JPH06322073A - Epoxy resin composition - Google Patents

Epoxy resin composition

Info

Publication number
JPH06322073A
JPH06322073A JP10903493A JP10903493A JPH06322073A JP H06322073 A JPH06322073 A JP H06322073A JP 10903493 A JP10903493 A JP 10903493A JP 10903493 A JP10903493 A JP 10903493A JP H06322073 A JPH06322073 A JP H06322073A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
formula
general formula
curing accelerator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10903493A
Other languages
Japanese (ja)
Inventor
Hiroyoshi Kokado
博義 小角
Masaji Ogata
正次 尾形
Kuniyuki Eguchi
州志 江口
Kazuhiro Suzuki
和弘 鈴木
Toshiaki Ishii
利昭 石井
Hirooki Koujima
博起 幸島
Hiroshi Suzuki
宏 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP10903493A priority Critical patent/JPH06322073A/en
Publication of JPH06322073A publication Critical patent/JPH06322073A/en
Pending legal-status Critical Current

Links

Landscapes

  • Epoxy Resins (AREA)

Abstract

PURPOSE:To obtain an epoxy resin composition reduced in the formation of halogen gases at high temperatures, improved in storage stability and moldability and having low hygroscopicity by mixing a specified biphenyl-derived epoxy resin with a curing agent and a cure accelerator. CONSTITUTION:This resin composition is prepared by mixing a biphenyl-derived epoxy resin (A) of formula I (wherein R is H or methyl; and (n) is 0-2) with 0.5-1.5 equivalents, per equivalent of component A, of a curing agent (B) of formula II (wherein (m) is 1-10), 1-15mmol, per 100 pts.wt. component A, of a cure accelerator (C) of formula III (wherein R<1> to R<6> are each phenyl, butyl or a cyclohexane ring), and optionally 50-90vol.% inorganic filler (D) of a mean particle diameter of 0.1-30mum.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は積層板、電子部品等の封
止に適したエポキシ樹脂組成物に係り、特に、貯蔵安定
性,成形性に優れ、得られる硬化物が高温での遊離性ハ
ロゲンの発生量が少なく、低吸湿性のエポキシ樹脂組成
物に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition suitable for encapsulating laminated plates, electronic parts, etc., and in particular, it has excellent storage stability and moldability, and the cured product obtained is free at high temperatures. The present invention relates to an epoxy resin composition having a low amount of halogen generation and a low hygroscopicity.

【0002】[0002]

【従来の技術】エポキシ樹脂は電気機器、電子部品等の
分野において、絶縁材料、コート材料、封止材料、積層
材料、プリプレグ材料として応用面が拡大されるに伴な
い、その性能に対する要求もますます厳しくなってきて
いる。
2. Description of the Related Art Epoxy resins are required to have higher performance as their applications are expanded as insulating materials, coating materials, encapsulating materials, laminating materials, and prepreg materials in the fields of electric equipment and electronic parts. It is getting tougher.

【0003】特に、エレクトロニクス機器は小型軽量
化、高性能化などのニーズから、それに用いられる半導
体部品は高密度実装が強く要望され、最近では実装の高
密度化に適した表面実装型半導体が主流になりつゝあ
る。更に、パッケージは年々小型薄型化の趨勢にあり、
厚さが1mmの薄型パッケージはすでに実用化され、最
近では厚さ0.5mm以下のパッケージの開発が行われ
ている。
In particular, since electronic devices are required to be small and lightweight and have high performance, high density mounting of semiconductor parts used therefor is strongly demanded, and recently, a surface mounting type semiconductor suitable for high density mounting is mainstream. There is. Furthermore, packages are becoming smaller and thinner year after year,
A thin package with a thickness of 1 mm has already been put to practical use, and recently, a package with a thickness of 0.5 mm or less has been developed.

【0004】実装密度向上策の一環としては、(1)基
板表面に部品をはんだ付けする表面実装方式、(2)電
子部品をプリント基板内に実装する方法等が提案されて
いる。特に、表面実装方式は実装の際のパッケージ温度
が200℃以上にもなるため、パッケージ内に多量の水
分が存在すると急激に気化して体積が膨張し、その蒸気
圧によってチップと封止材料との界面が剥離したり、パ
ッケージが破壊したりする要因になる。これらはいずれ
も素子の信頼性を損なう。
As a measure for improving the mounting density, there have been proposed (1) a surface mounting method of soldering a component on the surface of a substrate, (2) a method of mounting an electronic component on a printed circuit board, and the like. Particularly, in the surface mounting method, the package temperature at the time of mounting reaches 200 ° C. or more, so that when a large amount of water is present in the package, it is rapidly vaporized and its volume expands, and its vapor pressure causes the chip and the sealing material to be separated. May cause the interface of the product to peel off or the package to break. All of these impair the reliability of the device.

【0005】しかし、従来の樹脂、硬化剤、硬化促進剤
等を含む樹脂組成物では、上記のようなニーズに十分応
えられなくなっている。
However, conventional resin compositions containing a resin, a curing agent, a curing accelerator, etc. cannot fully meet the above needs.

【0006】半導体等の電子部品の樹脂封止法として、
封止材料のコスト低減や量産性向上を目的に、成形機の
自動化並びに成形後に不要となるランナー、スプルー等
を極力低減したマルチポット成形が行われているが、特
に、封止樹脂材料をミニタブレットにしたマルチポット
方式では、ポットライフの優れた封止樹脂が要求され
る。しかしながら、各種信頼性、特に、耐湿性とポット
ライフを同時に満足する封止樹脂は未だに開発されてお
らず、封止樹脂材料の高性能化が強く望まれている。
As a resin sealing method for electronic parts such as semiconductors,
For the purpose of cost reduction and mass productivity improvement of the encapsulation material, automation of the molding machine and multi-pot molding that reduces runners, sprues, etc. that are unnecessary after molding have been performed as much as possible. The tablet-type multi-pot method requires a sealing resin with an excellent pot life. However, a sealing resin that satisfies various reliability, particularly moisture resistance and pot life at the same time, has not yet been developed, and high performance of the sealing resin material is strongly desired.

