JPH06272015A - Production of aluminum sheet for film laminating - Google Patents

Production of aluminum sheet for film laminating

Info

Publication number
JPH06272015A
JPH06272015A JP8121393A JP8121393A JPH06272015A JP H06272015 A JPH06272015 A JP H06272015A JP 8121393 A JP8121393 A JP 8121393A JP 8121393 A JP8121393 A JP 8121393A JP H06272015 A JPH06272015 A JP H06272015A
Authority
JP
Japan
Prior art keywords
film
aluminum plate
oxide film
annealing
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8121393A
Other languages
Japanese (ja)
Inventor
Masahiro Kurata
倉田正裕
Sadao Shiraishi
白石貞雄
Hiroyuki Matsuura
松浦宏幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sky Aluminium Co Ltd
Original Assignee
Sky Aluminium Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sky Aluminium Co Ltd filed Critical Sky Aluminium Co Ltd
Priority to JP8121393A priority Critical patent/JPH06272015A/en
Publication of JPH06272015A publication Critical patent/JPH06272015A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain an aluminum sheet for film laminating improved in the adhesion of a film thereto, excellent in formability and suitable for a vessel, capacitor case material, rice cooking jar or the like. CONSTITUTION:The surface of an aluminum sheet is cleaned by mineral acid or organic acid or their mixed acid or an alkali soln. or water of 40 to 100 deg.C and is thereafter annealed in the temp. range of 250 to 650 deg.C for >=2hr in the air to produce the aluminum sheet for film laminating in which the thickness of an oxidized film on the surface is >=20Angstrom .

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は容器、コンデンサ−ケ−
ス材、炊飯ジャ−内釜等の深絞り成型を伴う用途に適す
るフィルム積層用アルミニウム板に関する。なお、本発
明においては「アルミニウム」とは純アルミニウムなら
びにアルミニウム合金を意味し、また「アルミニウム
板」とは純アルミニウム板ならびにアルミニウム合金板
を意味するものである。
BACKGROUND OF THE INVENTION The present invention relates to a container, a condenser case.
TECHNICAL FIELD The present invention relates to an aluminum plate for film lamination suitable for applications involving deep drawing such as stainless steel, rice cooker inner pot and the like. In the present invention, "aluminum" means pure aluminum and an aluminum alloy, and "aluminum plate" means a pure aluminum plate and an aluminum alloy plate.

【0002】[0002]

【従来の技術】従来、容器、コンデンサ−ケ−ス材、炊
飯ジャ−内釜等に用いられるフィルム積層アルミニウム
板の製造は、一般に鋳造、圧延により作成したアルミニ
ウム板を、深絞り成形性を向上させるために炉内で焼鈍
して軟化処理を施してO材とし、その後樹脂フィルムを
積層することにより行われている。このように酸素を含
む雰囲気中で焼鈍することによりアルミニウム板表面に
酸化皮膜が生成されるが、この酸化皮膜はフィルムとの
密着性を向上させる優れた性能を発揮するため、フィル
ム積層用アルミニウム板としては酸化皮膜の有無、状態
等の良否は重要な要素となっている。
2. Description of the Related Art Conventionally, in the production of film-laminated aluminum sheets used for containers, condenser casing materials, rice cooker inner pots, etc., aluminum sheets produced by casting and rolling are generally improved in deep drawing formability. For this purpose, it is annealed in a furnace to be softened to obtain an O material, and then a resin film is laminated. By annealing in an atmosphere containing oxygen in this way, an oxide film is formed on the surface of the aluminum plate. Since this oxide film exhibits excellent performance of improving the adhesion to the film, the aluminum plate for film lamination As such, the presence or absence of an oxide film and the quality of the condition are important factors.

【0003】[0003]

【発明が解決しようとする問題点】従来は上記の軟化処
理の焼鈍において圧延板をそのまま炉内で焼鈍している
ために圧延板表面に付着している圧延油・金属粉等の汚
れが焼鈍中に焼き付き、それが外観不良や密着性不良等
の不具合を生じる場合が多かった。この圧延油や金属粉
等の焼き付けを除去するために、焼鈍後に酸洗浄・アル
カリ洗浄・湯洗等の洗浄処理を行うことが行われるが、
焼鈍中に生成した酸化皮膜までも除去されてしまい、そ
の結果フィルムとの密着性が低下するという問題があっ
た。この失われた酸化皮膜を補うために、洗浄後にさら
に機械的粗面化処理、陽極酸化処理、水和酸化処理、電
解処理等を行う場合があるが、工程が増えまたコストが
増加するという問題があった。また、圧延後に酸化皮膜
を設けた後に焼鈍を施すことも行われており、例えば特
開昭63−143290号公報記載の発明は、冷間圧延
板を機械的に粗面化後、陽極酸化または水和酸化処理で
皮膜量≦50mg/dm2 とする処理を施し、その後、
加熱調質した表面に合成樹脂皮膜を形成するものであ
る。また特開昭63−126728号公報記載の発明
は、アルミニウム板表面に水和酸化皮膜層を設け、その
表面に熱可塑性フッ素樹脂層を形成後、4フッ化エチレ
ン樹脂フィルムを形成させるものである。このようなア
ルミニウム板を圧延した後に陽極酸化等の処理で表面に
酸化皮膜等を設け、その後加熱処理してアルミニウム板
を調質し、その後に合成樹脂皮膜を形成するものでは圧
延後の酸化皮膜等を設ける処理が複雑であり、また処理
時間が長いためにコストが増加するという問題があっ
た。
[Problems to be Solved by the Invention] Conventionally, in the above-mentioned softening annealing, since the rolled plate is annealed in the furnace as it is, stains such as rolling oil and metal powder adhered to the surface of the rolled plate are annealed. In many cases, seizure occurred, which resulted in defects such as poor appearance and poor adhesion. In order to remove the baking of the rolling oil, metal powder, etc., cleaning treatment such as acid cleaning, alkali cleaning, and hot water cleaning is performed after annealing.
Even the oxide film formed during annealing is removed, and as a result, there is a problem that the adhesion to the film is reduced. In order to make up for this lost oxide film, mechanical surface roughening treatment, anodizing treatment, hydration oxidation treatment, electrolytic treatment, etc. may be carried out after cleaning, but the number of steps increases and the cost increases. was there. Further, annealing is also performed after providing an oxide film after rolling, and for example, the invention described in JP-A-63-143290 discloses that a cold-rolled sheet is mechanically roughened and then anodized or A hydration oxidization treatment was applied to make the coating amount ≦ 50 mg / dm 2, and then
A synthetic resin film is formed on the heat-conditioned surface. In the invention described in JP-A-63-126728, a hydrated oxide film layer is provided on the surface of an aluminum plate, a thermoplastic fluororesin layer is formed on the surface, and then a tetrafluoroethylene resin film is formed. . After rolling such an aluminum plate, an oxide film or the like is provided on the surface by treatment such as anodic oxidation, then heat treatment is performed to heat the aluminum plate, and then a synthetic resin film is formed. There is a problem in that the process of providing the above is complicated, and the processing time is long, so that the cost is increased.

