JPH06314656A - Rotation-on-own-axis and-around-center type vapor growing apparatus - Google Patents

Abstract

PURPOSE:To obtain an apparatus in which reliability can be improved by fixing a stationary frame to a reactor through fixing fittings to be ruptured by a force of a predetermined value or more to be applied from a gear mechanism to the frame. CONSTITUTION:A susceptor 2 is provided in a reactor 1, rotatably supported by a vertical susceptor rotating-around-center shaft 4, a rotating-on-own-axis tray 8 is rotatably supported to a surface of the susceptor 2, a tray rotary shaft 10 is rotatably passed through the susceptor 2 and introduced to a rear surface side. A stationary frame 13 is disposed through a bearing 12 on an outer periphery of the shaft 4 under the susceptor 2, and a gear mechanism 15 for rotating the shaft 10 by utilizing rotation of the susceptor 2 is provided between the shaft 10 and the frame 13. In such an apparatus, the frame 13 is fixed to the reactor 1 through fixing fittings 16 to be ruptured by a predetermined value or more of force to be applied to the frame 13 from the mechanism 15.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a revolving vapor phase growth apparatus for revolving a susceptor in a reactor and rotating a tray supported by the susceptor to perform vapor phase growth on a wafer on the tray. It is about.

[0002]

2. Description of the Related Art A wafer is supported on a susceptor in a reactor, and AsH ₃ (arsine), TMG is placed in the reactor while the susceptor is heated to a high temperature (eg, about 700 ° C.).
Epitaxial wafers formed by allowing raw material gases such as (trimethylgallium) and TMAl (trimethylaluminum) to flow together with a carrier gas consisting of hydrogen and epitaxially growing on wafers are used as materials for FETs and HEMT devices for satellite broadcasting, mobile phones, etc. Is used as.

This epitaxial wafer is manufactured by mounting the wafer on each surface on a polygonal barrel type susceptor. The lower the variation in film thickness of this epitaxial wafer, the better, but it was about ± 5% in a normal apparatus.

Recently, due to demands for higher yield and higher quality in the post-process, the variation in the film thickness of the epitaxial wafer is required to be ± 2% or less.

Therefore, a rotation-and-revolution type vapor phase growth apparatus is proposed in which a rotation tray is provided on each surface of the polygonal barrel type susceptor, and the rotation tray is rotated while the susceptor is revolved to improve the uniformity of the film thickness. Has been done.

In this self-revolution type vapor phase growth apparatus, a barrel type susceptor is provided in a reactor, and a lower chamber having an open lower portion is provided in the susceptor. The susceptor is formed by a vertically oriented susceptor revolution shaft. It is rotatably supported, and a rotation tray is rotatably supported on the surface of the susceptor, and a tray rotation shaft that rotates the rotation tray is rotatably penetrated through the susceptor and led out into the lower chamber, A tray rotating planetary gear is supported on the tray rotating shaft that has been drawn out, a fixed frame is arranged below the susceptor on the outer periphery of the susceptor revolution shaft via bearings, and an upper portion of the fixed frame is arranged with respect to the susceptor revolution shaft. It has a structure in which a fixed ring gear that is coaxial with and meshes with the tray rotation planetary gear is provided.

[0007]

However, in such a conventional auto-revolution type vapor phase growth apparatus, when the tray rotary planetary gear is rotated at a high temperature, (a) thermal expansion and (b) tooth surface of the gear are performed. Due to factors such as accumulation of residue and (c) vibration, the meshing of gears deteriorates, which causes the teeth of the gears made of glass or carbon to be chipped or the fixed parts of the gears to be damaged. Trouble occurred,
There was a problem that the reliability of the device was low.

An object of the present invention is to provide a self-revolving vapor phase growth apparatus capable of improving reliability.

[0009]

The constitution of the present invention which achieves the above object will be described as follows.

