JPH06275595A - Structure of flow regulation plate in washing bath - Google Patents
Structure of flow regulation plate in washing bathInfo
- Publication number
- JPH06275595A JPH06275595A JP8807893A JP8807893A JPH06275595A JP H06275595 A JPH06275595 A JP H06275595A JP 8807893 A JP8807893 A JP 8807893A JP 8807893 A JP8807893 A JP 8807893A JP H06275595 A JPH06275595 A JP H06275595A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning liquid
- cleaning
- spherical members
- cleaning tank
- spherical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、洗浄液を使用して被洗
浄物の洗浄処理を行う際に用いられる洗浄槽において、
槽内の洗浄液の流れを整える整流板の構造に関するもの
である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning tank used for cleaning an object to be cleaned using a cleaning liquid,
The present invention relates to the structure of a current plate that regulates the flow of cleaning liquid in a tank.
【0002】[0002]
【従来の技術】一般に、薬液、溶剤、純水などの洗浄液
をオーバーフローさせながら、液中に浸した被洗浄物の
洗浄処理を行う方式としては、単純流出方式、噴出管方
式、整流板方式の3つが挙げられる。2. Description of the Related Art Generally, as a method for performing a cleaning process of an article to be cleaned immersed in a liquid while overflowing a cleaning liquid such as a chemical liquid, a solvent, and pure water, there are a simple outflow system, an ejection pipe system, and a straightening plate system. There are three.
【0003】単純流出方式は、図7(a)に示すように
洗浄槽1の底板2に接続した配管3から直接槽内に洗浄
液を噴き出させるようにしたものである。この方式で
は、配管3の接続部分、つまり洗浄液の噴出孔の近傍で
は大きな液流が得られるが、噴出孔から離れるにしたが
って液流が小さくなり、洗浄槽1の上層部やコーナー部
分では洗浄液の置換効率が著しく低下してしまうという
欠点があった。In the simple outflow system, as shown in FIG. 7A, the cleaning liquid is directly jetted into the tank from the pipe 3 connected to the bottom plate 2 of the cleaning tank 1. In this method, a large liquid flow can be obtained in the connection portion of the pipe 3, that is, in the vicinity of the cleaning liquid ejection hole, but the liquid flow becomes smaller as the distance from the ejection hole increases, so that the cleaning liquid becomes less in the upper layer portion and the corner portion of the cleaning tank 1. There is a drawback that the substitution efficiency is significantly reduced.
【0004】噴出管方式は、図7(b)に示すように洗
浄槽1の底部に噴出管7を配置して、各々の噴出管7に
接続した配管3から槽内に洗浄液を供給して、噴出管7
に周壁に明けた噴出孔から洗浄液を噴き出させるように
したものである。この方式は、上述した単純流出方式の
欠点を補うために提案されたものであるが、この場合で
も槽内の液中に乱流箇所が発生して洗浄液の滞留部分が
みられ、洗浄液の置換効率としては満足できるものでは
なかった。In the jet pipe system, as shown in FIG. 7 (b), the jet pipes 7 are arranged at the bottom of the washing tank 1, and the washing liquid is supplied from the pipes 3 connected to the jet pipes 7 into the bath. , Spout pipe 7
The cleaning liquid is spouted from the spouting hole formed in the peripheral wall. This method was proposed to compensate for the drawbacks of the simple outflow method described above, but even in this case, a turbulent flow point is generated in the liquid in the tank and a stagnation portion of the cleaning liquid is observed, and the replacement of the cleaning liquid is caused. The efficiency was not satisfactory.
