JPH0636287A - Optical disk master and master exposure apparatus - Google Patents

Abstract

PURPOSE:To provide an optical disk master and a master exposure apparatus in which an increase in a crosstalk is prevented and stably recording/reproducing can be always stably conducted. CONSTITUTION:An optical disk master comprises phase pits 25 to be used as EFM-modulated information by condensing and exposing a laser beam irradiated from a laser light source through an objective lens, and grooves 26 to be used as guide grooves for tracking at the time of additionally writing. Sectional shapes of the pit 25 and the groove 26 in a radial direction of the disk are trapezoidal shapes in which its bottom of the groove is flat. Flat surfaces of the trapezoidal grooves of the pit and the groove are equal in depth direction of the groove, and the depth of the pit 25 is larger than that of the groove 26.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical disk master and a master exposure apparatus.

[0002]

2. Description of the Related Art The structure of a conventional hybrid CD-R disc will be described with reference to FIGS. Figure 1
0 is a hybrid C having a ROM section 1 and a write-once section 2
1 shows the structure of a D-R disc. 11 is shown in FIG.
The pit 4 is formed in advance on the substrate 3 (PC, polycarbonate) in the ROM section 1, and the pit 4 is recorded as EFM-modulated information. In the write-once portion 2, the groove 5 is formed on the substrate 3 in advance. At the time of this additional recording, recording is performed by using the groove 5 as a guide groove for tracking. An organic film such as a cyanine dye is applied as the recording layer 6 to the substrate 3, and an Au film is sputtered as the reflective layer 7. In this case, CD-R
A characteristic of the disc is that the disc after recording can be reproduced by a CD player, and therefore, the reproduction signal characteristics after additional recording in the ROM section 1 and the additional recording section 2 need to be the same. This C
The standard of the D-R disc is Orange Brook (Sony Phi
standardized by lips).

12 and 13 show examples of characteristics of reproduced signals with respect to pit and groove depths. In this case, referring to the relationship shown in FIGS. 14A and 14B, the track pitch is 1.6 μm, and the pit 4 has a rectangular groove width wp =
It is assumed that the V-shaped groove width wg of the groove 5 is set to 0.4 μm and wg = 0.4 μm. To satisfy the modulation degree> 0.65, the phase depth Dp of the pit 4 is Dp = (3/16)
It should be between λ and (5/16) λ. To satisfy the push-pull amplitude of 0.04 to 0.09 after recording,
The phase depth Dg of the groove 5 is Dg = (1/24)?
It must be (1/8) λ. Thus, in order for the reproduction signal characteristics to satisfy the standard, the pits 4 and the grooves 5 have different groove depths.

Next, a method of manufacturing a substrate having pits 4 and grooves 5 having different groove depths will be described. The board is
Generally, it is manufactured by an injection molding method, but a mold (stamper) used in the injection molding can be manufactured by a photolithography and electroforming process as shown in FIG. First, the photoresist 9 is spin-coated on the glass substrate 8, baked at 80 to 90 ° for about 30 minutes (the thickness of the photoresist 9 is the same as the pit depth), and then exposed by an optical disc master exposure device (described later). To do. The exposed portion is lifted off by the development process, and a pattern of pits 4 and grooves 5 is formed on the surface of the photoresist 9 (b). A Ni sputtered film 10 is formed on the surface of the photoresist 9 (c). The Ni sputtered film 10 is electroformed to obtain a Ni film having a thickness of about 0.3 mm.
Electroformed 11 is produced (d). The back surface of the Ni electroformed 11 is polished and the inner and outer diameters are processed to complete the Ni stamper 12. A mold can be manufactured by such a series of steps.

Next, the structure of the optical disk master exposure device will be described with reference to FIG. The light emitted from the Ar laser light source 13 is incident on the light quantity modulator 17 via the pulse modulator 14, the λ / 2 plate 15, and the mirror 16, and the light quantity is converted. The pulsed light whose light quantity has been converted is
It is converted into a predetermined polarization angle by the polarizer 18. Only the light polarized in a certain direction is selected by passing through the polarization beam splitter 19 as the polarized light, and the selected light is condensed by the objective lens 21 via the λ / 4 plate 20 and the optical disk The photoresist 9 surface of the master 22 is exposed. The objective lens 21 can be moved and adjusted in the optical axis direction by the focus actuator 21a.

In the case of the hybrid CD-R, it is necessary to form pits 4 and grooves 5 having different phase depths. When patterning the pits 4 and the grooves 5 on the photoresist surface, the laser power of the pits 4 and the grooves 5 to be exposed is changed by the light quantity modulator 17 of FIG. Therefore, the pit 4 becomes a trapezoidal groove close to a rectangle as shown in FIG. 14A, and the groove 5 becomes a V-shaped groove.
Further, in order to obtain a large degree of modulation in the pits 4, it is necessary to make the thickness of the recording layer uniform (eliminate the liquid pool of the pits 4 and the grooves 5 due to the surface tension and make the recording layer thickness uniform). The groove 5 is pre-formatted by wobbling the ATIR information.

[0007]

Next, the recording mechanism of the CD-R disc will be described with reference to FIGS. In the case of this CD-R disc, the position where the exposed laser beam 23 focuses on the optical disc master 22 is the portion of the reflection layer 7 (Au) and the recording layer 6 having the highest reflectance, and is focused. About 70% of the laser light 23 is reflected, but the rest of the light acts on the recording as heat energy. This thermal energy is absorbed by the recording layer 6 and the substrate portion (polycarbonate), and the recording layer 6 is deteriorated by heat and the substrate portion is deformed. FIG. 17 shows that when the groove 5 is a V-shaped groove,
FIG. 18 shows the case where the bottom surface of the groove of the groove 5 is a flat trapezoid. In this case, due to the effect of surface tension, the trapezoid does not transfer heat to a wider area due to the edge effect than the V-shape, and the trapezoid is less likely to spread the substrate deformation due to heat.
As shown in (b), the V shape of the groove 5 has a larger ratio of the area of thermal change of the recording material and the area of deformation of the substrate than the trapezoid. As described above, the V-shaped area and the rectangular area differ in the area of thermal change (alteration of the recording layer 6 and deformation of the substrate) due to recording. Due to the two effects of the change in the refractive index due to the alteration of No. 6 and the change in the optical phase due to the deformation of the substrate, a difference occurs in the reflected light at the time of reproduction, and the recording pit can be reproduced.

As described above, in the hybrid CD-R, the pits 4 (hereinafter referred to as the phase pits 4) previously formed on the substrate and the grooves 5 have different phase depths,
For this reason, the groove 5 has a V shape in the related art. When the groove 5 is V-shaped, the area of the recording pit is larger than that of the trapezoidal shape, as shown in FIGS. As described above, the noise (crosstalk) from the adjacent track becomes large during reproduction, and the C / N becomes low, which may result in defective reproduction. Further, in the CD player, since the EFM pattern is detected from the reproduction signal in the off-track at the time of seek and the spindle servo is performed, if the above-mentioned crosstalk is large, a servo error occurs, which causes a seek error. Will occur.

[0009]

According to a first aspect of the invention, a phase pit used as EFM-modulated information is obtained by focusing and exposing a laser beam emitted from a laser light source by an objective lens, and In an optical disc master in which a groove used as a guide groove for tracking at the time of additional recording is formed, a cross-sectional shape of the phase pit and the groove in the disc radial direction is a trapezoidal groove whose bottom surface portion is a flat surface. In these trapezoidal grooves, the positions of the flat surfaces of the groove bottom surface are equal to the groove depth direction, and the depth of the phase pit is formed larger than the depth of the groove.

