決するための手段】本発明の湿度センサは、
導電性基板上に絶縁膜が形成され、この絶縁膜上に感湿
膜が形成されることを特徴とする。本発明の湿度センサ
は、導電性基板上に絶縁膜が形成され、この絶縁膜上に
電極が形成され、この電極が形成された絶縁膜上に感湿
膜が形成されることを特徴とする。本発明の湿度センサ
は、導電性基板上に絶縁膜が形成され、この絶縁膜上に
電極が形成され、この電極上に感湿膜が形成され、この
感湿膜上に電極が形成されることを特徴とする。
The humidity sensor of the present invention comprises:
An insulating film is formed on a conductive substrate, and a moisture sensitive film is formed on the insulating film. The humidity sensor of the present invention is characterized in that an insulating film is formed on a conductive substrate, an electrode is formed on the insulating film, and a moisture sensitive film is formed on the insulating film on which the electrode is formed. . In the humidity sensor of the present invention, an insulating film is formed on a conductive substrate, an electrode is formed on the insulating film, a moisture sensitive film is formed on the electrode, and an electrode is formed on the moisture sensitive film. It is characterized by

【0007】少なくとも1つの端子部が、導電性基板に
関して感湿膜と反対側の面にあると、スペースファクタ
ーが良く、安価で、小型機器への応用がしやすくなる。
この場合、導電性基板に関して感湿膜側の面にある電極
と、感湿膜と反対側の面にある端子部は、導電性基板に
開けられたスルーホールまたは導電性基板の側面に絶縁
膜が形成され、この絶縁膜上に導電路が形成されること
により、電気的に接続されるようにすればよい。また、
導電性基板に関して感湿膜側の面にある電極と、感湿膜
と反対側の面にある端子部は、導電性基板の導電性を利
用して電気的に接続されるようにしてもよい。
When at least one terminal portion is on the surface opposite to the moisture sensitive film with respect to the conductive substrate, the space factor is good, the cost is low, and the application to small equipment is easy.
In this case, the electrode on the surface of the conductive substrate on the moisture sensitive film side and the terminal portion on the surface on the side opposite to the moisture sensitive film are formed through holes formed in the conductive substrate or an insulating film on the side surface of the conductive substrate. Is formed, and a conductive path is formed on this insulating film so that they are electrically connected. Also,
The electrode on the surface of the conductive substrate facing the moisture sensitive film and the terminal on the surface of the conductive substrate opposite to the moisture sensitive film may be electrically connected by utilizing the conductivity of the conductive substrate. .

【0008】導電性基板はステンレス、銅、アルミ等の
金属板または、導電性のセラミックスでよい。導電性基
板にシリコンを用いると、大量生産に適したシリコンプ
ロセスが使え、量産性、信頼性の両面から好ましい。
The conductive substrate may be a metal plate such as stainless steel, copper or aluminum, or conductive ceramics. When silicon is used for the conductive substrate, a silicon process suitable for mass production can be used, which is preferable in terms of mass productivity and reliability.

【0009】少なくとも感湿膜の部分はすべて覆われる
ように、含フッ素高分子膜を形成すると、電界質溶液に
浸漬しても特性が変化しない、信頼性の非常に高い湿度
センサを得ることができる。
By forming the fluorine-containing polymer film so that at least the moisture-sensitive film is entirely covered, a highly reliable humidity sensor whose characteristics do not change even when immersed in an electrolyte solution can be obtained. it can.

【0010】[0010]

【実施例】【Example】

(実施例1)エチルシリケート(Si(OC25)4)5
0mlにエタノール34ml、0.02N塩酸16ml
を加え、1時間攪拌した溶液を、ステンレス板にスピン
コーティングし、300℃で1時間熱処理し、ステンレ
ス板上にSiO2絶縁膜を形成した。
(Example 1) Ethyl silicate (Si (OC 2 H 5) 4) 5
34 ml of ethanol and 16 ml of 0.02N hydrochloric acid in 0 ml
Was added and spin-coated with a solution stirred for 1 hour and heat-treated at 300 ° C. for 1 hour to form a SiO 2 insulating film on the stainless plate.

【0011】次に、水100mlに、エタノール100
ml、酢酸マンガン80g、酢酸鉛20g、酢酸カリウ
ム10gを加え、1時間攪拌し、感湿膜用コーティング
液を作製した。
Next, 100 ml of water was added to 100 ml of ethanol.
ml, 80 g of manganese acetate, 20 g of lead acetate, and 10 g of potassium acetate were added, and the mixture was stirred for 1 hour to prepare a coating liquid for moisture-sensitive film.

