JPH0653921B2 - Vertical type mechanical device - Google Patents

Vertical type mechanical device

Info

Publication number
JPH0653921B2
JPH0653921B2 JP24560285A JP24560285A JPH0653921B2 JP H0653921 B2 JPH0653921 B2 JP H0653921B2 JP 24560285 A JP24560285 A JP 24560285A JP 24560285 A JP24560285 A JP 24560285A JP H0653921 B2 JPH0653921 B2 JP H0653921B2
Authority
JP
Japan
Prior art keywords
tank
plated
plating
hot
dip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP24560285A
Other languages
Japanese (ja)
Other versions
JPS62107053A (en
Inventor
孝男 新井
Original Assignee
昭和電線電纜株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 昭和電線電纜株式会社 filed Critical 昭和電線電纜株式会社
Priority to JP24560285A priority Critical patent/JPH0653921B2/en
Publication of JPS62107053A publication Critical patent/JPS62107053A/en
Publication of JPH0653921B2 publication Critical patent/JPH0653921B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】 [発明の技術分野] 本発明は、被メッキ線材がほぼ垂直方向に通過するよう
構成された縦型メッキ装置に関する。
Description: TECHNICAL FIELD OF THE INVENTION The present invention relates to a vertical plating apparatus configured so that a wire to be plated passes in a substantially vertical direction.

[発明の技術的背景とその問題点] 一般に、ゴム絶縁被覆の施される銅線や半田付けの施さ
れる銅線には、絶縁ゴム中の遊離イオウにより黒色の硫
化銅が形成されるのを防ぎ、あるいは半田付け時の作業
性を向上させるために、スズメッキを施すことが行なわ
れている。
[Technical Background of the Invention and Problems Thereof] In general, black copper sulfide is formed by free sulfur in insulating rubber on a copper wire coated with rubber insulation or a copper wire soldered. In order to prevent this or improve workability during soldering, tin plating is performed.

従来から、このような銅線上へのスズメッキ装置として
は、第3図に示すような横型のスズメッキ装置が一般に
用いられている。
Conventionally, as such a tin plating device on a copper wire, a horizontal tin plating device as shown in FIG. 3 has been generally used.

このスズメッキ装置1は、通常伸線ラインにおいて伸線
軟化機2とタンデムに接続されて使用されている。
This tin plating apparatus 1 is normally used in a wire drawing line by being connected in tandem with a wire drawing softening machine 2.

このスズメッキ装置は、第3図および第4図に示すよう
に、水平配置された円筒状本体1aの両端部の偏心した
位置に、互いに対向させて銅線通過孔1b、1bを有
し、かつこの銅線通過孔1b、1bを中心にして、円筒
状本体1aが流体シリンダ1cのピストン1dにより回
動されるように構成されている。+印は回動中心であ
る。
As shown in FIGS. 3 and 4, this tin plating apparatus has copper wire passage holes 1b and 1b facing each other at eccentric positions at both ends of a horizontally arranged cylindrical main body 1a, and The cylindrical body 1a is configured to be rotated by the piston 1d of the fluid cylinder 1c around the copper wire passage holes 1b and 1b. The + symbol is the center of rotation.

この円筒状本体1aは、メッキ作業が行なわれる前は、
第3図に点線で示すように、流体シリンダ1cのピスト
ン1dが下降して、銅線通過孔1b、1bが溶融スズ5
の液面Fの上方に位置するようにされている。
The cylindrical main body 1a is
As shown by the dotted line in FIG. 3, the piston 1d of the fluid cylinder 1c is lowered and the copper wire passage holes 1b, 1b are filled with molten tin 5.
It is arranged to be located above the liquid level F.

