JPH0652813A - Flat display and manufacture thereof - Google Patents

Flat display and manufacture thereof

Info

Publication number
JPH0652813A
JPH0652813A JP22527892A JP22527892A JPH0652813A JP H0652813 A JPH0652813 A JP H0652813A JP 22527892 A JP22527892 A JP 22527892A JP 22527892 A JP22527892 A JP 22527892A JP H0652813 A JPH0652813 A JP H0652813A
Authority
JP
Japan
Prior art keywords
emission source
electron emission
exhaust pipe
substrate
flat display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22527892A
Other languages
Japanese (ja)
Other versions
JP3189409B2 (en
Inventor
Akira Nakayama
昭 中山
Toshio Oboshi
敏夫 大星
Junichi Inoue
潤一 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP22527892A priority Critical patent/JP3189409B2/en
Publication of JPH0652813A publication Critical patent/JPH0652813A/en
Application granted granted Critical
Publication of JP3189409B2 publication Critical patent/JP3189409B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2209/00Apparatus and processes for manufacture of discharge tubes
    • H01J2209/38Control of maintenance of pressure in the vessel
    • H01J2209/385Gettering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2329/00Electron emission display panels, e.g. field emission display panels

Landscapes

  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)

Abstract

PURPOSE:To obtain a flat display capable of keeping ultimate vacuum high and also the degree of vacuum high. CONSTITUTION:A basic board 1 with a fluorescent surface 3 provided on a main surface and a basic board 2 with a secondary electron emission source 4 provided on a main surface are faced against each other so that the fluorescent surface 3 is in opposite to the secondary electron emission source 4, and a plurality of through-holes 2a are made in the part of the basic board 2 in which the secondary electron emission source is not provided, and a getter container 5 is provided in the position corresponding to the through-holes 2a in the other surface of the basic board. Then, an exhaust tube communicating with the through-holes may be provided. Furthermore, when a thermal exhaust treatment is applied to the opposed basic boards, a thermal exhaust treatment is applied to the exhaust tube or the exhaust treatment may be applied thereto by applying electron beams to the fluorescent surface from the secondary electron emission source.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、一主面に電子放出源を
有する基板と一主面に蛍光面を有する基板を電子放出源
と蛍光面が対向するように対向させてなるフラットディ
スプレイ及びその製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flat display in which a substrate having an electron emission source on one main surface and a substrate having a fluorescent surface on one main surface are opposed to each other so that the electron emission source and the fluorescent surface face each other. The present invention relates to a manufacturing method thereof.

【0002】[0002]

【従来の技術】文字や映像等の画像による情報の表示装
置としてディスプレイ装置がよく用いられているが、近
年では、小型,薄型のディスプレイ装置が求められてお
り、液晶を用いたものや蛍光体を用いた薄型の平面ディ
スプレイ装置が提案されている。上記平面ディスプレイ
の代表的なものとしては、フィールド・エミッション・
ディスプレイ(Field Emission Dis
play、以下、FEDと略する。)が挙げられる。
2. Description of the Related Art A display device is often used as a display device for displaying information such as characters and images, but in recent years, a small and thin display device has been demanded. There has been proposed a thin flat display device using. A typical example of the above flat panel display is a field emission display.
Display (Field Emission Dis)
Play, hereinafter abbreviated as FED. ) Is mentioned.

【0003】上記FEDは、微小冷陰極等の電子放出源
が画素に応じてマトリックス状に配列されてなる2次元
電子放出源を形成した基板と、ブラックマトリックスを
境として色区分された蛍光体が形成された基板とを、前
記2次元電子放出源と蛍光体が対向するように対向させ
たものであり、2次元電子放出源から電子ビームを蛍光
体に照射して蛍光体の発光によって基板上に表示を行う
ものである。
The FED is composed of a substrate on which a two-dimensional electron emission source is formed by arranging electron emission sources such as micro cold cathodes in a matrix according to pixels, and a phosphor which is color-separated with a black matrix as a boundary. The formed substrate is opposed to the two-dimensional electron emission source so that the phosphor is opposed to the two-dimensional electron emission source, and the phosphor is irradiated with an electron beam from the two-dimensional electron emission source to emit light from the phosphor onto the substrate. Is to be displayed.

【0004】FEDは、次のような工程を経て製造され
る。先ず、ガラス等よりなる基板の一主面にスラリー
法,印刷法,電着法等の手法により蛍光体を塗布し蛍光
面とし、蛍光面の周囲にフリットシールを配し、酸化処
理を施し基板上の有機物を焼結させる。それと同時に、
外部に貫通する排気孔を端部に有する基板の一主面に、
微小冷陰極が画素に応じてマトリックス状に配列されて
なる2次元電子放出源を形成する。そして、これら2つ
の基板を蛍光体と2次元電子放出源が対向するようにフ
リットシールをスペーサーとして空間を有して向かい合
わせて接合する。次に、接合部にフリットシールを配し
て酸化処理を施した排気管を基板の排気孔に接合し、該
排気管から基板間の空間の排気を行う。この際、排気を
促進するために基板に加熱処理を施しながら排気処理を
行う。基板間の空間の真空度が所定の真空度に達した
後、排気管中にゲッターを配して排気管を封止し、FE
Dを得る。
The FED is manufactured through the following steps. First, a fluorescent material is applied to one main surface of a substrate made of glass or the like by a method such as a slurry method, a printing method, or an electrodeposition method to form a fluorescent surface, a frit seal is arranged around the fluorescent surface, and an oxidation treatment is applied to the substrate. Sinter the organic material above. At the same time,
On one main surface of the substrate having an exhaust hole penetrating to the outside,
A two-dimensional electron emission source is formed by arranging micro cold cathodes in a matrix according to pixels. Then, these two substrates are bonded to each other with a space as a spacer using a frit seal so that the phosphor and the two-dimensional electron emission source face each other. Next, an exhaust pipe subjected to oxidation treatment with a frit seal disposed at the joint is joined to the exhaust hole of the substrate, and the space between the substrates is exhausted from the exhaust pipe. At this time, the exhaust treatment is performed while the substrate is subjected to heat treatment in order to accelerate the exhaust. After the vacuum degree in the space between the substrates reaches a predetermined vacuum degree, a getter is arranged in the exhaust pipe to seal the exhaust pipe,
Get D.

【0005】[0005]

【発明が解決しようとする課題】ところで、従来ディス
プレイ装置に用いられていたCRT等の電子管において
は、電子放出源と蛍光面間の空間に必要な真空度は10
-3〜10-4Pa程度であり、あまり高い真空度は必要と
されず、また空間が広いことからゲッターの飛散領域も
広く、多少のガスの発生により真空度が変化することは
あまりなかった。一方、FEDは非常に薄型のディスプ
レイ装置であり、電子放出源と蛍光面間の空間、すなわ
ち基板間の空間に必要とされる真空度は10-6Paと非
常に高く、基板間の空間が非常に狭いことから、微量の
ガスの発生によって真空度が大きく変化してしまう。基
板間の空間の真空度が低下すると、電子放出源である微
小冷陰極を汚染してしまい電子ビームの照射に支障をき
たし、FEDの耐久性の低下を招いてしまう。
By the way, in an electron tube such as a CRT which has been conventionally used in a display device, the degree of vacuum required in the space between the electron emission source and the phosphor screen is 10.
It is about -3 to 10 -4 Pa, a high degree of vacuum is not required, and since the space is large, the getter scattering area is also wide, and the degree of vacuum does not change much due to the generation of some gas. . On the other hand, the FED is a very thin display device, and the degree of vacuum required for the space between the electron emission source and the phosphor screen, that is, the space between the substrates is as high as 10 −6 Pa, and the space between the substrates is Since it is extremely narrow, the degree of vacuum changes greatly due to the generation of a small amount of gas. If the degree of vacuum in the space between the substrates decreases, the minute cold cathodes, which are the electron emission sources, are contaminated, which hinders the irradiation of the electron beam, and the durability of the FED is deteriorated.

【0006】しかしながら、上述のような製造方法でF
EDの製造を行った場合、排気孔が基板の端部にしか設
けられていないこと及び基板間の空間が狭いことから排
気効率が悪く、排気速度が遅い上に到達真空度が低い。
また、排気管中にゲッターを配して排気管を封止する
が、排気孔が基板の1ヶ所しか設けられていないため、
封止後に基板間に発生したガスがゲッターにより吸収さ
れるには時間がかかってしまう。さらに、基板の一主面
に形成される蛍光面を構成する蛍光体が粉末であるた
め、排気管の封止後に電子ビームの照射によりガスを発
生する。このようなことから、FEDの基板間の空間の
真空度を高く保つことは困難であり、FED内の真空度
の低下がFEDの耐久性の低下を招いてしまう。
However, in the above manufacturing method, F
When the ED is manufactured, since the exhaust holes are provided only at the end portions of the substrates and the space between the substrates is narrow, the exhaust efficiency is poor, the exhaust speed is slow, and the ultimate vacuum is low.
Further, a getter is arranged in the exhaust pipe to seal the exhaust pipe, but since the exhaust hole is provided only in one place on the substrate,
It takes time for the gas generated between the substrates after the sealing to be absorbed by the getter. Further, since the phosphor forming the phosphor screen formed on the one main surface of the substrate is powder, gas is generated by irradiation of the electron beam after the exhaust pipe is sealed. For this reason, it is difficult to maintain a high degree of vacuum in the space between the substrates of the FED, and a decrease in the degree of vacuum inside the FED leads to a decrease in the durability of the FED.

【0007】そこで、本発明は従来の実情に鑑みて提案
されたものであり、フラットディスプレイ内の到達真空
度を高め、真空度を高く維持することのできるフラット
ディスプレイ及びその製造方法を提供することを目的と
する。
Therefore, the present invention has been proposed in view of the conventional circumstances, and provides a flat display capable of increasing the ultimate vacuum in the flat display and maintaining the high vacuum, and a manufacturing method thereof. With the goal.

