JPH06273609A - Production of color filter - Google Patents

Abstract

PURPOSE:To provide the process for production of the color filter capable of efficiently producing the color filter provided with a light shielding layer having a sufficient optical density with high accuracy. CONSTITUTION:A photosensitive resin compsn. layer 15 is formed via a conductive layer 13 on a substrate 12. This photosensitive resin compsn. layer 15 is exposed and developed via a photomask having prescribed patterns to expose the prescribed regions of the conductive layer 13. Nonconductive resin compsn. layers 17R are formed in a part of the exposed surfaces of the conductive layer 13. Desired colored layers 14R are formed by electrodeposition only on the exposed surfaces of the conductive layer 13 not provided with the nonconductive resin compsn. layers 17R and thereafter, only the nonconductive resin compsn. layers 17R are removed. The colored layers 14R consisting of a prescribed number of colors are formed by repeating these operations. Further, the colored layers 14R are formed by electrodeposition on the surface of the conductive layer on which neither the photosensitive resin compsn. layer 15 nor the colored layers 14R are formed and thereafter, the light shieldable colored layers are formed on the exposed surfaces of the conductive layers generated by removing only the photosensitive resin compsn. layer 15.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter, and more particularly to a method for manufacturing a color filter used in a liquid crystal display or the like.

[0002]

2. Description of the Related Art For example, in a liquid crystal display (LCD), a color filter is used in both an active matrix system and a simple matrix system in order to meet the recent demand for colorization. For example, in an active matrix type liquid crystal display using thin film transistors (TFTs), three primary colors of red (R), green (G), and blue (B) are used as color filters, and R, G, and B pixels are used. The liquid crystal operates as a shutter by turning on and off the electrodes corresponding to, and light is transmitted through each of the R, G, and B pixels to perform color display. Then, color mixing is visually performed on the retina based on the principle of additive color mixing in which liquid crystal shutters corresponding to pixels of two or more colors are opened to mix the colors to make them appear as different colors.

The above color filter has the following types depending on its forming method, and the required properties are pattern resolution, spectral property, heat resistance, weather resistance, chemical resistance, and low manufacturing cost. In addition, there are no defects and workability is high. (A) Dyeing method color filter To form a color filter by a dyeing method, a coating solution prepared by adding a photosensitizer such as dichromate to a hydrophilic resin such as gelatin, casein, or polyvinyl alcohol is spin-coated or the like. To a thickness of about 0.4 to 2 μm on the surface of the transparent glass substrate, and then exposed and developed through a mask having a predetermined shape to form a dyed layer, which is dyed with an acid dye or a reactive dye. Dyeing is performed to form the first color layer.
Next, after forming a dye-proof layer of acrylic, urethane, epoxy or the like on the first color layer to prevent double dyeing, the second and subsequent color layers are formed in the same process, and R, G, B
It is possible to form a color filter provided with each of the colored layers. (B) Dispersion Method Color Filter To form a color filter by the dispersion method, a photosensitive liquid in which a dye, an organic pigment, an inorganic pigment or the like as a colorant is dispersed in a transparent photosensitive resin is applied on a transparent substrate to form a photosensitive film. A resin layer is formed. Next, this photosensitive resin layer is exposed and developed through a mask having a predetermined shape to form a colored layer for the first color, and similarly, colored layers for the second and subsequent colors are formed to form R, G, B colors. It is possible to form a color filter provided with each of the colored layers.

[0004]

However, in the above-mentioned dyeing method, it is necessary to perform a photolithography process each time a color is changed, and it is necessary to form a dye-proof layer for preventing double dyeing. However, the process becomes complicated and there is a problem in manufacturing cost. Further, since a dye is used as a colorant, there is a problem that heat resistance, weather resistance, chemical resistance and the like are poor.

Further, the dispersion method can produce a color filter having a fine pattern having excellent heat resistance, weather resistance, chemical resistance, etc., but like the dyeing method, a photolithography process is performed every time a color change occurs. It is necessary to carry out the treatment, which complicates the process and causes a problem in manufacturing cost.

