JPH0641605Y2 - Thin film evaporator - Google Patents

Thin film evaporator

Info

Publication number
JPH0641605Y2
JPH0641605Y2 JP1988121991U JP12199188U JPH0641605Y2 JP H0641605 Y2 JPH0641605 Y2 JP H0641605Y2 JP 1988121991 U JP1988121991 U JP 1988121991U JP 12199188 U JP12199188 U JP 12199188U JP H0641605 Y2 JPH0641605 Y2 JP H0641605Y2
Authority
JP
Japan
Prior art keywords
unit
thin film
thinning
dispersion unit
liquid material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1988121991U
Other languages
Japanese (ja)
Other versions
JPH0257935U (en
Inventor
忠成 山崎
裕利 半田
Original Assignee
神鋼パンテック株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 神鋼パンテック株式会社 filed Critical 神鋼パンテック株式会社
Priority to JP1988121991U priority Critical patent/JPH0641605Y2/en
Publication of JPH0257935U publication Critical patent/JPH0257935U/ja
Application granted granted Critical
Publication of JPH0641605Y2 publication Critical patent/JPH0641605Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【考案の詳細な説明】 (産業上の利用分野) 本考案は、重合反応によって得られた高粘度液状の高分
子樹脂から残留するモノマー、溶剤等の揮発性成分を除
去して精製製品にする等の目的に有利に使用される強制
薄膜化蒸発装置の改良に関する。
[Detailed Description of the Invention] (Industrial field of application) The present invention removes residual volatile components such as monomers and solvents from a high-viscosity liquid polymer resin obtained by a polymerization reaction to obtain a purified product. The present invention relates to an improvement of a forced thin film evaporation device that is advantageously used for such purposes.

(従来の技術) 第4図は本考案と対比される先行技術の薄膜蒸発装置を
示す。
(Prior Art) FIG. 4 shows a prior art thin film evaporation apparatus which is to be compared with the present invention.

中心縦軸線(X)のまわりに円筒形の密閉式蒸発器本体
(1)の器内面(2)を外周に付設したジャケット
(3)に熱媒ノズル(4)(5)を経て熱媒を通ずるこ
とにより加熱蒸発面に形成し、上部の揮発性成分蒸気の
蒸気出口ノズル(6)を器外の凝縮器を経て真空化源に
接続することにより器内の減圧化、真空化を可能とし、
中心縦軸線(X)位置に上下の軸受(7)(8)により
支承した回転軸(9)の上位に分散ユニット(10)、下
位に薄膜化ユニット(11)を取付けて液材料入口ノズル
(12)から器内の分散ユニット(10)に向かって供給さ
れる揮発性成分を含む液材料を分散ユニット(10)によ
り器内面に全周に一次的に分散しかつ下方に移送し、薄
膜化ユニット(11)の外周に列設した薄膜化翼(13)に
より加熱蒸発面上に薄膜状に強制展開させかつその強制
掻下げを図り、こうして加熱蒸発面上の液材料薄膜から
揮発性成分を減圧下で加熱温度を極力低くして広い蒸発
面積から短い熱影響時間のもとに急速に蒸発させて除去
して液材料を精製するようになっている。こうして精製
された製品は蒸発器本体下端の製品出口(14)より抜き
出し、一方薄膜化ユニット(11)の領域の薄膜化蒸発部
(A)で発生した揮発性成分の蒸気は上位の分散ユニッ
ト中に設けた蒸気通路(15)を通過し蒸気出口ノズル
(6)から器外に抜出し凝縮器で凝縮液化させるように
なっている。
The heat medium is passed through the heat medium nozzles (4) and (5) to a jacket (3) provided with the inner surface (2) of the cylindrical hermetic evaporator body (1) around the central longitudinal axis (X) on the outer periphery. It is formed on the heating / evaporating surface by passing it through, and the vapor outlet nozzle (6) of the volatile component vapor in the upper part is connected to the vacuum source via the condenser outside the device, thereby making it possible to reduce the pressure and vacuum inside the device. ,
The dispersion unit (10) is attached to the upper side of the rotary shaft (9) supported by the upper and lower bearings (7) and (8) at the central vertical axis (X) position, and the thinning unit (11) is attached to the lower side of the rotary shaft (9), and the liquid material inlet nozzle ( A liquid material containing a volatile component supplied from the (12) toward the dispersion unit (10) in the vessel is primarily dispersed all around the inner surface of the vessel by the dispersion unit (10) and transferred downward to form a thin film. The thinning blades (13) arranged in a row on the outer periphery of the unit (11) forcibly develop a thin film on the heating / evaporating surface and forcibly scrape it, thus removing volatile components from the liquid material thin film on the heating / evaporating surface. The heating temperature is made as low as possible under reduced pressure to rapidly evaporate and remove from a wide evaporation area under a short heat influence time to purify the liquid material. The product purified in this way is extracted from the product outlet (14) at the lower end of the evaporator body, while the vapor of volatile components generated in the thinning evaporation section (A) in the area of the thinning unit (11) is in the upper dispersion unit. After passing through the steam passage (15) provided in the above, the steam is discharged from the steam outlet nozzle (6) to the outside and condensed and liquefied by the condenser.

