JPH06283314A - Voltage nonlinear resistance element - Google Patents

Voltage nonlinear resistance element

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Publication number
JPH06283314A
JPH06283314A JP5072233A JP7223393A JPH06283314A JP H06283314 A JPH06283314 A JP H06283314A JP 5072233 A JP5072233 A JP 5072233A JP 7223393 A JP7223393 A JP 7223393A JP H06283314 A JPH06283314 A JP H06283314A
Authority
JP
Japan
Prior art keywords
electrode
silver
parts
glass frit
stannous oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5072233A
Other languages
Japanese (ja)
Inventor
Toshiaki Murakami
俊昭 村上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Yuden Co Ltd
Original Assignee
Taiyo Yuden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Yuden Co Ltd filed Critical Taiyo Yuden Co Ltd
Priority to JP5072233A priority Critical patent/JPH06283314A/en
Publication of JPH06283314A publication Critical patent/JPH06283314A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To provide a voltage nonlinear resistance element with such an inexpensive ohmic electrode that the electrode has excellent solder wettability and a strong strength of adhesion and stable electrical characteristics can be obtained without forming any potential barrier. CONSTITUTION:An ohmic electrode to be formed on the surface of a semiconductor ceramic in a coating state is composed of silver containing glass frit and at least one kind selected out of metallic tin and stannous oxide and the mixing amounts of the glass frit and metallic thin or stannous oxide against 100 pts. silver are respectively set at 1.5-6.0 pts. and 0.5-10.0 pts.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、電圧非直線性抵抗素子
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a voltage non-linear resistance element.

【0002】[0002]

【従来の技術】従来、半導体磁器セラミックを基材とし
た電圧非直線性抵抗素子やサーミスター素子において、
その基材へ金(Au)、銀(Ag)銅(Cu)等の電極
を焼き付け等により被着形成した場合、半導体磁器と前
記電極界面との間に電位障壁が形成されてしまい、この
電位障壁自体が高電場もしくは熱等に対して不安定なた
め、素子として不安定なものとなってしまう。例えばこ
のような電位障壁を持つ素子はパルスやサージ電流によ
って特性劣化を生じたり、電極へ半田つけをすることに
よっても劣化を生じてしまうものである。
2. Description of the Related Art Conventionally, in voltage non-linear resistance elements and thermistor elements based on semiconductor porcelain ceramics,
When electrodes of gold (Au), silver (Ag), copper (Cu), etc. are formed on the base material by baking or the like, a potential barrier is formed between the semiconductor porcelain and the electrode interface, and this potential Since the barrier itself is unstable to a high electric field or heat, it becomes an unstable element. For example, an element having such a potential barrier causes characteristic deterioration due to pulse or surge current, or deterioration due to soldering to electrodes.

【0003】そこで、これらの特性劣化を改善すべく、
電極材料の銀(Ag)にインジウム・ガリウム(In−
Ga)等の合金、もしくは亜鉛(Zn)等の金属を含有
せしめた、所謂オーミック電極を被着することによって
電位障壁を生ずることなく、半導体磁器の表面に電極を
形成することが可能となり、半導体磁器自身の電気特性
を安定して引き出すことが出来る。
Therefore, in order to improve these characteristic deteriorations,
Indium gallium (In-
By depositing a so-called ohmic electrode containing an alloy such as Ga) or a metal such as zinc (Zn), it is possible to form an electrode on the surface of a semiconductor porcelain without generating a potential barrier. The electric characteristics of the porcelain itself can be stably extracted.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、前記電
極を500〜600℃の大気中で焼き付けした場合、A
g中のIn−Gaは酸化されてしまい、焼付形成された
電極は非常に半田つけが悪くなり、実用化が困難とな
る。
However, when the electrode is baked in the atmosphere of 500 to 600 ° C., A
In-Ga in g is oxidized, and the electrode formed by baking becomes very poor in soldering, which makes practical application difficult.

