JPH06273465A - Potential measuring device - Google Patents

Potential measuring device

Info

Publication number
JPH06273465A
JPH06273465A JP5852593A JP5852593A JPH06273465A JP H06273465 A JPH06273465 A JP H06273465A JP 5852593 A JP5852593 A JP 5852593A JP 5852593 A JP5852593 A JP 5852593A JP H06273465 A JPH06273465 A JP H06273465A
Authority
JP
Japan
Prior art keywords
potential
measuring
probe
electric
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5852593A
Other languages
Japanese (ja)
Inventor
Tomoki Kato
知己 加藤
Masafumi Kadonaga
雅史 門永
Tomoko Takahashi
朋子 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP5852593A priority Critical patent/JPH06273465A/en
Publication of JPH06273465A publication Critical patent/JPH06273465A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent discharge from occuring, measure a potentialat a small region in noncontact state, and achieve miniaturization of the device by providing a measurement probe, an electrical element, and a charge measurement means. CONSTITUTION:After a measurement probe 1 is brought closer to the object at the grounding potential, the probe 1 is brought closer to a potential measurement surface 2. At this time, the charge determined by air between the probe 1 and the measurement surface 2 and the amount of static electricity of an electrical element 3, the potential, etc., of the measurement surface 2, flows into or flows out of the measurement surface 2 via an element 3, the probe 1, and an insulation substance 1a from a constant potential source 4. A charge measurement means 5 measures the potential of the measurement surface 2 by detecting the amount of charge entering or escaping from the element 3. The substance 1a is sealed to the tip of the probe 1, thus preventing discharge and measuring the potential of a small region without any contact. Also, since the configuration of the probe 1 is extremely simple, the device can be miniaturized easily.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は微小な領域の電位測定が
可能な電位測定装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a potential measuring device capable of measuring potential in a minute area.

【0002】[0002]

【従来の技術】従来、電位測定装置としては、被測定物
に検出電極を振動させながら近付けることにより、被測
定物の表面電位に応じた大きさの交流が検出電極に流れ
ることを利用した表面電位センサが超音波TECHNO
8月号第56〜60頁に記載されている。
2. Description of the Related Art Conventionally, as a potential measuring device, a surface utilizing the fact that an alternating current of a magnitude corresponding to the surface potential of the measured object flows to the measured electrode by bringing the detected electrode closer to the measured object while vibrating the surface. The potential sensor is ultrasonic TECHNO
August issue, pp. 56-60.

【0003】[0003]

【発明が解決しようとする課題】現在、乾式普通紙複写
機やファクシミリ等においては、高画質化は、低コスト
化、小型化、低騒音化と共に重要な課題となっている。
電子写真技術を利用した乾式普通紙複写機やファクシミ
リ等の場合には、高画質化のための1つの解決手段とし
て、帯電後,露光後等の感光体の表面電位分布を高解像
で測定し、それをもとに各種の制御を行うことが考えら
れる。そのためには、感光体の微小領域の表面電位を測
定できる小型な装置が必要である。
At present, in a dry plain paper copying machine, a facsimile or the like, high image quality is an important issue together with cost reduction, size reduction and noise reduction.
In the case of dry plain paper copiers and facsimiles using electrophotographic technology, one solution for improving image quality is to measure the surface potential distribution of the photoconductor after charging and after exposure with high resolution. However, it is conceivable to perform various controls based on that. For that purpose, a small device capable of measuring the surface potential of a minute region of the photoconductor is required.

【0004】現在、電位測定装置は、主流になっている
表面電位計でも、小型化すれば、ある程度解像度を上げ
ることができるが、構造が多少複雑であるので、小型化
に限界があるだけでなく、小型化した場合にその出力が
小さくなってしまって測定精度が落ちるというような問
題が生ずる。したがつて、現在の表面電位計では、微小
な領域の表面電位を測定できず、高解像な表面電位分布
を測定することは不可能である。
[0004] The potential measuring device can increase the resolution to some extent even if the surface electrometer, which is the mainstream at present, is downsized, but the structure is rather complicated, and therefore there is only a limit to downsizing. However, there is a problem in that the output becomes small when the size is reduced and the measurement accuracy is lowered. Therefore, the current surface electrometer cannot measure the surface potential of a minute area, and cannot measure the high-resolution surface potential distribution.