【0004】本発明は、焼鈍前後にアルミニウム板表面
に酸化皮膜を設ける等の処理を必要とせず、O材を作製
するうえで必須の工程である焼鈍工程においてアルミニ
ウム板表面に形成される酸化皮膜を有効に利用すること
により、外観不良が無く、フィルムとの密着性に優れた
アルミニウム板を低コストで得ることを目的としたもの
である。
The present invention does not require a treatment such as providing an oxide film on the surface of the aluminum plate before and after annealing, and an oxide film formed on the surface of the aluminum plate in the annealing step which is an essential step for producing the O material. It is intended to obtain an aluminum plate which has no poor appearance and is excellent in adhesiveness with a film at a low cost by effectively utilizing.

【0005】[0005]

【問題を解決するための手段】発明者らは上記問題を解
決するために素材の成分組成、機械的ないし表面特性な
らびに製造方法について鋭意研究努力の結果、本発明を
為すに至った。すなわち本発明は、
[Means for Solving the Problems] In order to solve the above problems, the inventors have made earnest research efforts on the component composition of the material, the mechanical or surface characteristics, and the manufacturing method, and as a result, have accomplished the present invention. That is, the present invention is

【0006】アルミニウム板の表面を洗浄し、その後大
気中で250〜650℃の温度範囲で2時間以上焼鈍
し、表面の酸化皮膜の厚さが20オングストローム以上
であることを特徴とするフィルム積層用アルミニウム板
の製造方法であり、
For laminating films, the surface of the aluminum plate is washed and then annealed in the temperature range of 250 to 650 ° C. for 2 hours or more, and the thickness of the oxide film on the surface is 20 Å or more. A method of manufacturing an aluminum plate,

【0007】アルミニウム板の表面を鉱酸または有機酸
またはその混酸で洗浄し、その後大気中で250〜65
0℃の温度範囲で2時間以上焼鈍し、表面の酸化皮膜の
厚さが20オングストローム以上であることを特徴とす
るフィルム積層用アルミニウム板の製造方法であり、
The surface of the aluminum plate is washed with a mineral acid, an organic acid or a mixed acid thereof, and then 250 to 65 in air.
A method for producing an aluminum plate for film lamination, which comprises annealing at a temperature range of 0 ° C. for 2 hours or more, and a thickness of an oxide film on the surface is 20 Å or more,

【0008】アルミニウム板の表面をアルカリ性溶液で
洗浄し、その後大気中で250〜650℃の温度範囲で
2時間以上焼鈍し、表面の酸化皮膜の厚さが20オング
ストローム以上であることを特徴とするフィルム積層用
アルミニウム板の製造方法であり、
The surface of the aluminum plate is washed with an alkaline solution and then annealed in the temperature range of 250 to 650 ° C. for 2 hours or more, and the thickness of the oxide film on the surface is 20 angstroms or more. A method for manufacturing an aluminum plate for film lamination,

【0009】アルミニウム板の表面を40〜100℃の
水で洗浄し、その後大気中で250〜650℃の温度範
囲で2時間以上焼鈍し、表面の酸化皮膜の厚さが20オ
ングストローム以上であることを特徴とするフィルム積
層用アルミニウム板の製造方法である。
The surface of the aluminum plate is washed with water at 40 to 100 ° C., then annealed in the temperature range of 250 to 650 ° C. for 2 hours or more, and the thickness of the oxide film on the surface is 20 angstroms or more. And a method for producing an aluminum plate for film lamination.

【0010】以上のように、本発明は焼鈍に先だってあ
らかじめアルミニウム板を洗浄し表面に付着している圧
延油、金属粉等の汚れを除去し、その後焼鈍することに
よりアルミニウム板全面に清浄で均一な酸化皮膜を形成
させる製造方法である。
As described above, according to the present invention, prior to annealing, the aluminum plate is washed in advance to remove stains such as rolling oil and metal powder adhering to the surface thereof, and then annealed, so that the entire surface of the aluminum plate is clean and uniform. It is a manufacturing method for forming a transparent oxide film.

