JPH06349121A - Magneto-optical recording medium - Google Patents

Magneto-optical recording medium

Info

Publication number
JPH06349121A
JPH06349121A JP13456893A JP13456893A JPH06349121A JP H06349121 A JPH06349121 A JP H06349121A JP 13456893 A JP13456893 A JP 13456893A JP 13456893 A JP13456893 A JP 13456893A JP H06349121 A JPH06349121 A JP H06349121A
Authority
JP
Japan
Prior art keywords
recording
film thickness
layer
magneto
average film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13456893A
Other languages
Japanese (ja)
Inventor
Katsuji Minagawa
勝治 皆川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PURODEISUKU KK
DIC Corp
JFE Engineering Corp
Original Assignee
PURODEISUKU KK
NKK Corp
Nippon Kokan Ltd
Dainippon Ink and Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PURODEISUKU KK, NKK Corp, Nippon Kokan Ltd, Dainippon Ink and Chemicals Co Ltd filed Critical PURODEISUKU KK
Priority to JP13456893A priority Critical patent/JPH06349121A/en
Publication of JPH06349121A publication Critical patent/JPH06349121A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To suppress an increase in jitters by forming the magneto-optical recording medium which increases the margin of a recording laser power for CNR by the thickness on the grooves of a reflection layer larger than the film thickness on lands where recording is executed. CONSTITUTION:A substrate consisting of a polycarbonate resin is arranged in a sputtering device and is subjected to reactive sputtering by discharging the inside of the sputtering device to 3X10<-7> torr and using an Si target in an atmosphere of, for example, 5mol% content of gaseous oxygen under 10 mtorr pressure of a gaseous mixture composed of Ar and N2. A dielectric layer consisting of SiNx and having, for example, 100nm average film thickness is formed. A recording film having 25nm average film thickness is then formed by using a TbFeCo alloy under, for example, 3 torr pressure of the gaseous Ar. Further, a dielectric layer consisting of SiNx and having 30nm average film thickness is similarly formed. Finally, the reflection layer having 150nm average film thickness is formed by using an AlTi alloy target under 5 mtorr pressure of the gaseous Ar and is etched at about 15nm.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は基板上に形成された多層
の薄膜よりなる記録膜上にレーザー光を照射し、情報の
記録、再生、消去を行なうことができる光磁気記録媒体
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magneto-optical recording medium capable of recording, reproducing and erasing information by irradiating a recording film composed of a multi-layered thin film formed on a substrate with laser light. is there.

【0002】[0002]

【従来の技術】近年、情報量の増大に伴い大容量の情報
を記録することができる記録媒体の開発が急がれてい
る。その中でもレーザー光を利用して高密度な情報の記
録再生ができる光ディスクがすでに実用されている。
2. Description of the Related Art In recent years, with the increase in the amount of information, there has been an urgent need to develop a recording medium capable of recording a large amount of information. Among them, optical discs that can record and reproduce high-density information using laser light have already been put into practical use.

【0003】光ディスクには、一回だけ記録が可能な追
記型と記録した情報を消去でき何度も書き換えることが
できる書換え可能型があるが、今後コンピュータの外部
メモリとして使用する場合、情報の書換えをおこなうこ
とができる書換え可能型が有望視されている。
Optical discs include a write-once type that can be recorded only once and a rewritable type that can erase recorded information and can be rewritten many times. When used as an external memory of a computer in the future, rewriting of information is possible. A rewritable type that can perform is promising.

