JPH06287261A - Method for purifying novolak resin - Google Patents

Method for purifying novolak resin

Info

Publication number
JPH06287261A
JPH06287261A JP7968493A JP7968493A JPH06287261A JP H06287261 A JPH06287261 A JP H06287261A JP 7968493 A JP7968493 A JP 7968493A JP 7968493 A JP7968493 A JP 7968493A JP H06287261 A JPH06287261 A JP H06287261A
Authority
JP
Japan
Prior art keywords
novolak resin
novolac resin
resin
water
impurities
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7968493A
Other languages
Japanese (ja)
Other versions
JP2769087B2 (en
Inventor
Koji Sasayama
孝治 笹山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanebo NSC KK
Original Assignee
Kanebo NSC KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanebo NSC KK filed Critical Kanebo NSC KK
Priority to JP5079684A priority Critical patent/JP2769087B2/en
Publication of JPH06287261A publication Critical patent/JPH06287261A/en
Application granted granted Critical
Publication of JP2769087B2 publication Critical patent/JP2769087B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Removal Of Specific Substances (AREA)
  • Phenolic Resins Or Amino Resins (AREA)

Abstract

PURPOSE:To obtain a method for purifying a novolak resin, capable of providing the novolak resin reduced in impurities by removing impurities contained in the novolak resin. CONSTITUTION:Impurities in a novolak resin is eluted and removed by bringing the novolak resin into contact with water.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、添加剤等の不純物の
含有されたノボラック樹脂中から上記不純物を除去する
ノボラック樹脂の精製法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for purifying a novolak resin which removes the impurities from a novolak resin containing impurities such as additives.

【0002】[0002]

【従来の技術】従来から半導体素子およびプリント基板
等の洗浄には、特定フロンおよび1,1,1−トリクロ
ロエタン等の塩素系溶剤が使用されてきた。しかしなが
ら、オゾン層破壊の可能性が指摘されてから、1995
年末時点での上記特定フロンの全廃が決定された。この
ため、国内においても、電気・電子業界を中心に、上記
特定フロンに代わる洗浄用代替フロンの開発が積極的に
行われている。そして、現在、溶剤系洗浄剤と水系洗浄
剤の2種類に大別される代替フロンが開発されている。
上記溶剤系洗浄剤は、ハロゲン化炭化水素系を除けばい
ずれも引火性を有するもので、使用にあたっては火災に
対する注意が必要であり防爆対応が必須である。また、
毒性を有するために取扱いに注意を要する。これに対し
て、上記水系洗浄剤は、基本的に引火性を有するもので
はなく危険性が非常に少ないため、最近ではこれを中心
に研究開発が行われている。上記水系洗浄剤には、アル
カリ鹸化型洗浄剤と中性高濃度界面活性剤を主成分とす
る洗浄剤の二つに大別される。上記アルカリ鹸化型洗浄
剤は、洗浄力の点では優れているが、例えば濯ぎ不足に
より洗浄剤が残留した場合にエレクトロマイグレーショ
ンが発生する等の問題を有している。このような観点か
ら、中性の高濃度界面活性剤を主成分とする水系洗浄剤
が最近注目されている。
2. Description of the Related Art Conventionally, for cleaning semiconductor devices, printed circuit boards and the like, specific flon and chlorine-based solvents such as 1,1,1-trichloroethane have been used. However, since the possibility of ozone depletion was pointed out, 1995
It was decided to abolish the specified CFCs at the end of the year. Therefore, also in Japan, mainly in the electric and electronic industries, development of alternative CFCs for cleaning in place of the above specific CFCs is being actively carried out. At present, alternative CFCs, which are roughly classified into two types, solvent-based cleaning agents and water-based cleaning agents, have been developed.
All of the above solvent-based cleaning agents are flammable except halogenated hydrocarbon-based cleaning agents, and precautions against fire are necessary and explosion-proof measures are essential when used. Also,
Careful handling due to toxicity. On the other hand, the above-mentioned water-based detergents are basically non-flammable and have very little danger, and therefore research and development have been conducted mainly on these recently. The above-mentioned water-based cleaning agents are roughly classified into two types: an alkaline saponification type cleaning agent and a cleaning agent containing a neutral high concentration surfactant as a main component. The above-mentioned alkaline saponification type detergent is excellent in detergency, but has a problem that electromigration occurs when the detergent remains due to insufficient rinsing, for example. From such a viewpoint, an aqueous cleaning agent containing a neutral high-concentration surfactant as a main component has recently received attention.