According to the second aspect of the present invention, the laser beam emitted from the laser light source is condensed by the objective lens and exposed on the optical disc master, whereby the phase pits used as the EFM-modulated information and the additional writing are performed. In a master exposure apparatus for forming a groove used as a guide groove for tracking on the optical disk master, a first for performing an on / off operation and an EFM modulation arranged on an optical path of a laser beam emitted from a laser light source. A pulse modulator, one phase pit beam for exposing the phase pits and grooves arranged on the optical path of the laser beam modulated by the first pulse modulator, and two beams added during the groove exposure. And a first half mirror for separately generating the groove beam and the first half mirror. One of the first light quantity modulators arranged on the optical path of the phase pit beam and adjusting the light quantity, and the other one of the two groove beams separated by the first half mirror are arranged on the optical path. And a second light quantity modulator for adjusting the quantity of light, and the two groove beams that have passed through the second light quantity modulator are separated into individual beams. Second
A half mirror; a mirror for arranging the respective groove beams separated by the second half mirror at positions ⅓ track pitch apart in the radial direction at both ends of the phase beam; A polarization beam splitter for converging the phase pit beam that has passed through the light quantity modulator and the groove beam separated by the second half mirror one by one in the same direction; AT to 3 beams
An exposure optical system provided with a deflector for pre-formatting IP information was provided.

According to the third aspect of the present invention, the laser beam emitted from the laser light source is condensed by the objective lens and exposed on the optical disc master, and the phase pits used as the EFM-modulated information and the additional recording. In a master exposure apparatus for forming a groove used as a guide groove for tracking on the optical disk master, a synchronization circuit for synchronizing EFM information recorded by phase pits and ATIP information recorded by the groove, A CPU that monitors ATIP information to synchronize the switching between the phase pit and the groove, a P / G switching circuit that generates an enable signal for switching, a CLV drive circuit that rotates the turntable by CLV, and a lateral feed. A lateral feed drive circuit for executing the above, an EFM encoder,
An ATIP encoder, a pulse generator that operates the EFM encoder and the ATIP encoder with the same clock, a lens set circuit that sets a lens on a photo glass substrate for patterning an objective lens, and a focus error signal is monitored and focused. An exposure control system provided with a focus servo circuit for performing servo was provided.

According to the invention of claim 4, claim 2 or 3
In the invention described above, one phase beam is used when forming the phase pits, and when forming the groove, the one phase beam and 1 / in the radial direction of both ends of this phase beam are used. 2 placed 3 track pitch apart
The groove beam of the book is used.

According to a fifth aspect of the invention, in the invention of the fourth aspect, the exposure amount of the phase pit beam is equal when forming the phase pit and the groove, and the two groove beams added during the groove exposure. The exposure amounts of the above are equal to each other and smaller than the exposure amount of the phase pit beam.

According to the sixth aspect of the present invention, the laser beam emitted from the laser light source is condensed by the objective lens and is exposed on the optical disc master, whereby the phase pits used as the EFM-modulated information and the additional pits are additionally recorded. In a master exposure apparatus for forming a groove used as a guide groove for tracking on the optical disk master, a first for performing an on / off operation and an EFM modulation arranged on an optical path of a laser beam emitted from a laser light source. A pulse modulator, one phase pit beam for exposing the phase pits and grooves arranged on the optical path of the laser beam modulated by the first pulse modulator, and two beams added during the groove exposure. And a first half mirror for separately generating the groove beam and the first half mirror. One of the first light quantity modulators arranged on the optical path of the phase pit beam and adjusting the light quantity, and the other one of the two groove beams separated by the first half mirror are arranged on the optical path. And a second light quantity modulator for adjusting the quantity of light, and the two groove beams that have passed through the second light quantity modulator are separated into individual beams. Second
A half mirror; a mirror for arranging the respective groove beams separated by the second half mirror at positions ⅓ track pitch apart in the radial direction at both ends of the phase beam; A polarization beam splitter for converging the phase pit beam that has passed through the light quantity modulator and the groove beam separated by the second half mirror one by one in the same direction; AT to 3 beams
An exposure optical system having a deflector for pre-formatting IP information is provided, and EF recorded by phase pits
A synchronization circuit for synchronizing the M information with the ATIP information recorded by the groove, and a CP for monitoring the ATIP information for synchronizing the switching between the phase pit and the groove.
U and P / which generates an enable signal for switching
G switching circuit and C for rotating the turntable by CLV
An LV drive circuit, a transverse feed drive circuit for performing transverse feed, an EFM encoder, an ATIP encoder, a pulse generator for operating the EFM encoder and the ATIP encoder with the same clock, and an objective lens for patterning. An exposure control system including a lens setting circuit for setting a lens on a photo glass substrate and a focus servo circuit for monitoring a focus error signal and performing a focus servo is provided.

According to the seventh aspect of the present invention, the laser beam emitted from the laser light source is condensed by the objective lens and is exposed on the optical disc master, whereby the phase pits used as the EFM-modulated information and the additional recording. In a master exposure apparatus for forming a groove used as a guide groove for tracking on the optical disk master, a first for performing an on / off operation and an EFM modulation arranged on an optical path of a laser beam emitted from a laser light source. A pulse modulator, one phase pit beam for exposing the phase pits and grooves arranged on the optical path of the laser beam modulated by the first pulse modulator, and one beam added for the groove exposure. The half mirror that separates and generates the beam for the groove and the one that is separated by this half mirror A first light quantity modulator arranged on the optical path of the phase pit beam to adjust the quantity of light, and an on / off operation arranged on the optical path of the other one groove beam separated by the half mirror. A second pulse modulator for controlling and a second light intensity modulator for adjusting the light intensity,
A defocus lens for defocusing the one groove beam that has passed through the second light amount modulator with respect to the optical disc master surface, and the phase pit beam and the defocus lens that have passed through the first light amount modulator. A polarization beam splitter for converging the groove beam defocused by the focus lens in the same direction, and ATIP for one beam condensed by the polarization beam splitter
An exposure optics with a deflector for preformatting information was provided.

According to an eighth aspect of the invention, in the invention of the seventh aspect, one phase beam is used when forming the phase pits, and one phase beam is used when forming the grooves. And 1 on the same track as this phase beam
A beam of a book was added for exposure.

According to a ninth aspect of the invention, in the invention of the eighth aspect, the phase pit beam is in a focused state on the optical disc master, and the groove beam added during groove exposure is in a defocused state on the optical disc master. .

According to a tenth aspect of the invention, in the invention of the eighth aspect, the beam diameter of the beam for the phase pit when entering the objective lens of the groove beam is made smaller than the beam diameter of the beam for the phase pit.