As a method for solving such a problem, a method for manufacturing a color filter by electrodeposition has been developed.
In the electrodeposition method, for example, a transparent conductive film formed on a substrate is patterned to form a transparent electrode, and a voltage is selectively applied only to a portion of the patterned transparent electrode where a colored layer of the same color is formed. Then, electrodeposition is performed in the colored electrodeposition bath to form the first colored layer. Next, a voltage is selectively applied only to a portion where a colored layer of another color is formed, and the second
By forming the colored layers after the color, it is possible to form a color filter including the R, G, and B colored layers.

The color filter formed by the electrodeposition method has the advantages of excellent pixel smoothness and less residue of resist in the non-image line area, but highly precise patterning for forming the transparent electrode for electrodeposition. Therefore, there is a problem that the process is complicated and the manufacturing cost is high. Also,
Since the formed transparent electrode for electrodeposition has a fine pattern, a defect such as a disconnection is likely to occur, and this defect directly leads to a defect of the color filter and is difficult to correct.

Furthermore, since the pattern of each colored layer is basically a continuous line, there is a problem that the degree of freedom in pattern design is low. When a light-shielding layer (black matrix) is formed on the color filter, the light-shielding layer is usually formed of metallic chromium or the like before the formation of the coloring layer. When the layer is formed, the light-shielding layer made of a conductive material is present on the transparent electrode when the colored layer is formed, which causes a problem that the colored layer is also formed on the light-shielding layer. This problem is also a problem that occurs when a conductive material such as carbon black is used as the black pigment, even when the light-shielding layer is formed using a material in which a black pigment is dispersed.

Further, there has been proposed a method of forming a light-shielding layer by coating a photoresist in which a black pigment is dispersed and exposing and developing it after forming a colored layer of R, G and B. There is a reciprocal relationship in utilizing photoreaction in the material, and as a result, it is difficult to obtain a sufficient optical density as a color filter.

The present invention has been made in view of the above circumstances, and provides a method of manufacturing a color filter, which is capable of highly accurately and efficiently obtaining a color filter having a light-shielding layer having a sufficient optical density. The purpose is to provide.

[0011]

In order to achieve such an object, the present invention forms a conductive layer on a substrate, forms a photosensitive resin composition layer on the conductive layer, and forms a predetermined pattern. After exposing the photosensitive resin composition layer through a photomask that has, a first step of exposing a predetermined region of the surface of the conductive layer by development, and non-conductive on a part of the exposed surface of the conductive layer. A conductive resin composition layer by screen printing, and after forming a colored layer by electrodeposition on the conductive layer in an exposed state where the non-conductive resin composition layer is not formed, the non-conductive resin A second step of forming a colored layer having a predetermined number of colors by repeating removal of only the composition layer, and a colored layer by electrodeposition on the conductive layer exposed at the end of the second step. Third step of forming and the photosensitive resin composition A fourth step of forming a light-shielding colored layer only removed on the conductive layer exposed by the, was such as to have configure.

[0012]

The photosensitive resin composition layer formed on the substrate via the conductive layer is exposed and developed through a photomask having a predetermined pattern to expose a predetermined region of the conductive layer. The exposed surface of the non-conductive resin composition layer is formed in part, a desired colored layer is formed by electrodeposition on the exposed surface of the conductive layer on which the non-conductive resin composition layer is not provided, Then, only the non-conductive resin composition layer is removed, a colored layer having a predetermined number of colors is formed by repeating this, and further, the conductive layer in which neither the photosensitive resin composition layer nor the colored layer is formed. After the colored layer is formed on the surface by electrodeposition, only the photosensitive resin composition layer is removed, and the light-shielding colored layer is formed on the exposed surface of the conductive layer. As a result, a highly precise fine pattern is formed as compared with the conventional method, and it becomes possible to easily and efficiently manufacture a color filter provided with a light shielding layer having a sufficient optical density.