(考案が解決しようとする問題点) 前記の先行技術の薄膜蒸発装置は、他種蒸発装置に較べ
て製品の精製純度をはるかに高度にすることができるも
のであったが、それでも実際運転では理論的には到達可
能な筈の超高純度に均質な製品を安定して得ることが困
難であった。
(Problems to be Solved by the Invention) Although the above-mentioned prior art thin-film evaporator can make the purification purity of the product much higher than that of other kinds of evaporators, it is nevertheless practical. Theoretically, it was difficult to stably obtain a homogeneous product with an ultra-high purity that should be attainable.

その原因を探究の結果、次の事由が判明した。すなわ
ち、この種薄膜蒸発装置では、特に液材料が高粘度で器
内真空度を高くする場合、薄膜化蒸発部では加熱蒸発面
上の薄膜化液材料中で揮発性成分が蒸発して発泡しこの
気泡が薄膜表面を離れて気相に出る際に破泡による液材
料の飛散が生ずる。薄膜化翼による撹拌作用はこれを助
長する。この飛沫は揮発性成分の蒸気に同伴される。
As a result of investigating the cause, the following reason was found. That is, in this type of thin film evaporator, particularly when the liquid material has high viscosity and the degree of vacuum inside the chamber is increased, the volatile component evaporates and foams in the thin film liquid material on the heating evaporation surface in the thin film evaporation section. When the bubbles leave the thin film surface and exit into the gas phase, the liquid material is scattered due to the bubble breakage. The agitation action by the thinning blade promotes this. This droplet is entrained in the vapor of the volatile component.

揮発性成分の蒸気の温度は加熱蒸発面の蒸発温度であ
り、この温度は凝縮温度でもあるので、この蒸気が器外
に出る以前に器内の凝縮温度以下の部分に接触するとこ
れら部分の表面に凝縮しこれに伴い同伴液材料飛沫が付
着し堆積する。薄膜化蒸発部(A)の領域の回転部材に
付着した揮発性成分の凝縮液は遠心力作用により加熱蒸
発面上の薄膜化液材料に戻りリサイクルし、上記の液材
料飛沫化現象を繰り返すし、付着堆積した液材料は付着
時間中、熱影響を受けそれだけ変質したのち精製液材料
中に混入して製品の不均質化の原因となる。その結果、
液材料薄膜の強制掻下しの1パスの短時間中には計画設
定どおりの液材料の高純度、均質精製は行われ難くな
る。
The temperature of the vapor of the volatile component is the vaporization temperature of the heating evaporation surface, and this temperature is also the condensation temperature.Therefore, if this vapor comes into contact with parts below the condensation temperature inside the container before it goes out of the container, the surface of these parts And the entrained liquid material droplets adhere and accumulate. The condensate of volatile components adhering to the rotary member in the area of the thin film evaporation section (A) returns to the thin film liquid material on the heating evaporation surface by the action of centrifugal force and is recycled to repeat the above liquid material splashing phenomenon. The deposited and deposited liquid material is affected by heat during the deposition time and deteriorates to that extent, and then mixes into the purified liquid material, which causes non-uniformity of the product. as a result,
It is difficult to carry out high-purity and homogeneous purification of the liquid material as planned within a short time of one pass of forcedly scraping the liquid material thin film.