According to a first aspect of the present invention, a susceptor is provided in the reactor, the susceptor is rotatably supported by a vertically oriented susceptor revolution shaft, and a rotation tray is rotatably supported on the surface of the susceptor. A tray rotation shaft that rotates the rotation tray is rotatably pierced through the susceptor and is guided to the back surface side, and a fixed frame is disposed below the susceptor on the outer periphery of the susceptor revolution shaft via a bearing, and A rotation / revolution type vapor phase growth apparatus in which a gear mechanism for rotating the tray rotation shaft by utilizing the rotation of the susceptor is provided between the tray rotation shaft led out to the back surface side of the susceptor and the fixed frame. In, the fixed frame is fixed to the reactor through a fixture that is broken by a force applied from the gear mechanism to the fixed frame at a predetermined value or more. And wherein the door. According to a second aspect of the present invention, a susceptor is provided in the reactor, the susceptor is rotatably supported by a vertically oriented susceptor revolution shaft, and a rotation tray is rotatably supported on the surface of the susceptor. A tray rotation shaft that rotates the tray is rotatably penetrated through the susceptor and led out to the back surface side, and a fixed frame is disposed under the susceptor on the outer periphery of the susceptor revolution shaft via a bearing, and the back surface of the susceptor is provided. In the auto-revolution type vapor phase growth apparatus in which a gear mechanism for rotating the tray rotation shaft by using the rotation of the susceptor is provided between the tray rotation shaft and the fixed frame led to the side, The reactor is provided with a sensor for measuring a force applied from the gear mechanism to the fixed frame.

[0011]

According to the first aspect of the present invention, the fixed frame connected to the susceptor via the gear mechanism is broken through a fixture that is broken by a force applied from the gear mechanism to the fixed frame at a predetermined value or more. When fixed to the reactor, when an unreasonable force is applied between the gears of the gear mechanism, the fixing tool is broken and the fixing frame becomes free so that the fixing frame can rotate together with the susceptor. Therefore, an unreasonable force is not applied between the gears of the gear mechanism, and it is possible to prevent troubles such as chipping of the teeth of these gears or damage to the fixed parts of the gears, and improving the reliability of the device. Can be made.

When the reactor is provided with a sensor for measuring the force applied to the fixed frame from the gear mechanism, the force applied to the fixed frame can be measured by the sensor. Therefore, it is possible to take a protective operation of the gear mechanism, such as monitoring the measured value of the sensor and stopping the rotation of the susceptor when an excessive force is measured.

[0013]

FIG. 1 shows a first embodiment of a self-revolving vapor phase growth apparatus according to the present invention using a barrel type susceptor. In this auto-revolution type vapor phase growth apparatus, a barrel type susceptor 2 made of carbon or the like is provided in a reactor 1 made of quartz glass or the like. The susceptor 2 is provided with a lower chamber 3 whose lower part is opened. The susceptor 2 is rotatably supported by a vertically oriented susceptor revolution shaft 4. The susceptor revolving shaft 4 is divided into a susceptor holder shaft 4a made of quartz glass and a drive shaft 4b made of stainless steel, and these are separably connected. A locking projection 6 that is engaged with the locking hole 5 of the susceptor 2 is provided on the upper portion of the susceptor holder shaft 4a so that the rotational force of the susceptor revolution shaft 4 can be applied to the susceptor 2. The susceptor 2 is moved up and down by raising and lowering the susceptor revolution shaft 4.

A recess 7 is provided on the surface of the susceptor 2,
A rotating tray 8 made of carbon or the like is rotatably fitted in and supported by the recess 7. The rotation tray 8 is fitted into the recess 7 with a thickness such that the surface of the wafer 9 supported by the surface of the rotation tray 8 matches the surface of the susceptor 2.
A tray rotation shaft 10 that rotates the rotation tray 8 rotatably penetrates the susceptor 2 and is led out into the lower chamber 3 on the back surface of the susceptor 2.

A tray rotation planetary gear 11 made of quartz glass or the like is fixed to the tray rotation shaft 10 led out into the lower chamber 3 on the back surface of the susceptor 2. A fixed frame 13 made of quartz glass or the like is arranged below the susceptor 2 on the outer circumference of the susceptor revolution shaft 4 via a bearing 12. A skirt portion 13a is provided on the outer periphery of the fixed frame 13 to close the lower chamber 3 of the susceptor 2 and prevent the gas from being disturbed at the lower portion of the susceptor 2. A fixed ring gear 14 made of carbon or the like, which is coaxial with the susceptor revolution shaft 4 and meshes with the tray rotation planetary gear 11, is provided on the fixed frame 13. The fixed ring gear 14 and the tray rotation planetary gear 11 constitute a gear mechanism 15 that rotates the tray rotation shaft 10 by utilizing the rotation of the susceptor 2.

The fixed frame 13 is fixed to the reactor 1 through a fixture 16 having a structure in which it is broken by a force applied to the fixed frame 13 from the gear mechanism 15 at a predetermined value or more. The fixture 16 is formed by a shear pin made of quartz glass or the like in this embodiment.

