JPH0651328A - Laser marking method for liquid crystal glass - Google Patents
Laser marking method for liquid crystal glassInfo
- Publication number
- JPH0651328A JPH0651328A JP4223408A JP22340892A JPH0651328A JP H0651328 A JPH0651328 A JP H0651328A JP 4223408 A JP4223408 A JP 4223408A JP 22340892 A JP22340892 A JP 22340892A JP H0651328 A JPH0651328 A JP H0651328A
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- transparent electrode
- electrode film
- crystal glass
- marking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【産業上の利用分野】本発明は、例えば液晶テレビのデ
ィスプレイに用いられる液晶ガラスにマーキングを施す
レーザマーキング方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a laser marking method for marking a liquid crystal glass used for a display of a liquid crystal television, for example.
【従来の技術】近年、液晶ガラスは、液晶テレビやパー
ソナルコンピュータのディスプレイ等に広く用いられて
おり、生産管理上の必要から液晶ガラスに所要のマーキ
ングを施すことが行われている。そして、従来一般に、
液晶ガラスは、ガラス基板とそのガラス基板を被覆した
透明電極膜とを備えており、このような構成の液晶ガラ
スにマーキングを施す技術として次のようなものが知ら
れている。すなわち、第１のマーキング方法は、透明電
極膜の表面にインクを用いてマーキングする方法であ
り、第２のマーキング方法は、炭酸ガスレーザやＹＡＧ
レーザを液晶ガラスに照射して、上記透明電極膜を熱に
よって塑性変形させてマーキングする方法であり、さら
に第３のマーキング法は、液晶ガラスの表面にシールを
貼付するものである。2. Description of the Related Art In recent years, liquid crystal glass has been widely used in displays such as liquid crystal televisions and personal computers, and the required marking is performed on the liquid crystal glass for production control. And, in general,
The liquid crystal glass includes a glass substrate and a transparent electrode film covering the glass substrate, and the following techniques are known as techniques for marking the liquid crystal glass having such a configuration. That is, the first marking method is a method of marking the surface of the transparent electrode film with ink, and the second marking method is a carbon dioxide laser or YAG.
This is a method of irradiating a liquid crystal glass with a laser to plastically deform the transparent electrode film by heat for marking, and a third marking method is to stick a seal on the surface of the liquid crystal glass.
【発明が解決しようとする課題】しかるに、上述した第
１の方法においては、マーキング後に行う液晶ガラスの
洗浄作業工程において、インクで付したマークが消えて
しまうという欠点がある。また、上記第２の方法におい
ては、透明電極膜を熱によって塑性変形させることに伴
って、透明電極膜の表面が削り取られることになるの
で、マーキングを施す際に塵埃が発生するという欠点が
ある。さらに、上記第３のマーキング方法では、シール
によって液晶ガラスの表面に凹凸が生じるので、シール
貼付後の液晶ガラスの取り扱いに支障をきたすという欠
点がある。However, in the above-mentioned first method, there is a drawback that the mark made with ink disappears in the process of cleaning the liquid crystal glass performed after the marking. Further, in the second method, the surface of the transparent electrode film is scraped off as the transparent electrode film is plastically deformed by heat, so that there is a drawback that dust is generated when marking is performed. . Further, in the third marking method, since the surface of the liquid crystal glass is uneven due to the sticker, there is a drawback that it hinders the handling of the liquid crystal glass after sticking the sticker.
【課題を解決するための手段】このような事情に鑑み、
本発明は、ガラス基板と、酸化インジウムおよび酸化ス
ズとの混合物からなり上記ガラス基板を被覆した透明電
極膜とを備えた液晶ガラスに、エキシマレーザを照射
し、上記透明電極膜を構成する酸化インジウムおよび酸
化スズに還元反応を生じさせて、該透明電極膜に所要の
マーキングを施すことを特徴とする液晶ガラスのレーザ
マーキング方法を提供するものである。[Means for Solving the Problems] In view of such circumstances,
The present invention irradiates an excimer laser on a liquid crystal glass including a glass substrate and a transparent electrode film made of a mixture of indium oxide and tin oxide to cover the glass substrate, and forms indium oxide forming the transparent electrode film. And a laser marking method for liquid crystal glass, which comprises subjecting tin oxide to a reduction reaction to perform required marking on the transparent electrode film.