【0011】洗浄方法としては、1)酸性水溶液による
洗浄、2)アルカリ性水溶液による洗浄、3)湯洗によ
る洗浄が上げられる。各々について以下順次説明する。
The cleaning methods include 1) cleaning with an acidic aqueous solution, 2) cleaning with an alkaline aqueous solution, and 3) cleaning with hot water. Each of them will be described below in sequence.

【0012】1)酸性水溶液による洗浄としては、硫
酸、リン酸、硝酸、塩酸等の鉱酸、またはスルホン酸等
の有機酸の内の1種またはその混酸の水溶液中に浸漬洗
浄またはスプレ−洗浄した後、水洗する。酸濃度、浴
温、時間はライン速度、汚れの程度等から適宜選択すれ
ば良いが、酸濃度としては1〜60wt%程度、浴温と
しては常温〜90℃程度、洗浄時間としては1秒〜数分
程度が良い。特に生産性、装置のライニング等を考慮す
ると、濃度=2〜30wt%、浴温=30〜80℃、時
間は2〜30秒程度が好ましい。また、さらに洗浄力を
上げるために、上記酸性水溶液中にHLBが約8〜14
程度のポリオキシエチレンアルキルフェニルエ−テルの
ような界面活性剤、EDTAのようなキレ−ト剤を添加
しても良い。
1) As washing with an acidic aqueous solution, dipping washing or spray washing with an aqueous solution of one of mineral acids such as sulfuric acid, phosphoric acid, nitric acid, hydrochloric acid, etc., or organic acids such as sulfonic acid, or a mixed acid thereof. After that, wash with water. The acid concentration, bath temperature, and time may be appropriately selected from the line speed, the degree of contamination, etc., but the acid concentration is about 1 to 60 wt%, the bath temperature is room temperature to 90 ° C, and the cleaning time is 1 second to A few minutes is good. Considering productivity, lining of the apparatus and the like, it is preferable that the concentration is 2 to 30 wt%, the bath temperature is 30 to 80 ° C., and the time is about 2 to 30 seconds. In addition, in order to further improve the detergency, HLB in the above acidic aqueous solution is about 8-14.
A surfactant such as polyoxyethylene alkylphenyl ether and a chelating agent such as EDTA may be added to a certain extent.

【0013】2)アルカリ性溶液による洗浄としては、
苛性ソ−ダ、水酸化カリウム等のアルカリ金属水酸化
物、リン酸3ナトリウム等のリン酸塩、炭酸ナトリウム
等の炭酸塩等の内の1種または2種以上の混合物の水溶
液中に浸漬洗浄またはスプレ−洗浄した後、水洗する。
アルカリ濃度、浴温、時間はライン速度、汚れの程度等
から適宜選択すれば良いが、アルカリ濃度としては1〜
50wt%程度、浴温としては常温〜90℃程度、洗浄
時間としては1秒〜数分程度で良い。特に生産性、装置
のライニング等を考慮すると、濃度=2〜30wt%、
浴温=30〜80℃、時間は2〜30秒程度が好まし
い。さらに洗浄力を上げるために、上記アルカリ性水溶
液中にHLBが約8〜14程度のポリオキシエチレンア
ルキルエ−テルのような界面活性剤、グルコン酸ナトリ
ウム等のキレ−ト剤を添加しても良い。また、アルカリ
性水溶液で洗浄した後さらに、1)に記載したような酸
性水溶液による洗浄をおこなっても良い。
2) For cleaning with an alkaline solution,
Immersion washing in an aqueous solution of one or a mixture of caustic soda, alkali metal hydroxide such as potassium hydroxide, phosphate such as trisodium phosphate, carbonate such as sodium carbonate Alternatively, after spray-washing, it is washed with water.
The alkali concentration, bath temperature, and time may be appropriately selected depending on the line speed, the degree of contamination, etc.
The bath temperature may be about 50 wt%, the room temperature to about 90 ° C., and the cleaning time may be about 1 second to several minutes. Especially considering productivity, lining of equipment, etc., concentration = 2 to 30 wt%,
The bath temperature is preferably 30 to 80 ° C. and the time is preferably 2 to 30 seconds. In order to further improve the detergency, a surfactant such as polyoxyethylene alkyl ether having an HLB of about 8 to 14 and a chelating agent such as sodium gluconate may be added to the alkaline aqueous solution. . After washing with an alkaline aqueous solution, washing with an acidic aqueous solution as described in 1) may be further performed.

【0014】3)湯洗による洗浄としては、水道水、工
業用水、軟水、純水等で浸漬洗浄またはスプレ−洗浄す
る。水温、洗浄時間はライン速度、汚れの程度等から適
宜選択すれば良いが、水温としては40〜90℃程度、
洗浄時間としては1秒〜数分程度で良い。生産性、装置
のライニング等を考慮すると、浴温=50〜80℃、時
間は2〜60秒程度が好ましい。さらに洗浄力を上げる
ために、アルキルベンゼンスルホン酸ナトリウムのよう
な界面活性剤、EDTA・2Na等のキレ−ト剤を添加
しても良い。ただし、この場合は湯洗後、これらを含ま
ない水または湯で洗浄することが好ましい。
3) As the washing with hot water, immersion washing or spray washing with tap water, industrial water, soft water, pure water or the like is performed. The water temperature and the washing time may be appropriately selected from the line speed, the degree of dirt, etc., but the water temperature is about 40 to 90 ° C.
The cleaning time may be about 1 second to several minutes. Considering the productivity, the lining of the apparatus, etc., the bath temperature = 50 to 80 ° C., and the time is preferably 2 to 60 seconds. In order to further improve the detergency, a surfactant such as sodium alkylbenzenesulfonate and a chelating agent such as EDTA · 2Na may be added. However, in this case, it is preferable to wash with hot water or hot water containing no water after washing with hot water.