【0005】整流板方式は、図7(c)に示すように洗
浄槽1の底部に整流板8を配置して、バルブ4の開閉に
より配管3から洗浄槽1に供給した洗浄液を、さらに複
数の噴出孔を有する整流板8を通して噴き出させるよう
にしたものである。この方式は、洗浄槽1に供給された
洗浄液の流れが整流板8を通すことによって層流となる
ため、洗浄液の置換効率としては上記二つの方式に比べ
てかなり高い値が得られる。なお、上記いずれの方式
も、被洗浄物の洗浄効果を上げるため、バルブ4の開閉
により配管3から供給した洗浄液を洗浄槽1の上面から
オーバーフローさせて受皿5に流し込み、そのまま配管
6を通して排水する構成になっている。In the straightening vane system, as shown in FIG. 7C, a straightening vane 8 is arranged at the bottom of the washing tank 1, and a plurality of washing liquids supplied from the pipe 3 to the washing tank 1 by opening and closing the valve 4 are further added. The rectifying plate 8 having the squirt holes is used for squirting. In this method, since the flow of the cleaning liquid supplied to the cleaning tank 1 becomes a laminar flow by passing through the straightening plate 8, the replacement efficiency of the cleaning liquid can be considerably higher than those of the above two systems. In any of the above methods, in order to improve the cleaning effect of the object to be cleaned, the cleaning liquid supplied from the pipe 3 is overflowed from the upper surface of the cleaning tank 1 by opening and closing the valve 4 to flow into the saucer 5, and is drained through the pipe 6 as it is. It is configured.
【0006】[0006]
【発明が解決しようとする課題】ところで図8に示すよ
うに、実際に被洗浄物である基板9を搬送ケース10に
収納した状態で洗浄槽1の中に投入し、洗浄槽1の底部
に配置した整流板8を通して洗浄液を噴き出させると、
槽内の洗浄液の流れは図9に示すような状態となる。こ
こで図中の矢印は、洗浄液の流れ方向を示すとともに槽
内の各箇所における洗浄液の流速も示している。すなわ
ち、矢印の長さは洗浄液の流速に比例しており、矢印の
長さが長いほど洗浄液の流速も大きい。図から明らかな
ように、槽内に基板(被洗浄物)9を投入した状態で
は、基板9の存在によって洗浄液が洗浄槽1の側壁側に
廻り込むようになり、また基板9の表面部分を通過する
洗浄液の流速は洗浄槽1の側壁近傍を通過する洗浄液の
流速に比べて極端に小さくなる。そして、同じ基板9の
表面上でも特にその中央寄りになるほど洗浄液の流速は
小さくなる。By the way, as shown in FIG. 8, the substrate 9 which is the object to be cleaned is actually stored in the transfer case 10 and is put into the cleaning tank 1 to be placed at the bottom of the cleaning tank 1. When the cleaning liquid is spouted through the arranged straightening plate 8,
The flow of the cleaning liquid in the tank is as shown in FIG. Here, the arrows in the figure indicate the flow direction of the cleaning liquid and also the flow velocity of the cleaning liquid at each position in the tank. That is, the length of the arrow is proportional to the flow rate of the cleaning liquid, and the longer the arrow, the larger the flow rate of the cleaning liquid. As is clear from the figure, when the substrate (object to be cleaned) 9 is placed in the bath, the presence of the substrate 9 causes the cleaning liquid to sneak into the side wall of the cleaning bath 1, and the surface portion of the substrate 9 The flow velocity of the cleaning liquid passing through is extremely smaller than the flow velocity of the cleaning liquid passing near the side wall of the cleaning tank 1. Then, even on the surface of the same substrate 9, the flow velocity of the cleaning liquid decreases as it approaches the center thereof.
【0007】そこで従来では、整流板8に明けられる噴
出孔8a(図8参照)の大きさや形状を板上の各箇所で
変えることで槽内における洗浄液の流速を調整してい
た。すなわち、基板9の真下に位置する部分では噴出孔
8aの形状を例えば長孔にして孔径を大きく設定し、そ
の周辺部分では噴出孔8aの形状を丸穴にして孔径を小
さく設定していた。これにより、槽内の洗浄液の流速は
基板9の真下に位置する箇所が最も大きくなるため、実
際に基板9を投入した状態では基板9が抵抗となって槽
内の洗浄液の流れはほぼ均一になる。Therefore, conventionally, the flow velocity of the cleaning liquid in the tank has been adjusted by changing the size and shape of the ejection holes 8a (see FIG. 8) formed in the straightening vane 8 at each position on the plate. That is, in the portion directly below the substrate 9, the shape of the ejection hole 8a is set to be, for example, a long hole to set a large hole diameter, and in the peripheral portion, the shape of the ejection hole 8a is set to be a round hole and the hole diameter is set to be small. As a result, the flow velocity of the cleaning liquid in the bath becomes maximum at the position directly below the substrate 9, so that when the substrate 9 is actually put in, the substrate 9 becomes a resistance and the flow of the cleaning liquid in the bath becomes substantially uniform. Become.