【0007】上記に対し、封止樹脂のガラス転移温度を
上げたり、吸湿率の低減や接着力の向上または潜在性硬
化促進剤などの検討がなされてきた。特に、薄型の半導
体パッケージにおいては封止樹脂材料の低吸湿化並びに
高接着化が有効である。具体的には封止用樹脂としてビ
フェニル骨格を有するエポキシ樹脂とフェノールアラル
キル樹脂硬化剤からなるエポキシ樹脂組成物(特開平3
−207714号,特開平4−48759号公報)を用
いたり、ナフタレン骨格を有する低吸湿性のエポキシ樹
脂組成物(特開平4−50223号,特開平4−199
856号,特開平4−199857号公報)等を用いた
例が開示されている。
In contrast to the above, studies have been made on increasing the glass transition temperature of the encapsulating resin, reducing the moisture absorption rate, improving the adhesive strength, or a latent curing accelerator. Particularly in a thin semiconductor package, it is effective to reduce the moisture absorption and increase the adhesion of the sealing resin material. Specifically, an epoxy resin composition comprising an epoxy resin having a biphenyl skeleton as a sealing resin and a curing agent for a phenol aralkyl resin (Japanese Patent Laid-Open No. Hei 3 (1998)
No. 207714, JP-A-4-48759), or a low hygroscopic epoxy resin composition having a naphthalene skeleton (JP-A-4-502223, JP-A-4-199).
No. 856, Japanese Patent Application Laid-Open No. 4-199857) and the like are disclosed.

【0008】[0008]

【発明が解決しようとする課題】しかし、前記従来技術
において、例えば、半導体装置の封止材料に適用する
と、はんだリフロー時のパッケージクラックの発生を防
止する効果はかなりあるものゝ、封止樹脂が貯蔵時に吸
湿すると硬化性が著しく低下したり、溶融粘度の上昇に
よって流動性が著しく低下すると云った問題があり、封
止材料の品質や保管条件を厳密に管理しないと実用に供
さないと云う問題があった。
However, in the above-mentioned prior art, when it is applied to a sealing material for a semiconductor device, for example, it has a considerable effect of preventing the generation of package cracks during solder reflow. When moisture is absorbed during storage, there is a problem that curability is significantly reduced, and fluidity is significantly reduced due to an increase in melt viscosity, and it is said that it will not be put to practical use unless the quality and storage conditions of the sealing material are strictly controlled. There was a problem.

【0009】また、半導体等の電子部品の封止品を高温
で放置すると、Auワイヤ/Al電極またはAu電極/
Alワイヤの接合部が遊離性ハロゲンによって腐食され
易いと云う問題があった。
[0009] Further, if a sealed product of an electronic component such as a semiconductor is left at high temperature, Au wire / Al electrode or Au electrode /
There is a problem that the joint portion of the Al wire is easily corroded by the free halogen.

【0010】本発明は上記のような状況に鑑みてなされ
たもので、その目的とするところは、貯蔵安定性,成形
性が優れ、高接着力と低吸湿性で、高温加熱による遊離
性ハロゲンの発生量が少ないエポキシ樹脂組成物を提供
することにある。
The present invention has been made in view of the above circumstances, and its object is to provide a storage halogen and a moldability which are excellent, a high adhesive strength and a low hygroscopicity, and a free halogen which is heated at a high temperature. An object of the present invention is to provide an epoxy resin composition in which the generation amount of

【0011】[0011]

【課題を解決するための手段】本発明者らは、上記課題
を解決するため前記特性に及ぼす硬化促進剤を始めガラ
ス繊維、ガラスクロス、充填剤、カップリング剤、離型
剤等の影響、各素材の混合条件並びに成形条件について
鋭意検討した。その結果、上記課題は特定のエポキシ樹
脂,硬化剤,硬化促進剤を用いることによって飛躍的な
改善が図れることを見出し本発明に至った。本発明の要
旨は次のとおりである。
Means for Solving the Problems In order to solve the above-mentioned problems, the inventors of the present invention have the effects of glass fibers, glass cloth, fillers, coupling agents, release agents, etc. The mixing conditions of each material and the molding conditions were thoroughly studied. As a result, they have found that the above problems can be dramatically improved by using a specific epoxy resin, a curing agent, and a curing accelerator, and completed the present invention. The gist of the present invention is as follows.

【0012】(a)一般式〔1〕(A) General formula [1]

【0013】[0013]

【化7】 [Chemical 7]

【0014】(式中、Rは水素原子またはメチル基を示
し互いに異なっていてもよい、nは0〜2の整数を示
す。)で表されるビフェニル型エポキシ樹脂、 (b)一般式〔2〕
(Wherein R represents a hydrogen atom or a methyl group and may be different from each other, n represents an integer of 0 to 2), and (b) a general formula [2. ]

【0015】[0015]

【化8】 [Chemical 8]

【0016】(式中、mは1〜10の整数を示す。)で
表される硬化剤、 (c)一般式〔3〕
(Wherein m represents an integer of 1 to 10), (c) general formula [3]

【0017】[0017]

【化9】 [Chemical 9]

【0018】(式中、R1〜R6はフェニル基,ブチル
基,シクロヘキサン環を示し互いに異なっていてもよ
い。)で表される硬化促進剤、を含むことを特徴とする
エポキシ樹脂組成物。
(In the formula, R 1 to R 6 represent a phenyl group, a butyl group and a cyclohexane ring and may be different from each other.) A curing accelerator represented by the formula: .

【0019】前記一般式〔1〕で表されるエポキシ樹脂
は1分子当り2個以上のエポキシ基とビフェニル骨格を
有するビフェニル型エポキシ樹脂である。
The epoxy resin represented by the above general formula [1] is a biphenyl type epoxy resin having two or more epoxy groups per molecule and a biphenyl skeleton.