In the part of the reactor 1 below the susceptor 2,
An exhaust unit 17 and an exhaust pipe 18 are provided. A high frequency heating coil 19 as a heater for heating the susceptor 2 is arranged on the outer periphery of the reactor 1. A gas inlet 20 is provided at the top of the reactor 1. Reactor 1
The lower part of is closed with the susceptor revolution shaft 4 rotatably passing therethrough.

In such a self-revolution type vapor phase growth apparatus, the susceptor 2 is rotated by the rotation of the susceptor revolution shaft 4, and the heating coil 19 heats the susceptor 2 to heat the wafer 9. In this state, the raw material gas and the carrier gas are introduced into the reactor 1 through the gas introduction port 20 to cause vapor phase growth on the wafer 9. At this time, as the susceptor 2 revolves, the tray rotation planetary gear 11 meshes with the fixed ring gear 14 and revolves while revolving, so that the rotation tray 8 rotates.
The wafer 9 is also rotated together. Therefore, it is possible to perform vapor phase growth in which the film thickness is approximately equal in each part of the wafer 9.

During the vapor phase growth work, the vapor phase growth material or the like adheres to the tray rotary planetary gear 11 and the fixed ring gear 14, and the tray rotary planetary gear 11 does not revolve or rotate on its own. When an unreasonable force acts between the fixing gear 11 and the fixed ring gear 14, the force is applied to the fixing tool 16 via the fixing frame 13, and the fixing tool 16 such as a shear pin is broken and the fixing frame 13 becomes free. As a result, the fixed frame 13 can be rotated together with the susceptor 2. Therefore, the tray rotating planetary gear 1
It is possible to prevent the occurrence of troubles such as an unreasonable force being applied between the gear 1 and the fixed ring gear 14 and the teeth of the gears 11 and 14 being chipped or the fixed portions of the gears 11 and 14 being damaged. The reliability of the device can be improved.

When the fixing tool 16 is broken,
The rotation of the susceptor revolution shaft 4 is stopped.

FIG. 2 shows a second embodiment of the auto-revolution type vapor phase growth apparatus according to the present invention using a barrel type susceptor. The parts corresponding to those in FIG. 1 described above are denoted by the same reference numerals.

In this auto-revolution type vapor phase growth apparatus, a torque composed of a load cell or the like which is connected to the fixed frame 13 through a fixture 16 made of shear pins and measures the force applied from the gear mechanism 15 to the fixed frame 13. The sensor 21 is provided in the reactor 1.

In such a rotation-and-revolution type vapor phase growth apparatus, when a force is applied from the gear mechanism 15 to the fixed frame 13, the force is transmitted to the sensor 21 via the fixture 16 and the force can be measured. Therefore, when the value measured by the sensor 21 becomes larger than the preset value, the protective operation is performed such as stopping the rotation of the susceptor revolution shaft 4.

If a suddenly excessive force acts on the fixed frame 13 from the gear mechanism 15 due to some circumstances, the force is applied to the fixture 16 and the fixture 16 is broken and the fixed frame 13 becomes free. As described above, the fixed frame 13 can be rotated together with the susceptor 2.

According to the experiment, the maximum torque load of the 3 inch × 6 sheet rotation type vapor phase growth apparatus was 150 gf. Therefore, the fixture 16 made of a shear pin was provided with a notch so that it could be folded at 200 gf. Also, the torque sensor 2
For No. 1, the alarm is activated at 160 gf or more.

In this way, even if the susceptor holder shaft 4a is made of quartz glass, the susceptor holder shaft 4a is stable without being twisted.

FIG. 3 shows a third embodiment of the auto-revolution type vapor phase growth apparatus according to the present invention using a pancake type susceptor. In addition, in the portion corresponding to FIG. 1 described above,
The same reference numerals are given.

This self-revolution type vapor phase growth apparatus is different from the first embodiment in that the susceptor 2 is a pancake type. Further, in this embodiment, the lower chamber 3 is formed in the fixed frame 13 below the susceptor 2. A thermocouple 22 is passed through the hollow susceptor revolving shaft 4 to measure the temperature of the susceptor 2.

Even with such a structure, the same effect as that of the first embodiment can be obtained. Further, by measuring the temperature of the susceptor 2, it is possible to easily control the temperature of the susceptor 2.

FIG. 4 shows a fourth embodiment of the auto-revolution type vapor phase growth apparatus according to the present invention using a pancake type susceptor. The parts corresponding to those in FIGS. 2 and 3 described above are denoted by the same reference numerals.