[0013]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a perspective view showing an example of an active matrix type liquid crystal display (LCD) using a color filter manufactured according to the present invention, and FIG. 2 is a schematic sectional view of the same. 1 and 2, the LCD 1 includes a color filter 10 and a transparent glass substrate 2.
0 is made to face each other via a seal member 30, and a twisted nematic (TN) liquid crystal has a thickness of about 5 to 10 μm therebetween.
The liquid crystal layer 40 is formed to a certain degree, and the color filter 10
The polarizing plates 50 and 51 are arranged outside the transparent glass substrate 20.

FIG. 3 is an enlarged partial sectional view of the color filter 10. The color filter 10 includes a transparent substrate 12, a transparent conductive layer 13 formed on the transparent substrate 12, and a coloring layer 1.
4, a protective layer 18 provided so as to cover the colored layer 14, and a transparent common electrode 19. The color filter 10 is arranged such that the transparent common electrode 19 is located on the liquid crystal layer 40 side. The colored layer 14 is composed of a red colored layer 14R, a green colored layer 14G, a blue colored layer 14B and a light-shielding colored layer (black matrix) 14BM, and the arrangement of each colored layer 14R, 14G, 14B is as shown in FIG. It has a mosaic arrangement. The arrangement pattern of the colored layers is not limited to this, and may be triangular arrangement, stripe arrangement, or the like.

Display electrodes 22 are provided on the transparent glass substrate 20 so as to correspond to the respective colored layers 14R, 14G and 14B, and each display electrode 22 is a thin film transistor (TF).
T) 24. Further, a scanning line (gate electrode busbar) 26a and a data line 26b are arranged between the respective display electrodes 22 so as to correspond to the black matrix 14BM.

In such an LCD 1, each colored layer 14R, 14G, 14B constituting the colored layer 14 constitutes a pixel,
The liquid crystal layer 40 operates as a shutter by turning on and off the display electrodes corresponding to each pixel while illuminating light from the polarizing plate 51 side, and each of the colored layers 14R, 14G, 14
The irradiation light is transmitted through each of the B pixels to perform color display.

The transparent substrate 12 of the color filter 10 is a rigid material such as quartz glass, Pyrex glass, or synthetic quartz plate, or a transparent resin film.
A flexible material having flexibility such as an optical resin plate can be used. 7059 manufactured by Corning
Glass is a material with a small coefficient of thermal expansion, has excellent dimensional stability and workability in high-temperature heat treatment, and is a non-alkali glass that does not contain an alkali component in the glass, so it is a color filter for LCDs using an active matrix method Suitable for

Next, an example of manufacturing the color filter according to the present invention will be described with reference to FIGS. First, a transparent conductive material such as indium tin oxide (ITO) is formed on the transparent substrate 12 by a sputtering method or the like to have a thickness of 20.
The transparent conductive layer 13 having a thickness of 0 to 2000 Å is formed. Then, a photosensitive resin composition is applied onto the transparent conductive layer 13 by a spin coating method or the like to form a photosensitive resin composition layer 15 (FIG. 4 (A)). The photosensitive resin composition used here may be, for example, an acid-soluble (acid developable) / non-conductive resin composition, and is manufactured by Nippon Oil Co., Ltd. containing a photopolymerization initiator as a negative resist. LDN-27 diluted with propylene glycol monomethyl ether at a ratio of 1: 1 (weight ratio) can be used. As the other photosensitive resin composition, an amino group, an ammonium group, a sulfonium group or the like is introduced into an acrylic resin, an epoxy resin, a urethane resin, a polybutadiene resin or the like having a photosensitive group such as an acryloyl group, a methacryloyl group or a cinnamoyl group. Resins may be used alone or in a mixture, and if necessary, acrylic monomers such as hydroxyethyl (meth) acrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate and neopentyl glycol acrylate may be mixed to adjust the viscosity and coating properties. You may adjust it.

The photoinitiator is widely considered as a commercially available reagent, and benzoin-based, benzoin ether-based, anthraquinone-based, benzophenone-based, thioxanthone-based and the like can be used.

As the diluting solvent, glycol ethers such as ethylene glycol monobutyl ether, ethylene glycol dimethyl ether and propylene glycol monomethyl ether, ketones such as acetone and methyl ethyl ketone, alcohols such as isopropyl alcohol and ethanol are used alone or as a mixed solvent. Can be used.