【0020】なお、本発明の目的を損なわない範囲にお
いて、エポキシ樹脂には他の一般的に使用されているビ
スフェノールA型,F型またはS型エポキシ樹脂、ノボ
ラック型エポキシ樹脂、o−クレゾールノボラック型エ
ポキシ樹脂、ナフタレン骨格を有する多官能のエポキシ
樹脂、トリまたはテトラ(ヒドロキシフェニル)アルカ
ンのエポキシ樹脂、脂環式エポキシ樹脂等を併用するこ
とができる。
It should be noted that bisphenol A-type, F-type or S-type epoxy resins, novolac-type epoxy resins, o-cresol novolac-type epoxy resins, which are other commonly used epoxy resins, are used within a range that does not impair the object of the present invention. An epoxy resin, a polyfunctional epoxy resin having a naphthalene skeleton, an epoxy resin of tri- or tetra (hydroxyphenyl) alkane, an alicyclic epoxy resin and the like can be used in combination.

【0021】前記一般式〔2〕で表される硬化剤は1分
子当り少なくとも2個の水酸基を有するフェノールとア
ラルキルエーテルとの重縮合物であり、上記エポキシ樹
脂に対して0.5〜1.5当量、好ましくは0.8〜1.2
当量配合する。0.5当量未満では、エポキシ樹脂の硬
化が不十分となり硬化物の耐熱性、耐湿性並びに電気特
性が劣る。また、1.5当量を超えると逆に硬化剤成分
が過剰になり硬化樹脂中に多量のフェノール性水酸基が
残るため、電気特性並びに耐湿性が悪くなる。なお、本
発明の目的を損なわない範囲において、フェノールノボ
ラック樹脂のような他のフェノール類との縮合物を併用
することもできる。
The curing agent represented by the above general formula [2] is a polycondensation product of a phenol having at least two hydroxyl groups per molecule and an aralkyl ether, which is 0.5 to 1. 5 equivalents, preferably 0.8-1.2
Add the equivalent amount. If the amount is less than 0.5 equivalents, the curing of the epoxy resin will be insufficient and the cured product will have poor heat resistance, moisture resistance and electrical properties. On the other hand, if the amount exceeds 1.5 equivalents, the curing agent component becomes excessive and a large amount of phenolic hydroxyl groups remain in the cured resin, resulting in poor electrical characteristics and moisture resistance. In addition, a condensate with another phenol such as a phenol novolac resin can be used together within a range not impairing the object of the present invention.

【0022】前記一般式〔3〕で表される硬化促進剤は
有機ホスフィン系化合物の有機ボロン塩である。具体的
にはトリフェニルホスフィン・トリフェニルボロン、ト
リブチルホスフィン・トリフェニルボロン、トリシクロ
ヘキシルホスフィン・トリフェニルボロンなどである。
The curing accelerator represented by the general formula [3] is an organic boron salt of an organic phosphine compound. Specific examples include triphenylphosphine / triphenylboron, tributylphosphine / triphenylboron, tricyclohexylphosphine / triphenylboron and the like.

【0023】上記硬化促進剤は通常の硬化促進剤と全く
同様に用いることができるが、成形時に発生するボイド
を低減するためには、硬化促進剤は予め硬化剤に加熱
(120℃以上)溶解して用いることが望ましい。硬化
促進剤はエポキシ樹脂100重量部に対して1〜15m
mol、望ましくは5〜10mmolの範囲で配合する
ことが望ましい。
The above-mentioned curing accelerator can be used in the same manner as a usual curing accelerator. However, in order to reduce voids generated during molding, the curing accelerator is previously heated (120 ° C. or more) and dissolved in the curing agent. It is desirable to use. The curing accelerator is 1 to 15 m with respect to 100 parts by weight of the epoxy resin.
It is desirable to mix in the range of mol, preferably 5 to 10 mmol.

【0024】本発明のエポキシ樹脂組成物を半導体の封
止材料や一般の成形材料に適用する場合には、必要に応
じて組成物全体に対して無機充填剤は50〜90容量%
配合することができる。無機充填剤は硬化物の熱膨張係
数や熱伝導率、弾性率などの改良を目的に添加するもの
である。従って、50容量%未満ではこれらの特性の改
良を十分に行えず、また、90容量%を超えると粘度が
著しく上昇し流動性が低下して成形が難しくなる。こう
した無機充填剤としては溶融シリカ、結晶シリカ、アル
ミナ、炭酸カルシウム、ケイ酸ジルコニウム、ケイ酸カ
ルシウム、タルク、クレー、マイカ等の微粉末を用いる
ことができる。
When the epoxy resin composition of the present invention is applied to a semiconductor encapsulating material or a general molding material, the inorganic filler may be contained in an amount of 50 to 90% by volume based on the whole composition, if necessary.
It can be blended. The inorganic filler is added for the purpose of improving the thermal expansion coefficient, thermal conductivity and elastic modulus of the cured product. Therefore, if it is less than 50% by volume, these properties cannot be sufficiently improved, and if it exceeds 90% by volume, the viscosity is remarkably increased and the fluidity is lowered to make molding difficult. As such an inorganic filler, fine powder of fused silica, crystalline silica, alumina, calcium carbonate, zirconium silicate, calcium silicate, talc, clay, mica and the like can be used.