そしてメッキ作業の際には、伸線軟化機2により伸線さ
れた銅線6が、円筒状本体1a、水冷槽3を経て巻線機
4に巻取り可能な状態に固定され、この状態で円筒状本
体1aに溶融スズ5が、銅線通過孔1b、1bのやや下
側の位置となるまで充填される。
During the plating operation, the copper wire 6 drawn by the wire-drawing softening machine 2 is fixed to the winding machine 4 through the cylindrical body 1a and the water cooling tank 3 so that it can be wound up. Molten tin 5 is filled in the cylindrical main body 1a until it is located slightly below the copper wire passage holes 1b, 1b.

この後、伸線作業が開始され、作業条件が安定したとこ
ろで、流体シリンダ1cのピストン1dが上昇され、こ
れに伴って、第3図に実線で示すように、円筒状本体1
aが回動して銅線通過孔1b、1bの位置が溶融スズ5
の液面Fよりも低い位置とされる。
After this, wire drawing work is started, and when the working conditions are stabilized, the piston 1d of the fluid cylinder 1c is raised, and along with this, as shown by the solid line in FIG.
a is rotated and the positions of the copper wire passage holes 1b and 1b are the molten tin 5
The position is lower than the liquid level F of.

伸線軟化機2により伸線され、軟化された銅線6は入口
側ガイドロール7、8に導かれて、円筒状本体1a内に
導入され、溶融スズ5中を通過してその表面にスズメッ
キが施される。円筒状本体1aを通過した銅線6は水冷
槽3で冷却された後、出口側ガイドロール9、10に導
かれて巻線機4に巻取られる。
The copper wire 6 drawn by the wire drawing softener 2 and softened is guided to the inlet side guide rolls 7 and 8 and introduced into the cylindrical main body 1a, passes through the molten tin 5 and is plated with tin on its surface. Is applied. The copper wire 6 that has passed through the cylindrical main body 1 a is cooled in the water cooling tank 3, then guided to the outlet side guide rolls 9 and 10 and wound up by the winding machine 4.

メッキ作業を停止するときは、上記と逆の手順で各装置
が停止される。
When stopping the plating operation, each device is stopped in the reverse order of the above.

ところで、このような横型スズメッキ装置は、銅線が溶
融スズ内を水平に通過するためスズメッキ装置を出た銅
線のスズメッキ層が自重により下方に移動して、スズメ
ッキ層の下側が厚くなるという難点があった。
By the way, in such a horizontal tin plating apparatus, since the copper wire horizontally passes through the molten tin, the tin plating layer of the copper wire leaving the tin plating apparatus moves downward by its own weight, and the lower side of the tin plating layer becomes thicker. was there.

また、銅線パスラインが溶融スズの浅い部分を水平に通
過するため、溶融スズの対流面積が大きくなって酸化ス
ズの発生量が多くなり、溶融スズの表面に浮いている酸
化スズを巻き込んで、メッキ不良を発生し易いという難
点があった。
In addition, since the copper wire pass line horizontally passes through the shallow part of the molten tin, the convection area of the molten tin becomes large and the amount of tin oxide generated increases, and the tin oxide floating on the surface of the molten tin is entrained. However, there is a drawback that defective plating is likely to occur.

さらに、銅線のスズメッキ装置内での浸漬長さが円筒状
本体の長さにより一義的に決定されるため、細い径の銅
線の場合には線径に対して溶融スズの抵抗が相対的に大
きくなり、したがって銅線巻取速度を大きくとれず生産
性が低くなるという難点があった。
Furthermore, since the immersion length of the copper wire in the tin plating device is uniquely determined by the length of the cylindrical body, the resistance of molten tin is relative to the wire diameter in the case of a thin copper wire. Therefore, there is a problem that the copper wire winding speed cannot be increased and the productivity is lowered.

またさらに、円筒状本体1の水平方向の2箇所の銅線通
過孔1b、1bにダイスを必要とするため、線掛けに時
間がかかるうえに、放熱面積が大きいため消費電力が大
きく、さらに水冷槽も横型となるので設置面積を広く必
要とするという難点があった。
Furthermore, since two copper wire passage holes 1b and 1b in the horizontal direction of the cylindrical main body 1 require dies, it takes time to wire the wires, and since the heat dissipation area is large, power consumption is large, and water cooling Since the tank is also horizontal, there is a drawback that it requires a large installation area.