【0005】本発明は、上記欠点を改善し、微小な領域
の電位測定が可能な電位測定装置を提供することを目的
とする。
An object of the present invention is to improve the above-mentioned drawbacks and to provide an electric potential measuring device capable of measuring electric potential in a minute area.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するた
め、請求項1記載の発明は、電位測定面に対して微小な
間隔を隔てて位置し、かつ、少なくともこの電位測定面
に対向する部分に絶縁性物質が付いた導電性の測定プロ
ーブと、この測定プローブと定電位源との間に接続され
る電気素子と、この電気素子を出入りする電荷を測定す
る電荷測定手段とを備えたものである。
In order to achieve the above object, the invention according to claim 1 is located at a minute interval with respect to the potential measuring surface and at least a portion facing the potential measuring surface. Having a conductive measuring probe having an insulating substance attached to the inner surface, an electric element connected between the measuring probe and a constant potential source, and a charge measuring means for measuring electric charge going in and out of the electric element Is.

【0007】請求項2記載の発明は、電位測定面に接触
し、かつ、少なくともこの電位測定面に対向する部分に
絶縁性物質が付いた導電性の測定プローブと、この測定
プローブと定電位源との間に接続される電気素子と、こ
の電気素子を出入りする電荷を測定する電荷測定手段と
を備えたものである。
According to a second aspect of the present invention, there is provided a conductive measuring probe which is in contact with the potential measuring surface and at least a portion facing the potential measuring surface is provided with an insulating material, and the measuring probe and constant potential source. An electric element connected between the electric element and the electric element, and a charge measuring unit for measuring electric charge flowing in and out of the electric element.

【0008】請求項3記載の発明は、請求項1または2
記載の電位測定装置において、前記測定プローブの電位
測定面に対向する部分に絶縁性物質として強誘電体を固
着したものである。
The invention according to claim 3 is the invention according to claim 1 or 2.
In the potential measuring device described above, a ferroelectric substance is fixed as an insulating substance to a portion of the measuring probe facing the potential measuring surface.

【0009】[0009]

【作用】請求項1記載の発明では、導電性の測定プロー
ブは、電位測定面に対して微小な間隔を隔てて位置し、
かつ、少なくとも電位測定面に対向する部分に絶縁性物
質が付いている。電位測定面と定電位源との間には絶縁
性物質及び測定プローブ、電気素子を通して電荷が流
れ、電気素子を出入りする電荷が電荷測定手段により測
定される。
According to the first aspect of the present invention, the conductive measuring probe is located at a minute distance from the potential measuring surface,
In addition, an insulating substance is attached to at least a portion facing the potential measurement surface. A charge flows between the potential measurement surface and the constant potential source through the insulating substance, the measurement probe, and the electric element, and the charge flowing in and out of the electric element is measured by the charge measuring means.

【0010】請求項2記載の発明では、導電性の測定プ
ローブは、電位測定面に接触し、かつ、少なくとも電位
測定面に対向する部分に絶縁性物質が付いている。電位
測定面と定電位源との間には絶縁性物質及び測定プロー
ブ、電気素子を通して電荷が流れ、電気素子を出入りす
る電荷が電荷測定手段により測定される。
According to the second aspect of the present invention, the conductive measuring probe is in contact with the potential measuring surface, and at least a portion facing the potential measuring surface is provided with an insulating substance. A charge flows between the potential measurement surface and the constant potential source through the insulating substance, the measurement probe, and the electric element, and the charge flowing in and out of the electric element is measured by the charge measuring means.

【0011】請求項3記載の発明では、請求項1または
2記載の電位測定装置において、電位測定面と定電位源
との間には強誘電体及び測定プローブ、電気素子を通し
て電荷が流れる。
According to a third aspect of the invention, in the potential measuring device according to the first or second aspect, electric charges flow between the potential measuring surface and the constant potential source through the ferroelectric substance, the measuring probe and the electric element.