【0005】そこでこれらの電極上に更にIn−Ga等
を含まない一般のAgを被覆形成し、半田ぬれ性を得る
ことで実用化されているが、実質的には素子の上に電極
を2層印刷するため、1層目と2層目の位置ズレが生じ
る可能性があるため、外観上問題となるばかりではな
く、特性のバラツキも助長することとなってしまう。
Therefore, a general Ag containing no In-Ga or the like is further coated on these electrodes to obtain solder wettability, which is practically used. However, in practice, two electrodes are provided on the element. Since the layers are printed, the first layer and the second layer may be misaligned, which not only causes a problem in appearance but also promotes variations in characteristics.

【0006】また、素子の上に2層印刷することで、そ
の分、工程に手間がかかり、かつ電極材として高価なI
n−Gaの使用も相俟って得られた電圧非直線性抵抗素
子が非常に高価な素子となってしまう。更に、低温で焼
付処理を行わなければならないため、半導体磁器に対す
る接着強度が弱いことも欠点として挙げられる。
Further, since two layers are printed on the element, the process is laborious and the cost of the electrode material is high.
The voltage non-linear resistance element obtained in combination with the use of n-Ga becomes a very expensive element. Further, since the baking process must be performed at a low temperature, the weak adhesion strength to the semiconductor ceramics is also a drawback.

【0007】本発明はかかる問題点を解消し、半田ぬれ
性、接着強度が良好で、かつ電位障壁を形成せずに安定
した電気特性が得られる安価なオーミック電極を有する
電圧非直線性抵抗素子を提供することを目的とする。
The present invention solves the above problems, has good solder wettability and adhesive strength, and has a voltage non-linear resistance element having an inexpensive ohmic electrode capable of obtaining stable electric characteristics without forming a potential barrier. The purpose is to provide.

【0008】[0008]

【課題を解決するための手段】本発明の電圧非直線性抵
抗素子は、半導体磁器にオーミック電極を被着形成した
電圧非直線性抵抗素子において、前記オーミック電極は
銀とガラスフリットに金属錫もしくは酸化第一錫の少な
くとも1種類を含有し、大気中もしくは中性雰囲気中で
焼き付けされた焼付電極であって、銀100部、ガラス
フリット1.5〜6.0部に対して金属錫もしくは酸化
第一錫の少なくとも1種類を0.5〜10.0部の範囲
で含有することを特徴とする。
The voltage non-linear resistance element of the present invention is a voltage non-linear resistance element in which an ohmic electrode is formed on a semiconductor porcelain, wherein the ohmic electrode is silver and glass frit is made of metal tin or A baking electrode containing at least one kind of stannous oxide and baked in the air or in a neutral atmosphere, wherein metallic tin or an oxide is added to 100 parts of silver and 1.5 to 6.0 parts of glass frit. It is characterized by containing at least one kind of stannous in a range of 0.5 to 10.0 parts.

【0009】[0009]

【作用】前記組成で構成された電極は、金属錫もしくは
酸化第一錫の少なくとも1種類を含有することにより、
半導体磁器に対して電位障壁を持たないオーミック電極
となり、半導体磁器自身の電気特性をそのまま引き出す
ことが出来る。また、電位障壁を持たないため、パルス
に対する劣化もなく、電気的にも安定で信頼性の高い電
圧非直線性抵抗素子を得ることが出来る。
The electrode having the above composition contains at least one of metallic tin and stannous oxide,
It becomes an ohmic electrode that does not have a potential barrier to the semiconductor porcelain, and the electrical characteristics of the semiconductor porcelain itself can be brought out as they are. Further, since it has no potential barrier, it is possible to obtain a voltage non-linear resistance element which is electrically stable and highly reliable without deterioration due to pulses.

【0010】しかも前記組成で構成された電極に従来の
ような高価なIn−Ga合金を用いる必要がないため、
従来のIn−Ga合金を含有せしめたAgのオーミック
電極に比して安価なものとなる。
Moreover, since it is not necessary to use an expensive In-Ga alloy as in the prior art for the electrode having the above composition,
The cost is lower than that of a conventional Ag ohmic electrode containing an In-Ga alloy.

