JPH06298361A - Wafer transfer device - Google Patents

Wafer transfer device

Info

Publication number
JPH06298361A
JPH06298361A JP9297593A JP9297593A JPH06298361A JP H06298361 A JPH06298361 A JP H06298361A JP 9297593 A JP9297593 A JP 9297593A JP 9297593 A JP9297593 A JP 9297593A JP H06298361 A JPH06298361 A JP H06298361A
Authority
JP
Japan
Prior art keywords
wafer
ultrapure water
float
super
pure water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9297593A
Other languages
Japanese (ja)
Other versions
JP2659321B2 (en
Inventor
Kazuya Tsubota
一哉 坪田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP5092975A priority Critical patent/JP2659321B2/en
Publication of JPH06298361A publication Critical patent/JPH06298361A/en
Application granted granted Critical
Publication of JP2659321B2 publication Critical patent/JP2659321B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To transfer a wafer in super-pure water without exposing it to the air, and transfer the wafer in a sheet shape without generating any super-pure water bacteria. CONSTITUTION:The super-pure water 2 is stored in a duct 1, and a wafer is placed on a float 4 immersed in the super-pure water. The float 4 holds the wafer 3 in the super-pure water 2, and its water part floats in the super-pure water. At the position of a wafer handling device 10, a stopper 6 stops the float 4 for wafer processing, and the wafer is placed on the float 4 again. When the stopper 6 is removed, the wafer is transfered in an arrow direction 5 together with the super-pure water.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はウエハの移送装置に関す
るものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wafer transfer device.

【0002】[0002]

【従来の技術】近年デバイスの高集積化に伴いウエハに
要求される品質もますます厳しくなってきている。これ
に対応するためにウエハ製造工程においてもウエハハン
ドリングに種々の対策が講じられている。従来、ウエハ
を移送する場合、その直径が4インチ、5インチ、6イ
ンチ又は8インチ等比較的小径のウエハについては、2
5枚単位でカセットに収納して次工程に移送する方法が
採られている。
2. Description of the Related Art In recent years, with the high integration of devices, the quality required for wafers has become more and more severe. In order to deal with this, various measures are taken in wafer handling even in the wafer manufacturing process. Conventionally, when transferring a wafer, a wafer having a relatively small diameter such as 4 inches, 5 inches, 6 inches, or 8 inches has a diameter of 2 inches.
A method is adopted in which every five sheets are stored in a cassette and transferred to the next process.

【0003】ウエハを乾燥させて次工程へ移送すると、
乾燥の部分的不均一及び空気中での酸化によるウエハ表
面の変質などが発生するのでこれを防止するために超純
水に浸漬させたまま次工程へ移送する等の技術が開発さ
れている。一方ウエハの口径が大きくなると例えば8イ
ンチ径のウエハの次は12インチの直径のウエハが要求
されており、1枚当りの重量も重くなり搬送中の破損を
防止する意味から枚葉式搬送が好ましい。
When the wafer is dried and transferred to the next step,
Partial non-uniformity of drying and alteration of the wafer surface due to oxidation in the air occur. To prevent this, a technique of transferring the wafer to the next step while being immersed in ultrapure water has been developed. On the other hand, when the diameter of the wafer becomes large, for example, a wafer having a diameter of 8 inches and a wafer having a diameter of 12 inches are required next to the wafer. Therefore, the weight per sheet becomes heavy, and the single-wafer transportation is performed in order to prevent damage during transportation. preferable.

【0004】ウエハを超純水中に浸漬して搬送する場
合、様々な搬送用器具が開発されているが、いずれの場
合でも次のような問題がある。 (1)超純水の管理が難しく、バクテリアが発生し易
く、ウエハの品質に悪影響を及ぼす。 (2)搬送中に超純水が飛散したり、また、超純水と共
に搬送するため、重量が重くなり、自動化にも限度があ
る。
[0004] When carrying a wafer by immersing it in ultrapure water and carrying it, various carrying devices have been developed, but in any case, there are the following problems. (1) Management of ultrapure water is difficult, bacteria are likely to be generated, and wafer quality is adversely affected. (2) Since ultrapure water is scattered during the transportation, or is transported together with the ultrapure water, the weight becomes heavy and there is a limit to automation.