また回転部材上の付着堆積物は機械的なアンバランスの
原因となり連続運転の円滑な遂行を不可能とすることが
ある。
Further, the adhered deposits on the rotating member may cause mechanical imbalance, which may make it impossible to perform continuous operation smoothly.

(問題点を解決するための手段) 本考案は、上記探究結果の知見に基づいて、薄膜蒸発装
置の薄膜化蒸発部内で起こる揮発性成分および液材料の
分離、合一のリサイクルを断ち切る改良を付加すること
により、一層機能の高度化された薄膜蒸発装置を実現す
ることを目的とする。
(Means for Solving Problems) Based on the findings of the above-mentioned search results, the present invention proposes an improvement to cut off the separation and united recycling of volatile components and liquid materials occurring in the thin film evaporation section of the thin film evaporator. The purpose of the addition is to realize a thin film evaporation device with more advanced functions.

その手段としては、薄膜化蒸発部内の回転部材である薄
膜化翼の支持部および回転軸を中空として中空内に熱媒
を循環して加熱を与えてそれらの表面温度を揮発性成分
蒸気の凝縮温度以上となるようにし、蒸発分離成分の回
転部材への凝縮、液成分飛沫の付着堆積が起こらないよ
うにする。熱媒循環径路の途中にある分散ユニットの部
分も加熱を受けることになる。
As a means for this, the supporting part of the thinning blade, which is a rotating member in the thinning evaporation part, and the rotating shaft are made hollow, and a heating medium is circulated in the hollow to heat the surface, and the surface temperature of these is condensed to condense volatile component vapors. The temperature is set to be equal to or higher than the temperature so that the evaporation and separation component does not condense on the rotating member and the liquid component droplet does not adhere and accumulate. The part of the dispersion unit in the middle of the heat medium circulation path will also be heated.

この加熱のための熱媒の循環は、回転軸上部のロータリ
ージョイントから回転軸内の2重管給排管路を経由して
行うようにすればよく、ジャケット熱媒を共用して容易
に実施可能であり温度の関係制御の不都合を来さない。
Circulation of the heat medium for this heating may be performed from the rotary joint above the rotary shaft via the double pipe supply / discharge pipe line in the rotary shaft, and it can be easily performed by sharing the jacket heat medium. It is possible and does not cause inconvenience of temperature-related control.

すなわち本考案の薄膜蒸発装置は、中心縦軸線を中心と
して形成される円筒形の減圧可能な密閉式蒸発器本体の
器内面の外周にジャケットを形成し、前記ジャケットに
配設された熱媒ノズルから熱媒を循環させ前記器内面を
加熱して加熱蒸発面として形成し、 前記加熱蒸発面の内側部分に、前記中心縦軸線位置の回
転軸の上位に回転する分散ユニットが配設され、前記分
散ユニットの外周には下向傾斜の螺旋状のフィンが列設
されており、 前記回転軸の下位には、回転する強制薄膜化ユニットが
配設され、前記強制薄膜化ユニットが、前記分散ユニッ
トの下端の外周部から下方に延び回転軸の下端に到る複
数本の支持部が設けられ、かつその外側に下向傾斜の螺
旋状の薄膜化翼が列設して形成され、それにより、 前記分散ユニットに器外から供給される液材料が、前記
回転する分散ユニットによって、前記器内面の全周に一
次的に分散された後、前記回転軸の下位に配設された回
転する強制薄膜化ユニットによって、前記液材料を加熱
蒸発面上に二次的に薄膜状に展開させるように構成した
薄膜蒸発装置において、 前記分散ユニット、前記薄膜化ユニットの薄膜化翼を支
持する支持部及び回転軸を中空として連通し、分散ユニ
ット、支持部、及び回転軸内に熱媒循環流路を形成した
ことを特徴とする。
That is, the thin film evaporator of the present invention has a jacket formed on the outer circumference of the inner surface of a cylindrical decompressible closed evaporator main body formed around the central longitudinal axis, and the heating medium nozzle disposed in the jacket. A heating medium is circulated to heat the inner surface of the vessel to form a heating and evaporating surface, and a dispersion unit that rotates above the rotation axis at the central longitudinal axis position is disposed inside the heating and evaporating surface. Downwardly inclined spiral fins are arranged on the outer periphery of the dispersion unit, and a rotating forced thinning unit is disposed below the rotation shaft, and the forced thinning unit is the dispersion unit. A plurality of supporting portions extending downward from the outer peripheral portion of the lower end of the rotating shaft to the lower end of the rotary shaft are provided, and spirally thinned blades with a downward inclination are formed in a row on the outer side thereof, whereby, Outside the dispersion unit The liquid material to be supplied is primarily dispersed over the entire circumference of the inner surface of the vessel by the rotating dispersion unit, and then the liquid material is provided by the rotating forced thinning unit disposed below the rotation shaft. In a thin film evaporation device configured to be secondarily expanded in a thin film on the heating and evaporation surface, the dispersion unit, the supporting portion supporting the thinning blade of the thinning unit and the rotating shaft are communicated as a hollow, It is characterized in that a heat medium circulation passage is formed in the dispersion unit, the support portion, and the rotation shaft.