【0011】また、焼付電極を得るために中性雰囲気中
で電極材に焼付処理を行なう時は、電極表面中の金属錫
の酸化進行は抑えられ、これによって良好な半田ぬれ性
が得られる。また、酸化第一錫を含有する電極材は大気
中で焼付処理を行っても酸化第二錫への酸化進行は比較
的小さく、前記組成範囲で充分良好な半田ぬれ性が得ら
れる。
When the electrode material is baked in a neutral atmosphere in order to obtain a baked electrode, the progress of oxidation of metallic tin on the electrode surface is suppressed, and good solder wettability is thereby obtained. Further, the electrode material containing stannous oxide has a relatively small progress of oxidation to stannic oxide even after baking treatment in the atmosphere, and sufficiently good solder wettability can be obtained within the above composition range.

【0012】また、前記構成の電極は、電極1層のみで
良好なオーミック電極特性が得られ、かつ半田つけが良
好となるため、従来のIn−Ga合金を含むオーミック
銀電極のような電極材の2層印刷は不要となる。
In addition, since the electrode having the above-mentioned structure can obtain good ohmic electrode characteristics with only one electrode layer and can be well soldered, an electrode material such as an ohmic silver electrode containing a conventional In-Ga alloy is used. The two-layer printing is not required.

【0013】[0013]

【実施例】本発明における半導体磁器上に電極材を印刷
した後、焼付処理を施す際の、雰囲気は電極とする銀に
含有させる錫(金属錫、もしくは酸化第一錫)の種類、
含有量に対応させて大気中、もしくは中性雰囲気中とす
ればよく、中性雰囲気は例えばN2100%とする。
EXAMPLES After printing an electrode material on a semiconductor porcelain according to the present invention and performing a baking process, the atmosphere is the kind of tin (metal tin or stannous oxide) contained in silver used as an electrode,
Depending on the content, the atmosphere or the neutral atmosphere may be used, and the neutral atmosphere is, for example, N 2 100%.

【0014】また、焼付温度は電極とする銀に含有させ
る錫(金属錫、もしくは酸化第一錫)の種類、含有量お
よび焼付雰囲気に対応させて700〜850℃程度で行
えばよい。
The baking temperature may be about 700 to 850 ° C. depending on the kind and content of tin (metal tin or stannous oxide) contained in the silver used as the electrode and the baking atmosphere.

【0015】また、銀に含有させるガラスフリットとし
ては硼珪酸鉛が挙げられ、また、銀100部に含有させ
るガラスフリット量の範囲を1.5〜6.0部としたの
は、含有量が1.5部未満の場合は充分な電極強度が得
られなくなり、また、含有量が6.0部を超えた場合は
半田ぬれ性が低下するからである。
Further, as the glass frit contained in silver, lead borosilicate can be mentioned, and the range of the amount of glass frit contained in 100 parts of silver is 1.5 to 6.0 parts because the content is This is because when the amount is less than 1.5 parts, sufficient electrode strength cannot be obtained, and when the content exceeds 6.0 parts, the solder wettability is deteriorated.

【0016】また、銀およびガラスフリットに含有させ
る金属錫もしくは酸化第一錫の少なくとも1種類の量の
範囲を0.5〜10.0部としたのは、含有量が0.5
部未満の場合は安定した良好なオーミック性が得られな
くなり、また、含有量が10.0部を超えた場合は半田
ぬれ性が低下するからである。
The amount of at least one of metallic tin or stannous oxide contained in silver and glass frit is set to 0.5 to 10.0 parts because the content is 0.5.
When the content is less than 1.0 part, stable and good ohmic properties cannot be obtained, and when the content exceeds 10.0 parts, the solder wettability is deteriorated.

【0017】次に本発明の具体的実施例を比較例と共に
説明する。
Next, specific examples of the present invention will be described together with comparative examples.

【0018】実験例1 SiTiO3を主体として、予め表面または結晶粒界を
高抵抗化した半導体磁器を準備した。これとは別個に、
電極として銀(Ag)100部、ガラスフリット(硼珪
酸鉛)3部、有機ビビクル50部の組成比からなる組成
物に対し、表1に示すような含有させる金属錫(Sn)
粉末の混合割合を種々変え、金属錫量の異なる電極ペー
ストを準備した。
Experimental Example 1 A semiconductor porcelain having SiTiO 3 as a main component and having a surface or a grain boundary having a high resistance was prepared in advance. Separately from this,
Metal tin (Sn) to be contained as shown in Table 1 for a composition having a composition ratio of 100 parts of silver (Ag), 3 parts of glass frit (lead borosilicate) and 50 parts of organic vehicle as an electrode.
Electrode pastes having different amounts of metallic tin were prepared by variously changing the mixing ratio of the powders.