【0025】これらの充填剤の平均粒径は0.1〜30
μmの範囲が望ましく、平均粒径が0.1μm未満では
樹脂組成物の粘度を著しく上昇し、成形が難しくなる。
また、平均粒径が30μmを超えると成形時に樹脂成分
と充填剤が分離し易くなって、硬化物が不均一になるた
め物性にばらつきが生じたり、狭い隙間への充填性が低
下する。特に、充填剤を75容量%以上配合する場合、
充填剤の形状は角形より球形品の占める割合の大きい方
がが好ましく、かつ、粒度分布が0.1〜100μmの
広い範囲に分布するものが望ましい。このような充填剤
は最密充填構造をとり易いため配合量を増しても材料の
粘度上昇が比較的起こりにくいので流動性の優れた組成
物を得ることができる。
The average particle size of these fillers is 0.1 to 30.
The range of μm is desirable, and when the average particle size is less than 0.1 μm, the viscosity of the resin composition is remarkably increased and molding becomes difficult.
On the other hand, if the average particle size exceeds 30 μm, the resin component and the filler are easily separated during molding, and the cured product becomes non-uniform, resulting in variations in physical properties and deterioration of the filling property into narrow gaps. Especially when the filler is blended in an amount of 75% by volume or more,
The shape of the filler is preferably such that the proportion of spherical products is larger than that of prisms, and the one having a particle size distribution in a wide range of 0.1 to 100 μm is desirable. Since such a filler tends to have a close-packed structure, the viscosity of the material is relatively unlikely to increase even if the blending amount is increased, so that a composition having excellent fluidity can be obtained.

【0026】本発明のエポキシ樹脂組成物を積層板に適
用するには、ガラスクロスにエポキシ樹脂組成物を含浸
させた後、予備硬化(Bステージ化)を行ってプリプレ
グを作製し、得られたプリプレグを必要に応じて複数枚
積層し接着することによって積層板を得ることができ
る。この際エポキシ樹脂組成物として、前記充填剤を配
合したものを用いると、通常の積層板に比べて熱膨張係
数が小さい積層板を得ることができる。
In order to apply the epoxy resin composition of the present invention to a laminate, a glass cloth is impregnated with the epoxy resin composition, and then pre-cured (B-staged) to prepare a prepreg. A laminated board can be obtained by laminating and adhering a plurality of prepregs as needed. At this time, when an epoxy resin composition containing the above-mentioned filler is used, a laminated board having a smaller thermal expansion coefficient than an ordinary laminated board can be obtained.

【0027】本発明では必要に応じて樹脂硬化物の強靱
化や低弾性率化のために可撓化剤等を用いることができ
る。可撓化剤はエポキシ樹脂組成物と非相溶のもがガラ
ス転移温度を下げずに硬化物の低弾性率化が図れる。こ
のような可撓化剤としては、ブタジェン・アクリルニト
リル系共重合体やそれらの末端または側鎖にアミノ基、
エポキシ基、カルボキル基を有する変性共重合体、アク
リロニトリル・ブタジェン・スチレン共重合体等のブタ
ジェン系可撓化剤、末端または側鎖にアミノ基、水酸
基、エポキシ基、カルボキシル基を有するシリコーン系
のエラストマー等が挙げられるが、耐湿性や純度の点か
らシリコーン系可撓化剤が特に有用である。 可撓化剤
の配合量は全樹脂組成物に対して2〜20重量%の範囲
が好ましい。可撓化剤の配合量が2重量%未満では硬化
物の強靱化や低弾性率化に対してほとんど効果がない。
また、20重量%を超えると樹脂組成物の流動性や高温
の機械的強度が極端に低下したり、可撓化剤が樹脂硬化
物表面に浮きでることにより、成形金型の汚れが顕著に
なる。
In the present invention, a flexibilizing agent or the like can be used as required to strengthen the resin cured product and reduce the elastic modulus. Although the flexibilizer is incompatible with the epoxy resin composition, the elastic modulus of the cured product can be lowered without lowering the glass transition temperature. As such a flexibilizing agent, a butadiene-acrylonitrile-based copolymer or an amino group at the terminal or side chain thereof,
Modified copolymers having epoxy groups and carboxyl groups, butadiene-based flexibilizers such as acrylonitrile-butadiene-styrene copolymers, silicone-based elastomers having amino groups, hydroxyl groups, epoxy groups or carboxyl groups at the terminals or side chains. The silicone-based flexibilizing agent is particularly useful in terms of moisture resistance and purity. The blending amount of the flexibilizer is preferably in the range of 2 to 20% by weight based on the total resin composition. When the blending amount of the flexibilizing agent is less than 2% by weight, there is almost no effect on the toughness and low elastic modulus of the cured product.
On the other hand, if it exceeds 20% by weight, the fluidity of the resin composition and the mechanical strength at high temperature are extremely lowered, and the flexibilizer floats on the surface of the cured resin, so that the molding die is significantly soiled. Become.

【0028】本発明の樹脂組成物には上記の他に必要に
応じて、樹脂成分とガラス繊維,ガラスクロスや無機充
填剤との接着性を高めるためのカップリング剤として、
各種シラン系化合物、チタン系化合物、アルミニウムキ
レート類、アルミニウム/ジルコニウム系化合物等の公
知の化合物を用いることができる。更に、離型剤とし
て、カルナバワックス、モンタン酸系ワックス、ポリア
ルキレン系ワックス等公知の化合物を用いることができ
る。また、着色剤としてはカーボンブラック、酸化チタ
ン、鉛丹、ベンガラ等の公知の化合物を用いることがで
きる。
In addition to the above, the resin composition of the present invention may optionally contain, as a coupling agent for increasing the adhesiveness between the resin component and the glass fiber, glass cloth or inorganic filler,
Known compounds such as various silane compounds, titanium compounds, aluminum chelates, and aluminum / zirconium compounds can be used. Further, known compounds such as carnauba wax, montanic acid wax, and polyalkylene wax can be used as the release agent. As the colorant, known compounds such as carbon black, titanium oxide, red lead and red iron oxide can be used.

【0029】[0029]

【作用】本発明のエポキシ樹脂組成物が優れた貯蔵安定
性を示すのは、硬化促進剤として使用した有機ホスフィ
ン化合物の有機ボロン塩が、室温付近では硬化反応を余
り促進せず、150℃以上で速やかな硬化反応の促進性
を示す性質があるためである。
The epoxy resin composition of the present invention exhibits excellent storage stability because the organic boron salt of the organic phosphine compound used as the curing accelerator does not accelerate the curing reaction at around room temperature and is 150 ° C. or higher. This is because it has the property of promptly promoting the curing reaction.