【作用】このような方法によれば、透明電極膜にエキシ
マレーザを照射することによって、エキシマレーザが照
射された箇所の酸化インジウムおよび酸化インジウムに
還元反応が生じ、当該箇所の酸化インジウムおよび酸化
インジウムが備えていた酸素元素が一部、分離する様に
なる。そして、このような還元反応が生じたのちには、
それまで透明であった透明電極膜は、エキシマレーザが
照射された箇所だけ黒色に変色し、それによって鮮明な
マーキングを施すことができる。このように、マーキン
グを施すに当たって透明電極膜を削り取ることがないの
でマーキング時に塵埃が生じることがなく、しかも透明
電極膜自身が発色するために、マーキング後の液晶ガラ
スの洗浄工程において透明電極膜に施したマークが消え
るようなことがない。According to such a method, by irradiating the transparent electrode film with the excimer laser, a reduction reaction occurs in the indium oxide and the indium oxide in the portion irradiated with the excimer laser, and the indium oxide and the indium oxide in the relevant portion are reduced. A part of the oxygen element that was equipped with will come to be separated. And after such a reduction reaction occurs,
The transparent electrode film, which was transparent until then, changes color to black only where it is irradiated with excimer laser, which allows clear marking. In this way, since the transparent electrode film is not scraped off during marking, dust is not generated at the time of marking, and since the transparent electrode film itself develops color, the transparent electrode film is not formed on the transparent electrode film during the cleaning process of the liquid crystal glass after marking. The marks you make will not disappear.
【実施例】以下図示実施例について本発明の方法を説明
すると、図１において、１はレーザ光線Ｌを放射するレ
ーザ発振器であり、このレーザ発振器１から放射された
レーザ光線Ｌの光路上には、所要の印字パターンを穴開
けしたマスク２を配置している。レーザ発振器１から放
射されたレーザ光線Ｌは、上記マスク２を透過した後、
ミラー３に反射されて集光レンズ４に導かれるようにな
っており、さらに集光レンズ４によって集光されたレー
ザ光線Ｌは、所定の加工位置に保持した被加工物として
の液晶ガラス５に照射されて該液晶ガラス５に所要の印
字パターンをマーキングするようにしている。より詳細
に説明すると、上記液晶ガラス５は、液晶テレビやパー
ソナルコンピュータのディスプレイに使用されるもので
あり、図２に拡大して示すように、ガラス基板６と、そ
のガラス基板６上に均一に散布したＳｉＯｘからなるパ
シベーション層７と、さらにこのパシベーション層７を
被覆した透明電極膜８とから構成している。上記透明電
極膜８は、酸化インジウム（Ｉｎ2 Ｏ3 ）および酸化ス
ズ（ＳｎＯ2 ）の混合物からなり、透明である。また、
本実施例では、レーザ発振器１としてエキシマレーザを
発振するレーザ発振器を用いており、上述した構成の液
晶ガラス５にエキシマレーザを照射して上記透明電極膜
８に還元反応を生じさせ、それによって液晶ガラス５に
所要の印字パターンのマーキングを施すようにしてい
る。すなわち、被加工物としての上記液晶ガラス５を大
気中における所定の加工位置に保持した状態において、
液晶ガラス５にレーザ光線Ｌを照射する。レーザ光線Ｌ
は、液晶ガラス５における最も外方側に位置する透明電
極膜８に照射されることになり、それによって、透明電
極膜８におけるレーザ光線Ｌが照射された箇所は、レー
ザ光線Ｌを吸収して次のような還元反応が生じる。 Ｉｎ2 Ｏ3 ＋ｅ → Ｉｎ2 Ｏ＋Ｏ2 ＳｎＯ2 ＋ｅ → ＳｎＯ＋Ｏ このような還元反応が行われた後には、レーザ光線Ｌの
照射前まで透明であった透明電極膜８は、レーザ光線Ｌ
が照射された箇所だけ、つまり還元反応が行われた箇所
だけ黒く発色し、それによって鮮明なマーキングを施す
ことができる。このように、本実施例では、エキシマレ
ーザ発振器１から液晶ガラス５にレーザ光線Ｌを照射
し、上記透明電極膜８そのものを黒く発色させているの
で、マーキングを施す際に塵埃が生じない。このような
本実施例に対して、レーザ光線Ｌの熱によって透明電極
膜８を塑性変形させてマーキングする従来の技術におい
ては、透明電極膜８の表面を削ってマーキングすること
になるので、マーキングの際に塵埃が生じていたもので
ある。また、上記本実施例によれば、透明電極膜８自身
が還元反応によって発色するために、マーキング完了後
に液晶ガラス５を洗浄しても液晶ガラス５に付したマー
クが消えるようなことがない。上記マーキングを行う際
のエキシマレーザのエネルギ密度は５００ｍＪ／ｃｍ2
ないし９００ｍＪ／ｃｍ2 が適当であり、この場合には
透明電極膜８に鮮明な黒色のマーキングを施すことがで
きた。また、ＡｒＦエキシマレーザ（発振波長１９３ｎ
ｍ）、ＫｒＦエキシマレーザ（発振波長２４８ｎｍ）お
よびＸｅＦエキシマレーザ（発振波長３５７ｎｍ）を液
晶ガラス５に照射しても、透明電極膜８に鮮明な黒色の
マーキングを施すことができた。なお、レーザ光線のエ
ネルギ密度が９００ｍＪ／ｃｍ2 よりも大きな場合に
は、透明電極膜８に照射したレーザ光線Ｌによって透明
電極膜８そのものが吹き飛ばされてしまいマーキングを
施すことは出来なかった。また、レーザ光線Ｌの出力を