【0019】そして、半導体磁器表面へ各電極ペースト
を常法に従って厚さ5〜10μm塗布した後、窒素(N
2)ガス雰囲気中で温度850℃で焼付処理を施して、
金属錫の含有量が種々異なる電圧非直線性抵抗素子、所
謂バリスタ素子(試料番号1〜6)を得た。
Then, each electrode paste is applied to the surface of the semiconductor porcelain in a thickness of 5 to 10 μm by an ordinary method, and then nitrogen (N
2 ) After baking in a gas atmosphere at a temperature of 850 ° C,
Voltage non-linear resistance elements with different metal tin contents, so-called varistor elements (sample numbers 1 to 6) were obtained.

【0020】得られた各バリスタ素子の電気的特性とし
てE10(10mAの電流を流した時の電圧値)、α(電
圧非直線係数)、耐パルス性、半田ぬれ性、電極強度を
測定し、その測定結果を表1に示す。
E 10 (voltage value when a current of 10 mA was applied), α (voltage non-linearity coefficient), pulse resistance, solder wettability, and electrode strength were measured as electrical characteristics of each obtained varistor element. Table 1 shows the measurement results.

【0021】ここで、α=1/log(E10/E1)と
定義され、E1は1mAの電流を流した時の電圧値とす
る。
Here, α = 1 / log (E 10 / E 1 ) is defined, and E 1 is a voltage value when a current of 1 mA is applied.

【0022】また、耐パルス性は、80Vのパルス電圧
を10サイクル印加した後のE10値の変化率とした。
The pulse resistance was defined as the rate of change of the E 10 value after applying a pulse voltage of 80 V for 10 cycles.

【0023】また、半田ぬれ性は、φ2.2のリング半
田を電極部分へ載置し、温度250℃のホットプレート
上で7秒間静置し、冷却後の半田の延びを測定した。
尚、測定結果で○印は半田ぬれ性が良好(半田延び2.
5mm以上)であり、×印は半田ぬれ性が不良(半田延
び2.5mm以下)である。
The solder wettability was measured by placing a ring solder having a diameter of φ2.2 on the electrode portion and allowing it to stand for 7 seconds on a hot plate having a temperature of 250 ° C., and measuring the extension of the solder after cooling.
It should be noted that in the measurement results, the circle marks show good solder wettability (solder extension 2.
5 mm or more), and the symbol X indicates poor solder wettability (solder extension is 2.5 mm or less).

【0024】また、電極強度はφ0.5、長さ4cmのリ
ード線を先のリング半田を用いて電極中央部へ半田つけ
し、引張加重機にて電極が剥離した時の引張加重を測定
した。尚、測定結果で○印は3kgf以上であり、△印
は3kgf未満である。
Further, a lead wire having an electrode strength of φ0.5 and a length of 4 cm was soldered to the center of the electrode using the ring solder, and the tensile load when the electrode was peeled off was measured by a tensile loader. . In addition, in the measurement result, the mark ◯ is 3 kgf or more, and the mark Δ is less than 3 kgf.

【0025】比較として前記半導体磁器の表面に従来の
In−Ga合金含有のAg電極を塗布し、更に、その上
に一般のAg電極を印刷(2層電極)した後、大気中で
温度580℃で焼付処理を施して比較素子(試料番号
7)を得た。得られた比較素子の電気的特性としてE10
(10mAの電流を流した時の電圧値)、α(電圧非直
線係数)、耐パルス性、半田ぬれ性、電極強度を前記本
発明のバリスタ素子と同一条件で測定し、その測定結果
を表1に示す。
For comparison, a conventional Ag electrode containing an In--Ga alloy was applied to the surface of the semiconductor porcelain, and a general Ag electrode was printed on it (two-layer electrode), and then the temperature was 580 ° C. in the atmosphere. Then, a baking process was performed to obtain a comparative element (Sample No. 7). The electrical characteristics of the obtained comparative element were E 10
(Voltage value when a current of 10 mA is applied), α (voltage nonlinearity coefficient), pulse resistance, solder wettability, and electrode strength are measured under the same conditions as the varistor element of the present invention, and the measurement results are shown in a table. Shown in 1.

