JPH0642501B2 - Positioning method for small semiconductor chips - Google Patents

Positioning method for small semiconductor chips

Info

Publication number
JPH0642501B2
JPH0642501B2 JP32197587A JP32197587A JPH0642501B2 JP H0642501 B2 JPH0642501 B2 JP H0642501B2 JP 32197587 A JP32197587 A JP 32197587A JP 32197587 A JP32197587 A JP 32197587A JP H0642501 B2 JPH0642501 B2 JP H0642501B2
Authority
JP
Japan
Prior art keywords
semiconductor chip
connection
substrate
alignment mark
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP32197587A
Other languages
Japanese (ja)
Other versions
JPH01162345A (en
Inventor
正男 牧内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP32197587A priority Critical patent/JPH0642501B2/en
Publication of JPH01162345A publication Critical patent/JPH01162345A/en
Publication of JPH0642501B2 publication Critical patent/JPH0642501B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】 〔概要〕 微小半導体チップの位置合わせ方法の改良に関し、 容易に実施し得る位置合わせマークの形成により、微小
半導体チップの接続パッドと、接続基板の接続パッドと
を、高精度で接続することが可能な微小半導体チップの
位置合わせ方法の提供を目的とし、 微小半導体チップと接続基板とを位置合わせする方法で
あって、前記接続基板上に位置合わせマークを形成し、
前記微小半導体チップのチップ基板を透過する波長の入
射光を、前記微小半導体チップの接続パッドを形成して
いない面の裏面から照射し、前記裏面より、前記位置合
わせマークによる反射光と、微小半導体チップの光吸収
層の影像とのを確認し、位置合わせを行うよう構成す
る。
DETAILED DESCRIPTION OF THE INVENTION [Outline] The present invention relates to an improvement in a method of aligning a micro semiconductor chip, and by forming an alignment mark that can be easily carried out, a connection pad of a micro semiconductor chip and a connection pad of a connection substrate can be improved. A method for aligning a fine semiconductor chip and a connection board, which is for the purpose of providing a method for aligning a fine semiconductor chip that can be connected with accuracy, wherein an alignment mark is formed on the connection board,
Incident light having a wavelength that passes through the chip substrate of the micro semiconductor chip is irradiated from the back surface of the surface of the micro semiconductor chip on which the connection pads are not formed, and from the back surface, the light reflected by the alignment mark and the micro semiconductor The light absorption layer of the chip is confirmed to be aligned with the image, and the alignment is performed.

〔産業上の利用分野〕[Industrial application field]

本発明は、半導体チップの位置合わせ方法に係り、特に
微小半導体チップの位置合わせ方法の改良に関するもの
である。
The present invention relates to a method of aligning a semiconductor chip, and more particularly to improvement of a method of aligning a minute semiconductor chip.

半導体チップを接続基板に高精度で位置合わせする方法
として種々の方法が行われているが、従来は半導体チッ
プのサイズが数mm程度と大きいので、容易に位置合わせ
することが可能であった。
Various methods have been performed as a method for aligning a semiconductor chip with a connection substrate with high accuracy. However, since the size of the semiconductor chip is as large as several mm in the related art, the alignment can be easily performed.

しかしながら近年になって、光半導体装置の半導体チッ
プのように数百μm程度の微小半導体チップを、数μm
以下の精度で位置合わせすることが必要になってきた。
However, in recent years, a minute semiconductor chip of about several hundred μm, such as a semiconductor chip of an optical semiconductor device, has become
It has become necessary to perform alignment with the following accuracy.

以上のような状況から数百μm程度の微小半導体チップ
を数μm以下の精度で位置合わせすることが可能な微小
半導体チップの位置合わせ方法が要望されている。
Under the circumstances as described above, there is a demand for a method of aligning a micro semiconductor chip having a size of several hundreds of μm with an accuracy of several μm or less.

〔従来の技術〕[Conventional technology]

従来の半導体チップの位置合わせ方法は、半導体チップ
のサイズが数mm程度であるため、第4図に示すように、
接続基板22上にリソグラフィー技術により位置合わせマ
ーク23を形成し、この位置合わせマーク23とチップ基板
21aの外形とを用いて位置合わせする方法が行われてい
る。
In the conventional semiconductor chip alignment method, since the size of the semiconductor chip is about several mm, as shown in FIG.
The alignment mark 23 is formed on the connection substrate 22 by the lithography technique, and the alignment mark 23 and the chip substrate are formed.
A method of aligning with the outer shape of 21a is performed.