本発明者等は、先にこのような難点を解消した連続伸線
縦型スズメッキ装置を発明し、特許出願した(特願昭5
9−250262号)(特開昭61−127856号公
報)。
The inventors of the present invention previously invented a continuous wire drawing vertical type tin plating apparatus which solved such a difficulty and applied for a patent (Japanese Patent Application No.
9-250262) (Japanese Patent Laid-Open No. 61-127856).

この縦型スズメッキ装置は、第5図に示すように、溶融
スズ貯留部11、溶融スズ漫漬部12およびこれらを各
々底部側面で連通させる溶融スズ連通部13とを有する
二槽式スズメッキ槽14と、この二槽式スズメッキ槽1
4を溶融スズ連通部13の底部でヒンジ15aにより傾
動可能に支持する支持装置15と、溶融スズ貯留部11
の底部にピストン16aの作動端を固着させた流体シリ
ンダ16bからなる傾動装置16とから、その主体部分
が構成されている。17は伸線軟化機、18は水冷槽、
19は巻取機である。なお、二槽式スズメッキ槽14の
内部にはヒーター20が配設されており、スズが溶融状
態を保つよう加熱している。
As shown in FIG. 5, this vertical tin plating apparatus has a two-tank type tin plating tank 14 having a molten tin storage portion 11, a molten tin immersion portion 12 and a molten tin communication portion 13 for communicating these at the bottom side surfaces. And this two tank type tin plating tank 1
4, a support device 15 for tiltably supporting the molten tin communication portion 13 at the bottom of the molten tin communication portion 13 by a hinge 15a, and a molten tin storage portion 11
The main part of the tilting device 16 is composed of a fluid cylinder 16b having a working end of a piston 16a fixed to the bottom of the tilting device 16. 17 is a wire drawing softener, 18 is a water cooling tank,
19 is a winder. A heater 20 is provided inside the two-tank tin plating tank 14 to heat the tin so that the tin is kept in a molten state.

上記構成の縦型スズメッキ装置においては、まずメッキ
作業開始に先立って、溶融スズ21が溶融スズ貯留部1
1側に移動するように傾動装置16のピストン16aを
矢印A方向に動作させて銅線通過孔12aを露出させ
る。次いで伸線軟化機17から送出される銅線22を入
口側ガイドロール23を経て溶融スズ浸漬部12の上部
からその底部の銅線挿通孔12aへと導いてダイス24
を通過させ、更に溶融スズ浸漬部12を出た銅線22を
出口側ガイドロール25を経て水冷槽18へ導き、シー
ブ26、水冷槽18′、ガイドロール27を経て巻線機
19まで線掛けする。そして、ガイドロール25はエア
シリンダ25aにより銅線通路に向かって進退自在とさ
れており、ピストン16aが矢印A方向に移動した状態
では銅線通路側に前進し、反対方向に移動した状態では
後退して銅線22を常に銅線挿通孔12aのほぼ中心に
案内するように構成されている。線掛け完了後、傾動装
置16のピストン16aを上昇させて、溶融スズ浸漬部
12内に銅線22のメッキに必要な浸漬長Lが取れるよ
うに溶融スズ21を溶融スズ貯留部11側から溶融スズ
浸漬部12側に移動させる。浸漬長Lは溶融スズ貯留部
11内に投入する溶融スズの量を調節することにより変
えることができる。
In the vertical tin plating apparatus having the above-described configuration, first, the molten tin 21 is melted into the molten tin storage portion 1 before starting the plating operation.
The piston 16a of the tilting device 16 is moved in the direction of arrow A so as to move to the 1 side to expose the copper wire passage hole 12a. Next, the copper wire 22 delivered from the wire drawing softener 17 is guided through the inlet side guide roll 23 from the upper portion of the molten tin dipping portion 12 to the copper wire insertion hole 12a at the bottom thereof, and the die 24
The copper wire 22 that has passed through the molten tin dipping portion 12 and is guided to the water cooling tank 18 via the guide roller 25 on the outlet side, and is wire-wound to the winding machine 19 via the sheave 26, the water cooling tank 18 ', and the guide roll 27. To do. The guide roll 25 is movable back and forth toward the copper wire passage by the air cylinder 25a. The guide roll 25 advances toward the copper wire passage when the piston 16a moves in the direction of arrow A, and moves backward when the piston 16a moves in the opposite direction. Then, the copper wire 22 is always guided to substantially the center of the copper wire insertion hole 12a. After completion of the wire drawing, the piston 16a of the tilting device 16 is raised to melt the molten tin 21 from the molten tin storage portion 11 side so that the immersion length L necessary for plating the copper wire 22 in the molten tin immersion portion 12 can be obtained. It is moved to the tin immersion part 12 side. The immersion length L can be changed by adjusting the amount of molten tin put into the molten tin reservoir 11.