また、本考案は、上述した薄膜蒸発装置において、前記
上位の分散ユニットに蒸気通路を設けたことを特徴とす
る。
Further, the present invention is characterized in that, in the above-mentioned thin film evaporation apparatus, a vapor passage is provided in the upper dispersion unit.

さらに、本考案は、上述した薄膜蒸発装置において、前
記回転軸が、二重管状で外側流路及び中心流路を形成し
たことを特徴とする。
Furthermore, the present invention is characterized in that, in the above-mentioned thin film evaporation apparatus, the rotating shaft is a double tube and forms an outer flow path and a central flow path.

(作用) 本考案においては、薄膜蒸発装置の薄膜化蒸発部の域内
において加熱蒸発面に薄膜化された液材料から蒸発した
揮発性成分の蒸気が回転部材上に凝縮されてリサイクル
することがなくなり、これに伴う液材料の飛散、付着、
堆積、変質、混入の機会が軽減される作用が生じ、それ
により製品の精製度の一層の向上、製品の一層の均質化
が達成される。
(Operation) In the present invention, the vapor of the volatile component evaporated from the liquid material thinned on the heating and evaporating surface in the area of the thin film evaporating portion of the thin film evaporator does not condense on the rotating member and is recycled. , Due to this, scattering of liquid material, adhesion,
This has the effect of reducing the chances of accumulation, alteration, and contamination, which leads to a further improvement in the degree of purification of the product and a further homogenization of the product.

(実施例) 以下、本考案を第1〜3図を参照し、実施例に即して具
体的に説明する。
(Embodiment) Hereinafter, the present invention will be specifically described with reference to FIGS.

第1図は、本考案の1実施例の薄膜蒸発装置の全体を示
す縦断側面図、第2図はその回転部材の平面図、第3図
は第2図III-III線断面矢印縦断側面図である。
FIG. 1 is a vertical sectional side view showing the whole thin film evaporation apparatus of one embodiment of the present invention, FIG. 2 is a plan view of its rotating member, and FIG. 3 is a vertical sectional side view taken along the line III-III in FIG. Is.

この薄膜蒸発装置の基本的構成は、先行技術のそれとほ
ぼ同様であって、中心縦軸線(X)のまわりに円筒形の
密閉式蒸発器本体(1)の器内面(2)を外周に付設し
たジャケット(3)に熱媒ノズル(4)(5)を経て熱
媒を通ずることにより加熱蒸発面に形成し、上部の揮発
性成分蒸気の蒸気出口ノズル(6)を器外の凝縮器を経
て真空化源(図示せず)に接続することにより器内の減
圧化、真空化を可能とし、中心縦軸線(X)位置に上下
の軸受(7)(8)により支承した回転軸(9A)の上位
に分散ユニット(10A)、下位に薄膜化ユニット(11A)
を取付けて液材料入口ノズル(12)から器内に供給され
る液材料を分散ユニット(10A)により器内面の全周に
分散し、続いて薄膜化ユニット(11A)の薄膜化翼(1
3)により加熱蒸発面上に薄膜状に展開させて液材料中
に含まれる揮発性成分を蒸発させるようになっている。
The basic structure of this thin film evaporator is almost the same as that of the prior art, and the inner surface (2) of the cylindrical closed evaporator main body (1) is attached to the outer periphery around the central longitudinal axis (X). The heating medium is passed through the heating medium nozzles (4) and (5) through the jacket (3) to form a heating evaporation surface, and the vapor outlet nozzle (6) for the volatile component vapor in the upper portion is connected to the outside condenser. After that, by connecting to a vacuum source (not shown), it is possible to reduce the pressure and evacuate the inside of the vessel, and the rotary shaft (9A) supported by the upper and lower bearings (7) and (8) at the central vertical axis (X) position. ) Upper part of the dispersion unit (10A), lower part of the thinning unit (11A)
The liquid material supplied from the liquid material inlet nozzle (12) into the vessel is dispersed by the dispersing unit (10A) over the entire circumference of the inner surface of the vessel, and then the thinning blade (1A) of the thinning unit (11A) is
By 3), a volatile component contained in the liquid material is vaporized by spreading it in a thin film on the heating evaporation surface.