【0012】[0012]

【実施例】図1は本発明の第1実施例を示す。測定プロ
ーブ1は、電位測定面2に対して微小な間隔を隔てて対
向して配置され、かつ、電位測定面2と対向する先端部
に樹脂、セラミック等の絶縁性物質1aが固着される。
また、測定プローブ1はスイッチ素子、抵抗素子、コン
デンサ等から構成される電気素子3を介して定電位源4
に接続される。電気素子3は電荷測定手段5が接続さ
れ、電気素子3を通過する電荷が電荷測定手段5により
測定される。ここに、測定プローブ1と電位測定面2と
の間の空隙は一種のコンデンサを形成しており、その容
量Cは測定プローブ1の電位測定面2側の面積と、測定
プローブ1と電位測定面2との間のギャップ長で決ま
る。
FIG. 1 shows a first embodiment of the present invention. The measuring probe 1 is arranged so as to face the potential measuring surface 2 with a minute gap therebetween, and an insulating material 1a such as resin or ceramic is fixed to the tip end facing the potential measuring surface 2.
Further, the measurement probe 1 has a constant potential source 4 through an electric element 3 including a switch element, a resistance element, a capacitor and the like.
Connected to. A charge measuring means 5 is connected to the electric element 3, and the electric charge passing through the electric element 3 is measured by the charge measuring means 5. Here, the space between the measurement probe 1 and the potential measurement surface 2 forms a kind of capacitor, and its capacitance C is the area on the potential measurement surface 2 side of the measurement probe 1, the measurement probe 1 and the potential measurement surface. Determined by the gap length between the two.

【0013】次に、この第1実施例の動作を説明する。
測定プローブ1を接地電位の物体に近付けた後に、図1
に示すように電位測定面2に測定プローブ1を近付ける
と、測定プローブ1と電位測定面2との間の空隙や電気
素子3の静電容量、電位測定面2の電位Vなどによって
決まる電荷Qが定電位源4から電気素子3及び測定プロ
ーブ1、絶縁性物質1aを通して電位測定面2に対して
流入し又は流出する。電荷測定手段5は電気素子3を出
入りする電荷量Qを検出することによって電位測定面2
の電位Vを測定する。
Next, the operation of the first embodiment will be described.
After bringing the measurement probe 1 close to an object at ground potential,
When the measurement probe 1 is brought close to the potential measurement surface 2 as shown in FIG. 3, the charge Q determined by the gap between the measurement probe 1 and the potential measurement surface 2, the capacitance of the electric element 3, the potential V of the potential measurement surface 2, and the like. From the constant potential source 4 flows into or out of the potential measurement surface 2 through the electric element 3, the measurement probe 1, and the insulating substance 1a. The charge measuring means 5 detects the amount of charge Q entering and leaving the electric element 3 to detect the potential measuring surface 2
The potential V of is measured.

【0014】図2はこの第1実施例の具体的な構成を示
す。電気素子3はスイッチ6が用いられ、電荷測定手段
5は電流計7が用いられる。測定プローブ1はスイッチ
6及び電流計7を介して定電位源4を構成する接地点に
接続される。スイッチ6をオンさせた際には電位測定面
2から絶縁性物質1a、測定プローブ1、スイッチ6、
電流計7を介して接地点に電流が流れ、この電流が電流
計7により測定されて積分されることで、電気素子3を
出入りする電荷量Qが検出されて電位測定面2の電位V
が測定される。
FIG. 2 shows a concrete structure of the first embodiment. A switch 6 is used as the electric element 3, and an ammeter 7 is used as the charge measuring means 5. The measurement probe 1 is connected via a switch 6 and an ammeter 7 to a ground point forming a constant potential source 4. When the switch 6 is turned on, the insulating material 1a, the measurement probe 1, the switch 6,
A current flows through the ammeter 7 to the ground point, and this current is measured by the ammeter 7 and integrated, whereby the charge amount Q flowing in and out of the electric element 3 is detected, and the potential V of the potential measuring surface 2 is detected.
Is measured.