Next, the above-mentioned photosensitive resin composition layer 15 is exposed through a photomask 30 having a black matrix pattern to cure the exposed portion 15BM (FIG. 4 (B)). Then, it is developed and the unexposed portion is removed to form a photosensitive resin composition layer (first resist layer) 16 having a positive pattern for a black matrix (FIG. 4).
(C)). On the other hand, in the portions 13R, 13G and 13B where the transparent conductive layer 13 is exposed in the R, G and B colored pixel shapes without forming the positive pattern, the colored layer 1
4R, 14G and 14B are formed.

The thickness of the first resist layer 16 as described above is preferably about 0.5 to 2 μm. The above is the first step of the color filter manufacturing method of the present invention. Then R,
Of the exposed surfaces 13R, 13G, and 13B of the transparent conductive layer 13 exposed in the G and B colored pixel shapes, for example, the colored layer 1
When 4R, 14G, and 14B are formed in this order, a non-conductive resin composition is provided on the other pixel portions 13G and 13B except the pixel portion 13R where the colored layer (the colored layer 14R in this case) is formed first. Selective printing by screen printing method,
By drying and removing the solvent, a non-conductive resin composition layer (second resist layer) 17R is formed (FIG. 4).
(D)). As the non-conductive resin composition, those which do not contain a photopolymerization initiator among the above-mentioned photosensitive resin compositions can be used. For example, LDN manufactured by Nippon Oil Co., Ltd. as the negative resist can be used. A product obtained by diluting -27 with propylene glycol monomethyl ether at a ratio of 1: 1 (weight ratio) can be used. Further, as other non-conductive resin composition, acryloyl group, methacryloyl group, acrylic resin having a photosensitive group such as cinnamoyl group, epoxy resin, urethane resin, polybutadiene resin, etc. amino group, ammonium group, sulfonium group, etc. Examples of the resin that has been introduced include a single or a mixture thereof, and if necessary, an acrylic monomer such as hydroxyethyl (meth) acrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, or neopentyl glycol acrylate is mixed to obtain a viscosity and a coating film. Properties may be adjusted.

As the diluting solvent, glycol ethers such as ethylene glycol monobutyl ether, ethylene glycol dimethyl ether and propylene glycol monomethyl ether, ketones such as acetone and methyl ethyl ketone, alcohols such as isopropyl alcohol and ethanol are used alone or as a mixed solvent. Can be used.

Then, the above-mentioned substrate 12 is immersed in an electrodeposition bath in which a red pigment is dispersed, and the red electrodeposition material is deposited only on the pixel portion 13R, washed thoroughly with water and then dried to obtain a pinhole-free coloring. The layer 14R is formed (FIG. 4E). On the pixel portion 13R in which the colored layer 14R is formed in this manner, another electrodeposition material does not deposit in the subsequent electrodeposition process due to the insulating function of the colored layer 14R. Then the second
The substrate is dipped in a resist stripper to remove the second resist layer 17
Pixel portions 13G, 1 of the transparent conductive layer 13 by dissolving and removing R
3B is exposed (FIG. 4 (F)). At this time, since the first resist layer 16 forming the positive pattern for the black matrix is photo-cured, it is not dissolved by the second resist stripping solution. The second resist stripper is, for example, a non-conductive resin composition produced by Nippon Oil Co., Ltd.
In the case of using LDN-27 manufactured by diluting it with propylene glycol monomethyl ether at a ratio of 1: 1 (weight ratio), a 0.25 wt% lactic acid aqueous solution or the like can be used.

Next, on the exposed surfaces 13G and 13B of the transparent conductive layer 13 exposed in the G and B colored pixel shapes, on the other pixel portions 13B except the pixel portion 13G where the colored layer 14G is formed. Then, similarly to the above, the non-conductive resin composition layer (second resist layer) 17G is formed (FIG. 5A). Then, the substrate 12 is immersed in an electrodeposition bath in which a green pigment is dispersed, and a green electrodeposition material is deposited only on the pixel portion 13G,
Colored layer 1 without pinholes after being thoroughly washed with water and then dried
4G is formed (FIG. 5 (B)). After that, the substrate is dipped in the second resist stripping solution to dissolve and remove the second resist layer 17G to expose the pixel portion 13B of the transparent conductive layer 13 (FIG. 5C). The above is the second step of the color filter manufacturing method of the present invention.