According to the eleventh aspect of the present invention, the laser beam emitted from the laser light source is condensed by the objective lens and is exposed on the optical disc master, whereby the phase pits used as the EFM-modulated information and the additional recording. In a master exposure apparatus for forming a groove used as a guide groove for tracking on the optical disk master, a first for performing an on / off operation and an EFM modulation arranged on an optical path of a laser beam emitted from a laser light source. A pulse modulator, one phase pit beam for exposing the phase pits and grooves arranged on the optical path of the laser beam modulated by the first pulse modulator, and one beam added for the groove exposure. The half mirror that separates and generates the beam for the groove of A first light quantity modulator arranged on the light path of the phase pit beam to adjust the quantity of light, and an on / off operation arranged on the light path of the other groove beam separated by the half mirror. And a second light amount modulator for adjusting the light amount, and a defocusing device for defocusing the one groove beam having passed through the second light amount modulator with respect to the optical disc master surface. A focus lens, a polarization beam splitter that converges the phase pit beam that has passed through the first light amount modulator and the groove beam that has been defocused by the defocus lens in the same direction, and this polarization beam splitter AT for one focused beam
An exposure optical system having a deflector for pre-formatting IP information is provided, and EF recorded by phase pits
A synchronization circuit for synchronizing the M information with the ATIP information recorded by the groove, and a CP for monitoring the ATIP information for synchronizing the switching between the phase pit and the groove.
U and P / which generates an enable signal for switching
G switching circuit and C for rotating the turntable by CLV
An LV drive circuit, a transverse feed drive circuit for performing transverse feed, an EFM encoder, an ATIP encoder, a pulse generator for operating the EFM encoder and the ATIP encoder with the same clock, and an objective lens for patterning. An exposure control system including a lens setting circuit for setting a lens on a photo glass substrate and a focus servo circuit for monitoring a focus error signal and performing a focus servo is provided.

According to the twelfth aspect of the present invention, the laser beam emitted from the laser light source is condensed by the objective lens and exposed on the optical disc master, whereby the phase pits used as the EFM-modulated information and the additional information are recorded. In a master exposure apparatus for forming a groove used as a guide groove for tracking on the optical disk master, a first for performing an on / off operation and an EFM modulation arranged on an optical path of a laser beam emitted from a laser light source. A pulse modulator, one phase pit beam for exposing the phase pits and grooves arranged on the optical path of the laser beam modulated by the first pulse modulator, and one beam added for the groove exposure. The half mirror that separates and generates the beam for the groove of A first light quantity modulator arranged on the light path of the phase pit beam to adjust the quantity of light, and an on / off operation arranged on the light path of the other groove beam separated by the half mirror. A second pulse modulator for adjusting the light intensity, a second light intensity modulator for adjusting the light intensity, and a beam expander for changing the beam diameter of the one groove beam that has passed through the second light intensity modulator, A polarization beam splitter that collects the phase pit beam that has passed through the first light amount modulator and the groove beam that has a beam diameter changed by the beam expander in the same direction, and a polarization beam splitter that collects the same. An exposure optical system provided with a deflector for pre-formatting ATIP information on one beam thus formed was provided.

In the thirteenth aspect of the present invention, the laser beam emitted from the laser light source is condensed by the objective lens and is exposed on the optical disc master, whereby the phase pits used as the EFM-modulated information and at the time of additional recording. In a master exposure apparatus for forming a groove used as a guide groove for tracking on the optical disk master, a first for performing an on / off operation and an EFM modulation arranged on an optical path of a laser beam emitted from a laser light source. A pulse modulator, one phase pit beam for exposing the phase pits and grooves arranged on the optical path of the laser beam modulated by the first pulse modulator, and one beam added for the groove exposure. The half mirror that separates and generates the beam for the groove of A first light quantity modulator arranged on the light path of the phase pit beam to adjust the quantity of light, and an on / off operation arranged on the light path of the other groove beam separated by the half mirror. A second pulse modulator for adjusting the light intensity, a second light intensity modulator for adjusting the light intensity, and a beam expander for changing the beam diameter of the one groove beam that has passed through the second light intensity modulator, A polarization beam splitter that collects the phase pit beam that has passed through the first light amount modulator and the groove beam that has a beam diameter changed by the beam expander in the same direction, and a polarization beam splitter that collects the same. An exposure optical system provided with a deflector for pre-formatting ATIP information on one beam thus formed,
A synchronization circuit for synchronizing the EFM information recorded by the phase pits and the ATIP information recorded by the grooves, a CPU for monitoring the ATIP information for synchronizing the switching between the phase pits and the groove, and P / G switching circuit for generating an enable signal for driving, a CLV driving circuit for rotating the turntable by CLV, a lateral feeding driving circuit for performing lateral feeding, an EFM encoder, an ATIP encoder, the EFM encoder, and the ATIP. A pulse generator that operates the encoder with the same clock, a lens setting circuit that sets the lens on the photo glass substrate for patterning the objective lens, and a focus servo circuit that monitors the focus error signal and performs focus servo are provided. An exposure control system was provided.

[0022]

In the invention described in claim 1, the hybrid CD-
It is possible to prevent the spread of the recording pits in the phase pits and the groove shape of the R disc, and thereby it is possible to increase the signal characteristic margin at the time of reproduction.

According to the second aspect of the present invention, it is possible to realize an optical system that easily masters the phase pit and groove shapes by a single exposure.

According to the third aspect of the invention, it is possible to stably realize control of the optical system and the disc master exposure device.

According to the invention described in claims 4, 5, 6, 7, 8, 9, and 10, it is possible to obtain the same effect as that of the invention described in claim 2.

According to the invention described in claim 11, it is possible to obtain the same effect as that of the invention described in claim 3.

According to the twelfth aspect of the invention, it is possible to obtain the same effect as that of the second aspect of the invention.

In the thirteenth aspect of the invention, it is possible to obtain the same effect as that of the third aspect of the invention.

[0029]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described with reference to FIGS. First, the appearance of the surface shape of an optical disk master manufactured by the master exposure apparatus according to the present invention will be described with reference to FIG. FIG. 1A shows a state of the optical disc master 24 manufactured in this embodiment.
A phase pit 25 used as EFM-modulated information and a groove 26 used as a guide groove for tracking during additional recording are formed on the optical disc master 24. In such an optical disc master 24, in order to reduce the recording pits in the hybrid CD-R, it is desirable that the groove 26 (see FIG. 18) be trapezoidal. Therefore, in the present embodiment, as shown in FIG. 1A, the cross-sectional shape of the phase pit 25 and the groove 26 in the disk radial direction is a trapezoidal groove whose bottom surface is flat. Further, in this case, the trapezoidal grooves have the same position of the flat surface of the groove bottom in the groove depth direction, and the depth Dp of the phase pit 25 is
Is formed to be larger than the depth Dg of the groove 26. In addition, the phase pit 25 as shown in FIG.
The groove 26 and the groove 26 can also be formed in the shape shown in FIG. 1B, and since the groove depths are relatively equal to each other, it is possible to obtain the same reproduction signal characteristics in terms of optical phase.

FIG. 2 shows the relationship between the phase depth Dg of the groove 26 and the push-pull amplitude in this embodiment. The larger the groove width wg of the groove 26, the larger the push-pull amplitude (hereinafter referred to as PPA). For example, when the groove width Wg of the groove 26 is 0.6 μm, the range of the phase depth Dg of the groove 26 that satisfies the standard is:
It is 0.04 to 0.10λ.

Next, the phase pits 25 and the grooves 26, which are trapezoidal grooves as described above, for the hybrid CD-R.
A manufacturing method for realizing the shape will be described. FIG. 3 shows a configuration example of the exposure optical system of the master exposure apparatus in this embodiment. On-off operation and EFM are performed on the optical path of the laser beam a emitted from the laser light source 27.
A first pulse modulator 28 for modulating is arranged. On the optical path of the laser beam a modulated by the first pulse modulator 28, one phase pit beam b for exposing the phase pit 25 and the groove 26 and the groove are exposed via the λ / 2 plate 29. A first half mirror 30 that separates and generates two groove beams c and d added during exposure is arranged. This first half mirror 30
A first light quantity modulator 31 for adjusting the light quantity is arranged on the optical path of one of the phase pit beams b separated by.

