JPH06294566A - Gas cylinder cooler for production of semiconductor - Google Patents

Gas cylinder cooler for production of semiconductor

Info

Publication number
JPH06294566A
JPH06294566A JP7961693A JP7961693A JPH06294566A JP H06294566 A JPH06294566 A JP H06294566A JP 7961693 A JP7961693 A JP 7961693A JP 7961693 A JP7961693 A JP 7961693A JP H06294566 A JPH06294566 A JP H06294566A
Authority
JP
Japan
Prior art keywords
cylinder
gas
semiconductor manufacturing
cooling
supply line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7961693A
Other languages
Japanese (ja)
Inventor
Kazuo Yokoki
和夫 横木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teisan KK
Original Assignee
Teisan KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teisan KK filed Critical Teisan KK
Priority to JP7961693A priority Critical patent/JPH06294566A/en
Publication of JPH06294566A publication Critical patent/JPH06294566A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To provide a gas cylinder cooler for the production of semiconductors which enables the checking of cost of the cooler remarkably and moreover, the reducing of complicated maintenance work. CONSTITUTION:A cooling jacket 5A is fitted into a cylinder 2 for storing a liquefied gas surrounding it. With the jetting of compressed air for cooling into the cooling jacket 5A, air is made to pass through a spiral passage pipe within the cooling jacket 5A to cool the cylinder 2 from the bottom to top. Thereafter, the air is discharged outside to meet a relationship of temperature< ambient temperature of supply line of the cylinder 2. This enables the prevention of a gas for the production of semiconductors from stagnating in the supply line associated with a difference in the temperature in the perimeter of the cylinder 2, a semiconductor production apparatus or the supply line thereby holding back the cost of the cooler significantly while reducing burden from complicated maintenance work.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、室温では殆ど蒸気圧値
が大気圧値に近似する半導体製造用のガスを貯えたガス
シリンダを空気で冷却する半導体製造用のガスシリンダ
冷却装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas cylinder cooling device for semiconductor manufacturing which cools a gas cylinder, which stores a gas for semiconductor manufacturing, whose vapor pressure value is close to the atmospheric pressure value at room temperature, with air. is there.

【0002】[0002]

【従来の技術】半導体製造用のガス供給システムは、図
4に示す如く、シリンダキャビネット1から半導体製造
用ガスを半導体製造装置3に供給ライン4を介して供給
するようにしている。
2. Description of the Related Art As shown in FIG. 4, a gas supply system for semiconductor manufacturing supplies a semiconductor manufacturing gas from a cylinder cabinet 1 to a semiconductor manufacturing apparatus 3 via a supply line 4.

【0003】供給設備である上記シリンダキャビネット
1は、図示しない供給施設内に設置され、その内部に
は、ボンベであるシリンダ2が1本、或いは、予備を含
めた複数本が収納されており、このシリンダ2には、シ
ランや窒素等の半導体製造用ガス(図示せず)が充填さ
れている。
The cylinder cabinet 1 which is a supply facility is installed in a supply facility (not shown), in which one cylinder 2 which is a cylinder or a plurality of cylinders including a spare are stored. The cylinder 2 is filled with a semiconductor manufacturing gas (not shown) such as silane or nitrogen.

【0004】また、上記半導体製造装置3は、該供給施
設とは別の図示しない半導体製造施設内に設置され、供
給ライン4を介して離隔したシリンダキャビネット1の
シリンダ2と接続されており、通常は不規則に停止・始
動して半導体を製造する機能を有している。
The semiconductor manufacturing apparatus 3 is installed in a semiconductor manufacturing facility (not shown) different from the supply facility, and is connected to a cylinder 2 of a cylinder cabinet 1 separated by a supply line 4, Has the function of manufacturing semiconductors by randomly stopping and starting.

【0005】さらに、上記供給ライン4は、半導体製造
用ガスを供給する作用を営むが、設置場所やスペース等
の関係から、図4に示す如く、低位部4aを備えた高低
の付いた状態で配管されるとともに、屋内の他、野外に
も複雑な配管状態等で配管されるのが一般的である。
Further, the supply line 4 has a function of supplying the semiconductor manufacturing gas. However, in view of the installation location, space, etc., as shown in FIG. In addition to being piped, it is generally piped not only indoors but also outdoors in a complicated piping condition.

