JPH0629884Y2 - Electron beam irradiation device - Google Patents

Electron beam irradiation device

Info

Publication number
JPH0629884Y2
JPH0629884Y2 JP1987108700U JP10870087U JPH0629884Y2 JP H0629884 Y2 JPH0629884 Y2 JP H0629884Y2 JP 1987108700 U JP1987108700 U JP 1987108700U JP 10870087 U JP10870087 U JP 10870087U JP H0629884 Y2 JPH0629884 Y2 JP H0629884Y2
Authority
JP
Japan
Prior art keywords
electron beam
hole
irradiation
pipe
nitrogen gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1987108700U
Other languages
Japanese (ja)
Other versions
JPS6413659U (en
Inventor
寿男 木村
敏朗 錦見
Original Assignee
日新ハイボルテ−ジ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日新ハイボルテ−ジ株式会社 filed Critical 日新ハイボルテ−ジ株式会社
Priority to JP1987108700U priority Critical patent/JPH0629884Y2/en
Publication of JPS6413659U publication Critical patent/JPS6413659U/ja
Application granted granted Critical
Publication of JPH0629884Y2 publication Critical patent/JPH0629884Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Description

【考案の詳細な説明】 (産業上の利用分野) この考案は電子線照射装置に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) This invention relates to an electron beam irradiation apparatus.

(従来の技術) 電子線照射装置において、真空チェンバ内のカソードか
らの電子線を、照射チェンバ内を通過する被照射物に照
射する構成のものは、すでによく知られている。
(Prior Art) In an electron beam irradiation device, a structure in which an electron beam from a cathode in a vacuum chamber is applied to an object to be irradiated which passes through the irradiation chamber is already well known.

その具体的構成を第2図によって説明すると、1は真空
チェンバ、2はその内部に設置されてあるカソード、3
は照射チェンバ、4は被照射物、5はビームキャッチャ
である。被照射物4は矢印方向に沿って照射チェンバ3
内を移送される。そしてその移送の過程で、真空チェン
バ1からの電子線によって照射される。
The specific configuration will be described with reference to FIG. 2. Reference numeral 1 is a vacuum chamber, 2 is a cathode installed inside the chamber, and 3 is a cathode.
Is an irradiation chamber, 4 is an irradiation object, and 5 is a beam catcher. The object to be irradiated 4 is irradiated along the direction of the arrow by the irradiation chamber 3
Is transferred inside. Then, in the process of the transfer, the electron beam from the vacuum chamber 1 is applied.

このような装置では、照射チェンバ内の電子線の照射領
域の近辺を、できるだけ不活性雰囲気となるように、真
空チェンバ1の照射窓部6の周囲に配置した窒素ガス吹
付ノズル7より、窒素ガスを照射窓部6の付近に向かっ
て吹き付けて、周囲の酸素ガスと置換するようにしてい
る。
In such a device, nitrogen gas is sprayed from the nitrogen gas spray nozzle 7 arranged around the irradiation window 6 of the vacuum chamber 1 so that the vicinity of the electron beam irradiation region in the irradiation chamber is as inactive as possible. Is blown toward the vicinity of the irradiation window 6 to replace the surrounding oxygen gas.

しかしこのような構成によると、吹き付けられた窒素ガ
スが電子線によって加熱されるため、ガス温度が上昇す
るようになる。一般に被照射物4はその耐熱温度が低い
ので、ガス温度の上昇を防ぐ必要があり、そのために多
量の窒素ガスを供給しなければならない。
However, according to such a configuration, the sprayed nitrogen gas is heated by the electron beam, so that the gas temperature rises. In general, the object 4 to be irradiated has a low heat resistance temperature, so that it is necessary to prevent the gas temperature from rising, and therefore a large amount of nitrogen gas must be supplied.