【0008】[0008]

【課題を解決するための手段】上述の目的を達成するた
めに本発明は、一主面に電子放出源を有する基板と一主
面に蛍光面を有する基板を電子放出源と蛍光面が対向す
るように対向させてなるフラットディスプレイにおい
て、一主面に電子放出源を有する基板の電子放出源の設
けられない部分に複数の貫通孔を穿設し、基板の背面側
の該貫通孔に対応した位置にゲッター容器が設けられて
いることを特徴とするものである。
In order to achieve the above-mentioned object, according to the present invention, a substrate having an electron emission source on one main surface and a substrate having a fluorescent surface on one main surface are opposed to each other. In a flat display facing each other as described above, a plurality of through holes are formed in a portion of the substrate having an electron emission source on one main surface where the electron emission source is not provided, and the through holes on the back side of the substrate are provided. The getter container is provided at the above position.

【0009】また、本発明は一主面に電子放出源を有す
る基板と一主面に蛍光面を有する基板を電子放出源と蛍
光面が対向するように対向させてなるフラットディスプ
レイにおいて、一主面に電子放出源を有する基板の電子
放出源の設けられない部分に複数の貫通孔が穿設され、
これら貫通孔に連通する排気管が設けられていることを
特徴とするものである。この際、排気管内にゲッターが
配されている構造としても良い。
The present invention also provides a flat display in which a substrate having an electron emission source on one main surface and a substrate having a fluorescent surface on one main surface are opposed to each other so that the electron emission source and the fluorescent surface face each other. A plurality of through holes are formed in a portion of the substrate having an electron emission source on the surface where the electron emission source is not provided,
An exhaust pipe communicating with these through holes is provided. At this time, the getter may be arranged in the exhaust pipe.

【0010】さらに本発明は、一主面に電子放出源を有
する基板と一主面に蛍光面を有する基板を電子放出源と
蛍光面が対向するように空間を介して対向させ、該基板
間の空間に対し加熱排気処理を施した後に排気管を封止
するフラットディスプレイの製造方法において、排気管
を封止する前に排気管に加熱排気処理を施すことを特徴
とするものである。
Further, according to the present invention, a substrate having an electron emission source on one main surface and a substrate having a fluorescent surface on one main surface are opposed to each other through a space so that the electron emission source and the fluorescent surface are opposed to each other, and the space between the substrates is increased. In the method of manufacturing a flat display in which the exhaust pipe is sealed after the exhaust pipe is heated and exhausted, the exhaust pipe is heated and exhausted before the exhaust pipe is sealed.

【0011】また、本発明は、一主面に電子放出源を有
する基板と一主面に蛍光面を有する基板を電子放出源と
蛍光面が対向するように空間を介して対向させ、該基板
間の空間に対し加熱排気処理を施した後に排気管を封止
するフラットディスプレイの製造方法において、排気管
を封止する前に電子放出源より電子ビームを蛍光面に照
射することを特徴とするものである。
Further, according to the present invention, a substrate having an electron emission source on one main surface and a substrate having a fluorescent surface on one main surface are opposed to each other through a space so that the electron emission source and the fluorescent surface face each other, and the substrate In a method of manufacturing a flat display in which an exhaust pipe is sealed after heating and exhausting a space between the spaces, a phosphor screen is irradiated with an electron beam from an electron emission source before sealing the exhaust pipe. It is a thing.

【0012】さらには、本発明においては、上記電子放
出源が微小冷陰極であっても良い。
Further, in the present invention, the electron emission source may be a micro cold cathode.

【0013】[0013]

【作用】FEDのような薄型のフラットディスプレイに
おいては、フラットディスプレイ内に必要とされる真空
度が高い上、フラットディスプレイ内の空間が狭いため
微量のガスの発生によって真空度が大きく変化してしま
い、フラットディスプレイの電子放出源である微小冷陰
極を汚染し、フラットディスプレイの耐久性を低下させ
てしまう。
In a thin flat display such as an FED, the degree of vacuum required in the flat display is high, and since the space in the flat display is small, the degree of vacuum changes greatly due to the generation of a small amount of gas. However, it contaminates the micro cold cathode, which is the electron emission source of the flat display, and reduces the durability of the flat display.

【0014】本発明においては、一主面に電子放出源を
有する基板と一主面に蛍光面を有する基板を電子放出源
と蛍光面が対向するように対向させてなるフラットディ
スプレイにおいて、一主面に電子放出源を有する基板の
電子放出源の設けられない部分に複数の貫通孔が穿設さ
れ、基板の背面側の該貫通孔に対応した位置にゲッター
容器が設けられているため、多量のゲッターを収納で
き、該ゲッターが比較的広範囲に飛散することが可能で
あり、フラットディスプレイ内で発生したガスを効率良
く吸収することができるためフラットディスプレイ内の
真空度を高く維持することができる。
In the present invention, in a flat display in which a substrate having an electron emission source on one main surface and a substrate having a fluorescent surface on one main surface are opposed to each other such that the electron emission source and the fluorescent surface are opposed to each other, Since a plurality of through holes are formed in a portion of the substrate having the electron emission source on the surface where the electron emission source is not provided, and the getter container is provided at a position corresponding to the through hole on the back side of the substrate, a large amount of The getter can be stored, the getter can be scattered in a relatively wide range, and the gas generated in the flat display can be efficiently absorbed, so that the degree of vacuum in the flat display can be maintained high. .

【0015】また、本発明は一主面に電子放出源を有す
る基板と一主面に蛍光面を有する基板を電子放出源と蛍
光面が対向するように対向させてなるフラットディスプ
レイにおいて、一主面に電子放出源を有する基板の電子
放出源の設けられない部分に複数の貫通孔が穿設され、
これら貫通孔に連通する排気管が設けられているため、
フラットディスプレイ内を排気する際の排気効率が良好
であり、フラットディスプレイ内の到達真空度を短時間
で高めることができる。この際、排気管内にゲッターを
配すれば、さらにフラットディスプレイ内の排気効率を
高めることができ、フラットディスプレイ内で発生した
ガスを効率良く吸収することが可能であり、フラットデ
ィスプレイ内の真空度を高く維持することができる。
The present invention also provides a flat display in which a substrate having an electron emission source on one main surface and a substrate having a fluorescent surface on one main surface are opposed to each other so that the electron emission source and the fluorescent surface face each other. A plurality of through holes are formed in a portion of the substrate having an electron emission source on the surface where the electron emission source is not provided,
Since an exhaust pipe communicating with these through holes is provided,
Exhaust efficiency when exhausting the inside of the flat display is good, and the ultimate vacuum in the flat display can be increased in a short time. At this time, if a getter is placed in the exhaust pipe, the exhaust efficiency in the flat display can be further increased, and the gas generated in the flat display can be efficiently absorbed, and the degree of vacuum in the flat display can be reduced. Can be kept high.

【0016】さらに本発明は、一主面に電子放出源を有
する基板と一主面に蛍光面を有する基板を電子放出源と
蛍光面が対向するように空間を介して対向させ、該基板
間の空間に対し加熱排気処理を施した後に排気管を封止
するフラットディスプレイの製造方法において、排気管
を封止する前に排気管に加熱排気処理を施すため、排気
管表面付近に含まれるガスを予め排出しておくことにな
り排気管封止後に排気管表面付近よりガスが発生するこ
とがなく、フラットディスプレイ内の真空度を高く維持
することができる。
Further, according to the present invention, a substrate having an electron emission source on one main surface and a substrate having a fluorescent surface on one main surface are opposed to each other through a space such that the electron emission source and the fluorescent surface are opposed to each other, and In the manufacturing method of the flat display in which the exhaust pipe is sealed after the exhaust pipe is heated and exhausted, the exhaust pipe is heated and exhausted before the exhaust pipe is sealed. Since the gas is not discharged from the vicinity of the surface of the exhaust pipe after the exhaust pipe is sealed, the degree of vacuum in the flat display can be maintained high.

【0017】また、本発明は、一主面に電子放出源を有
する基板と一主面に蛍光面を有する基板を電子放出源と
蛍光面が対向するように空間を介して対向させ、該基板
間の空間に対し加熱排気処理を施した後に排気管を封止
するフラットディスプレイの製造方法において、排気管
を封止する前に電子放出源より電子ビームを蛍光面に照
射するため、蛍光面に含まれるガスを予め排出しておく
ことになり排気管封止後に蛍光面よりガスが発生するこ
とがなく、フラットディスプレイ内の真空度を高く維持
することができる。
Further, according to the present invention, a substrate having an electron emission source on one main surface and a substrate having a fluorescent surface on one main surface are opposed to each other through a space so that the electron emission source and the fluorescent surface face each other, and the substrate In the method of manufacturing a flat display in which the exhaust pipe is sealed after heating and exhausting the space between them, the fluorescent screen is irradiated with an electron beam from an electron emission source before sealing the exhaust pipe. Since the contained gas is exhausted in advance, no gas is generated from the phosphor screen after the exhaust pipe is sealed, and the degree of vacuum in the flat display can be maintained high.