【0015】洗浄後の焼鈍は、焼鈍温度は250〜65
0℃、好ましくは350〜550℃程度が良く、また焼
鈍時間は積層するフィルムとの十分な密着性を満たす程
度に酸化皮膜が生成されれば良く、適宜選択すれば良い
が2〜30時間の間が好ましい。
The annealing after cleaning has an annealing temperature of 250 to 65.
0 ° C., preferably about 350 to 550 ° C. is good, and the annealing time is sufficient if an oxide film is formed to the extent that sufficient adhesion with the film to be laminated is satisfied. Is preferred.

【0016】積層するフィルムとしては、ポリエチレン
テレフタレ−ト等のポリエステルフィルム、ポリアクリ
ル酸、メタクリル酸等のアクリル樹脂フィルム、ナイロ
ン等のポリアミド・ポリアミノフィルム、4フッ化エチ
レン等のフッソ樹脂フィルム、ビスフェノ−ルA型等の
エポキシ樹脂フィルム等が上げられる。また、ウレタン
系、アクリレ−ト系、エポキシ系、オレフィン系等の糊
を塗布してあっても良い。
As the film to be laminated, a polyester film such as polyethylene terephthalate, an acrylic resin film such as polyacrylic acid and methacrylic acid, a polyamide / polyamino film such as nylon, a fluorine resin film such as ethylene tetrafluoride, and a bispheno -Examples include epoxy resin films such as type A resin. Also, a urethane-based, acrylate-based, epoxy-based or olefin-based glue may be applied.

【0017】積層フィルムの熱圧着条件は、同一材質で
あってもフィルムの特質により大きく変わるので特定で
きないが、一般的には圧力=1〜10kg/cm2、温
度=50〜350℃、時間=1〜20分程度が良い。
The thermocompression bonding conditions of the laminated film cannot be specified because they vary greatly depending on the characteristics of the film even if they are made of the same material, but generally pressure = 1 to 10 kg / cm @ 2, temperature = 50 to 350.degree. C., time = 1. About 20 minutes is good.

【0018】[0018]

【作用】アルミニウム板を酸素を含む雰囲気中で焼鈍す
ることにより酸化皮膜がアルミニウム表面に形成され
る。この酸化皮膜の構造は焼鈍温度により変化するが、
250℃以上の高温で焼鈍するとγ−アルミナのような
活性を有する酸化皮膜が生成し、この皮膜は積層された
ポリマ−フィルムの官能基との結合力が高く、したがっ
て高い密着性を発揮する。しかし、アルミニウム板表面
に圧延油等が付着している場合には圧延油の焼き付き等
によりポリマ−フィルムとの結合を阻害するだけでな
く、アルミニウム表面への酸素の拡散−酸化皮膜形成そ
のものを阻害し、このため部分的に非常に薄いかあるい
は隙間だらけの酸化皮膜が形成され、密着力が低下す
る。しかも、このアルミニウム板表面の圧延油成分の一
部は600℃を越えても残留するものがあるので通常行
われている焼鈍温度(250〜550℃)程度では除去
できないばかりか、アルミニウム合金系の中には融点が
600℃以下のものも多く、従って事実上焼鈍中に除去
することは不可能である。これに対し、本発明のように
焼鈍に先立ち洗浄して圧延油、金属粉等を除去し、その
後焼鈍を施すことにより、アルミニウム表面への酸素拡
散が阻害されることがなくなり、よって酸化皮膜の形成
が促進され板の全面が均一の酸化皮膜で覆われその結果
高い密着力を得ることができる。
The oxide film is formed on the aluminum surface by annealing the aluminum plate in an atmosphere containing oxygen. The structure of this oxide film changes depending on the annealing temperature,
When annealed at a high temperature of 250 ° C. or higher, an oxide film having an activity such as γ-alumina is formed, and this film has a high bonding strength with the functional groups of the laminated polymer film, and therefore exhibits high adhesion. However, when rolling oil or the like adheres to the surface of the aluminum plate, not only the binding of the rolling oil to the polymer film is hindered due to seizure of the rolling oil but also the diffusion of oxygen to the aluminum surface-the formation of an oxide film itself. However, because of this, an oxide film that is very thin or has gaps is partially formed, and the adhesion is reduced. Moreover, since some of the rolling oil components on the surface of the aluminum plate remain even if the temperature exceeds 600 ° C., it cannot be removed at the annealing temperature (250 to 550 ° C.) that is usually performed, and the aluminum alloy type Many of them have a melting point of 600 ° C. or lower, and therefore, it is practically impossible to remove them during annealing. On the other hand, as in the present invention, cleaning is performed prior to annealing to remove rolling oil, metal powder, and the like, and then annealing is performed so that oxygen diffusion to the aluminum surface is not hindered, and thus the oxide film The formation is promoted and the entire surface of the plate is covered with a uniform oxide film, so that high adhesion can be obtained.

【0019】焼鈍に先立つ洗浄の方法としては上述した
ように酸性水溶液による洗浄、アルカリ性水溶液による
洗浄、温水による洗浄のいずれを用いても良いが、各々
については以下のような特質があり、どの方法を採用す
るかはアルミニウム板の汚れの程度、設備費用等を勘案
して決定すれば良い。
As a cleaning method prior to annealing, any of the cleaning with an acidic aqueous solution, the cleaning with an alkaline aqueous solution and the cleaning with warm water may be used as described above, but each method has the following characteristics, and which method is used. Whether or not to adopt should be decided in consideration of the degree of contamination of the aluminum plate, equipment cost, and the like.