Further, on the optical paths of the other two groove beams b and c separated by the first half mirror 30, a second pulse modulator 32 for performing an on / off operation and a second pulse modulator 32 for adjusting the amount of light are provided. A light quantity modulator 33 is arranged. A second half mirror 34 is provided for separating the two groove beams c and d that have passed through the second light quantity modulator 33 into one beam at a time. In addition, the groove beams c and d separated by the second half mirror 34 are set to 1 in the radial direction at both ends of the phase pit beam b.
Mirrors 35, 36, 37 for arranging at positions apart by / 3 track pitch are arranged. These mirrors 3
A λ / 2 plate 38 is provided in the optical paths of the groove beams c and d which are spaced by a predetermined distance by 5, 36 and 37.

At the position where the phase pit beam b that has passed through the first light quantity modulator 31 and the groove beams c and d separated by the second half mirror 34 one by one intersect with each other. A polarization beam splitter 39 that condenses the beam in the same direction is arranged. Further, on the optical paths of the three beams b, c, d condensed in the same direction, the ATIP information is transmitted to the three beams b, c, d condensed through the λ / 4 plate 40. A deflector 41 for pre-formatting is arranged. The three beams b, c and d deflected by the deflector 41 are the objective lens 4
It is condensed by 2 and is irradiated onto the optical disc master 24. The objective lens 42 is drive-controlled by a focus actuator 43. The optical disc master 24 includes a glass substrate 44 and a photoresist film 45.

In such a configuration, the laser light source 27
The laser beam a emitted from the laser beam is split into three beams b, c and d by the first and second half mirrors 30 and 34. The beam b is converted into RO by the first pulse modulator 28.
The pulse modulation is applied to the EFM pattern at the time of exposing the M portion, and the opening shutter operation is performed at the time of exposing the groove portion. This beam b can be changed to an arbitrary laser power by the first light quantity modulator 31. Further, the beams c and d are closed by the second pulse modulator 32 when the ROM portion is exposed, and are opened when the groove portion is exposed. The light amount adjustment of the beams c and d is performed by the second light amount modulator 33. The beam arrangement on the photoresist film 45 is adjusted by the mirror 35,
37. Then, the polarization beam splitter (PBS) 39 causes the three beams b, c, d
Are combined and wobbled by the deflector 41, whereby the ATIP information of the CD-R is pre-formatted.

FIG. 4 shows the light intensity distributions of the three beams b, c and d and the beam arrangement on the photoresist film 45. In this case, the three beams b, c, d are (1 /
3) They are arranged at an interval of track pitch (hereinafter referred to as P). Beam b has phase pit 25 and groove 26
And the beams c and d are sub-beams used to lift off the surface of the groove region by the phase depth (Dp-Dg). The light intensity distributions of the beams b, c, and d are largest in the beam b, and the beams c and d are equal to each other. FIG. 4A shows a light intensity distribution obtained by combining the three beams b, c, and d.
Further, in addition to this, a state in which the arrangement positions of the three beams b, c, d are changed is shown in FIGS. 4B to 4D, and in this case, the same effect as in the case of FIG. 4A is obtained. Obtainable.

Next, the structure of the exposure control system of the master exposure apparatus for hybrid CD-R will be described with reference to FIGS. A CPU 46 for monitoring the ATIP information is provided in order to synchronize the switching between the phase pit 25 and the groove 26. The CPU 46 manages each unit via the parallel I / O 47 for interface. The parallel I / O 47 includes an EFM encoder 4
8, an ATIP encoder 49, and a light quantity modulation control circuit 5
0 (D / A converter), a lateral feed drive circuit 51 for performing lateral feed, a linear scale 52, a CLV drive circuit 53 for CLV rotating a turntable, and a photo glass substrate for patterning the objective lens 42. A lens setting circuit 54 for setting a lens on the top, a focus servo circuit 55 for monitoring a focus error signal and performing focus servo, and a focus error monitor 56.
(A / D converter) is connected.

The EFM encoder 48 has a P / G switching circuit 5 for generating an enable signal for switching.
7 is connected. A synchronizing circuit 58 for synchronizing the EFM information recorded by the phase pit 25 and the ATIP information recorded by the groove 26 is connected between the EFM encoder 48 and the ATIP encoder 49. The EFM encoder 48 and the A
A pulse generator 59 that operates the TIP encoder 49 with the same clock is provided. Further, a lateral feed motor 60 for laterally feeding a turntable (not shown) is connected to the lateral feed drive circuit 51. CL
A turntable motor 61 is connected to the V drive circuit 53 to control the rotation of the optical disc master.
A lens set motor 62 for setting the objective lens 42 is connected to the lens set circuit 54.
A focus error detection circuit 63 is connected to the focus error motor 56.

The control system of this apparatus having such a configuration will be described with reference to the flow chart of FIG. In order to synchronize with the information of the phase pits 25 and the grooves 26 to be patterned, the EFM encoder 48, the ATIP encoder 49, the lateral feed and rotary drive of the turntable (not shown) are controlled by the same clock generated from the pulse generator 59. It In addition, the EFM encoder 48
The ATIP sync pattern is detected by the synchronizing circuit 58 in order to synchronize with the ATIP encoder 49, and the EFM encoder 48 is started by this sync pattern. Further, the synchronizing circuit 58 performs the switching in synchronization with the switching command from the CPU 46 and the sync pattern described above, thereby performing the exposure switching of the phase pits 25 and the grooves 26 with good timing. In fact, the CPU
46 monitors the ATIP and issues a switching command at the switching time. When the enable of the switching command and the sync pattern described above are simultaneously turned on, the phase pit 25 and the groove 26 are switched. The light amount modulation can be performed by setting data in the light amount modulation control circuit 50 from the CPU 46 and driving the first light amount modulator 31 and the second light amount modulator 33 with this voltage. Further, the beams b, c, d are added to the optical disc master 22.
The lens set of the objective lens 42 and the focus servo circuit 55 for focusing are also controlled by the CPU 46.

Here, the optical disk master 2 of the master exposure apparatus
The master exposure conditions of No. 4 are shown below.

Photoresist film thickness: Approximately 1300Å Photoresist coating conditions: Resist OFPR800
2CP (manufactured by Tokyo Ohka Co., Ltd.), rotation speed 1100 rpm, pre-bake 90 ° C. 30 min beam b exposure power: 4.0 mW beam c, d exposure power: 1.6 to 1.8 mW formed pattern: phase pit groove width about 0. 6 μm, groove depth about 1300 Å groove groove width about 0.6 μm, groove depth about 300
Å Development condition: DE-3 40% (manufactured by Tokyo Ohka) Development time 60 sec, Post bake 120 ° C 30 min Using the manufacturing process of FIG. A stamper can be made.

As described above, by forming the phase pits 25 and the grooves 26 by exposure control so as to form trapezoidal grooves as in this embodiment, it is possible to prevent the recording pits from expanding. It is possible to increase the signal characteristic margin during reproduction and stabilize the quality of manufacturing the optical disc master. Further, by using this exposure optical system, the shapes of the phase pits 25 and the grooves 26 can be easily mastered by one exposure, and even if the same master disc manufacturing process as that of the conventional method is used. Fabrication can be performed. Further, since the exposure control system is used, the exposure control can always be stably performed, so that the quality of the stamper can be stabilized.