【0015】この第1実施例では、測定プローブ1の先
端部に絶縁性物質1aを固着しているので、放電しにく
く、微小な領域の電位を非接触で測定することができ
る。また、測定プローブ1の構成が非常にシンプルであ
るので、小型化に適している。
In the first embodiment, since the insulating substance 1a is fixed to the tip of the measuring probe 1, it is difficult to discharge and the potential of a minute area can be measured without contact. Moreover, since the configuration of the measurement probe 1 is very simple, it is suitable for downsizing.

【0016】図3は本発明の第2実施例を示す。この第
2実施例は、上記第1実施例において、電気素子3とし
てスイッチ6及び抵抗素子8を用いて電荷測定手段5と
して電圧計9を用いたものである。測定プローブ1はス
イッチ6及び抵抗素子8を介して接地点4に接続され、
電圧計9は抵抗素子8に並列に接続される。
FIG. 3 shows a second embodiment of the present invention. In the second embodiment, a switch 6 and a resistance element 8 are used as the electric element 3 and a voltmeter 9 is used as the charge measuring means 5 in the first embodiment. The measurement probe 1 is connected to the ground point 4 via the switch 6 and the resistance element 8,
The voltmeter 9 is connected in parallel with the resistance element 8.

【0017】スイッチ6をオンさせた際には電位測定面
2から絶縁性物質1a、測定プローブ1、スイッチ6、
抵抗素子8を介して接地点に電荷が流れ、抵抗素子8の
両端間の電圧が電圧計9により測定されて積分されるこ
とで、電気素子3を出入りする電荷量Qが検出されて電
位測定面2の電位Vが測定される。この第2実施例で
は、第1実施例と同様に微小な領域の電位を非接触で測
定することができ、測定プローブ1の構成が非常にシン
プルで小型化に適している。
When the switch 6 is turned on, the insulating substance 1a, the measuring probe 1, the switch 6,
Electric charges flow to the ground point through the resistance element 8, and the voltage across the resistance element 8 is measured by the voltmeter 9 and integrated, whereby the charge amount Q flowing in and out of the electric element 3 is detected and the potential is measured. The potential V on surface 2 is measured. In the second embodiment, as in the first embodiment, it is possible to measure the electric potential in a minute area in a non-contact manner, and the configuration of the measuring probe 1 is very simple and suitable for miniaturization.

【0018】上記第1実施例及び第2実施例では、測定
プローブ1の先端部に絶縁性物質1aを固着している
が、この絶縁性物質1aは電位測定面2の電位が低い場
合や、低解像度の電位測定でよくて測定プローブ1を電
位測定面2からある程度離せる場合には無くてもよい。
しかし、高解像度で電位測定を行う場合には、測定プロ
ーブ1を電位測定面2にかなり近接させる必要があり、
絶縁性物質1aを測定プローブ1の先端部に固着するこ
とで、放電を回避して電位測定を行うことができるとい
う効果が得られる。
In the first and second embodiments described above, the insulating substance 1a is fixed to the tip of the measuring probe 1. However, when the insulating substance 1a has a low potential on the potential measuring surface 2, It is not necessary when the measurement probe 1 can be separated from the potential measurement surface 2 to some extent because low-resolution potential measurement is sufficient.
However, in order to measure the electric potential with high resolution, it is necessary to bring the measuring probe 1 close to the electric potential measuring surface 2,
By fixing the insulating substance 1a to the tip portion of the measurement probe 1, it is possible to obtain the effect that the electric potential can be measured while avoiding the discharge.

【0019】図4は本発明の第3実施例を示す。測定プ
ローブ11は、電位測定面12に接触して配置され、か
つ、電位測定面12側の先端部に樹脂、セラミック等の
絶縁性物質11aが固着される。また、測定プローブ1
1はスイッチ素子、抵抗素子、コンデンサ等から構成さ
れる電気素子13を介して定電位源14に接続される。
電気素子13は電荷測定手段15が接続され、電気素子
13を通過する電荷が電荷測定手段15により測定され
る。ここに、測定プローブ11と電位測定面12との間
には絶縁性物質11aが介在しているので、絶縁性物質
11aが一種のコンデンサを形成しており、その容量C
は絶縁性物質11aの材料、厚み、面積などで決まる。
FIG. 4 shows a third embodiment of the present invention. The measurement probe 11 is arranged in contact with the potential measuring surface 12, and an insulating material 11a such as resin or ceramic is fixed to the tip end portion on the potential measuring surface 12 side. Also, the measurement probe 1
1 is connected to a constant potential source 14 via an electric element 13 composed of a switch element, a resistance element, a capacitor and the like.
A charge measuring means 15 is connected to the electric element 13, and the electric charge passing through the electric element 13 is measured by the charge measuring means 15. Here, since the insulating substance 11a is interposed between the measuring probe 11 and the potential measuring surface 12, the insulating substance 11a forms a kind of capacitor and its capacitance C
Is determined by the material, thickness, area, etc. of the insulating substance 11a.