【0008】しかしながら、一般に整流板8の素材とし
ては不純物の析出がなくしかも耐薬品性、耐熱性に優れ
た石英が採用されるため、現状では石英板への孔加工の
難しさから整流板8の製作にかなりの時間とコストを費
やすことになり、これに加えて噴出孔8aの相互ピッチ
をあまり小さく設定すると孔明け加工の段階で整流板8
に割れや欠けなどが発生するため、実際の洗浄処理の中
で整流板8から密に洗浄液を噴き出させることは非常に
困難とされていた。このため従来の整流板8では、洗浄
槽1における洗浄液の流れとして最適な流速分布(後
述)を得ることができず、これが洗浄液の置換効率や被
洗浄物に対する洗浄効果の向上を図るうえで大きな障害
になっていた。However, generally, as the material of the straightening vane 8, quartz, which is free from the precipitation of impurities and is excellent in chemical resistance and heat resistance, is adopted. At present, therefore, the straightening vane 8 is difficult because it is difficult to form a hole in the quartz plate. In addition to this, a considerable amount of time and cost will be spent on manufacturing, and in addition to this, if the mutual pitch of the ejection holes 8a is set to be too small, the current plate 8 will be formed at the stage of drilling.
Since cracks and chippings occur on the surface, it has been very difficult to densely eject the cleaning liquid from the straightening vane 8 in the actual cleaning process. Therefore, in the conventional straightening plate 8, it is not possible to obtain an optimum flow velocity distribution (described later) as the flow of the cleaning liquid in the cleaning tank 1, which is a great factor in improving the replacement efficiency of the cleaning liquid and the cleaning effect on the object to be cleaned. It was an obstacle.
【0009】本発明は、上記問題を解決するためになさ
れたもので、最適な洗浄液の流速分布を容易に得ること
ができる整流板の構造を提供することを目的とする。The present invention has been made to solve the above problems, and an object of the present invention is to provide a structure of a straightening vane which can easily obtain an optimum flow velocity distribution of the cleaning liquid.
【0010】[0010]
【課題を解決するための手段】本発明は、上記目的を達
成するためになされたもので、搬送ケース内に収納され
た被洗浄物を洗浄液によって洗浄処理する際に用いられ
る洗浄槽において、洗浄槽の底部に配置されてその洗浄
槽に供給される洗浄液の流れを整える整流板の構造であ
って、所定の大きさをなす複数の球形部材を板状に敷き
詰めて配列し、球形部材の相互間に形成される孔を洗浄
液の噴出孔としたものである。SUMMARY OF THE INVENTION The present invention has been made to achieve the above-mentioned object, and in a cleaning tank used when cleaning an object to be cleaned stored in a carrying case with a cleaning liquid, A structure of a straightening plate arranged at the bottom of the tank to regulate the flow of the cleaning liquid supplied to the cleaning tank, in which a plurality of spherical members having a predetermined size are spread and arranged in a plate shape, and the spherical members are mutually arranged. The holes formed in between are used as the jetting holes of the cleaning liquid.
【0011】[0011]
【作用】本発明の整流板は、複数の球形部材を板状に敷
き詰めて配列することにより構成されているので、これ
らの球形部材の相互間に形成される噴出孔の孔径は球形
部材の大きさに応じて可変する。したがって、大きさの
異なる球形部材を縦横又は千鳥状に適宜配列することに
より、整流板の各箇所には孔径の異なる噴出孔が多数形
成されるようになるため、球形部材の大きさや配列を変
えるだけで被洗浄物の配置状態に応じた最適な洗浄液の
流速分布を得ることができる。Since the current plate of the present invention is constituted by arranging a plurality of spherical members arranged in a plate shape, the diameter of the ejection holes formed between these spherical members is large. Variable according to the size. Therefore, by appropriately arranging the spherical members having different sizes in the vertical and horizontal directions or in a zigzag pattern, a large number of ejection holes having different hole diameters are formed at each position of the straightening plate, so that the size and the arrangement of the spherical members are changed. Only with this, it is possible to obtain the optimum flow velocity distribution of the cleaning liquid according to the arrangement state of the object to be cleaned.