【0030】また、この硬化促進剤は材料を保管中に吸
湿しても硬化反応の促進の活性があまり変化しないこと
も理由の一つとして挙げられる。
Another reason is that the activity of accelerating the curing reaction does not change so much even if the material absorbs moisture during storage.

【0031】また、本発明の樹脂組成物が成形時にボイ
ドの発生が少なく良好な成形性を示すのは、エポキシ樹
脂や硬化剤成分中に含まれる低分子量成分と硬化促進剤
が比較的低温で選択的に反応し、樹脂が硬化する際に発
生する揮発性成分を低減させる効果があるためと考えら
れる。特に、硬化促進剤を予め硬化剤と120℃以上の
温度で加熱溶解して用いると、ボイドが一層低減できる
のは上記の効果がより顕著に現れるためではないかと考
えられる。
Further, the resin composition of the present invention shows good moldability with little generation of voids at the time of molding, because the low molecular weight component and the curing accelerator contained in the epoxy resin and the curing agent component are relatively low in temperature. It is considered that this is because it has an effect of selectively reacting and reducing volatile components generated when the resin is cured. In particular, it is considered that the void can be further reduced if the curing accelerator and the curing agent are preliminarily heated and dissolved at a temperature of 120 ° C. or higher because the above effect is more prominent.

【0032】本発明のエポキシ樹脂組成物の硬化物を2
00℃以上の高温に放置した場合に、遊離性ハロゲン化
合物の発生が少ないのは、硬化物を高温に放置した際に
硬化物の表面に生成する酸化物が、比較的安定で酸化劣
化が試料の内部へ進行しにくいためと考える。また、充
填剤を配合した成形品の場合には、ボイドや巣などの欠
陥が少ない緻密な成形品が得られることも一因と考えら
れる。
The cured product of the epoxy resin composition of the present invention is
The generation of free halogen compounds is small when left at a high temperature of 00 ° C or higher because the oxide formed on the surface of the cured product when the cured product is left at a high temperature is relatively stable and oxidative deterioration This is because it is difficult to proceed inside. Further, in the case of a molded product containing a filler, it is considered that a dense molded product with few defects such as voids and cavities can be obtained.

【0033】次に、本発明のエポキシ樹脂組成物が従来
の樹脂系に比べて低吸湿性を示す理由は、ビフェニル型
エポキシ樹脂は従来の樹脂に比べて化学構造的に疎水性
を有すること、また、硬化物が高い密度を有することか
ら分子鎖のパッキングが密になっており、形成された網
目構造が水を透過させにくいためと考えられる。
Next, the reason why the epoxy resin composition of the present invention exhibits a lower hygroscopicity than the conventional resin system is that the biphenyl type epoxy resin is chemically structurally hydrophobic as compared with the conventional resin. Further, it is considered that since the cured product has a high density, the packing of the molecular chains is dense, and the formed network structure is less likely to allow water to permeate.

【0034】また、高い接着力を示すのは硬化物のガラ
ス転移温度が低いこと及び樹脂の柔軟性が高いために、
硬化樹脂中に発生する残留応力が小さいためと考えられ
る。特に、本発明のエポキシ樹脂組成物において、この
ような特性が発揮されるのは本発明が用いている硬化促
進剤が、分子のパッキングを密にしたり、樹脂の柔軟性
を高める効果が大きいためと考えられる。また、硬化促
進剤が潜在的な反応の促進性を有するため樹脂組成物の
溶融粘度が低くなり、被接着体に対する樹脂組成物の濡
れ性が良好なためと考えられる。
The high adhesive strength is due to the low glass transition temperature of the cured product and the high flexibility of the resin.
It is considered that the residual stress generated in the cured resin is small. In particular, in the epoxy resin composition of the present invention, such characteristics are exhibited because the curing accelerator used in the present invention has a large effect of densely packing the molecules and increasing the flexibility of the resin. it is conceivable that. Further, it is considered that the curing accelerator has a latent reaction accelerating property, so that the melt viscosity of the resin composition becomes low and the wettability of the resin composition with respect to the adherend is good.

【0035】本発明の硬化促進剤がこのように優れた効
果があることは全く予想できなかったことである。
It was totally unexpected that the curing accelerator of the present invention had such excellent effects.

【0036】[0036]

【実施例】以下、本発明を実施例を示して更に具体的に
説明する。
EXAMPLES The present invention will be described more specifically below with reference to examples.

【0037】〔実施例1〜5及び比較例1〜2〕表1に
示すエポキシ樹脂組成物を約60〜100℃に加熱した
二軸ロールで約10分間溶融混練した後、冷却、粉砕し
て目的の封止材料を得た。なお、実施例4〜5は硬化促
進剤を予めフェノールアラルキル樹脂と140℃で15
分間加熱溶融させて使用した例である。
[Examples 1 to 5 and Comparative Examples 1 and 2] The epoxy resin compositions shown in Table 1 were melt-kneaded with a biaxial roll heated to about 60 to 100 ° C for about 10 minutes, then cooled and pulverized. The target sealing material was obtained. In addition, in Examples 4 to 5, the curing accelerator was previously mixed with the phenol aralkyl resin at 140 ° C. for 15 minutes.
This is an example of using after heating and melting for a minute.

【0038】こうして得られた封止材料を180℃、7
0kg/cm2、90秒間の条件でトランスファ成形
し、封止材料の製造直後の成形性並びに成形品の諸特性
を測定し評価した。測定結果を表2に示す。
The sealing material thus obtained was heated at 180 ° C. for 7 hours.
Transfer molding was performed under conditions of 0 kg / cm 2 and 90 seconds, and the moldability immediately after the production of the sealing material and various characteristics of the molded product were measured and evaluated. The measurement results are shown in Table 2.