【0004】書換え可能な光ディスクとしては、情報の
記録及び消去をレーザー光による加熱と外部磁界の印加
により磁性体層の磁化方向を変えることで行ない、磁気
光カー効果によるレーザー光の偏光方向の回転を利用し
て情報を読み出すことにより高密度な情報の記録再生が
できる方式が実用されている。そしてその記録媒体とし
ては、まず、基板上に誘電体からなる保護層を設け、次
に強磁性体を主体とする記録層を設け、さらに誘電体か
らなる保護層を介して、または介さないで直接反射層を
設けて、カー効果に加え磁性体層を透過した光のファラ
ディー効果を併用して磁気光学効果を大きくした構造の
ものが考案されている。(例えば、特開昭59−217
248号公報)
In a rewritable optical disk, information is recorded and erased by heating the laser beam and applying an external magnetic field to change the magnetization direction of the magnetic layer, and the polarization direction of the laser beam is rotated by the Kerr Kerr effect. A method has been put into practical use in which high-density information recording / reproduction can be performed by reading information by using the. As the recording medium, first, a protective layer made of a dielectric material is provided on a substrate, then a recording layer mainly made of a ferromagnetic material is provided, and further, with or without a protective layer made of a dielectric material. A structure has been devised in which a magneto-optical effect is enhanced by providing a direct reflection layer and using the Faraday effect of light transmitted through the magnetic layer in addition to the Kerr effect. (For example, JP-A-59-217
No. 248 publication)

【0005】一般的に書換可能な光ディスクに用いられ
ている記録方式に光変調記録方式がある。これは記録膜
の磁化を外部磁界の向きと逆向きに揃えておき、記録す
る場所を記録したい信号に対応したレーザー光で局部的
に加熱する。加熱部分の温度がキュリー温度近くに達し
たとき、保磁力は非常に小さくなり、磁化は外部磁界と
同じ方向に反転しビットが形成される。再生信号により
ビットを検出するためにはビットを大きく形成する必要
があるため、レーザーパワーを大きくして熱の広がりを
大きくする必要がある。
An optical modulation recording method is a recording method generally used for rewritable optical disks. In this method, the magnetization of the recording film is aligned in the direction opposite to the direction of the external magnetic field, and the recording location is locally heated by laser light corresponding to the signal to be recorded. When the temperature of the heated portion reaches near the Curie temperature, the coercive force becomes very small, the magnetization is reversed in the same direction as the external magnetic field, and a bit is formed. Since it is necessary to form a large bit in order to detect the bit by the reproduction signal, it is necessary to increase the laser power to increase the spread of heat.

【0006】[0006]

【発明が解決しようとする課題】しかし、レーザーパワ
ーを大きくしすぎると、特にディスクの内周部において
周方向に隣接するビットとの間隔が小さくなり、ビット
を読み出すとき読みだし信号として波形干渉を起こす。
この波形干渉によってジッタが増大する。
However, if the laser power is increased too much, the space between adjacent bits in the circumferential direction becomes small, especially at the inner peripheral portion of the disk, and when the bits are read, waveform interference may occur as a read signal. Wake up.
This waveform interference increases jitter.

【0007】このことは再生信号振幅の劣化を意味し、
CNR(Carrier/Noise Ratio)の低下の原因となる。
This means that the reproduction signal amplitude is deteriorated,
It causes a decrease in CNR (Carrier / Noise Ratio).

【0008】本発明が解決しようとする課題は、記録レ
ーザーパワーが大きくなってもジッタが増大せず、CN
Rに対する記録レーザーパワーのマージンを大きくでき
る光磁気記録媒体を提供することにある。
The problem to be solved by the present invention is that the jitter does not increase even if the recording laser power increases, and
An object of the present invention is to provide a magneto-optical recording medium that can increase the margin of recording laser power with respect to R.

【0009】[0009]

【課題を解決するための手段】本発明は上記課題を解決
するために、ランド部及びグルーブ部を有する基板上
に、透明な誘電体からなる保護層、磁性体からなる記録
層及び反射層から成る多層構造の記録膜を有するディス
ク状の光磁気記録媒体において、反射層のグルーブ部上
での膜厚が記録を行なうランド部上での膜厚よりも大き
いことを特徴とする光磁気記録媒体を提供する。
In order to solve the above problems, the present invention comprises a transparent dielectric protective layer, a magnetic recording layer and a reflective layer on a substrate having a land and a groove. In a disc-shaped magneto-optical recording medium having a multi-layered recording film, the magneto-optical recording medium is characterized in that the film thickness on the groove portion of the reflective layer is larger than the film thickness on the land portion for recording. I will provide a.