また照射窓部6ではその窓箔8を押えている押え枠9の
内面は、上方内部に向かって傾斜している構成となって
いるので、前記のように加熱された窒素ガスが窓箔8の
近辺に滞留し易くなり、これがため窓箔8およびその付
近の各部材に熱劣化が生じ、寿命が著しく短くなること
がある。
Further, in the irradiation window portion 6, the inner surface of the holding frame 9 holding the window foil 8 is inclined toward the upper inside, so that the nitrogen gas heated as described above is applied to the window foil 8. Of the window foil 8 and the respective members in the vicinity of the window foil 8 are thermally deteriorated, and the life of the window foil 8 may be significantly shortened.

(考案が解決しようとする問題点) この考案は酸素ガスとの置換のために供給する窒素ガス
の供給量を少なくするとともに、窓箔の温度上昇を抑制
することを目的とする。
(Problems to be Solved by the Invention) This invention aims to reduce the supply amount of nitrogen gas supplied for replacement with oxygen gas and suppress the temperature rise of the window foil.

(問題点を解決するための手段) この考案は真空チェンバの照射窓を構成している窓箔の
押え枠の内部より、窓箔またはその近辺に向けて窒素ガ
スを吹き付ける構成を備えたことを特徴とする。
(Means for Solving the Problems) This invention has a structure in which nitrogen gas is blown toward the window foil or its vicinity from the inside of the holding frame of the window foil that constitutes the irradiation window of the vacuum chamber. Characterize.

(実施例) この考案の実施例を第1図によって説明する。同図にお
いて10は押え枠9の外周にロー付けされてあるパイプ
で、ここには外部より窒素ガスが送られてくるものとす
る。パイプ10には孔11が形成されてあって、これが
押え枠9の内部にこれを横切る方向に延びる貫通孔12
と連通している。この貫通孔12は押え枠9の内面にお
いて開口している。
(Embodiment) An embodiment of the present invention will be described with reference to FIG. In the figure, reference numeral 10 denotes a pipe brazed around the outer circumference of the holding frame 9, to which nitrogen gas is sent from the outside. A hole 11 is formed in the pipe 10, and this is a through hole 12 extending in a direction traversing the inside of the holding frame 9.
Is in communication with. The through hole 12 is open on the inner surface of the holding frame 9.

13は窓箔8の真空側の内面を支持している桟である。
これは真空チェンバ1の内部が真空になることによっ
て、窓箔8が内側に向かって吸引されて変形するのを防
止するとともに、冷却フインを兼ねたものである。
Reference numeral 13 denotes a crosspiece that supports the inner surface of the window foil 8 on the vacuum side.
This prevents the window foil 8 from being sucked and deformed toward the inside due to the vacuum inside the vacuum chamber 1, and also serves as a cooling fin.

以上の構成においてパイプ10より孔11を介して貫通
孔12に窒素ガスを供給すると、その窒素ガスは窓箔8
の大気側の表面すなわち下面付近に向かって吹き付けら
れるようになる。この吹き付けによって窓箔8の下面付
近の酸素ガス、あるいは加熱された窒素ガスは、供給さ
れてきた新しい窒素ガスと効率よく置換される。しかも
この吹き付けによって窓箔8およびその付近は、確実に
冷却されるようになる。
When nitrogen gas is supplied from the pipe 10 to the through hole 12 through the hole 11 in the above configuration, the nitrogen gas is supplied to the window foil 8
It will be sprayed toward the atmosphere side surface, that is, near the lower surface. Oxygen gas in the vicinity of the lower surface of the window foil 8 or heated nitrogen gas is efficiently replaced with new nitrogen gas supplied by this spraying. Moreover, the spraying ensures that the window foil 8 and its vicinity are cooled.

この考案では特にパイプ10を押え枠9の外周に設置す
るようにしている。もしパイプ10を押え枠9の内周に
設置したとすると、その内周は電子線照射領域内であ
り、そのため内周に設置されたパイプには電子線が照射
されるようになり、そのため電子線の損失が大きくな
り、またパイプも損傷されるようになる。
In this invention, the pipe 10 is particularly installed on the outer circumference of the holding frame 9. If the pipe 10 is installed on the inner circumference of the holding frame 9, the inner circumference is within the electron beam irradiation area, so that the pipe installed on the inner circumference is irradiated with the electron beam, and thus the electron beam is irradiated. The loss of wire becomes large and the pipe becomes damaged.