【0018】[0018]

【実施例】以下、本発明を適用した具体的な実施例につ
いて、図面を参照しながら説明する。実施例 1 本実施例においては、本発明を適用したフラットディス
プレイの実施例について説明する。本実施例のフラット
ディスプレイは、図1に示すように、蛍光面3が一主面
に形成された基板1と2次元電子放出源4が一主面に形
成された基板2を蛍光面3と2次元電子放出源4が向か
い合うように対向させた、いわゆるFEDである。な
お、基板1,2は、基板1の蛍光面3周囲に配されるフ
リットシール6により基板1,2間に空間を形成しなが
ら接合されている。本実施例のフラットディスプレイの
拡大図を図2に示す。上記蛍光面3が形成される基板1
は、蛍光面3の発光を外部から見ることができるような
材料、例えばガラス等により形成される。また、蛍光面
3はブラックマトリックス7を境として色区分された蛍
光体8,9,10(通常は、赤・緑・青)によって構成
されている。一方、2次元電子放出源4は、上記蛍光面
3の蛍光体8,9,10に対応する位置にマトリックス
状に配されている。上記2次元電子放出源は、図3に示
すように、基板2上に電極11が形成され、絶縁層12
を介して電極11に対応する位置にゲート13aを有す
る金属層13が配されて構成されるものである。本実施
例のフラットディスプレイにおいては、2次元電子放出
源4に情報に応じて電圧が印加され、これにより2次元
電子放出源4から電子ビームが蛍光面3に照射され、蛍
光面3の発光により基板1に画像が形成される。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Specific embodiments to which the present invention is applied will be described below with reference to the drawings. Example 1 In this example, an example of a flat display to which the present invention is applied will be described. In the flat display of the present embodiment, as shown in FIG. 1, a substrate 1 having a phosphor screen 3 formed on one main surface and a substrate 2 having a two-dimensional electron emission source 4 formed on one main surface are called a phosphor screen 3. This is a so-called FED in which the two-dimensional electron emission sources 4 are opposed to each other. The substrates 1 and 2 are joined to each other while forming a space between the substrates 1 and 2 by a frit seal 6 arranged around the phosphor screen 3 of the substrate 1. An enlarged view of the flat display of this embodiment is shown in FIG. Substrate 1 on which the phosphor screen 3 is formed
Is formed of a material, such as glass, which allows the light emission of the phosphor screen 3 to be seen from the outside. The phosphor screen 3 is composed of phosphors 8, 9 and 10 (usually red, green and blue) that are color-separated with the black matrix 7 as a boundary. On the other hand, the two-dimensional electron emission sources 4 are arranged in a matrix at positions corresponding to the phosphors 8, 9, 10 on the phosphor screen 3. In the two-dimensional electron emission source, as shown in FIG. 3, an electrode 11 is formed on a substrate 2 and an insulating layer 12 is formed.
The metal layer 13 having the gate 13a is arranged at a position corresponding to the electrode 11 via the. In the flat display of the present embodiment, a voltage is applied to the two-dimensional electron emission source 4 according to information, whereby the electron beam is emitted from the two-dimensional electron emission source 4 to the fluorescent screen 3 and the fluorescent surface 3 emits light. An image is formed on the substrate 1.

【0019】また、本実施例のフラットディスプレイに
おいては、図1に示すように基板2の2次元電子放出源
4の形成されていない部分に複数の貫通孔2aが穿設さ
れており、基板2の2次元電子放出源4の設けられてい
ない面の貫通孔2aに対応した位置に例えば断面半円状
の棒状のゲッター容器5が設けられ、内部にゲッターが
配されている。上記貫通孔2aの設置数及び大きさは基
板2の強度を損なわない範囲であれば良いが、貫通孔2
aの開口部がゲッター容器5の開口部内に収まるように
形成されている。なお、貫通孔の直径は5〜10mmが
望ましく、多数設ける場合には5mm未満でも良い。ま
た、ゲッター容器5の形状であるが、上記の断面半円状
のものの他に断面四角形のもの、舟型のもの等が挙げら
れ、上記のような棒状のものの他にI型,コ型等のもの
が挙げられ、2次元電子放出源4の妨げとならない形状
であれば良い。また、ゲッター容器5内部に封入するゲ
ッターとしては、蒸発型,非蒸発型,蒸発型と非蒸発型
の混合タイプの何れを用いても良く、蒸発型としてはバ
リウムゲッター等が挙げられ、非蒸発型としてはTi+
(Zr−Al),Ti+(Zr−V−Fe),Ti+M
o等が挙げられる。ゲッターの形状は、リング型,棒
型,ワイヤー型等何れの形状であっても良い。上記ゲッ
ターのゲッター容器5への取付け方法であるが、ゲッタ
ー容器5外部よりゲッターの活性化が可能であり、かつ
ゲッターがゲッター容器5に接触しないように取りつけ
てあれば良い。例えば、ゲッター容器5内両端部に固定
板を設け、これにワイヤーを渡らせ、該ワイヤーにゲッ
ターを固定することによりゲッターがゲッター容器5に
接しないようにゲッターを取りつける等の手法が挙げら
れる。ゲッターのゲッター容器5への取付けは、ゲッタ
ー容器5を基板2に接合する前に行えば良い。なお、蒸
発型のゲッターを用いる場合には貫通孔2aを通じてゲ
ッターが基板1,2間の空間に拡散することのないよう
に貫通孔2aにシールド板等を設ける必要がある。
Further, in the flat display of this embodiment, as shown in FIG. 1, a plurality of through holes 2a are formed in the portion of the substrate 2 where the two-dimensional electron emission source 4 is not formed, and the substrate 2 The getter container 5 having, for example, a semicircular cross section is provided at a position corresponding to the through hole 2a on the surface where the two-dimensional electron emission source 4 is not provided, and the getter is arranged inside. The number and size of the through holes 2a may be set so long as the strength of the substrate 2 is not impaired.
The opening a is formed so as to fit inside the opening of the getter container 5. The diameter of the through holes is preferably 5 to 10 mm, and may be less than 5 mm when a large number are provided. Further, regarding the shape of the getter container 5, in addition to the semi-circular cross-section described above, a square cross-section, a boat-shaped shape, etc. may be mentioned. The shape may be any of those that do not interfere with the two-dimensional electron emission source 4. Further, the getter sealed in the getter container 5 may be any of an evaporation type, a non-evaporation type, and a mixed type of an evaporation type and a non-evaporation type. Examples of the evaporation type include a barium getter and the like. Ti + as a mold
(Zr-Al), Ti + (Zr-V-Fe), Ti + M
and the like. The getter may have any shape such as a ring shape, a rod shape, or a wire shape. As for the method of attaching the getter to the getter container 5, the getter may be activated from outside the getter container 5 and may be attached so that the getter does not come into contact with the getter container 5. For example, a method may be used in which fixing plates are provided at both ends inside the getter container 5, a wire is passed over this, and the getter is fixed to the wire so that the getter does not come into contact with the getter container 5. The getter may be attached to the getter container 5 before the getter container 5 is bonded to the substrate 2. When an evaporation type getter is used, it is necessary to provide a shield plate or the like in the through hole 2a so that the getter does not diffuse into the space between the substrates 1 and 2 through the through hole 2a.

【0020】本実施例のフラットディスプレイにおいて
は、基板の2次元電子放出源の設けられていない部分に
複数の貫通孔が穿設されており、基板の2次元電子放出
源の設けられていない面の貫通孔に対応する位置にゲッ
ター容器が設けられており、これにゲッターを配するた
め、多量のゲッターを収納することができ、かつ基板間
の真空空間でガスが発生しても複数の貫通孔よりゲッタ
ー容器内に収容されゲッターにより迅速に吸収されるた
め、フラットディスプレイ内の真空度を高く維持するこ
とができ2次元電子放出源を汚染しにくく、フラットデ
ィスプレイの耐久性を向上させることが可能である。ま
た、本実施例のフラットディスプレイのゲッター容器は
形状が偏平であるため、フラットディスプレイの厚さを
薄くすることができる。
In the flat display of this embodiment, a plurality of through holes are formed in the portion of the substrate where the two-dimensional electron emission source is not provided, and the surface of the substrate where the two-dimensional electron emission source is not provided. A getter container is provided at a position corresponding to the through hole of the substrate. Since the getter is arranged in the getter container, a large amount of getter can be stored, and even if a gas is generated in the vacuum space between the substrates, a plurality of through holes are formed. Since it is housed in the getter container through the hole and quickly absorbed by the getter, the degree of vacuum in the flat display can be maintained high, the two-dimensional electron emission source is less likely to be contaminated, and the durability of the flat display can be improved. It is possible. Further, since the getter container for the flat display of this embodiment has a flat shape, the thickness of the flat display can be reduced.

【0021】さらに本実施例のフラットディスプレイに
おいては、図4に示されるように基板2の2次元電子放
出源4の形成されない部分に穿設される複数の貫通孔2
aを連通するように排気管14を設けても良い。上記貫
通孔2aの設置数及び大きさは前述のように基板2の強
度を損なわない範囲であれば良いが、貫通孔2aが排気
管14の開口部内に収まるようにし、貫通孔2aの内径
が7〜10mmが望ましい。上記排気管14は図5に示
されるように、断面半円状の舟部15と管部16によっ
て構成され、管部16の端部16aは排気管14封止時
に密閉される。排気管14の形状は、特に限定されるも
のではなく、例えば図6に示されるような切り欠き部1
7aと管部17bにより構成される排気管17、図7に
示すような研磨部18aと管部18bを有する排気管1
8が挙げられる。また、図8に示されるようにゲッター
収納部19aと管部19bにより構成される排気管19
を用い、ゲッター容器として使用しても良い。この際用
いられるゲッターは前述のように、蒸発型,非蒸発型,
蒸発型と非蒸発型混合タイプの何れでも良く、形状も特
に限定されない。また、ゲッターの取付け方法も前述の
ようにゲッター容器外部よりゲッターの活性化が可能で
あり、かつゲッターがゲッター容器に接触しないように
取りつけてあれば良い。
Further, in the flat display of this embodiment, as shown in FIG. 4, a plurality of through holes 2 are formed in the portion of the substrate 2 where the two-dimensional electron emission source 4 is not formed.
The exhaust pipe 14 may be provided so as to communicate with a. The number and size of the through holes 2a may be set within a range that does not impair the strength of the substrate 2 as described above, but the through holes 2a are set within the opening of the exhaust pipe 14 so that the inner diameter of the through holes 2a is small. 7-10 mm is desirable. As shown in FIG. 5, the exhaust pipe 14 is composed of a boat portion 15 having a semicircular cross section and a pipe portion 16, and an end portion 16 a of the pipe portion 16 is sealed when the exhaust pipe 14 is sealed. The shape of the exhaust pipe 14 is not particularly limited, and for example, the cutout portion 1 as shown in FIG.
7a and a pipe part 17b, and an exhaust pipe 1 having a polishing part 18a and a pipe part 18b as shown in FIG.
8 is mentioned. Further, as shown in FIG. 8, an exhaust pipe 19 composed of a getter storage portion 19a and a pipe portion 19b.
May be used as a getter container. The getter used at this time is, as described above, an evaporation type, a non-evaporation type,
Both the evaporation type and the non-evaporation type may be used, and the shape is not particularly limited. As for the method of attaching the getter, it is sufficient that the getter can be activated from outside the getter container as described above, and the getter is attached so as not to contact the getter container.