【0010】反射層をランド部上よりもグルーブ部上の
膜厚が大きくなるように成膜を行なうと、レーザーパワ
ーを大きくすることで広がる熱を、周方向(隣接するビ
ットどうしの間隔を狭くする方向)ではなく、半径方向
(グルーブに熱が逃げる方向)により多く伝導させるこ
とができる。このことから比較的大きなレーザーパワー
で記録した場合であってもビットの間隔は狭くはなら
ず、読みだし信号は波形干渉を起こさず、ジッタの増大
を抑えることができる。
When the reflection layer is formed such that the film thickness on the groove portion is larger than that on the land portion, the heat spread by increasing the laser power is dispersed in the circumferential direction (the interval between adjacent bits is narrowed). It is possible to conduct more in the radial direction (the direction in which heat escapes into the groove), not in the direction in which the heat is conducted. Therefore, even when recording is performed with a relatively large laser power, the bit interval does not become narrow, the read signal does not cause waveform interference, and the increase in jitter can be suppressed.

【0011】反射層をランド部上よりもグルーブ部上の
膜厚が大きくなるように成膜を行なうには、例えば、通
常の方法で反射層を形成した後、逆スパッタ法により反
射層の表面が平滑となるようにエッチングする方法が挙
げられる。
In order to form the reflection layer so that the film thickness on the groove portion is larger than that on the land portion, for example, after forming the reflection layer by a normal method, the surface of the reflection layer is formed by reverse sputtering. There is a method of etching so that the surface becomes smooth.

【0012】本発明で使用する基板としては、例えば、
ポリカーボネート、ポリメチルメタクリレート、アモル
ファスポリオレフィンの如き樹脂又はガラスに直接案内
溝を形成した基板、ガラス又は樹脂の平板上にフォトポ
リマー法により案内溝を形成した基板が挙げられる。
The substrate used in the present invention is, for example,
Examples thereof include a substrate in which a guide groove is directly formed in resin or glass such as polycarbonate, polymethylmethacrylate, and amorphous polyolefin, and a substrate in which a guide groove is formed on a flat plate of glass or resin by a photopolymer method.

【0013】誘電体からなる保護層の材料としては、一
般に光学定数及び透過率が大きく、記録層を保護する効
果の大きいSiNX、SiOX、AlSiON、AlSi
N、AlN、AlTiN、Ta25、ZnS等が挙げら
れる。
[0013] As the material of the protective layer made of a dielectric, typically optical constants and transmittance is large, large SiN X effect of protecting the recording layer, SiO X, AlSiON, AlSi
N, AlN, AlTiN, Ta 2 O 5, ZnS , and the like.

【0014】磁性体からなる記録層を構成する材料とし
ては、例えば、TbFeCo、NdDyFeCo等の遷
移金属と希土類金属の合金等、あるいはこれにTi、T
a、Cr等の耐食性付与金属を添加した合金が挙げられ
る。特に耐食性の優れたTiが好ましい。
As a material for forming the recording layer made of a magnetic material, for example, an alloy of a transition metal such as TbFeCo or NdDyFeCo and a rare earth metal, or Ti or T
Examples include alloys to which corrosion resistance imparting metals such as a and Cr are added. Particularly, Ti, which has excellent corrosion resistance, is preferable.

【0015】記録層上に、誘電体からなる保護層を介し
て、又は介さないで反射層を形成する。
A reflective layer is formed on the recording layer with or without a protective layer made of a dielectric material.

【0016】反射層の材質としては、Al、Alと他の
金属との合金等が挙げられるが、記録膜を保護する効果
の大きいと思われるAlにTiを加えた合金が特に好ま
しい。
Examples of the material of the reflective layer include Al and alloys of Al with other metals. Among them, an alloy of Al and Ti, which is considered to have a large effect of protecting the recording film, is particularly preferable.

【0017】更に、反射層の上に保護コート層を、基板
の光磁気記録層の反対側の面にハードコート層を各々設
けることもできる。
Further, a protective coat layer may be provided on the reflective layer, and a hard coat layer may be provided on the surface of the substrate opposite to the magneto-optical recording layer.