この後、巻線機19を駆動させて銅線22を連続的に溶
融スズ浸漬部12に通過させれば、銅線22上にスズメ
ッキが施される。
After that, when the winding machine 19 is driven to continuously pass the copper wire 22 through the molten tin dipping portion 12, the copper wire 22 is tin-plated.

ところで、このスズメッキ装置においては、エアシリン
ダ25aがエア切れや溶融スズ浸漬部からの熱、あるい
は電気系統の故障により動作が円滑に行なわれなくなる
という問題を生じるおそれがあった。
By the way, in this tin plating apparatus, there is a risk that the air cylinder 25a may not operate smoothly due to air shortage, heat from the molten tin immersion portion, or failure of the electrical system.

そして、このような不具合が発生すると断線が生じその
復帰に多大の手数を要して生産性を大きく阻害するとい
う問題を生じるおそれがあった。
When such a defect occurs, there is a possibility that a disconnection occurs, it takes a lot of trouble to restore it, and productivity is greatly impaired.

[発明の目的] 本発明はかかる従来の事情に対処してなされたもので、
故障の少ない被メッキ線材保持装置を備え上記の問題が
改善された縦型メッキ装置を提供することを目的とす
る。
[Object of the Invention] The present invention has been made in response to such conventional circumstances.
It is an object of the present invention to provide a vertical plating apparatus which includes a plated wire holding device with few failures and which solves the above problems.

[発明の概要] すなわち本発明のメッキ装置は、上述した縦型メッキ装
置において、被メッキ線材保持装置を、先端の被メッキ
線材保持部を前記被メッキ線材通路に位置させて後退可
能に保持された作動腕と、この作動腕を前記被メッキ線
材通路に向けて付勢するばね装置と、二槽式メッキ槽と
基台とに設けられ前記二槽式メッキ槽を傾動位置から正
常位置に復帰させる際互いに当接し前記二槽式メッキ槽
の傾動につれて前記作動腕を前記ばね装置のばねに抗し
て後退させる係合装置とから構成することにより、故障
が少なく、これによってメッキ作業における生産性を向
上させたものである。
[Summary of the Invention] That is, in the plating apparatus of the present invention, in the above-described vertical plating apparatus, the plated wire holding device is held so as to be retractable by positioning the plated wire holding portion at the tip in the plated wire passage. Operating arm, a spring device for urging the operating arm toward the plated wire passage, a two-tank type plating tank and a base, and the two-tank type plating tank is returned from a tilted position to a normal position. When the two-tank type plating tanks are brought into contact with each other when the two-tank type plating tanks are tilted, the operating arms are retracted against the springs of the spring devices, so that the number of failures is reduced, thereby improving the productivity in the plating operation. Is improved.

[発明の実施例] 次に本発明の実施例について説明する。Embodiments of the Invention Next, embodiments of the present invention will be described.