【0006】然して、シリンダキャビネット1、半導体
製造装置3及び供給ライン4は、それぞれ別の施設内に
設置、又は、配管されるので、部分的に温まったり、冷
えたりする等、ガス供給システム全体に亘る温度分布が
一定化しないのが通常である。
However, since the cylinder cabinet 1, the semiconductor manufacturing apparatus 3 and the supply line 4 are installed or piped in different facilities, the gas supply system as a whole may be partially heated or cooled. It is normal for the temperature distribution over time to not be constant.

【0007】ところで、半導体の製造に際しては、上記
シランや窒素等のガスの他に、室温では殆ど蒸気圧値が
大気圧値に近似する液化ガス、換言すれば、20゜近辺
の室温では殆ど0気圧の液化ガス(例えば、SiH2
2 ガス、WF6 ガス、BCl3 ガス、ClF3 ガス、
F123ガス等)の使用されることが少なくない。
Incidentally, in the production of semiconductors, in addition to the above-mentioned gases such as silane and nitrogen, a liquefied gas whose vapor pressure value at room temperature is almost similar to the atmospheric pressure value, in other words, it is almost 0 at room temperature around 20 °. Liquefied gas at atmospheric pressure (eg SiH 2 C
l 2 gas, WF 6 gas, BCl 3 gas, ClF 3 gas,
F123 gas, etc.) is often used.

【0008】この液化ガスを上記半導体製造用のガス供
給システムに使用した場合、半導体製造装置3の運転中
には問題をそれほど生じさせないが、半導体製造装置3
の停止後には、以下に述べる大きな問題を生じさせるこ
とがあった。
When this liquefied gas is used in the gas supply system for semiconductor manufacturing, it does not cause much problems during the operation of the semiconductor manufacturing apparatus 3, but the semiconductor manufacturing apparatus 3
After the stop, there were cases where the following big problems were caused.

【0009】即ち、液化ガスからなる半導体製造用ガス
は、その特徴からレギュレータ無しで半導体製造装置3
側のポンプにより吸引状態で半導体製造装置3に供給さ
れるが、不規則な停止と始動を繰り返す半導体製造装置
3の停止に伴い、その一部が供給ライン4に残留するこ
ととなる(図4参照)。
That is, the semiconductor manufacturing gas, which is a liquefied gas, does not require a regulator because of its characteristics.
It is supplied to the semiconductor manufacturing apparatus 3 in a suction state by the pump on the side, but with the stop of the semiconductor manufacturing apparatus 3 which repeats irregular stop and start, a part thereof remains in the supply line 4 (FIG. 4). reference).

【0010】半導体製造装置3が停止しても、シリンダ
キャビネット1の側は供給状態、即ち、シリンダキャビ
ネット1内のバルブは開のままであるため、残留した半
導体製造用ガスは、時間の経過に伴い飽和蒸気になる
が、供給ライン4がシリンダ2の周囲温度に比べ冷える
場所に設置されている場合には、液化し、液化したガス
が管内に溜まることとなる。
Even if the semiconductor manufacturing apparatus 3 is stopped, the cylinder cabinet 1 side is in a supply state, that is, the valve in the cylinder cabinet 1 remains open, so that the remaining semiconductor manufacturing gas is left over time. Along with this, it becomes saturated vapor, but if the supply line 4 is installed at a place where it becomes cooler than the ambient temperature of the cylinder 2, it will be liquefied and the liquefied gas will accumulate in the pipe.

【0011】然して、この液量は時間の経過に従い増加
して最悪の場合液封となり、この液封を除去しないまま
で半導体製造用ガスの供給を再開すると、半導体製造用
ガスの供給が著しく困難化するという問題が生じる。ま
た、液封にまで至らない場合でも、管内に液が形成され
ることにより、ガス供給が不安定になるという問題が生
じる。
However, this liquid amount increases with the passage of time and becomes a liquid seal in the worst case. If the supply of the semiconductor manufacturing gas is restarted without removing the liquid seal, the supply of the semiconductor manufacturing gas is extremely difficult. The problem arises that Further, even if the liquid is not sealed up, the liquid is formed in the tube, which causes a problem that the gas supply becomes unstable.