【0018】保護コート層の材料には有機系、無機系の
双方が用いられている。有機系の保護コート層を形成す
る場合には、ディッピング法、スピンコート法、ロール
コーター法、蒸着法等の手法が用いられている。一方、
無機系の保護コート層を形成する場合には、スパッタリ
ング法や蒸着法、含浸法等の手法が用いられる。
Both organic and inorganic materials are used for the material of the protective coat layer. When forming an organic protective coat layer, methods such as a dipping method, a spin coat method, a roll coater method, and a vapor deposition method are used. on the other hand,
When forming the inorganic protective coat layer, a method such as a sputtering method, a vapor deposition method, an impregnation method or the like is used.

【0019】これらの保護コート法のうち、紫外線硬化
樹脂を用いたスピンコート法は簡便で迅速な方法である
ので好ましい。この方法は、ディスペンサーを用いて基
板上に紫外線硬化樹脂を吐出し、光磁気記録媒体を高速
回転して遠心力により樹脂を広げて塗布を行なう。塗布
された樹脂は、その後、紫外線照射によって硬化させ
る。また、スピンコート法は、紫外線硬化樹脂以外の樹
脂に対しても好適に用いることができる。いずれの場合
においても、保護コート層に用いる樹脂は、硬化後に鉛
筆硬度でH以上の硬度を有するものが好ましい。
Of these protective coating methods, the spin coating method using an ultraviolet curable resin is preferable because it is a simple and quick method. In this method, an ultraviolet curable resin is discharged onto a substrate using a dispenser, the magneto-optical recording medium is rotated at a high speed, and the resin is spread by centrifugal force for application. The applied resin is then cured by UV irradiation. The spin coating method can also be suitably used for resins other than the ultraviolet curable resin. In any case, the resin used for the protective coat layer preferably has a pencil hardness of H or higher after curing.

【0020】プラスチック製基板は、耐擦傷性が不十分
であり、このような欠点を克服するために、記録層とは
反対側の面に硬度の高い透明材質を用いてハードコート
層を設けることが望ましい。ハードコートの手段として
はスピンコート法、2P法等により多官能ウレタンアク
リレート及び光重合開始剤を含有する紫外線硬化樹脂等
の有機高分子を塗布、硬化する方法、析出法やスパッタ
リング法等により二酸化珪素等のセラミックハードコー
ト層を設ける方法が挙げられるが、セラミック製のハー
ドコート層は、生産性が悪いため、大量生産には不向き
であるので、紫外線硬化樹脂を用いたハードコート層が
好ましい。
The plastic substrate has insufficient scratch resistance, and in order to overcome such a drawback, a hard coat layer is provided on the surface opposite to the recording layer using a transparent material having high hardness. Is desirable. As a means for hard coating, a method of applying and curing an organic polymer such as a UV-curable resin containing a polyfunctional urethane acrylate and a photopolymerization initiator by a spin coating method, a 2P method or the like, a silicon dioxide by a precipitation method or a sputtering method, etc. And the like, a ceramic hard coat layer is not suitable for mass production due to poor productivity, and thus a hard coat layer using an ultraviolet curable resin is preferable.

【0021】このようにして製膜した光ディスクは、単
体で使用しても良く、2枚を貼り合わせて使用しても良
い。
The optical disc formed as described above may be used alone or may be used by laminating two optical discs.

【0022】[0022]

【作用】以上のような方法により、記録レーザーパワー
を大きくしても熱が周方向よりも半径方向に拡散される
ため、ジッタは増大しないことがわかった。
It has been found that the above method does not increase the jitter because the heat is diffused in the radial direction rather than the circumferential direction even if the recording laser power is increased.

【0023】[0023]

【実施例】以下、実施例及び比較例を用いて本発明を更
に詳細に説明する。
EXAMPLES The present invention will be described in more detail below with reference to examples and comparative examples.