【0026】[0026]

【表1】 [Table 1]

【0027】実験例2 半導体磁器の表面に電極ペーストを塗布した後の焼付処
理を、大気中で、温度700℃とした以外は前記実験例
1と同様の方法で、金属錫の含有量が種々異なるバリス
タ素子(試料番号8〜13)を得た。
Experimental Example 2 The same procedure as in Experimental Example 1 was repeated except that the electrode paste was applied on the surface of the semiconductor porcelain and the temperature was 700 ° C. in the atmosphere. Different varistor elements (sample numbers 8 to 13) were obtained.

【0028】そして、得られた各バリスタ素子の電気的
特性としてE10(10mAの電流を流した時の電圧
値)、α(電圧非直線係数)、耐パルス性、半田ぬれ
性、電極強度を前記実験例1と同一条件で測定し、その
測定結果を表2に示す。
The electrical characteristics of each obtained varistor element were E 10 (voltage value when a current of 10 mA was applied), α (voltage nonlinear coefficient), pulse resistance, solder wettability, and electrode strength. The measurement was performed under the same conditions as in Experimental Example 1, and the measurement results are shown in Table 2.

【0029】尚、表2に前記比較素子(試料番号7)お
よび、電気的特性値の測定結果を参考に併記した。
In Table 2, the comparative element (Sample No. 7) and the measurement results of electrical characteristic values are also shown for reference.

【0030】[0030]

【表2】 [Table 2]

【0031】表1および表2から明らかなように、銀
(Ag)100部に対し、金属錫(Sn)の含有量が
0.5部以上で耐パルス性も良好で、かつ電位障壁を持
たないオーミックなバリスタ特性が得られる。これは従
来のオーミック銀電極(Ag+In−Ga含有)のバリ
スタ特性と同等のレベルである。更に、金属錫の含有量
が10部以下では半田ぬれ性も良好であり、本発明品は
一層の電極のみで充分実用化可能な電圧非直線性抵抗素
子を提供することが出来る。
As is clear from Tables 1 and 2, the content of metal tin (Sn) is 0.5 parts or more per 100 parts of silver (Ag), the pulse resistance is good, and the potential barrier is present. No ohmic varistor characteristics are obtained. This is at the same level as the varistor characteristic of the conventional ohmic silver electrode (containing Ag + In-Ga). Further, when the content of metallic tin is 10 parts or less, the solder wettability is good, and the product of the present invention can provide a voltage non-linear resistance element that can be sufficiently put into practical use with only one electrode.

【0032】また、金属錫の含有量が0.5部未満では
電位障壁が存在し、パルス劣化を生じてしまうものであ
り、また、金属錫の含有量が10.0部を超えると金属
錫の一部が酸化されたり、銀の焼結を遅らせたりするも
ので、半田ぬれ性が低下する。
If the content of metallic tin is less than 0.5 part, a potential barrier exists and pulse deterioration occurs, and if the content of metallic tin exceeds 10.0 parts, metallic tin is contained. Part of it is oxidized or the sintering of silver is delayed, so that the solder wettability is deteriorated.

【0033】また、本発明においては、電極の焼付処理
時の雰囲気を実験例1のような窒素(N2)ガス雰囲気
(中性雰囲気)、実験例2のような大気中のいずれの条
件下でも、従来のオーミック銀電極の焼付処理時の温度
よりも高い温度で焼付処理が可能であり、電極強度の高
い素子を得ることが出来る。
Further, in the present invention, the atmosphere during the baking process of the electrode is either nitrogen (N 2 ) gas atmosphere (neutral atmosphere) as in Experimental Example 1 or atmospheric air as in Experimental Example 2. However, the baking process can be performed at a temperature higher than the temperature at which the conventional ohmic silver electrode is baked, and an element having high electrode strength can be obtained.

