JPH0658473B2 - Liquid crystal display device and manufacturing method thereof - Google Patents

Liquid crystal display device and manufacturing method thereof

Info

Publication number
JPH0658473B2
JPH0658473B2 JP60076356A JP7635685A JPH0658473B2 JP H0658473 B2 JPH0658473 B2 JP H0658473B2 JP 60076356 A JP60076356 A JP 60076356A JP 7635685 A JP7635685 A JP 7635685A JP H0658473 B2 JPH0658473 B2 JP H0658473B2
Authority
JP
Japan
Prior art keywords
film
liquid crystal
light
crystal display
metal film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60076356A
Other languages
Japanese (ja)
Other versions
JPS61235819A (en
Inventor
▲吉▼邦 長島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60076356A priority Critical patent/JPH0658473B2/en
Publication of JPS61235819A publication Critical patent/JPS61235819A/en
Publication of JPH0658473B2 publication Critical patent/JPH0658473B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は液晶表示装置に係り、特に有効表示部における
不要な光もれを防ぐために基板に形成する遮光膜の構造
に関する。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly to a structure of a light shielding film formed on a substrate to prevent unnecessary light leakage in an effective display section.

〔発明の背景〕[Background of the Invention]

例えば、カメラのフアインダー内表示用などに用いる液
晶表示素子は、上基板または下基板に遮光膜を形成し、
有効表示部における不要な光もれを防止している(特開
昭59−154424号)。また前記遮光膜は、表示品
質を高めるために、一般に無光沢面となつている。
For example, in a liquid crystal display element used for display in a camera finder, a light-shielding film is formed on an upper substrate or a lower substrate,
Unwanted light leakage in the effective display section is prevented (Japanese Patent Laid-Open No. 59-154424). Further, the light-shielding film is generally a matte surface in order to improve display quality.

従来、前記遮光膜は、つや消し(無光沢)黒色インクを
印刷して形成している。しかし、この方法は、微細パタ
ーンを形成することができなく、また電極パターンとの
位置精度という点でも問題があり、カメラ用などの小型
液晶表示に適用するには、パターン上の制約があつた。
Conventionally, the light shielding film is formed by printing a matte (matte) black ink. However, this method cannot form a fine pattern and has a problem in terms of positional accuracy with respect to the electrode pattern. Therefore, there are restrictions on the pattern when it is applied to a small liquid crystal display for a camera or the like. .

〔発明の目的〕[Object of the Invention]

本発明の目的は、微細パターンを形成することができる
と共に、電極パターンとの位置精度の向上が図れる遮光
膜を有する液晶表示素子を提供することにある。
An object of the present invention is to provide a liquid crystal display device having a light-shielding film which can form a fine pattern and can improve the positional accuracy with respect to an electrode pattern.

本発明の他の目的は、不要な光もれを防ぐと共に、無光
沢面に形成することができる遮光膜を有する液晶表示素
子を提供することにある。
Another object of the present invention is to provide a liquid crystal display device having a light shielding film which can be formed on a matte surface while preventing unnecessary light leakage.

〔発明の概要〕[Outline of Invention]

本発明の一実施例によれば、遮光膜を遮光性を有する金
属膜と無光沢性を有する金属膜との多層金属膜とによつ
て形成してなる。これにより、上記目的が達成される。
According to one embodiment of the present invention, the light-shielding film is formed of a multi-layer metal film including a light-shielding metal film and a matte metal film. This achieves the above object.

〔発明の実施例〕Example of Invention

以下、本発明の一実施例を第1図及び第2図により説明
する。第1図に示すように、電極パターンが形成された
上下基板1、2は、周辺部をシール材3でシールし、内
部に液晶4が封入されている。前記上基板1の外側面に
は、Cr2O3などのように無光沢性を有する金属膜5と、C
rなどのように遮光性を有する金属膜6と、Cr2O3などの
ように無光沢性を有する金属膜7とからなる3層金属膜
が形成されている。また前記金属膜7の外側面及び前記
下基板2の外側面にはそれぞれ偏光板8、9が設けられ
ている。
An embodiment of the present invention will be described below with reference to FIGS. 1 and 2. As shown in FIG. 1, the upper and lower substrates 1 and 2 on which the electrode patterns are formed have their peripheral portions sealed with a sealing material 3, and a liquid crystal 4 is enclosed inside. On the outer surface of the upper substrate 1, a non-gloss metal film 5 such as Cr 2 O 3 and C
A three-layer metal film composed of a light-shielding metal film 6 such as r and a matte metal film 7 such as Cr 2 O 3 is formed. Polarizing plates 8 and 9 are provided on the outer surface of the metal film 7 and the outer surface of the lower substrate 2, respectively.