【0012】前記絶縁膜を形成したステンレス板に、こ
の感湿膜用コーティング液をディップコーティングし、
500℃で1時間熱処理することにより、絶縁膜上に感
湿膜を形成した。この感湿膜上に、Agペーストをスク
リーン印刷することにより、櫛形電極を形成した。
The stainless steel plate having the insulating film formed thereon is dip-coated with this moisture-sensitive film coating solution,
A moisture sensitive film was formed on the insulating film by heat treatment at 500 ° C. for 1 hour. A comb-shaped electrode was formed on the moisture-sensitive film by screen-printing an Ag paste.

【0013】このようにして作製した湿度センサの断面
図を図1に示す。図1において、1は基板(ステンレス
板)、2は絶縁膜、3は感湿膜、4は電極である。本湿
度センサの感湿特性を図2に示す。
A cross-sectional view of the humidity sensor thus manufactured is shown in FIG. In FIG. 1, 1 is a substrate (stainless plate), 2 is an insulating film, 3 is a moisture sensitive film, and 4 is an electrode. The humidity sensitivity characteristics of this humidity sensor are shown in FIG.

【0014】(実施例2)シリコン基板にSiO2をス
パッタし、絶縁膜を形成した。この絶縁膜上に、Cr、
Auを蒸着し、櫛形電極を形成した。このシリコン基板
に、実施例1で用いた感湿膜用コーティング液をスクリ
ーン印刷し、700℃で1時間熱処理することにより、
櫛形電極が形成された絶縁膜上に感湿膜を形成した。こ
のようにして作製した湿度センサの断面図を図3に示
す。図3において、1は基板、2は絶縁膜、3は感湿
膜、4は電極である。
Example 2 SiO 2 was sputtered on a silicon substrate to form an insulating film. Cr, Cr,
Au was vapor-deposited to form a comb-shaped electrode. The silicon substrate was screen-printed with the coating liquid for a moisture-sensitive film used in Example 1 and heat-treated at 700 ° C. for 1 hour,
A moisture sensitive film was formed on the insulating film on which the comb electrodes were formed. A cross-sectional view of the humidity sensor thus manufactured is shown in FIG. In FIG. 3, 1 is a substrate, 2 is an insulating film, 3 is a moisture sensitive film, and 4 is an electrode.

【0015】本湿度センサの感湿特性を図4に示す。図
4より、本発明の湿度センサは、抵抗値が低く、抵抗値
の変化幅が適当であり、しかも温度によって特性が変化
しないので、使いやすいことがわかる。本湿度センサを
60℃90%の恒温恒湿槽中に1000時間放置後、特
性を測定したところ、図4と測定誤差の範囲内で同様で
あった。したがって、本湿度センサは、耐久性、信頼性
が高いことがわかる。また、温度変化に対する応答は1
0秒以内、湿度変化に対する応答は5秒以内と十分に速
かった。さらに、本湿度センサは、製造工程が単純であ
るため、量産性がよく、安価に製造できることがわか
る。
FIG. 4 shows the humidity-sensitive characteristics of this humidity sensor. It can be seen from FIG. 4 that the humidity sensor of the present invention has a low resistance value, an appropriate change width of the resistance value, and the characteristics do not change with temperature, and thus is easy to use. The humidity sensor was left for 1000 hours in a constant temperature and humidity chamber at 60 ° C. and 90%, and the characteristics were measured. Therefore, it can be seen that this humidity sensor has high durability and reliability. Also, the response to temperature change is 1.
Within 0 seconds, the response to changes in humidity was sufficiently fast, within 5 seconds. Further, since the humidity sensor has a simple manufacturing process, it can be easily mass-produced and can be manufactured at low cost.