この場合は、半導体チップのサイズが大きいので、半導
体チップの外形切断精度が多少悪くても、接続パッド間
のズレが許容可能な範囲内におさまっていた。
In this case, since the size of the semiconductor chip is large, even if the outer shape cutting accuracy of the semiconductor chip is somewhat poor, the deviation between the connection pads is within an allowable range.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

以上説明の従来の半導体チップの位置合わせ方法で問題
となるのは、位置合わせマークと半導体チップの外形と
を用いて位置合わせすることである。
The problem with the conventional semiconductor chip alignment method described above is that alignment is performed using the alignment mark and the outer shape of the semiconductor chip.

即ち、外形サイズが数百μm〜1mm程度の半導体チップ
の場合には、半導体チップの外形切断精度が悪いと、位
置合わせマークと半導体チップの外形とを用いて位置合
わせすると、接続パッド間のズレが許容可能な範囲内に
おさまらなくなるのである。
That is, in the case of a semiconductor chip having an outer shape size of several hundreds of μm to 1 mm, if the outer shape cutting accuracy of the semiconductor chip is poor, when the alignment mark and the outer shape of the semiconductor chip are used for alignment, a gap between the connection pads is misaligned. Will not be within the acceptable range.

本発明は以上のような状況から、容易に実施し得る位置
合わせマークの形成により、微小半導体チップの接続パ
ッドと、接続基板の接続パッドとを、高精度で接続する
ことが可能な微小半導体チップの位置合わせ方法の提供
を目的としたものである。
In view of the above situation, the present invention is a micro semiconductor chip capable of highly accurately connecting the connection pad of the micro semiconductor chip and the connection pad of the connection substrate by forming the alignment mark that can be easily implemented. The purpose is to provide a method of aligning.

〔問題点を解決するための手段〕[Means for solving problems]

上記問題点は、微小半導体チップと接続基板とを位置合
わせする方法であって、前記接続基板上に位置合わせマ
ークを形成し、前記微小半導体チップのチップ基板を透
過する波長の入射光を、前記微小半導体チップの接続パ
ッドを形成していない面の裏面から照射し、前記裏面よ
り、前記位置合わせマークによる反射光と、微小半導体
チップの光吸収層の影像とのを確認し、位置合わせを行
う本発明による微小半導体チップの位置合わせ方法によ
って解決される。
The above-mentioned problem is a method of aligning a micro semiconductor chip and a connection substrate, wherein an alignment mark is formed on the connection substrate, and incident light of a wavelength that passes through the chip substrate of the micro semiconductor chip is Irradiation is performed from the back surface of the surface of the micro semiconductor chip on which the connection pads are not formed, and the light reflected by the alignment mark and the image of the light absorption layer of the micro semiconductor chip are confirmed from the back surface for alignment. This is solved by the method for aligning the micro semiconductor chip according to the present invention.

〔作用〕[Action]

即ち本発明においては、接続基板上に位置合わせマーク
を形成し、この接続基板に搭載する微小半導体チップの
チップ基板を透過する波長の入射光を、この微小半導体
チップの接続パッドを形成していない面から照射する
と、この入射光は光吸収層が形成されている部分では吸
収されて全く反射せず、光吸収層が形成されていない部
分では透過し、その下に形成した位置合わせマークで反
射するので、この位置合わせマークの形状を認識するこ
とが可能である。
That is, in the present invention, the alignment mark is formed on the connection substrate, and the incident light of the wavelength that passes through the chip substrate of the micro semiconductor chip mounted on the connection substrate is not formed on the connection pad of the micro semiconductor chip. When irradiated from the surface, this incident light is absorbed in the part where the light absorption layer is formed and is not reflected at all, is transmitted in the part where the light absorption layer is not formed, and is reflected by the alignment mark formed below it. Therefore, it is possible to recognize the shape of this alignment mark.

この位置合わせマークの形状の反射光と光吸収層の影像
とを位置合わせすることにより、微小半導体チップの接
続パッドと、接続基板の接続パッドとを、高精度で接続
することが可能となる。
By aligning the reflected light in the shape of the alignment mark and the image of the light absorption layer, the connection pad of the minute semiconductor chip and the connection pad of the connection substrate can be connected with high accuracy.

〔実施例〕〔Example〕

以下第1図〜第3図について本発明の一実施例を説明す
る。
An embodiment of the present invention will be described below with reference to FIGS.