Next, the substrate 12 on which the above second step has been completed
Is immersed in an electrodeposition bath in which a blue pigment is dispersed, the blue electrodeposition material is deposited only on the pixel portion 13B of the transparent conductive layer 13 exposed at the end of the second step, washed thoroughly with water, and then dried. A colored layer 14B having no pinhole is formed (FIG. 5).
(D)). Thereby, the exposed surfaces 13R, 13G, 1 of the transparent conductive layer 13 exposed in the R, G, B colored pixel shapes.
Colored layers 14R, 14G, and 14B are formed on 3B, respectively. The above is the third step of the color filter manufacturing method of the present invention.

Next, as a fourth step, the substrate is dipped in a first resist stripping solution to remove the first resist layer 16 forming a positive pattern for the black matrix to expose the transparent conductive layer 13 ( FIG. 5 (E)). For the first resist stripping solution, for example, LDN-27 manufactured by Nippon Oil Co., Ltd. containing a photopolymerization initiator as a photosensitive resin composition is diluted with propylene glycol monomethyl ether at a ratio of 1: 1 (weight ratio). In this case, a 20 wt% lactic acid aqueous solution or the like can be used. Then, the above substrate 12 is immersed in an electrodeposition bath in which a black pigment is dispersed, and a black electrodeposition material is deposited on the transparent conductive layer 13 exposed in the positive pattern shape for the black matrix, and washed sufficiently with water. After that, it is dried to form a light-shielding colored layer (black matrix) 14BM without pinholes (FIG. 5 (F)). A non-electrodeposition portion (a portion where the transparent conductive layer 13 is exposed) may be formed in a mark shape for alignment at a predetermined portion of the light shielding colored layer 14BM.

The electrodeposition material used in the above manufacturing process is generally made of an organic material (polymer material), and its original form is well known as an electrodeposition coating method. In electrodeposition coating, there are cation electrodeposition and anion electrodeposition due to electrochemical reaction with the main electrode. Examples of the organic polymer substance used for electrodeposition include various organic polymer substances such as natural fats and oils, synthetic fats and oils, alkyd resins, polyester resins, acrylic resins and epoxy resins. Among such electrodeposition materials, a thermosetting anion is used, in particular, an acrylic resin, a polyester resin, a polybutadiene resin or the like is used alone or as a mixture, and is further used in combination with a crosslinkable resin such as a melamine resin, a urethane resin or a phenol resin. Molded electrodeposition materials are preferred. When such a thermosetting / anionic electrodeposition material is used, the transparent conductive layer 13 serves as an anode and the platinum electrode serves as a cathode. Then, in the production of the color filter of the present invention, the electrodeposition liquid in which the finely pulverized colorant (pigment) is dispersed is held in the anion type electrodeposition bath to expose the transparent conductive layer 13 together with the ionic polymer material. Precipitate on the part.

Colored layers 14R, 1 formed as described above
The protective layer 18 provided so as to cover the 4G and 14B and the black matrix 14BM is for the purpose of smoothing the surface of the color filter 10, improving reliability, preventing contamination of the liquid crystal layer 40, and the like, and is made of an acrylic resin. , A transparent resin such as an epoxy resin or a polyimide resin, or a transparent inorganic compound such as silicon dioxide. The thickness of such a protective layer is preferably about 0.5 to 50 μm.

As the transparent common electrode 19, an indium tin oxide (ITO) film or the like can be used. I
The TO film can be formed by a known method such as a vapor deposition method or a sputtering method, and the thickness thereof is preferably about 200 to 2000Å.