【0012】この問題の解消には、シリンダキャビネッ
ト1、半導体製造装置3及び供給ライン4を一箇所に配
設して相互間の距離を狭め、システム全体の温度分布を
一定化するという方法が考えられる。
In order to solve this problem, a method of arranging the cylinder cabinet 1, the semiconductor manufacturing apparatus 3 and the supply line 4 at one place to reduce the distance between them and to make the temperature distribution of the entire system constant can be considered. To be

【0013】しかしながら、この方法は、設置スペース
等の関係から供給ライン4を高低の付いた状態や野外に
複雑な配管状態で配管せざるを得ない場合には、採用し
得ず、又、温度制御のための高価な制御機器を必要不可
欠にするという欠点がある。
However, this method cannot be adopted when the supply line 4 is liable to have a high or low condition or in a complicated piping condition in the field because of the installation space or the like, and the temperature cannot be adjusted. It has the drawback of making expensive control equipment essential for control.

【0014】そこで、上記問題の解消に際しては、従
来、図5や図6に示す如く、シリンダ2の周囲に冷却ジ
ャケット5を設置し、この冷却ジャケット5には、水や
アルコール等の冷却水を流入させるとともに、シリンダ
2を冷却した冷却水を外部に流出させ、シリンダ2の温
度<供給ライン4の周囲温度の関係にするようにしてい
る。
Therefore, in order to solve the above problem, conventionally, as shown in FIGS. 5 and 6, a cooling jacket 5 is provided around the cylinder 2, and cooling water such as water or alcohol is placed in the cooling jacket 5. The cooling water that has cooled the cylinder 2 is caused to flow to the outside while being made to flow, so that the relationship of the temperature of the cylinder 2 <the ambient temperature of the supply line 4 is satisfied.

【0015】上記冷却ジャケット5は、同図に示す如
く、2つに分割可能な平面ほぼC字形に構成され、その
内部には、均一に冷却する観点からほぼ波形に蛇行した
流通パイプ6が通常内蔵されており、シリンダ2に囲繞
状態で嵌入されている。
As shown in the figure, the cooling jacket 5 is formed in a substantially C-shape in a plane that can be divided into two parts, and a circulation pipe 6 meandering in a substantially corrugated shape is usually provided inside the cooling jacket 5 in order to uniformly cool the cooling pipe. It is built in and is fitted in the cylinder 2 in a surrounding state.

【0016】そして、冷却ジャケット5の上部には、冷
却水を図示しない恒温槽から流通パイプ6に流入させる
流入パイプ7が接続されるとともに、冷却水を流通パイ
プ6から外部に排出する流出パイプ8が接続されてい
る。
An inflow pipe 7 is connected to the upper part of the cooling jacket 5 to allow the cooling water to flow into the distribution pipe 6 from a thermostat (not shown), and an outflow pipe 8 for discharging the cooling water from the distribution pipe 6 to the outside. Are connected.

【0017】従って、冷却水は、恒温槽から流入パイプ
7を経由して冷却ジャケット5内の流通パイプ6に順次
流入し、この波形に蛇行した流通パイプ6内を流通して
シリンダ2を効率良く冷却し、その後、流通パイプ6か
ら流出パイプ8を経由して外部に順次排出され、シリン
ダ2の温度をその周囲の温度に比べ、約−3゜C〜−5
゜Cほど冷却する。
Therefore, the cooling water sequentially flows from the constant temperature bath into the distribution pipe 6 in the cooling jacket 5 via the inflow pipe 7, and then flows in the distribution pipe 6 meandering in the waveform to efficiently move the cylinder 2 into the cylinder 2. After cooling, it is sequentially discharged from the distribution pipe 6 to the outside via the outflow pipe 8, and the temperature of the cylinder 2 is compared with the temperature of its surroundings by about −3 ° C. to −5.
Cool down by ° C.