Next, a second embodiment of the present invention will be described with reference to FIGS.
It will be described based on. The same reference numerals are used for the same parts as in the first embodiment.

Although the master exposure method for forming the phase pits 25 and the grooves 26 by using the three beams b, c, d has been described in the above-mentioned first embodiment, the method for producing by using the two beams is described here. I will describe. That is, of the two beams, one main beam b does not change, but as the other sub-beam, the beam e defocused with respect to the optical disk surface is used instead of the above-mentioned beams c and d. FIG. 7 shows a state of the exposure optical system for defocusing. Referring to the exposure optical system of FIG. 3, a defocus lens 64 is disposed on the optical path of the beam e obtained by splitting the beam a by the half mirror 30, and thus the beam e is in a defocused state. ing. 8 (a)-(d)
Shows the state of the light intensity distribution of the beams b and e. (A) shows the light intensity distribution 65 of the beam e in the defocused state, (b) shows the light intensity distribution 66 of the normal beam b, and (c) shows the two beams b and e.
7 shows a state of the combined light intensity distribution 67 of FIG.

FIG. 9 shows another structural example of the two-beam exposure optical system. In this case, an example is shown in which the beam expander 68 is arranged so that the beam diameter of the beam e incident on the objective lens 42 becomes smaller than the beam diameter of the beam b. As a result, the focused beam diameter on the optical disk surface is increased, and the same light intensity distribution as shown in FIG. 8 can be obtained.

Now, specific exposure conditions of the above defocus method and beam expander method will be described.

<Defocusing Method> Beam e: exposure power 2.0 mW, defocus amount about 0.05 μm (objective lens NA = 0.95) beam b: exposure power 3.5 mW Other conditions are as described in 3 above. Same as for beam.

<Beam Expander> Beam e: exposure power of 2.0 mW, beam diameter of about 1 mm Beam b: exposure power of 3.5 mW, beam diameter of about 3 mm Other conditions are the same as those of the three beams described above. .

By setting the conditions as described above, it is possible to obtain the phase pits 25 and the grooves 26 each having a trapezoidal groove, which is almost the same as in the three-beam method.

[0049]

According to the first aspect of the present invention, a laser beam emitted from a laser light source is condensed by an objective lens and is exposed on an optical disc master, so that a phase pit used as EFM-modulated information, and In a master exposure apparatus that creates a groove used as a guide groove for tracking at the time of additional writing on the optical disk master, the cross-sectional shape of the phase pits and the groove in the disk radial direction has a flat bottom surface of the groove. The trapezoidal grooves are formed such that the positions of the flat surfaces of the groove bottom surface are equal to each other in the groove depth direction, and the depth of the phase pit is larger than the depth of the groove. Therefore, it is possible to prevent the recording pits from spreading in the phase pits and groove shapes of the hybrid CD-R disc. Ri, thereby increasing the signal characteristic margin during reproduction, is capable of improving the quality of the optical disc master.

According to a second aspect of the present invention, a laser beam emitted from a laser light source is condensed by an objective lens and is exposed on an optical disc master, whereby phase pits used as EFM-modulated information and at the time of additional recording. In a master exposure apparatus for forming a groove used as a guide groove for tracking on the optical disk master, a first for performing an on / off operation and an EFM modulation arranged on an optical path of a laser beam emitted from a laser light source. A pulse modulator, one phase pit beam for exposing the phase pits and grooves arranged on the optical path of the laser beam modulated by the first pulse modulator, and two beams added during the groove exposure. And a first half mirror that separates and generates the groove beam and the first half mirror that is separated by the first half mirror. And a first light quantity modulator arranged on the optical path of the phase pit beam for adjusting the quantity of light, and a second light quantity modulator arranged on the optical path of the other two groove beams separated by the first half mirror. A second pulse modulator for performing an on / off operation, a second light amount modulator for adjusting the light amount, and a second beam amount modulator for separating the two groove beams that have passed through the second light amount modulator into individual beams. A second half mirror, a mirror for arranging the respective groove beams separated by the second half mirror at positions ⅓ track pitch apart in the radial direction at both ends of the phase beam; A polarization beam splitter for converging in the same direction the beam for phase pits that has passed through one light quantity modulator and the beam for grooves separated one by one by the second half mirror. Data and, ATI the three beams focused by the polarizing beam splitter
Since the exposure optical system provided with the deflector for pre-formatting the P information is provided, it is possible to realize the optical system that easily masters the phase pit and the groove shape by one exposure. The optical disc master can be manufactured by the same method and process as conventional ones.

According to a third aspect of the present invention, a laser beam emitted from a laser light source is condensed by an objective lens and is exposed on an optical disc master, whereby phase pits used as EFM-modulated information and at the time of additional recording. In a master exposure apparatus for forming a groove used as a guide groove for tracking on the optical disk master, a synchronization circuit for synchronizing EFM information recorded by phase pits and ATIP information recorded by the groove,
A to synchronize the switching of the phase pit and the groove
A CPU that monitors TIP information, a P / G switching circuit that generates an enable signal for switching, a CLV driving circuit that rotates the turntable by CLV, a lateral feeding driving circuit that performs lateral feeding, an EFM encoder, AT
IP encoder, the EFM encoder, and the AT
A pulse generator that operates the IP encoder with the same clock, a lens setting circuit that sets a lens on a photo glass substrate for patterning the objective lens, and a focus servo circuit that monitors a focus error signal and performs focus servo are provided. Since the exposure control system is provided, the control of the optical system and the disc master exposure device can be stably realized, and the quality of the stamper can be stabilized.

According to a fourth aspect of the invention, in the second or third aspect of the invention, one phase beam is used when forming the phase pits, and one phase beam is used when forming the grooves.
3. The invention according to claim 2, wherein the two phase beams and the two groove beams arranged at positions separated by 1/3 track pitch in the radial direction at both ends of the phase beam are used. The same effect can be obtained.

According to a fifth aspect of the invention, in the invention of the fourth aspect, the exposure amount of the phase pit beam is equal when forming the phase pit and the groove, and the two groove beams added during the groove exposure. Since the exposure amounts of 1 and 2 are equal to each other and smaller than the exposure amount of the phase pit beam, the same effect as the invention according to claim 2 can be obtained.

According to a sixth aspect of the present invention, a laser beam emitted from a laser light source is condensed by an objective lens and is exposed on an optical disc master, whereby phase pits used as EFM-modulated information and at the time of additional recording. In a master exposure apparatus for forming a groove used as a guide groove for tracking on the optical disk master, a first for performing an on / off operation and an EFM modulation arranged on an optical path of a laser beam emitted from a laser light source. A pulse modulator, one phase pit beam for exposing the phase pits and grooves arranged on the optical path of the laser beam modulated by the first pulse modulator, and two beams added during the groove exposure. And a first half mirror that separates and generates the groove beam and the first half mirror that is separated by the first half mirror. And a first light quantity modulator arranged on the optical path of the phase pit beam for adjusting the quantity of light, and a second light quantity modulator arranged on the optical path of the other two groove beams separated by the first half mirror. A second pulse modulator for performing an on / off operation, a second light amount modulator for adjusting the light amount, and a second beam amount modulator for separating the two groove beams that have passed through the second light amount modulator into individual beams. A second half mirror, a mirror for arranging the respective groove beams separated by the second half mirror at positions ⅓ track pitch apart in the radial direction at both ends of the phase beam; A polarization beam splitter for converging in the same direction the beam for phase pits that has passed through one light quantity modulator and the beam for grooves separated one by one by the second half mirror. Data and, ATI the three beams focused by the polarizing beam splitter
An exposure optical system having a deflector for pre-formatting P information is provided, and an EFM recorded by phase pits
A synchronization circuit for synchronizing the information with the ATIP information recorded by the groove, and a CPU for monitoring the ATIP information for synchronizing the switching between the phase pit and the groove
And P / G for generating an enable signal for switching
CL for switching circuit and CLV rotation of turntable
A V drive circuit and a transverse feed drive circuit for executing transverse feed;
EFM encoder, ATIP encoder, and EF
A pulse generator that operates the M encoder and the ATIP encoder with the same clock, a lens setting circuit that sets a lens on a photo glass substrate for patterning an objective lens, and a focus servo that monitors a focus error signal and performs focus servo. Since the exposure control system including the circuit is provided, the same effect as the invention according to claim 2 can be obtained.