微小半導体チップ1は第1図(a)及び第2図(b)に示すよ
うに、200μm×200μm×厚さ約100μmのインジュウ
ム燐(InP)よりなるチップ基板1aの表面に、直径10μm
×厚さ1.5μmのインジュウム・ガリウム、砒素(InGaA
s)よりなる光吸収層1bと、4個の40μm角×厚さ1.5μ
mのインジュウム・ガリウム、砒素(InGaAs)よりなる光
吸収層1b′が形成され、この光吸収層1b,1b′の表面に
インジュウム燐(InP)よりなる厚さ1μmの透明層1c,1
c′が形成され、更にその上に接続パッド1d,1d′が形成
されている。
As shown in FIGS. 1 (a) and 2 (b), the micro semiconductor chip 1 has a diameter of 10 μm on the surface of a chip substrate 1a of 200 μm × 200 μm × thickness of about 100 μm made of indium phosphide (InP).
× 1.5 μm thick indium gallium and arsenic (InGaA
s) light absorption layer 1b and four 40μm squares × thickness 1.5μ
m indium-gallium-arsenic (InGaAs) light-absorbing layer 1b 'is formed, and the transparent layer 1c, 1 made of indium-phosphorus (InP) and having a thickness of 1 μm is formed on the surface of the light-absorbing layers 1b, 1b'.
c'is formed, and the connection pads 1d and 1d 'are further formed thereon.

一方、接続基板2の表面には上記の接続パッド1dに接続
される接続パッド2a及び接続パッド1d′に接続される接
続パッド2a′が形成されている。
On the other hand, a connection pad 2a connected to the connection pad 1d and a connection pad 2a 'connected to the connection pad 1d' are formed on the surface of the connection substrate 2.

図示のようにチップ基板1aを透過する波長1.3μmの入
射光4を照射すると、チップ基板1aのみの部分を透過し
た入射光4は、接続基板2上に金属を蒸着して形成した
環状の位置合わせマーク3で反射し、この環状の反射光
5は図示のように反射する。
When the incident light 4 having a wavelength of 1.3 μm which is transmitted through the chip substrate 1a is irradiated as shown in the figure, the incident light 4 transmitted through only the portion of the chip substrate 1a has an annular position formed by depositing a metal on the connection substrate 2. The ring-shaped reflected light 5 is reflected by the alignment mark 3 and is reflected as shown in the drawing.

一方、光吸収層1bの部分に照射された入射光4はこの光
吸収層1bで吸収されるので、第1図(b)に示すような黒
丸となって見える。
On the other hand, the incident light 4 applied to the portion of the light absorption layer 1b is absorbed by the light absorption layer 1b, so that it appears as a black circle as shown in FIG. 1 (b).

チップ基板1aの位置を微調整して、上記の環状の反射光
の真中に上記の黒丸がくるようにすると、微小半導体チ
ップ1の接続パッド1dの中心と接続基板2の接続パッド
2aの中心とを正確に合致させることが可能となる。
When the position of the chip substrate 1a is finely adjusted so that the black circle is located in the center of the circular reflected light, the center of the connection pad 1d of the minute semiconductor chip 1 and the connection pad of the connection substrate 2
It is possible to exactly match the center of 2a.

しかしながら、光吸収層1bに比べて接続パッド2aの直径
が非常に大なる場合は、必然的に位置合わせマーク3の
内径も大きくなり、この内径と光吸収層1bの外径との間
に大きな差が生じる場合には、位置合わせが困難にな
り、位置合わせ精度が低下する。
However, when the diameter of the connection pad 2a is much larger than that of the light absorption layer 1b, the inner diameter of the alignment mark 3 is inevitably large, and it is large between this inner diameter and the outer diameter of the light absorption layer 1b. If there is a difference, the alignment becomes difficult and the alignment accuracy decreases.

このような場合に適用できる他の実施例について第2図
により説明する。
Another embodiment applicable to such a case will be described with reference to FIG.

この場合は位置合わせに光吸収層11bを用いないで、第
2図(a)及び(b)に示すように、接続パッド11d′の間の
光吸収層11bの一部を円形に除去し、この位置に対応す
る接続基板12上に位置合わせマーク13を金属を蒸着して
形成する。
In this case, the light absorption layer 11b is not used for the alignment, and as shown in FIGS. 2A and 2B, a part of the light absorption layer 11b between the connection pads 11d 'is removed in a circular shape, The alignment mark 13 is formed on the connection substrate 12 corresponding to this position by depositing metal.

図示のようにチップ基板11aを透過する波長1.3μmの入
射光14を照射すると、チップ基板11aのみの部分を透過
した入射光14は、接続基板12上の金属を蒸着して形成し
た位置合わせマーク13で反射し、この円形の反射光15は
図示のように反射する。
When the incident light 14 having a wavelength of 1.3 μm transmitted through the chip substrate 11a is irradiated as shown in the figure, the incident light 14 transmitted through only the chip substrate 11a is an alignment mark formed by vapor-depositing metal on the connection substrate 12. The circular reflected light 15 reflects at 13 and is reflected as shown.