【0018】[0018]

【発明が解決しようとする課題】従来における半導体製
造用のガスシリンダ冷却装置は、以上のように構成さ
れ、シリンダ2を囲繞する冷却ジャケット5に、冷却水
を流入させ、この冷却水を外部に排出しているので、冷
却装置が非常に大型化・複雑化して極めて高価(具体的
には50万〜100万)になってしまうとともに、頻繁
に繁雑なメンテナンスを強いられると言う問題点があっ
た。
The conventional gas cylinder cooling apparatus for semiconductor manufacturing is constructed as described above, and the cooling water is made to flow into the cooling jacket 5 surrounding the cylinder 2 and the cooling water is exposed to the outside. Since it is discharged, there is a problem that the cooling device becomes extremely large and complicated and becomes extremely expensive (specifically, 500,000 to 1,000,000), and frequently complicated maintenance is forced. It was

【0019】本発明は上記に鑑みなされたもので、シリ
ンダを冷却する冷却装置のコストを著しく抑制し、しか
も、繁雑なメンテナンス作業を軽減することのできる半
導体製造用のガスシリンダ冷却装置を提供することを目
的としている。
The present invention has been made in view of the above, and provides a gas cylinder cooling device for semiconductor manufacturing which can significantly reduce the cost of a cooling device for cooling a cylinder and can reduce complicated maintenance work. Is intended.

【0020】[0020]

【課題を解決するための手段】本発明においては上述の
目的を達成するため、半導体の製造に使用され室温では
殆ど蒸気圧値が大気圧値に近似する半導体製造用ガス
と、この半導体製造用ガスを充填したシリンダと、この
シリンダから半導体製造設備に該半導体製造用ガスを供
給する供給ラインと、少なくとも該シリンダの一部を囲
む周壁と、この周壁を流通して該シリンダ内の半導体製
造用ガスを冷却する冷却用圧縮空気とを備え、シリン
ダ、半導体製造設備、又は、供給ラインの周囲の温度の
相違に伴う供給ライン内における半導体製造用ガスの供
給の渋滞を防止するようにしている。
In order to achieve the above-mentioned object in the present invention, there is provided a semiconductor manufacturing gas which is used for manufacturing a semiconductor and has a vapor pressure value almost equal to an atmospheric pressure value at room temperature. A cylinder filled with gas, a supply line for supplying the semiconductor manufacturing gas from the cylinder to the semiconductor manufacturing facility, a peripheral wall surrounding at least a part of the cylinder, and a semiconductor manufacturing device in the cylinder that flows through the peripheral wall. Compressed air for cooling the gas is provided to prevent the congestion of the supply of the semiconductor manufacturing gas in the supply line due to the difference in temperature around the cylinder, the semiconductor manufacturing facility, or the supply line.

【0021】[0021]

【作用】本発明によれば、冷却用圧縮空気は、外部から
周壁内に冷却用噴射ノズルを介して噴射送給される。こ
の時ノズルから断熱膨脹することにより、空気は冷却さ
れる。このようにして冷却された空気は、周壁内を順次
流通してシリンダを下部から上部へと効率良く冷却し、
然る後、周壁から外部に順次排出され、シリンダの温度
をその周囲の温度に比べ、−3゜C〜−5゜C冷却す
る。
According to the present invention, the compressed compressed air is jetted from the outside into the peripheral wall through the cooling jet nozzle. At this time, the air is cooled by adiabatic expansion from the nozzle. The air cooled in this way flows through the peripheral wall in sequence and efficiently cools the cylinder from the lower part to the upper part,
After that, they are sequentially discharged from the peripheral wall to the outside, and the temperature of the cylinder is cooled by -3 ° C to -5 ° C as compared with the ambient temperature.

【0022】[0022]

【実施例】以下、図1乃至図4に示す一実施例に基づき
本発明を詳説する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail below with reference to an embodiment shown in FIGS.

