JPH0648552B2 - Method for manufacturing mold for recording medium - Google Patents

Method for manufacturing mold for recording medium

Info

Publication number
JPH0648552B2
JPH0648552B2 JP17590185A JP17590185A JPH0648552B2 JP H0648552 B2 JPH0648552 B2 JP H0648552B2 JP 17590185 A JP17590185 A JP 17590185A JP 17590185 A JP17590185 A JP 17590185A JP H0648552 B2 JPH0648552 B2 JP H0648552B2
Authority
JP
Japan
Prior art keywords
mold
conductive film
recording medium
manufacturing
metal conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP17590185A
Other languages
Japanese (ja)
Other versions
JPS6236757A (en
Inventor
明 後藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maxell Ltd
Original Assignee
Hitachi Maxell Energy Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Maxell Energy Ltd filed Critical Hitachi Maxell Energy Ltd
Priority to JP17590185A priority Critical patent/JPH0648552B2/en
Publication of JPS6236757A publication Critical patent/JPS6236757A/en
Publication of JPH0648552B2 publication Critical patent/JPH0648552B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Manufacturing Optical Record Carriers (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、光デイスク等、情報を記録する記録媒体を複
製するための記録媒体用金型の製造方法に関する。
Description: TECHNICAL FIELD The present invention relates to a method of manufacturing a recording medium mold for duplicating a recording medium such as an optical disk for recording information.

〔従来の技術〕[Conventional technology]

従来より、ビデオデイスク、コンパクトデイスク、追記
型デイスク、光磁気デイスク等で代表される光デイスク
やその他の情報記録媒体の複製方法として、当該記録媒
体に記録される信号パターンとは逆のパターンの凹凸が
形成された金型に、例えば紫外線硬化型の如き記録転写
用樹脂を塗布し、しかる後、その表面に透明な基板を圧
着し、上記記録転写用樹脂を硬化することによつて、上
記透明基板に所定の凹凸パターンが転写された樹脂層を
形成する方法が知られている。
Conventionally, as a duplication method of an optical disc represented by a video disc, a compact disc, a write-once disc, a magneto-optical disc, and other information recording media, unevenness of a pattern opposite to a signal pattern recorded on the recording medium is used. By applying a recording transfer resin such as an ultraviolet curable resin to the mold in which the transparent resin is formed, and then a transparent substrate is pressure-bonded to the surface of the mold to cure the recording transfer resin, There is known a method of forming a resin layer on which a predetermined uneven pattern is transferred on a substrate.

上記した記録媒体複製用の金型は、従来、第7図に示す
ような方法、手順によつて作製されている。即ち、まず
ガラス等の基板上にレジスト膜が均一の圧さに形成され
たデイスク原盤を作製する{第7図(a)}。次いで、こ
のデイスク原盤を回転駆動し、該デイスク原盤に所定の
情報信号やトラツキング信号によって変調されたレーザ
光を照射して上記レジスト膜を露光し、該露光原盤を現
像処理して上記露光部分あるいは露光部分以外の部分を
除去し、上記情報信号に対応するピツトや上記トラツキ
ング情報に対応するグルーブを作製する{第7図
(b)}。次いで、該記録済み原盤の凹凸パターン形成側
の面に、金型を電鋳するための電極として、金属導電膜
を形成する{第7図(c)}。次いで、電鋳の前処理とし
て、上記金属導電膜を酸性処理液に浸漬し、金属導電膜
の表面に生成された酸化物を除去する{第7図(d)}。
しかるのち、金属導電膜を陰極として該金属導電膜上に
金型基材を所要の厚さに電鋳する{第7図(e)}。最後
に、この電鋳膜とともに上記導電膜を上記レジスト膜の
表面から離型することによつて、凹凸パターンが反転さ
れた所定の金型を得る{第7図(f)}。
The above-mentioned mold for duplicating a recording medium is conventionally manufactured by the method and procedure shown in FIG. That is, first, a disk master having a resist film formed on a substrate such as glass at a uniform pressure is prepared {FIG. 7 (a)}. Then, the disk master is driven to rotate, and the disk master is irradiated with laser light modulated by a predetermined information signal or a tracking signal to expose the resist film, and the exposure master is subjected to a development treatment to expose the exposed portion or A portion other than the exposed portion is removed, and a pit corresponding to the above information signal and a groove corresponding to the above tracking information are produced (FIG. 7).
(b)}. Next, a metal conductive film is formed as an electrode for electroforming a mold on the surface of the recorded master on which the concave-convex pattern is formed {FIG. 7 (c)}. Then, as a pretreatment for electroforming, the metal conductive film is immersed in an acid treatment solution to remove oxides formed on the surface of the metal conductive film {FIG. 7 (d)}.
After that, a metal base is used as a cathode and a die base material is electroformed on the metal conductive film to a required thickness (FIG. 7 (e)). Finally, the electroconductive film and the electroconductive film are released from the surface of the resist film to obtain a predetermined mold having a concavo-convex pattern inverted (FIG. 7 (f)).