In the above embodiment, the light-shielding colored layer 14B is used.
Although M is formed by electrodeposition, in the present invention, the light-shielding colored layer 14BM can be formed by metal plating or electroless plating. The light-shielding colored layer 14BM can be formed by metal plating or electroless plating according to known techniques such as conventional Cr metal plating and Ni electroless plating. As described above, it is possible to form the light-shielding colored layer 14BM with the conductive material.
This is because the light-shielding colored layer 14BM is formed after the colored layers of red, green, blue and the like are formed in the present invention.

Next, the present invention will be described in more detail by showing experimental examples. (Experimental example) Indium tin oxide (IT
O) is formed by a sputtering method to form an ITO layer, and a photosensitive acid-developable negative resist (LDN manufactured by Nippon Oil Co., Ltd. containing a photopolymerization initiator) on the ITO layer.
-27 was diluted to 1: 1 (weight ratio) with propylene glycol monomethyl ether) and applied (film thickness 6 μm) by spin coating. Next, the resist coating material was exposed through a photomask having a black matrix pattern. This exposure was performed using an ultrahigh pressure mercury lamp (6 mW / cm ² , 100 mJ / cm ² ). Next, the substrate was immersed in a 0.25 wt% lactic acid aqueous solution maintained at room temperature for 1 minute to develop and remove the unexposed portion to form a first resist layer having a positive pattern for a black matrix.

Next, an acid-developable negative resist (LDN-27 manufactured by Nippon Oil Co., Ltd.) was used as propylene on the pixel surface of the exposed surface of the ITO layer except for the pixel portion forming the red colored layer. A second resist for forming a red colored layer by selectively printing (diluted 1: 1 (weight ratio) with glycol monomethyl ether) by a screen printing method and removing the solvent by drying at 80 ° C. for 10 minutes. Layers were formed.

On the other hand, a thermosetting type / anion type electrodeposition material (Oligo-ED manufactured by Nippon Petrochemical Co., Ltd.) diluted with pure water to a residual solid content of 13.5% by weight was mixed with a red pigment ( Naphthol red) was added at a ratio of 5% by weight to prepare an electrodeposition liquid for the red colored layer. Then, in this electrodeposition liquid, the ITO layer was used as an anode and the platinum electrode was used as a cathode, the substrate was immersed so that the electrode interval was 30 mm, and a constant current of 10 mA was applied for 60 seconds for electrodeposition. Next, the substrate taken out from the electrodeposition liquid was thoroughly washed with water and then dried at 80 ° C. for 10 minutes to form a red colored layer having good transparency.

Then, the substrate was immersed in a 0.25 wt% lactic acid aqueous solution maintained at room temperature for 2 minutes to dissolve and remove the second resist layer for forming the red colored layer formed by screen printing.

Next, on the exposed surface of the ITO layer, except for the pixel portion forming the green colored layer (pixel portion forming the blue colored layer), the same acid-developable negative mold as described above is formed. Selectively print the resist by screen printing,
The solvent was removed by drying at 80 ° C. for 10 minutes to form a second resist layer for forming a green colored layer.

An electrodeposition solution for the green colored layer was prepared in the same manner as the above-mentioned electrodeposition solution for the red colored layer except that a green pigment (phthalocyanine green) was used instead of the red pigment.
Then, the electrodeposition liquid for this green colored layer was used to perform electrodeposition under the same conditions as the above-mentioned formation of the red colored layer. Next, the substrate taken out from the electrodeposition solution was thoroughly washed with water, and then at 80 ° C. for 10
It was dried for a minute to form a green colored layer having good transparency.

Then, the substrate was immersed in a 0.25 wt% lactic acid aqueous solution maintained at room temperature for 2 minutes to dissolve and remove the second resist layer for forming a green colored layer formed by screen printing.

Next, an electrodeposition solution for a blue colored layer was prepared in the same manner as the above-mentioned electrodeposition solution for a red colored layer except that a blue pigment (copper phthalocyanine blue) was used instead of the red pigment.
Then, the electrodeposition liquid for the blue colored layer was used to carry out electrodeposition under the same conditions as the formation of the red colored layer. Next, the substrate taken out from the electrodeposition solution was thoroughly washed with water, and then at 80 ° C. for 10
It was dried for a minute to form a blue colored layer having good transparency.