この実施例では、分散ユニット(10A)は、第2および
3図に示すように、基体円筒部(16)の外周に器内送給
液材料の全周分散および下降のための下向傾斜部分螺旋
からなるフイン(17)を列設し、その上下に外縁が器内
面(2)と小間隔を隔てる上板部(18)および下板部
(19)を一体に結合して内縁で回転軸(9A)に結合し中
空密閉盤状に形成し、内部に上下に貫通して開口するこ
の例では4つの蒸気通路(15A)を設けて形成される。
分散ユニット(10A)内の中空空間は本考案では後記の
ように熱媒通路に利用する。
In this embodiment, as shown in FIGS. 2 and 3, the dispersion unit (10A) is provided with a downward sloping portion on the outer circumference of the base cylindrical portion (16) for the entire circumference dispersion and descending of the liquid feeding material in the container. The fins (17) composed of spirals are arranged in a row, and the upper and lower plate parts (18) and (19) whose outer edges are spaced apart from the inner surface (2) of the vessel by the upper and lower edges are integrally connected to each other to form a rotary shaft at the inner edges. In this example, four steam passages (15A) are provided, which are connected to (9A) and are formed into a hollow closed plate shape, and vertically penetrate through and open inside.
In the present invention, the hollow space inside the dispersion unit (10A) is used for the heat medium passage as described later.

薄膜化ユニット(11A)は、この例では分散ユニットの
下板部(19)の外周部から下方に延び回転軸の下端のマ
ニホールド(20)に到る4本の対称配置のL字形アーム
状の支持部(21)を設けその外側に薄膜化翼(13)を列
設して形成される。支持部(21)は本考案では中空で分
散ユニット(10A)の内部空間に通じている。
In this example, the thinning unit (11A) has four symmetrically arranged L-shaped arms extending downward from the outer peripheral portion of the lower plate portion (19) of the dispersion unit and reaching the manifold (20) at the lower end of the rotating shaft. The support portion (21) is provided and the thinning blades (13) are arranged in a row outside the support portion (21). In the present invention, the support part (21) is hollow and communicates with the internal space of the dispersion unit (10A).

こうして薄膜化ユニット(11A)の領域の薄膜化蒸発部
(A)内で、加熱蒸発面上に薄膜状に展開されられた液
材料から蒸発する揮発性成分の蒸気は蒸気通路(15A)
を上方に通り抜け蒸気出口ノズル(6)から器外に抜出
される。一方精製された製品の薄膜は薄膜化翼(13)に
より掻下げられ下端の製品出口(14)から器外に抜き出
される。
Thus, in the thinning evaporation section (A) in the area of the thinning unit (11A), the vapor of the volatile component evaporated from the liquid material spread in a thin film on the heating evaporation surface is the vapor passage (15A).
Through the steam outlet nozzle (6) to the outside of the device. On the other hand, the thin film of the refined product is scratched down by the thinning blade (13) and taken out from the product through the product outlet (14) at the lower end.