なお以下の実施例において、被メッキ線材保持装置を除
く部分は、前述した本発明者の発明した縦型メッキ装置
と同一構成であるので、同一部分に同一符号を付して重
複する説明を省略する。
In the following examples, parts other than the device for holding a wire to be plated have the same configuration as the vertical plating device invented by the present inventor, and therefore, the same parts are designated by the same reference numerals to omit redundant description. To do.

第1図は本発明の装置の要部を示す正面図である。FIG. 1 is a front view showing the main part of the device of the present invention.

この実施例の被メッキ線材保持装置50は、その本体部
分が二槽式スズメッキ槽14に固定され、この二槽式ス
ズメッキ槽14とともにヒンジ15aにより傾動可能に
構成されている。
The plated wire holding device 50 of this embodiment has a main body fixed to the two-tank tin plating tank 14 and is configured to be tiltable together with the two-tank tin plating tank 14 by a hinge 15a.

この本体部分は、後端にフランジ51を有する筒条部5
2とこの筒条部52内に摺動自在に内挿された作動腕5
3とから主として構成されている。作動腕53の先端に
はガイドロール54が装着され、後端部は小径とされ、
その端面には止め板55が固定されている。作動腕53
の小径部と筒条部52間にはコイルばね56が介挿さ
れ、押え板57により固定されている。さらに筒条部5
2の外側下部にはくさび状のストライカー58aが固定
され、また支持装置15の上面のこのストライカー58
aと係合する位置にくさび状のストライカー58bが固
定されている。
This main body portion has a tubular portion 5 having a flange 51 at the rear end.
2 and the operating arm 5 slidably inserted in the tubular portion 52
3 and 3. A guide roll 54 is attached to the tip of the operating arm 53, and the rear end has a small diameter.
A stop plate 55 is fixed to the end surface. Working arm 53
A coil spring 56 is inserted between the small-diameter portion and the tubular portion 52, and is fixed by a holding plate 57. Furthermore, the tubular portion 5
A wedge-shaped striker 58a is fixed to the outer lower portion of 2, and the striker 58a on the upper surface of the support device 15 is fixed.
A wedge-shaped striker 58b is fixed at a position where it engages with a.

そして作動腕53の長さおよびストライカー58a、5
8bの固定位置は、第2図に示すように、二槽式スズメ
ッキ槽14が傾動した状態ではストライカー58a、5
8bが離間してコイルばね56の弾撥力により作動腕5
3が前進してガイドロール54が被メッキ線材通路にそ
の案内面を位置させ、二槽式スズメッキ槽14がこの位
置から正常状態に復帰する過程でストライカー58a、
58bが係合してそのくさび面に沿って移動してコイル
ばね56の弾撥力に抗して作動腕53を後退させ、これ
によってガイドロール54と被メッキ線材通路間とがほ
ぼストライカーの厚さに相当する間隔dをおいて離間す
るようになっている。
The length of the operating arm 53 and the strikers 58a, 5
As shown in FIG. 2, the fixed positions of the 8b are the strikers 58a, 5a when the two-tank tin plating tank 14 is tilted.
8b is separated from each other and the elastic force of the coil spring 56 causes the operating arm 5 to move.
3 moves forward and the guide roll 54 positions its guide surface in the passage of the wire to be plated, and the striker 58a, in the process of the dual tank tin plating tank 14 returning from this position to the normal state.
58b engages and moves along the wedge surface to retreat the actuating arm 53 against the elastic force of the coil spring 56, whereby the distance between the guide roll 54 and the plated wire passage is almost equal to the striker thickness. The distance d corresponding to the height is set.

また、二槽式スズメッキ槽14が正常位置から傾動動作
をするときには、上記と逆の順序でストライカー58
a、58bが離間し、作動腕53がコイルばね56の弾
撥力により前進してガイドロール54が被メッキ線材通
路に位置するようになる。
When the two-tank tin plating tank 14 tilts from the normal position, the striker 58 is moved in the reverse order to the above.
The a and 58b are separated from each other, and the operating arm 53 is moved forward by the elastic force of the coil spring 56 so that the guide roll 54 is positioned in the plated wire passage.