Then, the substrate was dipped in a 20 wt% lactic acid aqueous solution maintained at 45 ° C. for 2 minutes to dissolve and remove the first resist layer having a positive pattern for the black matrix. Next, an electrodeposition solution for a black matrix was prepared in the same manner as the above-mentioned electrodeposition solution for the red colored layer except that a black pigment (carbon black) was used instead of the red pigment. Then, using this electrodeposition solution, electrodeposition was performed under the same conditions as the above-mentioned formation of the red colored layer. Next, the substrate taken out from the electrodeposition liquid was thoroughly washed with water and then dried at 80 ° C. for 10 minutes to form a black matrix, and a color filter was obtained.

A liquid crystal display (LCD) was prepared using the obtained color filter and a color image was displayed. As a result, a good color image without color shift or bleeding was displayed.

[0042]

As described in detail above, according to the present invention, a resin having excellent heat resistance, solvent resistance and weather resistance as an electrodeposition material,
The colorant can be selected, and the photolithography process can be performed only once when the photosensitive resin composition layer is exposed, so the process is simple and the dimensional accuracy of pixels such as a color filter and total pitch is Since it is compensated for by the conductive resin composition layer, high fineness is possible, and the alignment accuracy at the time of forming the non-conductive resin composition layer as masking may be rougher than the conventional method. Since patterning is not necessary and the formation of the light-shielding layer (black matrix) can be performed in the same process as the formation of the colored layers of red, green, blue, etc., manufacturing efficiency and cost can be reduced. Further, since the degree of freedom of the pattern of the colored layer is large and the light-shielding layer (black matrix) can be formed last, a conductive material such as metal or carbon black can be used for the light-shielding layer. It is possible to form a light-shielding layer having a high concentration.

[Brief description of drawings]

FIG. 1 is a perspective view showing an example of an active matrix liquid crystal display using a color filter manufactured according to the present invention.

FIG. 2 is a schematic sectional view of the liquid crystal display shown in FIG.

FIG. 3 is an enlarged partial sectional view of a color filter used in the liquid crystal display shown in FIG.

FIG. 4 is a process drawing for explaining the method of manufacturing a color filter according to the present invention.

FIG. 5 is a process drawing for explaining the manufacturing method of the color filter according to the present invention.

[Explanation of symbols]

 10 ... Color filter 12 ... Transparent substrate 13 ... Transparent conductive layer 14 ... Colored layer 15 ... Photosensitive resin composition layer 17 ... Non-conductive resin composition layer

Claims (6)

[Claims] 1. A conductive layer is formed on a substrate, a photosensitive resin composition layer is formed on the conductive layer, and the photosensitive resin composition layer is exposed through a photomask having a predetermined pattern. A first step of exposing a predetermined area on the surface of the conductive layer by development, and forming a non-conductive resin composition layer on a part of the exposed surface of the conductive layer by screen printing, After forming the colored layer by electrodeposition on the conductive layer in the exposed state without forming the composition layer, removing only the non-conductive resin composition layer, a predetermined number of colors by repeating A second step of forming a colored layer consisting of, a third step of forming a colored layer by electrodeposition on the conductive layer exposed at the end of the second step, and only the photosensitive resin composition layer. Form a light-shielding colored layer on the exposed conductive layer after removal And a fourth step, which comprises: 2. The black light-shielding colored layer is formed by electrodeposition in the fourth step.
A method for manufacturing the described color filter. 3. The method of manufacturing a color filter according to claim 1, wherein in the fourth step, the light-shielding colored layer is formed by metal plating or electroless plating. 4. The method of manufacturing a color filter according to claim 1, wherein the substrate is a glass substrate. 5. The method of manufacturing a color filter according to claim 1, wherein the conductive layer is a transparent conductive layer. 6. The method for producing a color filter according to claim 1, wherein the electrodeposition is performed in an electrodeposition bath containing a thermosetting / anionic electrodeposition polymer and a dye.