【0020】次に、この第3実施例の動作を説明する。
測定プローブ11を接地電位の物体に接触させた後に、
図4に示すように電位測定面12に測定プローブ11を
接触させると、絶縁性物質11aの静電容量や電位測定
面12の電位Vなどによって決まる電荷Qが定電位源1
4から電気素子13及び測定プローブ11、絶縁性物質
11aを通して電位測定面12に対して流入し又は流出
する。電荷測定手段15は電気素子3を出入りする電荷
量Qを検出することによって電位測定面12の電位Vを
測定する。
Next, the operation of the third embodiment will be described.
After bringing the measurement probe 11 into contact with an object of ground potential,
When the measuring probe 11 is brought into contact with the potential measuring surface 12 as shown in FIG. 4, the electric charge Q determined by the capacitance of the insulating substance 11a and the potential V of the potential measuring surface 12 is supplied to the constant potential source 1.
4 flows into or out of the electric potential measuring surface 12 through the electric element 13, the measuring probe 11, and the insulating material 11a. The electric charge measuring means 15 measures the electric potential V of the electric potential measuring surface 12 by detecting the electric charge amount Q flowing in and out of the electric element 3.

【0021】図5はこの第3実施例の具体的な構成を示
す。電気素子13はスイッチ16及びコンデンサ17が
用いられ、電荷測定手段15はスイッチ18及び電流計
19が用いられる。測定プローブ11はスイッチ16及
びコンデンサ17を介して定電位源14を構成する接地
点に接続され、電流計19がスイッチ18を介してコン
デンサ17と並列に接続される。
FIG. 5 shows a concrete structure of the third embodiment. A switch 16 and a capacitor 17 are used as the electric element 13, and a switch 18 and an ammeter 19 are used as the charge measuring means 15. The measurement probe 11 is connected via a switch 16 and a capacitor 17 to a ground point forming the constant potential source 14, and an ammeter 19 is connected in parallel with the capacitor 17 via a switch 18.

【0022】スイッチ16をオンさせてスイッチ18を
オフさせた際には電位測定面12から絶縁性物質11
a、測定プローブ11、スイッチ16、コンデンサ17
を介して接地点に電荷が流れ、この電荷は絶縁性物質1
1a及びコンデンサ17の静電容量、電位測定面12の
電位に応じた電荷となる。次に、スイッチ16をオフさ
せてスイッチ18をオンさせると、コンデンサ17がス
イッチ18及び電流計19を通して放電してその放電電
流が電流計19により測定されて積分されることで、電
気素子13を出入りする電荷量Qが検出されて電位測定
面12の電位Vが測定される。
When the switch 16 is turned on and the switch 18 is turned off, the insulating material 11 is removed from the potential measuring surface 12.
a, measuring probe 11, switch 16, condenser 17
An electric charge flows to the grounding point via the
1a and the electrostatic capacity of the capacitor 17, and the electric charge according to the electric potential of the electric potential measuring surface 12. Next, when the switch 16 is turned off and the switch 18 is turned on, the capacitor 17 discharges through the switch 18 and the ammeter 19, and the discharge current is measured by the ammeter 19 and integrated, whereby the electric element 13 is discharged. The amount Q of electric charges flowing in and out is detected and the electric potential V of the electric potential measuring surface 12 is measured.