一方、光吸収層11b′の部分に照射された入射光14はこ
の光吸収層11b′で吸収されるので、第2図(c)に示すよ
うな斜線で示すような黒地の中の円形の窓の中の接続基
板12の表面からの反射光の中に、輝いている位置合わせ
マーク13を見ることができる。
On the other hand, since the incident light 14 applied to the light absorbing layer 11b 'is absorbed by the light absorbing layer 11b', it is circular in a black background as shown by the diagonal lines in FIG. 2 (c). The shining alignment mark 13 can be seen in the reflected light from the surface of the connecting substrate 12 in the window.

チップ基板11aの位置を微調整して、上記の窓の真中に
上記の輝いている位置合わせマーク13がくるようにする
と、微小半導体チップ11の接続パッド11dの中心と、接
続基板12の接続パッド12aの中心とを正確に合致させる
ことが可能となる。
By finely adjusting the position of the chip substrate 11a so that the above-mentioned bright alignment mark 13 is located in the center of the window, the center of the connection pad 11d of the minute semiconductor chip 11 and the connection pad of the connection substrate 12 It is possible to exactly match the center of 12a.

この場合は黒地の中の円形の窓の中の接続基板12の表面
からの反射光の中に、輝いている位置合わせマーク13を
位置合わせするので、コントラストが少々不足ぎみであ
る。
In this case, since the bright alignment mark 13 is aligned with the reflected light from the surface of the connection substrate 12 in the circular window in the black background, the contrast is slightly insufficient.

なお、この点を改良するために、一実施例と他の実施例
の長所を組み合わせ、他の実施例で形成した位置合わせ
のための光吸収層11b′の円形の除去部分の中央に、一
実施例で用いた光吸収層1bに相当するものを残し、これ
に対応する環状の位置合わせマークを接続基板の表面に
形成すれば、一実施例と他の実施例の欠点を除去した位
置合わせを行うことが可能となる。
In order to improve this point, the advantages of one embodiment and the other embodiments are combined, and the center of the circular removed portion of the light absorption layer 11b ′ for alignment formed in the other embodiment is provided with By leaving the one corresponding to the light absorption layer 1b used in the example and forming an annular alignment mark corresponding to this on the surface of the connection substrate, alignment in which the defects of one example and other examples are removed It becomes possible to do.

このように接続パッドの中心を合致させた微小半導体チ
ップ1接続基板2とを、接続パッドの各々の表面に形成
しおいた金錫合金を加熱溶融すると一体化し、第3図に
示すような状態に組み立てることが可能となる。
The fine semiconductor chip 1 and the connection substrate 2 with the centers of the connection pads thus aligned are integrated by heating and melting the gold-tin alloy formed on the respective surfaces of the connection pads, and the state shown in FIG. 3 is obtained. It is possible to assemble it.