【0016】(実施例3)実施例2で作製した湿度セン
サに、溶媒可溶性含フッ素高分子をパーフルオロ溶媒に
溶解した溶液(7重量%)を、少なくとも感湿膜の部分
はすべて覆われるように、スクリーン印刷し、180℃
で1時間熱処理し、含フッ素高分子膜を形成した。この
ようにして作製した湿度センサの断面図を図5に示す。
図5において、1は基板、2は絶縁膜、3は感湿膜、4
は電極、5は含フッ素高分子膜である。本湿度センサの
特性は、実施例2で作製した湿度センサと同様であっ
た。本湿度センサを60℃の飽和食塩水に100時間浸
漬後、特性を測定したところ、図4と測定誤差の範囲内
で同様であった。したがって、本湿度センサは、極めて
耐久性、信頼性が高いことがわかる。
(Example 3) The humidity sensor prepared in Example 2 was covered with a solution (7% by weight) of a solvent-soluble fluorine-containing polymer dissolved in a perfluoro solvent so that at least the portion of the moisture-sensitive film was covered. Screen-printed on 180 ℃
And heat-treated for 1 hour to form a fluorine-containing polymer film. A cross-sectional view of the humidity sensor thus manufactured is shown in FIG.
In FIG. 5, 1 is a substrate, 2 is an insulating film, 3 is a moisture sensitive film, 4
Is an electrode, and 5 is a fluorine-containing polymer film. The characteristics of this humidity sensor were similar to those of the humidity sensor manufactured in Example 2. After the humidity sensor was immersed in a saturated saline solution at 60 ° C. for 100 hours and then the characteristics were measured, it was the same as in FIG. 4 within the measurement error range. Therefore, it can be seen that this humidity sensor is extremely durable and highly reliable.

【0017】(実施例4)シリコン基板に、Si34
スパッタし、絶縁膜を形成した。この絶縁膜上にPtを
スパッタし、電極を形成した。このシリコン基板に、実
施例1で用いた感湿膜用コーティング液をスピンコーテ
ィングし、700℃で1時間熱処理することにより、電
極上に感湿膜を形成した。さらに、この感湿膜上に、P
tをスパッタし、電極を形成し、図6に示す湿度センサ
を作製した。図6において、1は基板、2は絶縁膜、3
は感湿膜、4は電極である。本湿度センサの感湿特性を
図7に示す。
(Example 4) Si 3 N 4 was sputtered on a silicon substrate to form an insulating film. Pt was sputtered on this insulating film to form an electrode. The silicon substrate was spin-coated with the coating liquid for a moisture-sensitive film used in Example 1 and heat-treated at 700 ° C. for 1 hour to form a moisture-sensitive film on the electrode. Furthermore, on this moisture sensitive film, P
t was sputtered to form electrodes, and the humidity sensor shown in FIG. 6 was manufactured. In FIG. 6, 1 is a substrate, 2 is an insulating film, 3
Is a moisture sensitive film, and 4 is an electrode. FIG. 7 shows the humidity-sensitive characteristics of this humidity sensor.

【0018】(実施例5)シリコン基板にスルーホール
を開け、このシリコン基板を1100℃で4時間熱処理
することにより、表面を酸化し、SiO2絶縁膜を形成
した。このシリコン基板の片面には櫛形電極を、反対側
の面には端子部を、スルーホールには導電路を、Cr、
Auをスパッタすることにより形成した。このシリコン
基板に、実施例1で用いた感湿膜用コーティング液をロ
ールコーティングし、700℃で1時間熱処理すること
により、櫛形電極が形成された絶縁膜上に感湿膜を形成
した。このようにして作製した湿度センサの断面図を図
8に示す。図8において、1は基板、2は絶縁膜、3は
感湿膜、4は電極、6はスルーホール、7は導電路、8
は端子部である。本湿度センサの感湿特性を図9に示
す。
Example 5 A through hole was opened in a silicon substrate, and this silicon substrate was heat-treated at 1100 ° C. for 4 hours to oxidize the surface and form a SiO 2 insulating film. A comb-shaped electrode is provided on one surface of the silicon substrate, a terminal portion is provided on the opposite surface, and a conductive path is provided in the through hole.
It was formed by sputtering Au. The silicon substrate was roll-coated with the moisture-sensitive film coating solution used in Example 1 and heat-treated at 700 ° C. for 1 hour to form a moisture-sensitive film on the insulating film having the comb-shaped electrodes. A cross-sectional view of the humidity sensor thus manufactured is shown in FIG. In FIG. 8, 1 is a substrate, 2 is an insulating film, 3 is a moisture sensitive film, 4 is an electrode, 6 is a through hole, 7 is a conductive path, and 8 is.
Is a terminal part. FIG. 9 shows the humidity sensitivity characteristic of this humidity sensor.