According to a seventh aspect of the present invention, the laser beam emitted from the laser light source is condensed by the objective lens and exposed on the optical disc master, and the phase pits used as the EFM-modulated information and the additional writing. In a master exposure apparatus for forming a groove used as a guide groove for tracking on the optical disk master, a first for performing an on / off operation and an EFM modulation arranged on an optical path of a laser beam emitted from a laser light source. A pulse modulator, one phase pit beam for exposing the phase pits and grooves arranged on the optical path of the laser beam modulated by the first pulse modulator, and one beam added for the groove exposure. And a half mirror for separately generating the groove beam and one of the half mirrors separated by this half mirror. A first light quantity modulator arranged on the light path of the phase pit beam to adjust the quantity of light; and an on / off operation arranged on the light path of the other one of the groove beams separated by the half mirror. A second pulse modulator for controlling and a second light amount modulator for adjusting the light amount, and a defocus for defocusing the one groove beam having passed through the second light amount modulator with respect to the optical disc master surface. A lens, a polarization beam splitter that condenses the phase pit beam that has passed through the first light quantity modulator and the groove beam that has been defocused by the defocus lens in the same direction, and a polarization beam splitter that collects the beam. 3. An exposure optical system provided with a deflector for pre-formatting ATIP information on one light beam is irradiated. Invention and in which it is possible to obtain the same effect.

According to an eighth aspect of the invention, in the invention of the seventh aspect, one phase beam is used when forming the phase pits, and one phase beam is used when forming the grooves. Since one beam is added and exposed on the same track as the phase beam,
The same effects as the described invention can be obtained.

According to a ninth aspect of the invention, in the eighth aspect of the invention, the phase pit beam is in a focused state on the optical disc master, and the groove beam added during groove exposure is in a defocused state on the optical disc master. Therefore, the same effect as that of the invention according to claim 2 can be obtained.

According to a tenth aspect of the present invention, in the eighth aspect of the invention, the beam diameter of the beam for the phase pit when entering the objective lens of the groove is made smaller than the beam diameter of the beam for the phase pit. The same effects as the described invention can be obtained.

In the eleventh aspect of the present invention, the laser beam emitted from the laser light source is condensed by the objective lens and is exposed on the optical disc master, whereby the phase pits used as the EFM-modulated information and the additional writing are performed. In a master exposure apparatus for forming a groove used as a guide groove for tracking on the optical disk master, a first for performing an on / off operation and an EFM modulation arranged on an optical path of a laser beam emitted from a laser light source. A pulse modulator, one phase pit beam for exposing the phase pits and grooves arranged on the optical path of the laser beam modulated by the first pulse modulator, and one beam added for the groove exposure. The half mirror that separates and generates the beam for the groove and the one that is separated by this half mirror A first light quantity modulator arranged on the optical path of the phase pit beam to adjust the quantity of light, and an on / off operation arranged on the optical path of the other one groove beam separated by the half mirror. A second pulse modulator for controlling and a second light intensity modulator for adjusting the light intensity,
A defocus lens for defocusing the one groove beam that has passed through the second light amount modulator with respect to the optical disc master surface, and the phase pit beam and the defocus lens that have passed through the first light amount modulator. A polarization beam splitter for converging the groove beam defocused by the focus lens in the same direction, and ATIP for one beam condensed by the polarization beam splitter
An exposure optical system including a deflector for pre-formatting information is provided, and a synchronization circuit for synchronizing the EFM information recorded by the phase pit and the ATIP information recorded by the groove, and the phase pit and the groove. CPU that monitors ATIP information to synchronize switching with
And P / G for generating an enable signal for switching
CL for switching circuit and CLV rotation of turntable
A V drive circuit and a transverse feed drive circuit for executing transverse feed;
EFM encoder, ATIP encoder, and EF
A pulse generator that operates the M encoder and the ATIP encoder with the same clock, a lens setting circuit that sets a lens on a photo glass substrate for patterning an objective lens, and a focus servo that monitors a focus error signal and performs focus servo. Since the exposure control system including the circuit is provided, the same effect as that of the third aspect of the invention can be obtained.

According to the twelfth aspect of the present invention, the laser beam emitted from the laser light source is condensed by the objective lens and exposed on the optical disc master, and the phase pits used as the EFM-modulated information and the additional writing. In a master exposure apparatus for forming a groove used as a guide groove for tracking on the optical disk master, a first for performing an on / off operation and an EFM modulation arranged on an optical path of a laser beam emitted from a laser light source. A pulse modulator, one phase pit beam for exposing the phase pits and grooves arranged on the optical path of the laser beam modulated by the first pulse modulator, and one beam added for the groove exposure. The half mirror that separates and generates the beam for the groove and the one that is separated by this half mirror A first light quantity modulator arranged on the optical path of the phase pit beam to adjust the quantity of light, and an on / off operation arranged on the optical path of the other one groove beam separated by the half mirror. A second pulse modulator for controlling and a second light intensity modulator for adjusting the light intensity,
A beam expander for changing the beam diameter of the one groove beam that has passed through the second light amount modulator, and a beam for the phase pit beam and the beam expander that have passed through the first light amount modulator. A polarization beam splitter for converging the groove beam having a changed diameter in the same direction, and a deflector for pre-formatting ATIP information into one beam condensed by the polarization beam splitter are provided. Since the exposure optical system is provided, the same effect as that of the invention of claim 2 can be obtained.

According to the thirteenth aspect of the present invention, the laser beam emitted from the laser light source is condensed by the objective lens and exposed on the optical disc master, so that the phase pits used as EFM-modulated information and the additional pits at the time of additional recording. In a master exposure apparatus for forming a groove used as a guide groove for tracking on the optical disk master, a first for performing an on / off operation and an EFM modulation arranged on an optical path of a laser beam emitted from a laser light source. A pulse modulator, one phase pit beam for exposing the phase pits and grooves arranged on the optical path of the laser beam modulated by the first pulse modulator, and one beam added for the groove exposure. The half mirror that separates and generates the beam for the groove and the one that is separated by this half mirror A first light quantity modulator arranged on the optical path of the phase pit beam to adjust the quantity of light, and an on / off operation arranged on the optical path of the other one groove beam separated by the half mirror. A second pulse modulator for controlling and a second light intensity modulator for adjusting the light intensity,
A beam expander for changing the beam diameter of the one groove beam that has passed through the second light amount modulator, and a beam for the phase pit beam and the beam expander that have passed through the first light amount modulator. A polarization beam splitter for converging the groove beam having a changed diameter in the same direction, and a deflector for pre-formatting ATIP information into one beam condensed by the polarization beam splitter are provided. An exposure optical system is provided to monitor the ATIP information in order to synchronize the EFM information recorded by the phase pits with the ATIP information recorded by the grooves and the synchronization circuit for switching between the phase pits and the grooves. CPU, a P / G switching circuit for generating an enable signal for switching, and a turntable for CLV times. A CLV drive circuit which causes the horizontal feed drive circuit for executing a lateral feed, and EFM encoder,
An ATIP encoder, a pulse generator that operates the EFM encoder and the ATIP encoder with the same clock, a lens set circuit that sets a lens on a photo glass substrate for patterning an objective lens, and a focus error signal is monitored and focused. Since the exposure control system including the focus servo circuit for performing the servo is provided, the same effect as that of the third aspect of the invention can be obtained.