[発明の効果] 以上説明したように本発明の縦型メッキ装置は、次のよ
うな利点を有している。
[Advantages of the Invention] As described above, the vertical plating apparatus of the present invention has the following advantages.

銅線が溶融スズ浸漬部を垂直方向に通過するため、
自重によるメッキ厚の扁肉がなく、均一な厚さのメッキ
層が得られる。
Since the copper wire passes vertically through the molten tin immersion part,
A plating layer having a uniform thickness can be obtained without flattening the plating thickness due to its own weight.

溶融スズ浸漬部の中心を銅線が通過するため、酸化
スズの巻き込みがなく、良好なメッキ層が得られる。
Since the copper wire passes through the center of the molten tin soaked portion, tin oxide is not entrained and a good plating layer can be obtained.

溶融スズ浸漬部の浸漬長が可変であるので、細い径
の銅線の場合にも線速を上昇させ得る。
Since the immersion length of the molten tin immersion part is variable, the linear velocity can be increased even in the case of a copper wire having a small diameter.

使用するダイスは溶融スズ浸漬部の銅線通過孔1個
所だけでよいので線掛けが容易である。
Since the die to be used need only be one copper wire passage hole in the molten tin dipping portion, it is easy to wire.

銅線が通過する溶融スズ浸漬部内の対流面積が小さ
いので酸化スズの発生が少ない。
Since the convection area in the molten tin immersion part through which the copper wire passes is small, the generation of tin oxide is small.

溶融スズ浸漬部の直下に冷却装置を配置できるの
で、設置面積を縮少できる。
Since the cooling device can be arranged directly below the molten tin immersion portion, the installation area can be reduced.

二槽式であるのでヒーターの加熱効率がよい。 Since it is a two-tank type, the heating efficiency of the heater is good.

被メッキ線材保持装置は、二槽式メッキ槽k傾動動
作に応じて機械的手段により動作するので故障が少な
く、生産性を向上させることができる。
The device for holding a wire to be plated operates by mechanical means in response to the tilting operation of the two-tank type plating tank k, so that there are few failures and the productivity can be improved.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の一実施例の縦型スズメッキ装置の要部
を示す正面図、第2図はその動作を示す正面図、第3図
は従来の横型スズメッキ装置の概略図、第4図は第3図
のIII−III線に沿う断面図、第5図は従来の他の横型の
スズメッキ装置の断面図である。 11……溶融スズ貯留部 12……溶融スズ浸漬部 13……溶融スズ連通部 14……二槽式スズメッキ槽 15……支持装置 16……傾動装置 17……伸線軟化機 18、18′……水冷槽 19……巻取機 20……ヒーター 21……溶融スズ 22……銅線 50……被メッキ線材保持装置 51……フランジ 52……筒条部 53……作動腕 54……ガイドロール 55……止め板 56……コイルばね 57……押え板 58a、58b……ストライカー
FIG. 1 is a front view showing a main part of a vertical tin plating apparatus according to an embodiment of the present invention, FIG. 2 is a front view showing its operation, FIG. 3 is a schematic view of a conventional horizontal tin plating apparatus, and FIG. Is a sectional view taken along the line III-III of FIG. 3, and FIG. 5 is a sectional view of another conventional horizontal tin plating apparatus. 11 ... Molten tin storage part 12 ... Molten tin immersion part 13 ... Molten tin communication part 14 ... Two-tank type tin plating tank 15 ... Supporting device 16 ... Tilt device 17 ... Wire drawing softening machine 18, 18 ' …… Water cooling tank 19 …… Winder 20 …… Heater 21 …… Molten tin 22 …… Copper wire 50 …… Plated wire material holding device 51 …… Flange 52 …… Cylindrical part 53 …… Operating arm 54 …… Guide roll 55 …… Stop plate 56 …… Coil spring 57 …… Pressing plate 58a, 58b …… Striker

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】底部に小径の被メッキ線材挿通孔を有し被
メッキ線材が前記挿通孔を通って垂直方向に通過する溶
融メッキ材浸漬部、溶融メッキ材を貯留する溶融メッキ
材貯留部および前記溶融メッキ材浸漬部と溶融メッキ材
貯留部とを連通させる溶融メッキ材連通部とを有する二
槽式メッキ槽と、この二槽式メッキ槽を基台に傾動可能
に支持する支持手段と、前記溶融メッキ材浸漬部が溶融
メッキ材貯留部に対して相対的に上下動するように前記
二槽式メッキ槽を傾動させる手段と、前記二槽式メッキ
槽を傾動させたとき前記溶融メッキ材浸漬部の下方の被
メッキ線材通路に突出して被メッキ線材を保持してこの
被メッキ線材と溶融メッキ材浸漬部の被メッキ線材挿通
孔との相対位置を維持する被メッキ線材保持装置とを備
えた縦型メッキ装置において、前記被メッキ線材保持装
置が、先端の被メッキ線材保持部を前記被メッキ線材通
路に位置させて後退可能に保持された作動腕と、この作
動腕を前記被メッキ線材通路に向けて付勢するばね装置
と、前記二槽式メッキ槽と基台とに設けられ前記二槽式
メッキ槽を傾動位置から正常位置に復帰させる際互いに
当接し前記二槽式メッキ槽の傾動につれて前記作動腕を
前記ばね装置のばねに抗して後退させる係合装置とから
成ることを特徴とする縦型メッキ装置。
1. A hot-dip plated material dipping portion for allowing a wire to be plated to pass through the through hole in the vertical direction, a hot-dip plated material reservoir for storing hot-dip plated material, and A two-tank type plating tank having a hot-dip plating material communicating portion that connects the hot-dip plating material immersion portion and the hot-dip plating material storage portion, and a supporting means for tiltably supporting the two-tank plating tank on a base, Means for tilting the two-tank type plating tank so that the hot-dip plated material immersion part moves up and down relative to the hot-dip plated material reservoir, and the hot-dip plated material when the two-tank type plating tank is tilted A plated wire holding device for projecting into the plated wire passage below the immersion part to hold the plated wire and maintain the relative position between the plated wire and the plated wire insertion hole of the hot dip immersion part Vertical plating equipment In the device for holding a plated wire rod, the device for holding a plated wire rod at a tip end is positioned in the plated wire passage, and the operating arm is held so as to be retractable, and the operating arm is attached to the plated wire passage. A biasing spring device, and the two-tank plating tank and the base, which are provided in the two-tank plating tank and the base, contact each other when the two-tank plating tank is returned from the tilted position to the normal position, and the operating arm moves as the two-tank plating tank tilts. An engaging device for retracting the spring against the spring of the spring device.
JP24560285A 1985-10-31 1985-10-31 Vertical type mechanical device Expired - Lifetime JPH0653921B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24560285A JPH0653921B2 (en) 1985-10-31 1985-10-31 Vertical type mechanical device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24560285A JPH0653921B2 (en) 1985-10-31 1985-10-31 Vertical type mechanical device

Publications (2)

Publication Number Publication Date
JPS62107053A JPS62107053A (en) 1987-05-18
JPH0653921B2 true JPH0653921B2 (en) 1994-07-20

Family

ID=17136162

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24560285A Expired - Lifetime JPH0653921B2 (en) 1985-10-31 1985-10-31 Vertical type mechanical device

Country Status (1)

Country Link
JP (1) JPH0653921B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9084125B2 (en) 2007-09-18 2015-07-14 Lg Electronics Inc. Method of performing polling procedure in a wireless communication system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9084125B2 (en) 2007-09-18 2015-07-14 Lg Electronics Inc. Method of performing polling procedure in a wireless communication system

Also Published As

Publication number Publication date
JPS62107053A (en) 1987-05-18

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