【0019】(実施例6)シリコン基板に、SiO2
をCVDにより形成し、絶縁膜とした。このシリコン基
板の片面には櫛形電極を、反対側の面には端子部を、側
面には導電路を、Auをメッキすることにより形成し
た。このシリコン基板に、実施例1で用いた感湿膜用コ
ーティング液をスプレーコーティングし、700℃で1
時間熱処理することにより、櫛形電極が形成された絶縁
膜上に感湿膜を形成した。このようにして作製した湿度
センサの断面図を図10に示す。図10において、1は
基板、2は絶縁膜、3は感湿膜、4は電極、7は導電
路、8は端子部である。本湿度センサの感湿特性は、実
施例5で作製した湿度センサと同様であった。
Example 6 A SiO 2 film was formed on a silicon substrate by CVD to form an insulating film. A comb-shaped electrode was formed on one surface of the silicon substrate, a terminal portion was formed on the opposite surface, and a conductive path was formed on the side surface by plating Au. The silicon substrate was spray-coated with the moisture-sensitive film coating solution used in Example 1, and the coating was performed at 700 ° C. for 1 hour.
By heat treatment for a time, a moisture sensitive film was formed on the insulating film on which the comb-shaped electrodes were formed. A cross-sectional view of the humidity sensor thus manufactured is shown in FIG. In FIG. 10, 1 is a substrate, 2 is an insulating film, 3 is a moisture sensitive film, 4 is an electrode, 7 is a conductive path, and 8 is a terminal portion. The humidity sensitivity characteristics of this humidity sensor were similar to those of the humidity sensor manufactured in Example 5.

【0020】(実施例7)シリコン基板に、SiO2
スパッタし、絶縁膜を形成した。ただし、一部はマスク
をして、絶縁膜が形成されないようにした。この絶縁膜
上に、Auペーストをスクリーン印刷することにより、
櫛形電極を形成した。櫛形電極のうち一方は絶縁膜上に
端子部を設け、もう一方は絶縁膜が形成されていない部
分に接続した。そしてシリコン基板の櫛形電極と反対側
の面に、もう一つの端子部を形成した。このシリコン基
板に、実施例1で用いた感湿膜用コーティング液をスピ
ンコーティングし、700℃で1時間熱処理することに
より、櫛形電極が形成された絶縁膜上に感湿膜を形成し
た。このようにして作製した湿度センサの断面図を図1
1に示す。図11において、1は基板、2は絶縁膜、3
は感湿膜、4は電極、8は端子部である。本湿度センサ
の感湿特性は、実施例5で作製した湿度センサと同様で
あった。
Example 7 SiO 2 was sputtered on a silicon substrate to form an insulating film. However, a part was masked so that the insulating film was not formed. By screen-printing Au paste on this insulating film,
A comb-shaped electrode was formed. One of the comb-shaped electrodes was provided with a terminal portion on the insulating film, and the other was connected to a portion where the insulating film was not formed. Then, another terminal portion was formed on the surface of the silicon substrate opposite to the comb-shaped electrode. This silicon substrate was spin-coated with the coating liquid for moisture-sensitive film used in Example 1 and heat-treated at 700 ° C. for 1 hour to form a moisture-sensitive film on the insulating film on which the comb-shaped electrodes were formed. A cross-sectional view of the humidity sensor thus manufactured is shown in FIG.
Shown in 1. In FIG. 11, 1 is a substrate, 2 is an insulating film, 3
Is a moisture sensitive film, 4 is an electrode, and 8 is a terminal portion. The humidity sensitivity characteristics of this humidity sensor were similar to those of the humidity sensor manufactured in Example 5.

【0021】なお、本実施例ではセラミックス系の感湿
膜を用いたが、他の成分のセラミックス系感湿膜、高分
子系の感湿膜でもよい。また、本実施例では湿度を抵抗
値で検出しているが、静電容量で検出してもよい。
Although the ceramic moisture sensitive film is used in this embodiment, a ceramic moisture sensitive film of another component or a polymer moisture sensitive film may be used. Further, in this embodiment, the humidity is detected by the resistance value, but it may be detected by the capacitance.