【0023】本発明に係る半導体製造用のガスシリンダ
冷却装置は、シリンダ2の周囲に冷却ジャケット5Aを
設置し、この冷却ジャケット5Aには、冷却用の圧縮空
気を噴射するとともに、シリンダ2を冷却した空気を外
部に排出し、シリンダ2の温度<供給ライン4の周囲温
度の関係にするようにしている。
In the gas cylinder cooling apparatus for semiconductor manufacturing according to the present invention, a cooling jacket 5A is installed around the cylinder 2, and compressed air for cooling is injected into the cooling jacket 5A and the cylinder 2 is cooled. The generated air is discharged to the outside so that the temperature of the cylinder 2 <the ambient temperature of the supply line 4 is satisfied.

【0024】ボンベである上記シリンダ2は、その内部
に室温では殆ど蒸気圧値が大気圧値に近似する液化ガ
ス、換言すれば、20゜近辺の室温では殆ど0気圧の液
化ガス(例えば、SiH2 Cl2 ガス、WF6 ガス、B
Cl3 ガス、ClF3 ガス、F123ガス等)が充填さ
れ、供給設備であるシリンダキャビネット1の内部に収
納されている。
The cylinder 2, which is a cylinder, has a liquefied gas whose vapor pressure value at room temperature is almost the same as the atmospheric pressure value, in other words, liquefied gas at almost 0 atm at room temperature around 20 ° (for example, SiH). 2 Cl 2 gas, WF 6 gas, B
Cl 3 gas, ClF 3 gas, F123 gas, etc.) are filled and housed inside the cylinder cabinet 1 which is a supply facility.

【0025】また、上記冷却ジャケット5Aは、同図に
示す如く、ステンレス等の材質から2つに分割可能な円
筒形に構成され、その内部には、冷却用の圧縮空気(図
示せず)を下部から上部に順次流通させる螺旋状の流通
パイプ6Aが内蔵されており、シリンダ2に囲繞状態で
嵌入されている。
As shown in the figure, the cooling jacket 5A is formed of a material such as stainless steel into a cylindrical shape which can be divided into two, and compressed air (not shown) for cooling is provided therein. A spiral flow pipe 6A that sequentially flows from the lower part to the upper part is built in, and is fitted in the cylinder 2 in a surrounding state.

【0026】さらに、冷却ジャケット5Aの外周面下部
には、冷却用の圧縮空気を流通パイプ6Aに噴射・送給
させる流入パイプ7が接続されている。然して、空気
は、流入パイプ7から流通パイプ6Aを経由して冷却ジ
ャケット5Aの上部から排出され、シリンダキャビネッ
ト1の内部に排出されるようになっている。
Further, an inflow pipe 7 for injecting and supplying compressed air for cooling to the flow pipe 6A is connected to the lower portion of the outer peripheral surface of the cooling jacket 5A. However, the air is discharged from the upper part of the cooling jacket 5A from the inflow pipe 7 through the distribution pipe 6A, and is discharged to the inside of the cylinder cabinet 1.

【0027】詳言すると、冷却用の空気は、外部から流
入パイプ7を経由して冷却ジャケット5A内の流通パイ
プ6Aに順次噴射され、この螺旋状の流通パイプ6A内
を流通してシリンダ2を下部から上部へと効率良く冷却
し、然る後、流通パイプ6Aからシリンダキャビネット
1の内部に順次排出され、シリンダ2の温度をその周囲
の温度に比べ、約−3゜C〜−5゜Cほど冷却する。
More specifically, the cooling air is sequentially injected from the outside through the inflow pipe 7 into the circulation pipe 6A in the cooling jacket 5A, and circulates in the spiral circulation pipe 6A to flow through the cylinder 2. It is efficiently cooled from the lower part to the upper part, and after that, it is sequentially discharged from the distribution pipe 6A into the inside of the cylinder cabinet 1, and the temperature of the cylinder 2 is about -3 ° C to -5 ° C as compared with the ambient temperature. Cool it down.