本考案の実施のため、スチームを熱媒とする場合、回転
軸(9A)は二重管状で外側流路(9a)、中心流路(9b)
を形成し、これら流路に接続するロータリージョイント
(22)を器外上部に設ける。器内径路は、外部の熱媒径
路(23)から導入されるスチームがロータリージョイン
ト(22)を経て二重管の外側流路(9a)に入り、一部は
そのまま下端に流下して内部からの加熱により薄膜化蒸
発部(A)内の回転軸(9A)外面の温度を揮発性成分蒸
気の凝縮温度以上に維持し、他の1部は途中から分岐し
て通孔(24)から分散ユニット(10A)の入口マニホー
ルドの役割をする中空空間内に入り、そこから分岐して
4本の薄膜化翼支持部(21)の中空通路内を流下して内
部からの加熱によりこれらの外表面を同じく凝縮温度以
上に維持する。加熱により生じた廃スチームおよびドレ
ーンは通孔(25)(26)を経て二重管の中心流路(9b)
を上昇しロータージョイント(22)を経て熱媒径路(2
7)から外部に導出するよう接続される。
In order to implement the present invention, when steam is used as a heat medium, the rotating shaft (9A) is a double tube and has an outer flow path (9a) and a central flow path (9b).
And a rotary joint (22) connected to these flow paths is provided on the outside of the device. In the inner diameter passage, steam introduced from the outer heat medium passage (23) enters the outer passage (9a) of the double pipe through the rotary joint (22), and part of it flows down to the lower end as it is from the inside. The temperature of the outer surface of the rotating shaft (9A) in the thin film evaporation section (A) is maintained above the condensation temperature of the volatile component vapor by heating the other part, and the other part is branched from the middle and dispersed from the through hole (24). The outer surface of the unit (10A) enters the hollow space that functions as an inlet manifold, branches from the hollow space, flows down through the hollow passages of the four thin film blade support portions (21), and is heated from the inside to the outer surfaces thereof. Is also maintained above the condensation temperature. Waste steam and drain generated by heating pass through the holes (25) (26) and the central flow path (9b) of the double pipe.
Rise through the rotor joint (22) and the heat transfer path (2
It is connected so as to lead out from 7).

この熱媒の循環により薄膜化蒸発部(A)内の翼支持部
(21)、回転軸(9A)等の回転部材の外面温度が揮発性
成分蒸気の凝縮温度以上に維持されるので蒸気の凝縮が
起こらず同伴液成分飛沫の付着堆積が防止され、これら
の薄膜化蒸発部(A)内でのリサイクルは防止され、製
品の精製度が高度となり不均質化を招かない。入口マニ
ホールドの役割をする分散ユニット(10A)も加熱を受
けその下面、蒸気通路(15A)も凝縮温度以上となるの
で、蒸気通路の堆積物による閉塞傾向も防止され、真空
化効果の低下、回転アンバランスの問題も解消される。
By the circulation of the heat medium, the outer surface temperature of the rotating member such as the blade support portion (21) and the rotating shaft (9A) in the thin film evaporation portion (A) is maintained above the condensation temperature of the volatile component vapor. Condensation does not occur, the deposition of entrained liquid component droplets is prevented, the recycling of these in the thin-film evaporation section (A) is prevented, and the degree of purification of the product is high so that inhomogeneity is not caused. The dispersion unit (10A), which plays the role of the inlet manifold, is also heated and its lower surface and the steam passage (15A) reach the condensation temperature or higher. Therefore, the tendency of the steam passage to be blocked by deposits is prevented, and the vacuuming effect is reduced The problem of imbalance is also solved.

本考案は上記実施例に限らず、種々の変更を加えて実施
し得るものであって、例えば熱媒として温水を利用する
場合、流路方向をスチームの場合と逆にすればよい。
The present invention is not limited to the above embodiment, but can be implemented with various modifications. For example, when hot water is used as the heat medium, the flow passage direction may be opposite to that of the steam direction.

(考案の効果) 以上のように、本考案によると、薄膜化蒸発部内の回転
部材の表面温度を揮発性成分の凝縮温度以上に保持する
ことによりその凝縮および同伴液成分飛沫堆積を防止
し、それらのリサイクルを遮断し、製品の精製度を高め
均質に維持する効果がある。
(Effect of the Invention) As described above, according to the present invention, by keeping the surface temperature of the rotating member in the thin-film evaporation section at the condensation temperature of the volatile component or more, the condensation and the entrained liquid component splash accumulation are prevented, It has the effect of blocking their recycling, increasing the degree of purification of the product and maintaining it homogeneous.