【0022】[0022]

【発明の効果】以上述べたように本発明の湿度センサ
は、導電性基板上に絶縁膜が形成され、この絶縁膜上に
感湿膜が形成されるので、熱応答が速くなるとともに、
大型の安い基板が使え、量産性が良くなり、1個当りの
コストが安くなる。また、少なくとも1つの端子部が、
導電性基板に関して感湿膜と反対側の面にあると、スペ
ースファクターが良く、安価で、小型機器への応用がし
やすくなる。また、導電性基板にシリコンを用いると、
量産性、信頼性の高い湿度センサが得られる。さらに、
少なくとも感湿膜の部分はすべて覆われるように、含フ
ッ素高分子膜を形成すると、電界質溶液に浸漬しても特
性が変化しない、信頼性の非常に高い湿度センサを得る
ことができる。したがって、湿度計測、湿度制御を必要
とする分野、特に低価格、高信頼性を要求される分野、
携帯機器等に広く応用することができる。
As described above, in the humidity sensor of the present invention, since the insulating film is formed on the conductive substrate and the moisture sensitive film is formed on the insulating film, the thermal response becomes fast and
Large, cheap substrates can be used, mass productivity is improved, and the cost per unit is reduced. Also, at least one terminal portion,
When it is on the surface opposite to the moisture-sensitive film with respect to the conductive substrate, it has a good space factor, is inexpensive, and can be easily applied to small devices. Also, if silicon is used for the conductive substrate,
A highly reliable mass-produced humidity sensor can be obtained. further,
When the fluorine-containing polymer film is formed so that at least the portion of the moisture-sensitive film is covered, it is possible to obtain a highly reliable humidity sensor whose characteristics do not change even when immersed in an electrolyte solution. Therefore, in the fields that require humidity measurement and humidity control, especially those that require low price and high reliability,
It can be widely applied to mobile devices and the like.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の湿度センサの断面図である。FIG. 1 is a sectional view of a humidity sensor of the present invention.

【図2】 本発明の湿度センサの感湿特性図である。FIG. 2 is a humidity sensitive characteristic diagram of the humidity sensor of the present invention.

【図3】 本発明の湿度センサの断面図である。FIG. 3 is a sectional view of the humidity sensor of the present invention.

【図4】 本発明の湿度センサの感湿特性図である。FIG. 4 is a humidity sensitive characteristic diagram of the humidity sensor of the present invention.

【図5】 本発明の湿度センサの断面図である。FIG. 5 is a sectional view of the humidity sensor of the present invention.

【図6】 本発明の湿度センサの断面図である。FIG. 6 is a sectional view of the humidity sensor of the present invention.

【図7】 本発明の湿度センサの感湿特性図である。FIG. 7 is a humidity sensitive characteristic diagram of the humidity sensor of the present invention.

【図8】 本発明の湿度センサの断面図である。FIG. 8 is a sectional view of the humidity sensor of the present invention.

【図9】 本発明の湿度センサの感湿特性図である。FIG. 9 is a humidity sensitive characteristic diagram of the humidity sensor of the present invention.

【図10】 本発明の湿度センサの断面図である。FIG. 10 is a sectional view of the humidity sensor of the present invention.

【図11】 本発明の湿度センサの断面図である。FIG. 11 is a sectional view of the humidity sensor of the present invention.

【符号の説明】[Explanation of symbols]

1 基板 2 絶縁膜 3 感湿膜 4 電極 5 含フッ素高分子膜 6 スルーホール 7 導電路 8 端子部 1 Substrate 2 Insulating film 3 Moisture sensitive film 4 Electrode 5 Fluorine-containing polymer film 6 Through hole 7 Conductive path 8 Terminal part