【0028】上記構成によれば、シリンダ2を囲繞する
冷却ジャケット5Aに、冷却水の代わりに断熱膨脹によ
り冷却された空気を送給するとともに、シリンダ2を冷
却した空気を外部に排出し、シリンダ2の温度<供給ラ
イン4の周囲温度の関係にするので、シリンダ2、半導
体製造装置3、又は、供給ライン4の周囲の温度の相違
に伴う供給ライン4内における半導体製造用ガスの渋滞
を防止することができるとともに、冷却装置のコストの
大幅な抑制(具体的には数万円程度)が期待できる。
According to the above construction, the cooling jacket 5A surrounding the cylinder 2 is supplied with the air cooled by adiabatic expansion instead of the cooling water, and the air cooled by the cylinder 2 is discharged to the outside. Since the relation of the temperature of 2 <the ambient temperature of the supply line 4 is satisfied, the congestion of the semiconductor production gas in the cylinder 2, the semiconductor manufacturing apparatus 3, or the supply line 4 due to the difference in the ambient temperature of the supply line 4 is prevented. In addition to that, it is possible to expect a significant reduction in the cost of the cooling device (specifically, about tens of thousands of yen).

【0029】具体的には、水冷の場合には、冷却ジャケ
ット5Aを厚く構成し、水漏れ対策や錆対策等を施さな
ければならず、しかも、冷却装置の付属設備を設置する
スペースを大きく確保せざるを得ない。
Specifically, in the case of water cooling, the cooling jacket 5A must be made thick to take measures against water leakage and rust, and moreover, a large space for installing auxiliary equipment of the cooling device must be secured. I have to do it.

【0030】これに対し、本発明に係る空冷の場合に
は、冷却ジャケット5Aを薄く構成でき、水漏れ対策や
錆対策等を施す必要が全くなく、しかも、半導体製造施
設内の圧縮空気を簡単に利用することができるので、冷
却装置の付属設備の設置スペースを大幅に縮小すること
が可能となる。また、水の場合のように高価な循環装置
は不要で、ただシリンダキャビネット1の内部に放出す
るだけで良く、構造が極めてシンプルである。
On the other hand, in the case of air cooling according to the present invention, the cooling jacket 5A can be made thin, there is no need to take measures against water leaks and rust, and the compressed air in the semiconductor manufacturing facility is simple. Therefore, it is possible to significantly reduce the installation space of the auxiliary equipment of the cooling device. Further, unlike the case of water, an expensive circulating device is not necessary, and it is sufficient to simply discharge it into the inside of the cylinder cabinet 1, and the structure is extremely simple.

【0031】さらに、水冷の場合には、シリンダ2の温
度をその周囲の温度に比べ−3゜C〜−5゜C冷却すれ
ば十分なのに、オーバースペック(恒温化)の問題が生
じるという欠点があったが、本発明に係る空冷の場合に
は、オーバースペックの問題を確実に解消することがで
きる。
Further, in the case of water cooling, it is sufficient to cool the temperature of the cylinder 2 by −3 ° C. to −5 ° C. as compared with the surrounding temperature, but there is a drawback that an over-spec (constant temperature) problem occurs. However, in the case of air cooling according to the present invention, the problem of over-spec can be reliably solved.

【0032】さらにまた、本発明に係る空冷の場合に
は、冷却ジャケット5Aを薄く構成でき、しかも、水漏
れ対策や錆対策等を施す必要が全くないので、繁雑なメ
ンテナンス作業の作業負担を軽減することが可能とな
る。
Furthermore, in the case of air cooling according to the present invention, the cooling jacket 5A can be made thin and there is no need to take measures against water leaks, rust, etc., so the burden of complicated maintenance work is reduced. It becomes possible to do.

【0033】次に、図3は本発明の他の実施例を示すも
ので、この場合には、シリンダ2の外周面の一部に、平
面ほぼ溝形のスタンド支柱5Bを複数のバンド9で重合
して立設し、このスタンド支柱5Bの立面下部には、流
入パイプ7を接続しており、冷却用の空気を矢印で示す
下部から上部方向に流通させるようにしている。
Next, FIG. 3 shows another embodiment of the present invention. In this case, a plurality of bands 9 are provided on a part of the outer peripheral surface of the cylinder 2 to form a stand column 5B having a substantially planar shape. An inflow pipe 7 is connected to the lower part of the vertical surface of the stand column 5B so that the cooling air is circulated in the upward direction from the lower part indicated by the arrow.