【0034】実験例3 SiTiO3を主体として、予め表面または結晶粒界を
高抵抗化した半導体磁器を準備した。これとは別個に、
電極として銀(Ag)100部、ガラスフリット(硼珪
酸鉛)3部、有機ビビクル50部の組成比からなる組成
物に対し、表3に示すような含有させる酸化第一錫(S
nO)粉末の混合割合を種々変え、酸化第一錫の含有量
の異なる電極ペーストを準備した。
Experimental Example 3 A semiconductor porcelain having SiTiO 3 as a main component and having a surface or a crystal grain boundary having a high resistance was prepared in advance. Separately from this,
For a composition having a composition ratio of 100 parts of silver (Ag), 3 parts of glass frit (lead borosilicate) and 50 parts of organic vehicle as electrodes, stannous oxide (S) to be contained as shown in Table 3 is added.
(nO) powder was mixed in various proportions to prepare electrode pastes having different stannous oxide contents.

【0035】そして、半導体磁器表面へ各電極ペースト
を常法に従って厚さ5〜10μm塗布した後、N2雰囲
気中で温度800℃で焼付処理を施して、金属第一錫の
含有量が種々異なる電圧非直線性抵抗素子、所謂バリス
タ素子(試料番号14〜19)を得た。
Then, each electrode paste is applied to the surface of the semiconductor porcelain in a thickness of 5 to 10 μm according to a conventional method, and then baked at a temperature of 800 ° C. in an N 2 atmosphere so that the content of stannous metal varies. A voltage non-linear resistance element, a so-called varistor element (Sample Nos. 14 to 19) was obtained.

【0036】そして、得られた各バリスタ素子の電気的
特性としてE10(10mAの電流を流した時の電圧
値)、α(電圧非直線係数)、耐パルス性、半田ぬれ
性、電極強度を前記実験例1と同一条件で測定し、その
測定結果を表3に示す。
The electrical characteristics of each obtained varistor element were E 10 (voltage value when a current of 10 mA was applied), α (voltage non-linear coefficient), pulse resistance, solder wettability, and electrode strength. Measurement was performed under the same conditions as in Experimental Example 1, and the measurement results are shown in Table 3.

【0037】尚、表3に前記比較素子(試料番号7)お
よび、電気的特性値の測定結果を参考に併記した。
In Table 3, the comparative element (Sample No. 7) and the measurement results of electrical characteristic values are also shown for reference.

【0038】[0038]

【表3】 [Table 3]

【0039】表3から明らかなように、銀(Ag)10
0部に対し、酸化第一錫(SnO)の含有量が0.5部
以上で耐パルス性も良好で、かつ電位障壁を持たないオ
ーミックなバリスタ特性が得られる。更に、酸化第一錫
(SnO)の含有量が10.0部以下では半田ぬれ性も
良好であり、本発明品は一層の電極のみで充分な実用化
可能な電圧非直線性抵抗素子を提供することが出来る。
As is clear from Table 3, silver (Ag) 10
With respect to 0 part, the content of stannous oxide (SnO) is 0.5 part or more, the pulse resistance is good, and the ohmic varistor characteristic having no potential barrier can be obtained. Further, when the content of stannous oxide (SnO) is 10.0 parts or less, the solder wettability is also good, and the product of the present invention provides a voltage non-linear resistance element which can be practically used with only one electrode. You can do it.

【0040】また、電極の焼付処理時の温度を従来のオ
ーミック銀電極の焼付処理時の温度よりも高い焼付処理
が可能となり、電極強度の高い素子を得ることが出来
る。
Further, the baking temperature of the electrode can be made higher than the baking temperature of the conventional ohmic silver electrode, and an element having high electrode strength can be obtained.

【0041】実験例4 SiTiO3を主体として、予め表面または結晶粒界を
高抵抗化した半導体磁器を準備した。これとは別個に、
電極として銀(Ag)100部、ガラスフリット(硼珪
酸鉛)3部、有機ビビクル50部の組成比からなる組成
物に対し、表4に示すような含有させる金属錫(Sn)
と金属第一錫(SnO)粉末の混合割合を種々変え、金
属錫と酸化第一錫量の異なる電極ペーストを準備した。
Experimental Example 4 A semiconductor porcelain having SiTiO 3 as a main component and having a surface or a crystal grain boundary having a high resistance was prepared in advance. Separately from this,
Metal tin (Sn) contained as shown in Table 4 with respect to a composition having a composition ratio of 100 parts of silver (Ag), 3 parts of glass frit (lead borosilicate) and 50 parts of organic vehicle as an electrode.
Electrode pastes having different amounts of metallic tin and stannous oxide were prepared by variously changing the mixing ratio of the metal stannous oxide (SnO) powder.