【0024】(実施例)厚さ1.2mm、外径90mmの円
板で片面に1.6μmピッチのスパイラル状のグルーブ
を有するポリカーボネート樹脂よりなる基板を、自公転
の可能な基板取り付け部を有するスパッタリング装置内
に配置し、まずスパッタリング装置内を3×10-7torr
以下まで排気し、ArとN2との混合ガスの圧力が10m
torrで、かつ窒素ガスの含有量が5モル%の雰囲気中で
Siターゲットを用いて反応性スパッタを行ない、平均
膜厚が100nmのSiNXからなる誘電体層を形成し
た。
(Embodiment) A substrate made of a polycarbonate resin having a thickness of 1.2 mm and an outer diameter of 90 mm and having spiral grooves with a pitch of 1.6 μm on one side has a substrate mounting portion capable of rotating and revolving. Place it inside the sputtering system and first set the inside of the sputtering system to 3 × 10 -7 torr.
Evacuate to below and the pressure of the mixed gas of Ar and N 2 is 10 m
Reactive sputtering was performed using a Si target in a torr atmosphere containing 5 mol% of nitrogen gas to form a dielectric layer made of SiN x having an average film thickness of 100 nm.

【0025】次に、 Arガスの圧力が3mTorrでTbF
eCo合金ターゲットを用いて平均膜厚が25nmの記録
層を設けた。
Next, when the Ar gas pressure is 3 mTorr, TbF
A recording layer having an average film thickness of 25 nm was provided using an eCo alloy target.

【0026】更に、 上記と同様の方法で平均膜厚が約
30nmのSiNXからなる誘電体層を形成した。そして
最後に、 Arガスの圧力が5mTorrでAlTi合金ター
ゲットを用いて平均膜厚が約150nmの反射層を設けた
後、 Arガスの圧力を1mTorrとし、逆スパッタ法で平
均深さが約15nmだけエッチングし、厚さが約135nm
の表面が平滑の反射層を成膜した。また、この時のエッ
チングレートは0.05nm/秒とした。
Further, a dielectric layer made of SiN x having an average film thickness of about 30 nm was formed by the same method as described above. Finally, after forming a reflective layer with an average film thickness of about 150 nm using an AlTi alloy target with an Ar gas pressure of 5 mTorr, the Ar gas pressure was set to 1 mTorr and the average depth was only about 15 nm by the reverse sputtering method. Etched, thickness is about 135nm
A reflective layer having a smooth surface was formed. The etching rate at this time was 0.05 nm / sec.

【0027】以上の方法で製膜を行なった記録膜につい
て、光磁気ディスク評価装置を用いて記録再生特性の測
定を経時的に行なった。測定は波長830nmの半導体レ
ーザーを用い、ディスクの回転数は2,400rpm、記
録周波数3.9MHz、パルス幅60nsec、記録時バイア
ス磁界325ガウス、再生レーザー出力1.5mWの条件
において半径24.1mmの位置で記録レーザーパワーに
対するCNRを調べた。その結果を図4に示した。
The recording and reproducing characteristics of the recording film formed by the above method were measured with the use of a magneto-optical disk evaluation apparatus. A semiconductor laser with a wavelength of 830 nm was used for the measurement, the disc rotation speed was 2,400 rpm, the recording frequency was 3.9 MHz, the pulse width was 60 nsec, the recording bias magnetic field was 325 gauss, and the reproducing laser output was 1.5 mW. The CNR with respect to the recording laser power was examined at the position. The results are shown in Fig. 4.

【0028】(比較例1)実施例で使用したポリカーボ
ネート樹脂よりなる基板上に、実施例と同様の方法でS
iNXからなる誘電体層を100nm成膜し、 続いて実施
例と同様の方法で記録層を25nm、誘電体層を30nm順
次成膜し、最後に実施例と同様の方法で反射層をエッチ
ングすることなしに135nm成膜した。
(Comparative Example 1) On a substrate made of the polycarbonate resin used in the example, S was processed in the same manner as in the example.
A dielectric layer made of iN x is formed to a thickness of 100 nm, a recording layer is formed to a thickness of 25 nm and a dielectric layer is formed to a thickness of 30 nm in the same manner as in the embodiment, and finally the reflective layer is etched in the same manner as the embodiment. Without doing so, a film having a thickness of 135 nm was formed.