前記金属膜6は、遮光性という面から1000Å程度、前記
金属膜5、7は、無光沢性という面から500Å程度の
厚さに形成する。これら3層金属膜5、6、7の形成
は、蒸着あるいはスパツタ方法などにより形成し、第2
図に示すように有効表示部10a、シンボルパターン1
0bなどを有する金属膜パターン10に形成する。
The metal film 6 is formed to have a thickness of about 1000 Å in terms of light shielding property, and the metal films 5 and 7 are formed to have a thickness of about 500 Å in terms of matteness. The three-layer metal films 5, 6 and 7 are formed by vapor deposition or a sputtering method, and the second
As shown in the figure, the effective display portion 10a, the symbol pattern 1
The metal film pattern 10 having 0b or the like is formed.

このように、遮光性を有する金属膜6を形成してなるの
で、表示部の不要な光もれを防止できる。また金属膜6
の上下面には無光沢面を有する金属膜5、7を形成して
なるので、金属膜6の両面は無光沢面となる。また3層
金属膜5、6、7よりなるので、金属膜パターン10は
エツチング方法によつて数10μmという微細パターン
に形成することができると共に、位置精度も向上する。
Since the metal film 6 having a light shielding property is formed in this way, unnecessary light leakage of the display section can be prevented. Also, the metal film 6
Since the metal films 5 and 7 having matte surfaces are formed on the upper and lower surfaces, both surfaces of the metal film 6 are matte surfaces. Further, since the three-layer metal films 5, 6 and 7 are used, the metal film pattern 10 can be formed into a fine pattern of several tens of μm by the etching method and the positional accuracy is improved.

なお、上記実施例においては、金属膜5、6、7を上基
板1の外側面に形成したが、下基板2の外側面に形成し
てもよい。また遮光性の金属膜6の上下面に金属膜5、
7を形成し、両側無光沢面としたが、一方の面のみに金
属膜5または7を形成して2層金属膜とし、片側無光沢
面にしてもよい。
Although the metal films 5, 6 and 7 are formed on the outer surface of the upper substrate 1 in the above embodiment, they may be formed on the outer surface of the lower substrate 2. Further, the metal film 5 is formed on the upper and lower surfaces of the light-shielding metal film 6,
7 is formed to be a matte surface on both sides, but the metal film 5 or 7 may be formed on only one surface to form a two-layer metal film, which is a matte surface on one side.

〔発明の効果〕〔The invention's effect〕

以上の説明から明らかなように、本発明によれば、遮光
膜を遮光性の金属膜と無光沢性の金属膜との多層金属膜
によつて形成したので、遮光性及び無光沢性の両方を満
足できる。また微細パターンを形成することができると
共に、位置精度も向上する。これらのことにより、特殊
分野、例えばカメラのフアインダー内表示用液晶表示素
子に適用した場合に優れた効果が得られる。
As is clear from the above description, according to the present invention, since the light-shielding film is formed by the multilayer metal film of the light-shielding metal film and the matte metal film, both the light-shielding property and the matte property are obtained. Can be satisfied. Further, it is possible to form a fine pattern and also improve the positional accuracy. As a result, excellent effects can be obtained when applied to a special field, for example, a liquid crystal display device for display in a finder of a camera.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明になる液晶表示素子の一実施例を示す断
面図、第2図は第1図の金属膜パターンの正面図であ
る。 1……上基板、2……下基板、 3……シール材、4……液晶、 5……無光沢性の金属膜、6……遮光性の金属膜、 7……無光沢性の金属膜、10……金属膜パターン。
FIG. 1 is a sectional view showing an embodiment of the liquid crystal display device according to the present invention, and FIG. 2 is a front view of the metal film pattern of FIG. 1 ... upper substrate, 2 ... lower substrate, 3 ... sealing material, 4 ... liquid crystal, 5 ... matte metal film, 6 ... light-shielding metal film, 7 ... matte metal Membrane, 10 ... Metal film pattern.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】対向面に電極パターンが形成された2枚の
上下基板の周辺をシール材でシールし、内部に液晶を封
入し、かつ前記上基板或は下基板に遮光膜を形成した液
晶表示素子において、前記遮光膜を遮光性の金属膜と無
光沢性の膜との多層膜によって形成したことを特徴とす
る液晶表示素子。
1. A liquid crystal in which the periphery of two upper and lower substrates having electrode patterns formed on opposite surfaces is sealed with a sealing material, liquid crystal is sealed inside, and a light-shielding film is formed on the upper or lower substrate. In the display element, the liquid crystal display element is characterized in that the light-shielding film is formed of a multilayer film including a light-shielding metal film and a matte film.
【請求項2】特許請求の範囲第1項に於いて、上記遮光
膜が上記基板上に金属膜、無光沢膜或は無光沢膜、金属
膜の順で形成されていることを特徴とする液晶表示素
子。
2. The light-shielding film according to claim 1, wherein the light-shielding film is formed on the substrate in the order of a metal film, a matte film or a matte film, and a metal film. Liquid crystal display device.
【請求項3】特許請求の範囲第1項に於いて、上記遮光
膜が上記基板上に無光沢膜、金属膜、無光沢膜の順で形
成されていることを特徴とする液晶表示素子。
3. A liquid crystal display device according to claim 1, wherein the light-shielding film is formed on the substrate in the order of a matte film, a metal film, and a matte film.
【請求項4】対向面に電極パターンが形成された2枚の
上下基板の周辺をシール材でシールし、内部に液晶を封
入し、かつ前記上基板或は下基板の外側面に遮光膜を形
成した液晶表示素子において、前記遮光膜を遮光性の金
属膜と無光沢性の膜との多層膜によって形成したことを
特徴とする液晶表示素子の製造方法において、 上記多層膜をホトレジストを用いたエッチング技術によ
って所望のパターンに形成したことを特徴とする液晶表
示素子の製造方法。
4. A peripheral surface of two upper and lower substrates having electrode patterns formed on opposite surfaces is sealed with a sealant, liquid crystal is sealed inside, and a light-shielding film is provided on the outer surface of the upper or lower substrate. In the formed liquid crystal display element, in the method for manufacturing a liquid crystal display element, wherein the light shielding film is formed of a multilayer film of a light shielding metal film and a matte film, a photoresist is used as the multilayer film. A method of manufacturing a liquid crystal display device, which is characterized in that a desired pattern is formed by an etching technique.
JP60076356A 1985-04-12 1985-04-12 Liquid crystal display device and manufacturing method thereof Expired - Lifetime JPH0658473B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60076356A JPH0658473B2 (en) 1985-04-12 1985-04-12 Liquid crystal display device and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60076356A JPH0658473B2 (en) 1985-04-12 1985-04-12 Liquid crystal display device and manufacturing method thereof