【0023】この第3実施例では、測定プローブ11を
絶縁性物質11aを介して電位測定面12に接触させて
電位測定を行うので、微小な領域の電位を測定すること
ができる。また、測定プローブ11の構成が非常にシン
プルで小型化に適していると共に絶縁性物質11aと電
位測定面12との間の微小なギャップの制御あるいは測
定の必要が無くなる。
In the third embodiment, since the measuring probe 11 is brought into contact with the potential measuring surface 12 via the insulating substance 11a to measure the potential, it is possible to measure the potential in a minute area. Further, the configuration of the measurement probe 11 is very simple and suitable for miniaturization, and it is not necessary to control or measure a minute gap between the insulating substance 11a and the potential measurement surface 12.

【0024】図6は本発明の第4実施例を示す。この第
4実施例では、上記第3実施例において、定電位源14
として直流電源20が用いられて測定プローブ11がス
イッチ16及びコンデンサ17を介して直流電源20に
接続され、電荷測定手段5としてスイッチ21及び電圧
計22が用いられて電圧計22がスイッチ21を介して
コンデンサ17に並列に接続される。
FIG. 6 shows a fourth embodiment of the present invention. In the fourth embodiment, the constant potential source 14 is used in the third embodiment.
A DC probe 20 is used as the measuring probe 11 and the measuring probe 11 is connected to the DC probe 20 via the switch 16 and the capacitor 17. A switch 21 and a voltmeter 22 are used as the charge measuring means 5, and the voltmeter 22 is connected via the switch 21. Connected in parallel to the capacitor 17.

【0025】スイッチ16をオンさせてスイッチ21を
オフさせた際には直流電源20から絶縁性物質11a、
測定プローブ11、スイッチ16、コンデンサ17を介
して電位測定面12に電荷が流れてコンデンサ17が充
電され、この電荷は絶縁性物質11a及びコンデンサ1
7の静電容量、電位測定面12の電位、直流電源21の
電圧に応じた電荷となる。次に、スイッチ16をオフさ
せてスイッチ18をオンさせると、コンデンサ17の両
端間の電圧がスイッチ21を介して電圧計22により測
定されて積分されることで、電気素子13を出入りする
電荷量Qが検出されて電位測定面12の電位Vが測定さ
れる。
When the switch 16 is turned on and the switch 21 is turned off, the insulating material 11a from the DC power source 20
An electric charge flows through the potential measuring surface 12 through the measuring probe 11, the switch 16 and the capacitor 17 to charge the capacitor 17, and this electric charge is applied to the insulating substance 11a and the capacitor 1.
The electric charge is in accordance with the capacitance of No. 7, the potential of the potential measurement surface 12, and the voltage of the DC power supply 21. Next, when the switch 16 is turned off and the switch 18 is turned on, the voltage across the capacitor 17 is measured by the voltmeter 22 via the switch 21 and integrated, so that the amount of charge flowing in and out of the electric element 13 is increased. Q is detected and the potential V of the potential measuring surface 12 is measured.

【0026】この第4実施例では、第3実施例と同様に
微小な領域の電位を測定することができ、測定プローブ
11の構成が非常にシンプルで小型化に適していると共
に絶縁性物質11aと電位測定面12との間の微小なギ
ャップの制御あるいは測定の必要が無くなる。
In the fourth embodiment, as in the third embodiment, it is possible to measure the electric potential in a minute area, and the structure of the measuring probe 11 is very simple and suitable for miniaturization, and the insulating material 11a is used. It becomes unnecessary to control or measure a minute gap between the potential measuring surface 12 and the potential measuring surface 12.

【0027】上記第3実施例及び第4実施例では、絶縁
性物質11aの材料は特に強誘電体などの誘電率の大き
な物質を用いれば、放電しにくいだけでなく大きな出力
を得ることができ、測定精度が向上する。その理由は、
絶縁性物質11aの材料として誘電率の大きな物質を用
いた場合には測定プローブ11と電位測定面12との間
の絶縁性物質11aにより形成されるコンデンサの静電
容量が大きくなり、多くの電荷が移動するので、放電し
にくいだけでなく大きな出力を得ることができて電位測
定を高精度で行えるからである。
In the third and fourth embodiments described above, if a material having a large dielectric constant such as a ferroelectric material is used as the material of the insulating material 11a, it is possible to obtain a large output in addition to being difficult to discharge. , The measurement accuracy is improved. The reason is,
When a material having a large dielectric constant is used as the material of the insulating material 11a, the capacitance of the capacitor formed by the insulating material 11a between the measurement probe 11 and the potential measurement surface 12 becomes large, and a large amount of charge is generated. This is because not only is it difficult to discharge, but also a large output can be obtained and potential measurement can be performed with high accuracy.