【0029】以上の方法で成膜した記録膜について実施
例と同様の方法で記録再生特性の測定を行ない、その結
果を図4に示した。図4に示した結果から、比較例1の
ディスクはCNRに対する記録レーザーパワーのマージ
ンは実施例と比較して劣っていることが理解できる。
The recording and reproducing characteristics of the recording film formed by the above method were measured by the same method as in the example, and the results are shown in FIG. From the results shown in FIG. 4, it can be understood that the disk of Comparative Example 1 is inferior in the margin of the recording laser power to the CNR as compared with the Example.

【0030】(比較例2)実施例で使用したポリカーボ
ネート樹脂よりなる基板上に、実施例と同様の方法でS
iNXからなる誘電体層を100nm成膜し、 続いて実施
例と同様の方法で記録層を25nm、誘電体層を30nm順
次成膜し、最後に実施例と同様の方法で平均膜厚が14
0nmの反射層を設けた後、平均深さが約5nmだけエッチ
ングし、平均膜厚が135nmの反射層を成膜した。
(Comparative Example 2) On a substrate made of the polycarbonate resin used in the example, S was processed in the same manner as in the example.
A dielectric layer made of iN x is formed to a thickness of 100 nm, a recording layer is sequentially formed to a thickness of 25 nm and a dielectric layer is formed to a thickness of 30 nm in the same manner as in the embodiment, and finally an average film thickness is formed in the same manner as in the embodiment. 14
After providing a 0 nm reflective layer, etching was performed to an average depth of about 5 nm to form a reflective layer having an average film thickness of 135 nm.

【0031】以上の方法で成膜した記録膜について実施
例と同様の方法で記録再生特性の測定を経時的に行な
い、その結果を図4に示した。図4に示した結果から、
比較例2のディスクはCNRに対する記録レーザーパワ
ーのマージンは実施例と比較して劣っていることが理解
できる。
The recording and reproducing characteristics of the recording film formed by the above method were measured with time in the same manner as in the example, and the results are shown in FIG. From the results shown in FIG.
It can be understood that the disc of Comparative Example 2 is inferior in the margin of the recording laser power to the CNR as compared with the Example.

【0032】(比較例3)実施例で使用したポリカーボ
ネート樹脂よりなる基板上に、実施例と同様の方法でS
iNXからなる誘電体層を100nm成膜し、 続いて実施
例と同様の方法で記録層を25nm、誘電体層を30nm順
次成膜し、最後にArガスの圧力が5mTorrでAlTi
合金ターゲットを用いて平均膜厚が150nmの反射層を
設けた後、Arガスの圧力が10mTorrで平均深さが約
15nmだけエッチングし、 平均膜厚が135nmの反射
層を成膜した。以上の方法で成膜した記録膜について実
施例と同様の方法で記録再生特性の測定を経時的に行な
った結果、比較例3のディスクはCNRに対する記録レ
ーザーパワーのマージンは実施例と比較して劣っている
ことがわかる。
(Comparative Example 3) On a substrate made of the polycarbonate resin used in the example, S was processed in the same manner as in the example.
A dielectric layer made of iN x is formed to a thickness of 100 nm, a recording layer is formed to a thickness of 25 nm and a dielectric layer is formed to form a thickness of 30 nm in the same manner as in the example, and finally, the pressure of Ar gas is 5 mTorr and AlTi is formed.
After forming a reflective layer having an average film thickness of 150 nm using an alloy target, etching was performed at an Ar gas pressure of 10 mTorr and an average depth of approximately 15 nm to form a reflective layer having an average film thickness of 135 nm. The recording and reproducing characteristics of the recording film formed by the above method were measured with time in the same manner as in the example. As a result, the disc of Comparative Example 3 had a margin of the recording laser power with respect to the CNR as compared with the Example. You can see that it is inferior.