上げすぎると、透明電極膜８が黒色に変色しないままレ
ーザ光線Ｌによってガラス基板６が損傷して不適当であ
った。さらに、ＣＯ2 レーザを上記液晶ガラス５に照射
した場合には、透明電極膜８は発色しなかった。また上
記実施例においては液晶ガラス５を大気中に配置した状
態においてマーキングを施す様にしているが、還元ガス
を介在させた中に液晶ガラス５を設置し、その状態にお
いて上述のようにマーキングしても良い。この場合に
は、上述した実施例の場合に比較して透明電極膜８の還
元反応がより一層促進されるので、透明電極膜８の発色
が早くなり、マーキングに要する作業時間を短縮するこ
とができる。DESCRIPTION OF THE PREFERRED EMBODIMENTS The method of the present invention will be described below with reference to the illustrated embodiments. In FIG. 1, 1 is a laser oscillator for emitting a laser beam L, and the laser beam L emitted from the laser oscillator 1 is on the optical path. A mask 2 having a required printing pattern is arranged. The laser beam L emitted from the laser oscillator 1 passes through the mask 2 and then
The laser beam L reflected by the mirror 3 and guided to the condenser lens 4 is condensed on the liquid crystal glass 5 as a workpiece held at a predetermined processing position. The liquid crystal glass 5 is irradiated with the light so as to mark a desired print pattern. More specifically, the liquid crystal glass 5 is used for a display of a liquid crystal television or a personal computer, and as shown in the enlarged view of FIG. 2, the glass substrate 6 and the glass substrate 6 are evenly arranged. The passivation layer 7 is made of scattered SiOx, and the transparent electrode film 8 further covers the passivation layer 7. The transparent electrode film 8 is made of a mixture of indium oxide (In 2 O 3 ) and tin oxide (SnO 2 ) and is transparent. Also,
In the present embodiment, a laser oscillator that oscillates an excimer laser is used as the laser oscillator 1, and the liquid crystal glass 5 having the above-described configuration is irradiated with the excimer laser to cause a reduction reaction in the transparent electrode film 8 and thereby the liquid crystal. The glass 5 is marked with a required print pattern. That is, in a state where the liquid crystal glass 5 as a workpiece is held at a predetermined processing position in the atmosphere,
The liquid crystal glass 5 is irradiated with the laser beam L. Laser beam L
Will be irradiated to the transparent electrode film 8 located on the outermost side of the liquid crystal glass 5, whereby the portion of the transparent electrode film 8 irradiated with the laser beam L will absorb the laser beam L. The following reduction reaction occurs. In 2 O 3 + e → In 2 O + O 2 SnO 2 + e → SnO + O After such a reduction reaction, the transparent electrode film 8 which was transparent before the laser beam L was irradiated was
Only in the area where is irradiated, that is, in the area where the reduction reaction is performed, the color develops black, and it is possible to make a clear marking. As described above, in this embodiment, since the liquid crystal glass 5 is irradiated with the laser beam L from the excimer laser oscillator 1 to color the transparent electrode film 8 itself black, no dust is generated when marking is performed. In contrast to this embodiment, in the conventional technique of marking the transparent electrode film 8 by plastically deforming it with the heat of the laser beam L, the surface of the transparent electrode film 8 is scraped for marking. The dust was generated at the time. Further, according to the present embodiment, since the transparent electrode film 8 itself develops color due to the reduction reaction, the mark attached to the liquid crystal glass 5 does not disappear even if the liquid crystal glass 5 is washed after the marking is completed. The energy density of the excimer laser when performing the above marking is 500 mJ / cm 2
To 900 mJ / cm 2 is suitable, in which case a clear black marking could be applied to the transparent electrode film 8. In addition, an ArF excimer laser (oscillation wavelength 193n
m), the KrF excimer laser (oscillation wavelength 248 nm) and the XeF excimer laser (oscillation wavelength 357 nm) were also applied to the liquid crystal glass 5, it was possible to make a clear black marking on the transparent electrode film 8. When the energy density of the laser beam was larger than 900 mJ / cm 2 , the transparent electrode film 8 itself was blown off by the laser beam L applied to the transparent electrode film 8, and marking could not be performed. Further, if the output of the laser beam L was increased too much, the glass substrate 6 was damaged by the laser beam L while the transparent electrode film 8 was not discolored to black, which was inappropriate. Further, when the liquid crystal glass 5 was irradiated with a CO 2 laser, the transparent electrode film 8 did not develop color. In the above embodiment, the marking is performed in the state where the liquid crystal glass 5 is placed in the atmosphere. However, the liquid crystal glass 5 is placed in the presence of a reducing gas and the marking is performed as described above in that state. May be. In this case, the reduction reaction of the transparent electrode film 8 is further promoted as compared with the case of the above-described embodiment, so that the color development of the transparent electrode film 8 is accelerated and the working time required for marking can be shortened. it can.
【発明の効果】以上のように本発明によれば、マーキン
グを施す際に塵埃が生じることがなく、しかもマーキン
グ後の液晶ガラスの洗浄工程においてマークが消えるよ
うなことがないという効果が得られる。As described above, according to the present invention, it is possible to obtain an effect that dust is not generated during marking and that the mark does not disappear in the cleaning process of the liquid crystal glass after marking. .
【図１】本発明の一実施例を示す概略の構成図FIG. 1 is a schematic configuration diagram showing an embodiment of the present invention.
【図２】図１に示す液晶ガラスの拡大断面図FIG. 2 is an enlarged cross-sectional view of the liquid crystal glass shown in FIG.
１ レーザ発振器 ５ 液晶ガラス ６ ガラス基板 ８ 透明電極膜 Ｌ レーザ光線 1 Laser Oscillator 5 Liquid Crystal Glass 6 Glass Substrate 8 Transparent Electrode Film L Laser Beam
Claims (1)
化スズとの混合物からなり上記ガラス基板を被覆した透
明電極膜とを備えた液晶ガラスに、エキシマレーザを照
射し、上記透明電極膜を構成する酸化インジウムおよび
酸化スズに還元反応を生じさせて、該透明電極膜に所要
のマーキングを施すことを特徴とする液晶ガラスのレー
ザマーキング方法。1. A liquid crystal glass comprising a glass substrate and a transparent electrode film made of a mixture of indium oxide and tin oxide and covering the glass substrate is irradiated with an excimer laser to oxidize the transparent electrode film. A laser marking method for liquid crystal glass, which comprises subjecting indium and tin oxide to a reduction reaction to perform required marking on the transparent electrode film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4223408A JP2820182B2 (en) | 1992-07-30 | 1992-07-30 | Laser marking method for liquid crystal glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4223408A JP2820182B2 (en) | 1992-07-30 | 1992-07-30 | Laser marking method for liquid crystal glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0651328A true JPH0651328A (en) | 1994-02-25 |
| JP2820182B2 JP2820182B2 (en) | 1998-11-05 |
Family
ID=16797679
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4223408A Expired - Lifetime JP2820182B2 (en) | 1992-07-30 | 1992-07-30 | Laser marking method for liquid crystal glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2820182B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11138896A (en) * | 1997-11-07 | 1999-05-25 | Sumitomo Heavy Ind Ltd | Laser marker and marking method, mark viewer and viewing method |
| WO2010125846A1 (en) | 2009-04-30 | 2010-11-04 | シャープ株式会社 | Method for manufacturing liquid crystal panel, liquid crystal panel glass substrate, and liquid crystal panel provided with the liquid crystal panel glass substrate |
| WO2010125847A1 (en) | 2009-04-30 | 2010-11-04 | シャープ株式会社 | Method for manufacturing liquid crystal panel, glass substrate for liquid crystal panel, and liquid crystal panel provided with same |
| JP2015031940A (en) * | 2013-08-07 | 2015-02-16 | 三菱電機株式会社 | Color filter, liquid crystal panel, and repair method |
-
1992
- 1992-07-30 JP JP4223408A patent/JP2820182B2/en not_active Expired - Lifetime
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11138896A (en) * | 1997-11-07 | 1999-05-25 | Sumitomo Heavy Ind Ltd | Laser marker and marking method, mark viewer and viewing method |
| WO2010125846A1 (en) | 2009-04-30 | 2010-11-04 | シャープ株式会社 | Method for manufacturing liquid crystal panel, liquid crystal panel glass substrate, and liquid crystal panel provided with the liquid crystal panel glass substrate |
| WO2010125847A1 (en) | 2009-04-30 | 2010-11-04 | シャープ株式会社 | Method for manufacturing liquid crystal panel, glass substrate for liquid crystal panel, and liquid crystal panel provided with same |
| CN102422212A (en) * | 2009-04-30 | 2012-04-18 | 夏普株式会社 | Method for manufacturing liquid crystal panel, glass substrate for liquid crystal panel, and liquid crystal panel provided with same |
| US8582073B2 (en) | 2009-04-30 | 2013-11-12 | Sharp Kabushiki Kaisha | Method of manufacturing liquid crystal panel, glass substrate for liquid crystal panel, and liquid crystal panel including the same |
| US8749747B2 (en) | 2009-04-30 | 2014-06-10 | Sharp Kabushiki Kaisha | Method of manufacturing liquid crystal panel, glass substrate for liquid crystal panel, and liquid crystal panel including the same |
| JP2015031940A (en) * | 2013-08-07 | 2015-02-16 | 三菱電機株式会社 | Color filter, liquid crystal panel, and repair method |
| US9891462B2 (en) | 2013-08-07 | 2018-02-13 | Mitsubishi Electric Corporation | Color filter substrate, liquid crystal panel, and repair method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2820182B2 (en) | 1998-11-05 |
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