【0012】[0012]
【実施例】以下、本発明の実施例について図面を参照し
ながら詳細に説明する。図1は本発明に係わる整流板の
一実施例を示す平面図である。本実施例の整流板11
は、図示せぬ洗浄槽の底部に配置されてその洗浄槽に供
給される洗浄液の流れを整えるものであり、全体的には
所定の大きさをなす複数の球形部材12によって構成さ
れている。そして、これら複数の球形部材12は板状に
敷き詰めて配列されており、この配列状態で球形部材1
2の相互間に形成される孔を洗浄液の噴出孔13として
いる。Embodiments of the present invention will now be described in detail with reference to the drawings. FIG. 1 is a plan view showing an embodiment of a current plate according to the present invention. The current plate 11 of this embodiment
Is arranged at the bottom of a cleaning tank (not shown) and regulates the flow of the cleaning liquid supplied to the cleaning tank, and is composed of a plurality of spherical members 12 having a predetermined size as a whole. The plurality of spherical members 12 are spread and arranged in a plate shape, and the spherical members 1 are arranged in this arrangement state.
A hole formed between the two is used as a cleaning liquid ejection hole 13.
【0013】また本実施例では、整流板11を構成する
球形部材12に、不純物の析出がなくしかも耐薬品性、
耐熱性に優れた素材として石英球を採用している。そし
て、球形部材12同士の接合手段としては、洗浄液の汚
染源となり得る接着剤等を使用することなく、所定の平
面状態に配列した複数の球形部材12に対し、横方向か
ら適度な圧力を加えながら加熱処理を施すことで、球面
部分の溶着作用により球形部材12同士を接合してい
る。Further, in this embodiment, the spherical member 12 constituting the straightening plate 11 is free from the precipitation of impurities and has chemical resistance.
Quartz spheres are used as a material with excellent heat resistance. As a means for joining the spherical members 12 together, an appropriate pressure is applied from the lateral direction to the plurality of spherical members 12 arranged in a predetermined plane state without using an adhesive or the like that may be a contamination source of the cleaning liquid. By performing the heat treatment, the spherical members 12 are joined together by the welding action of the spherical surface portion.
【0014】ここで、参考までに球形部材12の大きさ
の違いによる開孔率の格差について説明しておく。ここ
では開孔率の算出例として、図2(a)〜(c)に示す
ように、L=15mm四方の枠内にそれぞれΦ=5m
m、7.5mm、15mmの球形部材12を敷き詰めて
配列した場合について述べる。これらの各寸法を数値パ
ラメータとして開孔率の算出式に当てはめると、いずれ
の場合も開孔率は21.5%と算出される。ところが、
同じ開孔率でも球形部材12の直径が大きくなる程、噴
出孔13の孔径は大きくなり反対にその数は減少する。
つまり、ここで留意すべき点は、球形部材12の大きさ
を変えるだけで噴出孔13の数や大きさを自由に可変で
きるという点である。Here, for reference, the difference in the aperture ratio due to the difference in the size of the spherical member 12 will be described. Here, as an example of calculating the aperture ratio, as shown in FIGS. 2A to 2C, Φ = 5 m in each frame of L = 15 mm square.
A case will be described in which spherical members 12 of m, 7.5 mm, and 15 mm are spread and arranged. When each of these dimensions is applied as a numerical parameter to the formula for calculating the porosity, the porosity is calculated to be 21.5% in any case. However,
Even with the same aperture ratio, as the diameter of the spherical member 12 increases, the diameter of the ejection holes 13 increases and conversely the number decreases.
That is, what should be noted here is that the number and size of the ejection holes 13 can be freely changed only by changing the size of the spherical member 12.
【0015】ところで、上記従来例でも説明したよう
に、洗浄槽の中に被洗浄物(本例では基板)を投入する
と基板の表面を流れる洗浄液の流速が周辺部分に比べて
小さくなり、特に基板の中央寄りではその傾向が顕著に
現れる。よって、最適な洗浄液の流速分布としては、図
3に示すように基板9の中央部分に向かう箇所が流速が
最も大きく、そこから周辺にいくほど流速が小さくなる
ような状態が望ましい。By the way, as described in the above-mentioned conventional example, when the object to be cleaned (the substrate in this example) is put into the cleaning tank, the flow velocity of the cleaning liquid flowing on the surface of the substrate becomes smaller than that of the peripheral portion, and particularly the substrate The tendency is noticeable near the center of. Therefore, as an optimum flow velocity distribution of the cleaning liquid, it is desirable that the flow velocity be highest at the portion toward the central portion of the substrate 9 and gradually lower toward the periphery as shown in FIG.