【0003】一方、上記中性の高濃度界面活性剤を主成
分とする洗浄剤は、非危険物で取扱いが容易であり、濯
ぎも水で行うことができるため、実用に適しており、最
近ではこの中性の高濃度界面活性剤を主成分とする洗浄
剤の開発が盛んに行われている。しかしながら、この洗
浄剤を用いて洗浄を行った際に、洗浄後に生ずる廃水の
処理が問題となる。この廃水処理としては、上記廃水
を、活性炭,イオン交換樹脂および活性汚泥等から構成
される廃水濾過システムで処理する方法が一般的であ
る。
On the other hand, the above-mentioned detergent containing a neutral high-concentration surfactant as a main component is a non-dangerous substance, is easy to handle, and can be rinsed with water, so that it is suitable for practical use. In this regard, the development of detergents containing this neutral high-concentration surfactant as the main component is being actively conducted. However, when cleaning is performed using this cleaning agent, treatment of waste water generated after cleaning poses a problem. This wastewater treatment is generally performed by treating the wastewater with a wastewater filtration system composed of activated carbon, ion exchange resin, activated sludge and the like.

【0004】[0004]

【発明が解決しようとする課題】しかし、上記廃水濾過
システムは、大規模な設備となり処理にコストがかかり
過ぎるという問題を有している。さらに、上記洗浄剤
は、ノニオン性の界面活性剤と水とからなり、このノニ
オン性界面活性剤を充分に除去することができないとい
う問題も有している。このように、代替フロンとして注
目されている中性の高濃度界面活性剤を主成分とする洗
浄剤を用いての洗浄の際に生ずる廃水の処理において、
効果的な処理方法が未だ確立されておらずその開発が強
く望まれているのが実情である。
However, the above waste water filtration system has a problem that it is a large-scale facility and the treatment is too costly. Furthermore, the above-mentioned cleaning agent is composed of a nonionic surfactant and water, and there is also a problem that the nonionic surfactant cannot be sufficiently removed. In this way, in the treatment of wastewater generated during cleaning using a cleaning agent whose main component is a neutral high-concentration surfactant, which is attracting attention as an alternative CFC,
The fact is that an effective treatment method has not yet been established and its development is strongly desired.

【0005】このような実情を解決するため、この出願
人は、ノボラック樹脂を主成分とし、これにアルカリ性
物質を用いて、廃水中のノニオン性界面活性剤を沈殿さ
せ分離させる廃水処理方法を提案し出願している(特願
平5−51779号)。ところが、上記廃水処理方法に
よって処理された上澄み液を分析すると、化学的酸素要
求量(COD)値が高く、廃水中に存在しない物質が検
出された。したがって、この上澄み液を活性汚泥,活性
炭等を用いて処理しても上澄み液のCOD値は高く、処
理液が放流可能なレベルにまで処理するには高度かつ高
コストの処理が要求される。
In order to solve such a situation, the present applicant proposes a wastewater treatment method in which a novolac resin is a main component, and an alkaline substance is used in the main component to precipitate and separate a nonionic surfactant in the wastewater. Have filed an application (Japanese Patent Application No. 5-51779). However, when the supernatant treated by the above wastewater treatment method was analyzed, a substance having a high chemical oxygen demand (COD) value and not existing in the wastewater was detected. Therefore, even if this supernatant liquid is treated with activated sludge, activated carbon or the like, the COD value of the supernatant liquid is high, and high-level and high-cost treatment is required to treat the treatment liquid to a level at which it can be discharged.