【0022】上記のような排気管14の設けられるフラ
ットディスプレイは次のような製造方法により製造され
る。すなわち、図9に示されるように基板1の一主面に
蛍光面3を形成し、その周辺部にフリットシール6を配
する。基板2の一主面に電子放出源4を形成し、2次元
電子放出源4が形成されない位置に複数の貫通孔2aを
形成する。また、排気管14の舟部15の開口部15a
にフリットシール20を形成する。そして基板1と排気
管14に酸化処理を施した後、図10に示すように基板
1,2を蛍光面3と2次元電子放出源4が向き合うよう
に、かつ蛍光面3の色区分された蛍光体とマトリックス
状の2次元電子放出源4の位置が合致するように対向さ
せ、基板2に設けられた貫通孔2aに対応する位置に排
気管14の舟部15が位置するように排気管14を基板
2に対向させ、基板1,2、排気管14を接合させる。
この後、接合された基板1,2に加熱を施しながら排気
管14の管部16の端部16aより排気を行う。排気が
十分になされた後(到達真空度10-6Pa)排気管14
を封止する。
The flat display having the exhaust pipe 14 as described above is manufactured by the following manufacturing method. That is, as shown in FIG. 9, the phosphor screen 3 is formed on one main surface of the substrate 1, and the frit seal 6 is arranged on the periphery thereof. An electron emission source 4 is formed on one main surface of the substrate 2, and a plurality of through holes 2a are formed at positions where the two-dimensional electron emission source 4 is not formed. In addition, the opening 15a of the boat 15 of the exhaust pipe 14
Then, the frit seal 20 is formed. Then, after the substrate 1 and the exhaust pipe 14 were oxidized, the substrates 1 and 2 were color-separated so that the phosphor screen 3 and the two-dimensional electron emission source 4 face each other as shown in FIG. The fluorescent tube and the matrix-shaped two-dimensional electron emission source 4 are opposed to each other so that their positions match each other, and the exhaust pipe is arranged so that the boat portion 15 of the exhaust pipe 14 is located at a position corresponding to the through hole 2a provided in the substrate 2. 14 is opposed to the substrate 2, and the substrates 1 and 2 and the exhaust pipe 14 are joined.
After that, the substrates 1 and 2 joined together are heated while being exhausted from the end portion 16a of the pipe portion 16 of the exhaust pipe 14. Exhaust pipe 14 after sufficient exhaustion (attaining vacuum degree of 10 -6 Pa)
Is sealed.

【0023】本実施例のフラットディスプレイにおいて
は、基板に複数の貫通孔が穿設されているため、排気時
に基板間の空間中の空気が流れ易く、排気効率が良好で
あり、短時間で高い真空度を達成することができる。ま
た、排気管の形状が偏平であるためフラットディスプレ
イの厚さを薄くすることが可能であり、該排気管の破損
が発生しにくく、フラットディスプレイの耐久性を向上
させる。さらに、該排気管を上記のようにゲッター収納
部と管部により構成されるものとした場合には、排気処
理後、ゲッターを排気管内に封入すれば良く、基板間の
真空空間でガスが発生しても複数の貫通孔よりゲッター
容器内に収容されゲッターにより迅速に吸収されるた
め、フラットディスプレイ内の真空度を高く維持するこ
とができ2次元電子放出源を汚染しにくく、フラットデ
ィスプレイの耐久性を向上させることが可能である。
In the flat display of this embodiment, since a plurality of through holes are formed in the substrate, the air in the space between the substrates easily flows during exhaust, the exhaust efficiency is good, and the exhaust efficiency is high in a short time. A vacuum degree can be achieved. Further, since the exhaust pipe has a flat shape, it is possible to reduce the thickness of the flat display, the exhaust pipe is less likely to be damaged, and the durability of the flat display is improved. Further, when the exhaust pipe is constituted by the getter housing portion and the pipe portion as described above, the getter may be sealed in the exhaust pipe after the exhaust treatment, and gas is generated in the vacuum space between the substrates. Even though it is housed in the getter container through multiple through holes and quickly absorbed by the getter, the vacuum level in the flat display can be maintained at a high level, the two-dimensional electron emission source is less likely to be contaminated, and the flat display is durable. It is possible to improve the property.

【0024】実施例 2 本実施例においては、本発明を適用したフラットディス
プレイの製造方法の実施例について説明する。本実施例
のフラットディスプレイの製造方法は、図11に示され
るように基板21の一主面に蛍光面23を形成し、その
周辺部にフリットシール25を配する。基板22の一主
面に電子放出源24を形成し、2次元電子放出源24が
形成されない位置に貫通孔22aを形成する。また、吸
引部26と管部27により構成される排気管25の吸引
部26の開口部26aにフリットシール28を形成す
る。そして基板21と排気管25に酸化処理を施した
後、図12に示すように基板21,22を蛍光面23と
2次元電子放出源24が向き合うように対向させ、基板
22に設けられた貫通孔22aに対応する位置に排気管
25の吸引部26が位置するように排気管25を基板2
2に合わせ、基板21,22、排気管25を接合させ
る。この後、図13に示されるような加熱排気装置を用
い、接合された基板21,22及び排気管25に加熱を
施しながら排気管25の管部27の端部27aより排気
を行う。排気が十分になされた後(到達真空度10-6
a)、図12に示されるようにゲッター28を排気管2
5内に配し、排気管25の封止を行う。
Example 2 In this example, an example of a method for manufacturing a flat display to which the present invention is applied will be described. In the flat display manufacturing method of the present embodiment, as shown in FIG. 11, a phosphor screen 23 is formed on one main surface of a substrate 21, and a frit seal 25 is arranged on the periphery thereof. An electron emission source 24 is formed on one main surface of the substrate 22, and a through hole 22a is formed at a position where the two-dimensional electron emission source 24 is not formed. Further, the frit seal 28 is formed in the opening 26a of the suction portion 26 of the exhaust pipe 25 which is constituted by the suction portion 26 and the pipe portion 27. After oxidizing the substrate 21 and the exhaust pipe 25, the substrates 21 and 22 are opposed to each other so that the phosphor screen 23 and the two-dimensional electron emission source 24 face each other as shown in FIG. The exhaust pipe 25 is arranged so that the suction portion 26 of the exhaust pipe 25 is located at a position corresponding to the hole 22a.
In accordance with 2, the substrates 21 and 22 and the exhaust pipe 25 are joined. Thereafter, the heating and exhausting device as shown in FIG. 13 is used to exhaust the air from the end portion 27a of the pipe portion 27 of the exhaust pipe 25 while heating the bonded substrates 21 and 22 and the exhaust pipe 25. After exhaustion is sufficient (ultimate vacuum degree of 10 -6 P
a), the getter 28 is connected to the exhaust pipe 2 as shown in FIG.
5, and the exhaust pipe 25 is sealed.

【0025】上記加熱排気装置は、図13に示されるよ
うに、加熱炉31とチャンバー32,ターボポンプ3
3,電磁弁とサーモカップルゲージ34,ロータリーポ
ンプ35,電離真空ゲージ36よりなる排気系37によ
り構成される。なお、加熱炉31内にはプリベーク・チ
ップオフ治具39が配されている。接合された基板2
1,22及び排気管25は排気系37に接続される治具
38により保持されて加熱炉31内に配され、排気管2
5の管部27は加熱炉31内のプリベーク・チップオフ
治具39に保持されている。上記プリベーク・チップオ
フ治具39は図14に示すように、本体40の上下端に
中央に貫通孔41a,42aを有するガイド蓋41,4
2が設けられ、本体40内部には加熱装置としてコイル
状に巻回されたリボンヒーター44が配され、その周囲
には炉材43が配されて構成されており、プリベーク・
チップオフ治具39中央を排気管25の管部27がガイ
ド蓋41,42及びリボンヒーター44にガイドされて
貫通する構造となされている。なお、本実施例の加熱排
気装置においては加熱装置としてリボンヒーターを用い
ているが、ガスバーナーを用いても良い。
As shown in FIG. 13, the heating / exhausting device includes a heating furnace 31, a chamber 32, and a turbo pump 3.
3, an exhaust system 37 including a solenoid valve, a thermocouple gauge 34, a rotary pump 35, and an ionization vacuum gauge 36. A pre-baking / chip-off jig 39 is arranged in the heating furnace 31. Bonded substrates 2
1, 22 and the exhaust pipe 25 are held by a jig 38 connected to the exhaust system 37 and arranged in the heating furnace 31.
The tube portion 27 of No. 5 is held by a pre-baking / chip-off jig 39 in the heating furnace 31. As shown in FIG. 14, the pre-baking / chip-off jig 39 has guide lids 41, 4 having through holes 41a, 42a in the upper and lower ends of a main body 40 in the center.
2, a ribbon heater 44 wound in a coil shape is arranged as a heating device inside the main body 40, and a furnace material 43 is arranged around the ribbon heater 44.
The pipe portion 27 of the exhaust pipe 25 is guided by the guide lids 41 and 42 and the ribbon heater 44 to penetrate the center of the tip-off jig 39. Although the ribbon heater is used as the heating device in the heating and exhausting device of this embodiment, a gas burner may be used.