【0016】これを踏まえて図1に示す整流板11の構
成を見てみると、洗浄槽に投入される基板の中央部分に
あたる箇所には最も大きな球形部材12が配置されてお
り、そこから周辺にいくほど段階的に球形部材12の球
径が小さくなっている。また、こうした球形部材11の
配列によって噴出孔13の孔径は上述した基板の中央部
分にあたる箇所が最も大きくそこから段階的に小さくな
るため、実際の洗浄処理では基板の中央部分に近い箇所
ほど洗浄液の流速が大きくなる。このように本実施例の
整流板11においては、大きさの異なる複数の球形部材
12を槽内における被洗浄物の配置状態に応じて適宜配
列することにより、洗浄槽での洗浄液の流速分布として
は上述の図3に示すような最適な分布状態を容易に得る
ことができる。Taking this into consideration, the structure of the current plate 11 shown in FIG. 1 is as follows: the largest spherical member 12 is arranged at the central portion of the substrate to be put into the cleaning tank, and the periphery thereof. The spherical diameter of the spherical member 12 gradually decreases as the distance increases. Further, due to the arrangement of the spherical members 11, the hole diameter of the ejection hole 13 is the largest at the above-mentioned central portion of the substrate and gradually decreases from that portion. Therefore, in an actual cleaning process, the closer to the central portion of the substrate the cleaning liquid is. The flow velocity increases. As described above, in the current plate 11 of the present embodiment, a plurality of spherical members 12 having different sizes are appropriately arranged according to the arrangement state of the object to be cleaned in the tank, so that the flow velocity distribution of the cleaning liquid in the cleaning tank is obtained. Can easily obtain the optimum distribution state as shown in FIG.
【0017】また、球形部材12の配列の仕方について
も、単に縦横に並べるだけでなく、例えば図4(a)に
示すように球形部材12を千鳥状に配列したり、或いは
図1、図4(b)に示すように大きさの異なる球形部材
12を混合して縦横または千鳥状に配列すれば、洗浄液
の流速を一層細かく調整することが可能となる。こうし
た種々の配列状態を採用した整流板11の構成を図5に
示す。Regarding the way of arranging the spherical members 12, the spherical members 12 are not only arranged vertically and horizontally, but the spherical members 12 are arranged in a staggered manner as shown in FIG. As shown in (b), if the spherical members 12 having different sizes are mixed and arranged vertically or horizontally or in a zigzag manner, the flow rate of the cleaning liquid can be adjusted more finely. FIG. 5 shows the configuration of the current plate 11 that adopts such various arrangement states.
【0018】さらに、上記実施例では3種類程度の球形
部材12を組み合わせて配列しているが、大きさの異な
る球形部材12を多種類組み合わせたり、それらの配列
状態を場所によって変えたりすることにより、被洗浄物
である基板の大きさや配置状態に対応してさらにきめ細
かく洗浄液の流速を調整することが可能であり、またそ
の実施も非常に容易である。Further, in the above embodiment, about three kinds of spherical members 12 are combined and arranged, but by combining various kinds of spherical members 12 having different sizes or by changing their arrangement state depending on the place. The flow rate of the cleaning liquid can be more finely adjusted according to the size and arrangement of the substrate to be cleaned, and its implementation is very easy.
【0019】加えて、従来の整流板8では図6(a)に
示すように噴出孔8aを通過した部分で洗浄液の巻き込
み(矢印で示す)が顕著に見られたが、本実施例の整流
板11を採用すれば図6(b)に示すように洗浄液が球
形部材12の球面に沿ってスムースに流れ出るようにな
るため、従来に比べて洗浄液の巻き込みを大幅に低減す
ることができる。In addition, in the conventional straightening vane 8, as shown in FIG. 6A, the entrainment of the cleaning liquid (indicated by the arrow) was remarkably observed at the portion passing through the ejection hole 8a. If the plate 11 is adopted, the cleaning liquid can smoothly flow out along the spherical surface of the spherical member 12 as shown in FIG. 6B, and thus the entrapment of the cleaning liquid can be significantly reduced as compared with the conventional case.