【0006】この発明は、このような事情に鑑みなされ
たもので、ノボラック樹脂中に含まれる不純物を容易に
除去して、不純物の少ないノボラック樹脂を得ることが
できるノボラック樹脂の精製法の提供をその目的とす
る。
The present invention has been made in view of the above circumstances, and provides a method for purifying a novolak resin, by which impurities contained in the novolac resin can be easily removed to obtain a novolac resin having less impurities. To that end.

【0007】[0007]

【課題を解決するための手段】上記の目的を達成するた
め、この発明のノボラック樹脂の精製法は、ノボラック
樹脂に水を接触させ、上記ノボラック樹脂中の不純物を
水に溶出させて除去するという構成をとる。
In order to achieve the above object, the method for purifying a novolak resin of the present invention is to bring water into contact with the novolac resin and to elute the impurities in the novolac resin to remove them. Take composition.

【0008】[0008]

【作用】すなわち、この発明者は、ノボラック樹脂を用
いて廃水処理を行った際に生じる上澄み液中の成分を分
析すると、廃水中に含まれていない成分が含有されて、
これが廃水処理された上澄み液のCOD値を上げる原因
であることを突き止めた。そして、このCOD値を上げ
る原因である物質について研究を重ねた結果、この物質
は上記ノボラック樹脂に起因することを突き止めた。つ
いで、このノボラック樹脂に起因する不純物を除去する
ために研究を重ねた結果、水で洗浄すると、洗浄後の上
澄み液中に不純物が溶出されて不純物の少ないノボラッ
ク樹脂が得られることを見出しこの発明に到達した。
That is, the present inventor analyzed the components in the supernatant liquid generated when wastewater treatment was performed using a novolac resin, and found that the components not contained in the wastewater were contained,
It was found that this is the cause of increasing the COD value of the supernatant treated with the wastewater. As a result of repeated research on the substance that causes the increase in the COD value, it was found that this substance is caused by the novolac resin. Then, as a result of repeated studies to remove impurities caused by this novolak resin, it was found that washing with water results in the elution of impurities in the supernatant liquid after washing to obtain a novolak resin having less impurities. Reached

【0009】つぎに、この発明について詳しく説明す
る。
Next, the present invention will be described in detail.

【0010】この発明のノボラック樹脂の精製法には、
ノボラック樹脂と、水とが用いられる。
The method for purifying the novolak resin of the present invention comprises:
Novolac resin and water are used.

【0011】この発明の対象となるノボラック樹脂は、
特に限定するものではなく従来公知のものがあげられ
る。上記ノボラック樹脂の形態としては、粒状のものを
用いるのが好ましい。上記粒状とは、粒状,粉末状,フ
レーク状,マーブル状のものはもちろん、粉末状のもの
を打錠成形等によりペレット状に成形されたものも含む
趣旨である。そして、上記粒状ノボラック樹脂として
は、下記の一般式(1)で表されるノボラック樹脂を主
成分とするものを用いることが好ましい。特に、一般式
(1)中の繰り返し数nは5〜7が好適である。繰り返
し数nとして5〜7のものを用いることにより、廃水中
のノニオン性界面活性剤とそれ以外との分離が一層効果
的となる。
The novolak resin to which the present invention is applied is
There is no particular limitation, and conventionally known ones can be used. As the form of the novolac resin, it is preferable to use a granular form. The term "granular" is intended to include not only granular, powdery, flake-shaped, and marble-shaped particles, but also powdery particles formed into pellets by tableting or the like. And as the above-mentioned granular novolak resin, it is preferable to use a resin containing a novolac resin represented by the following general formula (1) as a main component. Particularly, the repeating number n in the general formula (1) is preferably 5 to 7. By using the repeating number n of 5 to 7, the separation of the nonionic surfactant in the waste water and the other components becomes more effective.