【0026】よって、上記加熱排気装置により基板2
1,22の加熱排気処理を行う際には、加熱炉31によ
り加熱を施しながら排気間25を介して排気系37によ
って排気を行う。この際の加熱排気処理は図15に示さ
れるような加熱サイクルにより行われる。該加熱サイク
ルは、5〜6℃/minで室温から350〜400℃ま
で昇温させる加熱工程a、350〜400℃で30〜6
0分保持する保温工程b、5〜6℃/minで350〜
400℃から室温に冷却する冷却工程cにより構成され
ている。本実施例のフラットディスプレイ製造方法にお
いては、上記加熱サイクルの冷却工程c中に排気管25
の加熱排気処理を行うものである。本実施例によって製
造されるフラットディスプレイにおいては、基板21,
22間の空間が非常に小さいことから、若干のガスの発
生が真空度を大きく低下させてしまう。そこで、排気管
25に加熱排気処理を施し、排気管25表面付近に含ま
れるガスも排気し、排気管25封止後の真空度の低下を
防止しようとするものである。この際、排気管25の容
積は基板21,22間の空間と比較して大きいため、排
気管25より排出されるガスが基板21,22間の空間
の真空度に影響を及ぼさないように排気管25の加熱排
気処理を行う必要がある。すなわち、本実施例において
は、上記のように基板21,22間の空間の排気が略終
了している加熱サイクル中の冷却工程c中に排気管25
の加熱排気処理を行っている。排気管25の加熱排気処
理は、排気管25の材質の軟化温度をTsとすると、T
s〜Ts+100℃程度の温度条件下で数分間行うこと
が望ましい。加熱排気処理温度が軟化温度Ts未満であ
ると、排気管表面付近に含まれるガスが十分に排気され
ず、Ts+100℃よりも高いと、排気管に変形が生じ
管径の縮小を起こし排気効率を低下させてしまう。例え
ば、排気管が軟化点530℃の鉛ガラスにより形成され
ている場合には530〜630℃で加熱排気処理を行
い、硬質ガラスである軟化点785℃のホウケイ酸ガラ
スの場合には785〜885℃,軟化点821℃のホウ
ケイ酸ガラスの場合には821〜921℃で加熱排気処
理を行えば良い。
Therefore, the substrate 2 is heated by the heating and exhausting device.
When the heating exhaust process of 1 and 22 is performed, exhaust is performed by the exhaust system 37 through the exhaust gap 25 while heating by the heating furnace 31. The heating and exhausting process at this time is performed by a heating cycle as shown in FIG. The heating cycle is a heating step a in which the temperature is raised from room temperature to 350 to 400 ° C. at 5 to 6 ° C./min, and 30 to 6 at 350 to 400 ° C.
Insulation process b for holding for 0 minutes, 350 ~ at 5-6 ° C / min
It comprises a cooling step c for cooling from 400 ° C. to room temperature. In the flat display manufacturing method of this embodiment, the exhaust pipe 25 is provided during the cooling step c of the heating cycle.
The heating and evacuation process is performed. In the flat display manufactured according to this embodiment, the substrate 21,
Since the space between 22 is very small, the generation of some gas greatly reduces the degree of vacuum. Therefore, the exhaust pipe 25 is heated and exhausted so that the gas contained in the vicinity of the surface of the exhaust pipe 25 is also exhausted to prevent a decrease in the degree of vacuum after the exhaust pipe 25 is sealed. At this time, since the volume of the exhaust pipe 25 is larger than the space between the substrates 21 and 22, the gas exhausted from the exhaust pipe 25 is exhausted so as not to affect the degree of vacuum in the space between the substrates 21 and 22. It is necessary to heat and exhaust the pipe 25. That is, in the present embodiment, the exhaust pipe 25 is provided during the cooling step c in the heating cycle in which the exhaust of the space between the substrates 21 and 22 is substantially completed as described above.
Is being heated and exhausted. When the softening temperature of the material of the exhaust pipe 25 is Ts, the heating exhaust process of the exhaust pipe 25 is T
It is desirable to carry out for several minutes under a temperature condition of about s to Ts + 100 ° C. When the heating / exhaust treatment temperature is lower than the softening temperature Ts, the gas contained in the vicinity of the exhaust pipe surface is not sufficiently exhausted, and when it is higher than Ts + 100 ° C., the exhaust pipe is deformed to reduce the pipe diameter and reduce the exhaust efficiency. Will lower it. For example, when the exhaust pipe is made of lead glass having a softening point of 530 ° C., heating and exhausting treatment is performed at 530 to 630 ° C., and in the case of borosilicate glass having a softening point of 785 ° C. which is hard glass, 785 to 885. In the case of borosilicate glass having a softening point of 821 ° C. and a softening point of 821 ° C., heating and exhausting treatment may be performed at 821 to 921 ° C.

【0027】そこで、上記のような加熱排気装置を用い
て、排気管の加熱排気処理と到達真空度の関係を調査し
た。排気管として軟化点785℃のホウケイ酸ガラス管
を用い、加熱温度785〜885℃で約3分間の排気管
の加熱排気処理を図15に示されるような加熱サイクル
中冷却工程cにおいて3回繰り返して行った。なお、到
達真空度は図13に示される加熱排気装置中の電離真空
ゲージ36にて測定した。加熱排気処理を繰り返す際、
一回の処理を終える毎に図14に示されるプリベーク・
チップオフ治具39中のリボンヒーター44の電源を切
り、初期状態まで冷却した後に再び加熱排気処理を施す
こととした。結果を図16に示す。この時、1回目と2
回目の処理は3分間行い、3回目の処理を3分40秒間
行い、排気管の封止を行った。図16に示されるよう
に、排気管に加熱排気処理を施すことにより真空度が上
昇し、また、加熱排気処理の回数を重ねる毎に到達真空
度が高くなり、安定してくることがわかった。
Therefore, the relationship between the heating and exhausting process of the exhaust pipe and the ultimate vacuum degree was investigated using the above heating and exhausting device. Using a borosilicate glass tube having a softening point of 785 ° C. as an exhaust pipe, heating and exhausting the exhaust pipe at a heating temperature of 785 to 885 ° C. for about 3 minutes is repeated three times in a cooling step c during a heating cycle as shown in FIG. I went. The ultimate vacuum was measured by the ionization vacuum gauge 36 in the heating and exhausting device shown in FIG. When repeating the heating and exhausting process,
Each time one process is completed, the pre-baking shown in FIG.
The ribbon heater 44 in the chip-off jig 39 was turned off, cooled to the initial state, and then heated and exhausted again. The results are shown in Fig. 16. At this time, the first time and 2
The third treatment was performed for 3 minutes, and the third treatment was performed for 3 minutes and 40 seconds to seal the exhaust pipe. As shown in FIG. 16, it was found that the degree of vacuum is increased by performing the heating and exhausting treatment on the exhaust pipe, and the ultimate degree of vacuum is increased and becomes stable as the number of heating and exhausting treatments is increased. .

【0028】次に、上記加熱排気装置を用い、排気管と
して軟化点785℃のホウケイ酸ガラス管を用い、加熱
温度785〜885℃で約3分間の排気管の加熱排気処
理を図15に示されるような加熱サイクル中冷却工程c
において3回繰り返して行ったものと、加熱サイクルの
冷却工程中排気管の加熱処理を行うことなく同時間排気
処理を行ったものの到達真空度の比較を行った。図17
に結果を示すが、3回目の排気管の加熱排気処理時の到
達真空度の変化を図中実線で示し、同時間排気処理のみ
を行った場合の到達真空度の変化を図中破線と一点鎖線
で示す。図17中に示されるように、排気管の加熱排気
処理の有無により到達真空度に大きな差が見られた。
Next, FIG. 15 shows the heating and exhausting process of the exhaust pipe for about 3 minutes at the heating temperature of 785 to 885 ° C. using the borosilicate glass tube having the softening point of 785 ° C. as the exhaust pipe by using the above heating and exhausting device. Cooling step c during heating cycle
The degree of vacuum reached was compared between those obtained by repeating the above three times and those obtained by performing the exhaust treatment for the same time without performing the exhaust pipe heat treatment during the cooling step of the heating cycle. FIG. 17
The results are shown in Figure 4. The change in the ultimate vacuum during the third heating and exhaust treatment of the exhaust pipe is shown by the solid line in the figure, and the change in the ultimate vacuum when only the exhaust treatment is performed for the same time is indicated by the dashed line and one point in the figure. Shown by a chain line. As shown in FIG. 17, a great difference was found in the ultimate vacuum degree depending on whether or not the exhaust pipe was heated and exhausted.

【0029】本実施例のフラットディスプレイの製造方
法によれば、蛍光面と2次元電子放出源の形成された2
枚の基板と排気管を接合した後、これらに所定の加熱サ
イクルによって加熱排気処理を施す際、上記加熱サイク
ルの冷却工程中において排気管の加熱排気処理を行うた
め、基板間の空間の真空度に影響を及ぼすことなく排気
管表面付近に含まれるガスを排気することができ、排気
管封止後の基板間の空間、すなわちフラットディスプレ
イ内の真空度を高く維持できる。また、真空度を高めた
後、ゲッターを排気管中に配し排気管を封止するため、
封止後ゲッターを効果的に働かせることができ、フラッ
トディスプレイ内の真空度を高く維持できる。よって、
フラットディスプレイの耐久性を向上させることが可能
である。
According to the method of manufacturing a flat display of this embodiment, a fluorescent screen and a two-dimensional electron emission source are formed on the two surfaces.
When the substrates and the exhaust pipe are joined and then heated and exhausted by a predetermined heating cycle, the exhaust pipe is heated and exhausted during the cooling process of the heating cycle. The gas contained in the vicinity of the surface of the exhaust pipe can be exhausted without affecting the temperature, and the space between the substrates after the exhaust pipe is sealed, that is, the degree of vacuum in the flat display can be maintained high. After increasing the degree of vacuum, the getter is placed in the exhaust pipe to seal the exhaust pipe.
The getter can be effectively operated after sealing, and the degree of vacuum in the flat display can be maintained high. Therefore,
It is possible to improve the durability of the flat display.