【0020】[0020]
【発明の効果】以上、説明したように本発明によれば、
整流板自体が複数の球形部材によって構成されているの
で、球形部材の大きさや配列状態を変えるだけで噴出孔
の数や孔径を自由に可変することができる。したがっ
て、球形部材の大きさや配列を被洗浄物の配置状態に応
じて適宜設定することにより、最適な洗浄液の流速分布
を容易に得ることができ、これによって洗浄液の置換効
率の向上、並びに被洗浄物に対する洗浄効果の向上が図
られる。As described above, according to the present invention,
Since the current plate itself is composed of a plurality of spherical members, the number and diameter of the ejection holes can be freely changed by changing the size and arrangement of the spherical members. Therefore, by appropriately setting the size and arrangement of the spherical members in accordance with the arrangement state of the object to be cleaned, it is possible to easily obtain the optimum flow velocity distribution of the cleaning liquid, which improves the replacement efficiency of the cleaning liquid and the object to be cleaned. The cleaning effect on the object is improved.
【0021】また本発明においては、洗浄液の噴出孔が
球形部材の球面で形成されているため、洗浄槽に供給さ
れる洗浄液は球形部材の球面に沿ってスムースに槽内に
流れ出るようになり、これによって整流板の噴出部分で
は従来よりも洗浄液の巻き込みが低減されることから、
さらなる洗浄液の置換効率の向上、並びに被洗浄物に対
する洗浄効果の向上が期待できる。Further, in the present invention, since the jetting hole of the cleaning liquid is formed by the spherical surface of the spherical member, the cleaning liquid supplied to the cleaning tank smoothly flows out into the tank along the spherical surface of the spherical member, As a result, the entrainment of the cleaning liquid is reduced in the jetted portion of the straightening vane than in the conventional case.
Further improvement of the cleaning liquid replacement efficiency and improvement of the cleaning effect on the object to be cleaned can be expected.
【図1】本発明に係わる整流板の一実施例を示す平面図
である。FIG. 1 is a plan view showing an embodiment of a current plate according to the present invention.
【図2】開孔率の算出例を説明するための図である。FIG. 2 is a diagram for explaining an example of calculating a porosity.
【図3】最適な洗浄液の流速分布を説明する図である。FIG. 3 is a diagram illustrating an optimum flow velocity distribution of a cleaning liquid.
【図4】球形部材の配列状態を説明する図である。FIG. 4 is a diagram illustrating an arrangement state of spherical members.
【図5】整流板の他の実施態様を示す平面図である。FIG. 5 is a plan view showing another embodiment of the current plate.
【図6】噴出孔からの洗浄液の流れを説明する図であ
る。FIG. 6 is a diagram illustrating the flow of cleaning liquid from the ejection holes.
【図7】洗浄方式の代表的な例を説明する図である。FIG. 7 is a diagram illustrating a typical example of a cleaning method.
【図8】従来の整流板方式の組込状態を示す斜視図であ
る。FIG. 8 is a perspective view showing an assembled state of a conventional straightening vane system.
【図9】従来例における洗浄液の流れを説明するための
模式図である。FIG. 9 is a schematic diagram for explaining a flow of a cleaning liquid in a conventional example.
11 整流板 12 球形部材 13 噴出孔 11 Straightening Plate 12 Spherical Member 13 Jet Hole
Claims (4)
浄液によって洗浄処理する際に用いられる洗浄槽におい
て、 前記洗浄槽の底部に配置されて前記洗浄槽に供給される
洗浄液の流れを整える整流板の構造であって、 所定の大きさをなす複数の球形部材を板状に敷き詰めて
配列し、前記球形部材の相互間に形成される孔を洗浄液
の噴出孔としたことを特徴とする洗浄槽における整流板
の構造。1. A cleaning tank used for cleaning an object to be cleaned housed in a transport case with a cleaning liquid, the cleaning tank being arranged at the bottom of the cleaning tank to regulate the flow of the cleaning liquid supplied to the cleaning tank. A structure of a straightening plate, characterized in that a plurality of spherical members having a predetermined size are laid out in a plate shape and arranged, and the holes formed between the spherical members are ejection holes for the cleaning liquid. Structure of the current plate in the cleaning tank.
とする請求項1記載の洗浄槽における整流板の構造。2. The structure of the current plate in the cleaning tank according to claim 1, wherein the spherical members are arranged in a staggered pattern.