[Brief description of drawings]

FIG. 1 is a cross-sectional view showing a configuration of an optical disc master according to a first embodiment of the present invention.

FIG. 2 is a characteristic diagram showing a state of push-pull amplitude with respect to groove depth.

FIG. 3 is an optical path diagram showing a state of a three-beam exposure optical system.

FIG. 4 is a schematic diagram showing the principle of three-beam exposure.

FIG. 5 is a block diagram showing a state of an exposure control system.

FIG. 6 is a flowchart.

FIG. 7 is an optical path diagram showing a configuration of a two-beam exposure optical system that is a second embodiment of the present invention.

FIG. 8 is a schematic diagram showing the principle of two-beam exposure.

FIG. 9 is an optical path diagram showing another configuration example of a two-beam exposure optical system.

FIG. 10 is a plan view showing a configuration of an optical disc master.

FIG. 11 is a schematic view showing various groove shapes formed on the optical disk surface.

FIG. 12 is a characteristic diagram showing the degree of change in the modulation degree with respect to the pit depth.

FIG. 13 is a characteristic diagram showing the degree of change in push-pull amplitude with respect to groove depth.

FIG. 14 is a side view showing a groove shape formed in a pit and a groove.

FIG. 15 is a process drawing showing a process of manufacturing an optical disc master.

FIG. 16 is an optical path diagram showing a conventional exposure optical system.

FIG. 17 is a cross-sectional view showing a state before and after recording when the recording pit is V-shaped.

FIG. 18 is a cross-sectional view showing a state before and after recording when the recording pit is a trapezoidal groove.

[Explanation of symbols]

 25 phase pit 26 groove 27 laser light source 28 first pulse modulator 30 first half mirror 31 first light quantity modulator 32 second pulse modulator 33 second light quantity modulator 34 second half mirror 35 to 37 mirror 39 polarizing beam splitter 41 Deflector 42 Objective Lens 64 Defocusing Lens 68 Beam Expander

Claims (13)

[Claims] 1. An EF by exposing a laser beam emitted from a laser light source by condensing it with an objective lens.
In an optical disc master in which a phase pit used as M-modulated information and a groove used as a guide groove for tracking at the time of additional recording are formed, the cross-sectional shape of the phase pit and the groove in the disc radial direction is the groove bottom surface. The trapezoidal groove has a flat surface, and the flat surface of the bottom surface of the trapezoidal groove has the same position in the groove depth direction, and the depth of the phase pit is set to the groove. The optical disc master is characterized in that it is formed larger than the depth of. 2. A phase pit used as EFM-modulated information and a guide groove for tracking at the time of additional recording by condensing a laser beam emitted from a laser light source by an objective lens and exposing it on an optical disc master. In a master exposure apparatus that creates a groove to be used on the optical disk master, on / off operation and EF arranged on the optical path of a laser beam emitted from a laser light source
First pulse modulator for M modulation, and one phase pit beam for exposing phase pits and grooves arranged on the optical path of the laser beam modulated by the first pulse modulator And a first half mirror that separates and generates two groove beams to be added during groove exposure, and the amount of light disposed on the optical path of one of the phase pit beams separated by the first half mirror is adjusted. For adjusting the amount of light and a second pulse modulator for performing on / off operation, which is disposed on the optical path of the other two groove beams separated by the first half mirror. A second light quantity modulator, a second half mirror that separates the two groove beams that have passed through the second light quantity modulator into one beam each, and a second half mirror 1 separated the respective grooves beam in the radial direction of the both ends of the phase beam Ri
A mirror for arranging at a distance of / 3 track pitch, the phase pit beam that has passed through the first light quantity modulator, and the groove beam that has been separated one by one by the second half mirror are the same. A master disc, which is provided with an exposure optical system including a polarization beam splitter for converging light in a direction and a deflector for pre-formatting ATIP information on the three beams condensed by the polarization beam splitter. Exposure equipment. 3. A phase pit used as EFM-modulated information and a guide groove for tracking at the time of additional recording by condensing a laser beam emitted from a laser light source by an objective lens and exposing it on an optical disc master. In a master exposure apparatus that creates a groove to be used on the optical disk master, a synchronization circuit for synchronizing the EFM information recorded by the phase pit and the ATIP information recorded by the groove, and the phase pit and the groove A CPU that monitors ATIP information to synchronize switching, a P / G switching circuit that generates an enable signal for switching, a CLV drive circuit that rotates the turntable by CLV, and a lateral feed drive that executes lateral feed. Circuit, EFM encoder, ATIP encoder, and EFM encoder And a pulse generator for operating the ATIP encoder with the same clock, a lens set circuit for setting a lens on a photo glass substrate for patterning an objective lens, and a focus servo circuit for monitoring a focus error signal and performing focus servo. An exposure apparatus for a master, which is provided with an exposure control system including. 4. When forming a phase pit, one phase beam is used, and when forming a groove, the one phase beam and 1 / in the radial direction of both ends of this phase beam are used. The master exposure apparatus according to claim 2 or 3, wherein two groove beams arranged at positions separated by three track pitches are used. 5. The exposure amount of the phase pit beam is equal when forming the phase pit and the groove, and the exposure amounts of the two groove beams added during the groove exposure are equal to each other and the phase pit beam exposure is performed. The master exposure apparatus according to claim 4, wherein the master exposure apparatus is smaller than the quantity. 6. A laser beam emitted from a laser light source is condensed by an objective lens and is exposed on an optical disc master to form a phase pit used as EFM-modulated information and a guide groove for tracking at the time of additional recording. In a master exposure apparatus that creates a groove to be used on the optical disk master, on / off operation and EF arranged on the optical path of a laser beam emitted from a laser light source
First pulse modulator for M modulation, and one phase pit beam for exposing phase pits and grooves arranged on the optical path of the laser beam modulated by the first pulse modulator And a first half mirror that separates and generates two groove beams to be added during groove exposure, and the amount of light disposed on the optical path of one of the phase pit beams separated by the first half mirror is adjusted. For adjusting the amount of light and a second pulse modulator for performing on / off operation, which is disposed on the optical path of the other two groove beams separated by the first half mirror. A second light quantity modulator, a second half mirror that separates the two groove beams that have passed through the second light quantity modulator into one beam each, and a second half mirror 1 separated the respective grooves beam in the radial direction of the both ends of the phase beam Ri
A mirror for arranging at a distance of / 3 track pitch, the phase pit beam that has passed through the first light quantity modulator, and the groove beam that has been separated one by one by the second half mirror are the same. An exposure optical system including a polarization beam splitter for converging light in a direction and a deflector for pre-formatting ATIP information on the three beams condensed by the polarization beam splitter is provided, and recording is performed by phase pits. A synchronizing circuit for synchronizing the EFM information and the ATIP information recorded by the groove, a CPU for monitoring the ATIP information for synchronizing the switching between the phase pit and the groove, and an enable signal for switching P / G switching circuit, CLV drive circuit for CLV rotation of the turntable, and lateral feed A drive circuit, and the EFM encoder,
An ATIP encoder, a pulse generator that operates the EFM encoder and the ATIP encoder with the same clock, a lens set circuit that sets a lens on a photo glass substrate for patterning an objective lens, and a focus error signal is monitored and focused. An original master exposure apparatus comprising an exposure control system including a focus servo circuit for performing servo. 7. A phase pit used as EFM-modulated information and a guide groove for tracking at the time of additional recording by condensing a laser beam emitted from a laser light source by an objective lens and exposing it on an optical disc master. In a master exposure apparatus that creates a groove to be used on the optical disk master, on / off operation and EF arranged on the optical path of a laser beam emitted from a laser light source
First pulse modulator for M modulation, and one phase pit beam for exposing phase pits and grooves arranged on the optical path of the laser beam modulated by the first pulse modulator And a half mirror for separately generating one groove beam to be added at the time of groove exposure, and a first light amount for adjusting the light amount arranged on the optical path of one of the phase pit beams separated by this half mirror. A modulator, a second pulse modulator arranged on the optical path of the other one of the groove beams separated by the half mirror to perform an on / off operation, and a second light amount modulator for adjusting the light amount. A defocus lens for defocusing the one groove beam that has passed through the second light amount modulator with respect to the optical disc master surface; Beam splitter for converging the phase pit beam that has passed through the beam splitter and the groove beam defocused by the defocus lens in the same direction, and a single beam focused by this polarization beam splitter. An original exposure apparatus comprising an exposure optical system including a deflector for pre-formatting ATIP information. 8. When forming a phase pit, one phase beam is used, and when forming a groove, the one phase beam and one phase beam are provided on the same track.
The master exposure apparatus according to claim 7, wherein a book beam is added for exposure. 9. The master disc exposure apparatus according to claim 8, wherein the phase pit beam is focused on the optical disc master and the groove beam added at the time of groove exposure is defocused on the optical disc master. . 10. The master exposure apparatus according to claim 8, wherein the beam diameter of the groove beam when entering the objective lens is smaller than the beam diameter of the phase pit beam. 11. A phase pit used as EFM-modulated information and a guide groove for tracking at the time of additional recording by condensing a laser beam emitted from a laser light source by an objective lens and exposing it on an optical disc master. In a master exposure apparatus for creating a groove to be used on the master of the optical disc, an on / off operation and an E which are arranged on an optical path of a laser beam emitted from a laser light source are performed.
A first pulse modulator for performing FM modulation, and the first pulse modulator
Separate generation of one phase pit beam for exposing the phase pits and grooves arranged on the optical path of the laser beam modulated by the pulse modulator and one groove beam added at the time of groove exposure Half mirror, a first light quantity modulator arranged on the optical path of one of the phase pit beams separated by the half mirror, and a first light quantity modulator, and the other one separated by the half mirror. Second pulse modulator arranged on the optical path of the groove beam for performing on / off operation, a second light amount modulator for adjusting the light amount, and the one groove for passing through the second light amount modulator A defocus lens for defocusing the beam on the master surface of the optical disc, the phase pit beam that has passed through the first light amount modulator, and the defocus lens. A polarization beam splitter for converging the groove beam defocused by the cass lens in the same direction, and a deflector for pre-formatting ATIP information into one beam condensed by the polarization beam splitter And a synchronizing circuit for synchronizing the EFM information recorded by the phase pits with the ATIP information recorded by the grooves, and the ATIP information for synchronizing the switching between the phase pits and the grooves. A CPU for monitoring, a P / G switching circuit for generating an enable signal for switching, a CLV driving circuit for rotating the turntable by CLV, a lateral feeding driving circuit for performing lateral feeding, an EFM encoder,
An ATIP encoder, a pulse generator that operates the EFM encoder and the ATIP encoder with the same clock, a lens set circuit that sets a lens on a photo glass substrate for patterning an objective lens, and a focus error signal is monitored and focused. A master exposure apparatus, comprising an exposure control system including a focus servo circuit for performing servo. 12. A phase pit used as EFM-modulated information and a guide groove for tracking at the time of additional recording by condensing a laser beam emitted from a laser light source by an objective lens and exposing the same on an optical disc master. In a master exposure apparatus for creating a groove to be used on the master of the optical disc, an on / off operation and an E which are arranged on an optical path of a laser beam emitted from a laser light source are performed.
A first pulse modulator for performing FM modulation, and the first pulse modulator
Separate generation of one phase pit beam for exposing the phase pits and grooves arranged on the optical path of the laser beam modulated by the pulse modulator and one groove beam added at the time of groove exposure Half mirror, a first light quantity modulator arranged on the optical path of one of the phase pit beams separated by the half mirror, and a first light quantity modulator, and the other one separated by the half mirror. Second pulse modulator arranged on the optical path of the groove beam for performing on / off operation, a second light amount modulator for adjusting the light amount, and the one groove for passing through the second light amount modulator A beam expander for changing the beam diameter of the beam, a beam for the phase pit passing through the first light amount modulator, and the beam expander. A polarization beam splitter for converging the groove beam having a changed diameter in the same direction, and a deflector for pre-formatting ATIP information into one beam condensed by the polarization beam splitter are provided. A master exposure apparatus, which is provided with an exposure optical system. 13. A phase pit used as EFM-modulated information and a guide groove for tracking at the time of additional recording by condensing a laser beam emitted from a laser light source by an objective lens and exposing it on an optical disc master. In a master exposure apparatus for creating a groove to be used on the master of the optical disc, an on / off operation and an E which are arranged on an optical path of a laser beam emitted from a laser light source are performed.
A first pulse modulator for performing FM modulation, and the first pulse modulator
Separate generation of one phase pit beam for exposing the phase pits and grooves arranged on the optical path of the laser beam modulated by the pulse modulator and one groove beam added at the time of groove exposure Half mirror, a first light quantity modulator arranged on the optical path of one of the phase pit beams separated by the half mirror, and a first light quantity modulator, and the other one separated by the half mirror. Second pulse modulator arranged on the optical path of the groove beam for performing on / off operation, a second light amount modulator for adjusting the light amount, and the one groove for passing through the second light amount modulator A beam expander for changing the beam diameter of the beam, a beam for the phase pit passing through the first light amount modulator, and the beam expander. A polarization beam splitter for converging the groove beam having a changed diameter in the same direction, and a deflector for pre-formatting ATIP information into one beam condensed by the polarization beam splitter are provided. An exposure optical system is provided to monitor the ATIP information in order to synchronize the EFM information recorded by the phase pits with the ATIP information recorded by the grooves and the synchronization circuit for switching between the phase pits and the grooves. CPU, a P / G switching circuit that generates an enable signal for switching, a CLV driving circuit that rotates the turntable by CLV, a lateral feeding driving circuit that performs lateral feeding, an EFM encoder, and an ATIP encoder,
A pulse generator that operates the EFM encoder and the ATIP encoder with the same clock, a lens setting circuit that sets a lens on a photo glass substrate for patterning an objective lens, and a focus that monitors a focus error signal and performs focus servo. An exposure apparatus for a master, comprising an exposure control system including a servo circuit.