【0028】なお、本発明は、上記実施例に限定される
ものではなく、電気素子3,13としてコンデンサと抵
抗素子を用いるようにしたり、コンデンサ17の充電時
の電流、電圧を測定するようにしたりすることができ
る。
The present invention is not limited to the above embodiment, but capacitors and resistance elements may be used as the electric elements 3 and 13, and the current and voltage at the time of charging the capacitor 17 may be measured. You can

【0029】[0029]

【発明の効果】以上のように請求項1記載の発明によれ
ば、電位測定面に対して微小な間隔を隔てて位置し、か
つ、少なくともこの電位測定面に対向する部分に絶縁性
物質が付いた導電性の測定プローブと、この測定プロー
ブと定電位源との間に接続される電気素子と、この電気
素子を出入りする電荷を測定する電荷測定手段とを備え
たので、放電しにくく、微小な領域の電位を非接触で測
定することができる。また、測定プローブの構成が非常
にシンプルであるので、小型化に適している。
As described above, according to the first aspect of the present invention, the insulating substance is located at a minute distance from the potential measuring surface and at least the portion facing the potential measuring surface is covered with the insulating substance. Since it is provided with a conductive measuring probe having an electric element connected between the measuring probe and a constant potential source, and a charge measuring means for measuring electric charge going in and out of the electric element, it is difficult to discharge, The potential of a minute area can be measured without contact. Moreover, the configuration of the measurement probe is very simple, which is suitable for downsizing.

【0030】請求項2記載の発明によれば、電位測定面
に接触し、かつ、少なくともこの電位測定面に対向する
部分に絶縁性物質が付いた導電性の測定プローブと、こ
の測定プローブと定電位源との間に接続される電気素子
と、この電気素子を出入りする電荷を測定する電荷測定
手段とを備えたので、微小な領域の電位を測定すること
ができ、測定プローブの構成が非常にシンプルで小型化
に適していると共に絶縁性物質と電位測定面との間の微
小なギャップの制御あるいは測定の必要が無くなる。
According to the second aspect of the present invention, a conductive measuring probe which is in contact with the potential measuring surface and at least a portion facing the potential measuring surface is provided with an insulating substance, and the measuring probe is fixed. Since the electric element connected between the electric source and the electric potential source and the electric charge measuring means for measuring the electric charge flowing in and out of the electric element are provided, the electric potential in a minute area can be measured, and the structure of the measuring probe is very high. It is simple and suitable for miniaturization, and it eliminates the need to control or measure the minute gap between the insulating material and the potential measurement surface.

【0031】請求項3記載の発明によれば、請求項1ま
たは2記載の電位測定装置において、前記測定プローブ
の電位測定面に対向する部分に絶縁性物質として強誘電
体を固着したので、放電しにくいと共に大きな出力を得
ることができ、測定精度が向上する。
According to the third aspect of the invention, in the potential measuring device according to the first or second aspect, since the ferroelectric substance is fixed as an insulating substance to the portion of the measuring probe facing the potential measuring surface, the discharge is performed. It is difficult to do so and a large output can be obtained, and the measurement accuracy is improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例を示すブロック図である。FIG. 1 is a block diagram showing a first embodiment of the present invention.

【図2】同第1実施例を具体的に示す回路図である。FIG. 2 is a circuit diagram specifically showing the first embodiment.

【図3】本発明の第2実施例を示す回路図である。FIG. 3 is a circuit diagram showing a second embodiment of the present invention.

【図4】本発明の第3実施例を示すブロック図である。FIG. 4 is a block diagram showing a third embodiment of the present invention.

【図5】同第3実施例を具体的に示す回路図である。FIG. 5 is a circuit diagram specifically showing the third embodiment.