【0034】本実施例では上記実施例のようにシリンダ
2の全外周面を囲繞していないが、シリンダ2の温度<
供給ライン4の周囲温度の関係にできるので、シリンダ
2、半導体製造装置3、又は、供給ライン4の周囲の温
度の相違に伴う供給ライン4内における半導体製造用ガ
スの渋滞を防止することができるとともに、冷却装置の
コストの大幅な抑制が期待できるのは明白である。
In the present embodiment, the entire outer peripheral surface of the cylinder 2 is not surrounded as in the above embodiment, but the temperature of the cylinder 2 <
Since the relationship of the ambient temperature of the supply line 4 can be used, the congestion of the semiconductor manufacturing gas in the cylinder 2, the semiconductor manufacturing apparatus 3, or the supply line 4 due to the difference in the ambient temperature of the supply line 4 can be prevented. At the same time, it is obvious that the cost of the cooling device can be greatly suppressed.

【0035】尚、上記諸実施例では、円筒形の冷却ジャ
ケット5Aや溝形のスタンド支柱5Bを使用するものを
示したが、空冷という要件を満たすものであれば、平面
ほぼ茶碗形等の形状・構造等に構成しても上記諸実施例
と同様の作用効果を奏する。
In the above-mentioned embodiments, the cylindrical cooling jacket 5A and the grooved stand column 5B are used. However, as long as the requirement of air cooling is satisfied, the shape of the bowl is almost flat. -Even if it is constructed in a structure or the like, the same operation and effect as those of the above-mentioned embodiments can be obtained.

【0036】[0036]

【発明の効果】以上のように本発明によれば、シリンダ
を囲繞する周壁に、断熱膨脹により冷却された空気を流
入させるとともに、シリンダを冷却した空気を外部に排
出し、シリンダの温度<供給ラインの周囲温度の関係に
するので、シリンダ、半導体製造設備、又は、供給ライ
ンの周囲の温度の相違に伴う供給ライン内における半導
体製造用ガスの渋滞を確実に防止することができるとと
もに、冷却装置のコストの大幅な抑制が期待できるとい
う顕著な効果がある。
As described above, according to the present invention, the air cooled by adiabatic expansion is introduced into the peripheral wall surrounding the cylinder, and the air cooled by the cylinder is discharged to the outside, so that the temperature of the cylinder <supply. Since the relationship is based on the ambient temperature of the line, it is possible to reliably prevent the congestion of the semiconductor manufacturing gas in the supply line due to the difference in temperature around the cylinder, the semiconductor manufacturing facility, or the supply line, and to cool the cooling device. There is a remarkable effect that the cost of can be greatly suppressed.

【0037】さらに、空冷を活用するので、水漏れ対策
や錆対策等を施す必要が全くなく、繁雑なメンテナンス
作業の作業負担度を大幅に軽減することが可能になると
いう格別の効果がある。
Furthermore, since air cooling is utilized, there is no need to take measures against water leaks and rust, and there is a special effect that the work burden of complicated maintenance work can be greatly reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る半導体製造用のガスシリンダ冷却
装置の一実施例を示す斜視図である。
FIG. 1 is a perspective view showing an embodiment of a gas cylinder cooling device for semiconductor manufacturing according to the present invention.

【図2】本発明に係る半導体製造用のガスシリンダ冷却
装置の一実施例を示す断面説明図である。
FIG. 2 is an explanatory sectional view showing an embodiment of a gas cylinder cooling device for semiconductor manufacturing according to the present invention.

【図3】本発明に係る半導体製造用のガスシリンダ冷却
装置の他の実施例を示す斜視図である。
FIG. 3 is a perspective view showing another embodiment of the gas cylinder cooling device for semiconductor manufacturing according to the present invention.

【図4】半導体製造用のガス供給システムを示す全体説
明図である。
FIG. 4 is an overall explanatory diagram showing a gas supply system for semiconductor manufacturing.

【図5】従来における半導体製造用のガスシリンダ冷却
装置を示す斜視図である。
FIG. 5 is a perspective view showing a conventional gas cylinder cooling device for semiconductor manufacturing.

【図6】従来における半導体製造用のガスシリンダ冷却
装置を示す断面説明図である。
FIG. 6 is an explanatory cross-sectional view showing a conventional gas cylinder cooling device for semiconductor manufacturing.

【符号の説明】[Explanation of symbols]

1…シリンダキャビネット 2…シリンダ 3…半導体製造装置(半導体製造設備) 4…供給ライン 5・5A…冷却ジャケット(周壁) 5B…スタンド支柱(周壁) 6・6A…流通パイプ 1 ... Cylinder cabinet 2 ... Cylinder 3 ... Semiconductor manufacturing equipment (semiconductor manufacturing equipment) 4 ... Supply line 5.5A ... Cooling jacket (peripheral wall) 5B ... Stand support (peripheral wall) 6.6A ... Distribution pipe

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】半導体の製造に使用され室温では殆ど蒸気
圧値が大気圧値に近似する半導体製造用ガスと、この半
導体製造用ガスを充填したシリンダと、このシリンダか
ら半導体製造設備に該半導体製造用ガスを供給する供給
ラインと、少なくとも該シリンダの一部を囲む冷却壁
と、この冷却壁を流通して該シリンダ内の半導体製造用
ガスを冷却する冷却空気とを備え、シリンダ、半導体製
造設備、又は、供給ラインの周囲の温度の相違に伴う供
給ライン内における半導体製造用ガスの供給の渋滞を防
止することを特徴とする半導体製造用のガスシリンダ冷
却装置。
1. A semiconductor manufacturing gas which is used for manufacturing a semiconductor and has a vapor pressure value close to an atmospheric pressure value at room temperature, a cylinder filled with the semiconductor manufacturing gas, and a semiconductor manufacturing facility from the cylinder to the semiconductor manufacturing gas. A cylinder, a semiconductor manufacturing system, comprising a supply line for supplying a manufacturing gas, a cooling wall surrounding at least a part of the cylinder, and cooling air flowing through the cooling wall to cool the semiconductor manufacturing gas in the cylinder. A gas cylinder cooling device for semiconductor manufacturing, which prevents congestion of supply of semiconductor manufacturing gas in a supply line due to a difference in temperature around the equipment or the supply line.
JP7961693A 1993-04-06 1993-04-06 Gas cylinder cooler for production of semiconductor Pending JPH06294566A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7961693A JPH06294566A (en) 1993-04-06 1993-04-06 Gas cylinder cooler for production of semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7961693A JPH06294566A (en) 1993-04-06 1993-04-06 Gas cylinder cooler for production of semiconductor

Publications (1)

Publication Number Publication Date
JPH06294566A true JPH06294566A (en) 1994-10-21

Family

ID=13694997

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7961693A Pending JPH06294566A (en) 1993-04-06 1993-04-06 Gas cylinder cooler for production of semiconductor

Country Status (1)

Country Link
JP (1) JPH06294566A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10277380A (en) * 1996-11-25 1998-10-20 L'air Liquide System and method for control distribution of liquefied gas
JP2007506058A (en) * 2003-09-22 2007-03-15 デーナ、コーポレイション Pressure vessel assembly for an integrated pressurized fluid system
KR20220162908A (en) * 2021-06-01 2022-12-09 에스지엔 주식회사 Cooling jacket for gas-cylinder to be filled in semiconductor processing gas

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10277380A (en) * 1996-11-25 1998-10-20 L'air Liquide System and method for control distribution of liquefied gas
JP2007506058A (en) * 2003-09-22 2007-03-15 デーナ、コーポレイション Pressure vessel assembly for an integrated pressurized fluid system
US8079408B2 (en) 2003-09-22 2011-12-20 Bosch Rexroth Corporation Pressure vessel assembly for integrated pressurized fluid system
US8726977B2 (en) 2003-09-22 2014-05-20 Bosch Rexroth Corporation Pressure vessel assembly for integrated pressurized fluid system
KR20220162908A (en) * 2021-06-01 2022-12-09 에스지엔 주식회사 Cooling jacket for gas-cylinder to be filled in semiconductor processing gas

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