【0042】そして、半導体磁器表面へ各電極ペースト
を常法に従って厚さ5〜10μm塗布した後、N2雰囲
気中で温度800℃で焼付処理を施して、金属錫と金属
第一錫の含有量が種々異なる電圧非直線性抵抗素子、所
謂バリスタ素子(試料番号20〜25)を得た。
Then, each electrode paste was applied to the surface of the semiconductor porcelain in a thickness of 5 to 10 μm by a conventional method, and then baked at a temperature of 800 ° C. in an N 2 atmosphere to obtain the contents of metallic tin and stannous metal. Various voltage non-linear resistance elements, so-called varistor elements (sample numbers 20 to 25) were obtained.

【0043】そして、得られた各バリスタ素子の電気的
特性としてE10(10mAの電流を流した時の電圧
値)、α(電圧非直線係数)、耐パルス性、半田ぬれ
性、電極強度を前記実験例1と同一条件で測定し、その
測定結果を表4に示す。
The electrical characteristics of each of the obtained varistor elements were E 10 (voltage value when a current of 10 mA was applied), α (voltage nonlinear coefficient), pulse resistance, solder wettability, and electrode strength. The measurement was performed under the same conditions as in Experimental Example 1, and the measurement results are shown in Table 4.

【0044】尚、表4に前記比較素子(試料番号7)お
よび、電気的特性値の測定結果を参考に併記した。
In Table 4, the comparative element (Sample No. 7) and the measurement results of electrical characteristic values are also shown for reference.

【0045】[0045]

【表4】 [Table 4]

【0046】表4から明らかなように、銀(Ag)10
0部に対し、金属錫(Sn)と酸化第一錫(SnO)の
総含有量が0.5部以上で安定した良好なオーミック性
が得られる。更に、金属錫(Sn)と酸化第一錫(Sn
O)の総含有量が10.0部以下では安定した良好なオ
ーミック性が得られ、かつ半田ぬれ性の良好なバリスタ
素子を提供することが出来る。
As is clear from Table 4, silver (Ag) 10
When the total content of metallic tin (Sn) and stannous oxide (SnO) is 0.5 part or more based on 0 part, stable and good ohmic property is obtained. Furthermore, metallic tin (Sn) and stannous oxide (Sn)
When the total content of O) is 10.0 parts or less, it is possible to provide a stable and good ohmic property and a varistor element having good solder wettability.

【0047】実験例5 SiTiO3を主体として、予め表面または結晶粒界を
高抵抗化した半導体磁器を準備した。これとは別個に、
電極として銀(Ag)100部、金属錫(Sn)5.0
部、有機ビビクル50部の組成比からなる組成物に対
し、表5に示すような含有させるガラスフリット(硼珪
酸鉛)の含有量が種々異なる電極ペーストを準備した。
Experimental Example 5 A semiconductor porcelain mainly composed of SiTiO 3 and having a surface or a crystal grain boundary having a high resistance was prepared in advance. Separately from this,
Silver (Ag) 100 parts, metallic tin (Sn) 5.0 as electrodes
Parts, and a composition having a composition ratio of 50 parts of organic vehicle, electrode pastes having different contents of glass frit (lead borosilicate) as shown in Table 5 were prepared.

【0048】そして、半導体磁器表面へ各電極ペースト
を常法に従って厚さ5〜10μm塗布した後、N2雰囲
気中で温度750℃で焼付処理を施して、ガラスフリッ
トの含有量が種々異なる電圧非直線性抵抗素子、所謂バ
リスタ素子(試料番号26〜30)を得た。
Then, each electrode paste was applied to the surface of the semiconductor porcelain in a thickness of 5 to 10 μm according to a conventional method, and then baked at a temperature of 750 ° C. in an N 2 atmosphere, and the voltage of the glass frit containing various contents was varied. Linear resistance elements, so-called varistor elements (sample numbers 26 to 30) were obtained.