【効果】記録レーザーパワーが大きくなってもジッタが
増大しないことから、CNRに対する記録レーザーパワ
ーのマージンが大きくなる。このマージンの向上はレー
ザー雑音、クロストーク、回路雑音、振動等の外乱によ
る記録レーザーパワーの変動に対して誤った信号を書き
込む確率を低減させ、ドライブ設計を容易にする働きを
する。
[Effect] Since the jitter does not increase even when the recording laser power increases, the margin of the recording laser power with respect to the CNR increases. The improvement of this margin reduces the probability of writing an erroneous signal with respect to fluctuations in the recording laser power due to disturbances such as laser noise, crosstalk, circuit noise, and vibration, and facilitates drive design.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例の光磁気記録媒体の層構成を示
す模式の断面図である。
FIG. 1 is a schematic sectional view showing a layer structure of a magneto-optical recording medium according to an example of the present invention.

【図2】本発明の比較例1の光磁気記録媒体の層構成を
示す模式の断面図である。
FIG. 2 is a schematic cross-sectional view showing the layer structure of a magneto-optical recording medium of Comparative Example 1 of the present invention.

【図3】本発明の比較例2の光磁気記録媒体の層構成を
示す模式の断面図である。
FIG. 3 is a schematic cross-sectional view showing the layer structure of a magneto-optical recording medium of Comparative Example 2 of the present invention.

【図4】実施例及び比較例1、2、3及び4における記
録レーザーパワーに対するCNRとの関係を示した図表
である。
FIG. 4 is a chart showing the relationship between recording laser power and CNR in Examples and Comparative Examples 1, 2, 3 and 4.

【符号の説明】[Explanation of symbols]

1 反射層 2 誘電体からなる保護層 3 磁性体からなる記録層 4 誘電体からなる保護層 ○ 実施例 △ 比較例1 □ 比較例2 × 比較例3 DESCRIPTION OF SYMBOLS 1 Reflective layer 2 Protective layer made of a dielectric material 3 Recording layer made of a magnetic material 4 Protective layer made of a dielectric material ○ Example △ Comparative example 1 □ Comparative example 2 × Comparative example 3

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 ランド部及びグルーブ部を有する基板上
に、透明な誘電体からなる保護層、磁性体からなる記録
層及び反射層から成る多層構造の記録膜を有するディス
ク状の光磁気記録媒体において、反射層のグルーブ部上
での膜厚が記録を行なうランド部上での膜厚よりも大き
いことを特徴とする光磁気記録媒体。
1. A disk-shaped magneto-optical recording medium having a multi-layered recording film including a protective layer made of a transparent dielectric material, a recording layer made of a magnetic material, and a reflective layer on a substrate having a land portion and a groove portion. 2. The magneto-optical recording medium as described above, wherein the film thickness on the groove portion of the reflective layer is larger than the film thickness on the land portion for recording.
JP13456893A 1993-06-04 1993-06-04 Magneto-optical recording medium Pending JPH06349121A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13456893A JPH06349121A (en) 1993-06-04 1993-06-04 Magneto-optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13456893A JPH06349121A (en) 1993-06-04 1993-06-04 Magneto-optical recording medium

Publications (1)

Publication Number Publication Date
JPH06349121A true JPH06349121A (en) 1994-12-22

Family

ID=15131387

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13456893A Pending JPH06349121A (en) 1993-06-04 1993-06-04 Magneto-optical recording medium

Country Status (1)

Country Link
JP (1) JPH06349121A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003067909A (en) * 2001-08-24 2003-03-07 Fuji Electric Co Ltd Perpendicular magnetic recording medium
JP4534402B2 (en) * 2001-09-13 2010-09-01 富士電機デバイステクノロジー株式会社 Perpendicular magnetic recording medium and manufacturing method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003067909A (en) * 2001-08-24 2003-03-07 Fuji Electric Co Ltd Perpendicular magnetic recording medium
JP4534402B2 (en) * 2001-09-13 2010-09-01 富士電機デバイステクノロジー株式会社 Perpendicular magnetic recording medium and manufacturing method thereof

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