【0030】さらに、本実施例のフラットディスプレイ
の製造方法においては、図12に示すように一主面に蛍
光面23の形成される基板21と一主面に2次元電子放
出源24の形成される基板22を蛍光面23と2次元電
子放出源24が向き合うように対向させ、基板21,2
2と排気管25を接合し、基板21,22に加熱排気処
理を施した後に、基板22に接続される電源より基板2
2に形成される図示しない電子放出源に電圧を印加し、
2次元電子放出源より電子ビームを基板21に形成され
る図示しない蛍光面に照射し、排気処理を行ってもよ
い。そして、排気が十分になされた後(到達真空度10
-6Pa)、排気管25中にゲッター28を配して排気管
25を封止する。
Further, in the flat display manufacturing method of this embodiment, as shown in FIG. 12, a substrate 21 having a phosphor screen 23 formed on one main surface and a two-dimensional electron emission source 24 formed on one main surface are formed. The substrate 22 facing each other so that the phosphor screen 23 and the two-dimensional electron emission source 24 face each other.
2 and the exhaust pipe 25 are joined to each other, and the substrates 21 and 22 are heated and exhausted.
Voltage is applied to an electron emission source (not shown) formed in 2.
An exhaust process may be performed by irradiating a phosphor screen (not shown) formed on the substrate 21 with an electron beam from a two-dimensional electron emission source. Then, after exhaustion is sufficiently performed (attaining vacuum degree 10
-6 Pa), the getter 28 is arranged in the exhaust pipe 25 to seal the exhaust pipe 25.

【0031】基板21,22の加熱排気処理を行う際に
は、図15に示されるような加熱サイクルにより行われ
る。本実施例のフラットディスプレイ製造方法において
は、上記加熱サイクルにより加熱排気処理を施した後、
電源より基板22に所定の電圧を印加し、基板22上の
2次元電子放出源24より電子ビームを基板21上の蛍
光面23に照射し、蛍光面23より排出されるガスを排
気する。本実施例によって製造されるフラットディスプ
レイにおいては、基板21,22間の空間が非常に小さ
いことから、若干のガスの発生が真空度を大きく低下さ
せてしまう。ところが、一方の基板21上に形成される
蛍光面23を形成する蛍光体が粉末であるため、電子ビ
ームの照射により蛍光体に含まれるガスが放出され、真
空度を低下させる原因となっている。そこで、基板2
1,22の加熱排気処理の後に基板21の蛍光面23に
基板22の2次元電子放出源24より電子ビームを照射
し、蛍光面23中のガスを排気し、基板21,22間の
空間、すなわちフラットディスプレイ内の真空度を高く
維持しようとするものである。この際、基板21,22
間の空間の真空度に影響を及ぼさないよう、また、電子
ビームの不必要な照射は蛍光面23に損傷を及ぼす可能
性もあるため電子ビームの照射は徐々に行う必要があ
る。電子ビームの照射は真空度が2桁変化する程度を目
安に行えば良い。また、電子ビームの照射前にゲッター
を排気管25中に配し、予め一部活性化しておき、蛍光
面23からのガスの発生による2次元電子放出源24の
損傷を防止しても良い。この場合、排気管25の封止前
に再びゲッターを活性化させて封入すれば良い。
When the substrates 21 and 22 are heated and exhausted, a heating cycle as shown in FIG. 15 is performed. In the flat display manufacturing method of the present embodiment, after performing heating and exhaust treatment by the heating cycle,
A predetermined voltage is applied to the substrate 22 from a power source, a two-dimensional electron emission source 24 on the substrate 22 irradiates the fluorescent screen 23 on the substrate 21 with an electron beam, and the gas discharged from the fluorescent screen 23 is exhausted. In the flat display manufactured according to this embodiment, since the space between the substrates 21 and 22 is very small, the generation of some gas greatly lowers the degree of vacuum. However, since the phosphor forming the phosphor screen 23 formed on one of the substrates 21 is powder, the gas contained in the phosphor is released by the irradiation of the electron beam, which causes the vacuum degree to be lowered. . Therefore, the substrate 2
After the heating and exhausting treatment of 1 and 22, the phosphor screen 23 of the substrate 21 is irradiated with an electron beam from the two-dimensional electron emission source 24 of the substrate 22, the gas in the phosphor screen 23 is exhausted, and the space between the substrates 21 and 22 is That is, it is intended to maintain a high degree of vacuum in the flat display. At this time, the substrates 21 and 22
In order not to affect the degree of vacuum in the space between them, and since unnecessary irradiation of the electron beam may damage the fluorescent screen 23, the irradiation of the electron beam must be gradually performed. Irradiation of the electron beam may be performed by using the degree of vacuum change of two digits as a guide. Further, a getter may be placed in the exhaust pipe 25 before irradiation with the electron beam and partially activated in advance to prevent damage to the two-dimensional electron emission source 24 due to generation of gas from the fluorescent screen 23. In this case, the getter may be activated and sealed again before the exhaust pipe 25 is sealed.

【0032】そこで、蛍光面に電子ビームを照射し、蛍
光面からのガスの発生の様子を調査した。すなわち、真
空中で蛍光面に電子ビームを照射した際の真空度の変化
の測定を行った。測定装置は、図18に示されるよう
に、チャンバー51にターボ分子ポンプ52,電磁弁5
3,ロータリーポンプ54よりなる排気系55が接続さ
れたものであり、チャンバー51内には一主面に図示し
ない蛍光面を形成したガラス56と電子ビーム源57が
蛍光面と電子ビーム源57が対向するように配されてお
り、チャンバー51外部にはチャンバー51内の真空度
を測定できる真空ゲージ58と電子ビーム源57および
ガラス56に接続される電極端子59が配されてなる。
上記測定装置にて測定を行う際には、排気系55により
チャンバー51内の排気を行い所定の真空度に達した
後、電極端子59より電子ビーム源57に所定の電圧を
印加し、また電子ビームの方向を制御するために、ガラ
ス56にも電圧を印加し、電子ビームを蛍光面に照射
し、その際の真空度の変化を真空ゲージ58により測定
を行う。
Therefore, the state of gas generation from the fluorescent screen was investigated by irradiating the fluorescent screen with an electron beam. That is, the change in the degree of vacuum when the phosphor screen was irradiated with an electron beam in vacuum was measured. As shown in FIG. 18, the measuring device has a chamber 51, a turbo molecular pump 52, and a solenoid valve 5.
3, an exhaust system 55 composed of a rotary pump 54 is connected, and a glass 56 having an unillustrated phosphor screen on one main surface, an electron beam source 57, and a phosphor screen and an electron beam source 57 are connected in the chamber 51. They are arranged so as to face each other, and a vacuum gauge 58 capable of measuring the degree of vacuum in the chamber 51, an electron beam source 57, and an electrode terminal 59 connected to the glass 56 are arranged outside the chamber 51.
When performing the measurement with the above-mentioned measuring device, the exhaust system 55 evacuates the chamber 51 to reach a predetermined vacuum degree, and then a predetermined voltage is applied to the electron beam source 57 from the electrode terminal 59, and an electron beam is emitted. In order to control the direction of the beam, a voltage is also applied to the glass 56 to irradiate the fluorescent screen with the electron beam, and the change in the degree of vacuum at that time is measured by the vacuum gauge 58.

【0033】本実施例においては、ITO付きガラスに
蛍光体を50×50mmの大きさに塗布して蛍光面を形
成し、これを430℃で1時間酸化処理を施して蛍光面
中の有機物を燃焼させ、更に脱ガスの為に真空度10-5
Pa,450℃の雰囲気中で6時間酸化処理を施して、
蛍光面の形成されたガラス56を得た。このガラス56
を図18に示されるようにチャンバー51内に配し、排
気系55によって真空度10-6になるまで排気を行い、
電子ビーム源57より蛍光面の形成されたガラス56に
電子ビームの照射を行った。照射条件は、蛍光面電圧が
100V,ビーム量が15mA,照射面積が25.0c
2 であった。その際の真空ゲージ58によって測定さ
れた真空度の変化を図19に示す。図19の結果から、
初期段階において電子ビームの照射によって蛍光面より
発生したガスにより真空度が大きく変化していることが
確認された。上記測定装置においては、チャンバー51
として容積3リットルのチャンバーを用い、かつターボ
分子ポンプ52で300リットル/分の排気速度で排気
しており、図19の結果を考えあわせると、電子ビーム
の照射により蛍光面からかなりのガスが発生しているこ
とがわかる。
In this example, a phosphor is applied to a glass with ITO in a size of 50 × 50 mm to form a phosphor screen, and the phosphor is subjected to an oxidation treatment at 430 ° C. for 1 hour to remove organic substances in the phosphor screen. Burned, and vacuum degree 10 -5 for degassing
Oxidation treatment is performed for 6 hours in an atmosphere of Pa, 450 ° C.,
A glass 56 having a phosphor screen was obtained. This glass 56
Is placed in the chamber 51 as shown in FIG. 18, and exhaust is performed by the exhaust system 55 until the degree of vacuum becomes 10 −6 .
The electron beam source 57 irradiates the glass 56 having the fluorescent surface with an electron beam. The irradiation conditions are as follows: phosphor screen voltage 100 V, beam amount 15 mA, irradiation area 25.0 c
It was m 2 . The change in the degree of vacuum measured by the vacuum gauge 58 at that time is shown in FIG. From the result of FIG.
At the initial stage, it was confirmed that the degree of vacuum was greatly changed by the gas generated from the phosphor screen by the electron beam irradiation. In the above measuring device, the chamber 51
A chamber having a volume of 3 liters is used as the chamber, and the turbo molecular pump 52 is evacuating at an evacuation rate of 300 liters / minute. Considering the results in FIG. You can see that

【0034】本実施例のフラットディスプレイの製造方
法によれば、蛍光面と2次元電子放出源の形成された2
枚の基板と排気管を接合してこれらに所定の加熱サイク
ルによって加熱排気処理を施した後、蛍光面に電子ビー
ムの照射を行うため、基板間の空間の真空度に影響を及
ぼすことなく蛍光面に含まれるガスを排気することがで
き、基板間の空間、すなわちフラットディスプレイ内の
真空度を高く維持できる。また、真空度を高めた後、ゲ
ッターを配するため、排気管の封止後ゲッターを効果的
に働かせることができ、フラットディスプレイ内の真空
度を高く維持できる。よって、フラットディスプレイの
耐久性を向上させることが可能である。
According to the manufacturing method of the flat display of the present embodiment, the fluorescent screen and the two-dimensional electron emission source are formed on the two surfaces.
After the substrate and the exhaust pipe are joined and heated and exhausted by a predetermined heating cycle, the fluorescent surface is irradiated with an electron beam, so that the vacuum degree in the space between the substrates is not affected. The gas contained in the surface can be exhausted, and the space between the substrates, that is, the degree of vacuum in the flat display can be maintained high. Further, since the getter is arranged after the degree of vacuum is increased, the getter can be effectively operated after the exhaust pipe is sealed, and the degree of vacuum in the flat display can be maintained high. Therefore, it is possible to improve the durability of the flat display.