〔発明の効果〕 以上の説明から明らかなように本発明によれば極めて簡
単な構造の位置合わせマークを接続基板上に形成するこ
とにより、微小半導体チップの接続パッドと、接続基板
の接続パッドと、を高精度で位置合わせすることが可能
となる利点があり、著しい品質向上の効果が期待でき工
業的には極めて有用なものである。
[Effects of the Invention] As is clear from the above description, according to the present invention, by forming the alignment mark having an extremely simple structure on the connection substrate, Has the advantage that it can be aligned with high accuracy, and can be expected to have a remarkable effect of improving the quality, which is extremely useful industrially.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明による一実施例を示す図、 第2図は本発明による他の実施例を示す図、 第3図は本発明による一実施例の微小半導体チップと接
続基板との組立状態を示す側断面図、 第4図は従来の半導体チップの位置合わせ方法を示す
図、である。 図において、 1,11は微小半導体チップ、 1a,11aはチップ基板、 1b,11bは光吸収層、 1b′,11b′は光吸収層、 1c,11cは透明層、 1c′,11c′は透明層、 1d,11dは接続パッド、 1d′,11d′は接続パッド、 2,12接続基板、 2a,12aは接続パッド、 3,13は位置合わせマーク、 4,14は入射光、 5,15は反射光、を示す。
FIG. 1 is a diagram showing an embodiment according to the present invention, FIG. 2 is a diagram showing another embodiment according to the present invention, and FIG. 3 is an assembled state of a micro semiconductor chip and a connection substrate according to an embodiment of the present invention. FIG. 4 is a side sectional view showing the above, and FIG. 4 is a view showing a conventional method for aligning a semiconductor chip. In the figure, 1 and 11 are minute semiconductor chips, 1a and 11a are chip substrates, 1b and 11b are light absorbing layers, 1b 'and 11b' are light absorbing layers, 1c and 11c are transparent layers, and 1c 'and 11c' are transparent. Layers, 1d and 11d are connection pads, 1d ′ and 11d ′ are connection pads, 2 and 12 connection boards, 2a and 12a are connection pads, 3 and 13 are alignment marks, 4 and 14 are incident light, 5 and 15 are Reflected light.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】微小半導体チップ(1)と接続基板(2)とを位
置合わせする方法であって、前記接続基板(2)上に位置
合わせマーク(3)を形成し、前記微小半導体チップ(1)の
チップ基板(1a)を透過する波長の入射光(4)を、前記微
小半導体チップ(1)の接続パッド(1d)を形成していない
面の裏面から照射し、前記裏面より、前記位置合わせマ
ーク(3)による反射光(5)と、微小半導体チップ(1)の光
吸収層(1b)の影像とを確認し、位置合わせを行うことを
特徴とする微小半導体チップの位置合わせ方法。
1. A method for aligning a micro semiconductor chip (1) and a connection board (2), wherein an alignment mark (3) is formed on the connection board (2), and the micro semiconductor chip (3) is formed. Incident light (4) having a wavelength that passes through the chip substrate (1a) of 1) is irradiated from the back surface of the surface on which the connection pads (1d) of the micro semiconductor chip (1) are not formed, and from the back surface, A method for aligning a micro semiconductor chip, which comprises performing alignment by confirming the reflected light (5) from the alignment mark (3) and the image of the light absorption layer (1b) of the micro semiconductor chip (1). .
JP32197587A 1987-12-18 1987-12-18 Positioning method for small semiconductor chips Expired - Lifetime JPH0642501B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32197587A JPH0642501B2 (en) 1987-12-18 1987-12-18 Positioning method for small semiconductor chips

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32197587A JPH0642501B2 (en) 1987-12-18 1987-12-18 Positioning method for small semiconductor chips

Publications (2)

Publication Number Publication Date
JPH01162345A JPH01162345A (en) 1989-06-26
JPH0642501B2 true JPH0642501B2 (en) 1994-06-01

Family

ID=18138519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32197587A Expired - Lifetime JPH0642501B2 (en) 1987-12-18 1987-12-18 Positioning method for small semiconductor chips

Country Status (1)

Country Link
JP (1) JPH0642501B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2888015B2 (en) * 1992-01-20 1999-05-10 日本電気株式会社 Inspection jig for semiconductor device and alignment method thereof
JP2001056952A (en) 1999-08-19 2001-02-27 Hitachi Ltd Optical head device and its manufacture
JP4713763B2 (en) * 2000-05-18 2011-06-29 株式会社アドバンテスト Probe position deviation detection method, probe position determination method, probe position deviation detection device, probe position determination device

Also Published As

Publication number Publication date
JPH01162345A (en) 1989-06-26

Similar Documents

Publication Publication Date Title
US5403773A (en) Method for producing a semiconductor light emitting device
US5393696A (en) Method for forming multilayer indium bump contacts
US5257336A (en) Optical subassembly with passive optical alignment
JP5637526B2 (en) Laser processing equipment
US20060291771A1 (en) Methods and apparatus to mount a waveguide to a substrate
US6455944B1 (en) Alignment of an optical assembly
US20040063235A1 (en) Substrate for mounting optical component and method of manufacturing the same
US7415180B2 (en) Accurate positioning of components of an optical assembly
US20090074354A1 (en) Optical waveguide mounted substrate and method of producing the same
US6667550B2 (en) Installation structure and method for optical parts and electric parts
JPH0642501B2 (en) Positioning method for small semiconductor chips
US5771323A (en) Micro-photonics module
US20030118071A1 (en) Laser array and method of making same
US6137121A (en) Integrated semiconductor light generating and detecting device
WO2001029601A1 (en) Optical component having positioning markers and method for making the same
JPH03141308A (en) Photodetecting module and production thereof
JP2002014258A (en) Optical semiconductor element carrier and optical assembly provided with it
US6594084B1 (en) Method and manufacturing a precisely aligned microlens array
KR100353607B1 (en) Method for aligning optical elements one another on v-groove substrate
US6184543B1 (en) Optical semiconductor device and method for fabricating the same
JP2005164801A (en) Optical waveguide film and its manufacturing method
JPS61174791A (en) Semiconductor laser diode device
JPH05241048A (en) Coupling device for optical parts
JP3617903B2 (en) Mold and manufacturing method thereof
KR0169838B1 (en) Optical coupling device having self-aligned alignment marks and its fabrication method