This self-revolution type vapor phase growth apparatus is different from the second embodiment in that the susceptor 2 is a pancake type.

With such a structure, the same effect as that of the second embodiment can be obtained.

In the first to fourth embodiments, the fixture 16 is not limited to the shear pin, but a string or the like may be used.

The temperature of the susceptor 2 can be measured in the same manner in the first and second embodiments.

[0035]

As described above, according to the auto-revolution type vapor phase growth apparatus of the present invention, the following effects can be obtained.

In the rotation-and-revolution type vapor phase growth apparatus according to claim 1, the fixed frame connected to the susceptor through the gear mechanism is broken by a force of a predetermined value or more applied from the gear mechanism to the fixed frame. Since it is fixed to the reactor via the fixing device, the fixing device is broken and the fixing frame becomes free when an unreasonable force is applied between the gears of the gear mechanism. It can be in a state where it can be turned to. Therefore, an unreasonable force is not applied between the gears of the gear mechanism, and it is possible to prevent the occurrence of troubles such as the teeth of these gears being chipped or the fixed parts of the gears being damaged, and the reliability of the device is improved. Can be improved.

In the rotation-and-revolution type vapor phase growth apparatus according to the second aspect, since the sensor for measuring the force applied from the gear mechanism to the fixed frame is provided in the reactor, the force applied to the fixed frame can be measured by the sensor. it can. Therefore, it is possible to take a protective operation of the gear mechanism, such as monitoring the measured value of the sensor and stopping the rotation of the susceptor when an excessive force is measured.

[Brief description of drawings]

FIG. 1 is a vertical sectional view of a first embodiment of a self-revolving vapor phase growth apparatus according to the present invention.

FIG. 2 is a vertical cross-sectional view of a second embodiment of the auto-revolution type vapor phase growth apparatus according to the present invention.

FIG. 3 is a vertical cross-sectional view of a third embodiment of the auto-revolution type vapor phase growth apparatus according to the present invention.

FIG. 4 is a vertical cross-sectional view of a fourth embodiment of the auto-revolution type vapor phase growth apparatus according to the present invention.

[Explanation of symbols]

 1 Reactor 2 Susceptor 3 Lower Chamber 4 Susceptor Revolution Shaft 4a Susceptor Holder Shaft 4b Drive Shaft 5 Locking Hole 6 Locking Protrusion 7 Recess 8 Rotating Tray 9 Wafer 10 Tray Rotating Shaft 11 Tray Rotating Planetary Gear 12 Bearing 13 Fixed Frame 13a Skirt 14 Fixed ring gear 15 Gear mechanism 16 Fixture 17 Exhaust part 18 Exhaust pipe 19 High frequency heating coil 20 Gas inlet 21 Sensor

Claims (2)

[Claims] 1. A susceptor is provided in a reactor, the susceptor is rotatably supported by a vertically oriented susceptor revolution shaft, and a rotation tray is rotatably supported on the surface of the susceptor to rotate the rotation tray. The tray rotation shaft is rotatably penetrated through the susceptor and is led out to the back surface side, and a fixed frame is arranged under the susceptor on the outer circumference of the susceptor revolution shaft via a bearing, and is led out to the back surface side of the susceptor. In the auto-revolution type vapor phase growth apparatus in which a gear mechanism that rotates the tray rotation shaft by using the rotation of the susceptor is provided between the tray rotation shaft and the fixed frame, the fixed frame is An auto-revolution characterized in that it is fixed to the reactor through a fixture that is broken by a force applied from the gear mechanism to the fixed frame at a predetermined value or more. The vapor phase growth apparatus. 2. A susceptor is provided in the reactor, the susceptor is rotatably supported by a vertically oriented susceptor revolution shaft, and a rotation tray is rotatably supported on the surface of the susceptor to rotate the rotation tray. The tray rotation shaft is rotatably penetrated through the susceptor and is led out to the back surface side, and a fixed frame is arranged under the susceptor on the outer circumference of the susceptor revolution shaft via a bearing, and is led out to the back surface side of the susceptor. A rotation-and-revolution type vapor phase growth apparatus in which a gear mechanism for rotating the tray rotation shaft by using the rotation of the susceptor is provided between the tray rotation shaft and the fixed frame. The auto-revolution type vapor phase growth apparatus, wherein a sensor for measuring the force applied to the fixed frame is provided in the reactor.