【0049】そして、得られた各バリスタ素子の電気的
特性としてE10(10mAの電流を流した時の電圧
値)、α(電圧非直線係数)、耐パルス性、半田ぬれ
性、電極強度を前記実験例1と同一条件で測定し、その
測定結果を表5に示す。
The electrical characteristics of each obtained varistor element were E 10 (voltage value when a current of 10 mA was applied), α (voltage non-linear coefficient), pulse resistance, solder wettability, and electrode strength. The measurement was performed under the same conditions as in Experimental Example 1, and the measurement results are shown in Table 5.

【0050】[0050]

【表5】 [Table 5]

【0051】表5から明らかなように、銀(Ag)10
0部に対し、金属錫(Sn)の含有量が5.0部(本発
明の範囲内)であって、かつガラスフリットの含有量が
1.5部以上で充分な電極強度を持ったバリスタ素子が
得られる。更に、ガラスフリットの含有量が6.0部以
下では充分な電極強度が得られ、かつ半田ぬれ性の良好
なバリスタ素子を提供することが出来る。
As is clear from Table 5, silver (Ag) 10
A varistor having a sufficient electrode strength in which the content of metallic tin (Sn) is 5.0 parts (within the scope of the present invention) and the content of glass frit is 1.5 parts or more with respect to 0 part. The device is obtained. Further, when the content of the glass frit is 6.0 parts or less, it is possible to provide a varistor element having sufficient electrode strength and good solder wettability.

【0052】[0052]

【発明の効果】このように本発明によるときは、本構成
の電極を半導体磁器へ焼付被着することにより、半田つ
けが良好で、半導体磁器への接着強度が大きく、かつパ
ルスや半田つけの際の熱に対して電気的特性が安定で信
頼性の高い電圧非直線性抵抗素子を安価に提供すること
が出来る等の効果がある。
As described above, according to the present invention, by baking and depositing the electrode of this structure on the semiconductor porcelain, the soldering is good, the adhesive strength to the semiconductor porcelain is large, and the pulse and the soldering There is an effect that a voltage non-linear resistance element having stable electrical characteristics and high reliability against heat at the time can be provided at low cost.

【0053】また、本発明品は正、または負の抵抗温度
係数を有する半導体磁器電気部品にも適用することが出
来る。
The product of the present invention can also be applied to a semiconductor ceramic electric component having a positive or negative temperature coefficient of resistance.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 半導体磁器にオーミック電極を被着形成
した電圧非直線性抵抗素子において、前記オーミック電
極は銀とガラスフリットに金属錫もしくは酸化第一錫の
少なくとも1種類を含有し、大気中もしくは中性雰囲気
中で焼き付けされた焼付電極であって、銀100部、ガ
ラスフリット1.5〜6.0部に対して金属錫もしくは
酸化第一錫の少なくとも1種類を0.5〜10.0部の
範囲で含有することを特徴とする電圧非直線性抵抗素
子。
1. A voltage non-linear resistance element in which an ohmic electrode is formed by depositing on a semiconductor porcelain, wherein the ohmic electrode contains at least one of metallic tin or stannous oxide in silver and glass frit, and A baking electrode baked in a neutral atmosphere, wherein at least one kind of metallic tin or stannous oxide is used for 0.5 to 10.0 with respect to 100 parts of silver and 1.5 to 6.0 parts of glass frit. A voltage non-linear resistance element, characterized in that it is contained within the range of a part.
JP5072233A 1993-03-30 1993-03-30 Voltage nonlinear resistance element Pending JPH06283314A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5072233A JPH06283314A (en) 1993-03-30 1993-03-30 Voltage nonlinear resistance element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5072233A JPH06283314A (en) 1993-03-30 1993-03-30 Voltage nonlinear resistance element

Publications (1)

Publication Number Publication Date
JPH06283314A true JPH06283314A (en) 1994-10-07

Family

ID=13483358

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5072233A Pending JPH06283314A (en) 1993-03-30 1993-03-30 Voltage nonlinear resistance element

Country Status (1)

Country Link
JP (1) JPH06283314A (en)

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