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 導電性基板上に絶縁膜が形成され、この
絶縁膜上に感湿膜が形成されることを特徴とする湿度セ
ンサ。
1. A humidity sensor, comprising: an insulating film formed on a conductive substrate; and a moisture sensitive film formed on the insulating film.
【請求項2】 導電性基板上に絶縁膜が形成され、この
絶縁膜上に電極が形成され、この電極が形成された絶縁
膜上に感湿膜が形成されることを特徴とする湿度セン
サ。
2. A humidity sensor characterized in that an insulating film is formed on a conductive substrate, an electrode is formed on the insulating film, and a moisture sensitive film is formed on the insulating film on which the electrode is formed. .
【請求項3】 導電性基板上に絶縁膜が形成され、この
絶縁膜上に電極が形成され、この電極上に感湿膜が形成
され、この感湿膜上に電極が形成されることを特徴とす
る湿度センサ。
3. An insulating film is formed on a conductive substrate, an electrode is formed on the insulating film, a moisture sensitive film is formed on the electrode, and an electrode is formed on the moisture sensitive film. A characteristic humidity sensor.
【請求項4】 少なくとも1つの端子部が、導電性基板
に関して感湿膜と反対側の面にあることを特徴とする請
求項1〜3記載の湿度センサ。
4. The humidity sensor according to claim 1, wherein at least one terminal portion is on a surface of the conductive substrate opposite to the moisture sensitive film.
【請求項5】 導電性基板に関して感湿膜側の面にある
電極と、感湿膜と反対側の面にある端子部は、導電性基
板に開けられたスルーホールまたは導電性基板の側面に
絶縁膜が形成され、この絶縁膜上に導電路が形成される
ことにより、電気的に接続されていることを特徴とする
請求項4記載の湿度センサ。
5. The electrode on the surface of the conductive substrate on the moisture sensitive film side and the terminal portion on the surface of the conductive substrate opposite to the moisture sensitive film are formed on the side surface of the through hole or the side surface of the conductive substrate. The humidity sensor according to claim 4, wherein an insulating film is formed, and a conductive path is formed on the insulating film so as to be electrically connected.
【請求項6】 導電性基板に関して感湿膜側の面にある
電極と、感湿膜と反対側の面にある端子部は、導電性基
板の導電性を利用して電気的に接続されていることを特
徴とする請求項4記載の湿度センサ。
6. The electrode on the surface of the conductive substrate facing the moisture sensitive film and the terminal portion on the surface of the conductive substrate opposite to the moisture sensitive film are electrically connected by utilizing the conductivity of the conductive substrate. The humidity sensor according to claim 4, wherein
【請求項7】 導電性基板としてシリコンを用いること
を特徴とする請求項1〜6記載の湿度センサ。
7. The humidity sensor according to claim 1, wherein silicon is used as the conductive substrate.
【請求項8】 少なくとも感湿膜の部分はすべて覆われ
るように、含フッ素高分子膜が形成されていることを特
徴とする請求項1〜7記載の湿度センサ。
8. The humidity sensor according to claim 1, wherein the fluorine-containing polymer film is formed so that at least the portion of the moisture sensitive film is covered.
JP20920692A 1992-08-05 1992-08-05 Moisture sensor Pending JPH0658900A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20920692A JPH0658900A (en) 1992-08-05 1992-08-05 Moisture sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20920692A JPH0658900A (en) 1992-08-05 1992-08-05 Moisture sensor

Publications (1)

Publication Number Publication Date
JPH0658900A true JPH0658900A (en) 1994-03-04

Family

ID=16569114

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20920692A Pending JPH0658900A (en) 1992-08-05 1992-08-05 Moisture sensor

Country Status (1)

Country Link
JP (1) JPH0658900A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002243689A (en) * 2001-02-15 2002-08-28 Denso Corp Capacity-type humidity sensor and method for manufacturing the same
KR100351810B1 (en) * 1999-12-13 2002-09-11 엘지전자 주식회사 absolute humidity sensor
US6628501B2 (en) 2001-06-15 2003-09-30 Denso Corporation Capacitive moisture sensor
US7181966B2 (en) 2004-09-08 2007-02-27 Nippon Soken, Inc. Physical quantity sensor and method for manufacturing the same
JP2007155556A (en) * 2005-12-06 2007-06-21 Denso Corp Humidity sensor
KR20160039797A (en) * 2014-10-02 2016-04-12 고려대학교 산학협력단 Capacitive humidity sensor and method of manufacturing the same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100351810B1 (en) * 1999-12-13 2002-09-11 엘지전자 주식회사 absolute humidity sensor
JP2002243689A (en) * 2001-02-15 2002-08-28 Denso Corp Capacity-type humidity sensor and method for manufacturing the same
US6628501B2 (en) 2001-06-15 2003-09-30 Denso Corporation Capacitive moisture sensor
US7181966B2 (en) 2004-09-08 2007-02-27 Nippon Soken, Inc. Physical quantity sensor and method for manufacturing the same
JP2007155556A (en) * 2005-12-06 2007-06-21 Denso Corp Humidity sensor
JP4650246B2 (en) * 2005-12-06 2011-03-16 株式会社デンソー Humidity sensor
KR20160039797A (en) * 2014-10-02 2016-04-12 고려대학교 산학협력단 Capacitive humidity sensor and method of manufacturing the same

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