【0012】[0012]

【化1】 [Chemical 1]

【0013】この発明のノボラック樹脂の精製法は、例
えばつぎのようにして行われる。すなわち、ノボラック
樹脂に水を配合し攪拌する。そして、ノボラック樹脂か
らなる沈殿物質と上澄み液に分離させて、上記上澄み液
中にノボラック樹脂中の不純物を溶出させる。ついで、
この上澄み液とノボラック樹脂を遠心分離,脱水機等に
より分離して上澄み液を除去する。さらに、ノボラック
樹脂を精製する場合は、上記操作を繰り返す。このよう
にして、ノボラック樹脂に含まれる不純物が水中に溶出
し、上澄み液とともに除去される。
The method for purifying the novolac resin of the present invention is carried out, for example, as follows. That is, the novolac resin is mixed with water and stirred. Then, the precipitated substance composed of the novolac resin is separated into a supernatant, and the impurities in the novolac resin are eluted into the supernatant. Then,
The supernatant and the novolak resin are separated by centrifugation, dehydrator or the like to remove the supernatant. Further, when refining the novolac resin, the above operation is repeated. In this way, the impurities contained in the novolac resin are eluted in water and are removed together with the supernatant.

【0014】このような精製法にてノボラック樹脂を精
製した際に生ずる上澄み液中には、ノボラック樹脂に含
有されていた不純物が溶出する。そして、ノボラック樹
脂からなる沈殿物質と上澄み液とを分離し、上澄み液を
除去する方法としては、分離・除去可能であれば上記装
置に特に限定する必要はない。
Impurities contained in the novolac resin are eluted in the supernatant produced when the novolac resin is purified by such a purification method. Then, as a method for separating the precipitating substance consisting of the novolac resin and the supernatant liquid and removing the supernatant liquid, it is not particularly limited to the above-mentioned device as long as it can be separated and removed.

【0015】上記精製法で用いられる水としては、例え
ば25℃程度の常温水から80℃程度の温水を用いるこ
とが好ましい。特に好ましくは50℃程度の温水であ
る。
As the water used in the above-mentioned purification method, for example, room temperature water at about 25 ° C. to warm water at about 80 ° C. is preferably used. Particularly preferred is warm water of about 50 ° C.

【0016】[0016]

【発明の効果】以上のように、この発明のノボラック樹
脂の精製法は、ノボラック樹脂に水を接触させ、上記ノ
ボラック樹脂中の不純物を水に溶出させて除去するもの
である。このため、廃水処理剤として上記精製されたノ
ボラック樹脂を用いると、上澄み液中にノボラック樹脂
に含有された不純物の溶出が減少して上澄み液のCOD
値が低下する。したがって、廃水処理により生じた上澄
み液を活性汚泥,活性炭等で効果的に処理し、廃水を放
流可能なまでのCOD値,生化学的酸素要求量(BO
D)値等に設定することが容易となる。
As described above, the method for purifying a novolak resin of the present invention is to remove the impurities in the novolac resin by eluting it with water by contacting the novolac resin with water. Therefore, when the purified novolac resin is used as the wastewater treatment agent, the elution of impurities contained in the novolac resin in the supernatant is reduced, and the COD of the supernatant is reduced.
The value decreases. Therefore, the COD value and biochemical oxygen demand (BO) until the wastewater can be discharged by effectively treating the supernatant produced by the wastewater treatment with activated sludge, activated carbon, etc.
D) It becomes easy to set a value or the like.

【0017】つぎに、この発明を実施例に基づいて詳し
く説明する。
Next, the present invention will be described in detail based on embodiments.

【0018】[0018]

【実施例1】粉末状(粒径0.5mm以下)のノボラッ
ク型フェノール・ホルムアルデヒド樹脂100gに常温
水(25℃)を1000リットル添加して攪拌すること
によりノボラック樹脂を洗浄した。
Example 1 1000 liters of normal temperature water (25 ° C.) was added to 100 g of a powdery (particle size: 0.5 mm or less) novolak type phenol-formaldehyde resin, and the novolac resin was washed by stirring.

【0019】[0019]

【実施例2】実施例1で洗浄されたノボラック樹脂を、
さらに実施例1と同様の方法により洗浄した。
Example 2 The novolac resin washed in Example 1 was
Further, it was washed in the same manner as in Example 1.

【0020】[0020]

【実施例3】常温水を50℃の温水に代えた。それ以外
は実施例1と同様にしてノボラック樹脂を洗浄した。
Example 3 Normal temperature water was replaced with warm water at 50 ° C. The novolak resin was washed in the same manner as in Example 1 except for the above.