この点パイプ10を押え枠9の外周に設置しておけば、
このような電子線の損失、パイプの損傷は全く回避でき
る。
If this point pipe 10 is installed on the outer circumference of the holding frame 9,
It is possible to avoid such electron beam loss and pipe damage.

(考案の効果) 以上詳述したようにこの考案によれば、従来構成に比較
して照射窓近辺の加熱ガス置換を容易にするとともに、
電子線の損失、窒素ガス供給用のパイプの損傷をなんら
ともなわずに窓箔の冷却を確実に行なうことができると
いった効果を奏する。
(Effect of the Invention) As described in detail above, according to the present invention, the heating gas replacement in the vicinity of the irradiation window is facilitated as compared with the conventional configuration, and
There is an effect that the window foil can be surely cooled without any loss of electron beams or damage to the pipe for supplying nitrogen gas.

【図面の簡単な説明】[Brief description of drawings]

第1図はこの考案の実施例を示す要部の断面図、第2図
はこの考案の実施例を示す全体の断面図である。 1……真空チェンバ、3……照射チェンバ、4……被照
射物、6……照射窓部、8……窓箔、9……押え枠、1
0……パイプ、12……貫通孔、
FIG. 1 is a sectional view of an essential part showing an embodiment of the present invention, and FIG. 2 is an overall sectional view showing an embodiment of the present invention. 1 ... Vacuum chamber, 3 ... Irradiation chamber, 4 ... Irradiation object, 6 ... Irradiation window part, 8 ... Window foil, 9 ... Holding frame, 1
0 ... pipe, 12 ... through hole,

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】電子線を放射する真空チェンバと、前記真
空チェンバからの電子線を被照射物に照射するための照
射チェンバとを備えた電子線照射装置において、前記真
空チェンバの照射窓部の窓箔の押え枠の外周に、内部に
窒素ガスが送られてくるパイプを設置し、前記パイプに
孔を設け、前記孔を、前記押え枠の内部を横切るように
貫通して設けられた貫通孔に連通せしめ、前記パイプの
孔からの窒素ガスが前記貫通孔を介して前記窓箔の下面
付近に向けて吹き付けられるように、前記貫通孔を前記
押え枠の内面において開口せしめてなる電子線照射装
置。
1. An electron beam irradiation apparatus comprising a vacuum chamber for emitting an electron beam and an irradiation chamber for irradiating an object to be irradiated with an electron beam from the vacuum chamber, wherein an irradiation window portion of the vacuum chamber is provided. A pipe through which nitrogen gas is sent is installed on the outer periphery of the holding frame of the window foil, a hole is provided in the pipe, and the hole is penetrated so as to cross the inside of the holding frame. An electron beam which is made to communicate with the hole so that the nitrogen gas from the hole of the pipe is blown toward the vicinity of the lower surface of the window foil through the through hole so that the through hole is opened on the inner surface of the holding frame. Irradiation device.
JP1987108700U 1987-07-14 1987-07-14 Electron beam irradiation device Expired - Lifetime JPH0629884Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987108700U JPH0629884Y2 (en) 1987-07-14 1987-07-14 Electron beam irradiation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987108700U JPH0629884Y2 (en) 1987-07-14 1987-07-14 Electron beam irradiation device

Publications (2)

Publication Number Publication Date
JPS6413659U JPS6413659U (en) 1989-01-24
JPH0629884Y2 true JPH0629884Y2 (en) 1994-08-10

Family

ID=31344280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987108700U Expired - Lifetime JPH0629884Y2 (en) 1987-07-14 1987-07-14 Electron beam irradiation device

Country Status (1)

Country Link
JP (1) JPH0629884Y2 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5115920Y2 (en) * 1971-11-04 1976-04-26

Also Published As

Publication number Publication date
JPS6413659U (en) 1989-01-24

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