したことを特徴とする請求項1記載の洗浄槽における整
流板の構造。3. The structure of the current plate in the cleaning tank according to claim 1, wherein spherical members having different sizes are mixed and arranged.
とする請求項1記載の洗浄槽における整流板の構造。4. The structure of the current plate in the cleaning tank according to claim 1, wherein the spherical member is made of quartz sphere.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP08807893A JP3154262B2 (en) | 1993-03-23 | 1993-03-23 | Structure of current plate in cleaning tank and method of manufacturing substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP08807893A JP3154262B2 (en) | 1993-03-23 | 1993-03-23 | Structure of current plate in cleaning tank and method of manufacturing substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH06275595A true JPH06275595A (en) | 1994-09-30 |
JP3154262B2 JP3154262B2 (en) | 2001-04-09 |
Family
ID=13932835
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP08807893A Expired - Fee Related JP3154262B2 (en) | 1993-03-23 | 1993-03-23 | Structure of current plate in cleaning tank and method of manufacturing substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3154262B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006224906A (en) * | 2005-02-21 | 2006-08-31 | Mazda Motor Corp | Wind deflector device for convertible |
WO2010131478A1 (en) * | 2009-05-15 | 2010-11-18 | 昭和電工株式会社 | Flow-through washing method and flow-through washing apparatus |
JP2011222062A (en) * | 2010-04-06 | 2011-11-04 | Showa Denko Kk | Method for manufacturing magnetic recording medium |
-
1993
- 1993-03-23 JP JP08807893A patent/JP3154262B2/en not_active Expired - Fee Related
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006224906A (en) * | 2005-02-21 | 2006-08-31 | Mazda Motor Corp | Wind deflector device for convertible |
JP4583204B2 (en) * | 2005-02-21 | 2010-11-17 | マツダ株式会社 | Open car wind deflector device |
WO2010131478A1 (en) * | 2009-05-15 | 2010-11-18 | 昭和電工株式会社 | Flow-through washing method and flow-through washing apparatus |
JP2010267340A (en) * | 2009-05-15 | 2010-11-25 | Showa Denko Kk | Flow-through washing method and flow-through washing apparatus |
JP2011222062A (en) * | 2010-04-06 | 2011-11-04 | Showa Denko Kk | Method for manufacturing magnetic recording medium |
Also Published As
Publication number | Publication date |
---|---|
JP3154262B2 (en) | 2001-04-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW434668B (en) | Wafer rinse apparatus and rinse method of the same | |
CN103871938A (en) | Rinse tank for rinsing semiconductor wafer | |
JPH07161678A (en) | Dipping type substrate processing device | |
WO2023185546A1 (en) | Electroplating apparatus | |
JPH06275595A (en) | Structure of flow regulation plate in washing bath | |
US20070227563A1 (en) | Cleaning apparatus and cleaning method | |
US6132523A (en) | Method of cleaning a substrate in a cleaning tank using plural fluid flows | |
JPH0345970U (en) | ||
CN116441218A (en) | Silicon wafer cleaning device | |
CN216149461U (en) | Flow equalizing device and wet cleaning equipment | |
JP2690851B2 (en) | Immersion type substrate processing equipment | |
JPH09232272A (en) | Cleaner of semiconductor substrate | |
JP2002322596A (en) | Electroplating apparatus for film carrier | |
US11854794B2 (en) | Semiconductor cleaning equipment and method for cleaning through vias using the same | |
CN219616252U (en) | Wafer cleaning overflow groove and wafer cleaning equipment | |
JP3247322B2 (en) | Cleaning equipment | |
CN110167275A (en) | A kind of etch system and its engraving method | |
JPH10214838A (en) | Semiconductor manufacturing device and method for manufacturing semiconductor device | |
CN207981455U (en) | Shower pressurized construction | |
JP2008288442A (en) | Substrate treatment method and substrate treatment apparatus | |
JPH06196468A (en) | Substrate cleaning device | |
JPH05299404A (en) | Washer for platelike body | |
JPH09285767A (en) | Running water-type cleaner | |
JP2539732Y2 (en) | Wafer cleaning equipment | |
JP2001291693A (en) | Cleaning pipe structure for cleaning device in semiconductor manufacturing apparatus |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20010109 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080202 Year of fee payment: 7 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090202 Year of fee payment: 8 |
|
LAPS | Cancellation because of no payment of annual fees |