【0020】酸性水溶液による洗浄は、洗浄力は中程度
であるが、アルカリ洗浄と異なりスマットが付きにく
い。但し装置は耐酸性のライニングまたは材料を必要と
し、ミスト飛散に対する処置も必要であり、処理装置設
置費用は割高となる。アルカリ水溶液による洗浄は、洗
浄力が強く、油分をケン化する作用を持つので効率的で
ある。ただしスマットが付き易くこれが接着性に悪影響
を及ぼす場合がある。温水による洗浄は、簡単な設備で
も良く、低コストである。また環境汚染や廃液処理、作
業環境の点でも有利である。ただし洗浄力は3種の洗浄
方法のうちで最も弱い。
The cleaning with an acidic aqueous solution has a moderate cleaning power, but unlike the alkaline cleaning, it hardly causes smut. However, the equipment requires an acid-resistant lining or material, and it is necessary to take measures against mist scattering, which makes the installation cost of the treatment equipment expensive. Cleaning with an alkaline aqueous solution is efficient because it has a strong cleaning power and acts to saponify oil. However, smut tends to adhere, which may adversely affect the adhesiveness. Cleaning with warm water can be performed with simple equipment and is low cost. It is also advantageous in terms of environmental pollution, waste liquid treatment, and working environment. However, the cleaning power is the weakest of the three cleaning methods.

【0021】焼鈍温度は250℃未満では表面の酸化皮
膜の生成が不充分であり、一方650℃を超えるとアル
ミニウム板の融点近傍となるため板の軟化が激しくなり
あるいは部分溶融が始まり、製造上問題となる。従って
焼鈍温度は250〜650℃とする。その範囲内でも特
に酸化物の生成が均一にかつ速やかに進行し、また板の
軟化等の問題の無い350〜550℃の温度範囲が特に
好ましい。また焼鈍時間は積層するフィルムとの十分な
密着性を満たす程度に酸化皮膜が生成されれば良く、適
宜選択すれば良いが2〜30時間の間が好ましい。2時
間未満では一般に酸化物の生成が不充分となり好ましく
なく、また30時間を超えて焼鈍を行っても酸化物の生
成は飽和してしまい、単にエネルギーを消費するのみで
酸化物はそれ以上生成しないため無駄である。従って2
〜30時間が好ましい。なお積層するフィルムの材質に
よりアルミニウム地肌との密着性、酸化皮膜との密着性
が異なり、従って必要とする酸化皮膜厚さは異なる。こ
のため上記温度範囲、時間範囲内で適宜選択することが
望ましい。
When the annealing temperature is less than 250 ° C., the formation of an oxide film on the surface is insufficient. On the other hand, when it exceeds 650 ° C., the temperature is close to the melting point of the aluminum plate, so that the softening of the plate becomes severe or partial melting starts, which causes the manufacturing process It becomes a problem. Therefore, the annealing temperature is set to 250 to 650 ° C. Within this range, the temperature range of 350 to 550 ° C. is particularly preferable, in which the production of oxides progresses uniformly and rapidly and there is no problem such as softening of the plate. The annealing time may be selected as long as an oxide film is formed to the extent that sufficient adhesion with the film to be laminated is satisfied, and may be appropriately selected, but is preferably 2 to 30 hours. If it is less than 2 hours, the formation of oxide is generally insufficient, which is not preferable, and even if the annealing is performed for more than 30 hours, the formation of oxide is saturated and energy is merely consumed, and more oxide is produced. It is useless because it is not done. Therefore 2
-30 hours is preferred. The adhesiveness with the aluminum surface and the adhesiveness with the oxide film differ depending on the material of the film to be laminated, and thus the required oxide film thickness varies. For this reason, it is desirable to select as appropriate within the above temperature range and time range.

【0022】焼鈍条件が高温短時間保持の条件の場合、
CAL(連続焼鈍炉)などを用いることになる。しか
し、本発明の用途である容器、コンデンサーケース材、
炊飯ジャー内釜等においてはフィルム積層用アルミニウ
ム板の板厚は薄いものが多く用いられており、特にコン
デンサーケースにおいては板厚は0.3mmあるいはそ
れ以下と薄く、また合金の種類も合金元素の少ない10
00系が多く、さらに質別も軟質化してO材とすること
が多い。このように合金の種類、質別ともに軟質のもの
でしかも板厚が薄いことから、CAL(連続焼鈍炉)の
ように張力をかけて通板しながら焼鈍する方法では軟化
のための撓み変形、それによる炉内壁との擦り疵あるい
は張力が強すぎることによる板切れなどの問題が発生す
る。本発明においては、焼鈍条件として250〜650
℃で2時間以上とすることによりCAL(連続焼鈍炉)
を用いなくとも良く、通常のバッチ炉により焼鈍を行う
ことができることから、上記のような軟質材をCALで
焼鈍する際の撓み、擦り傷、板切れなどの発生が無く、
従って今後さらに板厚の薄いものが要求された場合でも
なんら問題無く製造することが可能である。
When the annealing condition is a condition of holding at high temperature for a short time,
A CAL (continuous annealing furnace) or the like will be used. However, the container, the capacitor case material, which is the application of the present invention,
In the rice cooker inner pot and the like, a thin aluminum plate for film lamination is often used. Especially in a capacitor case, the plate thickness is as thin as 0.3 mm or less. Less 10
There are many 00 series, and the material is often softened to be an O material. In this way, since the alloys are both soft and soft, and the plate thickness is thin, flexing deformation for softening is caused by the method of annealing while applying tension such as CAL (continuous annealing furnace) while passing through the plate. As a result, problems such as scratches on the inner wall of the furnace or plate breakage due to excessive tension occur. In the present invention, the annealing condition is 250 to 650.
CAL (continuous annealing furnace) by keeping the temperature at ℃ for 2 hours or more
It is not necessary to use, and since it is possible to perform annealing in a normal batch furnace, there is no occurrence of bending, abrasion, plate breakage, etc. when annealing the above soft material by CAL,
Therefore, even if a thinner plate is required in the future, it can be manufactured without any problem.