【図面の簡単な説明】[Brief description of drawings]

第1図は本考案の1実施例の薄膜蒸発装置の全体的構成
を示す縦断側面図、第2図はその回転部材の平面図、第
3図はその第2図III-III線断面矢視の縦断側面図、第
4図は本考案と対比される先行技術の薄膜蒸発装置の縦
断側面図である。 (1)……蒸発器本体、(2)……器内面、加熱蒸発
面、(3)……ジャケット、(4)(5)……熱媒ノズ
ル、(6)……蒸気出口ノズル、(7)(8)……軸
受、(9)(9A)……回転軸、(9a)……外側流路、
(9b)……中心流路、(10)(10A)……分散ユニッ
ト、(11)(11A)……薄膜化ユニット、(12)……液
材料入口ノズル、(13)……薄膜化翼、(14)……製品
出口、(15)(15A)……蒸気通路、(16)……基体円
筒部、(17)……フイン、(18)……上板部、(19)…
…下板部、(20)……マニホールド、(21)……支持
部、(23)(27)……熱媒径路、(24)(25)(26)…
…通孔、(X)……中心縦軸線、(A)……薄膜化蒸発
部。
FIG. 1 is a vertical sectional side view showing the overall construction of a thin film evaporation apparatus according to one embodiment of the present invention, FIG. 2 is a plan view of its rotating member, and FIG. 3 is its sectional view taken along line III-III in FIG. FIG. 4 is a vertical side view of a prior art thin film evaporation apparatus which is to be compared with the present invention. (1) …… Evaporator body, (2) …… Inner surface, heating / evaporating surface, (3) …… Jacket, (4) (5) …… Heating medium nozzle, (6) …… Steam outlet nozzle, ( 7) (8) …… Bearing, (9) (9A) …… Rotary shaft, (9a) …… Outside flow path,
(9b) ... central flow channel, (10) (10A) ... dispersion unit, (11) (11A) ... thinning unit, (12) ... liquid material inlet nozzle, (13) ... thinning blade , (14) …… Product outlet, (15) (15A) …… Steam path, (16) …… Base cylinder part, (17) …… Fin, (18) …… Upper plate part, (19)…
… Lower plate, (20) …… Manifold, (21) …… Support, (23) (27) …… Heat carrier path, (24) (25) (26)…
... through hole, (X) ... central vertical axis, (A) ... thin film evaporation portion.