【0035】[0035]

【発明の効果】以上の説明からも明らかなように、本発
明においては、一主面に電子放出源を有する基板と一主
面に蛍光面を有する基板を電子放出源と蛍光面が対向す
るように対向させてなるフラットディスプレイにおい
て、一主面に電子放出源を有する基板の電子放出源の設
けられない部分に複数の貫通孔が穿設され、基板の背面
側の該貫通孔に対応した位置にゲッター容器が設けられ
ているため、ゲッターが比較的広範囲に飛散し、フラッ
トディスプレイ内で発生したガスを複数の貫通孔より効
率良く吸収し、フラットディスプレイ内の真空度を高く
維持することができ、電子放出源を汚染しにくく、フラ
ットディスプレイの耐久性を向上させることができる。
As is apparent from the above description, in the present invention, a substrate having an electron emission source on one principal surface and a substrate having a phosphor screen on one principal surface are opposed to the electron emission source and the phosphor surface. In the flat display thus facing each other, a plurality of through holes are formed in a portion of the substrate having an electron emission source on one main surface where the electron emission source is not provided, and the through holes on the back surface side of the substrate correspond to the through holes. Since the getter container is provided at the position, the getter scatters in a relatively wide range, and the gas generated in the flat display can be efficiently absorbed through the plurality of through holes to maintain a high degree of vacuum in the flat display. Therefore, the electron emission source is less likely to be contaminated, and the durability of the flat display can be improved.

【0036】また、本発明は一主面に電子放出源を有す
る基板と一主面に蛍光面を有する基板を電子放出源と蛍
光面が対向するように対向させてなるフラットディスプ
レイにおいて、一主面に電子放出源を有する基板の電子
放出源の設けられない部分に複数の貫通孔が穿設され、
これら貫通孔に連通する排気管が設けられているため、
フラットディスプレイ内を排気する際の排気効率が良好
であり、フラットディスプレイ内の到達真空度を短時間
で高めることができ、フラットディスプレイ内の真空度
を高く維持することができ、電子放出源を汚染しにくい
ためフラットディスプレイの耐久性を向上させることが
できる。この際、排気管内にゲッターを配した場合に
は、さらに排気効率を高めることができ、フラットディ
スプレイ内で発生したガスを効率良く吸収し、フラット
ディスプレイ内の真空度を高く維持することができ、フ
ラットディスプレイ内の真空度を高く維持することがで
き電子放出源を汚染しにくいためフラットディスプレイ
の耐久性を向上させることができる。
Further, the present invention provides a flat display in which a substrate having an electron emission source on one main surface and a substrate having a fluorescent surface on one main surface are opposed to each other so that the electron emission source and the fluorescent surface face each other. A plurality of through holes are formed in a portion of the substrate having an electron emission source on the surface where the electron emission source is not provided,
Since an exhaust pipe communicating with these through holes is provided,
The exhaust efficiency when exhausting the inside of the flat display is good, the ultimate vacuum inside the flat display can be increased in a short time, the vacuum inside the flat display can be maintained high, and the electron emission source is contaminated. Since it is difficult to do so, the durability of the flat display can be improved. At this time, when a getter is arranged in the exhaust pipe, the exhaust efficiency can be further increased, the gas generated in the flat display can be efficiently absorbed, and the vacuum degree in the flat display can be maintained high. Since the degree of vacuum in the flat display can be maintained high and the electron emission source is unlikely to be contaminated, the durability of the flat display can be improved.

【0037】さらに本発明は、一主面に電子放出源を有
する基板と一主面に蛍光面を有する基板を電子放出源と
蛍光面が対向するように空間を介して対向させ、該基板
間の空間に対し加熱排気処理を施した後に排気管を封止
するフラットディスプレイの製造方法において、排気管
を封止する前に排気管に加熱排気処理を施すため、排気
管表面付近に含まれるガスを予め排出しておくことにな
り排気管封止後に排気管よりガスが発生することがな
く、フラットディスプレイ内の真空度を高く維持するこ
とができ、フラットディスプレイの耐久性を向上させる
ことが可能である。
Further, according to the present invention, a substrate having an electron emission source on one main surface and a substrate having a fluorescent surface on one main surface are opposed to each other through a space so that the electron emission source and the fluorescent surface are opposed to each other, and In the manufacturing method of the flat display in which the exhaust pipe is sealed after the exhaust pipe is heated and exhausted, the exhaust pipe is heated and exhausted before the exhaust pipe is sealed. Since the gas is not discharged from the exhaust pipe after the exhaust pipe is sealed, the degree of vacuum in the flat display can be maintained high, and the durability of the flat display can be improved. Is.

【0038】また、本発明は、一主面に電子放出源を有
する基板と一主面に蛍光面を有する基板を電子放出源と
蛍光面が対向するように空間を介して対向させ、該基板
間の空間に対し加熱排気処理を施した後に排気管を封止
するフラットディスプレイの製造方法において、排気管
を封止する前に電子放出源より電子ビームを蛍光面に照
射するため、蛍光面に含まれるガスを予め排出しておく
ことになり排気管封止後に蛍光面よりガスが発生するこ
とがなく、フラットディスプレイ内の真空度を高く維持
することができ、フラットディスプレイの耐久性を向上
させることが可能である。
Further, according to the present invention, a substrate having an electron emission source on one main surface and a substrate having a fluorescent surface on one main surface are opposed to each other through a space so that the electron emission source and the fluorescent surface are opposed to each other, and the substrate is In the method of manufacturing a flat display in which the exhaust pipe is sealed after heating and exhausting the space between them, the fluorescent screen is irradiated with an electron beam from an electron emission source before sealing the exhaust pipe. Since the contained gas will be exhausted in advance, gas will not be generated from the phosphor screen after the exhaust pipe is sealed, and the degree of vacuum inside the flat display can be maintained high, improving the durability of the flat display. It is possible.

【0039】本発明のフラットディスプレイ及び本発明
のフラットディスプレイの製造方法によって製造される
フラットディスプレイにおいては、フラットディスプレ
イ内が高真空状態に保たれるため、電子放出源から電子
ビームを取り出しやすく、蛍光面の輝度を向上させるこ
とができ、良好な画像を得ることができる。また、真空
度が高いことから電界分布を均一とし易く、良好な画像
を得ることができる。
In the flat display of the present invention and the flat display manufactured by the method of manufacturing a flat display of the present invention, since the inside of the flat display is kept in a high vacuum state, it is easy to take out an electron beam from the electron emission source, and fluorescence is emitted. The brightness of the surface can be improved and a good image can be obtained. Further, since the degree of vacuum is high, it is easy to make the electric field distribution uniform and a good image can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明を適用したフラットディスプレイの一実
施例を示す斜視図である。
FIG. 1 is a perspective view showing an embodiment of a flat display to which the present invention is applied.

【図2】本発明を適用したフラットディスプレイの一実
施例を示す拡大図である。
FIG. 2 is an enlarged view showing an embodiment of a flat display to which the present invention is applied.

【図3】本発明を適用したフラットディスプレイの一実
施例の2次元電子放出源を示す拡大図である。
FIG. 3 is an enlarged view showing a two-dimensional electron emission source of one embodiment of a flat display to which the present invention is applied.

【図4】本発明を適用したフラットディスプレイの他の
実施例を示す斜視図である。
FIG. 4 is a perspective view showing another embodiment of the flat display to which the present invention is applied.

【図5】本発明を適用したフラットディスプレイに配さ
れる排気管の一例を示す斜視図である。
FIG. 5 is a perspective view showing an example of an exhaust pipe arranged in a flat display to which the present invention is applied.

【図6】本発明を適用したフラットディスプレイに配さ
れる排気管の他の例を示す斜視図である。
FIG. 6 is a perspective view showing another example of an exhaust pipe arranged in a flat display to which the present invention is applied.

【図7】本発明を適用したフラットディスプレイに配さ
れる排気管のさらに他の例を示す斜視図である。
FIG. 7 is a perspective view showing still another example of an exhaust pipe arranged in a flat display to which the present invention is applied.

【図8】本発明を適用したフラットディスプレイに配さ
れる排気管のさらに他の例を示す斜視図である。
FIG. 8 is a perspective view showing still another example of the exhaust pipe arranged in the flat display to which the present invention is applied.

【図9】本発明を適用したフラットディスプレイを製造
する工程を順次示すものであり、一対の基板の一主面に
それぞれ蛍光面,フリットシール及び2次元電子放出源
を形成し、排気管にフリットシールを配する工程を示す
斜視図である。
FIG. 9 is a view sequentially showing steps of manufacturing a flat display to which the present invention is applied, in which a phosphor screen, a frit seal, and a two-dimensional electron emission source are respectively formed on one main surface of a pair of substrates, and a frit is formed on an exhaust pipe. It is a perspective view showing a process of arranging a seal.

【図10】一主面に蛍光面及び2次元電子放出源の形成
された一対の基板と排気管を接合する工程を示す側面図
である。
FIG. 10 is a side view showing a step of joining a pair of substrates having a phosphor screen and a two-dimensional electron emission source formed on one main surface to an exhaust pipe.