【0023】[0023]

【実施例】以下、本発明の実施例について説明する。EXAMPLES Examples of the present invention will be described below.

【0024】[0024]

【表1】 [Table 1]

【0025】(実施例1)JIS1100アルミニウム
板を冷間圧延して0.3mmtの板材とし、これを表1
に掲げる条件の酸水溶液により洗浄した後、大気中にて
500℃で8時間焼鈍してO材とした。この時得られた
供試材の酸化皮膜厚さを表1に示す。その後、この板に
厚さ30μmのフッ素系樹脂フィルムを圧力=7kg/
cm2 、温度=300℃、時間=10分の条件で熱圧着
し積層板を作製した。この積層板を総シゴキ率40%で
成型し、直径5mm、高さ11mmの円筒容器とした。
この円筒容器をトリミング後、125℃(沸点)で保持
したパ−クロルエチレン中に15分浸漬し切り口の皮膜
付着状況を観察したところ、いずれも樹脂皮膜の剥離が
無く、良好であった。
(Example 1) A JIS 1100 aluminum plate was cold-rolled into a plate material having a thickness of 0.3 mmt.
After washing with an acid aqueous solution under the conditions listed in (1), it was annealed in the air at 500 ° C. for 8 hours to obtain an O material. Table 1 shows the oxide film thickness of the test material obtained at this time. After that, a fluororesin film having a thickness of 30 μm is applied to this plate under pressure = 7 kg /
A laminate was prepared by thermocompression bonding under the conditions of cm2, temperature = 300 ° C. and time = 10 minutes. This laminated plate was molded at a total squeeze rate of 40% to obtain a cylindrical container having a diameter of 5 mm and a height of 11 mm.
After this cylindrical container was trimmed, it was immersed in perchlorethylene held at 125 ° C. (boiling point) for 15 minutes and the state of film adhesion at the cut edge was observed. In all cases, there was no peeling of the resin film and it was good.

【0026】(実施例2)JIS1100アルミニウム
板を冷間圧延して0.3mmtの板材とし、これを表1
に掲げる条件のアルカリ性水溶液により洗浄した後、大
気中にて450℃で3時間焼鈍しO材とした。この時得
られた供試材の酸化皮膜厚さを表1に示す。その後、こ
の板に厚さ30μmのナイロン系樹脂フィルムを圧力=
5kg/cm2 、温度=230℃、時間=10分の条件
で熱圧着し積層板を作製した。この積層板を総シゴキ率
40%で成型し、直径5mm、高さ11mmの円筒容器
とした。この円筒容器をトリミング後、125℃(沸
点)で保持したパ−クロルエチレン中に15分浸漬し切
り口の皮膜付着状況を観察したところ、いずれも樹脂皮
膜の剥離が無く、良好であった。
(Example 2) A JIS 1100 aluminum plate was cold-rolled into a plate material having a thickness of 0.3 mmt.
After being washed with an alkaline aqueous solution under the conditions listed in (3), it was annealed in the air at 450 ° C. for 3 hours to obtain an O material. Table 1 shows the oxide film thickness of the test material obtained at this time. After that, press a nylon resin film with a thickness of 30 μm on this plate.
A laminate was prepared by thermocompression bonding under the conditions of 5 kg / cm @ 2, temperature = 230.degree. C. and time = 10 minutes. This laminated plate was molded at a total squeeze rate of 40% to obtain a cylindrical container having a diameter of 5 mm and a height of 11 mm. After this cylindrical container was trimmed, it was immersed in perchlorethylene held at 125 ° C. (boiling point) for 15 minutes and the state of film adhesion at the cut edge was observed. In all cases, there was no peeling of the resin film and it was good.

【0027】(実施例3)JIS1100アルミニウム
板を冷間圧延して0.3mmtの板材とし、これを、表
1に掲げる条件の湯洗により洗浄した後、大気中にて3
50℃で16時間焼鈍しO材とした。この時得られた供
試材の酸化皮膜厚さを表1に示す。その後、この板に厚
さ30μmのPET系樹脂フィルムを熱圧着し積層板を
作製した。この積層板を総シゴキ率40%で成型し、直
径5mm、高さ11mmの円筒容器とした。この円筒容
器をトリミング後、125℃(沸点)で保持したパ−ク
ロルエチレン中に15分浸漬し、切り口の皮膜付着状況
を観察したところ、いずれも樹脂皮膜の剥離が無く、良
好であった。
(Example 3) A JIS 1100 aluminum plate was cold-rolled into a plate material having a thickness of 0.3 mmt, which was washed with hot water under the conditions shown in Table 1 and then subjected to 3 in the atmosphere.
It was annealed at 50 ° C. for 16 hours to obtain an O material. Table 1 shows the oxide film thickness of the test material obtained at this time. Thereafter, a PET resin film having a thickness of 30 μm was thermocompression bonded to this plate to produce a laminated plate. This laminated plate was molded at a total squeeze rate of 40% to obtain a cylindrical container having a diameter of 5 mm and a height of 11 mm. After this cylindrical container was trimmed, it was immersed in perchlorethylene held at 125 ° C. (boiling point) for 15 minutes, and the state of film adhesion at the cut edge was observed. All were good with no peeling of the resin film.