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

ところで、この種情報記録媒体は、再生用レーザ光を上
記凹凸パターンに沿つて照射し、ピツトやグルーブがあ
る部分とない部分の反射光強度の差からこれらピツトや
グルーブの有無を検出することによつて信号の記録また
は再生を行う。その反射光強度の差はピツトやグルーブ
の形状(深さ、大きさ、全体の形状)に依存するため、
良好な記録再生特性を有する情報記録媒体を得るために
は、所定形状のピツトやグルーブが精密かつ均一に形成
された金型を作製する必要がある。
By the way, in this type of information recording medium, a reproducing laser beam is irradiated along the concave-convex pattern to detect the presence or absence of these pits or grooves from the difference in the reflected light intensity between the portions with and without pits or grooves. Therefore, the signal is recorded or reproduced. The difference in the reflected light intensity depends on the shape of the pit or groove (depth, size, overall shape),
In order to obtain an information recording medium having good recording / reproducing characteristics, it is necessary to manufacture a mold in which pits and grooves having a predetermined shape are precisely and uniformly formed.

然るに、上記のようにして形成された金型には、従来、
上記金属導電膜と電鋳膜とが剥離し易く耐久性に乏しい
ものや、あるいは所定形状のピツトやグルーブを転写す
ることができないものが頻繁に発生しており、情報記録
媒体の量産化を図る上で重大な障害となつていた。
However, in the mold formed as described above, conventionally,
Frequently, the metal conductive film and the electroformed film are easily separated from each other and have poor durability, or the pits or grooves having a predetermined shape cannot be transferred, and thus mass production of the information recording medium is attempted. It was a serious obstacle above.

本発明者は、かかる金型の不具合発生原因を追求した結
果、電鋳の前処理として行われる酸処理に問題があるこ
とを発見した。即ち、金属導電膜が形成された基板を例
えば空気中などに放置すると、該金属導電膜に酸化物が
生成されるが、この酸化物が生成付着されたままの状態
で金型基材の電鋳を行なうと金属導電膜と電鋳膜との間
の接着力が不良となり、金型として使用不能となる。そ
こで、電鋳工程以前に上記酸化物を除去するための前処
理が必要になうが、従来の酸処理は、強酸を含む処理液
中に金属導電膜が形成された基板を浸漬してその表面に
生成した酸化物を溶解除去する方式であるため、この浸
漬中に処理液が金属導電膜とレジスト膜との間に侵入す
る。そして、電鋳膜形成後になつてこの処理液が金属導
電膜と電鋳膜との間に浸出し、電鋳膜を剥離させたり、
クラツクやピンホール等を発生し、正確な凹凸パターン
の形成を阻害する、といつた事実を知得したのである。
The present inventor, as a result of pursuing the cause of such a mold defect, discovered that there is a problem with the acid treatment performed as a pretreatment for electroforming. That is, when the substrate on which the metal conductive film is formed is left to stand in the air, for example, an oxide is generated in the metal conductive film. When casting is performed, the adhesive force between the metal conductive film and the electroformed film becomes poor, making it unusable as a mold. Therefore, a pretreatment for removing the oxide is required before the electroforming step, but the conventional acid treatment is performed by immersing the substrate on which the metal conductive film is formed in a treatment solution containing a strong acid. Since the oxide formed on the surface is dissolved and removed, the treatment liquid penetrates between the metal conductive film and the resist film during the immersion. Then, after the electroformed film is formed, this treatment liquid leaches between the metal conductive film and the electroformed film, or the electroformed film is peeled off,
We learned that cracks, pinholes, etc. were generated, which hindered the formation of accurate uneven patterns.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、金属導電膜が形成された基板を非酸化雰囲気
中で保存することによつて、該金属導電膜に生成される
酸化物を未然に防止し、もつてこの酸化物を除去するた
めの前処理を省略して、叙上の如く不具合を防止しよう
とするものである。
The present invention prevents oxides formed in the metal conductive film by storing the substrate on which the metal conductive film is formed in a non-oxidizing atmosphere and removes the oxides. It is intended to prevent the inconvenience as described above by omitting the pretreatment of (1).