【図6】本発明の第4実施例を示す回路図である。FIG. 6 is a circuit diagram showing a fourth embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1,11 測定プローブ 1a,11a 絶縁性物質 2,12 電位測定面 3,13 電気素子 4,14,20 定電位源 5,15 電荷測定手段 6,16,18,21 スイッチ 7,19 電流計 8 抵抗素子 9,22 電圧計 17 コンデンサ 1,11 Measuring probe 1a, 11a Insulating material 2,12 Potential measuring surface 3,13 Electric element 4,14,20 Constant potential source 5,15 Charge measuring means 6,16,18,21 Switch 7,19 Ammeter 8 Resistance element 9,22 Voltmeter 17 Capacitor

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】電位測定面に対して微小な間隔を隔てて位
置し、かつ、少なくともこの電位測定面に対向する部分
に絶縁性物質が付いた導電性の測定プローブと、この測
定プローブと定電位源との間に接続される電気素子と、
この電気素子を出入りする電荷を測定する電荷測定手段
とを備えたことを特徴とする電位測定装置。
1. A conductive measuring probe which is located at a minute distance from the potential measuring surface and has an insulating substance at least at a portion facing the potential measuring surface, and the measuring probe. An electrical element connected between the potential source and
An electric potential measuring device comprising: an electric charge measuring means for measuring an electric charge flowing in and out of the electric element.
【請求項2】電位測定面に接触し、かつ、少なくともこ
の電位測定面に対向する部分に絶縁性物質が付いた導電
性の測定プローブと、この測定プローブと定電位源との
間に接続される電気素子と、この電気素子を出入りする
電荷を測定する電荷測定手段とを備えたことを特徴とす
る電位測定装置。
2. A conductive measuring probe which is in contact with the potential measuring surface and has an insulating substance at least at a portion facing the potential measuring surface, and is connected between the measuring probe and a constant potential source. An electric potential measuring device, comprising: an electric element, and an electric charge measuring means for measuring an electric charge flowing in and out of the electric element.
【請求項3】請求項1または2記載の電位測定装置にお
いて、前記測定プローブの電位測定面に対向する部分に
絶縁性物質として強誘電体を固着したことを特徴とする
電位測定装置。
3. A potential measuring device according to claim 1, wherein a ferroelectric substance is fixed as an insulating substance to a portion of the measuring probe facing the potential measuring surface.
JP5852593A 1993-03-18 1993-03-18 Potential measuring device Pending JPH06273465A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5852593A JPH06273465A (en) 1993-03-18 1993-03-18 Potential measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5852593A JPH06273465A (en) 1993-03-18 1993-03-18 Potential measuring device

Publications (1)

Publication Number Publication Date
JPH06273465A true JPH06273465A (en) 1994-09-30

Family

ID=13086850

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5852593A Pending JPH06273465A (en) 1993-03-18 1993-03-18 Potential measuring device

Country Status (1)

Country Link
JP (1) JPH06273465A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007132734A (en) * 2005-11-09 2007-05-31 Hitachi Computer Peripherals Co Ltd Non-contact type potential measuring method of rotator, and its device
WO2014155680A1 (en) * 2013-03-29 2014-10-02 東芝三菱電機産業システム株式会社 Voltage measurement device
CN107533091A (en) * 2015-04-28 2018-01-02 阿尔卑斯电气株式会社 Non-contact voltage measurement apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007132734A (en) * 2005-11-09 2007-05-31 Hitachi Computer Peripherals Co Ltd Non-contact type potential measuring method of rotator, and its device
WO2014155680A1 (en) * 2013-03-29 2014-10-02 東芝三菱電機産業システム株式会社 Voltage measurement device
CN105051549A (en) * 2013-03-29 2015-11-11 东芝三菱电机产业系统株式会社 Voltage measurement device
JPWO2014155680A1 (en) * 2013-03-29 2017-02-16 東芝三菱電機産業システム株式会社 Voltage measuring device
CN107533091A (en) * 2015-04-28 2018-01-02 阿尔卑斯电气株式会社 Non-contact voltage measurement apparatus
CN107533091B (en) * 2015-04-28 2019-12-31 阿尔卑斯阿尔派株式会社 Non-contact voltage measuring device

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