【0039】[0039]

【表1】 [Table 1]

【0040】表中、溶融粘度は180℃に加熱した高化
式フローテスターの金型のノズル(内径1mmφ×長さ
10mm)から2gの封止材料を荷重0.98MPaで
押し出した時の最大流速から計算で求めた。
In the table, the melt viscosity is the maximum flow rate when 2 g of the sealing material is extruded with a load of 0.98 MPa from a die nozzle (inner diameter 1 mmφ × length 10 mm) of a high-level flow tester heated to 180 ° C. Calculated from

【0041】スパイラルフローはEMMI−1−66に
定められたスパイラルフロー測定用金型をトランスファ
成形機の上下熱板間に挟持し、20gの封止材料を上記
条件で成形したときの成形品の長さで評価した。
For spiral flow, a mold for spiral flow measurement specified in EMMI-1-66 is sandwiched between upper and lower hot plates of a transfer molding machine, and 20 g of a sealing material is molded under the above conditions. The length was evaluated.

【0042】熱時硬度は直径20mmφの円板をトラン
スファ成形して成形金型が開いた直後の円板の熱時硬度
をバーコル硬度計で測定した。
The hot hardness was measured by using a Barcol hardness tester, which was obtained by transfer molding a disc having a diameter of 20 mmφ, and immediately after the molding die was opened.

【0043】成形品の内部ボイドは上記直径20mmφ
の円板をソフトX線透視装置で観察して評価した。
The internal void of the molded product has the above diameter of 20 mmφ.
The disc was observed with a soft X-ray fluoroscope and evaluated.

【0044】飽和吸湿率は直径90mmφ×厚さ2mm
の円板を四弗化エチレン−SUS二重圧力容器に入れ
て、60℃/100%RHの雰囲気中で240時間吸湿
させたときの吸湿率とした。
Saturated moisture absorption rate is 90 mm diameter x 2 mm thickness
The disc was placed in a double pressure vessel of tetrafluoroethylene-SUS and was allowed to absorb moisture in an atmosphere of 60 ° C./100% RH for 240 hours.

【0045】表3には各封止材料を40℃/湿度20%
RH及び40℃/湿度60%RH下にそれぞれ7日間保
管したときの流動性(スパイラルフロー)並びに硬化性
(熱時硬度)の経時変化を示した。
Table 3 shows each sealing material at 40 ° C./humidity of 20%.
The changes over time in the fluidity (spiral flow) and the curability (hardness at the time of heating) when stored for 7 days under RH and 40 ° C./humidity 60% RH were shown.

【0046】[0046]

【表2】 [Table 2]

【0047】[0047]

【表3】 [Table 3]

【0048】表2より、本実施例の封止材料はボイドの
発生が少なく成形性が優れ、成形品は低吸湿性、高接着
性であることが分かる。
From Table 2, it can be seen that the encapsulating material of this example has few voids and excellent moldability, and the molded product has low hygroscopicity and high adhesiveness.

【0049】また、表3より、比較例の封止材料は40
℃/20%RH及び60%RHに保管した場合に流動性
が低下し、さらに、40℃/60%RHに保管した場合
には硬化性も低下する。しかし、本願の封止材料は流動
性並びに硬化性の変化が小さく、貯蔵安定性が優れてい
ることが分かる。
Further, from Table 3, the sealing material of the comparative example is 40
When stored at ℃ / 20% RH and 60% RH, the fluidity decreases, and when stored at 40 ° C / 60% RH, the curability also decreases. However, it can be seen that the sealing material of the present application has a small change in fluidity and curability and is excellent in storage stability.

【0050】次に、封止材料を180℃、70kg/c
2、90秒間の条件でトランスファ成形して直径90
mmφ×厚さ2mmの円板を得た。該円板を180℃の
恒温槽で所定時間加熱処理後、ミル粉砕機TI−100
型(HEIKO社製)で粉砕し、その微粉末5gを純水
50mlとともにポリ四弗化エチレン−SUS二重圧力
容器に入れて120℃で300時間加熱した。純水に抽
出された遊離性ハロゲンイオンをイオンクロマトグラフ
10型(Dionex社製)で測定した。結果を表4に
示す。
Next, the sealing material was applied at 180 ° C. and 70 kg / c.
m 2 for 90 seconds, transfer molding and diameter 90
A disk of mmφ × thickness 2 mm was obtained. The disc was heat-treated in a thermostat at 180 ° C. for a predetermined time, and then mill mill TI-100.
It was pulverized with a mold (manufactured by HEIKO), and 5 g of the fine powder was placed in a polytetrafluoroethylene-SUS double pressure vessel together with 50 ml of pure water and heated at 120 ° C. for 300 hours. The free halogen ions extracted in pure water were measured with an ion chromatograph type 10 (manufactured by Dionex). The results are shown in Table 4.

【0051】[0051]

【表4】 [Table 4]

【0052】〔実施例6〕エポキシ樹脂として、ビフェ
ニル型エポキシ樹脂(エポキシ当量188)100重量
部、臭素化エポキシ樹脂(エポキシ当量375)15重
量部、硬化剤としてフェノールアラルキル樹脂(OH当
量170)100重量部、硬化促進剤としてトリフェニ
ルホスフィン・トリフェニルボロン5重量部、可とう化
剤として末端にアミノ基を有する分子量約3万のポリジ
メチルシロキサン10重量部、カップリング剤としてエ
ポキシシランを10重量部をメチルエチルケトンに溶解
させ、23℃における溶融粘度が20〜100ポイズに
なるように調製した。
Example 6 100 parts by weight of a biphenyl type epoxy resin (epoxy equivalent 188) as an epoxy resin, 15 parts by weight of a brominated epoxy resin (epoxy equivalent 375), and 100 parts of a phenol aralkyl resin (OH equivalent 170) as a curing agent. Parts by weight, 5 parts by weight of triphenylphosphine / triphenylboron as a curing accelerator, 10 parts by weight of polydimethylsiloxane having a terminal amino group as a flexible agent and having a molecular weight of about 30,000, and 10 parts by weight of epoxysilane as a coupling agent. Parts were dissolved in methyl ethyl ketone and prepared so that the melt viscosity at 23 ° C. was 20 to 100 poises.