〔実施例〕〔Example〕

第1図に、本発明に係る記録媒体用金型の製造方法の工
程図を示す。
FIG. 1 shows a process diagram of a method for manufacturing a recording medium mold according to the present invention.

まず、第2図に示すように、レジストとの接着性を改善
するための処理がなされたガラス等からなる基板1の表
面に、スピンナ塗布、デツピング等の手段により紫外線
硬化型の合成樹脂等からなるレジスト膜2を形成する
{第1図(a)}。
First, as shown in FIG. 2, the surface of the substrate 1 made of glass or the like that has been subjected to a treatment for improving the adhesiveness with the resist is removed from an ultraviolet curable synthetic resin or the like by means such as spinner coating or depping. A resist film 2 is formed {FIG. 1 (a)}.

次いで、第3図に示すように、レジスト膜2が形成され
たデイスク原盤3を回転駆動し、上記レジスト膜2に、
所定の情報信号およびトラツキング信号によつて変調さ
れたレーザ光4を照射し、続いて、この露光済みのデイ
スク原盤を現像処理して、所定のグルーブやピツトが形
成させたデイスク原盤を得る{第1図(b)}。
Then, as shown in FIG. 3, the disk master 3 having the resist film 2 formed thereon is rotationally driven to form the resist film 2 on the resist film 2.
A laser beam 4 modulated by a predetermined information signal and a tracking signal is irradiated, and then the exposed disc master is developed to obtain a disc master formed with predetermined grooves and pits. Figure 1 (b)}.

次いで、第4図に示すように、この記録済み原盤5のレ
ジスト膜2上に、例えば真空蒸着,スパツタリング,イ
オンプレーテイング等の手段で、ニツケル等の金属導電
膜6を形成する{第1図(c)}。
Then, as shown in FIG. 4, a metal conductive film 6 such as nickel is formed on the resist film 2 of the recorded master 5 by means such as vacuum deposition, sputtering, ion plating, etc. {FIG. 1 (c)}.

次いで、この金属導電膜6が形成されたデイスク原盤を
非酸化雰囲気中で冷却し、次の電鋳工程までの間、保存
する{第1図(d)}。ここで、非酸化雰囲気とは、真空
中または還元性ガス中または不活性ガス中であることを
意味する。
Next, the disk master having the metal conductive film 6 formed thereon is cooled in a non-oxidizing atmosphere and stored until the next electroforming step {FIG. 1 (d)}. Here, the non-oxidizing atmosphere means in a vacuum, a reducing gas, or an inert gas.

次いで、第5図に示すように、金属導電膜6が形成され
たデイスク原盤を非酸化雰囲気中から取り出し、直ちに
上記金属導電膜6上に金型基材を電鋳して電鋳膜7を形
成する{第1図(e)}。この場合、該金型基材7として
は、金属導電膜6と同じ材質のものであることが、両者
の密着性を確保する上で好ましい。また、金属導電膜6
が形成されたデイスク原盤を非酸化雰囲気中から取り出
し、電鋳を開始するまでの時間は短かいほど好ましく、
気温20℃、湿度60%RHの空気中にさらす時間は2
〜3分以内が良い。
Then, as shown in FIG. 5, the disk master on which the metal conductive film 6 is formed is taken out from the non-oxidizing atmosphere, and a metal mold base is immediately electroformed on the metal conductive film 6 to form the electroformed film 7. Form {Fig. 1 (e)}. In this case, it is preferable that the mold base material 7 is made of the same material as the metal conductive film 6 in order to secure the adhesiveness between them. In addition, the metal conductive film 6
The disk master on which is formed is taken out from the non-oxidizing atmosphere, and the shorter the time until the electroforming is started, the better,
2 hours of exposure to air with a temperature of 20 ° C and a humidity of 60% RH
~ Within 3 minutes is good.