【図11】本発明を適用したフラットディスプレイの製
造方法を工程順に示すものであり、一対の基板の一主面
にそれぞれ蛍光面,フリットシール及び2次元電子放出
源を形成し、排気管にフリットシールを配する工程を示
す斜視図である。
FIG. 11 is a view showing a method of manufacturing a flat display to which the present invention is applied in the order of steps, in which a phosphor screen, a frit seal, and a two-dimensional electron emission source are respectively formed on one main surface of a pair of substrates, and a frit is formed on an exhaust pipe. It is a perspective view showing a process of arranging a seal.

【図12】一主面に蛍光面及び2次元電子放出源の形成
された一対の基板と排気管を接合する工程を示す側面図
である。
FIG. 12 is a side view showing a step of joining a pair of substrates having a phosphor screen and a two-dimensional electron emission source formed on one main surface to an exhaust pipe.

【図13】接合された一対の基板と排気管に加熱排気処
理を施す加熱排気装置の一構成例を示す模式図である。
FIG. 13 is a schematic diagram showing a configuration example of a heating and exhausting device that performs a heating and exhausting process on a pair of substrates and an exhaust pipe that are joined together.

【図14】加熱排気装置のプリベーク・チップオフ治具
の一構成例を示す模式図である。
FIG. 14 is a schematic diagram showing a configuration example of a pre-baking / chip-off jig of a heating / exhausting device.

【図15】加熱排気処理の際の加熱サイクルを示す図で
ある。
FIG. 15 is a diagram showing a heating cycle in a heating and exhausting process.

【図16】排気管に加熱排気処理を施した際の到達真空
度の変化を示す図である。
FIG. 16 is a diagram showing changes in ultimate vacuum when an exhaust pipe is heated and exhausted.

【図17】排気管に加熱排気処理を施した場合と排気処
理のみを施した場合の到達真空度の変化を示す図であ
る。
FIG. 17 is a diagram showing changes in ultimate vacuum when the exhaust pipe is heated and exhausted and when the exhaust pipe is only exhausted.

【図18】真空度測定装置の一構成例を示す模式図であ
る。
FIG. 18 is a schematic diagram showing a configuration example of a vacuum degree measuring device.

【図19】蛍光面に電子ビームを照射した際の真空度の
変化を示す図である。
FIG. 19 is a diagram showing changes in the degree of vacuum when the phosphor screen is irradiated with an electron beam.

【符号の説明】[Explanation of symbols]

1,2,21,22・・・・基板 3,23・・・・・・・・・蛍光面 4,24・・・・・・・・・2次元電子放出源 5・・・・・・・・・・・・ゲッター容器 6,25・・・・・・・・・フリットシール 14,25・・・・・・・・排気管 31・・・・・・・・・・・加熱炉 37・・・・・・・・・・・排気系 39・・・・・・・・・・・プリベーク・チップオフ治
1, 2, 21, 22 ··· Substrate 3, 23 ···· Phosphor screen 4, 24 ··· · Two-dimensional electron emission source 5 ···・ ・ ・ ・ Getter container 6,25 ・ ・ ・ ・ Frit seal 14, 25 ・ ・ ・ ・ Exhaust pipe 31 ・ ・ ・ ・ Heating furnace 37・ ・ ・ ・ ・ ・ ・ ・ ・ ・ ・ Exhaust system 39 ・ ・ ・ ・ ・ ・ ・ ・ ・ ・ ・ Pre-baking / Chip-off jig

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 一主面に電子放出源を有する基板と一主
面に蛍光面を有する基板を電子放出源と蛍光面が対向す
るように対向させてなるフラットディスプレイにおい
て、 一主面に電子放出源を有する基板の電子放出源の設けら
れない部分に複数の貫通孔が穿設され、基板の背面側の
該貫通孔に対応した位置にゲッター容器が設けられてい
ることを特徴とするフラットディスプレイ。
1. A flat display in which a substrate having an electron emission source on one main surface and a substrate having a fluorescent surface on one main surface are opposed to each other so that the electron emission source and the fluorescent surface face each other. A flat plate characterized in that a plurality of through holes are formed in a portion of the substrate having the emission source where the electron emission source is not provided, and a getter container is provided at a position corresponding to the through holes on the back side of the substrate. display.
【請求項2】 一主面に電子放出源を有する基板と一主
面に蛍光面を有する基板を電子放出源と蛍光面が対向す
るように対向させてなるフラットディスプレイにおい
て、 一主面に電子放出源を有する基板の電子放出源の設けら
れない部分に複数の貫通孔が穿設され、これら貫通孔に
連通する排気管が設けられていることを特徴とするフラ
ットディスプレイ。
2. A flat display in which a substrate having an electron emission source on one principal surface and a substrate having a phosphor screen on one principal surface are opposed to each other so that the electron emission source and the phosphor surface are opposed to each other. A flat display characterized in that a plurality of through holes are formed in a portion of the substrate having the emission source where the electron emission source is not provided, and an exhaust pipe communicating with these through holes is provided.
【請求項3】 排気管内にゲッターが配されていること
を特徴とする請求項2記載のフラットディスプレイ。
3. The flat display according to claim 2, wherein a getter is arranged in the exhaust pipe.
【請求項4】 電子放出源が微小冷陰極であることを特
徴とする請求項1,2または3記載のフラットディスプ
レイ。
4. The flat display according to claim 1, wherein the electron emission source is a micro cold cathode.
【請求項5】 一主面に電子放出源を有する基板と一主
面に蛍光面を有する基板を電子放出源と蛍光面が対向す
るように空間を介して対向させ、該基板間の空間に対し
加熱排気処理を施した後に排気管を封止するフラットデ
ィスプレイの製造方法において、 排気管を封止する前に排気管に加熱排気処理を施すこと
を特徴とするフラットディスプレイの製造方法。
5. A substrate having an electron emission source on one main surface and a substrate having a fluorescent surface on one main surface are opposed to each other through a space so that the electron emission source and the fluorescent surface are opposed to each other, and a space is provided between the substrates. On the other hand, a method of manufacturing a flat display in which an exhaust pipe is sealed after being heated and exhausted, wherein the exhaust pipe is heated and exhausted before sealing the exhaust pipe.
【請求項6】 一主面に電子放出源を有する基板と一主
面に蛍光面を有する基板を電子放出源と蛍光面が対向す
るように空間を介して対向させ、該基板間の空間に対し
加熱排気処理を施した後に排気管を封止するフラットデ
ィスプレイの製造方法において、 排気管を封止する前に電子放出源より電子ビームを蛍光
面に照射することを特徴とするフラットディスプレイの
製造方法。
6. A substrate having an electron emission source on one main surface and a substrate having a fluorescent surface on one main surface are opposed to each other with a space so that the electron emission source and the fluorescent surface are opposed to each other, and a space is provided between the substrates. On the other hand, in a method for manufacturing a flat display in which an exhaust pipe is sealed after being heated and exhausted, a flat display characterized in that a fluorescent screen is irradiated with an electron beam from an electron emission source before sealing the exhaust pipe. Method.
【請求項7】 電子放出源が微小冷陰極であることを特
徴とする請求項5または6記載のフラットディスプレイ
の製造方法。
7. The method for manufacturing a flat display according to claim 5, wherein the electron emission source is a micro cold cathode.
JP22527892A 1992-07-31 1992-07-31 Flat display and manufacturing method thereof Expired - Lifetime JP3189409B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22527892A JP3189409B2 (en) 1992-07-31 1992-07-31 Flat display and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22527892A JP3189409B2 (en) 1992-07-31 1992-07-31 Flat display and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH0652813A true JPH0652813A (en) 1994-02-25
JP3189409B2 JP3189409B2 (en) 2001-07-16

Family

ID=16826828

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22527892A Expired - Lifetime JP3189409B2 (en) 1992-07-31 1992-07-31 Flat display and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JP3189409B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0780872A1 (en) * 1995-12-18 1997-06-25 Motorola, Inc. Flat panel display spacer structure and method of manufacture

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI497561B (en) * 2011-06-16 2015-08-21 Au Optronics Corp Device and method for vacuuming a display panel

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0780872A1 (en) * 1995-12-18 1997-06-25 Motorola, Inc. Flat panel display spacer structure and method of manufacture

Also Published As

Publication number Publication date
JP3189409B2 (en) 2001-07-16

Similar Documents

Publication Publication Date Title
JP4323573B2 (en) Manufacturing method of flat panel display device
JP2832510B2 (en) Display device manufacturing method
JPH11135018A (en) Manufacture of image formation device, its manufacturing equipment, and image formation device
US6926575B1 (en) Method for manufacturing flat image display and flat image display
JP3057081B2 (en) Method for manufacturing airtight container and method for manufacturing image forming apparatus using airtight container
JPH0652813A (en) Flat display and manufacture thereof
US6465952B1 (en) Fed flushed with hot inert gas
EP1182682A1 (en) Method and apparatus for manufacturing flat image display device
US6858982B2 (en) Image display apparatus and method of manufacturing the same
JP3454499B2 (en) Method of manufacturing image display device
JP3332906B2 (en) Method of manufacturing image forming apparatus
JP2000251722A (en) Sealing method of image display method
JP3136415B2 (en) Method of manufacturing image display device
JP2000133165A (en) Fluorescent surface member and image forming device using the same
JPH1064429A (en) Manufacture of image display device
JP2004031276A (en) Manufacturing method of image display device
JP2000340115A (en) Manufacture of image display device, and manufacturing device for executing the method
JP2000164131A (en) Evacuating method for vacuum vessel, manufacture of image display device, evacuating device for vacuum vessel, and device for manufacturing image display device
JP2004349009A (en) Method of manufacturing image display device, apparatus for manufacture, and image display device manufactured by this method of manufacture
JPH04322038A (en) Flat type display sealing method
JPH06338253A (en) Manufacture of electron source
JPH09106770A (en) Image display device
JP2003168365A (en) Cathode-ray tube and its manufacturing method
JPS62147629A (en) Manufacture of image display tube
JPH06223718A (en) Manufacture of cathode-ray tube

Legal Events

Date Code Title Description
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20010417

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090518

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100518

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100518

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110518

Year of fee payment: 10

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120518

Year of fee payment: 11

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130518

Year of fee payment: 12

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130518

Year of fee payment: 12