【0021】[0021]

【実施例4】実施例3で洗浄されたノボラック樹脂を、
さらに実施例3と同様の方法により洗浄した。
Example 4 The novolak resin washed in Example 3 was
Further, washing was performed in the same manner as in Example 3.

【0022】[0022]

【実施例5】粉末状のノボラック型フェノール・ホルム
アルデヒド樹脂をマーブル状のノボラック型フェノール
・ホルムアルデヒド樹脂に代えた。それ以外は実施例1
と同様にしてノボラック樹脂を洗浄した。
Example 5 The powdery novolac type phenol / formaldehyde resin was replaced with a marble type novolac type phenol / formaldehyde resin. Otherwise, Example 1
The novolak resin was washed in the same manner as.

【0023】[0023]

【実施例6】実施例5で洗浄されたノボラック樹脂を、
さらに実施例5と同様の方法により洗浄した。
Example 6 The novolac resin washed in Example 5 was
Further, it was washed in the same manner as in Example 5.

【0024】[0024]

【実施例7】常温水を50℃の温水に代えた。それ以外
は実施例5と同様にしてノボラック樹脂を洗浄した。
Example 7 Normal temperature water was replaced with warm water at 50 ° C. The novolak resin was washed in the same manner as in Example 5 except for the above.

【0025】[0025]

【実施例8】実施例7で洗浄されたノボラック樹脂を、
さらに実施例7と同様の方法により洗浄した。
Example 8 The novolac resin washed in Example 7 was
Further, it was washed in the same manner as in Example 7.

【0026】このようにして洗浄した各ノボラック樹脂
の洗浄液のCOD値を酸性過マンガン酸カリウム法に従
って測定した。その結果を下記の表1に示す。さらに、
上記各洗浄液中の成分をガスクロマトグラフィー(ヒュ
レットパッカー社製,HP5971)により分析した。
その結果、上記成分の大半は、フェノール、2,2′−
メチレンビス、4,4′−メチレンビスであることが判
明した。なお、ガスクロマトグラフィーの条件は、カラ
ム:HP−5、キャリアガス:Heで1ml/minで
ある。
The COD value of the cleaning liquid of each novolak resin thus washed was measured according to the acidic potassium permanganate method. The results are shown in Table 1 below. further,
The components in each of the above washing solutions were analyzed by gas chromatography (HP5971, manufactured by Hulet Packer).
As a result, most of the above components are phenol, 2,2'-
It was found to be methylenebis and 4,4'-methylenebis. The conditions for gas chromatography are column: HP-5 and carrier gas: He at 1 ml / min.

【0027】[0027]

【表1】 [Table 1]

【0028】上記表1の結果から、ノボラック樹脂から
大量の不純物が溶出していることがわかる。さらに、洗
浄工程を繰り返すことにより不純物の溶出量が減少し先
の洗浄工程で不純物が除去されていることがわかる。
From the results shown in Table 1 above, it can be seen that a large amount of impurities are eluted from the novolac resin. Furthermore, it can be seen that by repeating the washing step, the amount of impurities eluted is reduced and the impurities are removed in the previous washing step.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 ノボラック樹脂に水を接触させ、上記ノ
ボラック樹脂中の不純物を水に溶出させて除去すること
を特徴とするノボラック樹脂の精製法。
1. A method for purifying a novolac resin, which comprises contacting water with the novolac resin and eluting impurities in the novolac resin into water to remove the impurities.
JP5079684A 1993-04-06 1993-04-06 Manufacturing method of wastewater treatment agent Expired - Lifetime JP2769087B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5079684A JP2769087B2 (en) 1993-04-06 1993-04-06 Manufacturing method of wastewater treatment agent

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5079684A JP2769087B2 (en) 1993-04-06 1993-04-06 Manufacturing method of wastewater treatment agent

Publications (2)

Publication Number Publication Date
JPH06287261A true JPH06287261A (en) 1994-10-11
JP2769087B2 JP2769087B2 (en) 1998-06-25