【0005】一方、枚葉式搬送においては、ベルトコン
ベヤの上にウエハを乗せて搬送するコンベヤ方式が一般
的であるが、コンベヤ等には必ず可動部分があり、そこ
でウエハ面に付着したパーティクルが純水中で発塵する
大きな原因となるなど、超純水中の搬送は種々の問題が
あり、成功していない。
On the other hand, in the single-wafer transfer, a conveyor system in which a wafer is placed on a belt conveyor and transferred is generally used. However, since the conveyor and the like always have movable parts, particles adhering to the wafer surface are inevitable. Transportation in ultrapure water has various problems, such as being a major cause of dust generation in pure water, and has not been successful.

【0006】[0006]

【発明が解決しようとする課題】今後デバイスの集積度
が増すことによるウエハ要求品質の高度化及びウエハ口
径の巨大化に対応するためには、 (1)枚葉式搬送 (2)超純水中への浸漬搬送 (3)ウエハの番地管理 (4)デバイスの製造工程でのそれぞれの設備能力に応
じた適切なウエハの供給が必要である。
In order to cope with the sophistication of the required quality of wafers and the enlarging of the wafer diameter due to the increase in the degree of integration of devices in the future, (1) single wafer transfer (2) ultrapure water Immersion transfer into the inside (3) Address management of wafers (4) It is necessary to supply appropriate wafers according to each facility capacity in the device manufacturing process.

【0007】[0007]

【課題を解決するための手段】本発明は前記問題点を一
挙に解決するために開発されたものである。すなわち、
本発明は、 (a)超純水が一定速度で一定容量流れるように設計さ
れた超純水循環流路 (b)ウエハを乗せた状態でも超純水中で浮き、ウエハ
は超純水に浸漬するように浮力を調整したウエハ搬送用
フロートを構成とする。さらに、 (c)ウエハの認識のために設置された位置検出用セン
サ又はフロートに内蔵した位置伝達用信号発信器等を具
備することとすれば好適である。
The present invention was developed to solve the above problems all at once. That is,
The present invention provides: (a) an ultrapure water circulation channel designed so that ultrapure water flows at a constant rate and a fixed volume. (B) Floating in ultrapure water even when a wafer is placed thereon A float for wafer transfer, whose buoyancy is adjusted so as to be immersed, is configured. Further, (c) it is preferable to include a position detecting sensor installed for wafer recognition, a position transmitting signal transmitter incorporated in the float, or the like.

【0008】[0008]

【作用】前記フロートを超純水循環流路中に入れると、
ウエハを乗せた状態では、フロートは浮いたまま、ウエ
ハは超純水中に浸漬された状態となる。このようなフロ
ート全体は、超純水の流動に従って容易に移動させるこ
とができ、また、フロートストッパを用いて、フロート
を定位置に停止させ、所定工程でのウエハ受け渡しをす
ることができる。
[Operation] When the float is put into the ultrapure water circulation passage,
When the wafer is placed, the float remains floating and the wafer is immersed in ultrapure water. The entire float can be easily moved in accordance with the flow of ultrapure water, and the float stopper can be used to stop the float at a fixed position to transfer the wafer in a predetermined process.

【0009】[0009]

【実施例】図1〜3に実施例を示した。流路1内に超純
水2を収納し、これを矢印5方向に流動させる。超純水
2中に浸漬したフロート4にウエハ3を乗せる。フロー
ト4はウエハ3を超純水2中に保持し、かつフロート4
全体が超純水2中に浮遊している。ウエハハンドリング
装置10の位置でストッパ6を矢印7のようにシフト
し、フロート4を停止させ、ウエハのハンドリング装置
10を作動させ、ウエハを取り出して処理を行い、処理
後再びフロート4上にのせ、ストッパ6を外側へシフト
すると、ウエハ3は超純水2と共に矢印5方向に移送さ
れる。
EXAMPLES Examples are shown in FIGS. The ultrapure water 2 is stored in the channel 1 and is made to flow in the direction of arrow 5. The wafer 3 is placed on the float 4 immersed in the ultrapure water 2. The float 4 holds the wafer 3 in the ultrapure water 2 and
The whole is suspended in ultrapure water 2. At the position of the wafer handling device 10, the stopper 6 is shifted as shown by the arrow 7, the float 4 is stopped, the wafer handling device 10 is operated, the wafer is taken out and processed, and after the processing, it is placed on the float 4 again. When the stopper 6 is shifted to the outside, the wafer 3 is transferred together with the ultrapure water 2 in the direction of arrow 5.