最後に、上記電鋳膜7と共に金属導電膜6をレジスト膜
2の表面から離型させることによつて、第6図に示すよ
うな金型8を得る{第1図(f)}。
Finally, the metal conductive film 6 is released from the surface of the resist film 2 together with the electroformed film 7 to obtain a mold 8 as shown in FIG. 6 {FIG. 1 (f)}.

このようにして得られた金型8は、金型基材を電鋳する
以前にその金属導電膜6が酸化されることがないため、
金属導電膜6と電鋳膜7とが密着すると共に、両者の間
に、電鋳膜7を剥離したり、クラツクやピンホールを発
生するための因子が侵入することがないので、転写性及
び耐久性が良好である。
In the die 8 thus obtained, the metal conductive film 6 is not oxidized before the electroforming of the die base material.
Since the metal conductive film 6 and the electroformed film 7 are in close contact with each other and the electroformed film 7 is not peeled off or a factor for generating a crack or a pinhole does not intrude between them, transferability and Good durability.

実施例1 幅0.2μm、深さ700Å、ピツチ1.6μmのグル
ーブ、および幅0.8μm、長さ1.3μm、深さ15
00Åのピツトがカツテイングされた記録済み原盤の凹
凸パターン形成面側に、下記の条件の下で厚さ900Å
のニツケル製導電膜を形成した。
Example 1 A groove having a width of 0.2 μm, a depth of 700 μm, a pitch of 1.6 μm, and a width of 0.8 μm, a length of 1.3 μm, and a depth of 15
900 Å under the following conditions, on the surface of the recorded master with the pits of 00 Å cut
The nickel-made conductive film was formed.

成膜手段;抵抗加熱蒸着法 記録済み原盤の温度;約80℃ 真空度;試料1 1×10-4Torr 試料2 5×10-5Torr 試料3 2×10-5Torr 試料4 1×10-5Torr 試料5 5×10-6Torr 試料6 2×10-6Torr 試料7 1×10-6Torr 試料8 5×10-7Torr 次いで、上記各試料を1×10-6Torrに調整された真空槽
中で室温まで冷却し、この真空槽から取り出したのち、
直ちにニツケルの電鋳を行つた。
Film forming means; temperature of the resistance heating evaporation recorded master; about 80 ° C. vacuum; Sample 1 1 × 10 -4 Torr Sample 2 5 × 10 -5 Torr Sample 3 2 × 10 -5 Torr Sample 4 1 × 10 - 5 Torr sample 5 5 × 10 -6 Torr sample 6 2 × 10 -6 Torr sample 7 1 × 10 -6 Torr sample 8 5 × 10 -7 Torr Then, the above samples were adjusted to 1 × 10 -6 Torr After cooling to room temperature in a vacuum chamber and removing from this vacuum chamber,
Immediately, Nickel was electroformed.

上記各試料について、グルーブとピツトの転写性と、導
電膜および電鋳膜との間の剥離性について試験したとこ
ろ、表−1の結果を得た。ここで、グルーブとピツトの
転写性についての○印は、転写性が良好で金型に所定形
状のピツトおよびグルーブが形成されていることを示
す。また、導電膜と電鋳膜との間の剥離性についての○
印は、両者が強固に密着していて剥離し難いことを示し
ており、×印は両者が剥離し易く耐久性がないことを示
している。
Each of the above samples was tested for the transferability of the groove and the pit and the peelability between the conductive film and the electroformed film, and the results shown in Table 1 were obtained. Here, the mark “◯” regarding the transferability of the groove and the pit indicates that the transferability is good and the pit and the groove having a predetermined shape are formed in the mold. In addition, regarding the peelability between the conductive film and the electroformed film,
The mark indicates that they are firmly adhered to each other and is difficult to peel off, and the mark x indicates that they are easily peeled off and has no durability.