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP7281305A Division JP2753465B2 (en) 1995-10-30 1995-10-30 Manufacturing method of liquid crystal display element
JP9130669A Division JP2948171B2 (en) 1997-05-21 1997-05-21 Liquid crystal display device

Publications (2)

Publication Number Publication Date
JPS61235819A JPS61235819A (en) 1986-10-21
JPH0658473B2 true JPH0658473B2 (en) 1994-08-03

Family

ID=13603079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60076356A Expired - Lifetime JPH0658473B2 (en) 1985-04-12 1985-04-12 Liquid crystal display device and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JPH0658473B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2519523Y2 (en) * 1989-09-22 1996-12-04 カシオ計算機株式会社 Liquid crystal display
EP0794452B1 (en) 1996-03-08 2007-03-21 Canon Kabushiki Kaisha Display apparatus and process for production thereof

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5212464A (en) * 1975-07-21 1977-01-31 Toppan Printing Co Ltd Method of manufacturing photomask
JPS6030956B2 (en) * 1977-01-10 1985-07-19 松下電器産業株式会社 Method for manufacturing color image display device
JPS5421273A (en) * 1977-07-19 1979-02-17 Mitsubishi Electric Corp Manufacture for photo mask
JPS55166605A (en) * 1979-06-13 1980-12-25 Canon Inc Color filter
JPS5734522A (en) * 1980-08-09 1982-02-24 Dainippon Printing Co Ltd Production of electrode substrate for liquid crystal display element
JPS5756067A (en) * 1980-09-19 1982-04-03 Toshiba Corp Emulsion spray
JPS5773741A (en) * 1980-10-24 1982-05-08 Toppan Printing Co Ltd Photomask
JPS5778003A (en) * 1980-10-31 1982-05-15 Toppan Printing Co Ltd Color separation filter
JPS57104141A (en) * 1980-12-22 1982-06-29 Dainippon Printing Co Ltd Photomask and photomask substrate
JPS5913276A (en) * 1982-07-14 1984-01-24 セイコーエプソン株式会社 Manufacture of semiconductor device
JPS5999481A (en) * 1982-11-29 1984-06-08 株式会社日立製作所 Electrode construction for liquid crystal display element
JPS59124319A (en) * 1982-12-29 1984-07-18 Matsushita Electric Ind Co Ltd Image display device
JPS59154424A (en) * 1983-02-22 1984-09-03 Asahi Glass Co Ltd Liquid crystal display device
JPS59184123U (en) * 1983-05-25 1984-12-07 セイコーエプソン株式会社 Data imprinting device for camera
JPS6139024A (en) * 1984-07-31 1986-02-25 Casio Comput Co Ltd Recorder
JPH065467B2 (en) * 1984-09-07 1994-01-19 松下電器産業株式会社 Color liquid crystal display device

Also Published As

Publication number Publication date
JPS61235819A (en) 1986-10-21

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