【0010】[0010]

【発明の効果】本発明によれば、ウエハを空中にさらす
ことなく移送できる。また、超純水の移送においても、
一定の流速を維持するために超純水でバクテリアを発生
させることなく、しかも枚葉で移送することができる。
According to the present invention, the wafer can be transferred without exposing it to the air. Also, when transferring ultrapure water,
In order to maintain a constant flow velocity, ultrapure water does not generate bacteria and can be transferred as a single wafer.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例のウエハ移送装置の横断面図である。FIG. 1 is a cross-sectional view of a wafer transfer device according to an embodiment.

【図2】実施例のウエハ移送装置の説明図である。FIG. 2 is an explanatory diagram of a wafer transfer device according to an embodiment.

【図3】実施例のウエハ移送装置の説明図である。FIG. 3 is an explanatory diagram of a wafer transfer device according to an embodiment.

【符号の説明】[Explanation of symbols]

1 流路 2 超純水 3 ウエハ 4 フロート 5 矢印(流動方向) 6 ストッパ 7 矢印 10 ハンドリング装置 1 flow path 2 ultrapure water 3 wafer 4 float 5 arrow (flow direction) 6 stopper 7 arrow 10 handling device

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 超純水を収納した循環流路と、該超純水
に一定方向の流動を生ぜしめる駆動源と、ウエハ載置状
態でウエハが該超純水中に浸漬するように浮力を調整し
たウエハ移送用フロートとを具備したことを特徴とする
ウエハ移送装置。
1. A circulating flow path containing ultrapure water, a drive source for causing the ultrapure water to flow in a certain direction, and buoyancy so that a wafer is immersed in the ultrapure water in a wafer mounted state. And a wafer transfer float that is adjusted.
JP5092975A 1993-04-20 1993-04-20 Wafer transfer device Expired - Lifetime JP2659321B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5092975A JP2659321B2 (en) 1993-04-20 1993-04-20 Wafer transfer device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5092975A JP2659321B2 (en) 1993-04-20 1993-04-20 Wafer transfer device

Publications (2)

Publication Number Publication Date
JPH06298361A true JPH06298361A (en) 1994-10-25
JP2659321B2 JP2659321B2 (en) 1997-09-30

Family

ID=14069408

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5092975A Expired - Lifetime JP2659321B2 (en) 1993-04-20 1993-04-20 Wafer transfer device

Country Status (1)

Country Link
JP (1) JP2659321B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007053341A (en) * 2005-06-15 2007-03-01 Lam Res Corp Method and device for transferring board using non-newtonian fluid

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04357852A (en) * 1991-06-04 1992-12-10 Fujitsu Ltd Method of transportation
JPH0574916A (en) * 1991-09-18 1993-03-26 Fujitsu Ltd Hydraulic conveyor
JPH05109874A (en) * 1991-10-18 1993-04-30 Fujitsu Ltd In-liquid conveyance apparatus and recovery apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04357852A (en) * 1991-06-04 1992-12-10 Fujitsu Ltd Method of transportation
JPH0574916A (en) * 1991-09-18 1993-03-26 Fujitsu Ltd Hydraulic conveyor
JPH05109874A (en) * 1991-10-18 1993-04-30 Fujitsu Ltd In-liquid conveyance apparatus and recovery apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007053341A (en) * 2005-06-15 2007-03-01 Lam Res Corp Method and device for transferring board using non-newtonian fluid
KR101111360B1 (en) * 2005-06-15 2012-02-24 램 리써치 코포레이션 Method and apparatus for transporting a substrate using non-newtonian fluid

Also Published As

Publication number Publication date
JP2659321B2 (en) 1997-09-30

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Legal Events

Date Code Title Description
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 19970513