表−1から明らかなように、1×10-4Torr以上の真空度
にてニツケル導電膜を真空蒸着し、1×10-6Torrに調整
された真空槽中で室温まで冷却た場合には、全て良好な
転写性を得ることができる。しかしながら、5×10-5To
rr以下の真空度でニツケル導電膜を真空蒸着したもの
は、1×10-6Torrに調整された真空槽中で室温まで冷
却、保存した場合にも、ニツケル電鋳膜との間で剥離さ
れ易く、耐久性がないことが判明した。
As is clear from Table-1, when a nickel conductive film is vacuum-deposited at a vacuum degree of 1 × 10 -4 Torr or more and cooled to room temperature in a vacuum chamber adjusted to 1 × 10 -6 Torr, Therefore, good transferability can be obtained. However, 5 × 10 -5 To
A nickel conductive film vacuum-deposited with a vacuum degree of rr or less is peeled off from the nickel electroformed film even when cooled and stored at room temperature in a vacuum tank adjusted to 1 × 10 -6 Torr. It was found to be easy and not durable.

実験例2 上記第1実施例で用いれたと同様のグルーブおよびピツ
トがカツテイングされた記録済みの原盤の凹凸パターン
形成面側に、下記の条件の下で厚さ900Åのニツケル
製導電膜を形成した。
Experimental Example 2 A conductive film made of nickel having a thickness of 900 Å was formed under the following conditions on the surface of the recorded master having the grooves and pits cut therein similar to those used in the first embodiment, under the following conditions.

成膜手段;抵抗加熱蒸着法 記録済み原盤の温度;約80℃ 真空度;1×10-6Torr 試料数;4 次いで、上記の各試料をそれぞれ下記の各条件の下で室
温まで冷却、保存し、この保存槽から取り出したのち、
第1実施例の場合と全く同様の条件の下で直ちにニツケ
ル電鋳を行つた。
Film-forming means: Resistance heating vapor deposition method Recorded master temperature: Approx. 80 ° C Vacuum degree: 1 × 10 -6 Torr Number of samples: 4 Then, cool down and store each of the above samples to room temperature under the following conditions. After taking out from this storage tank,
Nickel electroforming was immediately performed under exactly the same conditions as in the first embodiment.

試料1;空気中に放置 試料2;1×10-6Torrに調整された真空槽内に保存 試料3;0.1Torrに調整された真空槽内に保存 試料4;アルゴンガス槽に保存 上記各試料について、グルーブとピツトの転写性と、導
電膜および電鋳膜との間の剥離性について試験したとこ
ろ、表−2の結果を得た。尚、グルーブとピツトの転写
性および導電膜と電鋳膜との間の剥離性の評価を示す○
印および×印は、上記第1実施例の場合と同様の判断基
準によつて付されている。
Sample 1; left in the air Sample 2; stored in a vacuum chamber adjusted to 1 × 10 -6 Torr Sample 3; stored in a vacuum chamber adjusted to 0.1 Torr Sample 4; stored in an argon gas chamber When the transferability of the groove and the pit and the peelability between the conductive film and the electroformed film were tested, the results shown in Table 2 were obtained. In addition, the transferability of the groove and the pit and the peelability between the conductive film and the electroformed film are evaluated.
The mark and the X mark are attached according to the same judgment criteria as in the case of the first embodiment.

表−2から明らかなように、1×10-6Torrの真空度にて
ニツケル導電膜を真空蒸着した場合には、冷却保存条件
に拘らず、全て良好な転写性を得ることができる。しか
しながら、空気中に放置して冷却保存されたものは、ニ
ツケル電鋳膜との間で剥離され易く、耐久性がないこと
が判明した。
As is clear from Table 2, when the nickel conductive film is vacuum-deposited at a vacuum degree of 1 × 10 −6 Torr, good transferability can be obtained regardless of the cooling storage conditions. However, it was found that the one that was left in the air and cooled and stored was easily peeled off from the nickel electroformed film and had no durability.