Family

ID=13697038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5079684A Expired - Lifetime JP2769087B2 (en) 1993-04-06 1993-04-06 Manufacturing method of wastewater treatment agent

Country Status (1)

Country Link
JP (1) JP2769087B2 (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6053516A (en) * 1983-09-05 1985-03-27 Sumitomo Bakelite Co Ltd High-purity phenolic resin and its preparation
JPS62212408A (en) * 1986-03-14 1987-09-18 Matsushita Electric Works Ltd Production of low-mw phenol resin
JPS62212409A (en) * 1986-03-14 1987-09-18 Matsushita Electric Works Ltd Production of high-purity phenolic resin
JPS62267315A (en) * 1986-05-15 1987-11-20 Matsushita Electric Works Ltd Production of phenolic resin
JPH0291115A (en) * 1988-09-28 1990-03-30 Mitsubishi Petrochem Co Ltd Preparation of polyphenol
JPH03220220A (en) * 1990-01-25 1991-09-27 Sumitomo Durez Co Ltd Production of phenolic resin and can coating agent
JPH0632814A (en) * 1992-07-21 1994-02-08 Toshiba Corp Method for removing impurity in resin for electronic part

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6053516A (en) * 1983-09-05 1985-03-27 Sumitomo Bakelite Co Ltd High-purity phenolic resin and its preparation
JPS62212408A (en) * 1986-03-14 1987-09-18 Matsushita Electric Works Ltd Production of low-mw phenol resin
JPS62212409A (en) * 1986-03-14 1987-09-18 Matsushita Electric Works Ltd Production of high-purity phenolic resin
JPS62267315A (en) * 1986-05-15 1987-11-20 Matsushita Electric Works Ltd Production of phenolic resin
JPH0291115A (en) * 1988-09-28 1990-03-30 Mitsubishi Petrochem Co Ltd Preparation of polyphenol
JPH03220220A (en) * 1990-01-25 1991-09-27 Sumitomo Durez Co Ltd Production of phenolic resin and can coating agent
JPH0632814A (en) * 1992-07-21 1994-02-08 Toshiba Corp Method for removing impurity in resin for electronic part

Also Published As

Publication number Publication date
JP2769087B2 (en) 1998-06-25

Similar Documents

Publication Publication Date Title
JP2770883B2 (en) Concentrated fluid photochemical treatment method for substrate treatment
ATE304991T1 (en) REMOVAL OF METAL IONS FROM WASTEWATER THROUGH ION EXCHANGE
US7488423B2 (en) System and method of slurry treatment
JP5490035B2 (en) How to clean contaminated soil
JP5164169B2 (en) How to clean hazardous metal contaminants
DE69937113D1 (en) REMOVAL OF METALLIONS FROM WASTE WATER
JP2769088B2 (en) Manufacturing method of wastewater treatment agent
JPH06287261A (en) Method for purifying novolak resin
JP2786982B2 (en) Wastewater treatment agent
JP2786981B2 (en) Wastewater treatment agent
US20100108609A1 (en) System and method of slurry treatment
US5055201A (en) Process for removing dissolved contaminants from aqueous solutions using reversibly dispersible getters
JP2840003B2 (en) Wastewater treatment method
JPH07232915A (en) Method for recovering fluorine in waste water
JP2840004B2 (en) Wastewater treatment method
JP2003185791A (en) Method of removing radium in water
JPH06154749A (en) Method for recovering organic quaternary ammonium hydroxide out of waste liquid
JP5049843B2 (en) Method and apparatus for removing radioactive substances and TOC
JP2893493B2 (en) Silicon wafer cleaning method
JP2010253393A (en) Method of recovering useful solid component in waste slurry
WO1996024158A1 (en) Compound for cleaning solid surfaces
JP2004290768A (en) Method for cleaning soil and ground water polluted with organochlorine compound
KR100206685B1 (en) Method for removing arsenic from soil contaminant and wastes
JP2016043283A (en) Method and apparatus for decontaminating contaminated soil
JPH09251095A (en) Method for cleaning pipe line