Claims (3)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】中心縦軸線を中心として形成される円筒形
の減圧可能な密閉式蒸発器本体の器内面の外周にジャケ
ットを形成し、前記ジャケットに配設された熱媒ノズル
から熱媒を循環させ前記器内面を加熱して加熱蒸発面と
して形成し、 前記加熱蒸発面の内側部分に、前記中心縦軸線位置の回
転軸の上位に回転する分散ユニットが配設され、前記分
散ユニットの外周には下向傾斜の螺旋状のフィンが列設
されており、 前記回転軸の下位には、回転する強制薄膜化ユニットが
配設され、前記強制薄膜化ユニットが、前記分散ユニッ
トの下端の外周部から下方に延び回転軸の下端に到る複
数本の支持部が設けられ、かつその外側に下向傾斜の螺
旋状の薄膜化翼が列設して形成され、それにより、 前記分散ユニットに器外から供給される液材料が、前記
回転する分散ユニットによって、前記器内面の全周に一
次的に分散された後、前記回転軸の下位に配設された回
転する強制薄膜化ユニットによって、前記液材料を加熱
蒸発面上に二次的に薄膜状に展開させるように構成した
薄膜蒸発装置において、 前記分散ユニット、前記薄膜化ユニットの薄膜化翼を支
持する支持部及び回転軸を中空として連通し、分散ユニ
ット、支持部、及び回転軸内に熱媒循環流路を形成した
ことを特徴とする薄膜蒸発装置。
1. A jacket is formed on the outer periphery of the inner surface of a cylindrical type decompressible closed evaporator main body formed around a central longitudinal axis, and a heat medium is discharged from a heat medium nozzle arranged in the jacket. A circulation unit is circulated to heat the inside surface of the vessel to form a heating evaporation surface, and a dispersion unit that rotates above the rotation axis at the central vertical axis position is disposed inside the heating evaporation surface. A spiral fin having a downward inclination is arranged in a row, a rotating forced thinning unit is disposed below the rotation shaft, and the forced thinning unit is arranged at the outer periphery of the lower end of the dispersion unit. A plurality of supporting portions extending downward from the lower portion to the lower end of the rotating shaft are provided, and spirally thinned blades with a downward inclination are formed in a row outside the supporting portions, whereby the dispersion unit is provided. Liquid material supplied from outside the device After being dispersed by the rotating dispersion unit over the entire circumference of the inner surface of the vessel, the liquid material is spread on the heating evaporation surface by the rotating forced thinning unit disposed below the rotation shaft. In a thin film evaporation device configured to be subsequently developed into a thin film, the dispersion unit, a supporting unit that supports the thinning blade of the thinning unit and a rotating shaft communicate with each other as a hollow, and the dispersing unit, the supporting unit, and A thin-film evaporation device, characterized in that a heat medium circulation passage is formed in the rotating shaft.
【請求項2】前記上位の分散ユニットに蒸気通路を設け
たことを特徴とする請求項1に記載の薄膜蒸発装置。
2. The thin film evaporation apparatus according to claim 1, wherein a vapor passage is provided in the upper dispersion unit.
【請求項3】前記回転軸が、二重管状で外側流路及び中
心流路を形成することを特徴とする請求項1又は2に記
載の薄膜蒸発装置。
3. The thin film evaporation apparatus according to claim 1, wherein the rotary shaft is a double tube and forms an outer flow path and a central flow path.
JP1988121991U 1988-09-16 1988-09-16 Thin film evaporator Expired - Lifetime JPH0641605Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988121991U JPH0641605Y2 (en) 1988-09-16 1988-09-16 Thin film evaporator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988121991U JPH0641605Y2 (en) 1988-09-16 1988-09-16 Thin film evaporator

Publications (2)

Publication Number Publication Date
JPH0257935U JPH0257935U (en) 1990-04-26
JPH0641605Y2 true JPH0641605Y2 (en) 1994-11-02

Family

ID=31369509

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988121991U Expired - Lifetime JPH0641605Y2 (en) 1988-09-16 1988-09-16 Thin film evaporator

Country Status (1)

Country Link
JP (1) JPH0641605Y2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113694548B (en) * 2021-08-26 2022-08-30 上海精日新材料科技有限公司 Energy-saving film evaporation device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4928832A (en) * 1972-07-14 1974-03-14
JPS566520A (en) * 1979-06-28 1981-01-23 Nec Corp Oscillating device

Also Published As

Publication number Publication date
JPH0257935U (en) 1990-04-26

Similar Documents

Publication Publication Date Title
JP4167984B2 (en) An apparatus for flowing and evaporating liquid material and then condensing the vapor formed
KR102512581B1 (en) Evaporator
JPH0413001B2 (en)
JP2004508922A (en) Method and apparatus for purifying pure steam
JPH0360701A (en) Screw blade-type discharger for thin-film vaporizer
JPH0223202B2 (en)
US3472304A (en) Falling film evaporator
JPH0641605Y2 (en) Thin film evaporator
KR101975720B1 (en) Thin film descent evaporation concentrator
JP3226593B2 (en) Thin film evaporator
US5419814A (en) Thin layer liquid film type evaporator
US4173246A (en) Feed distributor for glassed steel wiped film evaporator
CN115382231A (en) Liquid film rotation generator and falling film evaporator
US3344836A (en) Revolving disc spray type evaporator
US3962028A (en) Swept surface evaporator
US5264079A (en) Film-type evaporator
JP7300716B2 (en) Rotating sprayer and evaporator equipped with same
US3282326A (en) Evaporating method and apparatus therefor of the rotating drum type
RU2108840C1 (en) Rotary sectional evaporator
JPH03238001A (en) Membrane rectifying tower
JPWO2018230550A1 (en) Evaporator
US3474850A (en) Liquid film evaporator
JP7138917B2 (en) multistage evaporator
SU1271534A1 (en) Distillation column
US575854A (en) scott