〔発明の効果〕〔The invention's effect〕

以上説明したように、本発明の方法によれば、金属導電
膜上に酸化物が生成されることがないので、転写性およ
び耐久性に優れた金型を製造することができる。また、
従来のように、導電膜に生成された酸化物を除去するた
めの工程を必要としないので、金型の製造工程が簡略化
され、製品である情報記録媒体の製造コストを低減する
ことができる。
As described above, according to the method of the present invention, since an oxide is not formed on the metal conductive film, it is possible to manufacture a mold having excellent transferability and durability. Also,
Since a process for removing the oxide formed on the conductive film is not required unlike the conventional case, the manufacturing process of the mold is simplified and the manufacturing cost of the information recording medium as a product can be reduced. .

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の金型製造方法を示す工程説明図、第2
図はレジスト膜が形成されたデイスク原盤の断面図、第
3図はカツテイング工程を示す説明図、第4図は金属導
電膜が形成されたデイスク原盤の断面図、第5図は金属
電鋳膜が形成されたデイスク原盤の断面図、第6図は金
型の断面図、第7図は従来の金型製造方法を示す工程説
明図である。 1:基板、2:レジスト膜、3:デイスク原盤、4:レ
ーザ光、5:記録済み原盤、6:金属導電膜、7:電鋳
膜、8:金型
FIG. 1 is a process explanatory view showing a mold manufacturing method of the present invention, and FIG.
The figure is a cross-sectional view of a disk master on which a resist film is formed, FIG. 3 is an explanatory view showing the cutting process, FIG. 4 is a cross-sectional view of a disk master on which a metal conductive film is formed, and FIG. 5 is a metal electroformed film. 6 is a cross-sectional view of the disk master on which the disk is formed, FIG. 6 is a cross-sectional view of the mold, and FIG. 1: substrate, 2: resist film, 3: disk master, 4: laser light, 5: recorded master, 6: metal conductive film, 7: electroformed film, 8: mold

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】基板表面に形成されたレジスト膜にカツテ
イングを行う工程と、該カツテイング工程によつて形成
された凹凸部の表面に金属導電膜を形成する工程と、該
金属導電膜が形成された基板を非酸化雰囲気中で冷却、
保存する工程と、上記非酸化雰囲気中より導電膜が形成
された基板を取り出し、直ちに上記導電膜上に金型基材
を電鋳する工程と、該電鋳工程によつて形成された金型
基材と共に上記金属導電膜を上記レジスト膜の表面から
離型させる工程とから構成したことを特徴とする記録媒
体用金型の製造方法。
1. A step of cutting a resist film formed on a surface of a substrate, a step of forming a metal conductive film on a surface of an uneven portion formed by the cutting step, and a step of forming the metal conductive film. The cooled substrate in a non-oxidizing atmosphere,
A step of storing, a step of taking out the substrate on which the conductive film is formed from the non-oxidizing atmosphere and immediately electroforming a mold base material on the conductive film, and a mold formed by the electroforming step And a step of releasing the metal conductive film from the surface of the resist film together with the base material.
【請求項2】特許請求の範囲第1項記載の記録媒体用金
型の製造方法において、金属導電膜が形成された基板を
冷却、保存するための工程が、真空に調整された真空槽
内で行われることを特徴とする記録媒体用金型の製造方
法。
2. The method for manufacturing a mold for a recording medium according to claim 1, wherein the step of cooling and storing the substrate on which the metal conductive film is formed is performed in a vacuum chamber adjusted to a vacuum. A method for manufacturing a mold for a recording medium, characterized in that
【請求項3】特許請求の範囲第1項記載の記録媒体用金
型の製造方法において、金属導電膜が形成された基板を
冷却、保存するための工程が、不活性ガスが注入された
不活性ガス槽内で行われることを特徴とする記録媒体用
金型の製造方法。
3. The method for manufacturing a mold for a recording medium according to claim 1, wherein the step of cooling and storing the substrate on which the metal conductive film is formed is performed by using an inert gas injection method. A method for manufacturing a mold for a recording medium, which is carried out in an active gas tank.
【請求項4】特許請求の範囲第1項記載の記録媒体用金
型の製造方法において、金属導電膜が形成された基板を
冷却、保存するための工程が、還元性ガスが注入された
還元性ガス槽内で行われることを特徴とする記録媒体用
金型の製造方法。
4. The method of manufacturing a mold for a recording medium according to claim 1, wherein the step of cooling and storing the substrate on which the metal conductive film is formed is a reduction in which a reducing gas is injected. A method for manufacturing a mold for a recording medium, wherein the method is carried out in a reactive gas tank.
【請求項5】特許請求の範囲第1項乃至第4項記載の記
録媒体用金型の製造方法において、カツテイングされた
基板の凹凸部の表面に金属導電膜を形成する工程が、2
×10-5Torr 以上の真空度に調整された真空槽内で、
真空蒸着法によつて行われることを特徴とする記録媒体
用金型の製造方法。
5. The method of manufacturing a mold for a recording medium according to claim 1, wherein the step of forming a metal conductive film on the surface of the uneven portion of the cut substrate comprises 2 steps.
In a vacuum chamber adjusted to a vacuum degree of 10-5 Torr or more,
A method of manufacturing a mold for a recording medium, which is performed by a vacuum deposition method.
【請求項6】特許請求の範囲第1項乃至第5項記載の記
録媒体用金型の製造方法において、金属導電膜および電
鋳膜をニツケルにて形成したことを特徴とする記録媒体
用金型の製造方法。
6. A method for manufacturing a recording medium mold according to any one of claims 1 to 5, wherein the metal conductive film and the electroformed film are formed by nickel. Mold manufacturing method.
JP17590185A 1985-08-12 1985-08-12 Method for manufacturing mold for recording medium Expired - Fee Related JPH0648552B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17590185A JPH0648552B2 (en) 1985-08-12 1985-08-12 Method for manufacturing mold for recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17590185A JPH0648552B2 (en) 1985-08-12 1985-08-12 Method for manufacturing mold for recording medium