【0028】(比較例1)JIS1100アルミニウム
板を冷間圧延して0.3mmtの板材とし、これを、洗
浄せずにそのまま大気中にて500℃8時間、450℃
3時間、350℃16時間の焼鈍を施しO材とした。こ
の時得られた供試材の酸化皮膜厚さを表1に示す。その
後、これらの板にそれぞれ厚さ30μmのフッ素系、ナ
イロン系、PET系の樹脂フィルムを実施例と同様の条
件で積層し積層板を作製した。この積層板を総シゴキ率
40%で成型し、直径5mm、高さ11mmの円筒容器
とした。この円筒容器をトリミング後、125℃(沸
点)で保持したパ−クロルエチレン中に15分浸漬し、
切り口の皮膜付着状況を観察したところ、いずれも樹脂
皮膜が剥離した。
(Comparative Example 1) A JIS 1100 aluminum plate was cold-rolled into a plate material of 0.3 mmt, which was directly washed in the air at 500 ° C. for 8 hours at 450 ° C. without washing.
Annealing was performed for 3 hours at 350 ° C. for 16 hours to obtain an O material. Table 1 shows the oxide film thickness of the test material obtained at this time. Then, a fluorine-based, nylon-based, and PET-based resin film having a thickness of 30 μm was laminated on each of these plates under the same conditions as in the example to produce a laminated plate. This laminated plate was molded at a total squeeze rate of 40% to obtain a cylindrical container having a diameter of 5 mm and a height of 11 mm. After trimming this cylindrical container, it was immersed in perchlorethylene held at 125 ° C (boiling point) for 15 minutes,
When the state of film adhesion on the cut surface was observed, the resin film peeled off in all cases.

【0029】(比較例2)JIS1100アルミニウム
板を冷間圧延して0.3mmtの板材とし、これを、表
1に掲げる条件で洗浄した後、大気中にて250℃30
分の焼鈍を施しO材とした。この時得られた供試材の酸
化皮膜厚さを表1に示す。その後、これらの板にそれぞ
れ厚さ30μmのフッ素系、ナイロン系、PET系の樹
脂フィルムを実施例と同様の条件で積層し積層板を作製
した。この積層板を総シゴキ率40%で成型し、直径5
mm、高さ11mmの円筒容器とした。この円筒容器を
トリミング後、125℃(沸点)で保持したパ−クロル
エチレン中に15分浸漬し、切り口の皮膜付着状況を観
察したところ、いずれも樹脂皮膜が剥離した。
(Comparative Example 2) A JIS 1100 aluminum plate was cold-rolled into a plate of 0.3 mmt, which was washed under the conditions shown in Table 1 and then heated at 250 ° C. in the atmosphere at 30 ° C.
Minute annealing was performed to obtain an O material. Table 1 shows the oxide film thickness of the test material obtained at this time. Then, a fluorine-based, nylon-based, and PET-based resin film having a thickness of 30 μm was laminated on each of these plates under the same conditions as in the example to produce a laminated plate. This laminate was molded at a total squeeze rate of 40% and had a diameter of 5
mm and a height of 11 mm. After trimming this cylindrical container, it was immersed in perchlorethylene held at 125 ° C. (boiling point) for 15 minutes and the state of film adhesion at the cut edge was observed.

【0030】[0030]

【効果】本発明によれば、焼鈍に先立ちアルミニウム板
表面を酸洗浄またはアルカリ洗浄または湯洗した後、該
アルミニウム材をO材とするために必須の250℃以上
の焼鈍工程を施すことにより、フィルムとの密着性の良
い酸化皮膜をアルミニウム板表面にムラ無く均一に形成
することができ、従ってフィルムの密着性が向上して成
型性に優れた、容器、コンデンサーケース材、炊飯ジャ
ー等に好適なフィルム積層用アルミニウム板を得ること
ができる。また焼鈍中に形成される酸化皮膜を有効に利
用できるため、焼鈍後に電解処理や粗面化処理といった
表面処理をあらためて行う必要が無いので全体として工
程が簡略になり生産性が向上する。また焼鈍条件として
バッチ炉を用いることができるためアルミニウム板に余
分な張力をかけることがなく、従って板厚の薄い場合で
も支障無く製造することができる。
According to the present invention, the surface of an aluminum plate is acid-cleaned, alkali-cleaned or hot-water rinsed prior to annealing, and then subjected to an annealing step at 250 ° C. or higher, which is essential for converting the aluminum material into an O material. Suitable for containers, capacitor case materials, rice cookers, etc. because an oxide film with good adhesion to the film can be uniformly formed on the surface of the aluminum plate without unevenness, thus improving the film adhesion and excellent moldability. An aluminum plate for film lamination can be obtained. Further, since the oxide film formed during annealing can be effectively used, there is no need to perform additional surface treatment such as electrolytic treatment or surface roughening treatment after annealing, so that the process is simplified as a whole and the productivity is improved. Further, since a batch furnace can be used as the annealing condition, no extra tension is applied to the aluminum plate, and therefore, the aluminum plate can be manufactured without any trouble even when it is thin.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 アルミニウム板の表面を洗浄し、その後
大気中で250〜650℃の温度範囲で2時間以上焼鈍
し、表面の酸化皮膜の厚さが20オングストローム以上
であることを特徴とするフィルム積層用アルミニウム板
の製造方法。
1. A film characterized in that the surface of an aluminum plate is washed and then annealed in the temperature range of 250 to 650 ° C. for 2 hours or more in the atmosphere, and the thickness of the oxide film on the surface is 20 angstroms or more. Manufacturing method of aluminum plate for lamination.
【請求項2】 アルミニウム板の表面を鉱酸または有機
酸またはその混酸で洗浄し、その後大気中で250〜6
50℃の温度範囲で2時間以上焼鈍し、表面の酸化皮膜
の厚さが20オングストローム以上であることを特徴と
するフィルム積層用アルミニウム板の製造方法。
2. The surface of the aluminum plate is washed with a mineral acid, an organic acid or a mixed acid thereof, and then 250 to 6 in the atmosphere.
A method for producing an aluminum plate for laminating a film, which comprises annealing at a temperature range of 50 ° C. for 2 hours or more, and the thickness of an oxide film on the surface is 20 Å or more.
【請求項3】 アルミニウム板の表面をアルカリ性溶液
で洗浄し、その後大気中で250〜650℃の温度範囲
で2時間以上焼鈍し、表面の酸化皮膜の厚さが20オン
グストローム以上であることを特徴とするフィルム積層
用アルミニウム板の製造方法。
3. The surface of an aluminum plate is washed with an alkaline solution and then annealed in the temperature range of 250 to 650 ° C. for 2 hours or more, and the thickness of the oxide film on the surface is 20 angstroms or more. And a method for producing an aluminum plate for film lamination.
【請求項4】 アルミニウム板の表面を40〜100℃
の水で洗浄し、その後大気中で250〜650℃の温度
範囲で2時間以上焼鈍し、表面の酸化皮膜の厚さが20
オングストローム以上であることを特徴とするフィルム
積層用アルミニウム板の製造方法。
4. The surface of the aluminum plate is 40 to 100 ° C.
Washed with water, and then annealed in the temperature range of 250 to 650 ° C. for 2 hours or more so that the thickness of the oxide film on the surface is 20.
A method for producing an aluminum plate for film lamination, which is not less than angstrom.
JP8121393A 1993-03-16 1993-03-16 Production of aluminum sheet for film laminating Pending JPH06272015A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8121393A JPH06272015A (en) 1993-03-16 1993-03-16 Production of aluminum sheet for film laminating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8121393A JPH06272015A (en) 1993-03-16 1993-03-16 Production of aluminum sheet for film laminating

Publications (1)

Publication Number Publication Date
JPH06272015A true JPH06272015A (en) 1994-09-27

Family

ID=13740211

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8121393A Pending JPH06272015A (en) 1993-03-16 1993-03-16 Production of aluminum sheet for film laminating

Country Status (1)

Country Link
JP (1) JPH06272015A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6099953A (en) * 1996-03-27 2000-08-08 Toyo Kohan Co., Ltd. Thermoplastic resin-coated aluminum alloy plate, and process and apparatus for producing the same
US6238783B1 (en) 1996-03-27 2001-05-29 Toyo Kohan Co., Ltd. Thermoplastic resin coated aluminum alloy sheet, and method and apparatus for production thereof
US6475597B2 (en) 1996-02-23 2002-11-05 Toyo Kohan Co., Ltd. Thermoplastic resin-coated aluminum alloy plate and method and apparatus for manufacturing the same
US7507297B2 (en) 2002-05-20 2009-03-24 Panasonic Corporation Cleaning method and cleaning apparatus
JP2009068073A (en) * 2007-09-13 2009-04-02 Jfe Steel Kk Vertical pickling device for steel sheet
JP2010265551A (en) * 2003-06-03 2010-11-25 Showa Denko Kk Method for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, method for producing electrode material for electrolytic capacitor, and aluminum electrolytic capacitor
JP2010275637A (en) * 2003-06-03 2010-12-09 Showa Denko Kk Method for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, method for producing electrode material for electrolytic capacitor, and aluminum electrolytic capacitor
KR102077537B1 (en) * 2019-10-14 2020-02-14 주식회사 에이엘텍 Apparatus for cleaning aluminum pouch film for secondary batteries, method for cleaning aluminum pouch film for secondary batteries using same and aluminum pouch film cleaned using same

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6475597B2 (en) 1996-02-23 2002-11-05 Toyo Kohan Co., Ltd. Thermoplastic resin-coated aluminum alloy plate and method and apparatus for manufacturing the same
US6099953A (en) * 1996-03-27 2000-08-08 Toyo Kohan Co., Ltd. Thermoplastic resin-coated aluminum alloy plate, and process and apparatus for producing the same
US6238783B1 (en) 1996-03-27 2001-05-29 Toyo Kohan Co., Ltd. Thermoplastic resin coated aluminum alloy sheet, and method and apparatus for production thereof
DE19781671B4 (en) * 1996-03-27 2008-11-06 Toyo Kohan Co., Ltd. Thermo-resin coated aluminum alloy sheet
DE19782310B4 (en) * 1996-03-27 2009-09-24 Toyo Kohan Co., Ltd. A process for producing a thermoplastic resin-coated aluminum alloy sheet
US7507297B2 (en) 2002-05-20 2009-03-24 Panasonic Corporation Cleaning method and cleaning apparatus
JP2010265551A (en) * 2003-06-03 2010-11-25 Showa Denko Kk Method for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, method for producing electrode material for electrolytic capacitor, and aluminum electrolytic capacitor
JP2010275637A (en) * 2003-06-03 2010-12-09 Showa Denko Kk Method for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, method for producing electrode material for electrolytic capacitor, and aluminum electrolytic capacitor
JP2009068073A (en) * 2007-09-13 2009-04-02 Jfe Steel Kk Vertical pickling device for steel sheet
KR102077537B1 (en) * 2019-10-14 2020-02-14 주식회사 에이엘텍 Apparatus for cleaning aluminum pouch film for secondary batteries, method for cleaning aluminum pouch film for secondary batteries using same and aluminum pouch film cleaned using same

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