【0053】これに厚さ50μmの平織りEガラスクロ
スを浸漬して45重量%樹脂含浸ガラスクロスを得た。
このガラスクロスを7枚とその上に銅箔とを重ね合せて
170℃、70kg/cm2、60分間加熱加圧して成
形し積層板を得た。得られた積層板をJIS−C−64
81に準じて、曲げ強度(20℃および120℃)、煮
沸8時間後の吸湿率および銅箔のピール強度を測定し
た。結果を表5に示す。
A plain weave E glass cloth having a thickness of 50 μm was immersed in this to obtain a 45% by weight resin-impregnated glass cloth.
Seven pieces of this glass cloth and a copper foil were superposed on the glass cloth and heated and pressed at 170 ° C. and 70 kg / cm 2 for 60 minutes to form a laminated plate. The obtained laminated plate is JIS-C-64
Bending strength (20 ° C. and 120 ° C.), moisture absorption rate after 8 hours of boiling, and peel strength of the copper foil were measured according to 81. The results are shown in Table 5.

【0054】〔比較例3〕エポキシ樹脂として、o−ク
レゾールノボラック型エポキシ樹脂(エポキシ当量19
5)100重量部、硬化促進剤として1,8−ジアザビ
シクロ−(5,4,0)−ウンデンセン−7を用いた外
は、実施例6と同じにして、45重量%樹脂含浸ガラス
クロスを得た。このガラスクロスを7枚その上に銅箔と
を重ね合せて、170℃、70kg/cm2、60分間
加熱加圧して成形し積層板を得た。得られた積層板を実
施例6と同じく物性を測定した。結果を表5に示した。
Comparative Example 3 As an epoxy resin, an o-cresol novolac type epoxy resin (epoxy equivalent 19
5) In the same manner as in Example 6 except that 100 parts by weight of 1,8-diazabicyclo- (5,4,0) -undensene-7 was used as a curing accelerator, a 45% by weight resin-impregnated glass cloth was obtained. It was Seven pieces of this glass cloth were overlaid with a copper foil and heated and pressed at 170 ° C. and 70 kg / cm 2 for 60 minutes to form a laminated plate. The physical properties of the obtained laminated plate were measured in the same manner as in Example 6. The results are shown in Table 5.

【0055】[0055]

【表5】 [Table 5]

【0056】[0056]

【発明の効果】本発明のエポキシ樹脂組成物は、従来の
ものに比べて貯蔵安定性,成形性が優れ、低吸水性、高
接着性の硬化物を与えると云う優れた効果があり、積層
板用材料や電子部品用封止材料として用いた場合、当該
製品の信頼性を向上することができる。
INDUSTRIAL APPLICABILITY The epoxy resin composition of the present invention has excellent storage stability and moldability as compared with conventional ones, and has an excellent effect of giving a cured product having low water absorption and high adhesiveness. When used as a plate material or a sealing material for electronic components, the reliability of the product can be improved.

フロントページの続き (72)発明者 江口 州志 茨城県日立市大みか町七丁目1番1号 株 式会社日立製作所日立研究所内 (72)発明者 鈴木 和弘 茨城県日立市大みか町七丁目一番1号 株 式会社日立製作所日立研究所内 (72)発明者 石井 利昭 茨城県日立市大みか町七丁目一番1号 株 式会社日立製作所日立研究所内 (72)発明者 幸島 博起 茨城県結城市大字鹿窪1772番1号 日立化 成工業株式会社南結城工場内 (72)発明者 鈴木 宏 茨城県結城市大字鹿窪1772番1号 日立化 成工業株式会社南結城工場内Front Page Continuation (72) Inventor Satoshi Eguchi 7-1 Omika-cho, Hitachi City, Ibaraki Hitachi Ltd. Hitachi Research Laboratory (72) Inventor Kazuhiro Suzuki 1-chome, Omika-cho, Hitachi City, Ibaraki Prefecture Hitachi, Ltd. Hitachi Research Laboratory (72) Inventor Toshiaki Ishii 7-chome, No. 1 Omika-cho, Hitachi City, Ibaraki Prefecture Hitachi Ltd. Hitachi Research Laboratory (72) Inventor Hiroyuki Yukijima Yuki City, Ibaraki Prefecture 1772-1 Hitachi Chemical Co., Ltd. Minami-Yuki Plant (72) Inventor Hiroshi Suzuki 1721 Kagoku, Yuki City, Ibaraki Prefecture Hitachi Chemical Co., Ltd. Minami-Yuki Plant

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 (a)一般式〔1〕 【化1】 (式中、Rは水素原子またはメチル基を示し互いに異な
っていてもよい、nは0〜2の整数を示す。)で表され
るビフェニル型エポキシ樹脂、 (b)一般式〔2〕 【化2】 (式中、mは1〜10の整数を示す。)で表される硬化
剤、 (c)一般式〔3〕 【化3】 (式中、R1〜R6はフェニル基,ブチル基,シクロヘキ
サン環を示し互いに異なっていてもよい。)で表される
硬化促進剤、を含むことを特徴とするエポキシ樹脂組成
物。
1. (a) General formula [1]: (In the formula, R represents a hydrogen atom or a methyl group and may be different from each other, n represents an integer of 0 to 2.), (b) a general formula [2] 2] (In the formula, m represents an integer of 1 to 10.), (c) General formula [3] (In the formula, R 1 to R 6 represent a phenyl group, a butyl group, and a cyclohexane ring and may be different from each other.) A curing accelerator represented by the formula:
【請求項2】 (a)一般式〔1〕 【化4】 (式中、Rは水素原子またはメチル基を示し互いに異な
っていてもよい、nは0〜2の整数を示す。)で表され
るビフェニル型エポキシ樹脂、 (b)一般式〔2〕 【化5】 (式中、mは1〜10の整数を示す。)で表される硬化
剤、 (c)一般式〔3〕 【化6】 (式中、R1〜R6はフェニル基,ブチル基,シクロヘキ
サン環を示し互いに異なっていてもよい。)で表される
硬化促進剤、 (d)平均粒径0.1〜30μmの無機充填剤が50〜
90容量%、を含むことを特徴とするエポキシ樹脂組成
物。
2. (a) General formula [1]: (In the formula, R represents a hydrogen atom or a methyl group and may be different from each other, n represents an integer of 0 to 2.), (b) a general formula [2] 5] (In the formula, m represents an integer of 1 to 10.), (c) General formula [3] (In the formula, R 1 to R 6 represent a phenyl group, a butyl group and a cyclohexane ring and may be different from each other.), (D) an inorganic filler having an average particle size of 0.1 to 30 μm Agent is 50 ~
90% by volume of the epoxy resin composition.
【請求項3】 前記一般式〔2〕で表される硬化剤は、
前記一般式〔1〕で示されるエポキシ樹脂に対して0.
5〜1.5当量配合されている請求項1または2に記載
のエポキシ樹脂組成物。
3. The curing agent represented by the general formula [2] is
With respect to the epoxy resin represented by the general formula [1],
The epoxy resin composition according to claim 1 or 2, which is blended in an amount of 5 to 1.5 equivalents.
【請求項4】 前記一般式〔3〕で表される硬化促進剤
は、予め前記(b)の硬化剤に溶解し配合された請求項
1,2または3に記載のエポキシ樹脂組成物。
4. The epoxy resin composition according to claim 1, wherein the curing accelerator represented by the general formula [3] is dissolved in the curing agent (b) and blended in advance.
【請求項5】 前記一般式〔3〕で表される硬化促進剤
は、前記一般式〔1〕で示されるエポキシ樹脂100重
量部に対して1〜15mmol配合されている請求項1
〜4のいずれかに記載のエポキシ樹脂組成物。
5. The curing accelerator represented by the general formula [3] is blended in an amount of 1 to 15 mmol with respect to 100 parts by weight of the epoxy resin represented by the general formula [1].
The epoxy resin composition according to any one of to 4.
JP10903493A 1993-05-11 1993-05-11 Epoxy resin composition Pending JPH06322073A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10903493A JPH06322073A (en) 1993-05-11 1993-05-11 Epoxy resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10903493A JPH06322073A (en) 1993-05-11 1993-05-11 Epoxy resin composition

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2002233974A Division JP2003160636A (en) 2002-08-09 2002-08-09 Epoxy resin composition and material using the same for laminated plates

Publications (1)

Publication Number Publication Date
JPH06322073A true JPH06322073A (en) 1994-11-22

Family

ID=14499937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10903493A Pending JPH06322073A (en) 1993-05-11 1993-05-11 Epoxy resin composition

Country Status (1)

Country Link
JP (1) JPH06322073A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7667339B2 (en) 2006-03-13 2010-02-23 Cheil Industries, Inc. Epoxy resin composition for semiconductor encapsulation and semiconductor device using the same
JP2017031295A (en) * 2015-07-31 2017-02-09 日立化成株式会社 RESIN COMPOUND FOR Sm-BASED BOND MAGNET, BOND MAGNET USING THE SAME AND METHOD FOR PRODUCING Sm-BASED BOND MAGNET

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7667339B2 (en) 2006-03-13 2010-02-23 Cheil Industries, Inc. Epoxy resin composition for semiconductor encapsulation and semiconductor device using the same
JP2017031295A (en) * 2015-07-31 2017-02-09 日立化成株式会社 RESIN COMPOUND FOR Sm-BASED BOND MAGNET, BOND MAGNET USING THE SAME AND METHOD FOR PRODUCING Sm-BASED BOND MAGNET

Similar Documents

Publication Publication Date Title
JP3588539B2 (en) Polyphenylene sulfide resin composition and resin-encapsulated semiconductor device using the same
JP2008127577A (en) Epoxy resin composition for sealing multi-chip package and multi-chip package using the same
JP2016204626A (en) Composition, epoxy resin curing agent, epoxy resin composition, heat curable composition, cured article, semiconductor device and interlayer insulation material
JP5525236B2 (en) Fiber reinforced resin case, manufacturing method thereof, and hollow resin package device for storing electronic components
JPH0925334A (en) Epoxy resin composition
JP3509236B2 (en) Epoxy resin composition and semiconductor encapsulating material
JPH06322073A (en) Epoxy resin composition
JP3617725B2 (en) Resin composition and resin-encapsulated semiconductor device
JP2003160636A (en) Epoxy resin composition and material using the same for laminated plates
JP3003887B2 (en) Resin composition for semiconductor encapsulation
JP3551281B2 (en) Epoxy resin composition
JP2816290B2 (en) Resin-sealed semiconductor device
JP2006257309A (en) Epoxy resin composition for sealing semiconductor and semiconductor device
KR102408095B1 (en) Epoxy resin composition for encapsulating semiconductor device and semiconductor device encapsulated using the same
JPH06271653A (en) Resin-encapsulated semiconductor device
JPH03197527A (en) Resin composition for semiconductor sealing
JP4872161B2 (en) Epoxy resin composition and semiconductor device using the same
JPH04337316A (en) Epoxy resin composition
JP2593518B2 (en) Epoxy resin molding compound for semiconductor encapsulation
KR102570300B1 (en) Composition, epoxy resin curing agent, epoxy resin composition, thermosetting composition, cured product, semiconductor device, and interlayer insulating material
JP2912470B2 (en) Resin composition
CA2043422A1 (en) Epoxy resin composition
JP2912468B2 (en) Resin composition
JP3517961B2 (en) Epoxy resin composition and semiconductor encapsulating material
JPH04224859A (en) Resin composition

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060925

RD02 Notification of acceptance of power of attorney

Effective date: 20060925

Free format text: JAPANESE INTERMEDIATE CODE: A7422

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20060925