Publications (2)

Publication Number Publication Date
JPS6236757A JPS6236757A (en) 1987-02-17
JPH0648552B2 true JPH0648552B2 (en) 1994-06-22

Family

ID=16004210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17590185A Expired - Fee Related JPH0648552B2 (en) 1985-08-12 1985-08-12 Method for manufacturing mold for recording medium

Country Status (1)

Country Link
JP (1) JPH0648552B2 (en)

Also Published As

Publication number Publication date
JPS6236757A (en) 1987-02-17

Similar Documents

Publication Publication Date Title
US5051340A (en) Master for optical element replication
JP2984443B2 (en) Master holder and electroforming method for stamper electroforming apparatus
WO1996036046A1 (en) Optical disk and production method thereof
JPH0648552B2 (en) Method for manufacturing mold for recording medium
EP0668584A1 (en) Preformatted substrate, preformatted substrate having information to be duplicated, their methods of manufacture, and method of manufacture of a master disk or optical disk
JPH052779A (en) Stamper manufacturing method
JPS606018B2 (en) Method for manufacturing information recording media
JPS60147946A (en) Manufacture of optical memory element
JPS593731A (en) Manufacture of information disk
JP2663912B2 (en) Disc manufacturing method
JPH01201842A (en) Manufacture of guide groove stamper
JPH11350181A (en) Production of stamper
JPS60187952A (en) Manufacture of stamper for optical disk
JP2540464B2 (en) Method for manufacturing optical disk substrate
JPS62214532A (en) Production of stamper
KR900003520B1 (en) Optical tape manufacturing method
JPH03280231A (en) Production of stamper for optical disk
JP3018470B2 (en) Manufacturing method of stamper
JPS61214247A (en) Production of stamper for recording medium
JP2753388B2 (en) Manufacturing method of stamper
JPH04344346A (en) Production of stamper for optical information medium molding
JPS60182031A (en) Information recording mother disk and its production
JPH036390A (en) Method for manufacturing a stamper for forming information recording media
JPS60197959A (en) Manufacture of optical disk
JPH02123536A (en) Production of stamper for optical disk

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees